An inspection fixture for wafers and photomasks
By setting multi-size limiting grooves in the inspection fixture, the problem that existing fixtures can only inspect masks of a single size is solved, realizing the fixation and inspection of masks and wafers of different sizes and shapes, and improving the practicality and versatility of the inspection.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- SHENZHEN NEWWAY PHOTOMASK MAKING
- Filing Date
- 2025-08-29
- Publication Date
- 2026-07-31
AI Technical Summary
Existing mask fixtures typically can only inspect masks of one size and cannot inspect masks of other sizes or shapes, making it impossible to confirm the accuracy of the wafers manufactured by customers.
Two limiting grooves of different sizes were designed, including a first limiting groove and a second limiting groove, which are used to fix masks and wafers of different sizes. The first limiting groove is a square groove and the second limiting groove is a circular groove, which can accommodate the inspection and cleaning of square and circular masks and wafers.
It enables the fixation of masks and wafers of different sizes and shapes, avoiding displacement, facilitating inspection and cleaning, and has high practicality and versatility, enabling rapid response to customers' inspection needs.
Smart Images
Figure CN224580898U_ABST
Abstract
Description
Technical Field
[0001] This utility model relates to the field of semiconductor processing auxiliary tools technology, specifically to a testing fixture for wafers and photomasks. Background Technology
[0002] A photomask (also known as a chromium mask) is a pattern master used in photolithography. It is usually formed by creating a mask pattern structure on a transparent glass substrate with opaque metallic chromium, and then transferring the pattern information onto a wafer through an exposure process.
[0003] Semiconductor wafers are mainly made of silicon. Each wafer foundry will choose different wafer sizes depending on the type of exposure machine and its own process. Common sizes are 6-inch, 8-inch, and 12-inch wafers. The mask size is usually a 6-inch square mask. The circuit pattern on the 6-inch square mask is exposed onto the wafer through multiple transfers. In order to develop new products or improve production efficiency, wafer-shaped masks may also be used directly for processing, forming a pattern transfer.
[0004] Existing photomask manufacturers typically have photomask fixtures for inspecting 6-inch square wafers. However, if a customer's wafers have precision issues and need to be returned to the photomask manufacturer for confirmation, the photomask manufacturer does not have a corresponding mounting fixture, resulting in the inability to inspect the wafers. At the same time, there is no corresponding inspection fixture to use when making wafer masks. Utility Model Content
[0005] This invention aims to solve the technical problem that existing mask fixtures can only inspect masks of one size and cannot inspect masks of other sizes and shapes. The purpose is to provide an inspection fixture for wafers and masks, which is equipped with two first limiting grooves and second limiting grooves of different sizes. The two limiting grooves can respectively place masks and wafers of different sizes and shapes. It can match the inspection and cleaning of square masks, circular masks and wafer products, and has the advantages of strong practicality, high versatility and easy handling.
[0006] This utility model is achieved through the following technical solution.
[0007] The purpose of this invention is to provide an inspection fixture for wafers and photomasks, comprising:
[0008] Base
[0009] The first limiting groove is located inside the base and is used to fix a mask of a certain size.
[0010] The second limiting groove is located inside the base and above the first limiting groove, and is used to fix a mask and wafer of another size.
[0011] The testing fixture of this utility model has two limiting grooves of different sizes, namely the first limiting groove and the second limiting groove. The limiting grooves fix the placed mask and wafer to prevent displacement, which facilitates testing. The two limiting grooves can hold masks and wafers of different sizes and shapes respectively. The second limiting groove, which is located above, is larger than the first limiting groove, which is located below, making it more convenient to place masks and wafers of different sizes and shapes. It has the advantages of strong practicality, high versatility, and easy handling.
[0012] Furthermore, the second limiting groove is larger than the first limiting groove. Since the second limiting groove is above the first limiting groove, in order to facilitate the placement of the mask and wafer into the first limiting groove below, the second limiting groove is designed to be larger than the first limiting groove, making it easier for operators to perform operations.
