A kind of TOPCON cell acid-base cleaning device

Abstract

The utility model provides a kind of TOPCON battery acid-base cleaning device, including cleaning machine box, the both sides of the partition board fixedly installed in the middle of cleaning machine box are slidably installed with undulating cleaner, each the undulating cleaner is fixed with the undulating hydraulic cylinder output end fixedly installed below the outside of cleaning machine box, undulating cleaner and the inner wall between the bottom of cleaning machine box are installed with corrugated cover;The cleaning machine box is fixedly installed on the rack, the propeller of the both ends rotationally installed in the inside of cleaning machine box is fixed with the drive motor output end fixedly installed outside cleaning machine box;The utility model forms closed loop liquid flow by partition board and propeller, undulating cleaner drives silicon wafer to move up and down, increase cleaning contact area and scouring force, cleaning is more thorough;Fixed structure avoids silicon wafer breakage, easy to operate, high efficiency, reduce the rate of defective products.

Description

Technical Field

[0001] This utility model belongs to the field of battery cleaning technology, and in particular relates to a TOPCON battery acid and alkali cleaning device. Background Technology

[0002] In the fabrication of TOPCON (Tunneling Oxide Passivated Contact) solar cells, the cleanliness of the silicon wafer surface plays a crucial role in the cell's performance. TOPCON cells achieve selective electron permeability and effective hole blocking by adding a layer of silicon dioxide to the silicon wafer surface. This significantly improves the cell's open-circuit voltage and fill factor, thereby greatly enhancing the cell's conversion efficiency. However, during fabrication, substances such as acids and alkalis inevitably remain on the silicon wafer surface. If these residual acids and alkalis are not thoroughly cleaned, they will cause serious contamination of the silicon wafer, leading to reduced cell current and even defects in appearance, greatly affecting the cell's quality and performance.

[0003] Currently, various silicon wafer cleaning devices for solar cells exist on the market. For example, the Chinese utility model patent with publication number CN204144224U discloses a silicon wafer cleaning machine for residual acid and alkali solutions in solar cells. This machine uses blades on both sides to drive the water to rotate clockwise and counterclockwise during the cleaning process, aiming for rapid cleaning. However, this device has significant drawbacks. During cleaning, the silicon wafers are stationary within the cleaning chamber, and the cleaning relies solely on the rotation and collision of the water flow. This results in an unsatisfactory cleaning effect, failing to thoroughly remove complex acid and alkali residues and fine impurities from the wafer surface. Furthermore, some existing cleaning devices have inadequate structural designs. The methods for fixing the silicon wafers are either too simple, leading to displacement and collisions due to water flow impact during cleaning, resulting in wafer breakage; or the fixing operation is cumbersome, hindering large-scale, high-efficiency production.

[0004] Therefore, it is essential to invent a TOPCON battery acid and alkali cleaning device. Utility Model Content

[0005] To solve the above-mentioned technical problems, this utility model provides a TOPCON battery acid and alkali cleaning device, including a cleaning chassis, a partition, an undulating cleaner, an undulating hydraulic cylinder, a corrugated cover, a frame, a pusher, and a drive motor. The undulating cleaner is slidably installed on both sides of the partition fixed in the middle of the cleaning chassis. Each undulating cleaner is fixed to the output end of the undulating hydraulic cylinder fixedly installed on the lower part of the cleaning chassis. A corrugated cover is installed between the undulating cleaner and the inner wall of the bottom of the cleaning chassis. The cleaning chassis is fixedly installed on the frame. The pushers, which are rotatably installed at both ends inside the cleaning chassis, are fixed to the output end of the drive motor fixedly installed on the outside of the cleaning chassis.

[0006] Preferably, the cleaning chamber is an annular box structure with curved surfaces at both ends, and a vertically arranged partition is fixedly installed in the middle of the cleaning chamber to form a closed-loop flow path inside the cleaning chamber.

[0007] Preferably, a pusher is provided at one end of the partition, and two pushers are installed at opposite ends of the cleaning chamber. The rotation of the pushers can drive the liquid inside the cleaning chamber to circulate.

[0008] Preferably, two opposing undulating cleaners are slidably installed on the side of the partition and the inner wall of the cleaning chamber. The undulating cleaners are located in the path of liquid circulation and can be driven by the undulating hydraulic cylinder to make up-and-down undulating movements.

