A clamping mechanism for surface processing of a MOCVD reaction cavity
By designing a clamping mechanism consisting of a worktable, a fixed upright plate, a transverse locking screw, and a longitudinal screw, the problem of insufficient clamping stability during MOCVD reaction chamber surface processing was solved, achieving higher stability and easier debris removal.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- NANTONG GAOMI PRECISION MASCH CO LTD
- Filing Date
- 2025-09-10
- Publication Date
- 2026-08-04
AI Technical Summary
The existing clamping mechanisms used for surface processing of MOCVD reaction chambers lack stability and are difficult to meet processing requirements.
A clamping mechanism including a worktable, a fixed upright plate, a transverse locking screw, a longitudinal screw, and a pressure plate is designed. Through the cooperation of the transverse limiting groove, the guide groove, and the pressure plate, the stability and position adjustment of the longitudinal screw are realized, and a chip removal channel is set to facilitate chip cleaning.
It improves the clamping stability and flexibility of the MOCVD reaction chamber, reduces the difficulty of cleaning up debris after processing, and enhances the applicability and ease of operation of the clamping mechanism.
Smart Images
Figure CN224587532U_ABST
Abstract
Description
Technical Field
[0001] This utility model relates to the field of clamping structure technology for machining centers, specifically a clamping mechanism for surface machining of MOCVD reaction chambers. Background Technology
[0002] The MOCVD reaction chamber is the core component of a metal-organic chemical vapor deposition (MOCVD) device, responsible for achieving the epitaxial growth of semiconductor thin films. It is typically made of stainless steel or quartz and lined with high-temperature ceramics (such as silicon carbide) to enhance corrosion resistance.
[0003] During the processing of the MOCVD reaction chamber, the outer surface needs to be cut, and holes need to be drilled in some places. Currently, the clamping mechanism used for surface processing of the MOCVD reaction chamber generally clamps the whole through several locking screws at the bottom. However, there is still room for improvement in the stability of this clamping structure. Therefore, an improved technology is urgently needed to solve this problem in the existing technology. Utility Model Content
[0004] The purpose of this invention is to provide a clamping mechanism for surface processing of MOCVD reaction chambers, so as to solve the problems mentioned in the background art.
[0005] To achieve the above objectives, this utility model provides the following technical solution: a clamping mechanism for surface processing of an MOCVD reaction chamber, comprising a worktable, a fixed vertical plate, a transverse locking screw, a longitudinal screw, and a pressure plate. The worktable has several transverse limiting grooves inside, and a guide groove is formed above the transverse limiting grooves. An inlet / outlet channel connects to the inner side of each transverse limiting groove, and the top of the inlet / outlet channel communicates with the outside of the worktable. A chip removal channel connects to the outer end of each transverse limiting groove, and the chip removal channel is obliquely oriented. The end of the chip removal channel away from the transverse limiting groove extends to the bottom of the worktable and communicates with the outside of the worktable. The workbench has several fixed upright plates at its outer end, each with several screw holes. A transverse locking screw engages with these screw holes. Several longitudinal screws correspond one-to-one with transverse limiting grooves. One end of each longitudinal screw has an external hexagonal head, which is movably positioned within the corresponding transverse limiting groove. The longitudinal screw slides within a corresponding guide groove. A pressure plate has several transverse through grooves, each corresponding to a longitudinal screw. The longitudinal screw passes through the corresponding transverse through groove. A locking nut is connected to each longitudinal screw and presses against the upper surface of the pressure plate.
[0006] Preferably, the present invention provides a clamping mechanism for surface processing of an MOCVD reaction chamber, wherein an extension groove is provided inside the worktable and at the outer end of the transverse limiting groove, and the outer end of the extension groove is connected to the outside of the worktable.
[0007] Preferably, the present invention provides a clamping mechanism for surface processing of an MOCVD reaction chamber, wherein the fixed upright plate is fastened to the side wall of the worktable by bolts.
[0008] Preferably, the present invention provides a clamping mechanism for surface processing of an MOCVD reaction chamber, wherein the outer end of the transverse locking screw is provided with an internal hexagonal head, and a transverse pressure block is sleeved on the inner side of the transverse locking screw, and the transverse pressure block is fastened to the transverse locking screw by bolts.
[0009] Preferably, the present invention provides a clamping mechanism for surface processing of an MOCVD reaction chamber, wherein the width of the external hexagonal head matches the width of the transverse limiting groove, and the outer diameter of the external hexagonal head is smaller than the inner diameter of the inlet / outlet channel.
