A reduction furnace base structure

Abstract

The utility model discloses a reduction furnace chassis structure, it includes the chassis, is equipped with n concentric arrangement electrode hole ring on the chassis along the center from inside to outside equidistance, each electrode hole ring all is equilateral hexagon arrangement, each electrode hole ring is evenly arranged with a plurality of electrode holes along the circumference, is installed with silicon rod on each electrode hole, the distance between any two adjacent electrode holes in the same electrode hole ring all is D, the distance between any two adjacent electrode holes in different electrode hole ring all is L, and D is equal to L, is equipped with a feeding nozzle in the center of chassis, is equipped with a feeding nozzle ring between every two adjacent electrode hole rings, and the feeding nozzle on every feeding nozzle ring is evenly arranged and forms equilateral hexagon, is equipped with a plurality of equidistance arrangement tail gas hole on the chassis outside the outermost electrode hole ring along the circumference, and each tail gas hole forms the concentric circle concentric with the electrode hole ring.

Description

Technical Field

[0001] This utility model relates to the field of reduction furnace technology, and in particular to a reduction furnace chassis structure. Background Technology

[0002] The reduction furnace is one of the core pieces of equipment in polysilicon production, and its power consumption accounts for about 80% of the total power consumption in polysilicon production. The chassis of polysilicon reduction furnaces used in China generally adopts a uniform rod arrangement method, that is, all silicon rods are arranged on the chassis in multiple concentric circles, and the distance between any two adjacent silicon rods in the same concentric circle is equal.

[0003] There are two common methods for using fabric sticks. The first method is as follows: Figure 2 As shown, the circumferential spacing between any two adjacent silicon rods within any concentric circle is D. However, the spacing between any two adjacent concentric circles from the inside out are R1, R2, R3... which are not equal. This rod arrangement method requires that the spacing R of the different concentric circles continuously increases from the inside to the outside. When designing a large reduction furnace, because the spacing R of the concentric circles continuously increases from the inside to the outside, the diameter of the reduction furnace becomes too large, and the number of silicon rods that can be arranged in the reduction furnace is greatly limited. The second type is as follows... Figure 3 As shown, the distance between any two adjacent concentric circles is r, while the distances between two adjacent silicon rods in each concentric circle from the inside out are D1, D2, D3... which are not equal. This rod arrangement method must satisfy the requirement of uniform gas intake in the reduction furnace by continuously increasing the distance between two adjacent silicon rods along the circumferential direction in each concentric circle from the inside out. When designing a large reduction furnace, because the number of silicon rods increases layer by layer, the distance between two adjacent silicon rods along the circumferential direction in the inner concentric circle is much different from the distance between two adjacent silicon rods along the circumferential direction in the outer concentric circle, resulting in uneven heat radiation in the reduction furnace. Utility Model Content

[0004] The purpose of this invention is to provide a reduction furnace chassis structure to solve the problems existing in the prior art.

[0005] This utility model is implemented by the following technical solution: a reduction furnace chassis structure, which includes a chassis, on which n concentrically arranged electrode hole rings are provided at equal intervals from the inside to the outside along the center. Each electrode hole ring is arranged in an equilateral hexagonal shape, and each electrode hole ring has a plurality of electrode holes evenly arranged along the circumference. A silicon rod is installed on each electrode hole. The distance between any two adjacent electrode holes in the same electrode hole ring is D, and the distance between any two adjacent electrode holes in different electrode hole rings is L, and D is equal to L. A feed nozzle is provided at the center of the chassis, and a feed nozzle ring is provided between every two adjacent electrode hole rings. The feed nozzles on each feed nozzle ring are evenly arranged to form an equilateral hexagon. A plurality of exhaust vents are provided circumferentially on the chassis outside the outermost electrode hole ring, and each exhaust vent forms a concentric circle concentric with the electrode hole ring.

[0006] Preferably, the chassis has 1 to n concentrically arranged electrode hole rings at equal intervals from the inside to the outside along the center, and each electrode hole ring arranged from the inside to the outside along the center of the chassis has 6, 12, 18...6n electrode holes in sequence.

[0007] Preferably, the chassis has 1 to m concentrically arranged feed nozzle rings at equal intervals from the inside out. If m is an odd number, the number of feed nozzles on the feed nozzle rings is... If m is an even number, the number of feed nozzles on the feed nozzle ring is (the number of nozzles is not specified in the original text). indivual.

[0008] Preferably, the regular hexagonal region formed by the n electrode hole rings is divided into 6 equilateral triangle regions. The distance between any two adjacent feed nozzles on the same feed nozzle ring within each equilateral triangle region is equal, and each feed nozzle is arranged at the center of the equilateral triangle formed by the three surrounding electrode holes.

