Laser scribing apparatus

Abstract

This utility model relates to the field of solar cell technology and discloses a laser scribing device, mainly comprising: a laser, a beam splitter, a support platform, and a positioning mechanism. The laser emits a laser beam. The beam splitter is located at the output end of the laser and is used to split the beam into three sub-beams, each perpendicular to the substrate film surface to be scribed. The three sub-beams are used for P1 scribing, P2 scribing, and P3 scribing, respectively. The support platform is vertically positioned corresponding to the sub-beams and is used to support the substrate to be scribed. The positioning mechanism is located on the support platform and is used to position the substrate to be scribed using the same positioning reference during each scribing. This laser scribing device can simultaneously meet the process requirements of P1 scribing, P2 scribing, and P3 scribing, thereby reducing operating costs. It can also position the three scribings separately using the same positioning reference, ensuring parallelism, reducing the overall dead zone width, and thus increasing the effective power generation area of ​​the cell.

Description

Technical Field

[0001] This utility model relates to the field of solar cell technology, specifically to laser scribing equipment. Background Technology

[0002] Perovskite solar cells are solar cells that utilize perovskite-type organometal halide semiconductors as light-absorbing materials. The entire manufacturing process of perovskite solar cells requires laser intervention. Currently, the industry generally refers to the laser process that forms series sub-cells as the P1, P2, and P3 scribing processes.

[0003] Because the materials used in the laser scribing processes P1, P2, and P3 differ, the applicable laser wavelengths, morphologies, and process parameters also vary. Therefore, to achieve better scribing results, existing laser scribing processes generally employ three separate machines to handle the three scribing processes, resulting in high operating costs. Furthermore, due to the small spacing between the scribing lines (P1, P2, P3), using three separate machines leads to significant cumulative errors due to differences in the straightness curves of the machines, laser variations, and positioning errors. To avoid intersections in some areas along the scribing lines, the scribing spacing between P1, P2, and P3 needs to be increased. This results in a relatively large dead zone width created by the laser scribing, thus reducing the effective power generation area of ​​the perovskite solar cell. Utility Model Content

[0004] In view of this, the present invention provides a laser scribing device to solve the problems of high cost and small effective power generation area of ​​perovskite cells after scribing, which are caused by the use of three devices for scribing P1, P2 and P3 in existing perovskite solar cells.

[0005] This utility model provides a laser scribing device, comprising: A laser, used to emit a laser beam; A beam splitter is disposed at the output end of the laser and is used to split the laser beam into three sub-beams. The sub-beams are perpendicular to the substrate film surface to be scribed, and the three sub-beams are used for scribing P1, P2, and P3 respectively. A support platform is positioned perpendicular to the sub-beam and is used to support the substrate to be scribed. A positioning mechanism, disposed on the support platform, is used to position the substrate to be scribed using the same positioning reference each time a scribe is made.

[0006] Beneficial effects: This invention's laser scribing equipment utilizes a beam splitter to divide the laser beam emitted by the laser into three sub-beams. Only one device is needed to simultaneously meet the process requirements of scribing P1, P2, and P3, significantly reducing operating costs. A positioning mechanism is installed on the support platform, enabling the three scribing lines to be positioned using the same reference point, reducing positioning errors, ensuring the parallelism of the three scribing lines, and minimizing the spacing between the scribing lines. This, in turn, reduces the overall dead zone width, thereby increasing the effective power generation area of ​​the perovskite solar cell.

[0007] In one optional embodiment, the beam splitter includes: A first power regulator is located at the output end of the laser. The first power regulator is used to divide the laser beam into a first sub-beam and a penetrating beam. The first sub-beam is used for P1 scribing. A frequency doubling module is disposed at the rear end of the first power regulator along the propagation direction of the transmitted light beam. The frequency doubling module is used to receive the transmitted light beam and adjust the wavelength of the transmitted light beam. The second power regulator is located at the rear end of the frequency doubling module along the propagation direction of the transmitted beam. The second power regulator is used to divide the adjusted transmitted beam into a second sub-beam and a third sub-beam. The second sub-beam is used for P2 scribing, and the third sub-beam is used for P3 scribing.