[0010] Preferably, the present invention provides a clamping mechanism for surface processing of an MOCVD reaction chamber, wherein the upper surface of the pressure plate is provided with a handle.
[0011] Preferably, the present invention provides a clamping mechanism for surface processing of an MOCVD reaction chamber, wherein a plurality of longitudinal clamping blocks are provided on the periphery of the lower surface of the pressure plate.
[0012] Compared with the prior art, the beneficial effects of this utility model are:
[0013] (1) The worktable is provided with several transverse limiting grooves. A guide groove is provided above the transverse limiting groove. The longitudinal screw is engaged with the guide groove. The outer hexagonal head at the bottom of the longitudinal screw is engaged with the transverse limiting groove. When the MOCVD reaction chamber is inverted and supported on the worktable, the longitudinal screw passes through the inner cavity and bottom surface of the MOCVD reaction chamber. The pressure plate is engaged with each longitudinal screw through the transverse through groove, thereby ensuring the stability of each longitudinal screw and thus ensuring the stability of the MOCVD reaction chamber after clamping. At the same time, the bottom is also engaged with the transverse locking screw to further improve the stability of the MOCVD reaction chamber after clamping.
[0014] (2) By cooperating with the transverse limiting groove and guide groove of the worktable and the transverse through groove of the pressure plate, the position of the longitudinal screw can be adjusted, so that the position of each longitudinal screw can be flexibly adjusted according to the size of the through hole at the bottom of the MOCVD reaction chamber, greatly improving the flexibility and applicability.
[0015] (3) The outer end of the transverse limiting groove is connected to the discharge channel. When the processing is completed, if the debris on the surface of the workbench falls into the transverse limiting groove from the guide groove, the debris can be discharged through the discharge channel, reducing the cleaning difficulty in the transverse limiting groove. Attached Figure Description
[0016] Figure 1 This is a schematic diagram of the cross-sectional structure of the present invention;
[0017] Figure 2 This is a top view of the workbench structure.
[0018] Figure 3 This is a top view of the pressure plate structure.
[0019] In the diagram: 1. Workbench; 2. Fixed upright plate; 3. Horizontal locking screw; 4. Vertical screw; 5. Horizontal limiting groove; 6. Guide groove; 7. Inlet / outlet channel; 8. Chip removal channel; 9. External hexagonal head; 10. Pressure plate; 11. Horizontal through groove; 12. Locking nut; 13. Extension groove; 14. Internal hexagonal head; 15. Horizontal pressure block; 16. Handle; 17. Vertical pressure block. Detailed Implementation
[0020] The technical solution of this utility model will be clearly and completely described below with reference to the accompanying drawings of the embodiments. Obviously, the described embodiments are only some embodiments of this utility model, and not all embodiments. Based on the embodiments of this utility model, all other embodiments obtained by those skilled in the art without creative effort are within the protection scope of this utility model.
[0021] It should be noted that in the description of this utility model, the terms "inner", "outer", "upper", "lower", "both sides", "one end", "the other end", "left", "right", etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. They are only for the convenience of describing this utility model and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on this utility model.
[0022] Please see Figure 1-3This utility model provides a technical solution: a clamping mechanism for surface processing of an MOCVD reaction chamber, including a worktable 1, a fixed vertical plate 2, a transverse locking screw 3, a longitudinal screw 4, and a pressure plate 10. The worktable 1 has several transverse limiting grooves 5 inside. A guide groove 6 is provided above the transverse limiting grooves 5 on the worktable 1. An inlet / outlet channel 7 is connected to the inner side of the transverse limiting grooves 5, and the top of the inlet / outlet channel 7 is connected to the outside of the worktable 1. A chip removal channel 8 is connected to the outer end of the transverse limiting grooves 5. The chip removal channel 8 is obliquely oriented, and one end of the chip removal channel 8, away from the transverse limiting grooves 5, extends to the bottom of the worktable 1 and is connected to the outside of the worktable 1. An extension groove 13 is provided inside the worktable 1 at the outer end of the transverse limiting grooves 5. The outer end of the groove 13 is connected to the outside of the workbench 1. The extension groove 13 is used to open the transverse limiting groove 5 and to reserve the extension groove 13 so that it can be easily cleared if the transverse limiting groove 5 is blocked. Several fixed upright plates 2 are provided at the outer end of the workbench 1. The fixed upright plates 2 are fastened to the side wall of the workbench 1 by bolts to realize the connection and disassembly of the fixed upright plates 2 and the workbench. Several screw holes are opened on the fixed upright plates 2. The transverse locking screw 3 is engaged with the screw holes. The outer end of the transverse locking screw 3 is provided with an internal hexagon head 14 to facilitate the rotation of the transverse locking screw 3. Of course, an external hexagon head can also be used here. A transverse pressure block is sleeved on the inner side of the transverse locking screw 3. 