A device for treating semiconductor fluorine-containing wastewater and domestic sewage

Abstract

The utility model discloses a device for treating semiconductor fluorine-containing wastewater and domestic sewage, which comprises the following structures: a first sedimentation tank, a second sedimentation tank, an intermediate water pool, a domestic sewage collecting device, a mud film symbiotic SBR reactor, a first peristaltic pump, a second peristaltic pump, a third peristaltic pump, a fourth peristaltic pump, a first stirrer, a PLC integrated control center, a suction device, a third stirrer and a second stirrer. Compared with the conventional fluorine-containing wastewater treatment and short-path nitrification process, the utility model has the following advantages: 1) under the inhibition of fluorine ions, NOB is difficult to be enriched again, the short-path nitrification starts quickly and is more stable. 2) after primary treatment and biological treatment, the fluorine content in the effluent is far lower than the national discharge standard. 3) the treatment cost is low.

Description

Technical Field

[0001] This utility model belongs to the field of industrial wastewater biological treatment technology, specifically involving a short-cut nitrification process that uses a specific concentration of fluoride ions to inhibit the activity of nitrite-oxidizing bacteria (NOB) and promote the activity of ammonia-oxidizing bacteria (AOB), for the synergistic treatment of semiconductor fluoride-containing wastewater and domestic sewage, achieving efficient denitrification and deep fluoride removal. Technical Background

[0002] In recent years, the increasing discharge of industrial and urban wastewater has led to serious water pollution problems, causing eutrophication and jeopardizing the aquatic ecosystem balance. Strengthening nitrogen removal from water bodies is beneficial in reducing the risks of eutrophication and aquatic ecosystem imbalance.

[0003] Fluoride-containing wastewater (such as hydrofluoric acid etching wastewater) generated during semiconductor manufacturing is characterized by high fluoride concentrations (typically 1000–20,000 mg / L), high toxicity, and difficulty in degradation. Currently, the mainstream treatment process is calcium salt chemical precipitation (adding CaCl2 or lime to generate CaF2 precipitate). However, due to the limited solubility of CaF2 (Ksp=3.9×10⁻¹¹), the theoretical minimum residual fluoride concentration is approximately 8 mg / L, and actual effluent often exceeds the standard (>10 mg / L), making it difficult to meet the requirement of fluoride ions ≤1.5 mg / L in the "Electronic Industry Water Pollutant Discharge Standard" (GB39731-2020) (see "Industrial Water Treatment," 2023, No. 5). For deep defluorination, the industry is forced to adopt adsorption methods (such as lanthanum-modified zeolite) or reverse osmosis membranes, but these methods suffer from high costs (treatment cost of ¥15–25 per ton of water) and secondary pollution (adsorption waste / membrane concentrate).

[0004] Meanwhile, denitrification of domestic wastewater faces the common challenge of insufficient carbon sources leading to low denitrification efficiency. Although short-cut nitrification can control ammonia nitrogen oxidation at the nitrite stage, saving 25% of carbon sources and 40% of aeration energy consumption, its stable operation depends on high free ammonia (FA) or free nitrite (FNA) to inhibit nitrite-oxidizing bacteria (NOB). However, the low ammonia nitrogen concentration in domestic wastewater (typically <50 mg / L) makes it difficult to maintain the inhibition threshold of FA >1.0 mg / L, resulting in excessive NOB proliferation and a sharp decline in nitrite accumulation rate (NAR). Existing technologies attempt to increase FA concentration by adding ammonium chloride or controlling extreme pH, but this increases chemical consumption and system complexity.

[0005] It is worth noting that traditional research has viewed fluoride ions as microbial inhibitors (damaging cellular enzyme activity at concentrations >10 mg / L), neglecting the potential for differential regulation of nitrifying bacteria by low concentrations of fluoride ions (1–5 mg / L). Appropriate concentrations of fluoride ions can not only inhibit cytochrome c synthesis in NOB (nitrogenous oxygen bacteria) but also enhance the activity of ammonia monooxygenase (AMO) in ammonia-oxidizing bacteria (AOB). This invention is the first to introduce the effluent from semiconductor fluoride-containing wastewater precipitation as a precise fluoride source into a short-cut nitrification system for domestic sewage, achieving rapid start-up and stable operation of short-cut nitrification. Simultaneously, the fluoride ion concentration in the effluent is far below the discharge standards. Utility Model Content

[0006] Therefore, to address the aforementioned shortcomings, this utility model provides a method for treating fluoride-containing wastewater from semiconductor manufacturing and domestic sewage. Compared with traditional fluoride-containing wastewater treatment and short-cut nitrification processes, it has the following advantages: 1) Under the inhibition of fluoride ions, NOB is difficult to accumulate, and short-cut nitrification has a fast start-up speed and is more stable. 2) After primary treatment and biological treatment, the fluoride content in the effluent is far below the national emission standards. 3) Low treatment cost.

