Pure water systems and semiconductor equipment

Abstract

This application relates to the field of semiconductor technology and provides a pure water system and semiconductor device. The pure water system includes a water storage container for containing pure water, an inlet pipe connected to the top of the water storage container, an inlet valve disposed on the inlet pipe, a drain pipe connected to the bottom of the water storage container, a drain valve disposed on the drain pipe, a resistivity detection device connected to the drain pipe, and a controller. The resistivity detection device is used to detect the resistivity of the pure water flowing through the drain pipe. The controller is electrically connected to the inlet valve, the drain valve, and the resistivity detection device. The controller is configured to: when the resistivity detected by the resistivity detection device is greater than or equal to a preset threshold, control the drain valve to close and the inlet valve to open, so as to replenish pure water into the water storage container to a preset level; when the resistivity detected by the resistivity detection device is less than the preset threshold, control the drain valve to open to empty the pure water in the water storage container, and control the inlet valve to open to replenish pure water to a preset level.

Description

Technical Field

[0001] This application relates to the field of semiconductor technology, and more specifically, to a pure water system and semiconductor equipment. Background Technology

[0002] In the production process of photovoltaic semiconductors, a coating treatment is required on the product surface to passivate and protect the surface. The wet oxide film layer uses high-temperature water vapor to react with the silicon wafer, and an AL2O3 film is deposited on the surface using atomic layer deposition (ALD) equipment. This film requires two precursors, trimethylaluminium (TMA) and water, as reactants to grow a film of a certain thickness. The process is as follows: ultrapure nitrogen is introduced into TMA cylinders and water cylinders respectively. Under a heated environment (such as 50°C), saturated vapors of TMA and water are carried out and introduced into the process chamber to react chemically with the silicon wafer substrate. Therefore, the purity of deionized water becomes crucial.

[0003] In related technologies, deionized water with a resistivity greater than 18 MΩ is connected to a water storage container (such as a pure water cylinder). After filling the cylinder to a preset volume, the process consumes the remaining pure water in the cylinder. However, the pure water in the cylinder cannot be drained quickly, and it is impossible to detect whether the resistivity is up to standard. Furthermore, if there is a prolonged standby period during production, the resistivity of the pure water left in the cylinder decreases by 6 MΩ every 7 days. After 15 days, the tested resistivity drops to 7 MΩ, resulting in a 1000+ μs reduction in the passivation minority carrier lifetime of the solar cells and affecting the cell efficiency by 0.2%. Utility Model Content

[0004] Therefore, it is necessary to provide a pure water system and semiconductor device to solve the technical problem in the related technology that the resistivity in the water storage container cannot be detected, which leads to a decrease in the passivation minority carrier lifetime and efficiency of solar cells.

[0005] This application provides a pure water system. The pure water system includes a water storage container, an inlet pipe, an inlet valve, a drain pipe, a drain valve, a resistivity detection device, and a controller. The water storage container holds pure water. The inlet pipe is connected to the top of the water storage container. The inlet valve is located on the inlet pipe. The drain pipe is connected to the bottom of the water storage container. The drain valve is located on the drain pipe. The resistivity detection device is connected to the drain pipe and is used to detect the resistivity of the pure water flowing through the drain pipe. The controller is electrically connected to the inlet valve, the drain valve, and the resistivity detection device. The controller is configured to: when the resistivity detected by the resistivity detection device is greater than or equal to a preset threshold, control the drain valve to close and control the inlet valve to open to replenish pure water to a preset level in the water storage container; and when the resistivity detected by the resistivity detection device is less than the preset threshold, control the drain valve to open to drain the pure water from the water storage container and control the inlet valve to open to replenish pure water to a preset level.

