Chemical vapor deposition furnace tail gas treatment device

Abstract

The utility model discloses a chemical vapor deposition furnace tail gas treatment device, including the filter unit for filtering fixed impurity, the spray unit for absorbing HCl and the adsorption unit for gas adsorption that communicate in proper order, is provided with the gas end on the adsorption unit, the filter unit includes filter jar and sets up the ceramic filter core in the filter jar, and the filter jar is provided with the air pipe, the tail gas treatment device of the utility model is through setting filter unit, spray unit and adsorption unit in proper order, and the HCl and solid particle etc.

Description

Technical Field

[0001] This utility model belongs to the field of exhaust gas treatment technology, and in particular relates to an exhaust gas treatment device for a chemical vapor deposition furnace. Background Technology

[0002] Chemical vapor deposition (CVD) technology is widely used in the preparation of ultra-high temperature ceramic coatings on carbon-carbon composite materials. This technology achieves dense growth of the coating material on the substrate surface through the decomposition and deposition of reactive gases under high-temperature conditions, thereby endowing carbon-carbon composite materials with excellent oxidation and ablation resistance. However, while CVD improves material performance, the problem of exhaust gas treatment generated during the process is becoming increasingly prominent. The exhaust gas generated during the CVD ultra-high temperature ceramic coating process has a complex composition, including various gases and particulate matter such as HCl, alkanes, tar, and chlorine. Among them, HCl is extremely corrosive. If not handled properly, it can not only corrode critical components such as equipment pipelines and valves, shortening equipment lifespan and increasing equipment replacement and maintenance costs, but also pollute the surrounding environment, threaten the health of operators, and may even cause safety accidents.

[0003] Currently, most traditional exhaust gas treatment devices only employ simple water or alkaline absorption methods. However, this approach is significantly inadequate when treating acidic gases such as HCl, resulting in incomplete absorption and making it difficult to meet emission standards. Furthermore, traditional treatment devices are ineffective at filtering solid particles in the exhaust gas, failing to effectively intercept particles such as ceramic particles and condensed powder. These solid particles gradually accumulate in subsequent treatment equipment, exhaust gas pipelines, and vacuum pumps, not only affecting the normal operation of the equipment but also potentially causing system blockages, thereby impacting the stability of the CVD process and the deposition quality. Utility Model Content

[0004] The purpose of this invention is to overcome the shortcomings of the prior art and provide a chemical vapor deposition furnace tail gas treatment device. This tail gas treatment device, by sequentially connecting a filtration unit, a spray unit, and an adsorption unit, thoroughly filters and absorbs HCl and solid particles in the tail gas of the chemical vapor deposition furnace, solving the problems of incomplete HCl absorption, poor solid particle filtration leading to substandard emissions, and equipment blockage caused by traditional treatment devices.

[0005] To achieve the above objectives, the technical solution adopted by this utility model is: a chemical vapor deposition furnace tail gas treatment device, comprising a filter unit for filtering and fixing impurities, a spray unit for absorbing HCl, and an adsorption unit for gas adsorption connected in sequence, wherein the adsorption unit is provided with an outlet end. The filtration unit includes a filter canister and a ceramic filter element disposed inside the filter canister, and an air inlet pipe is provided on the filter canister.

[0006] In the above-mentioned chemical vapor deposition furnace tail gas treatment device, the busbar of the gas inlet pipe is tangent to the cross-section of the filter tank, and a guide plate is provided inside the filter tank. The guide plate extends upward in a spiral shape to form a spiral guide channel.

[0007] In the above-mentioned chemical vapor deposition furnace tail gas treatment device, an annular baffle is provided inside the filter tank, and a slot is provided in the center of the annular baffle. The ceramic filter element passes through the slot. The filter tank is divided into a first filter chamber and a second filter chamber by the annular baffle and the ceramic filter element. The air inlet pipe is connected to the first filter chamber. The guide plate is located in the first filter chamber. The second filter chamber is connected to the spray unit. A rubber ring is provided on the inner side of the slot and fits against the outer side of the ceramic filter element.