[0009] Preferably, the distance between any two adjacent electrode holes in the same electrode hole ring is D, where D is 200mm to 300mm; the distance between any two adjacent electrode holes in different electrode hole rings is L, where L is 200mm to 300mm.

[0010] Advantages of this utility model: 1. Compared with the concentric circle arrangement on the bottom plate of the existing reduction furnace, when the same number of silicon rods are arranged, the bottom plate diameter of the reduction furnace of this utility model is smaller. When the furnace type is larger, the diameter of the reduction furnace can be effectively reduced.

[0011] 2. In this utility model, the distance between any two adjacent electrode holes in the same electrode hole ring is D, and the distance between any two adjacent electrode holes in different electrode hole rings is L, and D equals L. The distance between any two adjacent electrode holes on the chassis of the reduction furnace is equal, which enables any two silicon rods to be stacked in groups, and the thermal radiation distance formed by each group of silicon rods is exactly the same, thus improving the uniformity of the temperature field.

[0012] 3. The feed nozzle rings arranged on the reduction furnace chassis of this utility model are located between every two adjacent electrode hole rings, and each feed nozzle is arranged at the center of the equilateral triangle formed by the three surrounding electrode holes. This ensures uniform feeding and makes full use of the heat radiation between silicon rods, reducing power consumption and increasing polysilicon production. Attached Figure Description

[0013] Figure 1 This is a schematic diagram of the structure of this utility model.

[0014] Figure 2 This is the first concentric circle arrangement of the reduction furnace chassis structure in the background technology.

[0015] Figure 3 This is the second type of concentric circle arrangement reduction furnace chassis structure in the background technology.

[0016] In the diagram: 1. Chassis; 2. Electrode hole ring; 2.1. Electrode hole; 3. Silicon rod; 4. Feed nozzle ring; 4.1. Feed nozzle; 5. Exhaust port. Detailed Implementation

[0017] The technical solutions of the present utility model will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the present utility model, and not all embodiments. Based on the embodiments of the present utility model, all other embodiments obtained by those of ordinary skill in the art without creative effort are within the protection scope of the present utility model.

[0018] like Figure 1 As shown, a reduction furnace chassis structure includes a chassis 1. One to n concentrically arranged electrode hole rings 2 are provided on the chassis 1 at equal intervals from the center outwards. In this embodiment, eight concentrically arranged electrode hole rings 2 are provided on the chassis 1 at equal intervals from the center outwards. Each electrode hole ring 2 is arranged in an equilateral hexagonal shape, and each electrode hole ring 2 has a plurality of electrode holes 2.1 evenly arranged circumferentially. A silicon rod 3 is installed on each electrode hole 2.1. In this embodiment, the eight electrode hole rings 2 arranged from the center outwards on the chassis 1 have 6, 12, 18, 24, 30, 36, and 42 electrodes arranged sequentially. There are 48 electrode holes 2.1. The distance between any two adjacent electrode holes 2.1 in the same electrode hole ring 2 is D, where D is 200mm to 300mm. The distance between any two adjacent electrode holes 2.1 in different electrode hole rings 2 is L, where L is 200mm to 300mm, and D is equal to L. In this embodiment, D=L=230mm. The distance between any two adjacent electrode holes 2.1 on the chassis 1 of the reduction furnace is equal, which allows any two silicon rods 3 to be stacked in groups, and the thermal radiation distance formed by each group of silicon rods 3 is exactly the same, which can improve the uniformity of the temperature field. A feed nozzle 4.1 is provided at the center of the chassis 1, and a feed nozzle ring 4 is provided between every two adjacent electrode hole rings 2. In this embodiment, seven concentrically arranged feed nozzle rings 4 are provided at equal intervals from the inside to the outside along the center of the chassis 1. The seven feed nozzle rings 4 arranged from the inside to the outside along the center of the chassis 1 are provided with 6, 6, 12, 12, 18, 18 and 24 feed nozzles 4.1 in sequence. The feed nozzles 4.1 on each feed nozzle ring 4 are evenly arranged to form an equilateral hexagon. The regular hexagonal area formed by the eight electrode hole rings 2 is divided into six equilateral triangular areas. The distance between any two adjacent feed nozzles 4.1 on the same feed nozzle ring 4 in each equilateral triangular area is equal, and each feed nozzle 4.1 is arranged at the center of the equilateral triangle formed by the three surrounding electrode holes 2.1. The feed is uniform and can make full use of the heat radiation between the silicon rods 3, reduce power consumption and increase polysilicon production. On the chassis 1 outside the outermost electrode hole ring 2, there are a number of exhaust holes 5 arranged at equal intervals along the circumference. In this embodiment, there are 6 exhaust holes 5 arranged at equal intervals along the circumference on the chassis 1 outside the outermost electrode hole ring 2, and each exhaust hole 5 forms a concentric circle concentric with the electrode hole ring 2.

