A wind-up film forming system

Abstract

The utility model relates to a kind of winding film-forming system.A kind of winding film-forming system, including conveying mechanism, coating mechanism, drying mechanism and annealing mechanism;The drying mechanism includes limiting device and multiple vacuumizing device;Limiting cavity and multiple air holes are provided in the limiting device, and the multiple vacuumizing device is communicated with the limiting cavity by the multiple air holes;The multiple vacuumizing device includes at least two of first vacuumizing device, second vacuumizing device, third vacuumizing device, fourth vacuumizing device and fifth vacuumizing device;The first vacuumizing device has first pressure, the second vacuumizing device has second pressure, the third vacuumizing device has third pressure, the fourth vacuumizing device has fourth pressure, and the fifth vacuumizing device has fifth pressure.Multiple vacuumizing device is connected with limiting cavity by multiple air holes, so that flexible substrate passing through limiting cavity is evenly flash-evaporated in gradient vacuum degree Crystal film-forming.

Description

Technical Field

[0001] This utility model relates to the field of photovoltaic cell preparation equipment technology, and in particular to a winding film forming system. Background Technology

[0002] Flexible solar cells have a promising future due to their advantages such as light weight, portability, low cost, and excellent performance. Currently, roll-to-roll production lines suitable for flexible cell manufacturing achieve high uniformity (film thickness uniformity ≥97%), constant tension control, and multi-cavity collaborative processes. These lines require the integration of multiple process units (such as cleaning, coating, drying, and evaporation), with buffer zones connecting each process segment. Currently, perovskite wet film vacuum distillation is used to extract perovskite from rigid substrates; however, this method causes severe deformation of the substrate when applied to flexible substrates and cannot be used on continuous substrates.

[0003] Therefore, there is an urgent need to study a new film-forming system to solve the problems of easy deformation and poor continuous film formation of flexible substrates in roll-to-roll production. Utility Model Content

[0004] Therefore, it is necessary to provide a winding film forming system to address the problems of easy deformation of flexible substrates and poor continuous film formation in existing roll-to-roll production equipment for flexible substrates.

[0005] A winding film forming system includes a conveying mechanism, a coating mechanism, a drying mechanism, and an annealing mechanism; the drying mechanism includes a limiting device and multiple vacuum devices; the limiting device has a limiting cavity and multiple air holes, and the multiple vacuum devices are connected to the limiting cavity through the multiple air holes; the multiple vacuum devices include at least two of a first vacuum device, a second vacuum device, a third vacuum device, a fourth vacuum device, and a fifth vacuum device; the first vacuum device has a first pressure, the second vacuum device has a second pressure, the third vacuum device has a third pressure, the fourth vacuum device has a fourth pressure, and the fifth vacuum device has a fifth pressure.

[0006] In the above-mentioned winding film forming system, multiple vacuum devices with different pressures in the drying mechanism are combined into a gradient vacuum module, which is connected to the limiting cavity through multiple air holes, so that the flexible substrate passing through the limiting cavity can be uniformly flash-evaporated to form a crystal film in the gradient vacuum.

[0007] In one embodiment, the first pressure is 0.1 MPa to 1000 Pa, the second pressure is 1000 Pa to 100 Pa, the third pressure is 100 Pa to 10 Pa, the fourth pressure is 1000 Pa to 100 Pa, and the fifth pressure is 0.1 MPa to 1000 Pa.

[0008] In one embodiment, the height of the limiting cavity is 300μm to 1000μm, and the width of the limiting cavity is 300mm to 1200mm.

[0009] In one embodiment, the drying mechanism further includes a gas device disposed at the inlet of the limiting cavity, wherein the gas flow direction of the gas blown out by the gas device forms an angle of 0° to 70° with the limiting cavity.

[0010] In the winding film-forming system of this invention, the gas device blows air at a small angle onto the flexible substrate, promoting the flexible substrate to enter the sealed limiting cavity and accelerating the crystallization film formation on the surface of the flexible substrate.

