A photolithography sample carrier
By constructing a sealed environment in the photolithography sample carrier, the problem of ketene volatilization of photolithography materials in an anhydrous and oxygen-free environment was solved, thereby improving the photolithography effect and pattern accuracy.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- TOPO TECH (SUZHOU) CO LTD
- Filing Date
- 2025-08-08
- Publication Date
- 2026-08-04
AI Technical Summary
During photolithography, the photolithographic material reacts with water and oxygen in the air, causing the material to fail. Furthermore, when photolithography is performed in an anhydrous and oxygen-free environment, the ketene cannot react with water to form indanic acid, resulting in different line widths and resist thicknesses in the lithographic area after development, leading to pattern distortion.
A photolithography sample carrier is provided, including a cavity, a light-transmitting plate, and a sample-supporting structure. The light-transmitting plate is detachably connected to the opening structure of the cavity to create a sealed environment and prevent the volatilization of ketene. The sample-supporting structure fixes the sample to be photolithographically etched and prevents it from shifting.
By establishing a stable microenvironment balance during the photolithography process, the volatilization of ketene is avoided, ensuring consistent development rates of exposure units, and improving photolithography effect and pattern accuracy.
Smart Images
Figure CN224594990U_ABST
Abstract
Description
Technical Field
[0001] This utility model relates to the field of photolithography technology, specifically to a photolithography sample carrier. Background Technology
[0002] During photolithography, some photolithography materials react with water and oxygen in the air, leading to material failure. These materials are generally not suitable for photolithography in an airy environment. The common practice is to place the photolithography machine inside a glove box and perform the photolithography inside the glove box, which has an inert, water-free, and oxygen-free special gas atmosphere. However, during photolithography in this special environment, the sample is in an anhydrous and oxygen-free open environment before exposure. The photolithography machine exposes the photoresist one by one. The DNQ-diazonaphthoquinone contained in the photoresist loses nitrogen molecules after exposure to ultraviolet light, generating carbene. Carbene undergoes a Wolf rearrangement reaction within the picosecond to nanosecond range, generating enone. Since the glove box is anhydrous and oxygen-free, the generated enone cannot react with water to generate indole. Indole is the main substance that directly participates in development. An increase in the content of indole makes the area more acidic and easier to neutralize with hydroxide ions in the developer. Because the atmosphere inside the glove box is circulated, the enone will be continuously volatilized from the exposed photoresist. The area that is photolithographically ... Utility Model Content
[0003] To address the aforementioned problems in the prior art, this application provides a photolithography sample carrier. The specific technical solution is as follows: On one hand, this application provides a photolithography sample carrier, comprising: A cavity having an open structure; A light-transmitting plate is detachably connected to the opening structure, and the light-transmitting plate seals the cavity after being connected to the opening structure; A sample support structure is located inside the cavity to hold the sample to be photolithographically etched and is positioned opposite to the light-transmitting plate, allowing photolithography light to pass through the light-transmitting plate and illuminate the sample support structure.
[0004] In a possible implementation, the photolithography sample carrier further includes a seal that seals the connection between the light-transmitting plate and the opening structure.
[0005] In a possible implementation, the edge of the opening structure is provided with a sealing groove, the sealing element is embedded in the sealing groove, and after the light-transmitting plate is engaged with the sealing groove, a sealed connection is formed between the light-transmitting plate and the sealing element.
[0006] In a possible implementation, a locking element is provided at the opening structure, and the light-transmitting plate is connected to the locking element.
[0007] In a possible implementation, the locking element is a protruding structure fixedly connected to the inner wall of the cavity.
[0008] In a possible implementation, the locking element is detachably connected to the inner wall of the cavity.
[0009] In a possible implementation, the locking elements are spaced apart around the edge of the opening structure.
[0010] In a possible implementation, the locking elements are arranged in a ring around the edge of the opening structure.
[0011] In a possible implementation, the photolithography sample carrier further includes a cover plate detachably connected to the locking member. The locking member and the cover plate are connected to form a locking position, and the sealing member is disposed at the locking position. The light-transmitting plate is sealed and locked to the locking position by the sealing member.
