A three-axis spiral scanning device

By using a three-axis spiral scanning device, combined with the coordinated control of X, Z, and T axis motion platforms and sensors, the problems of high cost and slow scanning speed of wafer inspection equipment have been solved, achieving efficient and low-cost wafer inspection.

CN224592994UActive Publication Date: 2026-08-04WUXI ZHAOLAN TECHNOLOGY CO LTD
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
WUXI ZHAOLAN TECHNOLOGY CO LTD
Filing Date
2025-10-13
Publication Date
2026-08-04

AI Technical Summary

Technical Problem

Existing wafer inspection equipment is expensive and slow, making it difficult to meet the growing and diverse inspection needs.

Method used

A three-axis spiral scanning device is adopted, including an X-axis motion platform, a Z-axis motion platform, a T-axis motion platform and sensors. Through coordinated control of the control system, precise scanning of the wafer is achieved, reducing the dependence on a high-precision sample stage, and the spiral scanning method is used to improve the scanning speed.

Benefits of technology

It reduces equipment costs, increases scanning speed, and enables efficient inspection of wafers, allowing for the scanning of complex samples in a shorter time.

✦ Generated by Eureka AI based on patent content.

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Abstract

The utility model discloses a kind of three-axis spiral scanning devices, it is related to wafer automatic detection equipment technical field, including X motion platform, Z axis motion platform, T axis motion platform, sensor and control system, the upper end of X motion platform is provided with Z axis motion platform, the upper end of Z axis motion platform is provided with T axis motion platform, the upper of T axis motion platform is provided with sensor, X motion platform, Z axis motion platform, T axis motion platform and sensor are connected with control system respectively.Three-axis spiral scanning device does not depend on expensive sample table of ±0.1nm level high-precision positioning in such as elliptical polarization method equipment, through the mutual cooperation of X motion platform, Z axis motion platform, T axis motion platform and sensor, the accurate scanning to sample can be realized, the dependence on single high-precision sample table is reduced, so as to greatly reduce equipment cost.
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Description

Technical Field

[0001] This utility model relates to the field of automatic wafer inspection equipment technology, and in particular to a three-axis spiral scanning device. Background Technology

[0002] Currently, wafer inspection mainly uses two common types of equipment: elliptic polarization detection equipment and electron beam detection equipment.

[0003] The elliptic polarization method (ELP) apparatus consists of a marble base and a vacuum adsorption sample stage, which must possess a high-precision positioning capability of ±0.1 nm. The light source system and analyzer are integrated into a cantilever bracket, and the optical module is rigidly fixed to the sample stage, with fine-tuning of the sample achieved via air bearings. The process involves step-by-step thickness measurement, i.e., changing the light source to different wavelengths, incident the beam on the sample, detecting the reflected light, and then using an iterative algorithm to fit the sample thickness. However, this apparatus relies on a high-cost sample stage with extremely stringent precision requirements, needing to achieve a positioning accuracy of ±0.1 nm, which undoubtedly significantly increases the equipment cost.

[0004] The electron beam detection equipment consists of a magnetically levitated sample stage and a vacuum chamber, and needs to maintain a 10- 5 The device operates in a Pa-level vacuum environment with the electron gun and detector coaxially aligned. The electron optics system and vacuum pump assembly are connected via a sealed flange. The motion control system is independently powered, and the magnetically levitated sample stage is connected to the controller via an electromagnetic coil for contactless levitation. Its workflow involves the electron beam scanning the sample point-by-point, followed by data acquisition and in-depth analysis by the signal detector. However, single-wafer inspection takes more than 30 minutes. The main problem with this equipment is its slow scanning speed, as the electron beam needs to acquire signals point-by-point, and the vacuum environment limits the application of parallel scanning methods. Furthermore, its high cost—over $500,000 per unit for the vacuum system and magnetic levitation components—poses a significant financial burden for many companies when purchasing the equipment.

[0005] This shows that existing scanning and inspection equipment suffers from high costs and slow speeds, making it difficult to meet the ever-increasing and diverse inspection needs. Therefore, there is an urgent need for a scanning device that is lower in cost and faster in speed. Utility Model Content

[0006] The purpose of this invention is to provide a three-axis helical scanning device to solve the above-mentioned technical problems.

[0007] The technical solution adopted in this utility model is as follows:

[0008] A three-axis helical scanning device includes an X-axis motion platform, a Z-axis motion platform, a T-axis motion platform, a sensor, and a control system. The Z-axis motion platform is located at the upper end of the X-axis motion platform, the T-axis motion platform is located at the upper end of the Z-axis motion platform, and the sensor is located above the T-axis motion platform. The X-axis motion platform, the Z-axis motion platform, the T-axis motion platform, and the sensor are all connected to the control system.

[0009] Preferably, the X-motion platform includes an upper end plate, a base plate, a first linear motor, and a first cross roller guide rail. The upper end plate is slidably connected to the upper end of the base plate via the first cross roller guide rail. The first linear motor is provided at the upper end of the base plate, and the first linear motor connects the base plate and the upper end plate.