[0008] In the above-mentioned chemical vapor deposition furnace tail gas treatment device, a connecting rod is provided on the top of the ceramic filter element, a spherical limiting block is provided on the top of the connecting rod, a limiting frame is provided on the top of the second filter chamber, and a hemispherical through hole matching the spherical limiting block is opened on the limiting frame. The spherical limiting block is locked in the hemispherical through hole, and the ceramic filter element is suspended in the filter tank. Multiple sets of ultrasonic vibrators are provided on the ceramic filter element.

[0009] The above-mentioned chemical vapor deposition furnace tail gas treatment device includes a spray unit comprising a spray box and a spray platform extending through the top of the spray box. The bottom of the spray platform is provided with multiple sets of nozzles, and the spray direction of the nozzles is downward. Both ends of the spray box are provided with connection ports, and the two connection ports are respectively connected to the gas outlet of the filter tank and the gas inlet of the adsorption unit. Both ends of the spray box cavity are respectively provided with buffer zones, and the buffer zones are respectively connected to the connection ports. The buffer zone consists of two baffles, which are fixedly connected to the top and bottom of the spray box cavity, respectively, so that the two baffles form an air passage. The baffle fixedly connected to the bottom of the spray box cavity is closer to the connection port, and the baffle fixedly connected to the bottom of the spray box cavity has an inclined surface on the side away from the connection port.

[0010] In the above-mentioned chemical vapor deposition furnace tail gas treatment device, the top of the spray box is embedded with a bearing for connecting the spray table, and the top of the spray table extends out of the bearing; a limit plate is fixed at the top of the spray table, and a power mechanism is provided on the limit plate for rotating the spray table.

[0011] In the above-mentioned chemical vapor deposition furnace tail gas treatment device, the bottom of the limiting plate is provided with a plurality of ball bearings, the lower end of the limiting plate is provided with a limiting bracket, the limiting bracket is provided with a rolling groove, and the ball bearings are locked in the rolling groove. The power mechanism includes a rotary motor and a second pulley disposed at the shaft end of the rotary motor. A first pulley is disposed on the limiting plate. The first pulley and the second pulley are connected by a belt. The spray box is provided with a mounting bracket for supporting the rotary motor.

[0012] The above-mentioned chemical vapor deposition furnace tail gas treatment device includes a collection funnel at the bottom of the spray box, a filter screen inside the collection funnel, and storage tanks for storing absorbent liquid on both sides of the spray box. One storage tank is connected to an external liquid supply device and the spray table, and the other storage tank is connected to the collection funnel and the spray table. Each storage tank is equipped with a pH sensor and a liquid level sensor.

[0013] The above-mentioned chemical vapor deposition furnace tail gas treatment device further includes a support frame for placing a filter unit, a spray unit and an adsorption unit. The adsorption unit includes an adsorption frame and an activated carbon adsorption column disposed within the adsorption frame. An inlet sleeve is provided at the top of the activated carbon adsorption column and an outlet sleeve is provided at the bottom. The inlet sleeve is connected to the spray unit.

[0014] This utility model has the following advantages compared with the prior art: 1. This utility model, by setting up a filtration unit, a spray unit and an adsorption unit connected in sequence, can thoroughly filter and absorb HCl and solid particles in the tail gas of a chemical vapor deposition furnace, avoiding problems such as substandard emissions and equipment blockage.

[0015] 2. This utility model sets the filter unit as a structure of ceramic filter element combined with spiral guide plate and annular baffle. Combined with the tangential connection between the air inlet pipe and the cross-section of the filter tank, the exhaust gas diffuses along the inner wall and rises through the spiral guide channel. Solid particles are initially separated under the action of centrifugal force, and then the exhaust gas is finely filtered through the ceramic filter element. The ceramic filter element is set in a suspended manner and dynamically sealed by a rubber ring. At the same time, a high-frequency ultrasonic vibrator is integrated to work periodically, which can effectively peel off the attached particles and significantly reduce the risk of filter element blockage. It greatly improves the solid impurity interception efficiency and avoids blockage of subsequent processing units, exhaust pipe and vacuum pump due to particle accumulation.