[0013] Furthermore, the first limiting groove is a square groove. Since photomasks are mostly square, the first limiting groove facilitates the placement of the photomask; for example, a 6-inch square photomask can be placed there.
[0014] Furthermore, the first limiting groove is formed by multiple first pads and the first inner wall of the base. The base has a hollow interior forming an inner wall structure, and the square first limiting groove is formed by multiple first pads and the first inner wall of the base to form a receiving groove, which realizes the function of receiving the square mask, and the height of the first inner wall matches the thickness of the product placed thereon.
[0015] Furthermore, the first pad can be configured as a square pad or a fan-shaped pad.
[0016] Furthermore, at least four first pads are provided, and they are located at the four corners of the square groove. In this case, if square pads are used, two sides of the square pads are connected to the first limiting groove. If fan-shaped pads are used, the fan shape is 90°. In addition to providing first pads at the four corners, in order to increase the stability of placement, pads can also be provided on the four sides of the first limiting groove. In this case, if square pads are used, only one side of the square pads is connected to the first limiting groove. If fan-shaped pads are used, the fan shape is 180°.
[0017] Furthermore, the second limiting groove is a circular groove. This invention adds a circular groove to the original square groove, which can accommodate a circular mask or a circular wafer. For example, since there is currently a lack of corresponding fixtures for the inspection and cleaning of 8-inch circular masks and 8-inch wafer products, the fixture of this invention can match the inspection and cleaning of 8-inch circular masks and 8-inch wafer products. If the wafer produced by the customer has an accuracy problem and needs to be returned to the mask manufacturer for confirmation, the mask manufacturer can use this fixture to quickly respond to and solve the problem during on-machine inspection.
[0018] Furthermore, the second limiting groove is formed by multiple second pads and the second inner wall of the base. The circular second limiting groove is formed by multiple second pads and the first inner wall of the base to form a receiving groove, realizing the function of accommodating the circular mask and wafer; wherein, the second pads can be set to any shape, for example, in this utility model, they are set to a triangular shape, and the number is at least 4, so as to play a role in uniform bearing.
[0019] Furthermore, the fixture of this utility model also includes a pick-and-place slot provided on the base, which is connected to the first limiting slot and the second limiting slot. The connection between the pick-and-place slot and the first and second limiting slots facilitates the picking and placing of products.
[0020] Furthermore, two symmetrically arranged pick-and-place slots are provided.
[0021] Compared with the prior art, this utility model has the following advantages and beneficial effects.
[0022] 1. The testing fixture of this utility model is provided with two first limiting grooves and second limiting grooves of different sizes inside. The limiting grooves fix the placed mask and wafer to prevent displacement, which facilitates testing. The two limiting grooves can respectively place masks and wafers of different sizes and shapes. The second limiting groove located above is larger than the first limiting groove located below, which makes it more convenient to place masks and wafers of different sizes and shapes. It has the advantages of strong practicality, high versatility and easy handling.
[0023] 2. This utility model adds a circular slot to the original square slot, which can place a circular mask or a circular wafer. Since there is currently a lack of corresponding fixtures for the inspection and cleaning of circular masks and wafer products, the fixture of this invention can match the inspection and cleaning of circular masks and wafer products. If the wafer produced by the customer has an accuracy problem and needs to be returned to the mask manufacturer for confirmation, the mask manufacturer can use this fixture to quickly respond to and solve the problem. Attached Figure Description
[0024] The accompanying drawings, which are included to provide a further understanding of the embodiments of the present invention and form part of this application, do not constitute a limitation thereof. In the drawings:
[0025] Figure 1 This is a schematic diagram of the structure of this utility model;
[0026] Figure 2 for Figure 1 Enlarged view of part A in the middle;
[0027] Figure 3 This is a top view of the present invention;
[0028] Figure 4 for Figure 3 BB section view.
[0029] The attached diagram shows the markings and corresponding component names:
[0030] 1-Base, 2-First pad, 3-Second pad, 4-Placement slot, 5-First inner wall, 6-Second inner wall. Detailed Implementation
[0031] To make the objectives, technical solutions, and advantages of this utility model clearer, the present utility model will be further described in detail below with reference to the embodiments and accompanying drawings. The illustrative embodiments and descriptions of this utility model are only used to explain this utility model and are not intended to limit this utility model.