[0009] Preferably, the undulating cleaner includes a base plate, limiting seats, limiting plates, plug-in rods, battery silicon wafers, and a pressing plate. The base plate is slidably connected to the side of the partition and the inner wall of the cleaning chamber. The base plate is fixed to the output end of the undulating hydraulic cylinder, which is fixedly installed on the lower part of the outside of the cleaning chamber. A corrugated cover is installed between the base plate and the bottom inner wall of the cleaning chamber. The corrugated cover is fitted outside the output end of the undulating hydraulic cylinder. At least three sets of limiting seats are fixedly installed on the top of the base plate. Two opposing limiting seats form a set. Each limiting seat has a slidably limiting plate on its inner side. Ten opposing plug-in rods are fixedly installed between two opposing limiting plates. The battery silicon wafers are inserted into the slots provided by the plug-in rods and are limited by the pressing plate fixedly installed on the limiting seats.

[0010] Preferably, the limiting plates in pairs and the four corresponding plug-in rods form a plug-in frame, and a number of battery silicon wafers are inserted into the slots of the four corresponding plug-in rods in a horizontally arranged manner, with the battery silicon wafers parallel to the path of liquid flow inside the cleaning chamber.

[0011] Compared with the prior art, the present invention has the following beneficial effects: The cleaning chamber of this invention features a closed-loop flow path formed by partitions. Combined with propellers installed at opposite ends for relative rotation, this allows the cleaning fluid to circulate within the chamber. When the undulating cleaner moves the battery silicon wafers up and down, the wafers can fully contact the circulating cleaning fluid. Compared to traditional cleaning methods where the wafers remain stationary and rely solely on water rotation and collision, this significantly increases the contact area and scouring force between the cleaning fluid and the wafer surface. This results in more thorough acid and alkali cleaning, effectively removing residual acids, alkalis, and impurities from the wafer surface and improving battery performance.

[0012] Furthermore, the unique structural design of this novel undulating cleaner, through the cooperation of a limiting seat, a limiting plate, plug-in rods, and a pressing plate, can securely fix the battery silicon wafers. Each set of limiting plates and four corresponding plug-in rods constitute a plug-in frame. The battery silicon wafers are inserted laterally into the slots of the plug-in rods, parallel to the liquid flow path inside the cleaning chamber. This fixing method avoids problems such as microcracks and breakage of silicon wafers caused by water flow impact or mutual collision during the cleaning process, greatly improving the safety of silicon wafers during the cleaning process, reducing the defect rate, and improving production efficiency.

[0013] The undulating hydraulic cylinder fixedly installed on the lower exterior of the cleaning machine casing of this utility model can easily control the up-and-down movement of the undulating cleaner, making it simple to operate and easy to control. At the same time, the drive motor drives the propeller to rotate, realizing the circulation of the cleaning fluid. The entire operation process is automated, reducing manual intervention and improving production efficiency. Attached Figure Description

[0014] Figure 1 This is a schematic diagram of the overall structure of this utility model.

[0015] Figure 2 This is a schematic diagram of the uninstalled structure of the undulating cleaner of this utility model.

[0016] Figure 3 This is a schematic diagram of the structure of the undulating cleaner of this utility model.

[0017] Figure 4 This is an exploded structural diagram of the undulating cleaner of this utility model.

[0018] In the picture: Base 1, positioning seat 2, air inlet group 3, exhaust group 4, limiting outer frame 5, limiting block 6, positioning hole 7, slot 8, rotating shaft 9, rotating block 10, pressure belt 11. Detailed Implementation

[0019] To enable those skilled in the art to better understand the present invention, the technical solutions in the embodiments of the present invention will be clearly and completely described below. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort should fall within the protection scope of the present invention.

[0020] In the description of the embodiments, it should be noted that the terms "upper," "lower," "inner," "outer," "front end," "rear end," "both ends," "one end," and "the other end," etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. They are used only for the convenience of describing the present invention and for simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on the present invention. Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance. In the description of the utility model, it should be noted that unless otherwise explicitly specified and limited, the terms "installed," "equipped with," "connected," etc., should be interpreted broadly. For example, "connection" can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection or an indirect connection through an intermediate medium; it can be a connection within two components. Those skilled in the art can understand the specific meaning of the above terms in the present utility model based on the specific circumstances.

[0021] As attached Figure 1 To be continued Figure 4 As shown: This utility model provides a TOPCON battery acid and alkali cleaning device, including a cleaning housing 1, a partition 2, an undulating cleaner 3, an undulating hydraulic cylinder 4, a corrugated cover 5, a frame 6, a pusher 7, and a drive motor 8. The undulating cleaner 3 is slidably installed on both sides of the partition 2, which is fixedly installed in the middle of the cleaning housing 1. Each undulating cleaner 3 is fixed to the output end of the undulating hydraulic cylinder 4, which is fixedly installed on the lower part of the outside of the cleaning housing 1. A corrugated cover 5 is installed between the undulating cleaner 3 and the inner wall of the bottom of the cleaning housing 1. The cleaning housing 1 is fixedly installed on the frame 6. The pushers 7, which are rotatably installed at both ends inside the cleaning housing 1, are fixed to the output end of the drive motor 8, which is fixedly installed on the outside of the cleaning housing 1.

