A hoisting fixture for the lower electrode products of a plasma etching equipment

Abstract

This invention provides a hoisting fixture for the lower electrode product of a plasma etching equipment, comprising: a main frame, the main frame including two sets of main rods and two sets of auxiliary rods, the main rods and auxiliary rods being interconnected to form a rectangular structure; and a rotating rod, both ends of the main rods having deflection grooves, one end of the rotating rod extending into the deflection groove, the portion of the rotating rod extending into the deflection groove being rotatably connected to the main rod, and a diagonal rod being provided between the rotating rod and the main frame. When the rotating rod deflects to form a straight structure with the main rod, the diagonal rod is inclinedly connected between the auxiliary rod and the rotating rod. The rotating rod provided by this invention forms a larger connection end face with the main rod, and uses the bolt seat on the rotating rod as the connection seat for the lower electrode, expanding the adaptability of the main frame to lower electrode products of different specifications of plasma etching equipment.

Description

Technical Field

[0001] This utility model belongs to the field of equipment hoisting technology, and in particular relates to a hoisting fixture for the lower electrode products of a plasma etching equipment. Background Technology

[0002] The lower electrode of a plasma etching machine is a core component for creating the electric field environment and forming plasma. During production, the lower electrode requires regular maintenance. Therefore, it needs to be disassembled from the plasma etching machine. This process involves using a lifting fixture to secure the lower electrode to the product, and then connecting a crane and ropes to it. The lifting fixture establishes the connection points, facilitating the lifting operation.

[0003] In existing technologies, the lifting fixtures are fixed in structure and cannot be deformed. When encountering the lower electrodes of plasma etching equipment of different specifications, their own structure limits their ability to cover more area, thus affecting the lifting effect. Utility Model Content

[0004] This utility model provides a hoisting fixture for the lower electrode product of a plasma etching equipment. The utility model is implemented as follows: A hoisting fixture for the lower electrode product of a plasma etching equipment includes:

[0005] The main frame includes two sets of main rods and two sets of secondary rods, which are connected to each other to form a rectangular structure.

[0006] The rotating rod has deflection grooves at both ends of the main rod. One end of the rotating rod extends into the deflection groove, and the part of the rotating rod extending into the deflection groove is rotatably connected to the main rod. An inclined rod is also provided between the rotating rod and the main frame. When the rotating rod deflects and forms a straight structure with the main rod, the inclined rod is inclinedly connected between the auxiliary rod and the rotating rod.

[0007] Preferably, the secondary rod is provided with a receiving groove, which is connected to the deflection groove, and the rotating rod enters the receiving groove by deflection.

[0008] Preferably, the outer side of the main rod is provided with a sliding groove, and a fixing plate is provided in the sliding groove. The rotating rod is also provided with a locking groove on the side near the main frame. When the rotating rod deflects and forms a straight structure with the main rod, the sliding groove and the locking groove are connected. Part of the fixing plate is assembled in the sliding groove and the other part is assembled in the locking groove.

[0009] Preferably, the groove is a T-shaped groove, and the cross-section of the fixing plate is a T-shaped structure adapted to the T-shaped groove.

[0010] Preferably, the rotating rod includes a rotating part and a main rod body. The rotating part is provided with a rotating shaft hole, and a rotating shaft is provided in the deflection groove. The rotating shaft hole is assembled in the rotating shaft.

[0011] Preferably, the width of the rotating part is smaller than that of the main rod, and a stepped surface is formed between the rotating part and the main rod. When the rotating rod deflects in a straight line with the main rod, part of the main rod abuts against the end of the main rod.

[0012] Compared with the prior art, the embodiments of this application have the following main advantages:

[0013] The hoisting fixture for the lower electrode product of the plasma etching equipment provided by this utility model expands outward to form an I-beam structure through the rotation of the rotating rod. Here, the rotating rod is equivalent to an extension component. The rotating rod and the main rod form a larger connection end face. The bolt seat on the rotating rod serves as the connection seat for the lower electrode, expanding the main frame to adapt to the lower electrode products of different specifications of plasma etching equipment. When the extension of the rotating rod is not required, the rotating rod is stored on the main frame. The flexible rotation connection function of the rotating rod achieves diversified use purposes and can connect and fix different lower electrodes. Attached Figure Description

[0014] Figure 1 This is a schematic diagram of the structure of the hoisting fixture for the lower electrode product of a plasma etching equipment provided by this utility model after it has been unfolded.

[0015] Figure 2 This is a schematic diagram of the main frame structure of a hoisting fixture for the lower electrode product of a plasma etching equipment provided by this utility model.

[0016] Figure 3 This is a schematic diagram of the inclined rod and rotating rod structure of a hoisting fixture for the lower electrode product of a plasma etching equipment provided by this utility model.

[0017] Figure 4 This is a schematic diagram of the structure of the transfer rod and main rod in the hoisting fixture for the lower electrode product of a plasma etching equipment provided by this utility model.