[0010] As a further preferred embodiment, the system also includes a first grating ruler and a first reading head. The upper end of the base plate is provided with a first boss, the first grating ruler is installed on one side of the first boss, and the first reading head is installed on the lower end of the upper plate and is directly opposite the first grating ruler.

[0011] As a further preferred embodiment, the Z-axis motion platform includes a base plate, a middle plate, an upper plate, a second linear motor, a second cross roller guide, and a third cross roller guide. The upper end of the base plate is slidably connected to the middle plate via the second cross roller guide, and the upper end of the middle plate is slidably connected to the upper plate via the third cross roller guide. The upper end of the base plate is provided with the second linear motor, which connects the base plate and the middle plate. The base plate is connected to the upper plate.

[0012] The middle plate and the upper plate are fitted together by an inclined surface. The upper end of the middle plate is provided with a first wedge-shaped surface, and the lower end of the upper plate is provided with a second wedge-shaped surface. The first wedge-shaped surface and the second wedge-shaped surface are fitted together.

[0013] As a further preferred embodiment, the system also includes a second grating ruler and a second reading head. The second grating ruler is disposed on one side of the middle plate, and a groove is formed on one side of the substrate. The second reading head is disposed in the groove.

[0014] As a further preferred embodiment, the system also includes a cylinder, wherein the cylinder is disposed on the upper end of the base plate on one side of the second linear motor, and the output end of the cylinder is connected to the lower end of the middle plate.

[0015] As a further preferred embodiment, the substrate also includes side plates and spring steel sheets. Two side plates are provided on both sides of the substrate, and a spring steel sheet is provided on each side plate, with the spring steel sheet connected to the upper plate.

[0016] As a further preferred embodiment, the T-axis motion platform includes a main spindle, a bearing housing, a motor housing, a turntable adapter plate, a table panel, a rotary motor, a vacuum suction disk, and a turntable loading disk. The turntable adapter plate is disposed on the upper end of the upper plate, and the motor housing is disposed on the upper end of the turntable adapter plate. The rotary motor is disposed inside the motor housing, and the main spindle is also disposed inside the motor housing. The bearing housing is disposed on the upper outer edge of the main spindle, and the lower end of the main spindle is connected to the output end of the rotary motor. The table panel is disposed on the upper end of the main spindle, and the turntable loading disk is disposed on the upper end of the table panel. The vacuum suction disk is disposed on the upper end of the turntable loading disk.

[0017] A convex ring is provided on the outer edge of the middle part of the main shaft, and an annular air film mating ring is formed between the lower end of the bearing seat and the upper end of the convex ring.

[0018] As a further preferred embodiment, it also includes an incremental encoder and a slip ring. The grating ruler mounting base is disposed on the lower outer edge of the main shaft. The slip ring is disposed inside the main shaft. The lower end of the slip ring is threadedly connected to the turntable adapter plate. The upper end of the slip ring is connected to the turntable loading plate and communicates with the interior of the turntable loading plate. The interior of the turntable loading plate communicates with the interior of the vacuum adsorption plate.

[0019] Preferably, the control system includes a motion controller, an X-axis controller, a Z-axis controller, and a T-axis controller. The X-axis controller, the Z-axis controller, the T-axis controller, and the sensor are respectively connected to the motion controller. The X-axis controller is connected to the X-axis motion platform, the Z-axis controller is connected to the Z-axis motion platform, and the T-axis controller is connected to the T-axis motion platform.

[0020] The above technical solution has the following advantages or beneficial effects:

[0021] (1) In this utility model, the triaxial spiral scanning device does not rely on the expensive sample stage with high-precision positioning of ±0.1nm in elliptic polarization equipment. Through the cooperation of the X-axis motion platform, Z-axis motion platform, T-axis motion platform and sensor, it can achieve accurate scanning of the sample, reducing the dependence on a single high-precision sample stage, thereby greatly reducing the equipment cost.

[0022] (2) In this utility model, the spiral scanning method is achieved through the cooperation of the X-axis motion platform, the Z-axis motion platform, the T-axis motion platform and the sensor. Compared with the point-by-point scanning method of the electron beam detection device, the scanning speed is greatly improved. Attached Figure Description

[0023] Figure 1 This is a perspective view of the triaxial spiral scanning device in this utility model;

[0024] Figure 2 This is a perspective view of the X-motion platform in this utility model;

[0025] Figure 3 This is a side view of the X-motion platform in this utility model;

[0026] Figure 4 This is a perspective view of the Z-axis motion platform in this utility model;

[0027] Figure 5 This is a side view of the Z-axis motion platform in this utility model;

[0028] Figure 6 This utility model is a three-dimensional T-axis motion platform. Figure 1 ;

[0029] Figure 7 This is a schematic diagram of the bottom structure of the T-axis motion platform in this utility model;

[0030] Figure 8 This utility model is a three-dimensional T-axis motion platform. Figure 2 ;

[0031] Figure 9 This is a schematic diagram of the internal structure of the T-axis motion platform in this utility model;

[0032] Figure 10 This is a test diagram of the axial runout of the Z-axis motion platform in this utility model;

[0033] Figure 11 This is the speed feedback curve diagram in this utility model.