[0012] In a possible implementation, the sealing element has a slot, the edge of the light-transmitting plate is sealed to the slot, and the sealing element is sandwiched between the locking element and the cover plate.
[0013] In a possible implementation, the inner wall of the cavity is provided with locking grooves spaced apart in the height direction, and the locking grooves are detachably connected to the locking member.
[0014] In a possible implementation, the locking member is a protruding structure fixedly connected to the inner wall of the cavity; or, the locking member is detachably connected to the inner wall of the cavity.
[0015] In a possible implementation, the cover plate is provided with a window area, which is disposed opposite to the sample support structure; and / or, the size of the window area is greater than or equal to the size of the sample to be photolithographically etched, and the size of the window area is smaller than the size of the light-transmitting plate.
[0016] In a possible implementation, a fastener is also included, through which the cover plate and the locking member are detachably connected; After the sealing element is installed in the space between the cover plate and the locking element, the sealing element, the inner wall of the cavity, the cover plate and the locking element form an installation cavity, the installation cavity is isolated from the cavity, and one end of the fastener passes through the cover plate and the installation cavity and is fixedly connected to the locking element.
[0017] In a possible implementation, the surface of the sample support structure is a friction surface, which contacts the sample to be lithographicated to fix the sample.
[0018] In a possible implementation, the sample support structure is a limiting groove, in which the sample to be lithographically etched is fixed and limited, and the limiting groove can restrict the in-plane movement of the sample to be lithographically etched.
[0019] In a possible implementation, it may also include a vent hole communicating with the interior of the cavity, and a sealing plug that is sealed to the vent hole.
[0020] In a possible implementation, the light-transmitting plate is provided with a functional layer, which is an anti-reflective layer or a protective layer.
[0021] In a possible implementation, the cavity can be any one of a polygonal prism, a cylinder, or an elliptical cylinder.
[0022] In a possible implementation, the gas atmosphere within the cavity is any one of nitrogen, argon, krypton, helium, and neon.
[0023] Based on the above technical solution, this utility model has the following beneficial effects: This invention provides a photolithography sample carrier, including a cavity for accommodating a sample to be photolithographically etched. The cavity has an open structure, and a light-transmitting plate is detachably connected to the open structure to seal the cavity. The photolithography sample carrier in a sealed state can isolate the sample to be photolithographically etched from the external environment, enabling a stable microenvironment balance to be built inside the sealed photolithography sample carrier during the photolithography process. This avoids the volatilization of ketene generated during exposure, thereby ensuring that the development rate of the exposure units of the sample is the same, which is beneficial to improving the photolithography effect. The sample support structure is located in the cavity and is arranged opposite to the light-transmitting plate. The sample support structure can fix the sample to be photolithographically etched, preventing the sample to be photolithographically etched from shifting during the photolithography process, avoiding misalignment or blurring of the photolithography pattern. The photolithography light can be irradiated onto the sample to be photolithographically etched through the light-transmitting plate, effectively improving the convenience of photolithography. Attached Figure Description
[0024] To more clearly illustrate the technical solutions and advantages in the embodiments of this application or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this application. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.
[0025] Figure 1 This application provides a schematic diagram of the structure of a photolithography sample carrier. Figure 2 : A schematic diagram of another photolithography sample carrier provided in the embodiments of this application; Figure 3: A schematic diagram of another photolithography sample carrier provided in the embodiments of this application; Figure 4 : A schematic diagram of another photolithography sample carrier provided in the embodiments of this application; Reference numerals: 1-Cavity, 2-Transparent plate, 3-Sample support structure, 4-Seal, 5-Positioning component, 6-Cover plate, 7-Fastener, 8-First seal, 9-Second seal, 10-Friction surface. Detailed Implementation
[0026] The technical solutions of the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this application, and not all embodiments. Based on the embodiments of this application, all other embodiments obtained by those of ordinary skill in the art without creative effort are within the scope of protection of this application.
[0027] It should be noted that, in the description of this application, the following definitions shall apply unless a different definition is given elsewhere in the claims or this specification. All numerical values, whether or not explicitly indicated, are defined herein as being modified by the term "about". The term "about" generally refers to a range of numerical values that a person skilled in the art would consider equivalent to the stated values to produce substantially the same properties, functions, results, etc. A range of numerical values indicated by a low value and a high value is defined as including all numerical values within that range and all subranges included within that range.