15. The transverse pressure block 15 is fastened to the transverse locking screw 3 by bolts. The transverse pressure block 15 cooperates with the side wall of the MOCVD reaction chamber to avoid damage to the surface of the MOCVD reaction chamber caused by direct pressing with the screw. There are several longitudinal screws 4, each corresponding to a transverse limiting groove 5. One end of the longitudinal screw 4 is provided with an external hexagonal head 9, which is movably set in the corresponding transverse limiting groove 5. The longitudinal screw 4 is slidably set in the corresponding guide groove 6. The width of the external hexagonal head 9 matches the width of the transverse limiting groove 5 to prevent the external hexagonal head 9 from rotating within the transverse limiting groove 5, thereby ensuring the normal connection between the locking nut 12 and the longitudinal screw 3. The outer diameter of the external hexagonal head 9 is smaller than the inner diameter of the inlet / outlet channel 7. To ensure that the external hexagonal head 9 can smoothly enter the transverse limiting groove 5 from the inlet / outlet channel 7, the pressure plate 10 is provided with several transverse through grooves 11. The transverse through grooves 11 of the pressure plate 10 correspond one-to-one with the longitudinal screws 4. The longitudinal screws 4 pass through the corresponding transverse through grooves 11. The longitudinal screws 4 are connected with locking nuts 12. The locking nuts 12 are pressed on the upper surface of the pressure plate 10. The width of the transverse through grooves 11 matches the diameter of the longitudinal screws 4 to ensure that the locking nuts 12 can be pressed smoothly on the pressure plate 10. The upper surface of the pressure plate 10 is provided with a handle 16 for easy lifting of the pressure plate 10. Several longitudinal pressing blocks 17 are provided on the periphery of the lower surface of the pressure plate 10 to better press the MOCVD reaction chamber.
[0023] Usage and Principle: First, process the workbench 1. Extending grooves 13 and transverse limiting grooves 5 are formed from the outer end of the workbench 1 inwards. Then, entry / exit channels 7 are formed at the inner end of each transverse limiting groove 5. Next, guide grooves 6 are formed above each transverse limiting groove 5. Simultaneously, chip removal channels 8 are formed obliquely at the junction of the transverse limiting grooves 5 and the extending grooves 13. Then, the fixed upright plate 2 is bolted to the outer surface of the workbench 1. The transverse locking screw 3 is then threaded into the threaded hole of the fixed upright plate 2. The transverse pressure block 15 is then sleeved onto the end of the transverse locking screw 3 and fastened with bolts. The hexagonal head 9 at the bottom of the longitudinal screw 4 is inserted into the entry / exit channel 7. Then, it is moved laterally so that the hexagonal head 9 enters the transverse limiting groove 5. At this time, the longitudinal screw 4 slides into the guide groove 6. After the MOCVD reaction chamber is lifted by a crane and an electric hoist, it is inverted and placed on the workbench 1. At the same time, the longitudinal screw 4 passes through the inner cavity of the MOCVD reaction chamber. Then, with the cooperation of the fixed vertical plate 2 and the transverse locking screw 3, the transverse pressure block 15 is pressed against the side wall of the MOCVD reaction chamber. Then, the transverse through slots 11 of the pressure plate 10 are engaged with the longitudinal screw 4, and the pressure plate 10 is placed at the top of the MOCVD reaction chamber. The locking nut 12 is engaged with each longitudinal screw 4 until the locking nut 12 is pressed against the upper surface of the pressure plate 10, thereby pressing the pressure plate 10 against the top of the MOCVD reaction chamber, completing the clamping and fixing of the MOCVD reaction chamber. This utility model has a reasonable structure. The worktable 1 is provided with several transverse limiting grooves 5, and a guide groove 6 is provided above the transverse limiting grooves 5. The longitudinal screw 4 cooperates with the guide groove 6, and the hexagonal head 9 at the bottom of the longitudinal screw 4 cooperates with the transverse limiting grooves 5. When the MOCVD reaction chamber is inverted and supported on the worktable 1, the longitudinal screw 4 passes through the inner cavity and bottom surface of the MOCVD reaction chamber (because it is inverted, the bottom surface is at the top at this time), and the pressure plate 10 cooperates with each longitudinal screw 4 through the transverse through groove 11, thereby ensuring the stability of each longitudinal screw 4, and thus ensuring the stability of the MOCVD reaction chamber after clamping. At the same time, the bottom is also connected by a transverse through groove 11. The locking screw 3 further improves the stability of the MOCVD reaction chamber after clamping. Through the cooperation of the transverse limiting groove 5, guide groove 6 and transverse through groove 11 of the pressure plate 10, the position of the longitudinal screw 4 can be adjusted. Thus, the position of each longitudinal screw 4 can be flexibly adjusted according to the size of the through hole on the bottom surface of the MOCVD reaction chamber, greatly improving the flexibility and applicability. The outer end of the transverse limiting groove 5 is connected to the chip removal channel 8. When the processing is completed, if the chips on the surface of the worktable 1 fall into the transverse limiting groove 5 from the guide groove 6, the chips can be easily discharged through the chip removal channel 8, reducing the cleaning difficulty in the transverse limiting groove 5.