[0018] Figure 5 This is a schematic diagram of the inclined rod structure of a hoisting fixture for the lower electrode product of a plasma etching equipment provided by this utility model.

[0019] Figure 6 This is a schematic diagram of the connection between the main rod and the auxiliary rod of a hoisting fixture for the lower electrode product of a plasma etching equipment provided by this utility model.

[0020] Explanation of reference numerals in the attached figures:

[0021] 100. Main frame; 110. Main rod; 111. Slide groove; 112. Deflection groove; 120. Secondary rod; 121. Receiving groove; 200. Rotating rod; 210. Rotating part; 220. Main rod body; 201. Storage groove; 202. Locking groove; 300. Fixing plate; 400. Diagonal rod; 410. End plate; 420. Back plate; 430. Horizontal plate. Detailed Implementation

[0022] Unless otherwise defined, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this application belongs; the terminology used herein in the specification of the application is for the purpose of describing particular embodiments only and is not intended to be limiting of the application; the terms "comprising" and "having," and any variations thereof, in the specification, claims, and foregoing drawings of this application are intended to cover non-exclusive inclusion. The terms "first," "second," etc., in the specification, claims, or foregoing drawings of this application are used to distinguish different objects, not to describe a particular order.

[0023] In this document, the term "embodiment" means that a particular feature, structure, or characteristic described in connection with an embodiment may be included in at least one embodiment of this application. The appearance of this phrase in various places throughout the specification does not necessarily refer to the same embodiment, nor is it a separate or alternative embodiment mutually exclusive with other embodiments. It will be explicitly and implicitly understood by those skilled in the art that the embodiments described herein can be combined with other embodiments.

[0024] This utility model embodiment provides a hoisting fixture for the lower electrode product of a plasma etching equipment, such as... Figures 1-6 As shown, the hoisting fixture for the lower electrode product of the plasma etching equipment includes:

[0025] The main frame 100 is mainly composed of two sets of main rods 110 and two sets of auxiliary rods 120 connected together to form a rectangular structure. The main frame 100 is provided with bolt seats for connecting the lower electrode products of the plasma etching equipment. The main rods 110 and auxiliary rods 120 are also provided with lifting rings for connecting the lifting ropes during the lifting process. The main rods 110 and the two sets of auxiliary rods 120 can be connected by welding. The bolt seats are connected to the lower electrode of the plasma etching equipment by bolts. The lower electrode products of the plasma etching equipment are lifted and pulled by the lifting jig using a crane and ropes to complete the overall lifting of the lower electrode products of the plasma etching equipment.

[0026] The rotating rod 200 has deflection grooves 112 at both ends of the main rod 110. One end of the rotating rod 200 extends into the deflection groove 112, and the part of the rotating rod 200 extending into the deflection groove 112 is rotatably connected to the main rod 110. Specifically, the rotating part 210 has a rotating shaft hole, and a rotating shaft is provided in the deflection groove 112. The rotating shaft hole is fitted into the rotating shaft. The auxiliary rod 120 has a receiving groove 121, which communicates with the deflection groove 112. The rotating rod 200 deflects into the receiving groove 121.

[0027] The number of rotating rods 200 is four sets. The rotating rods 200 expand outward to form an I-shaped structure. Here, the rotating rods 200 are equivalent to extension parts. The rotating rods 200 and the main rod 110 form a larger connection end face. The bolt seats on the rotating rods 200 are used as connection seats for the lower electrodes, expanding the area of ​​the main frame 100 to adapt to the lower electrode products of different specifications of plasma etching equipment. When the extension of the rotating rods 200 is not required, the rotating rods 200 are stored on the main frame 100. The flexible rotation connection function of the rotating rods 200 realizes diversified use purposes and can connect and fix different lower electrodes.

[0028] A diagonal brace 400 is also provided between the rotating rod 200 and the main frame 100. When the rotating rod 200 is deflected and forms a straight structure with the main rod 110, the diagonal brace 400 is inclinedly connected between the auxiliary rod 120 and the rotating rod 200. The diagonal brace 400 is usually set in a storage groove 201 provided on the rotating rod 200. When the storage groove 201 is unfolded, the diagonal brace 400 is removed from the storage groove 201 and connected to the rotating rod 200 and the auxiliary rod 120 respectively.

[0029] In a preferred embodiment of this invention, the main rod 110 is further provided with a sliding groove 111 on its outer side, and a fixing plate 300 is provided in the sliding groove 111. The rotating rod 200 is further provided with a locking groove 202 on the side near the main frame 100. When the rotating rod 200 is deflected and forms a straight structure with the main rod 110, the sliding groove 111 and the locking groove 202 are connected. A part of the fixing plate 300 is assembled in the sliding groove 111 and the other part is assembled in the locking groove 202.

[0030] In this embodiment, the slide 111 is a T-shaped groove, and the cross-section of the fixing plate 300 is a T-shaped structure adapted to the T-shaped groove. The fixing plate 300 adopts different connection methods in different states. When the rotating rod 200 deflects and forms a straight structure with the main rod 110, the rotating rod 200 and the main frame 100 are reinforced by the fixing plate 300. When the rotating rod 200 is retracted into the receiving groove 121, the fixing plate 300 is completely located in the slide 111.