[0032] In the following description, numerous specific details are set forth in order to provide a thorough understanding of the present invention. However, it will be apparent to those skilled in the art that these specific details are not necessary to implement the present invention. In other embodiments, well-known structures, circuits, materials, or methods are not specifically described in order to avoid obscuring the present invention.
[0033] In the description of this utility model, the terms "one embodiment," "some embodiments," "illustrative embodiment," "example," "specific example," or "some examples," etc., refer to specific features, structures, materials, or characteristics described in connection with that embodiment or example, which are included in at least one embodiment or example of this utility model. In this specification, the illustrative expressions of the above terms do not necessarily refer to the same embodiment or example. Furthermore, the specific features, structures, materials, or characteristics described may be combined in any suitable manner in one or more embodiments or examples.
[0034] In the description of this utility model, "multiple" means one or more, "more than" means two or more, "greater than," "less than," and "exceeding" are understood to exclude the stated number, while "above," "below," and "within" are understood to include the stated number. If the terms "first" and "second" are used, they are only for distinguishing technical features and should not be construed as indicating or implying relative importance, or implicitly indicating the number of indicated technical features or the order of the indicated technical features.
[0035] In the description of this utility model, the indicated orientation or positional relationship is based on the orientation or positional relationship shown in the accompanying drawings, or the orientation or positional relationship that the product of this application is usually placed in when in use, or the orientation or positional relationship that is commonly understood by those skilled in the art. It is only for the convenience of describing this application and simplifying the description, and is not intended to indicate or imply that the device or component referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, it should not be construed as a limitation of this application.
[0036] Meanwhile, the terms "set up," "assemble," "connect," and "link" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral connection; they can refer to a direct connection or an indirect connection through an intermediate medium; and they can refer to the internal connection of two components. Those skilled in the art can understand the specific meaning of the above terms in this utility model based on the specific circumstances.
[0037] Example 1
[0038] This embodiment provides a testing fixture for wafers and photomasks, such as... Figures 1-4 As shown, it includes:
[0039] Base 1,
[0040] The first limiting groove is located inside the base 1 and is used to fix a mask of a certain size.
[0041] The second limiting groove is located inside the base 1 and above the first limiting groove, and is used to fix a mask and wafer of another size.
[0042] The testing fixture of this utility model has two limiting grooves of different sizes, namely the first limiting groove and the second limiting groove. The limiting grooves fix the placed mask and wafer to prevent displacement, which facilitates testing. The two limiting grooves can hold masks and wafers of different sizes and shapes respectively. The second limiting groove, which is located above, is larger than the first limiting groove, which is located below, making it more convenient to place masks and wafers of different sizes and shapes. It has the advantages of strong practicality, high versatility, and easy handling.
[0043] The second limiting groove is larger than the first limiting groove. Since the second limiting groove is located above the first limiting groove, its larger size facilitates the placement of the mask and wafer into the lower first limiting groove, making it easier for operators to perform the operation.
[0044] See Figure 1-4 The first limiting groove is a square groove. Since most photomasks are square, the first limiting groove facilitates the placement of the photomask; for example, a 6-inch square photomask can be placed there.
[0045] In one or more specific embodiments, the first limiting groove is formed by a plurality of first pads 2 and the first inner wall 5 of the base 1. The base 1 has a hollow interior forming an inner wall structure, and the square first limiting groove is formed by the plurality of first pads 2 and the first inner wall 5 of the base 1 to form a receiving groove, thereby accommodating a square mask, and the height of the first inner wall 5 matches the thickness of the product placed thereon.
[0046] The first pad 2 can be configured as a square pad or a sector-shaped pad, such as... Figure 2 As shown, this embodiment uses a square pad.