[0034] In the diagram: 1. X-axis motion platform; 101. Upper plate; 102. Base plate; 103. First linear motor; 104. First crossed roller guide; 105. First grating ruler; 106. First reading head; 2. Z-axis motion platform; 201. Base plate; 202. Middle plate; 203. Upper plate; 204. Second linear motor; 205. Second crossed roller guide; 206. Third crossed roller guide; 207. Second grating ruler; 208. Second reading head; 209. Cylinder 210. Side plate; 211. Spring steel sheet; 3. T-axis motion platform; 301. Main spindle; 302. Bearing housing; 303. Motor housing; 304. Turntable adapter plate; 305. Tabletop; 306. Rotary motor; 307. Vacuum adsorption plate; 308. Turntable loading plate; 309. Convex ring; 310. Incremental encoder; 311. Air slip ring; 312. Grating ruler mounting base; 313. Reading head cover plate; 314. Iron core pressure block; 315. Adjusting copper screw. Detailed Implementation

[0035] The technical solution of this utility model will now be clearly and completely described with reference to the accompanying drawings. Obviously, the described embodiments are only some, not all, of the embodiments of this utility model. Based on the embodiments of this utility model, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of this utility model.

[0036] In the description of this utility model, it should be noted that the terms "center," "upper," "lower," "left," "right," "vertical," "horizontal," "inner," and "outer," etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. They are used only for the convenience of describing this utility model and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on this utility model. Furthermore, the terms "first," "second," and "third" are used for descriptive purposes only and should not be construed as indicating or implying relative importance.

[0037] In the description of this utility model, it should be noted that, unless otherwise explicitly specified and limited, the terms "installation," "connection," and "joining" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral connection; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; and they can refer to the internal connection of two components. Those skilled in the art can understand the specific meaning of the above terms in this utility model based on the specific circumstances.

[0038] Figure 1 This is a perspective view of the triaxial spiral scanning device in this utility model; Figure 2 This is a perspective view of the X-motion platform in this utility model; Figure 3 This is a side view of the X-motion platform in this utility model; Figure 4 This is a perspective view of the Z-axis motion platform in this utility model; Figure 5 This is a side view of the Z-axis motion platform in this utility model; Figure 6 This utility model is a three-dimensional T-axis motion platform. Figure 1 ; Figure 7 This is a schematic diagram of the bottom structure of the T-axis motion platform in this utility model; Figure 8 This utility model is a three-dimensional T-axis motion platform. Figure 2 ; Figure 9 This is a schematic diagram of the internal structure of the T-axis motion platform in this utility model; Figure 10 This is a test diagram of the axial runout of the Z-axis motion platform in this utility model; Figure 11 This is the speed feedback curve diagram in this utility model. Please refer to [link / reference]. Figures 1 to 11As shown, a preferred embodiment is illustrated, illustrating a three-axis helical scanning device, including an X-axis motion platform 1, a Z-axis motion platform 2, a T-axis motion platform 3, a sensor, and a control system. The Z-axis motion platform 2 is disposed at the upper end of the X-axis motion platform 1, and the T-axis motion platform 3 is disposed at the upper end of the Z-axis motion platform 2. The sensor is disposed above the T-axis motion platform 3. The X-axis motion platform 1, Z-axis motion platform 2, T-axis motion platform 3, and the sensor are respectively connected to the control system.

[0039] In this embodiment, the X-axis motion platform 1, Z-axis motion platform 2, and T-axis motion platform 3 are controlled by the control system to move the wafer along a planned path, enabling precise scanning of the wafer sample. This reduces reliance on a single high-precision sample stage, thereby significantly lowering equipment costs. Furthermore, this device configuration enables helical scanning, which greatly improves scanning speed compared to the point-by-point scanning method of electron beam detection equipment.

[0040] The control system can flexibly plan the scanning path according to the shape of the sample and the detection requirements. By optimizing the scanning path, the invalid movement time during the scanning process is reduced, further improving the scanning speed and enabling the equipment to complete the scanning of complex samples in a shorter time.

[0041] In this embodiment, the sensor is a displacement-camera integrated sensor, located directly above the center of the wafer being inspected, with its probe vertically aligned with the wafer surface. Through a built-in laser projection module and a high-resolution CMOS imaging unit, it acquires real-time three-dimensional topographic data of the wafer surface, calculates the height deviation signal, and transmits it to the Z-axis controller, providing a micrometer-level precision basis for dynamic focusing adjustment of the Z-axis. Simultaneously, utilizing the Part-SpeedPSO (position synchronization output) function of the motion controller, the sensor is triggered to perform an image acquisition every time the wafer undergoes a 0.1mm displacement with the X-axis motion platform 1 or the T-axis motion platform 3. This precisely achieves synchronized control of "motion displacement - image capture," ensuring the uniformity and timeliness of spatial sampling during the inspection process.