[0016] 3. This utility model features a rotatable spray table that sprays water downwards, combined with a baffle structure in the buffer zone, so that the water spray direction is perpendicular to the exhaust gas flow direction, significantly increasing the gas-liquid contact area. At the same time, by installing a pH sensor and a liquid level sensor in the storage tank, the concentration of the absorbent is ensured to be stable, achieving efficient absorption of HCl and avoiding non-compliance with emission standards.

[0017] 4. The adsorption unit of this utility model uses an activated carbon adsorption column to deeply adsorb organic matter such as alkanes and tar, further reducing the content of organic pollutants in the exhaust gas; the collection funnel at the bottom of the spray box, together with the filter screen, can filter the absorbent after spraying to remove solid impurities. The purified absorbent is returned to the storage tank through the pipeline for recycling, which extends the single replenishment cycle, reduces consumption, and lowers operating costs; in summary, this exhaust gas treatment device achieves efficient and synergistic purification of multiple harmful components in the exhaust gas of chemical vapor deposition furnace.

[0018] The technical solution of this utility model will be further described in detail below with reference to the accompanying drawings and embodiments. Attached Figure Description

[0019] Figure 1 This is a schematic diagram of the exhaust gas treatment device of this utility model.

[0020] Figure 2 This is a schematic diagram of the disassembled exhaust gas treatment device of this utility model.

[0021] Figure 3 This is a cross-sectional view of the filter unit of this utility model.

[0022] Figure 4 This is an exploded cross-sectional view of the filter unit of this utility model.

[0023] Figure 5 This is an exploded view of the spray unit of this utility model.

[0024] Figure 6 for Figure 5 Enlarged view of point A.

[0025] Figure 7 This is a cross-sectional view of the spray unit of this utility model.

[0026] Explanation of reference numerals in the attached figures: Detailed Implementation

[0027] Example 1 like Figure 1 and Figure 2 As shown, the exhaust gas treatment device of this embodiment includes a filter unit for filtering and fixing impurities, a spray unit for absorbing HCl, and an adsorption unit for gas adsorption, which are connected in sequence. The adsorption unit is provided with an outlet end. The filtration unit includes a filter canister 201 and a ceramic filter element 202 disposed inside the filter canister 201. An air inlet pipe 203 is provided on the filter canister 201.

[0028] In actual use, in this embodiment, the filtration unit, spray unit, and adsorption unit are connected in sequence. An air inlet pipe 203 is provided on the filtration unit, and an air outlet is provided on the adsorption unit, so that the three units are connected to form an exhaust gas treatment path. Through this series layout, the exhaust gas passes through three treatment stages of filtration, absorption and adsorption in sequence, ensuring that solid impurities, acidic gases and organic pollutants in the exhaust gas are treated step by step. By installing a ceramic filter element 202 inside the filter tank 201, the porous structure of the ceramic filter element 202 is used to intercept solid impurities such as ceramic particles and condensed powder in the exhaust gas, preventing these impurities from entering the subsequent treatment unit and affecting the treatment effect and normal operation of the equipment. It should be noted that variable frequency fans are installed at the connection points of each unit in this embodiment, which can effectively promote the circulation of exhaust gas in the entire exhaust gas treatment device.

[0029] like Figure 3 As shown, further, in this embodiment, the busbar of the air intake pipe 203 is tangent to the cross-section of the filter canister 201, and a guide plate 204 is provided inside the filter canister 201. The guide plate 204 extends upward in a spiral shape to form a spiral guide channel.