[0011] The drying mechanism of the aforementioned drying system uses a gas device to blow air onto the flexible substrate at a small angle, promoting the flexible substrate to enter the sealed limiting cavity and accelerating the crystallization and film formation on the surface of the flexible substrate. In conjunction with multiple vacuum pumping devices that can provide gradient vacuum and limiting devices with limiting cavities, a continuous and sealed space is provided for the flexible substrate, so that it will not deform during the surface film formation process.

[0012] In one embodiment, the conveying mechanism allows the flexible substrate to pass sequentially through the coating mechanism, the drying mechanism, and the annealing mechanism, and provides support for the flexible substrate.

[0013] In one embodiment, the annealing mechanism includes a first annealing module and a second annealing module, wherein the annealing temperature of the first annealing module is greater than that of the second annealing module, and the airflow rate of the first annealing module is greater than that of the second annealing module. The first and second annealing modules in the above-mentioned annealing mechanism constitute a gradient annealing module, where a high-temperature, high-airflow-rate annealing mode combined with a low-temperature, low-airflow-rate annealing mode can achieve uniform and continuous film formation.

[0014] In one embodiment, the annealing temperature of the first annealing module is 100℃~150℃ and the wind speed is 3m / s~15m / s; the annealing temperature of the second annealing module is 0℃~100℃ and the wind speed is 0m / s~3m / s.

[0015] In one embodiment, the first annealing module includes a first heating device and a first air compression device, and the second annealing module includes a second heating device and a second air compression device.

[0016] In one embodiment, the annealing mechanism further includes a conveying device that allows the flexible substrate to pass sequentially through the first annealing module and the second annealing module, and provides support for the flexible substrate.

[0017] In one embodiment, the winding film-making system includes, in sequence, an unwinding mechanism, a peeling mechanism, a cleaning mechanism, the coating structure, the drying mechanism, the annealing mechanism, the film-applying mechanism, and the winding mechanism, as well as the conveying mechanism.

[0018] Compared with the prior art, the present invention has the following beneficial effects:

[0019] In the film-forming system of this invention, multiple vacuum devices with different pressures in the drying mechanism are combined to form a gradient vacuum module. These modules are connected to a limiting cavity via multiple air vents, allowing the flexible substrate passing through the limiting cavity to uniformly flash-evaporate and crystallize into a film within the gradient vacuum. A gas device blows air onto the flexible substrate at a small angle, promoting its entry into the sealed limiting cavity and accelerating film crystallization on its surface. This combination of the gas device blowing air onto the flexible substrate at a small angle, promoting its entry into the sealed limiting cavity, and accelerating film crystallization, along with the multiple vacuum devices providing gradient vacuum and the limiting device with its own limiting cavity, creates a continuous, sealed space for the flexible substrate, preventing deformation during film formation. Combined with a gradient annealing module, this achieves uniform and continuous film formation. Attached Figure Description

[0020] Figure 1 This is a schematic diagram of the winding film-forming system in this utility model;

[0021] Figure 2 This is a schematic diagram of the drying mechanism in the winding film forming system of this utility model;

[0022] Figure 3 This is a schematic diagram of the annealing mechanism in the winding film forming system of this utility model;

[0023] Figure 4 IV test image of the device prepared by the winding film forming system of this utility model.

[0024] Explanation of reference numerals in the attached drawings: 1. Unwinding mechanism; 2. Peeling mechanism; 3. Cleaning mechanism; 4. Conveying mechanism; 5. Coating mechanism; 6. Drying mechanism; 611. First vacuuming device; 612. Second vacuuming device; 613. Third vacuuming device; 614. Fourth vacuuming device; 615. Fifth vacuuming device; 62. Limiting device; 621. Limiting cavity; 622. Air hole; 63. Gas device; 64. Filtering unit; 7. Annealing mechanism; 71. First annealing module; 711. First heating device; 712. First air compression device; 72. Second annealing module; 721. Second heating device; 722. Second air compression device; 73. Conveying device; 8. Film application mechanism; 81. Protective film unwinding device; 82. Roller pressing device; 9. Rewinding mechanism. Detailed Implementation

[0025] To facilitate understanding of this utility model, a more complete description will be given below with reference to the accompanying drawings. Preferred embodiments of this utility model are shown in the drawings. However, this utility model can be implemented in many different forms and is not limited to the embodiments described herein. Rather, these embodiments are provided to provide a more thorough and complete understanding of the disclosure of this utility model.