[0042] Furthermore, as a preferred embodiment, the X-motion platform 1 includes an upper end plate 101, a base plate 102, a first linear motor 103, and a first cross roller guide rail 104. The upper end plate 101 is slidably connected to the upper end of the base plate 102 via the first cross roller guide rail 104. The first linear motor 103 is disposed on the upper end of the base plate 102, and the first linear motor 103 connects the base plate 102 and the upper end plate 101. In this embodiment, a first boss is disposed on the upper end of the base plate 102, a first grating ruler 105 is mounted on one side of the first boss, and a first reading head 106 is mounted on the lower end of the upper end plate 101 and faces the first grating ruler 105.

[0043] The X-axis motion platform 1 is driven by a first linear motor 103 and utilizes the high-precision guiding effect of the first cross roller guide 104 to allow the upper end plate 101 to slide smoothly in the X direction. In conjunction with the first grating ruler 105 and the first reading head 106, the motion position information of the X-axis motion platform 1 is detected in real time and fed back to the X-axis controller to achieve high-precision position control.

[0044] In this embodiment, the base plate 102 is made of aluminum alloy. The base plate 102 serves as the basic support for the X-axis. The bottom is fixed to the marble by eight internal hex bolts. The upper end of the base plate 102 is reserved with motor stator mounting holes and guide rail positioning holes.

[0045] The stator of the first linear motor 103 is connected to the stator mounting hole by bolts, and the mover of the first linear motor 103 is connected to the upper end plate 101 by bolts. After current is applied, electromagnetic driving force is generated, which drives the upper end plate 101 and the load to achieve a linear motion of 400mm. The maximum thrust is 506.6N.

[0046] In this embodiment, the upper end plate 101 is made of aluminum alloy and is arranged parallel to the bottom plate 102. It is connected to the bottom plate 102 through the first cross roller guide rail 104. The upper end plate 101 can move synchronously in the X direction with the mover of the first linear motor 103. There are two second bosses at the lower end of the upper end plate 101, and the two first cross roller guide rails 104 are located on the side away from each other. The moving guide rail in the first cross roller guide rail 104 is fixed to the lower end of the upper end plate 101 by bolts, and the stationary guide rail in the first cross roller guide rail 104 is connected to the guide rail positioning hole at the upper end of the bottom plate 102 by bolts. The diameter of the rollers in the first cross roller guide rail 104 is 6mm. Through the separation of the cage, the flatness of the upper end plate 101 can be guaranteed to be ≤±2μm when it moves.

[0047] In this embodiment, the first grating ruler 105 is made of low-expansion nickel-iron alloy material, with a length of 480mm. It is fixed to the side wall of the first boss on the base plate 102 with tape and is parallel to the X-axis movement direction. The first reading head 106 is fixed to the lower end of the upper end plate 101 with a reading head pad (aluminum alloy material), and the gap between it and the first grating ruler 105 is maintained at 2.1±0.15mm. It reads the displacement signal in real time and transmits it to the X-axis controller through the signal line to achieve a positioning accuracy of ±200nm.

[0048] Furthermore, as a preferred embodiment, the Z-axis motion platform 2 includes a base plate 201, a middle plate 202, an upper plate 203, a second linear motor 204, a second cross roller guide 205, and a third cross roller guide 206. The upper end of the base plate 201 is slidably connected to the middle plate 202 via the second cross roller guide 205, and the upper end of the middle plate 202 is slidably connected to the upper plate 203 via the third cross roller guide 206. The upper end of the base plate 201 is provided with the second linear motor 204, which connects the base plate 201 and the middle plate 202. The base plate 201 is connected to the upper plate 101.

[0049] The middle plate 202 and the upper plate 203 are fitted together at an angle. The upper end of the middle plate 202 is provided with a first wedge-shaped surface, and the lower end of the upper plate 203 is provided with a second wedge-shaped surface. The first wedge-shaped surface and the second wedge-shaped surface fit together. In this embodiment, the base plate 201 and the upper plate 101 are connected by bolts. The second linear motor 204 of the Z-axis motion platform 2 pushes the middle plate 202 to move along the second cross roller guide rail 205. Since the middle plate 202 and the upper plate 203 are fitted together at an angle, and a third cross roller guide rail 206 is provided between the middle plate 202 and the upper plate 203, the upper plate 203 can be raised and lowered when the middle plate 202 moves.

[0050] In this embodiment, the substrate 201 is made of aluminum alloy and is vertically fixed to the upper surface of the X-axis upper end plate 101 by four bolts, serving as the basic support for the Z-axis. The upper surface is machined with a guide rail positioning surface, a linear motor stator mounting position, and a cylinder 209 fixing mounting position.

[0051] The middle plate 202 is made of aluminum alloy and is located above the base plate 201. It slides along the guide direction through the second cross roller guide 205, and its bottom is connected to the mover of the second linear motor 204 by bolts.