[0028] It should be noted that in the description of this application, the terms "first," "second," etc., are used to distinguish similar objects and are not necessarily used to describe a specific order or sequence. It should be understood that such data can be interchanged where appropriate so that the embodiments of this application described herein can be implemented in orders other than those illustrated or described herein. Furthermore, the terms "comprising" and "having," and any variations thereof, are intended to cover non-exclusive inclusion.
[0029] It should be noted that, in the description of this application, the terms "on," "above," "over," and "above" should be interpreted in the broadest sense, meaning that a description containing these terms is interpreted as "a component may be disposed on another component in direct contact, or there may be an intermediate component or layer between the components." Furthermore, for ease of description, this application may also use spatial relative terms such as "below," "under," "below," "on," "above," "lower," and "upper" to describe the relationship between one element or component and another element or component shown in the accompanying drawings. In addition to the orientations described in the figures, spatial relative terms are also intended to cover different orientations of the device during use or operation. The device may be oriented in other ways (rotated 90° or otherwise), and the spatial relative descriptive terms used in this application can be interpreted accordingly.
[0030] The following is for reference Figure 1 This application provides a photolithography sample carrier, comprising: a cavity 1 with an open structure; a light-transmitting plate 2 detachably connected to the open structure, which seals the cavity 1 after connection; and a sample-bearing structure 3 for accommodating the sample to be photolithographically etched, located within the cavity 1 and opposite to the light-transmitting plate 2, allowing photolithography light to pass through the light-transmitting plate 2 and irradiate the sample to be photolithographically etched onto the sample-bearing structure 3. Thus, the sealed photolithography sample carrier isolates the sample to be photolithographically etched from the external environment, enabling a stable microenvironment balance to be established within the sealed carrier during photolithography, preventing the volatilization of ketones generated during exposure, thereby ensuring uniform development rates of the exposure units and improving photolithography performance. Furthermore, the sample-bearing structure 3 fixes the sample to be photolithographically etched, preventing displacement during the process and avoiding misalignment or blurring of the photolithography pattern. The ability of the light-transmitting plate 2 to irradiate the sample effectively improves the convenience of photolithography.
[0031] In a possible implementation, the opening structure can completely expose the surface of the sample support structure 3. After the light-transmitting plate 2 is connected to the opening structure, the lithography light can shine through the light-transmitting plate 2 onto the area to be lithographic on the surface of the sample to be lithographic, without the need to move the sample to be lithographic during the lithography process. Specifically, the size of the opening structure is greater than or equal to the size of the sample to be lithographic, and the size of the light-transmitting plate 2 matches the size of the opening structure, which facilitates the placement and removal of the sample to be lithographic in the cavity 1, and also facilitates the illumination of the lithography light.
[0032] In a possible implementation, the light-transmitting plate 2 is arranged parallel to the surface of the sample support structure 3. In this way, the error between the incident angle of the lithography light on the light-transmitting plate 2 and the incident angle of the lithography light on the surface of the sample to be lithographicated can be controlled within the allowable deviation range. This can effectively avoid the phase delay of the light wave caused by the incident angle deviation, thereby avoiding the impact on the lithography accuracy. It is beneficial to reduce lithography errors and defects and ensure the high resolution and accuracy of the lithography pattern.
[0033] In a possible implementation, a functional layer is provided on the light-transmitting plate 2; in one example, the functional layer can be an anti-reflection layer, which can reduce the interface reflection of the light-transmitting plate 2 through thin film interference, thereby improving the light energy utilization rate; in another example, the functional layer can be a protective layer, which is formed by providing a rigid film on the surface of the light-transmitting plate 2 to prevent particle adsorption or mechanical damage.
[0034] In a possible implementation, the photolithography sample carrier further includes a seal 4, which seals the connection between the light-transmitting plate 2 and the opening structure. This effectively improves the sealing performance between the light-transmitting plate 2 and the opening structure, thereby enhancing the sealing performance of the photolithography sample carrier and preventing gas or water molecules from outside the photolithography sample carrier from entering the cavity 1, while also preventing the diffusion of ketene generated during the photolithography process to the outside of the cavity 1.