[0008] Beneficial effects: After passing through the first power regulator, the laser beam is divided into a first sub-beam and a penetrating beam. The first sub-beam is used for P1 scribing, and the penetrating beam is adjusted by the frequency doubling module to a wavelength suitable for P2 and P3 scribing. Then, it is divided by the second power regulator into a second sub-beam for P2 scribing and a third sub-beam for P3 scribing, so as to simultaneously meet the process requirements of P1 scribing, P2 scribing and P3 scribing, and reduce the number of laser scribing equipment used.

[0009] In one alternative embodiment, a reflector is further included, which is disposed at the rear end of the second power regulator, and the third sub-beam is parallel to the first sub-beam and the second sub-beam after being reflected by the reflector.

[0010] Beneficial effect: The reflector is used to adjust the propagation angle of the third sub-beam, so that the three sub-beams are set in parallel.

[0011] In one optional embodiment, the system further includes a first beam expander and a first focusing lens that are sequentially distributed along the propagation direction of the first sub-beam. The first beam expander is used to expand the first sub-beam, and the first focusing lens is used to converge the first sub-beam.

[0012] Beneficial effects: After the first sub-beam is expanded by the first beam expander, the divergence angle of the first sub-beam can be effectively reduced, the collimation of the first sub-beam can be improved, and the energy distribution range of the first sub-beam can be compressed. Then, after being converged by the first focusing lens, the energy of the first sub-beam is focused on the focal area, reducing energy loss and helping to improve the positioning accuracy and processing quality of P1 scribing.

[0013] In one optional embodiment, the system further includes a second beam expander, a shaping module, and a second focusing lens, which are sequentially distributed along the propagation direction of the second sub-beam. The second beam expander is used to expand the second sub-beam, the shaping module is used to shape the second sub-beam into a flat-topped square spot, and the second focusing lens is used to converge the second sub-beam.

[0014] Beneficial effects: After the second sub-beam is expanded by the second beam expander, the divergence angle of the second sub-beam can be effectively reduced, the collimation of the second sub-beam can be improved, and the energy distribution range of the second sub-beam can be compressed. The Gaussian circular spot is shaped into a flat-topped square spot by the shaping module, and then converged by the second focusing lens. This can meet the process requirements of P2 scribing and improve the processing quality of P2 scribing.

[0015] In one optional embodiment, a third beam expander and a third focusing lens are further distributed sequentially along the propagation direction of the third sub-beam, wherein the third beam expander is used to expand the third sub-beam and the third focusing lens is used to converge the third sub-beam.

[0016] Beneficial effects: After the third sub-beam is expanded by the third beam expander, the divergence angle of the third sub-beam can be effectively reduced, the collimation of the third sub-beam can be improved, and the energy distribution range of the third sub-beam can be compressed. Then, the energy of the third sub-beam is focused on the focal area by the third focusing lens, reducing energy loss and improving the positioning accuracy and processing quality of P3 scribing.

[0017] In one alternative implementation, the focal point of the first sub-beam, the second sub-beam, and the third sub-beam converges to be located on the same plane.

[0018] Beneficial effects: By setting the focal points of the three sub-beams on the same plane, the laser marking process does not require frequent refocusing, reducing the vertical movement of the laser marking equipment and thus avoiding focus drift caused by frequent height adjustments.

[0019] In one optional embodiment, the first power regulator includes a first half-wave plate and a first polarizing beam splitter sequentially distributed along the propagation direction of the laser beam. The laser beam irradiates and passes through the first half-wave plate, which is used to adjust the polarization state of the laser beam. Part of the laser beam is reflected by the first polarizing beam splitter to form a first sub-beam, and another part of the laser beam passes through the first polarizing beam splitter to form a penetrating beam.

[0020] Beneficial effects: The first half-wave plate and the first polarizing beam splitter constitute the first power regulator. The first half-wave plate can precisely adjust the polarization direction of the laser beam, and the first polarizing beam splitter splits the laser beam according to its polarization state, thereby forming a stable first sub-beam and a transmitted beam. By changing the polarization direction of the first half-wave plate and the angle between the polarization axes of the first polarizing beam splitter, the energy distribution ratio of the first sub-beam and the transmitted beam can be adjusted to meet the needs of different processing techniques, making it flexible in use.