[0006] In the pure water system of this application embodiment, the controller controls the opening and closing of the drain valve and the inlet valve based on the resistivity detection results of the resistivity detection device, thereby controlling the water replenishment to the water storage container: when the resistivity detected by the resistivity detection device is ≥ a preset threshold: the drain valve is closed, the inlet valve is opened, and water is replenished to the preset liquid level; when the resistivity detected by the resistivity detection device is < a preset threshold: the drain valve is opened to drain the water, and water is replenished to the preset liquid level. This achieves dynamic monitoring and management of the resistivity of the deionized water in the water storage container, ensuring that the purity of the deionized water used in semiconductor equipment (such as ALD equipment) applying this pure water system meets the requirements (e.g., resistivity ≥ 18 MΩ).

[0007] In addition, the automated water replenishment and drainage logic in the pure water system reduces manual intervention, improves production efficiency, and reduces the passivation minority carrier lifetime and efficiency loss of solar cells caused by water quality degradation.

[0008] In addition, the drainage design at the bottom of the water storage container solves the problem of pure water not being able to drain quickly in related technologies.

[0009] In some embodiments, the drain valve is disposed between the water storage container and the resistivity detection device. The controller is further configured to: perform resistivity detection of pure water at preset time intervals, and control the opening and closing of the drain valve and the inlet valve based on the resistivity detection results of the pure water, so as to maintain the resistivity of the pure water in the water storage container at the preset threshold.

[0010] In some embodiments, the resistivity detection device is disposed between the water storage container and the drain valve. The resistivity detection device is configured to detect the resistivity of the pure water flowing through the drain pipe in real time; the controller is configured to dynamically control the opening and closing of the drain valve and the inlet valve based on the resistivity detected in real time by the resistivity detection device, so as to ensure that the resistivity of the pure water in the water storage container is maintained greater than or equal to the preset threshold.

[0011] In some embodiments, the controller is further configured to: when the resistivity detected by the resistivity detection device is less than the preset threshold, control the inlet valve and the drain valve to open simultaneously for a preset duration to perform a rinsing operation on the water storage container; repeat the rinsing operation until the resistivity detection device detects that the resistivity is greater than or equal to the preset threshold; then close the drain valve and control the inlet valve to continue injecting pure water to the preset liquid level.

[0012] In some embodiments, the pure water system further includes a level detection device, which is disposed on the water storage container and used to detect the level of pure water in the water storage container; the level detection device is also connected to the controller, and when the level detection device detects that the level of pure water in the water storage container reaches the preset level, the controller controls the water inlet valve to close.

[0013] In some embodiments, the controller is further configured to: when the level detection device detects that the level of pure water in the water storage container is lower than 20% of the volume of the water storage container, control the water inlet valve to open to replenish water to the preset level, the preset level being in the range of 40% to 60% of the volume of the water storage container.

[0014] In some embodiments, the pure water system further includes a reverse osmosis filtration device disposed between the inlet valve and the water storage container, for performing secondary purification treatment on the pure water entering the water storage container to ensure that the resistivity of the injected pure water is greater than or equal to the preset threshold.

[0015] In some embodiments, the pure water system further includes an air inlet pipe and an air outlet pipe; the air inlet pipe is connected to the top of the water storage container for introducing carrier gas into the water storage container; and the air outlet pipe is connected to the top of the water storage container for discharging water vapor carried by the carrier gas.

[0016] In some embodiments, the pure water system further includes a handle disposed on top of the water storage container.

[0017] In some embodiments, the controller includes a comparison module and a control module, which are communicatively connected. The comparison module compares the resistivity detected by the resistivity detection device with the preset threshold. The control module controls the drain valve and the inlet valve such that: when the comparison module determines that the resistivity detected by the resistivity detection device is greater than or equal to the preset threshold, the control module receives a first signal sent by the comparison module and controls the drain valve to close and the inlet valve to open, thereby replenishing pure water to the water storage container to a preset level; and when the comparison module determines that the resistivity detected by the resistivity detection device is less than the preset threshold, the control module receives a second signal sent by the comparison module, controls the drain valve to open to drain the pure water in the water storage container, and controls the inlet valve to open to replenish pure water to the preset level.