[0035] In a possible implementation, a sealing groove is provided at the edge of the opening structure, and the sealing element 4 is embedded in the sealing groove. After the light-transmitting plate 2 is engaged with the sealing groove, a sealed connection is formed between the light-transmitting plate 2 and the sealing element 4. Thus, the engagement of the light-transmitting plate 2 with the sealing groove enables a detachable connection between the light-transmitting plate 2 and the cavity 1, facilitating the placement of the photolithography sample into the cavity 1 through the opening structure and enabling rapid replacement of the light-transmitting plate 2. Furthermore, the sealing element 4 seals the gap between the light-transmitting plate 2 and the sealing groove, ensuring a seal for the cavity 1 after the light-transmitting plate 2 is connected to the sealing groove. Specifically, the shape of the sealing element 4 matches the shape of the sealing groove to avoid the sealing element 4 being too large to be fully compressed and unable to form an effective seal, while also avoiding the sealing element 4 being too small, which would lead to excessive deformation, stress concentration, wear or extrusion of the sealing element 4, reducing its lifespan and reliability.
[0036] Specifically, the sealing element 4 is an elastic sealing ring. After the light-transmitting plate 2 is engaged with the sealing groove, the elastic sealing ring can fill the gap between the light-transmitting plate 2 and the sealing groove. When the elastic sealing ring is subjected to pressure between the light-transmitting plate 2 and the sealing groove, it is compressed and deformed, thereby filling the gap between the light-transmitting plate 2 and the sealing groove, so that a sealed connection is formed between the light-transmitting plate 2 and the sealing element 4, preventing external gas and water molecules from entering the cavity 1; and the elastic sealing ring can also mitigate the impact and vibration on the light-transmitting plate 2, preventing stress concentration from causing the light-transmitting plate 2 to crack.
[0037] In a possible implementation, the opening structure is provided with a locking member 5 and a cover plate 6 detachably connected to the locking member 5. The locking member 5 and the cover plate 6, when connected, form a locking position, and a sealing member 4 is disposed at the locking position. The light-transmitting plate 2 is sealed and locked into the locking position by the sealing member 4. Thus, through the cooperation of the locking member 5, the cover plate 6, and the sealing member 4, the light-transmitting plate 2 can be fixed and sealed, enabling quick assembly and disassembly of the light-transmitting plate 2, facilitating the replacement of the light-transmitting plate 2 and the placement of the sample to be photolithographically processed. Understandably, the dimensions of the locking position and the sealing member 4 can be adjusted according to the dimensions and thickness of the light-transmitting plate 2. The dimensions of the locking position can be adjusted by adjusting the distance between the cover plate 6 and the locking member 5.
[0038] In a possible implementation, the cover plate 6 is provided with a window area, see reference. Figure 2 The window area is positioned opposite to the sample support structure 3, exposing both the light incident area of the light-transmitting plate 2 and the sample support structure 3. The lithography light can sequentially pass through the window area and the light-transmitting plate 2 to illuminate the area to be lithographic on the surface of the sample, eliminating the need to move the sample during the lithography process. Specifically, the size of the window area is greater than or equal to the size of the sample to be lithographic, and smaller than the size of the light-transmitting plate 2, ensuring that the cover plate 6, when placed on the light-transmitting plate 2, can fix the light-transmitting plate 2 while allowing the lithography light to pass through.
[0039] Specifically, the size of the cover plate 6 matches the size of the opening structure, so that the cover plate 6 can be placed in the opening structure and connected to the locking member 5.
[0040] Specifically, a sealing structure is provided between the cover plate 6 and the opening structure. After the cover plate 6 is connected to the locking member 5, the sealing structure seals the connection between the cover plate 6 and the opening structure, which helps to enhance the sealing performance of the photolithography sample carrier. In one example, the sealing structure is selectively provided on both the cover plate 6 and the opening structure. In another example, a sealing structure is provided at the connection positions of the cover plate 6 and the opening structure.