[0021] In one optional embodiment, the second power regulator includes a second half-wave plate and a second polarizing beam splitter sequentially distributed along the propagation direction of the transmitted beam. The transmitted beam irradiates and passes through the second half-wave plate, which is used to adjust the polarization state of the transmitted beam. A portion of the transmitted beam is reflected by the second polarizing beam splitter to form a second sub-beam, and another portion of the transmitted beam passes through the second polarizing beam splitter to form a third sub-beam.

[0022] Beneficial effects: The second half-wave plate and the second polarizing beam splitter constitute the first power regulator. The second half-wave plate can precisely adjust the polarization direction of the transmitted beam, and the second polarizing beam splitter splits the transmitted beam according to its polarization state, thereby forming stable second and third sub-beams. By changing the polarization direction of the second half-wave plate and the angle between the polarization axes of the second polarizing beam splitter, the energy distribution ratio of the second and third sub-beams can be adjusted to meet the needs of different processing techniques, making it flexible in use.

[0023] In one optional embodiment, the wavelength of the laser beam is λ1, which satisfies 700 nm ≤ λ1 ≤ 1200 nm; The wavelength of the transmitted beam after being adjusted by the frequency doubling module is λ2, which satisfies 492 nm ≤ λ2 ≤ 577 nm.

[0024] Beneficial effects: By controlling the wavelength λ1 of the laser beam and the wavelength λ2 of the penetrating beam after being adjusted by the frequency doubling module within a suitable range, the wavelengths of the three sub-beams can be indirectly adjusted so that the three sub-beams are suitable for the process requirements of three scribing operations, thereby improving the quality of laser scribing. Attached Figure Description

[0025] To more clearly illustrate the specific embodiments of this utility model or the technical solutions in the prior art, the drawings used in the description of the specific embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are some embodiments of this utility model. For those skilled in the art, other drawings can be obtained from these drawings without creative effort.

[0026] Figure 1 This is a schematic diagram of the structure of a laser scribing device according to an embodiment of the present invention.

[0027] Explanation of reference numerals in the attached figures: 1. Laser; 2. Beam splitter; 201. First power regulator; 2011. First half-wave plate; 2012. First polarizing beam splitter; 202. Frequency doubling module; 203. Second power regulator; 2031. Second half-wave plate; 2032. Second polarizing beam splitter; 3. Support platform; 4. Positioning mechanism; 5. Substrate; 6. Reflector; 7. First beam expander; 8. First focusing lens; 9. Second beam expander; 10. Shaping module; 11. Second focusing lens; 12. Third beam expander; 13. Third focusing lens; 14. Displacement mechanism; A1, Laser beam; A2, First sub-beam; A3, Penetrating beam; A4, Second sub-beam; A5, Third sub-beam. Detailed Implementation

[0028] To make the objectives, technical solutions, and advantages of the embodiments of this utility model clearer, the technical solutions of the embodiments of this utility model will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this utility model, not all embodiments. Based on the embodiments of this utility model, all other embodiments obtained by those skilled in the art without creative effort are within the protection scope of this utility model.

[0029] The "range" disclosed in this application can be defined in the form of a lower limit and an upper limit. A given range is defined by selecting a lower limit and an upper limit, which define the boundaries of a particular range. Ranges defined in this way can include or exclude endpoints; any endpoint can be independently included or excluded, and they can be combined arbitrarily, meaning any lower limit can be combined with any upper limit to form a range. For example, if ranges of 60-120 and 80-110 are listed for a specific parameter, it is expected that ranges of 60-110 and 80-120 are also included. Furthermore, if minimum range values ​​1 and 2 are listed, and maximum range values ​​3, 4, and 5 are also listed, then the following ranges are all expected: 1-3, 1-4, 1-5, 2-3, 2-4, and 2-5. In this application, unless otherwise stated, the numerical range "ab" represents a shortened representation of any combination of real numbers between a and b, where a and b are real numbers. For example, the numerical range "0-5" means that all real numbers between "0-5" have been listed in this article; "0-5" is just a shortened representation of these numerical combinations.