[0052] The upper plate 203 is made of aluminum alloy and is connected to the middle plate 202 through the third cross roller guide 206. The second wedge surface at the bottom cooperates with the first wedge surface on the upper surface of the middle plate 202 to achieve sliding along the Z-axis.

[0053] The stator of the second linear motor 204 is fixed to the linear motor stator mounting position by bolts, and its mover is connected to the middle plate 202 to provide Z-axis motion driving force. The stroke is 5mm and the maximum speed is 4mm / s.

[0054] The second cross roller guide 205 is 125mm long and is symmetrically distributed on the upper end of the substrate 2017. The moving guide rail of the second cross roller guide 205 is fixed to the lower end of the middle plate 202 by bolts, and the stationary guide rail of the second cross roller guide 205 is connected to the guide rail positioning surface at the upper end of the substrate 201 by bolts. The roller diameter of the second cross roller guide 205 is 3mm and is separated by a cage.

[0055] The third cross roller guide 206 is 125mm long and is symmetrically distributed on both sides of the lower end of the upper plate 203. The moving guide rail of the third cross roller guide 206 is bolted to the lower end of the upper plate 203, and the stationary guide rail of the third cross roller guide 206 is rigidly connected to the upper end of the middle plate 202. The roller diameter of the third cross roller guide 206 is 3mm and is separated by a cage.

[0056] In this embodiment, the upper end of the middle plate 202 has first mounting grooves on both sides of the first wedge-shaped surface for mounting the stationary guide rails of the third cross roller guide rail 206. The lower end of the upper plate 203 has second mounting grooves on both sides of the second wedge-shaped surface for mounting the moving guide rails of the third cross roller guide rail 206.

[0057] Furthermore, as a preferred embodiment, it also includes a second grating ruler 207 and a second reading head 208. The second grating ruler 207 is disposed on one side of the middle plate 202, and a groove is formed on one side of the base plate 201. The second reading head 208 is disposed in the groove. In this embodiment, the second grating ruler 207 and the second reading head 208 are used to detect the motion position information of the Z-axis motion platform 2 and feed this position information back to the Z-axis controller to achieve high-precision position control. The second grating ruler 207 is made of low-expansion nickel-iron alloy material, and its length is 130mm. It is attached to one side of the middle plate 202 with adhesive tape and is parallel to the guiding direction of the second cross roller guide 205. The second reading head 208 is fixed in the groove on one side of the base plate 201 and cooperates with the second grating ruler 207. The gap between the two is maintained at 2.1±0.15mm, and the position of the middle plate 202 is fed back to the Z-axis controller in real time.

[0058] Furthermore, as a preferred embodiment, a cylinder 209 is also included. A cylinder 209 is disposed on the upper end of the substrate 201, located on one side of the second linear motor 204. The output end of the cylinder 209 is connected to the lower end of the middle plate 202. In this embodiment, the cylinder 209 is mounted parallel to the cylinder 209 fixed mounting position on the surface of the substrate 201. The piston rod of the cylinder 209 is connected to the lower end of the middle plate 202 along the guiding direction of the second cross roller guide 205, providing counterweight force to counteract the gravity of the upper plate 203 and the load, reducing the load on the second linear motor 204. The measured axial runout is 0.576 μm. For details on reducing axial runout, please refer to [link to relevant documentation]. Figure 10 As shown.

[0059] Furthermore, as a preferred embodiment, it also includes side plates 210 and spring steel sheets 211. Side plates 210 are provided on both sides of the base plate 201, and a spring steel sheet 211 is provided on each side plate 210, with the spring steel sheet 211 connected to the upper plate 203. In this embodiment, the longitudinal section of the spring steel sheet 211 is V-shaped, serving a buffering and stabilizing function. The spring steel sheet 211 is 0.1mm thick and symmetrically distributed on both sides of the upper plate 203, with its two ends connected to the upper plate 203 and the side plates 210 respectively, providing auxiliary guidance and buffering to prevent the upper plate 203 from swaying back and forth or left and right. The side plates 210 are made of aluminum alloy and symmetrically installed on both sides of the base plate 201, serving as an attachment to connect the spring steel sheets 2111 to the upper plate 203 and the base plate 201, while also enhancing the overall rigidity of the Z-axis.

[0060] Furthermore, as a preferred embodiment, the T-axis motion platform 3 includes a spindle 301, a bearing housing 302, a motor housing 303, a turntable adapter plate 304, a table panel 305, a rotary motor 306, a vacuum suction plate 307, and a turntable loading plate 308. The turntable adapter plate 304 is disposed on the upper end of the upper plate 203. The upper end of the turntable adapter plate 304 is provided with the motor housing 303. The rotary motor 306 is disposed inside the motor housing 303. The spindle 301 is also disposed inside the motor housing 303. The bearing housing 302 is disposed on the upper outer edge of the spindle 301. The lower end of the spindle 301 is connected to the output end of the rotary motor 306. The table panel 305 is disposed on the upper end of the spindle 301. The turntable loading plate 308 is disposed on the upper end of the table panel 305. The vacuum suction plate 307 is disposed on the upper end of the turntable loading plate 308. In this embodiment, the T-axis motion platform 3 can rotate 360°. The spindle 301 is made of aluminum alloy, and a convex ring 309 is provided on the outer edge of the middle part of the spindle 301. An annular air film mating ring is formed between the lower end of the bearing seat 302 and the upper end of the convex ring 309. The convex ring 309 is tightly fitted with the lower end of the bearing seat 302 through the air film to form a high-precision air float support, ensuring that the axial and lateral runout of the spindle 301 is ≤200nm. The upper surface of the spindle 301 is machined with mounting holes for fixing the table panel 305, which is connected to the table panel 305 by bolts. A central channel is provided in the middle of the spindle 301 for installing the air slip ring 311.