[0022] Furthermore, the cleaning chamber 1 is made of a single piece of acid and alkali resistant metal material, with an acid and alkali resistant PP (polypropylene) lining on its inner wall. The overall structure is a ring-shaped box with curved surfaces at both ends. The curved surface design reduces dead zones in the circulation of the cleaning fluid. The inner wall of the chamber is polished, and a support bracket is provided at the bottom. A PP partition 2 is vertically fixed in the middle of the cleaning chamber 1. The partition 2 is sealed to the inner lining of the cleaning chamber 1, dividing the interior of the cleaning chamber 1 into two chambers, left and right, with the two ends connected to form a closed-loop flow path.

[0023] Furthermore, a propeller 7 is installed on one side of each of the left and right ends of the partition 2, with the two propellers 7 arranged in a staggered manner. Each propeller 7 consists of a stainless steel shaft, PP propeller blades, and a coupling. The shaft is rotatably sealed to the side wall of the cleaning chamber 1 via a sealing ring, and its outer side is connected to the output shaft of the drive motor 6 via the coupling. When the two propellers 7 rotate relative to each other, a forced circulating water flow is formed within the closed-loop path.

[0024] Furthermore, vertical guide rail grooves 11 are provided on both sides of the partition plate 2 and at corresponding positions on the inner wall of the cleaning chamber 1. The edge of the bottom plate 31 of the undulating cleaner 3 is embedded in the guide rail groove 11 and is equipped with sliding components to achieve vertical sliding connection. The bottom center of the bottom plate 31 is fixedly connected to the output end of the undulating hydraulic cylinder 4. A corrugated cover 5 is installed between the bottom plate 31 and the bottom inner wall of the cleaning chamber 1. The corrugated cover 5 is made of acid and alkali resistant rubber and is sealed to the bottom plate 31 and the inner wall of the chamber through a flange.

[0025] Furthermore, multiple sets of limiting seats 32 are uniformly fixedly installed on the upper surface of the base plate 31, and the inner side of the limiting seat 32 is provided with a sliding groove. The two side edges of the limiting plate 33 are embedded in the sliding groove and can slide along the sliding groove to adjust their position. Two opposing limiting plates 33 form a frame structure. Multiple insertion rods 34 are installed at equal intervals on the inner side of each limiting plate 33, and the inner side of the insertion rod 34 is provided with a slot for horizontally inserting the battery silicon wafer 35. The pressing plate 36 is fixedly connected to the top of the limiting seat 32 by bolts, and a buffer pad is pasted on the lower surface of the pressing plate 36 to form a flexible pressing on the edge of the battery silicon wafer 35.

[0026] Furthermore, the insertion frame, consisting of two limiting plates 33 and four corresponding insertion rods 34, allows for the lateral insertion of multiple battery silicon wafers 35. After insertion, all battery silicon wafers 35 remain parallel to the liquid flow path inside the cleaning chamber 1, ensuring that the cleaning fluid can evenly wash the surface of the silicon wafers. When the undulating cleaner 3 moves up and down under the drive of a hydraulic cylinder, acid and alkali residues on the surface of the silicon wafers are efficiently removed under the combined action of circulating water and mechanical vibration.

[0027] The working principle is as follows: First, the operator inserts the silicon wafer 35 to be cleaned vertically into the insertion frame consisting of the limiting plate 33 and the insertion rod 34, ensuring that the edge of the silicon wafer is accurately engaged in the slot. Then, by tightening the bolts on the pressing plate 36, the buffer pad forms a flexible pressure on the edge of the silicon wafer, preventing displacement during the cleaning process. At this time, all the silicon wafers 35 remain parallel to the liquid flow path inside the cleaning chamber 1.

[0028] Next, an appropriate amount of acid-base cleaning solution (hydrofluoric acid, hydrochloric acid, or sodium hydroxide solution of appropriate concentration selected according to process requirements) is injected into the cleaning chamber 1, and the drive motor 8 is started to drive the propeller 7 to rotate. Since the two propellers 7 are staggered and oppositely arranged at both ends of the partition 2, the left propeller 7 rotates clockwise and the right propeller 7 rotates counterclockwise, forming a stable clockwise circulating water flow within the closed-loop flow path of the cleaning chamber 1. The flow rate of the cleaning solution can be controlled by adjusting the speed of the drive motor 8 to ensure an effective scouring force on the silicon wafer surface.