[0030] In this document, the term "embodiment" means that a particular feature, structure, or characteristic described in connection with an embodiment may be included in at least one embodiment or implementation of this application. The appearance of this phrase in various places throughout the specification does not necessarily refer to the same embodiment, nor is it a separate or alternative embodiment mutually exclusive with other embodiments. It will be explicitly and implicitly understood by those skilled in the art that the embodiments described herein can be combined with other embodiments. The term "implementation" as used herein has a similar understanding.

[0031] In this application, open-ended technical features or solutions described using terms such as "containing," "comprising," or "including" do not exclude additional members beyond those listed unless otherwise specified. They can be considered as providing both closed-ended features or solutions comprised of the listed members and open-ended features or solutions that include additional members beyond the listed members. For example, if A includes a1, a2, and a3, it may include other members or exclude additional members unless otherwise specified. This can be considered as providing both features or solutions where "A consists of a1, a2, and a3" or "A is selected from a1, a2, and a3," and features or solutions where "A includes not only a1, a2, and a3, but also other members."

[0032] In this application, unless otherwise specified, A (e.g., B) means that B is a non-limiting example of A, and it is understood that A is not limited to B.

[0033] In this application, terms such as "further," "even further," and "particularly" are used to describe purposes and indicate differences in content, but should not be construed as limiting the scope of protection of this application.

[0034] The following is combined Figure 1 The following describes embodiments of the present invention.

[0035] According to embodiments of the present invention, such as Figure 1 As shown, a laser scribing apparatus is provided, mainly comprising: a laser 1, a beam splitter 2, a support platform 3, and a positioning mechanism 4. The laser 1 emits a laser beam A1. The beam splitter 2 is disposed at the output end of the laser 1 and splits the laser beam A1 into three sub-beams, each perpendicular to the surface of the substrate 5 to be scribed. The three sub-beams are used for scribing P1, P2, and P3, respectively. The support platform 3 is perpendicular to the sub-beams and supports the substrate 5 to be scribed. The positioning mechanism 4 is disposed on the support platform 3 and positions the substrate 5 to be scribed using the same positioning reference during each scribing operation.

[0036] The laser scribing equipment provided in this embodiment utilizes a beam splitter 2 to divide the laser beam A1 emitted by the laser 1 into three sub-beams. Only one device is needed to simultaneously meet the process requirements of scribing P1, P2, and P3, significantly reducing operating costs. A positioning mechanism 4 is provided on the support platform 3, enabling the three scribings to be positioned using the same positioning reference, reducing positioning errors, ensuring the parallelism of the three scribing lines, reducing the spacing between the scribing lines, and thus reducing the overall dead zone width, thereby increasing the effective power generation area of ​​the perovskite solar cell.

[0037] Specifically, the support platform 3 can be a platform with a clamping mechanism, or a vacuum adsorption platform, etc. Taking a platform with a clamping mechanism as an example, the laser 1 and the beam splitter 2, etc., are fixed above the support platform 3 by the clamping mechanism.

[0038] Furthermore, such as Figure 1 As shown, a displacement mechanism 14 can also be installed at the bottom of the support platform 3. The displacement mechanism 14 drives the support platform 3 to move, thereby moving the substrate 5 relative to the sub-beam to achieve displacement of the substrate 5 relative to the focal point, thus forming the scribing lines P1, P2, and P3. The displacement mechanism 14 can be any existing mechanism as needed, such as a lead screw and nut mechanism, a hydraulic telescopic mechanism, etc.

[0039] A two-dimensional displacement mechanism can also be installed at the bottom of the support platform 3. This mechanism drives the support platform 3 to move, thereby moving the substrate 5 relative to the sub-beam. This displacement of the substrate 5 relative to the focal point forms the scribing lines P1, P2, and P3. It also serves to adjust the distance between the positioning reference plane and the focal point during the scribing processes of P1, P2, and P3. The displacement mechanism 14 can be any existing mechanism as needed, as long as it can achieve movement in the X and Y vertical directions within the plane.

[0040] It should be noted that the present invention does not limit the positioning mechanism 4. Any existing structure can be selected as needed. For example, the positioning mechanism 4 can be a positioning reference block / strip, and the positioning reference surface formed by the positioning mechanism 4 is parallel to the scribing lines P1, P2, and P3.