[0018] A second aspect of this application provides a semiconductor device. The semiconductor device includes a source-carrying component, which includes the pure water system described in the first aspect of this application. Attached Figure Description

[0019] Figure 1 This is a schematic diagram of the structure of a pure water system according to an embodiment of this application.

[0020] Figure 2 This is a block diagram of a controller according to an embodiment of this application.

[0021] Explanation of key component symbols: The following detailed description, in conjunction with the accompanying drawings, will further illustrate this application. Detailed Implementation

[0022] The embodiments of this application are described in detail below. Examples of these embodiments are shown in the accompanying drawings, wherein the same or similar reference numerals denote the same or similar elements or elements having the same or similar functions throughout. The embodiments described below with reference to the accompanying drawings are exemplary and are only used to explain the embodiments of this application, and should not be construed as limiting this application.

[0023] like Figure 1 As shown, a pure water system 10 according to an embodiment of this application includes a water storage container 11, an inlet pipe 12, an inlet valve V1, a drain pipe 13, a drain valve V2, a resistivity detection device 14, and a controller 20 (shown in...). Figure 2 middle).

[0024] A water storage container 11 is used to hold pure water. An inlet pipe 12 is connected to the top of the water storage container 11. An inlet valve V1 is installed on the inlet pipe 12. A drain pipe 13 is connected to the bottom of the water storage container 11. A drain valve V2 is installed on the drain pipe 13. A resistivity detection device 14 is connected to the drain pipe 13 and is used to detect the resistivity of the pure water flowing through the drain pipe 13.

[0025] The controller 20 is electrically connected to the inlet valve V1, the drain valve V2, and the resistivity detection device 14. The controller 20 is configured to: when the resistivity detected by the resistivity detection device 14 is greater than or equal to a preset threshold, control the drain valve V2 to close and control the inlet valve V1 to open, so as to replenish pure water into the water storage container 11 to the preset liquid level; when the resistivity detected by the resistivity detection device 14 is less than the preset threshold, control the drain valve V2 to open to drain the pure water in the water storage container 11, and control the inlet valve V1 to open to replenish pure water to the preset liquid level.

[0026] In the pure water system 10 of this application embodiment, the controller 20 controls the opening and closing of the drain valve V2 and the inlet valve V1 based on the resistivity detection result of the resistivity detection device 14, thereby controlling the water replenishment to the water storage container 11: when the resistivity detected by the resistivity detection device 14 is ≥ a preset threshold: the drain valve V2 is closed, the inlet valve V1 is opened, and water is replenished to the preset level; when the resistivity detected by the resistivity detection device 14 is < a preset threshold: the drain valve V2 is opened to drain the water, and water is replenished to the preset level. Thus, dynamic monitoring and management of the resistivity of the deionized water in the water storage container 11 is achieved, ensuring that the purity of the deionized water used in semiconductor equipment (such as ALD equipment) applying this pure water system 10 meets the requirements (e.g., resistivity ≥ 18 MΩ).

[0027] In addition, the automated water replenishment and drainage logic in the pure water system 10 reduces manual intervention, improves production efficiency, and reduces the reduction in minority carrier lifetime and efficiency loss of battery cells due to water quality degradation.

[0028] In addition, the drainage design at the bottom of the water storage container 11 solves the problem that pure water in the water storage container 11 cannot be discharged quickly in related technologies.

[0029] In some embodiments, the water storage container 11 is a steel cylinder, but it is not limited to this.

[0030] In some embodiments, the preset threshold is 18 MΩ, but it is not limited to this. For example, depending on different process requirements, the preset resistivity threshold can also be 16 MΩ, 15 MΩ, etc.

[0031] In some embodiments, the inlet valve V1 is a pneumatic valve, but it is not limited to this.

[0032] In some embodiments, the drain valve V2 is a pneumatic valve, but it is not limited to this.

[0033] In some embodiments, controller 20 is a programmable logic controller, but is not limited thereto.

