Diaphragm vacuum suction platform

CN224600740UActive Publication Date: 2026-08-07KEYAO MICROELECTRONICS (GUANGDONG) CO LTD
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
KEYAO MICROELECTRONICS (GUANGDONG) CO LTD
Filing Date
2025-09-09
Publication Date
2026-08-07

AI Technical Summary

Technical Problem

在PI膜的切割应用场景中,由于PI膜的厚度薄、质量小,在传统的飞秒激光设备上需通过硅胶、钢化玻璃间接的固定在设备的真空吸附台上,即真空吸附台的吸附孔作用于硅胶或钢化玻璃,PI膜通过固体胶与硅胶或钢化玻璃固定,然而这种固定结构存在以下不足:由于PI膜与硅胶或钢化玻璃的接触仅是存在于固体胶的点胶位,容易因PI膜与硅胶或钢化玻璃的顶表存在间隙而导致加工误差,加工误差可达5~10μm,难以满足高精度的加工需求

Benefits of technology

[0011] The above-mentioned one or more technical solutions in the membrane vacuum adsorption platform provided in this utility model embodiment have at least one of the following technical effects: by utilizing the dense adsorption holes on the microporous substrate and reducing the spacing between adjacent holes, during processing, the PI film is directly stacked on the top surface of the microporous substrate, and the PI film is fixed on the adsorption stage after vacuum suction is turned on; compared with the prior art, this application provides to adjust the spacing between the adsorption holes to obtain a larger vacuum adsorption area. By reducing the gap between the PI film and the adsorption stage, the occurrence of air bubbles and bulges between the two is reduced, which is beneficial to improving the processing accuracy of the PI film. The processing error can be reduced to 2-3 μm. On the other hand, it saves the time waiting for the solid adhesive to cure, which is beneficial to improving the work efficiency.

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Abstract

The utility model belongs to the fixed device technical field of diaphragm processing, especially relates to diaphragm vacuum adsorption platform, including assembly panel and micropore base plate, the assembly panel is recessed with the vacuum adsorption cavity of top opening, the micropore base plate is embedded in the vacuum adsorption cavity, and its adsorption surface is flush with the top surface of assembly panel, the gas path structure is opened in the assembly panel, the inner end of gas path structure is communicated with the vacuum adsorption cavity, and the outer end is connected with vacuum generator, the micropore base plate is opened with a plurality of adsorption holes. The present application adjusts the hole spacing of adsorption hole to obtain greater vacuum adsorption area, reduces the gap between PI film and adsorption mesa, reduces the bubble and bulge between them, improves the processing accuracy of PI film, and reduces the processing error to 2-3 microns. On the other hand, the time for waiting for the solidification of the solid adhesive is saved, and the work efficiency is improved.
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Description

Technical Field

[0001] This utility model belongs to the technical field of fixing devices for diaphragm processing, and particularly relates to a diaphragm vacuum adsorption platform. Background Technology

[0002] Femtosecond lasers are based on femtoseconds (1fs = 10^67 Hz). -15 Ultrashort pulse laser technology, with a time unit of femtoseconds (seconds), has pulse durations on the order of femtoseconds (several femtoseconds) and features high instantaneous power (up to trillions of watts) and high focusing accuracy (smaller than the diameter of a human hair). Due to its minimal impact on materials, it can be safely used in processes such as cutting, drilling, and engraving. In the cutting application of PI films, because PI films are thin and lightweight, traditional femtosecond laser equipment requires indirect fixation to the vacuum adsorption stage of the equipment via silicone or tempered glass. That is, the adsorption holes of the vacuum adsorption stage act on the silicone or tempered glass, and the PI film is fixed to the silicone or tempered glass with solid adhesive. However, this fixing structure has the following shortcomings: since the contact between the PI film and the silicone or tempered glass exists only at the application point of the solid adhesive, gaps can easily exist between the top surfaces of the PI film and the silicone or tempered glass, leading to processing errors of 5–10 μm, which is insufficient to meet the requirements of high-precision processing. Utility Model Content

[0003] The purpose of this invention is to provide a membrane vacuum adsorption platform, which aims to solve the technical problems in the prior art.

[0004] To achieve the above objectives, the membrane vacuum adsorption platform provided in this embodiment includes an assembly plate and a microporous substrate. The assembly plate has a vacuum adsorption cavity with a top opening recessed therein. The microporous substrate is embedded in the vacuum adsorption cavity, and its adsorption surface is flush with the top surface of the assembly plate. The assembly plate has an air passage structure inside, the inner end of which communicates with the vacuum adsorption cavity, and the outer end of which communicates with a vacuum generator. The microporous substrate has a plurality of adsorption holes.