[0030] In actual use, in this embodiment, the generatrix of the intake pipe 203 is set to be tangent to the cross-section of the filter canister 201, so that after the exhaust gas enters the filter canister 201 through the intake pipe 203, it diffuses along the inner wall of the filter canister 201 and forms a swirling motion. During the swirling motion, large particulate solid impurities in the exhaust gas are thrown towards the inner wall of the filter canister 201 under the action of centrifugal force and slide down to the bottom along the inner wall, realizing the initial separation of large particulate impurities and reducing the filtration burden of the ceramic filter element 202. By setting a spiral upward-extending guide plate 204, the exhaust gas is guided to spiral upward in the filter canister 201, prolonging the residence time of the exhaust gas in the filter canister 201, so that solid impurities have more time to separate from the exhaust gas under the action of centrifugal force and gravity; at the same time, the exhaust gas is more evenly distributed in the filter canister 201, ensuring that the filtration load at all parts of the ceramic filter element 202 is relatively balanced, improving filtration efficiency and filter element service life. Preferably, in this embodiment, the bottom of the filter tank 201 is a conical funnel shape, and a slag discharge valve is provided at the bottom end; the conical funnel shape of the collection area facilitates the falling of impurities to the bottom end of the filter tank 201, and the slag discharge valve is opened to discharge the collected impurities, so as to avoid the accumulation of impurities in the filter tank 201 and affect the separation efficiency. Preferably, in this embodiment, multiple sets of back-blowing nozzles and high-pressure airflow devices are evenly distributed around the filter tank 201, which can spray high-pressure airflow to blow ceramic particles and other impurities deposited on the guide plate 204 down the surface of the guide plate 204 to the bottom collection area, thereby enhancing the dust removal effect, ensuring the smooth flow channel, and extending the continuous operation cycle of the equipment.

[0031] like Figure 3 and Figure 4 As shown, further, in this embodiment, an annular partition 205 is provided inside the filter tank 201. The annular partition 205 has a groove 207 at its center. The ceramic filter element 202 passes through the groove 207. The filter tank 201 is divided into a first filter chamber and a second filter chamber by the annular partition 205 and the ceramic filter element 202. The air inlet pipe 203 is connected to the first filter chamber. The guide plate 204 is located inside the first filter chamber. The second filter chamber is connected to the spray unit. A rubber ring 208 is provided on the inner side of the groove 207 and fits against the outer side of the ceramic filter element 202.

[0032] In practical use, this embodiment divides the filter tank 201 into a first filter chamber for storing unfiltered exhaust gas and a second filter chamber for storing filtered exhaust gas by setting an annular baffle 205 inside the filter tank 201 and setting a ceramic filter element 202 through the slot 207. This allows the unfiltered exhaust gas and the filtered exhaust gas to flow in different areas, avoiding mixing and ensuring the filtration effect. The first filter chamber is used to accommodate the unfiltered exhaust gas entering from the air inlet pipe 203 and allows the exhaust gas to undergo preliminary separation and filtration under the guidance of the guide plate 204. After the solid impurities in the exhaust gas are finely filtered by the porous structure of the ceramic filter element 202, it enters the second filter chamber. The ceramic filter element 202 ensures that the exhaust gas entering the second filter chamber reaches a certain level of cleanliness, preparing it for subsequent delivery to the spray unit. By setting the rubber ring 208 to fit against the outside of the ceramic filter element 202, a sealing effect is achieved, preventing unfiltered exhaust gas from bypassing the ceramic filter element 202 and directly entering the second filtration chamber, ensuring that only exhaust gas filtered by the ceramic filter element 202 can enter the second filtration chamber; at the same time, the rubber ring 208 has a certain degree of elasticity, which can adapt to the slight deformation of the ceramic filter element 202 caused by temperature changes during operation, ensuring the stability of the sealing effect.

[0033] like Figure 3 and Figure 4 As shown, further, in this embodiment, a connecting rod 206 is provided at the top of the ceramic filter element 202, a spherical limiting block 209 is provided at the top of the connecting rod 206, a limiting frame 210 is provided at the top of the second filter chamber, and a hemispherical through hole 211 matching the spherical limiting block 209 is opened on the limiting frame 210. The spherical limiting block 209 is locked in the hemispherical through hole 211, and the ceramic filter element 202 is suspended in the filter tank 201; multiple sets of ultrasonic vibrators are provided on the ceramic filter element 202.