[0007] This utility model is implemented as follows: A device for treating semiconductor fluoride-containing wastewater and domestic sewage is constructed, characterized by comprising the following structures: a primary sedimentation tank, a secondary sedimentation tank, an intermediate water tank, a domestic sewage collection device, a sludge-film symbiotic SBR reactor, a first peristaltic pump, a second peristaltic pump, a third peristaltic pump, a fourth peristaltic pump, a first agitator, a PLC integrated control center, a suction device, a third agitator, and a second agitator; the first agitator is correspondingly arranged in the primary sedimentation tank, the second agitator is correspondingly arranged in the secondary sedimentation tank, and the third agitator is correspondingly arranged in the sludge-film symbiotic SBR reactor. The primary sedimentation tank and the secondary sedimentation tank are connected by a first peristaltic pump. The secondary sedimentation tank is connected to the intermediate water tank by a second peristaltic pump. The domestic sewage collection device is connected to the intermediate water tank by a third peristaltic pump. The intermediate water tank is connected to the sludge-film symbiotic SBR reactor by a fourth peristaltic pump. The PLC integrated control center is connected to the first, second, third, and fourth peristaltic pumps, the first agitator, the suction device, the third agitator, and the second agitator, and controls their operation. The suction device is connected to the bottom of the primary sedimentation tank, the secondary sedimentation tank, and the sludge-film symbiotic SBR reactor through pipelines.

[0008] According to the present application, an apparatus for treating semiconductor fluoride-containing wastewater and domestic sewage is characterized in that: the volume of the primary sedimentation tank and the secondary sedimentation tank is 5L, and they are cylindrical with a diameter of 20 cm; the corresponding agitator is located at the bottom of the sedimentation tank, 5-8 cm away from the bottom of the tank.

[0009] According to the present application, an apparatus for treating semiconductor fluoride-containing wastewater and domestic sewage is characterized in that: the domestic sewage collection device has a volume of 20L, is cylindrical, and has a diameter of 30 cm; the intermediate water tank has a volume of 25L, is cylindrical, and has a diameter of 35 cm.

[0010] According to the present application, an apparatus for treating semiconductor fluoride-containing wastewater and domestic sewage is characterized in that: a mud-film symbiotic SBR reactor with an effective volume of 25L, cylindrical in shape and with a diameter of 30 cm; the packing material in the reactor includes K3 type Pall rings after membrane attachment and sponge blocks, the sponge blocks being cubes with a side length of 1.2 cm; the carrier filling ratio in the reactor is 30%; and it also includes an aeration pump, a microporous aeration disc, a rotor flow meter, and a drainage solenoid valve.

[0011] According to the present application, an apparatus for treating semiconductor fluoride-containing wastewater and domestic sewage is characterized in that: a first pH meter and a second pH meter are respectively provided in the primary sedimentation tank and the secondary sedimentation tank, and an online fluoride ion analyzer (3-1) is provided in the intermediate water tank.

[0012] This invention has the following advantages: It provides an apparatus and method for treating semiconductor fluoride wastewater and domestic sewage, which, compared with traditional fluoride wastewater treatment and short-cut nitrification processes, have the following advantages: 1) Under the inhibition of fluoride ions, NOB is difficult to accumulate, and short-cut nitrification starts up quickly and is more stable. 2) After primary and biological treatment, the fluoride content in the effluent is far below the national discharge standard. 3) Low treatment cost. Attached Figure Description

[0013] Figure 1 This is a schematic diagram of the reactor apparatus; Figure 2 This is a schematic diagram illustrating the effect of fluoride ion concentration on the activity of nitrifying bacteria.