[0026] It should be noted that when an element is referred to as being "fixed to" another element, it can be directly on the other element or there may be an intervening element. When an element is considered to be "connected to" another element, it can be directly connected to the other element or there may be an intervening element. Furthermore, the terms "center," "longitudinal," "lateral," "upper," "lower," "front," "rear," "left," "right," "vertical," "horizontal," "top," "bottom," "inner," and "outer," etc., indicating orientation or positional relationships, are based on the orientation or positional relationships shown in the accompanying drawings and are only for the convenience of describing the embodiments of this utility model and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation on the embodiments of this utility model. The terms "first," "second," and "third" are used for descriptive purposes only and should not be construed as indicating or implying relative importance.

[0027] Unless otherwise defined, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this invention pertains. The terminology used herein is for the purpose of describing particular embodiments only and is not intended to be limiting of the invention. The term "and / or" as used herein includes any and all combinations of one or more of the associated listed items.

[0028] The dashed arrows indicate the direction of transport for the flexible substrate.

[0029] Example 1

[0030] A winding film forming system, such as Figure 1 The aforementioned mechanism includes, in sequence, an unwinding mechanism 1, a peeling mechanism 2, a cleaning mechanism 3, a coating mechanism 5, a drying mechanism 6, an annealing mechanism 7, a film-applying mechanism 8, and a rewinding mechanism 9, as well as a conveying mechanism 4.

[0031] The conveying mechanism 4 is used to convey the flexible substrate from the unwinding mechanism 1 to the rewinding mechanism 9, and to make the flexible substrate pass through the peeling mechanism 2, the cleaning mechanism 3, the coating mechanism 5, the drying mechanism 6, the annealing mechanism 7 and the film-applying mechanism 8 in sequence, and also to provide support for the flexible substrate.

[0032] Drying mechanism 6, such as Figure 2As shown, the system includes multiple vacuum pumping devices, a limiting device 62, a gas device 63, and a filter unit 64. The multiple vacuum pumping devices include a first vacuum pumping device 611, a second vacuum pumping device 612, a third vacuum pumping device 613, a fourth vacuum pumping device 614, and a fifth vacuum pumping device 615. The first vacuum pumping device 611 has a first pressure, the second vacuum pumping device 612 has a second pressure, the third vacuum pumping device 613 has a third pressure, the fourth vacuum pumping device 614 has a fourth pressure, and the fifth vacuum pumping device 615 has a fifth pressure. The first pressure is 0.1 MPa to 1000 Pa, the second pressure is 1000 Pa to 100 Pa, and the third pressure is 100 Pa to 1... The pressure ranges from 0 Pa to 100 Pa (fourth pressure is 1000 Pa to 100 Pa), and from 0.1 MPa to 1000 Pa (fifth pressure is 0.1 MPa to 1000 Pa). The limiting device 62 is provided with a limiting cavity 621 and multiple air holes 622. The limiting cavity 621 is horizontally arranged in the limiting device 62, and the flexible substrate passes through the limiting cavity 621. Multiple vacuum devices are connected to the limiting cavity 621 through multiple air holes 622. The height of the limiting cavity 621 is 300 μm to 1000 μm and the width is 300 mm to 1200 mm. The gas device 63 is arranged at the inlet of the limiting cavity 621 and blows gas into the limiting cavity 621. The angle between the airflow direction of the gas blown out by the gas device 63 and the limiting cavity 621 (or the surface of the flexible substrate) is 0° to 60°. Multiple vacuum pumping devices with different pressures are combined to form a gradient vacuum module, which is connected to a limiting cavity 621 through multiple air holes 622. This allows the flexible substrate passing through the limiting cavity 621 to uniformly flash-evaporate and form a crystal film within the gradient vacuum. A gas device 63 blows air onto the flexible substrate at a small angle, promoting the substrate's entry into the sealed limiting cavity 621 and accelerating the crystallization of the film on the substrate's surface. Together with the multiple vacuum pumping devices that provide gradient vacuum and the limiting device 62 with the limiting cavity 621, a continuous, sealed space is provided for the flexible substrate, preventing deformation during the surface film formation process.