[0041] In a possible implementation, the sealing member 4 has a groove, and the edge of the light-transmitting plate 2 is sealed to the groove. The sealing member 4 is sandwiched between the retaining member 5 and the cover plate 6. In this way, after the retaining member 5 is connected to the cover plate 6, the edge of the light-transmitting plate 2 can be in close contact with the sealing member 4 to form a sealed connection. By accommodating the edge of the light-transmitting plate 2 through the groove of the sealing member 4, it is possible to avoid the edge of the light-transmitting plate 2 from contacting the cover plate 6 and the retaining member 5, thereby avoiding stress concentration at the edge of the light-transmitting plate 2 and preventing cracking at the corners of the light-transmitting plate 2. This is beneficial to reducing the impact and vibration on the light-transmitting plate 2.
[0042] In a possible implementation, a first sealing element 8 is provided between the edge of the light-transmitting plate 2 and the cover plate 6, and a second sealing element 9 is provided between the edge of the light-transmitting plate 2 and the locking element 5. After the cover plate 6 and the locking element 5 are connected, the first sealing element 8 and the second sealing element 9 achieve a sealed connection between the cover plate 6, the light-transmitting plate 2, and the locking element 5. (Reference) Figure 3 The cover plate 6, the first sealing element 8, the light-transmitting plate 2, the second sealing element 9 and the locking element 5 are connected to achieve the sealing of the cavity 1, thus facilitating the individual disassembly and replacement of each component.
[0043] In some embodiments, the positioning member 5 is a protruding structure fixedly connected to the inner wall of the cavity 1, and the edge of the light-transmitting plate 2 can be stacked on top of the positioning member 5 so that the light-transmitting plate 2 is arranged parallel to the surface of the sample carrying structure 3. In other embodiments, the positioning member 5 is detachably connected to the inner wall of the cavity 1 for placing the light-transmitting plate 2 and adjusting the distance between the light-transmitting plate 2 and the sample carrying structure 3.
[0044] In some embodiments, the locking elements 5 are spaced apart around the edge of the opening structure; in other embodiments, the locking elements 5 are arranged in a ring around the edge of the opening structure.
[0045] In a possible implementation, the inner wall of the cavity 1 is provided with locking grooves spaced apart in the height direction, and the locking grooves are detachably connected to the locking components 5. Thus, through the connection between the locking grooves and the locking components 5, the height of the locking components 5 within the cavity 1 can be adjusted, thereby adjusting the distance between the light-transmitting plate 2 and the sample support structure 3, so that the distance between the surface of the sample to be lithographicated and the light-transmitting plate 2 matches the objective lens magnification, satisfying the working distance of the lithography machine objective lens system.
[0046] Specifically, the height of the positioning component 5 within the cavity 1 can be adjusted according to the thickness and refractive index of the light-transmitting plate 2. Understandably, the distance between the light-transmitting plate 2 and the sample to be lithographically etched on the sample support structure 3 is the propagation distance of the lithography light in the gas environment within the cavity 1. The lithography light passes through the light-transmitting plate 2 and illuminates the surface of the sample to be lithographically etched within the cavity 1. The refractive index and thickness of the light-transmitting plate 2 affect the propagation path of the lithography light within the light-transmitting plate 2, thereby affecting the optical path length of the lithography light within the light-transmitting plate 2. By combining the refractive index and thickness of the light-transmitting plate 2 with the gas environment required for lithography of the sample to be lithographically etched, the propagation distance of the lithography light in the gas environment within the cavity 1 can be adjusted, thereby compensating for the refractive index of the gas within the cavity 1 and improving the accuracy of refractive index compensation.
[0047] In a possible implementation, the photolithography sample carrier further includes a fastener 7. The cover plate 6 and the locking member 5 are detachably connected by the fastener 7, which is used to fix the cover plate 6, the light-transmitting plate 2, and the locking member 5. After the sealing member 4 is installed in the space between the cover plate 6 and the locking member 5, a mounting cavity is formed between the sealing member 4, the inner wall of the cavity 1, the cover plate 6, and the locking member 5. The mounting cavity is isolated from the cavity 1. One end of the fastener 7 passes through the cover plate 6 and the mounting cavity and is fixedly connected to the locking member 5. By setting the fastener 7, the cover plate 6, the sealing member 4, and the light-transmitting plate 2 can be quickly installed and removed, facilitating the individual replacement of each component. The mounting cavity is isolated from the cavity 1, avoiding affecting the sealing performance of the cavity 1.