[0014] The system includes: a primary sedimentation tank (1), a secondary sedimentation tank (2), an intermediate water tank (3), a domestic sewage collection device (4), a mud-film symbiotic SBR reactor (5), a first peristaltic pump (6), a second peristaltic pump (7), a third peristaltic pump (8), a fourth peristaltic pump (9), a first agitator (10), a PLC integrated control center (11), a suction device (12), a third agitator (13), a second agitator (14), a first pH meter (1-1), a second pH meter (2-1), an online fluoride ion analyzer (3-1), a microporous aeration disc (5-1), a K3 type Pall ring (5-2), a sponge block (5-3), a drainage solenoid valve (5-4), an aeration pump (5-5), and a rotor flow meter (5-6). Detailed Implementation

[0015] The following will be combined with the appendix Figures 1-2This utility model will be described in detail, and the technical solutions in the embodiments of this utility model will be clearly and completely described. Obviously, the described embodiments are only some embodiments of this utility model, and not all embodiments. Based on the embodiments of this utility model, all other embodiments obtained by those of ordinary skill in the art without creative effort are within the protection scope of this utility model.

[0016] This utility model provides an apparatus for treating semiconductor fluoride-containing wastewater and domestic sewage, which is described below in conjunction with the appendix. Figures 1-2 As shown; it includes the following structure: primary sedimentation tank 1, secondary sedimentation tank 2, intermediate water tank 3, domestic sewage collection device 4, mud-film symbiotic SBR reactor 5, first peristaltic pump 6, second peristaltic pump 7, third peristaltic pump 8, fourth peristaltic pump 9, first agitator 10, PLC integrated control center 11, suction device 12, third agitator 13, and second agitator 14; The first agitator 10 is installed in the primary sedimentation tank 1, the second agitator 14 is installed in the secondary sedimentation tank 2, and the third agitator 13 is installed in the sludge membrane symbiotic SBR reactor 5. The primary sedimentation tank 1 and the secondary sedimentation tank 2 are connected by the first peristaltic pump 6, the secondary sedimentation tank 2 is connected to the intermediate water tank 3 by the second peristaltic pump 7, and the domestic sewage collection device 4 is connected to the intermediate water tank 3 by the third peristaltic pump 8. The intermediate water tank 3 and the sludge membrane symbiotic SBR reactor 5 are connected by the fourth peristaltic pump 9. The PLC integrated control center 11 is connected to the first peristaltic pump 6, the second peristaltic pump 7, the third peristaltic pump 8, the fourth peristaltic pump 9, the first stirrer 10, the suction device 12, the third stirrer 13, and the second stirrer 14, respectively, and controls the operation of the system. The suction device 12 is connected to the bottom of the primary sedimentation tank 1, the secondary sedimentation tank 2, and the mud-film symbiotic SBR reactor 5 via pipelines.

[0017] When the device is implemented, the volume of the primary sedimentation tank 1 and the secondary sedimentation tank 2 is 5L, and they are cylindrical with a diameter of 20cm. The corresponding agitator is located at the bottom of the sedimentation tank, 5-8cm away from the bottom of the tank.

[0018] The domestic sewage collection device 4 has a volume of 20L, is cylindrical, and has a diameter of 30 cm; the intermediate water tank 3 has a volume of 25L, is cylindrical, and has a diameter of 35 cm.

[0019] When the device is implemented, the mud-film symbiotic SBR reactor 5 has an effective volume of 25L and is cylindrical with a diameter of 30 cm. The packing material in the reactor includes K3 type Pall rings 5-2 after membrane attachment and sponge blocks 5-3. The sponge blocks 5-3 are cubes with a side length of 1.2 cm. The carrier filling ratio in the reactor is 30%. It also includes an aeration pump 5-5, a microporous aeration disc 5-1, a rotor flow meter 5-6, and a drainage solenoid valve 5-4.

[0020] When the device is implemented, a first pH meter 1-1 and a second pH meter 2-1 are respectively installed in the primary sedimentation tank 1 and the secondary sedimentation tank 2; and an online fluoride ion analyzer 3-1 is installed in the intermediate water tank 3.

[0021] This utility model also provides a method for treating semiconductor fluorine wastewater and domestic sewage, which is described below in conjunction with the appendix. Figures 1-2 The implementation process will be described in detail; Pretreatment of fluoride-containing wastewater: Semiconductor wastewater undergoes a two-stage calcium salt precipitation process, which occurs in primary sedimentation tank 1 and secondary sedimentation tank 2. This includes primary treatment: pH = 5.5–6.5, Ca²⁺:F⁻ = 1.05–1.15 (molar ratio), to remove fluoride to 15–20 mg / L. Secondary treatment: pH = 6.8–7.2, with additional Ca²⁺:F⁻ = 0.3:1, resulting in effluent fluoride ≤12 mg / L.