[0041] The positioning mechanism 4 can also be mounted on the support platform 3 via a linear displacement module to adjust the distance between the positioning reference plane and the first sub-beam A2, the second sub-beam A4, and the third sub-beam A5. The linear displacement module can be any existing mechanism as needed, such as a servo screw and nut mechanism, a telescopic mechanism, etc.

[0042] It should be noted that the laser beam A1 emitted by laser 1 is a Gaussian beam. A Gaussian beam is a beam whose transverse electric field distribution approximately follows a Gaussian function. Laser 1 can adopt any existing structure, and this embodiment of the present invention does not impose excessive restrictions on it.

[0043] Furthermore, this embodiment of the invention does not limit the structure of the beam splitter 2, and any existing structure can be selected as needed.

[0044] In one embodiment, such as Figure 1 As shown, the beam splitting device 2 includes: a first power regulator 201, a frequency doubling module 202, and a second power regulator 203. The first power regulator 201 is located at the output end of the laser 1 and is used to split the laser beam A1 into a first sub-beam A2 and a penetrating beam A3. The first sub-beam A2 is used for marking P1. The frequency doubling module 202 is located at the rear end of the first power regulator 201 along the propagation direction of the penetrating beam A3 and is used to receive the penetrating beam A3 and adjust its wavelength. The second power regulator 203 is located at the rear end of the frequency doubling module 202 along the propagation direction of the penetrating beam A3 and is used to split the adjusted penetrating beam A3 into a second sub-beam A4 and a third sub-beam A5. The second sub-beam A4 is used for marking P2, and the third sub-beam A5 is used for marking P3.

[0045] After passing through the first power regulator 201, the laser beam A1 is divided into a first sub-beam A2 and a penetrating beam A3. The first sub-beam A2 is used for P1 scribing, and the penetrating beam A3 is adjusted by the frequency doubling module 202 to a wavelength suitable for P2 and P3 scribing. Then, it is divided by the second power regulator 203 into a second sub-beam A4 for P2 scribing and a third sub-beam A5 for P3 scribing, so as to simultaneously meet the process requirements of P1 scribing, P2 scribing and P3 scribing and reduce the number of laser scribing equipment used.

[0046] In one embodiment, such as Figure 1As shown, the laser scribing device also includes a reflector 6, which is located at the rear end of the second power regulator 203. After being reflected by the reflector 6, the third sub-beam A5 is parallel to the first sub-beam A2 and the second sub-beam A4. The reflector 6 is used to adjust the propagation angle of the third sub-beam A5, so that the three sub-beams are set in parallel.

[0047] Specifically, such as Figure 1 As shown, laser beam A1 is split into a first sub-beam A2, perpendicular to the surface of the support platform 3, and a penetrating beam A3, parallel to the surface of the support platform 3, by the first power regulator 201. The penetrating beam A3 is then split into a second sub-beam A4, also perpendicular to the surface of the support platform 3, and a third sub-beam A5, parallel to the surface of the support platform 3, by the second power regulator 203. The third sub-beam A5 is then adjusted by the reflector 6 to be perpendicular to the surface of the support platform 3.

[0048] In one embodiment, such as Figure 1 As shown, the laser scribing equipment also includes a first beam expander 7 and a first focusing lens 8 sequentially distributed along the propagation direction of the first sub-beam A2. The first beam expander 7 is used to expand the first sub-beam A2, and the first focusing lens 8 is used to converge the first sub-beam A2. After the first beam expander 7 expands the first sub-beam A2, it can effectively reduce the divergence angle of the first sub-beam A2, improve the collimation of the first sub-beam A2, and compress the energy distribution range of the first sub-beam A2. Then, after being converged by the first focusing lens 8, the energy of the first sub-beam A2 is focused on the focal region, reducing energy loss and improving the positioning accuracy and processing quality of P1 scribing.

[0049] Specifically, the magnification of the first sub-beam A2 controlled by the first beam expander 7 is 2-10 times, and the specific magnification needs to be selected and set according to the actual process.