[0034] In some embodiments, such as Figure 2 As shown, the controller 20 includes a comparison module 21 and a control module 22. The comparison module 21 and the control module 22 are communicatively connected. The comparison module 21 compares the resistivity detected by the resistivity detection device 14 with a preset threshold. The control module 22 controls the drain valve V2 and the inlet valve V1, such that: when the comparison module 21 determines that the resistivity detected by the resistivity detection device 14 is greater than or equal to the preset threshold, the control module 22 receives a first signal sent by the comparison module 21 and controls the drain valve V2 to close and the inlet valve V1 to open, so as to replenish pure water into the water storage container 11 to a preset level; and when the comparison module 21 determines that the resistivity detected by the resistivity detection device 14 is less than the preset threshold, the control module 22 receives a second signal sent by the comparison module 21, controls the drain valve V2 to open to drain the pure water in the water storage container 11, and controls the inlet valve V1 to open to replenish pure water to a preset level.

[0035] In some embodiments, the drain valve V2 is disposed between the water storage container 11 and the resistivity detection device 14. The controller 20 is also configured to perform resistivity detection of pure water at preset time intervals, and control the opening and closing of the drain valve V2 and the inlet valve V1 based on the resistivity detection results of the pure water, so as to maintain the resistivity of the pure water in the water storage container 11 at a preset threshold.

[0036] In the above embodiments, periodically detecting the resistivity of the pure water in the water storage container 11 helps to address the water quality deterioration problem caused by prolonged standby of semiconductor equipment using the pure water system 10 (e.g., a resistivity decrease of 6 MΩ in 7 days and 7 MΩ in 15 days), reducing process defects caused by substandard water quality. Furthermore, timed detection reduces the resource consumption of real-time detection, making it suitable for scenarios with relatively stable production rhythms and lowering system operating costs.

[0037] In some embodiments, the preset time interval is 72 hours. Every 72 hours, the drain valve V2 is opened for approximately 5 seconds, and the resistivity is checked. If the resistivity does not meet the standard, the water storage container 11 is automatically emptied.

[0038] In other embodiments, the preset time interval is not limited to this. For example, the detection frequency can be dynamically adjusted according to the standby time or ambient temperature (e.g., high temperature environment accelerates the decrease of resistivity and shortens the detection interval).

[0039] In some embodiments, the controller 20 is further configured to: when the resistivity detected by the resistivity detection device 14 is less than a preset threshold, control the inlet valve V1 and the drain valve V2 to open simultaneously for a preset duration to perform a rinsing operation on the water storage container 11; repeat the rinsing operation until the resistivity detection device 14 detects a resistivity greater than or equal to the preset threshold; then close the drain valve V2 and control the inlet valve V1 to continue injecting pure water to the preset liquid level.

[0040] In some embodiments, when the comparison module 21 of the controller 20 determines that the resistivity detected by the resistivity detection device 14 is less than a preset threshold, the control module 22 receives the signal sent by the comparison module 21 and controls the inlet valve V1 and the drain valve V2 to open simultaneously for a preset time to perform a rinsing operation on the water storage container 11; the rinsing operation is repeated until the comparison module 21 determines that the resistivity detected by the resistivity detection device 14 is greater than or equal to the preset threshold, the control module 22 receives the signal sent by the comparison module 21 and controls the drain valve V2 to close, and controls the inlet valve V1 to remain open to continue injecting pure water to the preset liquid level.

[0041] In the above embodiments, the flushing operation helps remove contaminants (such as microorganisms and ion residues) from the water storage container 11 or pipelines, restoring the water quality to a qualified level. Automated flushing reduces the need for manual cleaning, lowers maintenance costs, and improves system reliability. It ensures that the water quality continuously meets the high purity requirements of semiconductor processes during long-term operation.

[0042] In some embodiments, the rinsing operation can be a rapid rinse (short time, high flow rate) or a deep rinse (multiple low flow rate cycles).