[0022] In the two-stage treatment process, the first-stage sedimentation uses lime slurry pretreatment, with the first agitator 10 stirring initially for 20-25 minutes. After the reaction, sedimentation begins for 1.5 hours. After sedimentation, the supernatant is pumped into the second-stage sedimentation tank via the first peristaltic pump 6. The second-stage sedimentation uses calcium chloride for deep treatment, with the second agitator 14 stirring initially for 45-60 minutes and sedimentation for 3 hours. After the second-stage sedimentation, the pretreated fluoride-containing wastewater is pumped into the intermediate tank 3 via the second peristaltic pump 7. The drainage ratio of both the first and second-stage sedimentation tanks is 80%. Then, the agitator 10 is activated, and the suction device 12 is simultaneously activated, discharging the sediment to a collection device for separate treatment.

[0023] The primary sedimentation tank 1 and the secondary sedimentation tank 2 each have a volume of 5L, are cylindrical, and have a diameter of 20 cm. The agitator is located at the bottom of the sedimentation tank, 5-8 cm from the bottom.

[0024] Domestic sewage is collected in domestic sewage collection device 4 and enters intermediate water tank 3 through third peristaltic pump 8 to mix with fluoride-containing wastewater.

[0025] The domestic sewage collection device 4 has a volume of 20L, is cylindrical, and has a diameter of 30cm. The intermediate water tank 3 has a volume of 25L, is cylindrical, and has a diameter of 35cm.

[0026] An online fluoride ion analyzer 3-1 is installed in the intermediate tank to provide feedback and regulate the influent flow rate of the semiconductor fluoride-containing wastewater. The fluoride ion concentration in the intermediate tank is maintained at 1.3-1.8 mg / L. Within this concentration range, AOB activity is effectively promoted while NOB activity is inhibited, thereby promoting nitrite accumulation and achieving stable short-cut nitrification. Toxicity threshold: Fluoride ions >7.5 mg / L inhibit all nitrifying bacteria; >20 mg / L will cause system collapse.

[0027] Short-range nitrification start-up.

[0028] Reactor Operation: A sludge-film co-production SBR reactor (SBR) 5 was used, with an effective volume of 25L and a cylindrical shape with a diameter of 30cm. The inoculum sludge in the SBR reactor was secondary sedimentation tank return sludge, with MLSS = 2700~3300 mg / L and MLVSS / MLSS = 0.0.5~0.0.65. The packing material in the reactor consisted of K3 type Pall rings 5-2 after biofilm attachment and sponge blocks 5-3. The sponge blocks were cubes with a side length of 1.2cm. The carrier filling ratio in the reactor was 30%.

[0029] The fourth peristaltic pump 9 controls the influent and effluent. Influent takes 10 minutes, and after influent, the total reaction time is 3 hours, with a settling time of 25 minutes and a drainage time of 10 minutes. The third agitator 13 agitates throughout the reaction cycle, using an intermittent aeration and anoxic agitation operation. First, during intermittent aeration, the ratio of aerobic time to anoxic time is 12.5 minutes:12.5 minutes. During the aerobic period, aeration pump 5-5 is started, and dissolved oxygen is controlled by a rotor flow meter 5-6. The reactor is equipped with a microporous aeration disc 5-1, and the DO concentration during aeration is 1.0–1.6 mg / L. Intermittent aeration is repeated four times, for a total of 2 hours. Then, anoxic agitation begins for denitrification, lasting 25 minutes. Next, there is a 25-minute settling period followed by a 10-minute drainage period. The drainage ratio is 60%. This completes one reaction cycle. Three cycles are run daily.

[0030] During the short-cut nitrification start-up phase, actual domestic wastewater from a semiconductor factory was used as the influent. Simultaneously, actual fluoride-containing wastewater from the semiconductor factory was mixed in as an exogenous NOB inhibitor. The fluoride ion concentration in the influent was continuously increased, allowing the nitrifying bacteria to adapt to the wastewater quality. The peak concentration was determined in batch experiments to be the optimal concentration for promoting AOB activity while inhibiting NOB activity. The fluoride ion concentration in the wastewater was distributed over time as follows: 1-2 days, 0.5 mg / L; 2-4 days, 0.8 mg / L; 4-5 days, 1.2 mg / L; from the tenth day onwards, the concentration was 1.5 mg / L. A constant temperature device was used to maintain the reactor temperature at 30–32℃.