[0050] In one embodiment, such as Figure 1 As shown, the laser scribing device also includes a second beam expander 9, a shaping module 10, and a second focusing lens 11, which are sequentially distributed along the propagation direction of the second sub-beam A4. The second beam expander 9 is used to expand the second sub-beam A4, the shaping module 10 is used to shape the second sub-beam A4 into a flat-topped square spot, and the second focusing lens 11 is used to converge the second sub-beam A4.

[0051] After the second sub-beam A4 is expanded by the second beam expander 9, the divergence angle of the second sub-beam A4 can be effectively reduced, the collimation of the second sub-beam A4 can be improved, and the energy distribution range of the second sub-beam A4 can be compressed. Then, the Gaussian circular spot is shaped into a flat-topped square spot by the shaping module 10, and then converged by the second focusing lens 11. This can meet the process requirements of P2 scribing and improve the processing quality of P2 scribing.

[0052] Specifically, the magnification of the second sub-beam A4 controlled by the second beam expander 9 is 2-10 times, and the specific magnification needs to be selected and set according to the actual process.

[0053] In one embodiment, such as Figure 1 As shown, the laser scribing equipment also includes a third beam expander 12 and a third focusing lens 13, which are sequentially distributed along the propagation direction of the third sub-beam A5. The third beam expander 12 is used to expand the third sub-beam A5, and the third focusing lens 13 is used to converge the third sub-beam A5. After the third beam expander 12 expands the third sub-beam A5, it can effectively reduce the divergence angle of the third sub-beam A5, improve the collimation of the third sub-beam A5, and compress the energy distribution range of the third sub-beam A5. Then, after being converged by the third focusing lens 13, the energy of the third sub-beam A5 is focused on the focal region, reducing energy loss and improving the positioning accuracy and processing quality of P3 scribing.

[0054] Specifically, the magnification of the third sub-beam A5 controlled by the third beam expander 12 is 2-10 times, and the specific magnification needs to be selected and set according to the actual process.

[0055] In one embodiment, the focal points of the first sub-beam A2, the second sub-beam A4, and the third sub-beam A5 converge on the same plane. Setting the focal points of the three sub-beams on the same plane eliminates the need for frequent refocusing during the three marking processes, reducing the vertical movement of the laser marking equipment. This prevents focus drift caused by frequent height adjustments, which in turn reduces the equipment's lifespan.

[0056] Furthermore, in one embodiment, such as Figure 1 As shown, the first power regulator 201 includes a first half-wave plate 2011 and a first polarizing beam splitter 2012 sequentially distributed along the propagation direction of the laser beam A1. The laser beam A1 irradiates and passes through the first half-wave plate 2011. The first half-wave plate 2011 is used to adjust the polarization state of the laser beam A1. Part of the laser beam A1 is reflected by the first polarizing beam splitter 2012 to form a first sub-beam A2, and another part of the laser beam A1 passes through the first polarizing beam splitter 2012 to form a penetrating beam A3.

[0057] The first half-wave plate 2011 and the first polarizing beam splitter 2012 constitute the first power regulator 201. The first half-wave plate 2011 can precisely adjust the polarization direction of the laser beam A1, and the first polarizing beam splitter 2012 splits the laser beam A1 according to its polarization state, thereby forming a stable first sub-beam A2 and a transmitted beam A3. By changing the polarization direction of the first half-wave plate 2011 and the angle between the polarization axes of the first polarizing beam splitter 2012, the energy distribution ratio of the first sub-beam A2 and the transmitted beam A3 can be adjusted to meet the needs of different processing techniques, making it flexible in use.

[0058] It should be noted that a half-wave plate, also known as a half-wave plate, is a birefringent crystal of a specific thickness, mainly used to adjust the direction of polarized light. In this embodiment of the invention, the attenuation of the first half-wave plate 2011 is less than 0.1%.

[0059] Furthermore, in one embodiment, such as Figure 1 As shown, the second power regulator 203 includes a second half-wave plate 2031 and a second polarizing beam splitter 2032 sequentially distributed along the propagation direction of the transmitted beam A3. The transmitted beam A3 illuminates and passes through the second half-wave plate 2031. The second half-wave plate 2031 is used to adjust the polarization state of the transmitted beam A3. Part of the transmitted beam A3 is reflected by the second polarizing beam splitter 2032 to form a second sub-beam A4, and another part of the transmitted beam A3 passes through the second polarizing beam splitter 2032 to form a third sub-beam A5.