[0034] In actual use, in this embodiment, a connecting rod 206 with a spherical limiting block 209 is provided on the top of the ceramic filter element 202, and a limiting frame 210 with a hemispherical through hole 211 matching the spherical limiting block 209 is provided on the top of the second filter chamber, so that the ceramic filter element 202 is suspended in the filter tank 201 and can swing to a certain extent; when there are many impurities attached to the surface of the ceramic filter element 202, the ceramic filter element 202 can swing under the action of airflow, which helps to shake off the impurities on the surface, prevent the filter element from clogging, and maintain the filtration effect; By setting multiple sets of ultrasonic vibrators on the ceramic filter element 202, the surface of the ceramic filter element 202 can generate minute vibrations, which enhances the removal effect of impurities attached to the surface of the ceramic filter element 202, ensures that the pores of the ceramic filter element 202 are unobstructed, maintains a high filtration efficiency, and extends the service life of the filter element.

[0035] like Figure 5 and Figure 7 As shown, further, in this embodiment, the spraying unit includes a spray box 301 and a spray platform 304 extending through the top of the spray box 301. The bottom of the spray platform 304 is provided with multiple sets of nozzles, and the spraying direction of the nozzles is downward. Both ends of the spray box 301 are provided with connection ports 302, and the two connection ports 302 are respectively connected to the air outlet of the filter tank 201 and the air inlet of the adsorption unit. Both ends of the cavity of the spray box 301 are respectively provided with buffer zones, and the buffer zones are respectively connected to the connection ports 302. The buffer zone consists of two baffles 303, which are fixedly connected to the top and bottom of the spray box 301 cavity, respectively, so that the two baffles 303 form an air passage. The baffle 303 fixedly connected to the bottom of the spray box 301 cavity is closer to the connection port 302, and the baffle 303 fixedly connected to the bottom of the spray box 301 cavity has an inclined surface on the side away from the connection port 302.

[0036] In practical use, this embodiment uses a downward-facing spray platform 304 at the top of the spray box 301 to remove acidic gases from the exhaust gas. Multiple spray nozzles ensure that the absorbent liquid evenly covers the exhaust gas, allowing the acidic gases in the exhaust gas to fully react with the absorbent liquid (NaOH solution), thus improving the absorption effect. Connection ports 302 are provided at both ends of the spray box 301, connecting to the filter tank 201 and the adsorption unit respectively, enabling exhaust gas transmission with the pre- and post-treatment units. Buffer zones connected to the connection ports 302 are provided at both ends of the spray box 301 cavity to buffer and adjust the exhaust gas speed and flow direction, allowing the exhaust gas to enter the area below the spray platform 304 more evenly and fully contact the absorbent liquid. Two baffles 303 forming a buffer zone are fixedly connected to the top and bottom of the spray box 301 cavity, respectively, so that the two baffles 303 form an air passage to restrict the flow path of the exhaust gas. Among them, the baffle 303 fixedly connected to the bottom of the spray box 301 cavity is closer to the connection port 302, and the side away from the connection port 302 is provided with an inclined surface, which can ensure that the exhaust gas is absorbed and treated under the spray table, ensuring the absorption effect, and can guide the liquid generated during the spraying process to flow to the bottom of the spray box 301, preventing the liquid from accumulating in the buffer zone and affecting the normal flow of the exhaust gas; at the same time, it helps the liquid to collect at the bottom of the spray box 301, which is convenient for liquid collection and subsequent treatment. By combining the downward spray direction of the nozzles with the direction of the exhaust gas flow, the vertical and staggered spraying method allows the absorbent liquid and the exhaust gas to come into full contact, increasing the gas-liquid contact area and improving the absorption efficiency of acidic gases such as HCl.