[0031] The acclimation method for inoculated activated sludge is as follows: Secondary sedimentation tank return sludge from the wastewater treatment plant is acclimated in an SBR reactor to accelerate AOB enrichment. The influent ammonia nitrogen concentration is 100 mg / L, and the DO concentration in the reactor is maintained at 3–5 mg / L. No organic carbon source is added. Sodium bicarbonate 0.4 g / L is added to maintain the pH at 8.0–8.7. The effluent ratio is 50%, the HRT is 7 h, and the temperature control device is set at 30 ± 1℃. The indications for successful inoculation are: an ammonia nitrogen removal rate greater than 80%, and a rapid decrease in dissolved oxygen after aeration stops, reaching an anoxic state within 1.5 minutes during the initial aeration phase.

[0032] The optimal fluoride ion concentration (1.5 mg / L) during the short-cut nitrification start-up period was determined through batch experiments. Full-process nitrification activated sludge was selected and washed three times with deionized water to remove residual substrate. A gradient concentration of fluoride ions (0, 0.5, 1.0, 1.5, 2.0, 2.5 mg / L) was added to serum bottles, ensuring the same sludge concentration in each bottle. After one hour of thorough aeration, ammonium chloride and sodium nitrite stock solutions were added to achieve ammonia nitrogen and nitrite concentrations of 80 mg / L in the serum bottles. Samples were taken every half hour for three hours. After the experiment, the ammonia nitrogen and nitrate nitrogen concentrations and MLVSS in the water samples were measured. The activities of AOB and NOB were expressed as specific ammonia nitrogen oxidation rate and specific nitrate formation rate, respectively, in mgN / (g VSS∙h). The rates of ammonia nitrogen oxidation and nitrate formation were determined by linear regression. The fluoride ion concentration that promoted AOB, inhibited NOB, or had a stronger inhibitory effect on NOB was selected as the reactor dosage concentration. The effect of fluoride ion concentration on nitrifying bacteria activity is shown in the appendix. Figure 2 .

[0033] Two sludge-film co-existing SBR reactors were operated simultaneously. Sodium fluoride was added to the influent of one reactor at a concentration selected from batch experiments that promoted AOB inhibition of NOB or had a stronger inhibitory effect on NOB, while the other reactor was not added. Other operating conditions were the same. Nitrogen levels in the influent and effluent were measured every cycle; MLSS, MLVSS, SV30, and SVI were measured every 16 cycles (4 days). The effects of fluoride ions on short-cut nitrification start-up and sludge settling performance were evaluated throughout the reaction process; the short-cut nitrification start-up effect was assessed using ammonia nitrogen removal rate and nitrite accumulation rate; sludge settling performance was assessed using the sludge volume index (SVI); the concentrations of polysaccharides (PS) and proteins (PN) in extracellular polymeric substances (EPS) were determined using the anthrone reagent method and the modified Lowry method; and qPCR technology was used to analyze the abundance changes of functional microorganisms (AOB, Nitrobacter, Nitrospira) in the two reactors.

[0034] The signs of successful short-cut nitrification start-up are: ammonia nitrogen removal rate and nitrite accumulation rate both greater than 90% and remain stable for more than 10 cycles.

[0035] After rapid start-up of short-cut nitrification, AOB bacteria have become the dominant bacteria, and stable short-cut nitrification is maintained, allowing treatment of wastewater in the mixed water well to begin. The operation mode is as follows: A peristaltic pump controls the influent and effluent. Influent takes 10 minutes, followed by a total reaction time of 2.5 hours, a settling time of 25 minutes, and effluent drainage of 10 minutes. The agitator operates continuously throughout the reaction cycle, employing an intermittent aeration followed by anoxic agitation. First, during intermittent aeration, the ratio of aerobic to anoxic time is 10 minutes to 10 minutes; dissolved oxygen (DO) is controlled at 1.0–1.6 mg / L during aeration. Intermittent aeration is repeated four times, totaling 80 minutes. Then, anoxic agitation begins for denitrification, lasting 25 minutes. This is followed by 25 minutes of settling and 10 minutes of drainage. The drainage ratio is 60%. This completes one reaction cycle. Three cycles are run daily.