[0043] In some embodiments, performing a flushing operation on the water storage container 11 includes: opening the top inlet valve V1 for a preset time (e.g., 30 seconds) and the bottom drain valve V2 for a preset time (e.g., 60 seconds) to ensure that the pure water with substandard resistivity is completely drained.

[0044] In some embodiments, the resistivity detection device 14 is disposed between the water storage container 11 and the drain valve V2, and the portion of the drain pipe 13 between the resistivity detection device 14 and the water storage container 11 remains connected. The resistivity detection device 14 is configured to detect the resistivity of the pure water flowing through the drain pipe 13 in real time. The controller 20 is configured to dynamically control the opening and closing of the drain valve V2 and the inlet valve V1 based on the resistivity detected in real time by the resistivity detection device 14, to ensure that the resistivity of the pure water in the water storage container 11 remains greater than or equal to a preset threshold.

[0045] In the above embodiments, the resistivity of the pure water flowing through the drain pipe 13 is detected in real time by the resistivity detection device 14, which improves the accuracy of water quality monitoring. This is particularly suitable for high-precision ALD processes, ensuring the stability of process water for each batch. In addition, the controller 20 dynamically controls the opening and closing of the drain valve V2 and the inlet valve V1, reducing unnecessary drainage and water replenishment operations, avoiding process failures caused by sudden changes in water quality (such as pipe contamination), and ensuring cell efficiency.

[0046] In some embodiments, the pure water system 10 further includes a level detection device 15, which is mounted on the water storage container 11 and used to detect the level of pure water in the water storage container 11. The level detection device 15 is also connected to the controller 20. When the level detection device 15 detects that the level of pure water in the water storage container 11 has reached a preset level, the controller 20 controls the inlet valve V1 to close.

[0047] In some embodiments, when the liquid level detection device 15 detects that the liquid level of pure water in the water storage container 11 has reached the preset liquid level, the liquid level detection device 15 sends a signal to the controller 20, the control module 22 receives and processes the signal sent by the liquid level detection device 15, and controls the water inlet valve V1 to close.

[0048] In some embodiments, the preset liquid level is any point value within the range of 40% to 60% of the volume of the water storage container 11 (such as 40% to 45%, 45% to 50%, 50% to 55%, 55% to 60%, etc.).

[0049] In the above embodiments, the liquid level in the water storage container 11 is controlled by the liquid level detection device 15 (e.g., 60%) to avoid excessive water replenishment or insufficient liquid level, thus optimizing the stability of water vapor supply in the ALD process. The liquid level detection device 15 is linked with the controller 20 to improve the degree of automation and reduce the need for manual monitoring. In addition, the liquid level detection device 15 is linked with the controller 20 to ensure liquid level stability and prevent liquid level fluctuations from affecting the saturated vapor pressure of TMA and water, thereby affecting the membrane quality.

[0050] In some embodiments, the liquid level detection device 15 is a float-type liquid level detector, but it is not limited thereto.

[0051] In some embodiments, the liquid level detection device 15 is an ultrasonic liquid level detector or a laser liquid level detector.

[0052] In some embodiments, the controller 20 is further configured to: when the level detection device 15 detects that the level of pure water in the water storage container 11 is lower than 20% of the volume of the water storage container 11, control the water inlet valve V1 to open to replenish water to a preset level, the preset level being in the range of 40% to 60% of the volume of the water storage container 11.

[0053] In the above embodiments, the low-level water replenishment logic of the controller 20 (replenishing to the preset level when the level is below 20%) helps ensure that the water storage container 11 always has a sufficient supply of pure water, avoiding process interruptions. Furthermore, the preset level range (40% to 60%) flexibly adapts to different process requirements, balancing water quality stability and water conservation. In addition, automated water replenishment reduces manual operation and improves production continuity.

[0054] In some embodiments, the pure water system 10 further includes a reverse osmosis filter 16, which is disposed between the inlet valve V1 and the water storage container 11, and is used to perform secondary purification treatment on the pure water entering the water storage container 11 to ensure that the resistivity of the injected pure water is greater than or equal to a preset threshold.