[0019] Figure 1 This is the reduction furnace chassis structure of this utility model. Figure 2 , Figure 3 For the existing reduction furnace chassis structure, in Figure 1 , Figure 2 , Figure 3 The reduction furnace chassis 1 is arranged with the same number of silicon rods 3 in each ring. In the above arrangement, the distance between any two adjacent electrode holes 2.1 in the same electrode hole ring 2 (referred to as: intra-ring rod spacing) and the distance between any two adjacent electrode holes 2.1 in different electrode hole rings 2 (referred to as: inter-ring rod spacing) are as follows:

[0020] As shown in the table above: The method adopted... Figure 1 The arrangement of the electrodes in the furnace is such that the distance between any two adjacent electrode holes 2.1 is 230mm, and the diameter of the reduction furnace chassis 1 is measured to be 4100mm. Figure 2 In the arrangement of the silicon rods, the distance between two adjacent silicon rods 3 along the circumferential direction within each concentric circle is 230mm, while the distance between two adjacent concentric circles gradually increases from the inside out. The diameter of the reduction furnace base 1 was measured to be 4429.67mm. Figure 3 In the arrangement of the furnace, the distance between any two adjacent concentric circles is 230mm, and the distance between two adjacent silicon rods 3 in each concentric circle increases sequentially from the inside to the outside. The diameter of the reduction furnace base plate 1 is measured to be 4593.02mm.

[0021] Therefore, adopt Figure 1 In the arrangement of the furnace, the base 1 of the reduction furnace has the smallest diameter and the outer diameter of the equipment is the smallest. When the furnace type of the reduction furnace is larger, the diameter of the reduction furnace can be effectively reduced.

[0022] In the description of this utility model, it should be noted that the terms "center", "upper", "lower", "front", "rear", "top", "bottom", "left", "right", "vertical", "horizontal", "inner", and "outer" indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. They are only for the convenience of describing this utility model and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on this utility model.

Claims

1. A reduction furnace chassis structure, comprising a chassis, characterized in that, On the chassis, n concentrically arranged electrode hole rings are provided at equal intervals from the inside to the outside along the center. Each electrode hole ring is arranged in an equilateral hexagonal shape, and a number of electrode holes are evenly arranged around the circumference of each electrode hole ring. A silicon rod is installed on each electrode hole. The distance between any two adjacent electrode holes in the same electrode hole ring is D, and the distance between any two adjacent electrode holes in different electrode hole rings is L, where D is equal to L. A feed nozzle is provided at the center of the chassis, and a feed nozzle ring is provided between every two adjacent electrode hole rings. The feed nozzles on each feed nozzle ring are evenly arranged to form an equilateral hexagon. A plurality of exhaust vents are provided circumferentially on the chassis outside the outermost electrode hole ring, and each exhaust vent forms a concentric circle concentric with the electrode hole ring.

2. The reduction furnace chassis structure according to claim 1, characterized in that, One to n concentrically arranged electrode hole rings are provided on the chassis from the inside out along the center. Each electrode hole ring arranged from the inside out along the center of the chassis has 6, 12, 18...6n electrode holes in sequence.

3. A reduction furnace chassis structure according to claim 1 or 2, characterized in that, The chassis has a concentric ring of feed nozzles arranged at equal intervals from the inside out. If m is an odd number, the number of feed nozzles on the feed nozzle ring is... If m is an even number, the number of feed nozzles on the feed nozzle ring is (the number of nozzles is not specified in the original text). indivual.

4. The reduction furnace chassis structure according to claim 3, characterized in that, The regular hexagonal region formed by the n electrode hole rings is divided into 6 equilateral triangle regions. The distance between any two adjacent feed nozzles on the same feed nozzle ring within each equilateral triangle region is equal, and each feed nozzle is arranged at the center of the equilateral triangle formed by the three surrounding electrode holes.

5. The reduction furnace chassis structure according to claim 1, characterized in that, The distance between any two adjacent electrode holes in the same electrode hole ring is D, where D is 200mm to 300mm; the distance between any two adjacent electrode holes in different electrode hole rings is L, where L is 200mm to 300mm.

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