[0036] During 30 days of operation, short-cut nitrification and denitrification remained stable, with nitrite accumulation consistently above 90%. Nitrogen removal rate exceeded 80%. Effluent fluoride concentration was below 0.4 mg / L.

[0037] This invention provides an apparatus and method for treating semiconductor fluoride wastewater and domestic sewage, which has the following advantages compared with traditional fluoride wastewater treatment and short-cut nitrification processes: 1) Under the inhibition of fluoride ions, NOB is difficult to accumulate, resulting in faster and more stable short-cut nitration start-up.

[0038] 2) After primary and biological treatment, the fluoride content in the effluent is far below the national emission standards.

[0039] 3) Low processing cost.

[0040] The above description of the disclosed embodiments enables those skilled in the art to make or use the present invention. Various modifications to these embodiments will be readily apparent to those skilled in the art, and the general principles defined herein may be implemented in other embodiments without departing from the spirit or scope of the present invention. Therefore, the present invention is not to be limited to the embodiments shown herein, but is to be accorded the widest scope consistent with the principles and novel features disclosed herein.

Claims

1. An apparatus for treating semiconductor fluoride-containing wastewater and domestic sewage, characterized in that, The structure includes the following components: a primary sedimentation tank (1), a secondary sedimentation tank (2), an intermediate water tank (3), a domestic sewage collection device (4), a mud-film symbiotic SBR reactor (5), a first peristaltic pump (6), a second peristaltic pump (7), a third peristaltic pump (8), a fourth peristaltic pump (9), a first agitator (10), a PLC integrated control center (11), a suction device (12), a third agitator (13), and a second agitator (14). The first agitator (10) is installed in the primary sedimentation tank (1), the second agitator (14) is installed in the secondary sedimentation tank (2), and the third agitator (13) is installed in the mud-film symbiotic SBR reactor (5). The primary sedimentation tank (1) and the secondary sedimentation tank (2) are connected by the first peristaltic pump (6). The secondary sedimentation tank (2) is connected to the intermediate water tank (3) by the second peristaltic pump (7). The domestic sewage collection device (4) is connected to the intermediate water tank (3) by the third peristaltic pump (8). The intermediate water tank (3) and the mud-film symbiotic SBR reactor (5) are connected by the fourth peristaltic pump (9). The PLC integrated control center (11) is connected to the first peristaltic pump (6), the second peristaltic pump (7), the third peristaltic pump (8), the fourth peristaltic pump (9), the first stirrer (10), the suction device (12), the third stirrer (13), and the second stirrer (14), and controls the operation of the system. The suction device (12) is connected to the bottom of the primary sedimentation tank (1), the secondary sedimentation tank (2), and the mud-film symbiotic SBR reactor (5) through pipelines.

2. The apparatus for treating semiconductor fluoride-containing wastewater and domestic sewage according to claim 1, characterized in that; The volume of the primary sedimentation tank (1) and the secondary sedimentation tank (2) is 5L, and they are cylindrical with a diameter of 20 cm. The corresponding agitator is located at the bottom of the sedimentation tank, 5-8 cm away from the bottom of the tank.

3. The apparatus for treating semiconductor fluoride-containing wastewater and domestic sewage according to claim 1, characterized in that... ； The domestic sewage collection device (4) has a volume of 20L, is cylindrical, and has a diameter of 30 cm; the intermediate water tank (3) has a volume of 25L, is cylindrical, and has a diameter of 35 cm.

4. The apparatus for treating semiconductor fluoride-containing wastewater and domestic sewage according to claim 1, characterized in that; The mud-film symbiotic SBR reactor (5) has an effective volume of 25L and is cylindrical with a diameter of 30 cm. The packing material in the reactor includes K3 type Pall rings (5-2) after membrane attachment and sponge blocks (5-3). The sponge blocks (5-3) are cubes with a side length of 1.2 cm. The carrier filling ratio in the reactor is 30%. It also includes an aeration pump (5-5), a microporous aeration disc (5-1), a rotor flow meter (5-6), and a drainage solenoid valve (5-4).

5. The apparatus for treating semiconductor fluoride-containing wastewater and domestic sewage according to claim 1, characterized in that; The primary sedimentation tank (1) and the secondary sedimentation tank (2) are equipped with a first pH meter (1-1) and a second pH meter (2-1), respectively, and the intermediate water tank (3) is equipped with an online fluoride ion analyzer (3-1).

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