[0055] In the above embodiments, the reverse osmosis filtration device 16 further improves the quality of the injected pure water, reduces the decrease in resistivity caused by water source pollution, which helps to reduce the probability of water quality deterioration in the water storage container 11, prolongs the storage time of pure water, reduces the frequency of drainage, and thus improves the stability of membrane quality in the ALD process and reduces the loss of cell efficiency.

[0056] In some embodiments, the pure water system 10 further includes an air inlet pipe 17 and an air outlet pipe 18. The air inlet pipe 17 is connected to the top of the water storage container 11 and is used to introduce carrier gas into the water storage container 11. The air outlet pipe 18 is connected to the top of the water storage container 11 and is used to discharge the water vapor carried by the carrier gas.

[0057] In the above embodiments, the inlet pipe 17 and the outlet pipe 18 ensure that the carrier gas (such as ultrapure nitrogen or inert gas) effectively carries TMA and water vapor to the process chamber to meet the requirements of the ALD process.

[0058] In some embodiments, the air outlet of the air inlet pipe 17 extends into the area near the bottom of the interior of the water storage container 11.

[0059] In some embodiments, the pure water system 10 also includes a handle 19. The handle 19 is located on top of the water storage container 11.

[0060] In the above embodiments, the handle 19 facilitates the movement and maintenance of the water storage container 11, improving the ease of operation of the equipment.

[0061] In some embodiments, the handle 19 is fixed to the top of the water storage container 11 and is in the shape of a ring or a semi-circle to facilitate gripping.

[0062] This application also provides a semiconductor device (not shown). The semiconductor device includes a source-carrying component, which includes the pure water system 10 of any of the above embodiments.

[0063] In some embodiments, the semiconductor device is an atomic layer deposition device, and the controller 20 can be a control panel for the atomic layer deposition device.

[0064] In some embodiments, the pure water system 10 can be applied to other semiconductor processes, such as diffusion and oxidation. The semiconductor equipment can also be a physical vapor deposition device, a boron diffusion device, an oxidation device, etc.

[0065] The pure water system 10 in the above embodiment, through structural optimization (such as adding a drain pipe 13, a drain valve V2, and a resistivity detection device 14 to the bottom of the water storage container 11), automated control (the controller 20 is linked with the inlet valve V1, the drain valve V2, and the resistivity detection device 14), and secondary purification (reverse osmosis filtration device 16), helps to solve the problems of decreased resistivity of pure water in the water storage container 11, inability to discharge quickly, and difficulty in detection in related technologies. It also helps to ensure the high purity requirements of deionized water in photovoltaic semiconductor processes (such as ALD processes), thereby improving the passivation minority carrier lifetime and efficiency of the solar cells.

[0066] Table 1 In some embodiments, the semiconductor device is an atomic layer deposition device. Compared with the operation of a conventional steel cylinder for 15 days in related technologies, the pure water system 10 of this application is compared in Table 1. As can be seen from Table 1, after cleaning and maintaining the pure water cylinder, the minority carrier lifetime and efficiency of the solar cell are significantly improved.

[0067] The above embodiments are only used to illustrate the technical solutions of this application and are not intended to limit it. Although this application has been described in detail with reference to the above preferred embodiments, those skilled in the art should understand that modifications or equivalent substitutions to the technical solutions of this application should not depart from the spirit and scope of the technical solutions of this application.

Claims

1. A pure water system, characterized in that, include: Water storage container for holding pure water; A water inlet pipe is connected to the top of the water storage container; The inlet valve is installed on the inlet pipe; A drain pipe is connected to the bottom of the water storage container; A drain valve is installed on the drain pipe; A resistivity detection device is connected to the drain pipe and is used to detect the resistivity of pure water flowing through the drain pipe. as well as The controller is electrically connected to the inlet valve, the drain valve, and the resistivity detection device, respectively, and the controller is configured to: When the resistivity detected by the resistivity detection device is greater than or equal to a preset threshold, the drain valve is controlled to close and the inlet valve is controlled to open, so as to replenish pure water to the water storage container to the preset liquid level. as well as When the resistivity detected by the resistivity detection device is less than the preset threshold, the drain valve is controlled to open to drain the pure water in the water storage container, and the inlet valve is controlled to open to replenish pure water to the preset liquid level.