[0060] The second half-wave plate 2031 and the second polarizing beam splitter 2032 constitute the first power regulator 201. The second half-wave plate 2031 can precisely adjust the polarization direction of the transmitted beam A3, and the second polarizing beam splitter 2032 splits the transmitted beam A3 according to its polarization state, thereby forming a stable second sub-beam A4 and a third sub-beam A5. By changing the polarization direction of the second half-wave plate 2031 and the angle between the polarization axes of the second polarizing beam splitter 2032, the energy distribution ratio of the second sub-beam A4 and the third sub-beam A5 can be adjusted to meet the needs of different processing techniques, making it flexible in use.

[0061] Similarly, the attenuation of the second half-wave plate 2031 is less than 0.1%.

[0062] In one embodiment, the wavelength of the laser beam A1 is λ1, which satisfies 700 nm ≤ λ1 ≤ 1200 nm.

[0063] The wavelength of the transmitted beam A3 after being adjusted by the frequency doubling module 202 is λ2, which satisfies 492 nm≤λ2≤577 nm.

[0064] For example, the wavelength λ1 of the laser beam A1 can be 700 nm, 1064 nm, 1200 nm, etc., and the wavelength λ2 of the transmitted beam A3 after being adjusted by the frequency doubling module 202 can be 492 nm, 532 nm, 577 nm, etc.

[0065] By controlling the wavelength λ1 of the laser beam A1 and the wavelength λ2 of the penetrating beam A3 after being adjusted by the frequency doubling module 202 within a suitable range, the wavelengths of the three sub-beams can be indirectly adjusted so that the three sub-beams are suitable for the process requirements of three scribing operations, thereby improving the quality of laser scribing.

[0066] The working principle of the present invention is described below with reference to specific embodiments. These examples should not be construed as limiting the scope of protection claimed in this application.

[0067] A laser beam A1 with a wavelength of 1064 nm is emitted by laser 1. The laser beam A1 first passes through a first half-wave plate 2011 (attenuation less than 0.1%) to adjust its polarization state, and then shines towards a first polarizing beam splitter 2012 (attenuation less than 0.5%). Part of the laser beam A1 is reflected by the first polarizing beam splitter 2012 to form a first sub-beam A2. The first sub-beam A2 is expanded by a first beam expander 7 and then converged by a first focusing lens 8 for scribing P1. The other part of the laser beam A1 passes through the first polarizing beam splitter 2012 to form a penetrating beam A3.

[0068] The transmitted beam A3 is first adjusted to a wavelength of 532 nm green light by the frequency doubling module 202, and then its polarization state is adjusted by the second half-wave plate 2031 (attenuation less than 0.1%). It then shines towards the second polarizing beam splitter 2032 (attenuation less than 0.5%). Part of the transmitted beam A3 is reflected by the second polarizing beam splitter 2032 to form a second sub-beam A4. After being expanded by the second beam expander 9, the second sub-beam A4 is shaped into a flat-topped square beam by the shaping module 10, and then converged by the second focusing lens 11 for marking P2. Another part of the transmitted beam A3 passes through the second polarizing beam splitter 2032 to form a third sub-beam A5. The third sub-beam A5 is reflected by the reflecting mirror 6 (attenuation less than 0.1%) to adjust its propagation angle, then expanded by the third beam expander 12, and finally converged by the third focusing lens 13 for marking P3.

[0069] Although embodiments of the present invention have been described in conjunction with the accompanying drawings, those skilled in the art can make various modifications and variations without departing from the spirit and scope of the present invention, and such modifications and variations all fall within the scope defined by the appended claims.

Claims

1. A laser scribing device, characterized in that, include: Laser (1) for emitting a laser beam (A1); A beam splitter (2) is disposed at the output end of the laser (1) and is used to split the laser beam (A1) into three sub-beams. The sub-beams are perpendicular to the substrate (5) film surface to be scribed, and the three sub-beams are used for scribing P1, P2 and P3 respectively. The support platform (3) is vertically positioned corresponding to the sub-beam and is used to support the substrate (5) to be scribed. A positioning mechanism (4) is provided on the support platform (3) for positioning the substrate (5) to be scribed with the same positioning reference each time a scribe is made.