[0061] The bearing housing 302 is made of aluminum alloy, and the upper end of the bearing housing 302 is fixed to the upper end of the motor housing 303 by bolts.

[0062] The motor housing 303 is made of aluminum alloy and serves as the mounting carrier for the rotary motor 306. It is fixed to the upper surface of the turntable adapter plate 304 by bolts, providing a rigid mounting base for the rotary motor 306.

[0063] The turntable adapter plate 304 is made of aluminum alloy and serves as the connection between the T-axis motion platform 3 and the Z-axis motion platform 2. It is fixed to the upper end of the upper plate 203 by bolts to achieve the installation and positioning of the T-axis motion platform 3 and the Z-axis motion platform 2.

[0064] The table panel 305 is made of aluminum alloy and is fixed to the upper surface of the spindle 301 by bolts. It serves as an intermediate load-bearing component and is used to install the turntable tray 308 and subsequent loads.

[0065] The rotary motor 306 is a direct-drive rotary motor 306. The stator of the rotary motor 306 is fixed at the bottom of the bearing housing 302. The rotor of the rotary motor 306 is rigidly fixed to the lower end of the spindle 301 through the iron core pressure block 314, directly driving the spindle 301 to rotate. The maximum speed can reach 6000 rpm, and the peak torque is 10.5 Nm, realizing the high-speed and high-precision rotation of the spindle 301.

[0066] Furthermore, as a preferred embodiment, it also includes an incremental encoder 310 and a slip ring 311. The grating ruler mounting base 312 is disposed on the lower outer edge of the main shaft 301. The slip ring 311 is disposed inside the main shaft 301. The lower end of the slip ring 311 is threadedly connected to the turntable adapter plate 304. The upper end of the slip ring 311 is connected to the turntable loading plate 308 and communicates with the interior of the turntable loading plate 308. The interior of the turntable loading plate 308 communicates with the interior of the vacuum adsorption plate 307. The air slip ring 311 is installed in the central channel of the main shaft 301 and is arranged coaxially with the main shaft 301. The lower end (stationary end) of the air slip ring 311 is fixed to the turntable adapter plate 304 by a threaded connection, and the upper end (rotating end) of the air slip ring 311 is fixed to the turntable loading plate 308 and rotates synchronously with the main shaft 301. It can provide a stable and uninterrupted vacuum medium transmission for the vacuum adsorption air path of the vacuum adsorption plate 307 (Chuck plate) when the main shaft 301 rotates at high speed, ensuring that the vacuum adsorption function of the vacuum adsorption plate 307 continues to operate stably during the rotation of the main shaft 301.

[0067] The vacuum adsorption plate 307 is used to adsorb wafers. Its upper surface is distributed with multiple sets of vacuum adsorption bosses. When the air is pumped out, it can adsorb and fix wafers with a maximum diameter of 300mm and rotate synchronously with the spindle 301.

[0068] The grating of the incremental encoder 310 is made of glass and is fixed to the grating ruler mounting base 312 by adhesive bonding. The grating ruler mounting base 312 is mounted on the extension shaft at the lower end of the main shaft 301 and is arranged coaxially with the main shaft 301. The reading head of the incremental encoder 310 is fixed on the reading head cover plate 313, and both the reading head cover plate 313 and the grating ruler mounting base 312 are part of the incremental encoder 310. The incremental encoder 310 has a resolution of 0.1 arcsec and can provide real-time feedback of the rotation angle and speed of the main shaft 301 to the T-axis controller, ensuring a repeatability accuracy of ±0.5 arcsec.

[0069] In this embodiment, the vacuum adsorption disk 307 is fixed to the upper surface of the turntable tray 308 by adjusting the copper screws 315 and bolts, which facilitates fine adjustment of the horizontality of the adsorption surface and ensures the planar accuracy during wafer adsorption.

[0070] The turntable tray 308 is fixed to the upper surface of the table panel 305 by bolts, serving as a transitional support for mounting the vacuum adsorption tray 307.