[0005] Optionally, the microporous substrate is made of ceramic, and the adsorption pores are formed on the microporous substrate by a sintering process.

[0006] Optionally, the thickness of the microporous substrate is 4-8 mm, and the pore size of the adsorption pores is 2-5 μm.

[0007] Optionally, the vacuum adsorption cavity is rectangular, and the outline of the microporous substrate corresponds to the side of the vacuum adsorption cavity and is fixed by an adhesive.

[0008] Optionally, the gas path structure includes several gas pipes arranged along the length of the vacuum adsorption cavity, and the gas pipes are arranged at equal intervals.

[0009] Optionally, it also includes a pair of positioning waist holes, which are disposed opposite to each other on both sides of the assembly plate.

[0010] Optionally, it may also include a plurality of mounting holes, wherein the plurality of mounting holes are formed on the assembly.

[0011] The above-mentioned one or more technical solutions in the membrane vacuum adsorption platform provided in this utility model embodiment have at least one of the following technical effects: by utilizing the dense adsorption holes on the microporous substrate and reducing the spacing between adjacent holes, during processing, the PI film is directly stacked on the top surface of the microporous substrate, and the PI film is fixed on the adsorption stage after vacuum suction is turned on; compared with the prior art, this application provides to adjust the spacing between the adsorption holes to obtain a larger vacuum adsorption area. By reducing the gap between the PI film and the adsorption stage, the occurrence of air bubbles and bulges between the two is reduced, which is beneficial to improving the processing accuracy of the PI film. The processing error can be reduced to 2-3 μm. On the other hand, it saves the time waiting for the solid adhesive to cure, which is beneficial to improving the work efficiency. Attached Figure Description

[0012] To more clearly illustrate the technical solutions in the embodiments of this utility model, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this utility model. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0013] Figure 1 A schematic diagram of the structure of the membrane vacuum adsorption platform provided in the embodiment of this utility model.

[0014] Figure 2 for Figure 1 A schematic diagram of the longitudinal section.

[0015] The following are the labeling elements in the figure:

[0016] 1—Assembly plate; 11—Vacuum adsorption chamber; 12—Gas path structure

[0017] 13—Positioning hole; 14—Assembly hole

[0018] 2—Microporous substrate 21—Adsorption pores. Detailed Implementation

[0019] The embodiments of the present invention are described in detail below, examples of which are shown in the accompanying drawings, wherein the same or similar reference numerals denote the same or similar elements or elements having the same or similar functions throughout. The embodiments described below with reference to the accompanying drawings are exemplary and intended to explain the embodiments of the present invention, and should not be construed as limiting the present invention.

[0020] In the description of the embodiments of this utility model, it should be understood that the terms "length", "width", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the drawings. They are only for the convenience of describing the embodiments of this utility model and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on this utility model.

[0021] Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of indicated technical features. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of that feature. In the description of embodiments of this utility model, "a plurality of" means two or more, unless otherwise explicitly specified.

[0022] In this embodiment of the invention, unless otherwise explicitly specified and limited, the terms "installation," "connection," "linking," and "fixing," etc., should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral part; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; they can refer to the internal communication of two components or the interaction between two components. Those skilled in the art can understand the specific meaning of the above terms in this embodiment of the invention according to the specific circumstances.

[0023] In one embodiment of this utility model, such as Figures 1-2As shown, a membrane vacuum adsorption platform is provided, including an assembly plate 1 and a microporous substrate 2. The assembly plate 1 has a vacuum adsorption cavity 11 with a top opening recessed on it. The microporous substrate 2 is embedded in the vacuum adsorption cavity 11, and its adsorption surface is flush with the top surface of the assembly plate 1. The assembly plate 1 has an air passage structure 12, the inner end of which communicates with the vacuum adsorption cavity 11, and the outer end of which communicates with a vacuum generator. The microporous substrate 2 has a plurality of adsorption holes 21. By utilizing the densely packed adsorption holes 21 on the microporous substrate 2 and reducing the spacing between adjacent holes, the PI film is directly stacked on the top surface of the microporous substrate 2 during processing. Vacuum suction is then activated to fix the PI film onto the adsorption stage. This embodiment provides an adjustment for the spacing of the adsorption holes 21 to obtain a larger vacuum adsorption area. By reducing the gap between the PI film and the adsorption stage, the occurrence of air bubbles and bulges is reduced, which helps improve the processing accuracy of the PI film. The processing error can be reduced to 2-3 μm. On the other hand, it saves the time waiting for the solid adhesive to cure, thus improving work efficiency. Preferably, the assembly plate 1 is made of aluminum alloy.