2. The pure water system according to claim 1, characterized in that, The drain valve is located between the water storage container and the resistivity detection device; The controller is also configured to perform resistivity detection of pure water at preset time intervals, and control the opening and closing of the drain valve and the inlet valve based on the resistivity detection results of pure water, so as to maintain the resistivity of pure water in the water storage container at the preset threshold.

3. The pure water system according to claim 1, characterized in that, The resistivity detection device is disposed between the water storage container and the drain valve; The resistivity detection device is configured to detect the resistivity of pure water flowing through the drain pipe in real time. The controller is configured to dynamically control the opening and closing of the drain valve and the inlet valve based on the resistivity detected in real time by the resistivity detection device, so as to ensure that the resistivity of the pure water in the water storage container is maintained at or above the preset threshold.

4. The pure water system according to claim 1, characterized in that, The controller is also configured to: When the resistivity detected by the resistivity detection device is less than the preset threshold, the water inlet valve and the water outlet valve are controlled to open simultaneously for a preset time to perform a flushing operation on the water storage container. Repeat the rinsing operation until the resistivity detection device detects that the resistivity is greater than or equal to the preset threshold. Then close the drain valve and control the inlet valve to continue injecting pure water to the preset liquid level.

5. The pure water system according to any one of claims 1 to 4, characterized in that, The pure water system also includes a liquid level detection device, which is installed on the water storage container and is used to detect the liquid level of pure water in the water storage container. The liquid level detection device is also connected to the controller. When the liquid level detection device detects that the liquid level of pure water in the water storage container reaches the preset liquid level, the controller controls the water inlet valve to close.

6. The pure water system according to claim 5, characterized in that, The controller is also configured to control the water inlet valve to open when the liquid level detection device detects that the liquid level of pure water in the water storage container is lower than 20% of the volume of the water storage container, so as to replenish water to the preset liquid level, which is in the range of 40% to 60% of the volume of the water storage container.

7. The pure water system according to any one of claims 1 to 4, characterized in that, The pure water system also includes a reverse osmosis filtration device, which is disposed between the inlet valve and the water storage container. The reverse osmosis filtration device is used to perform secondary purification treatment on the pure water entering the water storage container to ensure that the resistivity of the injected pure water is greater than or equal to the preset threshold.

8. The pure water system according to any one of claims 1 to 4, characterized in that, The pure water system also includes an air inlet pipe and an air outlet pipe; The air inlet pipe is connected to the top of the water storage container and is used to introduce carrier gas into the water storage container. The vent pipe is connected to the top of the water storage container and is used to discharge the water vapor carried by the carrier gas.

9. The pure water system according to any one of claims 1 to 4, characterized in that, The controller includes a comparison module and a control module, and the comparison module and the control module are communicatively connected. The comparison module compares the resistivity detected by the resistivity detection device with the preset threshold value, and the control module controls the drain valve and the inlet valve so that: When the comparison module determines that the resistivity detected by the resistivity detection device is greater than or equal to a preset threshold, the control module receives the first signal sent by the comparison module and controls the drain valve to close and the inlet valve to open, so as to replenish pure water to the water storage container to the preset liquid level. as well as When the comparison module determines that the resistivity detected by the resistivity detection device is less than the preset threshold, the control module receives the second signal sent by the comparison module, controls the drain valve to open to drain the pure water in the water storage container, and controls the inlet valve to open to replenish pure water to the preset liquid level.

10. A semiconductor device, characterized in that, It includes a source-carrying component, which includes a pure water system according to any one of claims 1 to 9.

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