[0048] Specifically, the photolithography sample carrier includes at least two fasteners 7, which are spaced apart around the light-transmitting plate 2; preferably, the photolithography sample carrier includes four fasteners 7, which are arranged opposite to each other around the light-transmitting plate 2, so that the surface of the light-transmitting plate 2 can be adjusted relative to the ideal plane by the fasteners 7, thereby reducing the deviation, eliminating optical aberrations, and helping to reduce photolithography errors and defects.
[0049] In a possible implementation, the cover plate 6 is provided with a first positioning hole, the locking member 5 is provided with a second positioning hole, and one end of the fastener 7 passes through the first positioning hole and the mounting cavity in sequence and is fixedly connected to the second positioning hole.
[0050] In a possible implementation, the fastener 7 is threadedly connected to the cover plate 6 and to the locking member 5; for example, the fastener 7 is a screw, and the inner walls of the first positioning hole and the second positioning hole are provided with threads that match the screw. The screw is rotated into the first positioning hole and the second positioning hole to fix the cover plate 6 and the locking member 5.
[0051] In a possible implementation, the surface of the sample support structure 3 is a friction surface 10, which contacts the sample to be lithographicated to fix the sample. (Refer to...) Figure 4 Thus, by providing a friction surface 10 on the sample support structure 3, the friction between the sample support structure 3 and the sample to be lithographicated can be increased. Compared with the existing technology that uses vacuum adsorption and mechanical clamping to fix the sample to be lithographicated, the method provided in this embodiment is simple to operate and does not require contact with the lithographic surface of the sample to be lithographicated, which can prevent the sample to be lithographicated from moving during the lithography process and avoid damage to the sample to be lithographicated.
[0052] In a possible implementation, the sample support structure 3 is a limiting groove, in which the sample to be lithographically etched is fixed and limited. The limiting groove can restrict the in-plane movement of the sample to be lithographically etched. Specifically, the shape of the limiting groove matches the edge of the sample to be lithographically etched, which can restrict the movement of the sample to be lithographically etched in the plane, avoid sample displacement caused by movement or vibration, and help improve the accuracy and efficiency of sample positioning and improve pattern precision.
[0053] In a possible implementation, the photolithography sample carrier further includes a vent hole communicating with the interior of the cavity 1, and a sealing plug sealed to the vent hole. Thus, the vent hole can be connected to a source of a preset gas, allowing the gas inside the cavity 1 to be replaced, filling the cavity 1 with the preset gas to form a preset gas atmosphere, and expelling oxygen and water molecules from the cavity 1. During the photolithography process, the sealing plug is sealed to the vent hole, ensuring that the sample to be photolithographically analyzed is isolated from the external environment. This allows a stable microenvironment balance to be established inside the photolithography sample carrier during the photolithography process, which is beneficial for improving the photolithography effect. The preset gas atmosphere inside the cavity 1 includes at least one of a nitrogen atmosphere, an argon atmosphere, a krypton atmosphere, a helium atmosphere, and a neon atmosphere. Optionally, the gas atmosphere inside the cavity 1 can be any one of a nitrogen atmosphere, an argon atmosphere, a krypton atmosphere, a helium atmosphere, and a neon atmosphere.
[0054] Understandably, the material of the sample to be photolithographically lithographically analyzed is prone to reacting with oxygen during exposure, and the photoresist expands after absorbing water, thus affecting the linewidth of the lithographic pattern. When the sealed cavity 1 contains a preset gas atmosphere, oxidation and side reactions of the material of the sample to be photolithographically analyzed can be effectively avoided, ensuring lithographic precision and accurate pattern transfer.