[0071] Furthermore, as a preferred implementation, the control system includes a motion controller, an X-axis controller, a Z-axis controller, and a T-axis controller. The X-axis controller, Z-axis controller, T-axis controller, and sensors are connected to the motion controller. The X-axis controller is connected to X-axis motion platform 1, the Z-axis controller is connected to Z-axis motion platform 2, and the T-axis controller is connected to T-axis motion platform 3. In this embodiment, the motion controller acts as the core, receiving signals from the sensors and parameters set by the operator. It controls the movement of X-axis motion platform 1, Z-axis motion platform 2, and T-axis motion platform 3 through the X-axis controller, Z-axis controller, and T-axis controller, respectively, achieving coordinated control of the three-axis motion to complete the scanning task. This control system design achieves precise control of the three-axis motion platforms, allowing for flexible adjustment of the scanning path and parameters according to different detection requirements, thus improving the intelligence and detection efficiency of the scanning device. Simultaneously, through real-time interaction between the sensors and the motion controller, deviations during the movement process can be detected and corrected promptly, ensuring scanning accuracy.

[0072] In this embodiment, the sensor can be fixed above the T-axis motion platform 3 by a bracket, which can be connected to an external structure, while the motion controller, X-axis controller, Z-axis controller and T-axis controller can be fixed to the external structural components.

[0073] In this embodiment, the wafer is moved by the X-axis motion platform 1, the Z-axis motion platform 2, and the T-axis motion platform 3 to generate a three-dimensional spiral scanning trajectory. The T-axis motion platform 3 directly drives the wafer to rotate, increasing the scanning speed by 40% and solving the problem of slow electron beam scanning. The X-axis motion platform 1 has a positioning accuracy of ±200nm and a maximum X-axis speed of 800mm / s, which is 60% faster than traditional progressive scan (≤500mm / s) equipment. The Z-axis motion platform 2 uses a cylinder 209 counterweight to overcome the dependence of the elliptic polarization method on a high-precision sample stage.

[0074] In this embodiment, the motion controller can implement the Part-Speed ​​PSO (Position Synchronization Output) function to ensure that the sensor is triggered to perform image acquisition once every 0.1mm displacement, so as to accurately realize the synchronous control of "motion displacement-image capture".

[0075] In this embodiment, the X-axis controller is equipped with an emergency stop (E-STOP) port, which is connected to the first linear motor 103 and the first reading head 106 respectively. By receiving the position signal of the first grating ruler 105 (converted by the reading head 6), it outputs current in real time to control the movement of the first linear motor 103, thereby realizing high-precision displacement control of the X-axis. When the emergency stop is triggered, the current output of the first linear motor 103 is immediately cut off, and the emergency stop action is executed synchronously through the motion controller in conjunction with the Z-axis controller and the T-axis controller.

[0076] The Z-axis controller is equipped with an emergency stop (E-STOP) port, which is electrically connected to the second linear motor 204 and the second reading head 208 respectively. It receives the position signal from the second grating ruler 207 (converted by the second reading head 208) and, in combination with the feedback data from the sensor, dynamically adjusts the output of the second linear motor 204 to achieve precise position control of the Z-axis. It receives trigger signals (including self-trigger and X-axis controller linkage signals) through the emergency stop (E-STOP) port. When triggered, it immediately cuts off the current output of the second linear motor 204, causing the Z-axis motion platform 2 to stop moving quickly.

[0077] The T-axis controller is equipped with an emergency stop (E-STOP) port, which connects to the reading head of the rotary motor 306 and the incremental encoder 310. By receiving the rotation angle and speed signals fed back by the grating ruler of the incremental encoder 310, it controls the speed and rotation angle of the rotary motor 306 in a closed loop to ensure the high-speed and stable operation of the T-axis. It receives trigger signals (including self-trigger and X-axis controller linkage signals) through the emergency stop (E-STOP) port. When triggered, it immediately cuts off the current output of the rotary motor 306 and maintains the vacuum adsorption state of the vacuum adsorption disk 307 to protect the wafer.

[0078] In use, the vacuum adsorption disk 307 fixes the wafer by vacuum adsorption, and then drives the spindle 301 to rotate the wafer. At the same time, the first linear motor 103 and the second linear motor 204 synchronously drive the corresponding axes to make linear motion, and the three coupling to form a three-dimensional spiral scanning trajectory covering the wafer surface.

[0079] The air slip ring 311 is coaxially installed inside the spindle 301, providing air film support for the bearing housing 302 and uninterrupted transmission of dry nitrogen for vacuum adsorption by the vacuum adsorption disk 307, thereby preventing wafer displacement by stabilizing the air film accuracy; the incremental encoder 310 provides real-time feedback on the rotation angle and position signal of the spindle 301, and triggers the sensor by linking the motion controller Part-SpeedPSO function to achieve synchronization of motion and detection.

[0080] Before placing the wafer, a scan path can be generated by inputting parameters through the motion controller.

[0081] In this implementation, the X-axis motion platform 1, Z-axis motion platform 2, and T-axis motion platform 3 are coupled to generate an Archimedean spiral trajectory with a synthesized linear velocity of 2000 mm / s. When the dynamic radius is adjusted (150 mm → 10 mm), the linear velocity fluctuation rate is <0.03% (see...). Figure 11 (As shown). The triaxial spiral scanning device in this embodiment can be applied to wafer inspection, spiral imaging of gene sequencing chips, and contour optimization of fiber optic sensor end face polishing, and its cost is significantly lower than that of traditional electron beam inspection equipment.

