Wafer probe grinding apparatus
By designing a wafer probe grinding equipment with a drive motor, a rotation drive mechanism, and an adjustment mechanism, the problem of traditional equipment being unable to grind and adjust angles in all directions has been solved, achieving efficient and precise probe grinding.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- SHENZHEN KEDAXIN TECH CO LTD
- Filing Date
- 2025-10-16
- Publication Date
- 2026-07-21
AI Technical Summary
Traditional wafer probe grinding equipment cannot achieve all-round grinding or flexibly adjust the angle and position of the probe, resulting in low grinding efficiency and low precision.
A wafer probe grinding device was designed, comprising a drive motor, a rotation drive mechanism, an adjustment mechanism, and an observation mechanism. The drive motor drives the grinding wheel, the rotation drive mechanism drives the probe to rotate, the adjustment mechanism adjusts the position and angle of the support base, and the observation mechanism monitors the grinding status in real time, thereby achieving all-round grinding of the probe.
It improves the grinding efficiency and accuracy of the probe, reduces the difficulty of operation and labor intensity, and enables flexible adjustment and all-round grinding of the probe.
Smart Images

Figure CN224526830U_ABST