[0047] Among them, at least four first pads 2 are provided and are located at the four corners of the square groove. In this case, if square pads are used, two sides of the square pads are connected to the first limiting groove. If fan-shaped pads are used, the fan shape is 90°. In addition to providing first pads 2 at the four corners, in order to increase the stability of placement, pads can also be provided on the four sides of the first limiting groove. In this case, if square pads are used, only one side of the square pads is connected to the first limiting groove. If fan-shaped pads are used, the fan shape is 180°.
[0048] See Figure 1-4 The second limiting groove is a circular groove. This utility model adds a circular groove to the original square groove, which can place a circular mask or a circular wafer. For example, since there is currently a lack of corresponding fixtures for the inspection and cleaning of 8-inch circular masks and 8-inch wafer products, the fixture of this invention can match the inspection and cleaning of 8-inch circular masks and 8-inch wafer products. If the wafer produced by the customer has a precision problem and needs to be returned to the mask manufacturer for confirmation, the mask manufacturer can use this fixture to quickly respond to and solve the problem during on-machine inspection.
[0049] In one or more specific embodiments, the second limiting groove is formed by a plurality of second pads 3 and the second inner wall 6 of the base 1. The circular second limiting groove is formed by a plurality of second pads 3 and the first inner wall 5 of the base 1 to form a receiving groove, thereby accommodating the circular photomask and the wafer; wherein, the second pads 3 can be set to any shape, for example, in this utility model they are set to a triangular shape, and the number is at least 4, so as to play a role in uniform bearing.
[0050] See Figure 3 The fixture of this utility model also includes a pick-and-place slot 4 provided on the base 1. The pick-and-place slot 4 is connected to the first limiting slot and the second limiting slot, and two pick-and-place slots 4 are provided and arranged symmetrically on the left and right. The pick-and-place slot 4 is connected to the first limiting slot and the second limiting slot to facilitate the picking and placing of products.
[0051] Finally, it should be noted that the above specific embodiments are only used to describe the purpose, technical solution, and beneficial effects of this utility model in detail. It should be understood that the above description is only a specific implementation of this utility model and is not intended to limit the protection scope of this utility model. Although this utility model has been described in detail with reference to the foregoing specific embodiments, those skilled in the art should understand that modifications can still be made to the technical solutions described in the foregoing embodiments, or equivalent substitutions or improvements can be made to some or all of the technical features. These modifications, equivalent substitutions, and improvements do not cause the essence of the corresponding technical solutions to deviate from the scope of the technical solutions of the embodiments of this utility model, and they should all be covered within the scope of the claims and specification of this utility model.
Claims
1. A testing fixture for wafers and photomasks, characterized in that, include: Base (1), The first limiting groove is located inside the base (1) and is used to fix a mask of a certain size. The second limiting groove is located inside the base (1) and above the first limiting groove, and is used to fix a mask and wafer of another size.
2. The inspection fixture for wafers and photomasks according to claim 1, characterized in that, The second limiting groove is larger than the first limiting groove.
3. The inspection fixture for wafers and photomasks according to claim 1, characterized in that, The first limiting groove is a square groove.
4. A testing fixture for wafers and photomasks according to claim 3, characterized in that, The first limiting groove is formed by multiple first pads (2) and the first inner wall (5) of the base (1).
5. A testing fixture for wafers and photomasks according to claim 4, characterized in that, The first pad (2) is a square pad or a fan-shaped pad.
6. A testing fixture for wafers and photomasks according to claim 4, characterized in that, At least four first pads (2) are provided, and they are located at the four corners of the square groove.
7. A testing fixture for wafers and photomasks according to claim 1, characterized in that, The second limiting groove is a circular groove.
8. A testing fixture for wafers and photomasks according to claim 7, characterized in that, The second limiting groove is formed by multiple second pads (3) and the second inner wall (6) of the base (1).
9. A testing fixture for wafers and photomasks according to any one of claims 1-8, characterized in that, It also includes a pick-and-place slot (4) provided on the base (1), the pick-and-place slot (4) being connected to the first limiting slot and the second limiting slot.
10. A testing fixture for wafers and photomasks according to claim 9, characterized in that, The pick-and-place slots (4) are provided in two symmetrical configurations.