[0055] In possible implementations, the shape and size of cavity 1 can be adjusted according to the size of the sample to be lithographicated to meet the size requirements of various lithography materials. Specifically, the shape of cavity 1 can be one of a polygonal prism, a cylinder, and an elliptical cylinder, wherein the polygonal prism can be a cuboid, a cube, a pentagonal prism, or a hexagonal prism, etc. Alternatively, in other embodiments, the shape of cavity 1 can be irregular, and other components of the lithography sample carrier can be adapted to meet the sealing requirements of an irregularly shaped cavity 1.
[0056] Specifically, the dimensions of cavity 1 can be adjusted according to the lithography equipment used in the actual application to meet the lithography requirements of various lithography equipment and expand the applicability of the lithography sample carrier. The shape and size of the light-transmitting plate 2 can be adjusted according to the size of the sample to be lithographicated to meet the size requirements of various lithography materials.
[0057] The following describes specific embodiments of this application in conjunction with the aforementioned photolithography sample carrier. The following embodiments further illustrate the technical solutions of this application. These embodiments are for illustrative purposes only, as various modifications and variations within the scope of the disclosure of this application will be apparent to those skilled in the art.
[0058] Example 1 This embodiment provides a photolithography sample carrier, including a cavity 1 with an open structure, a light-transmitting plate 2 detachably connected to the open structure, and a sample carrying structure 3 disposed opposite to the light-transmitting plate 2. The surface of the sample carrying structure 3 is a friction surface 10, which contacts the sample to be photolithographically lithographically lithographically 10 to fix the sample. A locking member 5 and a cover plate 6 are provided at the open structure. The locking member 5 and the cover plate 6 are connected to form a locking position. A sealing member 4 is provided at the locking position. The sealing member 4 has a locking groove. The edge of the light-transmitting plate 2 is sealed and fitted with the locking groove. The light-transmitting plate 2 is sealed and locked at the locking position by the sealing member 4. After the sealing member 4 is installed in the space between the cover plate 6 and the locking member 5, an installation cavity is formed between the sealing member 4, the inner wall of the cavity 1, the cover plate 6 and the locking member 5. The installation cavity is isolated from the cavity 1. One end of the fastener 7 passes through the cover plate 6 and the installation cavity and is fixedly connected to the locking member 5, and seals the cavity 1. The cover plate 6 is provided with a window area, which is positioned opposite to the sample support structure 3 and exposes the light incident area of the light-transmitting plate 2. The photolithography light can pass through the light incident area of the light-transmitting plate 2 to irradiate the sample to be photolithographically etched.
[0059] Using the photolithography sample carrier provided in this embodiment, the sample to be photolithographically etched is placed on the sample support structure 3 inside the cavity 1 through the opening structure of the cavity 1, thus fixing the sample to be photolithographically etched to the surface of the sample support structure 3. After the cover plate 6, sealing member 4, light-transmitting plate 2, and locking member 5 are connected and connected, the cavity 1 is sealed, and the atmosphere inside the cavity 1 is an argon atmosphere. During photolithography, the photolithography light shines through the light-transmitting plate 2 onto the sample to be photolithographically etched, exposing the sample to be photolithographically etched. During the photolithography process, a stable microenvironment balance can be constructed inside the sealed photolithography sample carrier, avoiding the volatilization of ketene generated during exposure, thereby ensuring that the development rate of the exposure units of the sample is the same, which is beneficial to improving the photolithography effect.
[0060] The technical features of the above embodiments can be combined in any way. For the sake of brevity, not all possible combinations of the technical features in the above embodiments are described. However, as long as there is no contradiction in the combination of these technical features, they should be considered to be within the scope of this specification.
[0061] The foregoing description has fully disclosed the specific embodiments of this application. It should be noted that any modifications made by those skilled in the art to the specific embodiments of this application do not depart from the scope of the claims. Accordingly, the scope of the claims of this application is not limited to the foregoing specific embodiments.
Claims
1. A photolithography sample carrier, characterized by, include: Cavity (1), the cavity (1) having an open structure; A light-transmitting plate (2) is detachably connected to the opening structure, and the light-transmitting plate (2) seals the cavity (1) after being connected to the opening structure. The sample support structure (3) is used to hold the sample to be photolithographically etched. It is located inside the cavity (1) and is positioned opposite to the light-transmitting plate (2). The photolithography light can pass through the light-transmitting plate (2) and irradiate the sample support structure (3).