[0024] In one embodiment of this utility model, such as Figures 1-2 As shown, the microporous substrate 2 is made of ceramic, and the adsorption pores 21 are formed on the microporous substrate 2 by a sintering process. Specifically, ceramic has the characteristics of high hardness and high temperature resistance. The adsorption pores 21 are irregular holes provided on the microporous substrate 2, and their irregular distribution greatly increases the coverage area on the vacuum adsorption cavity 11, thereby obtaining a stronger adsorption effect and reducing the relative displacement of the PI film relative to the top surface of the microporous substrate 2 during the processing.

[0025] In one embodiment of this utility model, such as Figures 1-2 As shown, the thickness of the microporous substrate 2 is 4-8 mm, and the pore size of the adsorption pore 21 is 2-5 μm.

[0026] In one embodiment of this utility model, such as Figures 1-2 As shown, the vacuum adsorption cavity 11 is rectangular, and the outline of the microporous substrate 2 corresponds to the side of the vacuum adsorption cavity 11 and is fixed with adhesive. The adhesive reinforces the microporous substrate 2 to prevent the ceramic plate from falling off or the medium from leaking.

[0027] In one embodiment of this utility model, such as Figures 1-2 As shown, the gas path structure 12 includes several gas pipes arranged along the length of the vacuum adsorption cavity 11, with the gas pipes spaced at equal intervals. Specifically, the gas pipes are formed on the assembly plate 1 by a drilling process, and the other end is connected to the vacuum port of the vacuum generator.

[0028] In one embodiment of this utility model, such as Figures 1-2 As shown, it also includes a pair of positioning waist holes 13, which are disposed opposite to each other on both sides of the assembly plate 1. Specifically, the vacuum adsorption platform of this embodiment is applied to the femtosecond laser equipment (model: FEMTO Mono) of Posalux Corporation, and the pair of positioning waist holes 13 are used to initially fix the assembly plate 1, which facilitates subsequent installation work.

[0029] In one embodiment of this utility model, such as Figures 1-2 As shown, it also includes a plurality of mounting holes 14, which are formed on the assembly. Specifically, screw holes corresponding to the mounting holes 14 need to be machined on the femtosecond laser equipment. In this embodiment, the mounting holes 14 are countersunk screw holes, and the assembly plate 1 is fixed to the femtosecond laser equipment by screws.

[0030] The above description is only a preferred embodiment of the present utility model and is not intended to limit the present utility model. Any modifications, equivalent substitutions and improvements made within the spirit and principles of the present utility model should be included within the protection scope of the present utility model.

Claims

1. A membrane vacuum adsorption platform, characterized in that: The assembly includes an assembly plate and a microporous substrate. The assembly plate has a vacuum adsorption cavity with a top opening. The microporous substrate is embedded in the vacuum adsorption cavity, and its adsorption surface is flush with the top surface of the assembly plate. The assembly plate has an air passage structure, the inner end of which is connected to the vacuum adsorption cavity and the outer end of which is connected to a vacuum generator. The microporous substrate has a plurality of adsorption holes.

2. The membrane vacuum adsorption platform according to claim 1, characterized in that: The microporous substrate is made of ceramic, and the adsorption pores are formed on the microporous substrate by a sintering process.

3. The membrane vacuum adsorption platform according to claim 1, characterized in that: The thickness of the microporous substrate is 4–8 mm, and the pore size of the adsorption pores is 2–5 μm.

4. The membrane vacuum adsorption platform according to claim 2, characterized in that: The vacuum adsorption cavity is rectangular, and the outline of the microporous substrate corresponds to the side of the vacuum adsorption cavity and is fixed by adhesive.

5. The membrane vacuum adsorption platform according to claim 1, characterized in that: The gas path structure includes several gas pipes arranged along the length of the vacuum adsorption cavity, and the gas pipes are arranged at equal intervals.

6. The membrane vacuum adsorption platform according to claim 1, characterized in that: It also includes a pair of positioning waist holes, which are located opposite each other on both sides of the assembly plate.

7. The membrane vacuum adsorption platform according to claim 1, characterized in that: It also includes a number of assembly holes, which are formed on the assembly.