A pre-cleaning device for a chemical mechanical polishing apparatus

Abstract

The utility model relates to the field of cleaning equipment discloses a kind of pre-cleaning device for chemical mechanical polishing equipment, including cleaning tank, two positioning mechanisms are equipped in cleaning tank inside, upper is equipped with cleaning assembly;The pedestal is equipped below cleaning tank, and the inside of pedestal is hollow design, and cleaning tank is slidably installed on the top of pedestal, and the inside of pedestal is equipped with the drive assembly for driving cleaning tank to move, and the middle of top is provided with through slot;Positioning mechanism includes locating seat, vertical cylinder is rotatably installed in the middle of locating seat and penetrates, vertical cylinder top is equipped with round plate, support seat is fixedly connected in the center of round plate top, and the edge of top is fixedly connected with multiple arc structure's limit plate, multiple through holes are provided in support seat top surface, and air guide pipe is fixedly connected in the bottom inside vertical cylinder.The utility model can realize the contact cleaning of wafer by setting two positioning mechanisms, improve cleaning efficiency, and effectively prevent sewage splashing by the setting of fixed cylinder, improve the practicability of device.

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