2. The laser scribing apparatus of claim 1, wherein, The beam splitter (2) includes: A first power regulator (201) is provided at the output end of the laser (1). The first power regulator (201) is used to divide the laser beam (A1) into a first sub-beam (A2) and a penetrating beam (A3). The first sub-beam (A2) is used for scribing P1. A frequency doubling module (202) is disposed at the rear end of the first power regulator (201) along the propagation direction of the transmitted beam (A3). The frequency doubling module (202) is used to receive the transmitted beam (A3) and adjust the wavelength of the transmitted beam (A3). The second power regulator (203) is located at the rear end of the frequency doubling module (202) along the propagation direction of the transmitted beam (A3). The second power regulator (203) is used to divide the adjusted transmitted beam (A3) into a second sub-beam (A4) and a third sub-beam (A5). The second sub-beam (A4) is used for P2 scribing, and the third sub-beam (A5) is used for P3 scribing.

3. The laser scribing apparatus of claim 2, wherein, It also includes a reflector (6), which is located at the rear end of the second power regulator (203). The third sub-beam (A5) is reflected by the reflector (6) and is parallel to the first sub-beam (A2) and the second sub-beam (A4).

4. The laser scribing apparatus of claim 3, wherein, It also includes a first beam expander (7) and a first focusing lens (8) arranged sequentially along the propagation direction of the first sub-beam (A2). The first beam expander (7) is used to expand the first sub-beam (A2), and the first focusing lens (8) is used to focus the first sub-beam (A2).

5. The laser scribing apparatus of claim 4, wherein, It also includes a second beam expander (9), a shaping module (10), and a second focusing lens (11) arranged sequentially along the propagation direction of the second sub-beam (A4). The second beam expander (9) is used to expand the second sub-beam (A4), the shaping module (10) is used to shape the second sub-beam (A4) into a flat-top square spot, and the second focusing lens (11) is used to converge the second sub-beam (A4).

6. The laser scribing apparatus of claim 5, wherein, It also includes a third beam expander (12) and a third focusing lens (13) arranged sequentially along the propagation direction of the third sub-beam (A5). The third beam expander (12) is used to expand the third sub-beam (A5), and the third focusing lens (13) is used to focus the third sub-beam (A5).

7. The laser scribing apparatus of claim 6, wherein, The focal point of the first sub-beam (A2), the second sub-beam (A4), and the third sub-beam (A5) is located on the same plane.

8. The laser scribing apparatus according to any one of claims 2 to 7, characterized in that, The first power regulator (201) includes a first half-wave plate (2011) and a first polarizing beam splitter (2012) sequentially distributed along the propagation direction of the laser beam (A1). The laser beam (A1) irradiates and passes through the first half-wave plate (2011). The first half-wave plate (2011) is used to adjust the polarization state of the laser beam (A1). Part of the laser beam (A1) is reflected by the first polarizing beam splitter (2012) to form a first sub-beam (A2), and another part of the laser beam (A1) passes through the first polarizing beam splitter (2012) to form a penetrating beam (A3).

9. The laser scribing apparatus of any one of claims 2 to 7, wherein, The second power regulator (203) includes a second half-wave plate (2031) and a second polarizing beam splitter (2032) sequentially distributed along the propagation direction of the transmitted beam (A3). The transmitted beam (A3) illuminates and passes through the second half-wave plate (2031). The second half-wave plate (2031) is used to adjust the polarization state of the transmitted beam (A3). Part of the transmitted beam (A3) is reflected by the second polarizing beam splitter (2032) to form a second sub-beam (A4), and another part of the transmitted beam (A3) passes through the second polarizing beam splitter (2032) to form a third sub-beam (A5).

10. The laser scribing apparatus according to any one of claims 2 to 7, characterized in that, The wavelength of the laser beam (A1) is λ1, which satisfies 700 nm ≤ λ1 ≤ 1200 nm; The wavelength of the transmitted beam (A3) after being adjusted by the frequency doubling module (202) is λ2, which satisfies 492 nm≤λ2≤577nm.

Images