[0024] Any aspects of this utility model not described in detail are well-known technologies to those skilled in the art.
[0025] Finally, it should be noted that the above specific embodiments are only used to illustrate the technical solution of this utility model and not to limit it. Although this utility model has been described in detail with reference to the embodiments, those skilled in the art should understand that modifications and equivalent substitutions can be made to the technical solution of this utility model without departing from the spirit and scope of the technical solution of this utility model, and all such modifications and substitutions should be covered within the scope of the claims of this utility model.
Claims
1. A clamping mechanism for surface processing of an MOCVD reaction chamber, characterized in that: The system includes a workbench (1), a fixed upright plate (2), a transverse locking screw (3), a longitudinal screw (4), and a pressure plate (10). The workbench (1) has several transverse limiting grooves (5) inside. A guide groove (6) is provided above the transverse limiting grooves (5). An inlet / outlet channel (7) is connected to the inner side of the transverse limiting grooves (5). The top of the inlet / outlet channel (7) is connected to the outside of the workbench (1). A chip removal channel (8) is connected to the outer end of the transverse limiting grooves (5). The chip removal channel (8) is obliquely oriented, extending from the end away from the transverse limiting grooves (5) to the bottom of the workbench (1) and connecting to the outside of the workbench (1). Several fixed upright plates (2) are provided at the outer end of the workbench (1). The upright plate (2) has several screw holes. The transverse locking screw (3) is engaged with the screw holes. There are several longitudinal screws (4) that correspond one-to-one with the transverse limiting grooves (5). One end of the longitudinal screw (4) is provided with an external hexagonal head (9). The external hexagonal head (9) is movably disposed in the corresponding transverse limiting groove (5). The longitudinal screw (4) is slidably disposed in the corresponding guide groove (6). The pressure plate (10) has several transverse through grooves (11). The transverse through grooves (11) of the pressure plate (10) correspond one-to-one with the guide grooves (6). The longitudinal screw (4) passes through the corresponding transverse through grooves (11). The longitudinal screw (4) is engaged with a locking nut (12). The locking nut (12) is pressed against the upper surface of the pressure plate (10).
2. The clamping mechanism for processing the surface of a MOCVD reaction chamber according to claim 1, wherein: An extension groove (13) is provided inside the workbench (1) and at the outer end of the transverse limiting groove (5). The outer end of the extension groove (13) is connected to the outside of the workbench (1).
3. The clamping mechanism for processing the surface of a MOCVD reaction chamber according to claim 1, wherein: The fixed upright plate (2) is fastened to the side wall of the workbench (1) by bolts.
4. The clamping mechanism for processing the surface of a MOCVD reaction chamber according to claim 1, wherein: The outer end of the transverse locking screw (3) is provided with an internal hexagon head (14), and the inner side of the transverse locking screw (3) is provided with a transverse pressure block (15). The transverse pressure block (15) is fastened to the transverse locking screw (3) by bolts.
5. The clamping mechanism for processing the surface of a MOCVD reaction chamber according to claim 1, wherein: The width of the external hexagonal head (9) matches the width of the transverse limiting groove (5), and the outer diameter of the external hexagonal head (9) is smaller than the inner diameter of the inlet / outlet channel (7).
6. The clamping mechanism for processing the surface of a MOCVD reaction chamber according to claim 1, wherein: A handle (16) is provided on the upper surface of the pressure plate (10).
7. The clamping mechanism for processing the surface of a MOCVD reaction chamber according to claim 1, wherein: The lower surface of the pressure plate (10) is provided with several longitudinal pressure blocks (17).