[0031] In a preferred embodiment of this invention, the diagonal brace 400 includes an end plate 410, a back plate 420, and a horizontal plate 430. The horizontal plate 430 is an isosceles trapezoidal structure and there are two sets. The end plates 410 are also divided into two sets and disposed on the horizontal plate 430. The two sets of horizontal plates 430 are arranged in parallel and spaced apart and connected by the end plates 410. The back plate 420 is connected to the upper bottom side of the two sets of horizontal plates 430.

[0032] In this embodiment, when the rotating rod 200 deflects to form a straight line with the main rod 110, the two sets of end plates 410 extend into the receiving groove 121 and the storage groove 201 respectively to connect with the auxiliary rod 120 and the rotating rod 200. When the rotating rod 200 needs to be stored in the storage groove 201, the back plate 420 fits against the bottom surface of the storage groove 201 and connects with the rotating rod 200. Here, the connection is mainly achieved by bolt fixing through screw holes on the end plate 410, the back plate 420, the auxiliary rod 120 and the rotating rod 200.

[0033] In a preferred embodiment of this invention, the width of the rotating part 210 is smaller than that of the main rod 220, and a stepped surface is formed between the rotating part 210 and the main rod 220. When the rotating rod 200 deflects and forms a straight line with the main rod 110, part of the main rod 220 abuts against the end of the main rod 110.

[0034] In this embodiment, the stepped surface serves both as a limiting element and as a means to enhance the axial support force between the elements.

[0035] It should be noted that, for the sake of simplicity, the foregoing embodiments are all described as a series of actions. However, those skilled in the art should understand that the present invention is not limited to the described order of actions, as some steps may be performed in other orders or simultaneously according to the present invention. Furthermore, those skilled in the art should also understand that the embodiments described in the specification are preferred embodiments, and the actions and modules involved are not necessarily essential to the present invention.

[0036] The above embodiments are only used to illustrate the technical solutions of this utility model, and are not intended to limit the scope of protection of this utility model. Obviously, the described embodiments are only some embodiments of this utility model, not all embodiments. Based on these embodiments, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of this utility model. Although this utility model has been described in detail with reference to the above embodiments, those skilled in the art can still combine, add, delete, or otherwise adjust the features of the various embodiments of this utility model according to the circumstances without conflict or creative effort, thereby obtaining different technical solutions that do not fundamentally depart from the concept of this utility model. These technical solutions are also within the scope of protection of this utility model.

Claims

1. A lifting tool for a lower electrode product of a plasma etching apparatus, characterized by, include: The main frame (100) includes two sets of main rods (110) and two sets of secondary rods (120), which are connected to each other to form a rectangular structure. The rotating rod (200) has deflection grooves (112) at both ends of the main rod (110). One end of the rotating rod (200) extends into the deflection groove (112). The part of the rotating rod (200) extending into the deflection groove (112) is rotatably connected to the main rod (110). A diagonal rod (400) is also provided between the rotating rod (200) and the main frame (100). When the rotating rod (200) deflects and forms a straight structure with the main rod (110), the diagonal rod (400) is inclinedly connected between the auxiliary rod (120) and the rotating rod (200).

2. The lifting jig for a lower electrode product of a plasma etching apparatus according to claim 1, wherein The auxiliary rod (120) is provided with a receiving groove (121), which is connected to the deflection groove (112). The rotating rod (200) enters the receiving groove (121) by deflection.

3. The lift-off jig for a lower electrode product of a plasma etching apparatus according to claim 2, wherein The main rod (110) is also provided with a sliding groove (111) on the outside. A fixing plate (300) is provided in the sliding groove (111). The rotating rod (200) is also provided with a locking groove (202) on the side near the main frame (100). When the rotating rod (200) deflects and forms a straight structure with the main rod (110), the sliding groove (111) and the locking groove (202) are connected. A part of the fixing plate (300) is assembled in the sliding groove (111) and the other part is assembled in the locking groove (202).

4. The lift-off jig for a lower electrode product of a plasma etching apparatus according to claim 3, wherein The groove (111) is a T-shaped groove, and the cross-section of the fixing plate (300) is a T-shaped structure adapted to the T-shaped groove.

5. The lift-off jig for a lower electrode product of a plasma etching apparatus according to claim 4, wherein The rotating rod (200) includes a rotating part (210) and a main rod body (220). The rotating part (210) is provided with a rotating shaft hole, and a rotating shaft is provided in the deflection groove (112). The rotating shaft hole is assembled in the rotating shaft.

6. The hoisting fixture for the lower electrode product of a plasma etching equipment as described in claim 5, characterized in that, The width of the rotating part (210) is smaller than that of the main rod (220). A stepped surface is formed between the rotating part (210) and the main rod (220). When the rotating rod (200) deflects and forms a straight structure with the main rod (110), part of the main rod (220) abuts against the end of the main rod (110).

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