[0037] like Figure 7 As shown, further, in this embodiment, the top of the spray box 301 is embedded with a bearing for connecting the spray table 304, and the top of the spray table 304 protrudes from the bearing; the top of the spray table 304 is fixed with a limiting plate 305, and a power mechanism is provided on the limiting plate 305 for rotating the spray table 304.

[0038] In actual use, in this embodiment, the spray table 304 is made to rotate by setting bearings, and a power mechanism is set to drive the spray table 304 to rotate, adjust the spray direction and coverage of the nozzles, so that the contact between the absorbent liquid and the exhaust gas is more sufficient, and improve the absorption efficiency of acidic gases such as HCl.

[0039] like Figure 6 As shown, further, in this embodiment, the bottom of the limiting plate 305 is provided with a plurality of balls 307, the lower end of the limiting plate 305 is provided with a limiting bracket 306, the limiting bracket 306 is provided with a rolling groove 308, and the balls 307 are engaged in the rolling groove 308. The power mechanism includes a rotary motor 402 and a second pulley 403 disposed at the shaft end of the rotary motor 402. A first pulley 401 is disposed on the limiting plate 305. The first pulley 401 and the second pulley 403 are connected by a belt. A mounting bracket for supporting the rotary motor 402 is disposed on the spray box 301.

[0040] In practical use, in this embodiment, by setting ball bearings 307 between the limiting plate 305 and the limiting bracket 306, the spray table 304 rotates more smoothly, reducing frictional resistance and energy consumption while ensuring the stability of the spray table 304's rotation. By setting a second pulley 403 at the shaft end of the rotating motor 402 and a first pulley 401 on the limiting plate 305, the spray table 304 is driven to rotate via belt transmission. This transmission method has a simple structure, smooth transmission, and facilitates control of the rotation speed of the spray table 304. The spray table 304 maintains rotation during the spraying process, forming a rotating spraying effect.

[0041] like Figure 7 As shown, further, in this embodiment, a collection funnel 309 is provided at the bottom of the spray box 301, and a filter screen is provided inside the collection funnel 309. Both sides of the spray box 301 are provided with storage tanks 404 for storing absorbent liquid. One storage tank 404 is connected to the external liquid supply equipment and the spray table 304, and the other storage tank 404 is connected to the collection funnel 309 and the spray table 304. Each storage tank 404 is provided with a pH sensor and a liquid level sensor.

[0042] In actual use, in this embodiment, a collection funnel 309 is set at the bottom of the spray box 301 to collect the liquid generated during the spraying process; a filter screen is set in the collection funnel 309 to filter the collected liquid, separate the solid impurities that may be carried in the liquid, prevent the impurities from entering the subsequent liquid circulation system, ensure the cleanliness of the absorbent liquid, avoid the impurities from damaging the device, and at the same time help improve the recycling effect of the absorbent liquid. By installing storage tanks 404 on both sides of the spray box 301 to store absorbent liquid, one storage tank 404, connected to an external liquid supply device and the spray table 304, is used to replenish fresh absorbent liquid. In actual use, the absorbent liquid is supplied to the spray table 304 through the storage tank 404, and the absorbent liquid is sprayed into the spray box 301. The other storage tank 404 is connected to the collection funnel 309 and the spray table 304 to collect the liquid generated after spraying, and transport the collected liquid to the spray table 304 for spraying, thus achieving absorption. The liquid is collected and recycled, reducing processing costs. The two liquid storage tanks 404 are independent, ensuring that the liquid storage tank 404 connected to the external liquid supply equipment always contains fresh absorbent liquid that has not absorbed the exhaust gas. Water pumps are provided between the two liquid storage tanks 404 and the external liquid supply equipment, collection funnel, and spray table 304 to provide transportation power. Preferably, in this embodiment, a controller is provided, which is connected to the control terminals of the two liquid storage tanks 404 to realize that the two liquid storage tanks 404 alternately supply liquid to the spray table 304. A pH sensor and a liquid level sensor are installed in the storage tank 404. The pH sensor monitors the acidity and alkalinity of the absorbent in real time. When the pH value of the absorbent drops to a certain level, it indicates that the absorbent's ability to absorb acidic gases has decreased, and fresh absorbent is added. The liquid level sensor monitors the liquid level in the storage tank 44 in real time. When the liquid level is lower than the set value, absorbent is added to ensure that the spraying process can continue stably and guarantee the absorption effect of the exhaust gas. In this embodiment, the liquid level sensor is a PLS9600 / PLS960 liquid level sensor, and the pH sensor is an InPro 4800i pH sensor.