2. The photolithography sample carrier of claim 1, wherein, The photolithography sample carrier also includes a seal (4), which seals the light-transmitting plate (2) and the opening structure.
3. The photolithography sample carrier of claim 2, wherein, The edge of the opening structure is provided with a sealing groove, and the sealing element (4) is embedded in the sealing groove. After the light-transmitting plate (2) is engaged with the sealing groove, a sealed connection is formed between the light-transmitting plate (2) and the sealing element (4).
4. The photolithography sample carrier of claim 2, wherein, A locking component (5) is provided at the opening structure, and the light-transmitting plate (2) is connected to the locking component (5).
5. The photolithography sample carrier of claim 4, wherein, The locking element (5) satisfies at least one of the following characteristics: The locking component (5) is a protruding structure that is fixedly connected to the inner wall of the cavity (1); The locking component (5) is detachably connected to the inner wall of the cavity (1); The locking elements (5) are spaced apart around the edge of the opening structure; The locking element (5) is distributed in a ring around the edge of the opening structure.
6. The photolithography sample carrier of claim 4, wherein, The photolithography sample carrier also includes a cover plate (6) that is detachably connected to the locking member (5). The locking member (5) and the cover plate (6) are connected to form a locking position, and the sealing member (4) is disposed at the locking position. The light-transmitting plate (2) is sealed and locked to the locking position by the sealing member (4).
7. The photolithography sample carrier of claim 6, wherein, The sealing element (4) is provided with a slot, the edge of the light-transmitting plate (2) is sealed and fitted with the slot, and the sealing element (4) is sandwiched between the locking element (5) and the cover plate (6).
8. The photolithography sample carrier of claim 4, wherein, The inner wall of the cavity (1) is provided with slots at intervals in the height direction, and the slots are detachably connected to the slotting member (5).
9. The photolithography sample carrier of claim 4, wherein, The locking component (5) is a protruding structure that is fixedly connected to the inner wall of the cavity (1); Alternatively, the locking member (5) can be detachably connected to the inner wall of the cavity (1).
10. The photolithography sample carrier of claim 6, wherein, The cover plate (6) is provided with a window area, which is disposed opposite to the sample support structure (3); And / or, The size of the windowed area is greater than or equal to the size of the sample to be photolithographically etched, and the size of the windowed area is smaller than the size of the light-transmitting plate (2).
11. The photolithography sample carrier of claim 6, wherein, It also includes fasteners (7), and the cover plate (6) and the locking member (5) are detachably connected by the fasteners (7); After the sealing element (4) is installed in the space between the cover plate (6) and the locking element (5), the sealing element, the inner wall of the cavity, the cover plate (6) and the locking element (5) form an installation cavity. The installation cavity is isolated from the cavity (1). One end of the fastener (7) passes through the cover plate (6) and the installation cavity and is fixedly connected to the locking element (5).
12. The photolithography sample carrier of any one of claims 1-3, wherein, The surface of the sample support structure (3) is a friction surface (10), and the friction surface (10) contacts the sample to be photolithographically etched to fix the sample to be photolithographically etched. Alternatively, the sample support structure (3) is a limiting groove, in which the sample to be photolithographically lithographically oriented is fixed and positioned, and the limiting groove can restrict the in-plane movement of the sample to be photolithographically oriented.
13. The photolithography sample carrier of any one of claims 1-3, wherein, The photolithography sample carrier also includes a vent hole communicating with the interior of the cavity (1) and a sealing plug that is sealed to the vent hole.
14. The photolithography sample carrier of any one of claims 1-3, wherein, The light-transmitting plate (2) is provided with a functional layer, which is an anti-reflective layer or a protective layer.
15. The photolithography sample carrier of any one of claims 1-3, wherein, The cavity (1) is shaped like one of a polygonal prism, a cylinder, or an elliptical cylinder.
16. The photolithography sample carrier of any one of claims 1-3, wherein, The gas atmosphere inside the cavity (1) is any one of nitrogen atmosphere, argon atmosphere, krypton atmosphere, helium atmosphere and neon atmosphere.