[0082] The above description is only a preferred embodiment of the present utility model and does not limit the implementation method and protection scope of the present utility model. Those skilled in the art should realize that all solutions obtained by equivalent substitutions and obvious changes made based on the description and illustrations of the present utility model should be included within the protection scope of the present utility model.

Claims

1. A three-axis spiral scanning device, characterized by, The system includes an X-axis motion platform, a Z-axis motion platform, a T-axis motion platform, a sensor, and a control system. The Z-axis motion platform is located at the upper end of the X-axis motion platform, the T-axis motion platform is located at the upper end of the Z-axis motion platform, and the sensor is located above the T-axis motion platform. The X-axis motion platform, the Z-axis motion platform, the T-axis motion platform, and the sensor are all connected to the control system.

2. The tri-axial spiral scanning device of claim 1, wherein, The X-motion platform includes an upper end plate, a base plate, a first linear motor, and a first cross roller guide rail. The upper end plate is slidably connected to the upper end of the base plate via the first cross roller guide rail. The first linear motor is provided at the upper end of the base plate, and the first linear motor connects the base plate and the upper end plate.

3. The triaxial spiral scanning device as described in claim 2, characterized in that, It also includes a first grating ruler and a first reading head. The upper end of the base plate is provided with a first protrusion. The first grating ruler is installed on one side of the first protrusion. The first reading head is installed on the lower end of the upper plate and is directly opposite the first grating ruler.

4. The triaxial spiral scanning device as described in claim 2, characterized in that, The Z-axis motion platform includes a base plate, a middle plate, an upper plate, a second linear motor, a second cross roller guide rail, and a third cross roller guide rail. The upper end of the base plate is slidably connected to the middle plate via the second cross roller guide rail, and the upper end of the middle plate is slidably connected to the upper plate via the third cross roller guide rail. The upper end of the base plate is provided with the second linear motor, which connects the base plate and the middle plate. The base plate is connected to the upper plate. The middle plate and the upper plate are fitted together by an inclined surface. The upper end of the middle plate is provided with a first wedge-shaped surface, and the lower end of the upper plate is provided with a second wedge-shaped surface. The first wedge-shaped surface and the second wedge-shaped surface are fitted together.

5. The triaxial spiral scanning device as described in claim 4, characterized in that, It also includes a second grating ruler and a second reading head. The second grating ruler is disposed on one side of the middle plate, and a groove is formed on one side of the substrate. The second reading head is disposed in the groove.

6. The triaxial spiral scanning device as described in claim 4, characterized in that, It also includes a cylinder, with the cylinder located on the upper end of the base plate on one side of the second linear motor, and the output end of the cylinder being connected to the lower end of the middle plate.

7. The triaxial spiral scanning device as described in claim 4, characterized in that, It also includes side plates and spring steel sheets. Two side plates are provided on both sides of the base plate, and a spring steel sheet is provided on each side plate. The spring steel sheet is connected to the upper plate.

8. The triaxial spiral scanning device as described in claim 4, characterized in that, The T-axis motion platform includes a main shaft, bearing housing, motor housing, turntable adapter plate, platform, rotary motor, vacuum suction disk, and turntable loading disk. The turntable adapter plate is located on the upper end of the upper plate. The motor housing is located on the upper end of the turntable adapter plate. The rotary motor is located inside the motor housing. The main shaft is also located inside the motor housing. The bearing housing is located on the upper outer edge of the main shaft. The lower end of the main shaft is connected to the output end of the rotary motor. The platform is located on the upper end of the main shaft. The turntable loading disk is located on the upper end of the platform. The vacuum suction disk is located on the upper end of the turntable loading disk. A convex ring is provided on the outer edge of the middle part of the main shaft, and an annular air film mating ring is formed between the lower end of the bearing seat and the upper end of the convex ring.

9. The triaxial spiral scanning device as described in claim 8, characterized in that, It also includes an incremental encoder and a slip ring. The grating ruler mounting base is located on the lower outer edge of the main shaft. The slip ring is installed inside the main shaft. The lower end of the slip ring is threadedly connected to the turntable adapter plate. The upper end of the slip ring is connected to the turntable loading plate and communicates with the interior of the turntable loading plate. The interior of the turntable loading plate communicates with the interior of the vacuum adsorption plate.

10. The triaxial spiral scanning device as described in claim 1, characterized in that, The control system includes a motion controller, an X-axis controller, a Z-axis controller, and a T-axis controller. The X-axis controller, the Z-axis controller, the T-axis controller, and the sensor are respectively connected to the motion controller. The X-axis controller is connected to the X-axis motion platform, the Z-axis controller is connected to the Z-axis motion platform, and the T-axis controller is connected to the T-axis motion platform.