[0043] like Figure 1 and Figure 2 As shown, in this embodiment, the exhaust gas treatment device further includes a support frame 101 for placing the filter unit, the spray unit and the adsorption unit. The adsorption unit includes an adsorption frame 501 and an activated carbon adsorption column 502 disposed in the adsorption frame 501. The activated carbon adsorption column 502 is provided with an air inlet sleeve 503 at the top and an air outlet sleeve 504 at the bottom. The air inlet sleeve 503 is connected to the spray unit.

[0044] In practical use, this embodiment uses a support frame 101 to house the filter unit, spray unit, and adsorption unit, and an adsorption frame 501 to provide an installation and support structure for the activated carbon adsorption column 502. An inlet sleeve 503 is installed at the top of the activated carbon adsorption column 502 to connect with the spray unit and receive the exhaust gas treated by the spray unit. An outlet sleeve 504 is installed at the bottom of the activated carbon adsorption column 502 to discharge the treated exhaust gas to the outside. The activated carbon adsorption column 502 is filled with activated carbon with a rich microporous structure. These micropores can adsorb organic pollutants such as alkanes and tar in the exhaust gas, deeply purifying the spray-treated exhaust gas, further reducing the content of organic pollutants in the exhaust gas, enabling the exhaust gas to meet emission standards, and reducing environmental pollution.

[0045] The method of using this utility model is as follows: the tail gas of the chemical vapor deposition furnace enters the first filter chamber of the filter tank 201 through the air inlet pipe 203, flows upward along the guide plate 204, and after passing through the ceramic filter element 202 to remove solid impurities such as ceramic particles and condensed powder in the tail gas, it enters the connection port 302 of the spray box 301 through the second filter chamber. After the flow direction and flow rate are adjusted by the buffer zone, it mixes with the absorbent sprayed from the spray table 304, and then enters the activated carbon adsorption column 502 of the adsorption unit through the other buffer zone to remove organic pollutants such as alkanes and tar in the tail gas, and is discharged through the gas outlet sleeve 504.

[0046] The above description is merely a preferred embodiment of the present utility model and does not constitute any limitation on the present utility model. Any simple modifications, alterations, or equivalent structural transformations made to the above embodiments based on the technical essence of the present utility model shall still fall within the protection scope of the present utility model.

Claims

1. A chemical vapor deposition furnace tail gas treatment device, characterized in that, It includes a filter unit for filtering and fixing impurities, a spray unit for absorbing HCl, and an adsorption unit for gas adsorption, which are connected in sequence. The adsorption unit is provided with an outlet end. The filtration unit includes a filter canister (201) and a ceramic filter element (202) disposed inside the filter canister (201), and an air inlet pipe (203) is provided on the filter canister (201).

2. The chemical vapor deposition furnace tail gas treatment device according to claim 1, characterized in that, The busbar of the air intake pipe (203) is tangent to the cross-section of the filter canister (201). A guide plate (204) is provided inside the filter canister (201). The guide plate (204) extends upward in a spiral shape to form a spiral guide channel.