[0029] Then, the undulating hydraulic cylinder 4 is activated, driving the undulating cleaner 3 to reciprocate up and down along the guide rail groove 11. The frequency and amplitude of the movement can be adjusted according to the cleaning effect requirements. When the undulating cleaner 3 descends, the battery silicon wafer 35 is immersed in the cleaning fluid; when it rises, the silicon wafer is partially exposed above the fluid surface, forming a wave-like cleaning motion. This movement not only increases the contact area between the silicon wafer and the cleaning fluid but also promotes the removal of stubborn stains through mechanical vibration.

[0030] During the cleaning process, the circulating cleaning fluid continuously washes the surface of the silicon wafer. The acid and alkaline solutions react chemically with impurities on the silicon wafer surface, dissolving or decomposing them. Simultaneously, the corrugated cover 5 expands and contracts with the movement of the undulating cleaner 3, effectively preventing the cleaning fluid from seeping into the undulating hydraulic cylinder 4 and ensuring the stable operation of the hydraulic system. Furthermore, the PP lining and polishing treatment of the inner wall of the cleaning chamber 1 prevent direct contact between the metal materials and the acid and alkaline solutions, extending the service life of the equipment.

[0031] Any technical solution that achieves the above-mentioned technical effects by utilizing the technical solution described in this utility model, or by designing a similar technical solution inspired by the technical solution described in this utility model, falls within the protection scope of this utility model.

Claims

1. A TOPCON battery acid and alkali cleaning device, characterized in that, The cleaning unit includes a cleaning housing (1), a partition (2), an undulating cleaner (3), an undulating hydraulic cylinder (4), a corrugated cover (5), a frame (6), a thruster (7), and a drive motor (8). The undulating cleaner (3) is slidably installed on both sides of the partition (2) fixed in the middle of the cleaning housing (1). Each undulating cleaner (3) is fixed to the output end of the undulating hydraulic cylinder (4) fixedly installed on the lower part of the outside of the cleaning housing (1). A corrugated cover (5) is installed between the undulating cleaner (3) and the bottom inner wall of the cleaning housing (1). The cleaning housing (1) is fixedly installed on the frame (6). The thrusters (7) rotatably installed at both ends inside the cleaning housing (1) are fixed to the output end of the drive motor (8) fixedly installed on the outside of the cleaning housing (1).

2. The TOPCON battery acid and alkali cleaning device as described in claim 1, characterized in that: The cleaning chamber (1) is an annular box structure with curved surfaces at both ends. A vertically arranged partition (2) is fixedly installed in the middle of the cleaning chamber (1) to form a closed-loop flow path inside the cleaning chamber (1).

3. The TOPCON battery acid and alkali cleaning device as described in claim 2, characterized in that: A pusher (7) is provided on one end of the partition (2). The two pushers (7) are installed at opposite ends of the cleaning chamber (1). The rotation of the pushers (7) can drive the liquid inside the cleaning chamber (1) to circulate.

4. The TOPCON battery acid and alkali cleaning device as described in claim 3, characterized in that: Two opposing undulating cleaners (3) are slidably installed on the side of the partition (2) and the inner wall of the cleaning chamber (1). The undulating cleaners (3) are located on the path of liquid circulation and can be driven by the undulating hydraulic cylinder (4) to make up-down undulating movements.

5. The TOPCON battery acid and alkali cleaning device as described in claim 4, characterized in that: The undulating cleaner (3) includes a base plate (31), a limiting seat (32), a limiting plate (33), a plug rod (34), a battery silicon wafer (35), and a pressing plate (36). The base plate (31) is slidably connected to the side of the partition plate (2) and the inner wall of the cleaning chamber (1). The base plate (31) is fixed to the output end of the undulating hydraulic cylinder (4) fixedly installed on the lower part of the outside of the cleaning chamber (1). A corrugated cover (5) is installed between the base plate (31) and the bottom inner wall of the cleaning chamber (1). The corrugated cover (5) is fitted onto the... Outside the output end of the undulating hydraulic cylinder (4), at least three sets of limiting seats (32) are fixedly installed on the top of the base plate (31). Two opposing limiting seats (32) form a set. Each limiting seat (32) has a sliding limiting plate (33) on its inner side. Ten opposing plug rods (34) are fixedly installed between two opposing limiting plates (33). The battery silicon wafer (35) is inserted into the slot provided by the plug rod (34) and is limited by the pressing plate (36) fixedly installed on the limiting seat (32).

6. The TOPCON battery acid and alkali cleaning device as described in claim 5, characterized in that: The limiting plates (33) in pairs and the four corresponding plug rods (34) form a plug frame. Several battery silicon wafers (35) are inserted into the slots of the four corresponding plug rods (34) in a horizontal arrangement. The battery silicon wafers (35) are parallel to the liquid flow path inside the cleaning chamber (1).

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