[0033] The filter unit 64 can be a fan filter unit (FFU), and the vacuum device can be a vacuum pump.

[0034] Annealing mechanism 7, such as Figure 3As shown, the system includes a conveying device 73, a first annealing module 71, and a second annealing module 72. The conveying device 73 is used to sequentially pass the flexible substrate through the first annealing module 71 and the second annealing module 72, and to provide support for the flexible substrate. The first annealing module 71 includes a first heating device 711 and a first air compression device 712, and the second annealing module 72 includes a second heating device 721 and a second air compression device 722. The first annealing module 71 is a high-temperature, high-wind-speed annealing module with a temperature of 100℃~150℃ and a wind speed of 3m / s~15m / s. The second annealing module 72 is a low-temperature, low-wind-speed annealing module with a temperature of 0℃~100℃ and a wind speed of 0m / s~3m / s. The first annealing module 71 and the second annealing module 72 form a gradient annealing module. The combination of the high-temperature, high-wind-speed annealing mode and the low-temperature, low-wind-speed annealing mode can achieve uniform and continuous film formation. The first heating device 711 can be near-infrared annealing, the second heating device 721 can be thermal radiation annealing, and the air compression device can be an air compression blower.

[0035] The system comprises: an unwinding mechanism 1 for unwinding the flexible substrate; a peeling mechanism 2 for peeling the protective film from the surface of the flexible substrate; a cleaning mechanism 3 for cleaning the surface of the flexible substrate; a coating mechanism 5 for coating a charge transport layer and a perovskite wet film onto the surface of the flexible substrate; a drying mechanism 6 for evaporating the perovskite wet film to prepare a perovskite mesophase; an annealing mechanism 7 for cooperating with the drying mechanism 6 to prepare a perovskite thin film; a film-applying mechanism 8, including a protective film unwinding device 81 and a rolling device 82, for applying a protective film to the surface of the flexible substrate; and a winding mechanism 9 for winding the flexible substrate.

[0036] The method for preparing perovskite thin films using the above-mentioned winding film-forming system includes the following steps: placing a flexible substrate into an unwinding mechanism 1, and conveying it from the unwinding mechanism 1 to the winding mechanism 9 via a conveying mechanism 4; peeling off the protective film on the surface of the flexible substrate via a peeling mechanism 2; cleaning the surface of the flexible substrate in a cleaning mechanism 3; coating the surface of the flexible substrate in a coating mechanism 5, where a charge transport layer and a perovskite wet film are sequentially coated; and drying the flexible substrate in a drying mechanism 6, where the airflow from a gas device 63 forms a 0-60° angle with the surface of the perovskite wet film, assisting the flexible substrate coated with the perovskite wet film to enter the limiting cavity 621 of a limiting device 62. The perovskite wet film continuously passes through vacuum devices of different pressures in the limiting cavity 621. The vacuum devices promote the evaporation of solvent and crystallization of the film layer through the air holes 622 connected to the limiting cavity 621, resulting in a perovskite mesophase. The filtration unit 64 ensures the crystallinity of the drying mechanism 6. The film then enters the annealing mechanism 7, where a continuous conveying device 73 applies a constant tension to the flexible substrate coated with the perovskite mesophase and continuously passes it through the first annealing module 71 and the second annealing module 72, thus preparing a perovskite film on the surface of the flexible substrate. After passing through the film-applying mechanism 8, a protective film is applied to the surface of the perovskite film, and it is then compacted by the roller pressing device 82 before entering the winding mechanism 9.