3. The chemical vapor deposition furnace tail gas treatment device according to claim 2, characterized in that, The filter tank (201) is provided with an annular partition (205), and the annular partition (205) has a groove (207) in the center. The ceramic filter element (202) passes through the groove (207). The filter tank (201) is divided into a first filter chamber and a second filter chamber by the annular partition (205) and the ceramic filter element (202). The air inlet pipe (203) is connected to the first filter chamber. The guide plate (204) is located in the first filter chamber. The second filter chamber is connected to the spray unit. A rubber ring (208) is provided on the inner side of the groove (207) and fits against the outer side of the ceramic filter element (202).

4. The chemical vapor deposition furnace tail gas treatment device according to claim 3, characterized in that, The ceramic filter element (202) is provided with a connecting rod (206) at the top, and a spherical limiting block (209) is provided at the top of the connecting rod (206). The second filter chamber is provided with a limiting frame (210) at the top. The limiting frame (210) is provided with a hemispherical through hole (211) that matches the spherical limiting block (209). The spherical limiting block (209) is locked in the hemispherical through hole (211). The ceramic filter element (202) is suspended in the filter tank (201). The ceramic filter element (202) is provided with multiple sets of ultrasonic vibrators.

5. The chemical vapor deposition furnace tail gas treatment device according to claim 1, characterized in that, The spray unit includes a spray box (301) and a spray platform (304) extending through the top of the spray box (301). The bottom of the spray platform (304) is provided with multiple sets of nozzles, and the spray direction of the nozzles is downward. Both ends of the spray box (301) are provided with connection ports (302). The two connection ports (302) are respectively connected to the air outlet of the filter tank (201) and the air inlet of the adsorption unit. Both ends of the cavity of the spray box (301) are respectively provided with buffer zones, and the buffer zones are respectively connected to the connection ports (302). The buffer zone consists of two baffles (303), which are fixedly connected to the top and bottom of the spray box (301) cavity, respectively, so that the two baffles (303) form an air passage. The baffle (303) fixedly connected to the bottom of the spray box (301) cavity is closer to the connection port (302), and the baffle (303) fixedly connected to the bottom of the spray box (301) cavity has an inclined surface on the side away from the connection port (302).

6. The chemical vapor deposition furnace tail gas treatment device according to claim 5, characterized in that, The top of the spray box (301) is embedded with a bearing for connecting the spray table (304), and the top of the spray table (304) extends out of the bearing; a limit plate (305) is fixed at the top of the spray table (304), and a power mechanism is provided on the limit plate (305) for rotating the spray table (304).

7. The chemical vapor deposition furnace tail gas treatment device according to claim 6, characterized in that, The bottom of the limiting plate (305) is provided with a plurality of balls (307), and the lower end of the limiting plate (305) is provided with a limiting bracket (306). A rolling groove (308) is provided on the limiting bracket (306), and the balls (307) are engaged in the rolling groove (308). The power mechanism includes a rotating motor (402) and a second pulley (403) disposed at the shaft end of the rotating motor (402). A first pulley (401) is disposed on the limiting plate (305). The first pulley (401) and the second pulley (403) are connected by a belt. A mounting bracket for supporting the rotating motor (402) is disposed on the spray box (301).

8. The chemical vapor deposition furnace tail gas treatment device according to claim 5, characterized in that, The bottom of the spray box (301) is provided with a collection funnel (309), and a filter screen is provided inside the collection funnel (309). Both sides of the spray box (301) are provided with storage tanks (404) for storing absorbent liquid. One storage tank (404) is connected to the external liquid supply equipment and the spray table (304), and the other storage tank (404) is connected to the collection funnel (309) and the spray table (304). Each storage tank (404) is provided with a pH sensor and a liquid level sensor.

9. The chemical vapor deposition furnace tail gas treatment device according to claim 1, characterized in that, The exhaust gas treatment device also includes a support frame (101) for placing the filter unit, the spray unit and the adsorption unit. The adsorption unit includes an adsorption frame (501) and an activated carbon adsorption column (502) disposed in the adsorption frame (501). The activated carbon adsorption column (502) is provided with an air inlet sleeve (503) at the top and an air outlet sleeve (504) at the bottom. The air inlet sleeve (503) is connected to the spray unit.

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