[0037] IV testing was performed on the devices prepared using the winding film-forming system of this invention and according to the above preparation method. The test results are as follows: Figure 4 As shown, the device's V oc 76.854V I sc The value is 0.579A, FF is 0.668, and PCE is 14.856%.

[0038] The technical features of the above embodiments can be combined in any way. For the sake of brevity, not all possible combinations of the technical features in the above embodiments are described. However, as long as there is no contradiction in the combination of these technical features, they should be considered to be within the scope of this specification.

[0039] The embodiments described above are merely illustrative of several implementations of this utility model, and while the descriptions are relatively specific and detailed, they should not be construed as limiting the scope of the utility model patent. It should be noted that those skilled in the art can make various modifications and improvements without departing from the concept of this utility model, and these all fall within the protection scope of this utility model. Therefore, the protection scope of this utility model patent should be determined by the appended claims.

Claims

1. A winding film forming system, characterized in that, This includes a conveying mechanism, a coating mechanism, a drying mechanism, and an annealing mechanism; The drying mechanism includes a limiting device and multiple vacuum devices; The limiting device is provided with a limiting cavity and multiple air holes, and the multiple vacuum pumping devices are connected to the limiting cavity through the multiple air holes; The plurality of vacuum pumping devices includes at least two of a first vacuum pumping device, a second vacuum pumping device, a third vacuum pumping device, a fourth vacuum pumping device, and a fifth vacuum pumping device; The first vacuum pumping device has a first pressure, the second vacuum pumping device has a second pressure, the third vacuum pumping device has a third pressure, the fourth vacuum pumping device has a fourth pressure, and the fifth vacuum pumping device has a fifth pressure.

2. The winding film forming system according to claim 1, characterized in that, The first pressure is 0.1 MPa to 1000 Pa, the second pressure is 1000 Pa to 100 Pa, the third pressure is 100 Pa to 10 Pa, the fourth pressure is 1000 Pa to 100 Pa, and the fifth pressure is 0.1 MPa to 1000 Pa.

3. The winding film forming system according to claim 1, characterized in that, The height of the limiting cavity is 300μm~1000μm, and the width of the limiting cavity is 300mm~1200mm.

4. The winding film forming system according to claim 1, characterized in that, The drying mechanism also includes a gas device, which is located at the inlet of the limiting cavity. The gas flow direction of the gas blown out by the gas device makes an angle of 0° to 70° with the limiting cavity.

5. The winding film forming system according to claim 1, characterized in that, The conveying mechanism allows the flexible substrate to pass sequentially through the coating mechanism, the drying mechanism, and the annealing mechanism, and provides support for the flexible substrate.

6. The winding film forming system according to claim 1, characterized in that, The annealing mechanism includes a first annealing module and a second annealing module, wherein the annealing temperature of the first annealing module is greater than that of the second annealing module, and the air velocity of the first annealing module is greater than that of the second annealing module.

7. The winding film forming system according to claim 6, characterized in that, The annealing temperature of the first annealing module is 100℃~150℃, and the wind speed is 3m / s~15m / s; the annealing temperature of the second annealing module is 0℃~100℃, and the wind speed is 0m / s~3m / s.

8. The winding film forming system according to claim 6, characterized in that, The first annealing module includes a first heating device and a first air compression device, and the second annealing module includes a second heating device and a second air compression device.

9. The winding film forming system according to claim 6, characterized in that, The annealing mechanism also includes a conveying device, which allows the flexible substrate to pass sequentially through the first annealing module and the second annealing module, and provides support for the flexible substrate.

10. The winding film forming system according to claim 1, characterized in that, It includes, in sequence, an unwinding mechanism, a peeling mechanism, a cleaning mechanism, the coating structure, the drying mechanism, the annealing mechanism, the film-applying mechanism, and the winding mechanism, as well as the conveying mechanism.

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