An industrial full-automatic film processor

Abstract

The utility model relates to a film processor technical field, concretely relates to an industrial full -automatic film processor, including developing platform, the top of developing platform is provided with sealed liquid keeping mechanism, sealed liquid keeping mechanism includes fixedly connected with the inactivity gas storehouse of developing platform bottom end and is provided with filter equipment in the inside of inactivity gas storehouse, filter equipment includes active carbon, molecular sieve and three filter mechanism of alkaline substance, the rear side fixed connection of inactivity gas storehouse has two groups of pump exhaust pipe, the rear side fixed connection of inactivity gas storehouse has inverted L type sliding seat. The utility model cooperates with the sealed liquid keeping mechanism through developing platform, starts and lifts the cylinder drive sealed platform to drop, makes its second sealing groove and the sealing strip in developing platform first sealing groove form mechanical seal, constructs the basic closed space, jointly constitutes a recyclable inactivity gas purification and supply system, the system not only can actively discharge the contaminated air in cavity, but also can continuously provide dry, pure inactivity gas protection atmosphere.

Description

Technical Field

[0001] This utility model relates to the field of film washing machine technology, specifically to an industrial fully automatic film washing machine. Background Technology

[0002] Film processing after industrial radiographic inspection (such as X-ray and gamma-ray inspection) is a critical step in quality assessment, and its quality directly affects the accuracy of defect identification. Traditional film processing methods mainly rely on manual operation or semi-automated tank-type film processors, which generally have many inherent drawbacks. Manual operation is not only cumbersome and inefficient, but also highly dependent on the operator's skill level and experience. More seriously, chemical solutions such as developers and fixers will undergo oxidation reactions with oxygen in the air in an open environment for a long time, leading to the decay of the effective components of the solutions and unstable performance. This results in quality problems such as uneven film development density and increased haze. At the same time, the continuous evaporation of the solutions will release harmful chemical gases, endangering the health of operators and polluting the environment.

[0003] To improve efficiency and consistency, various semi-automatic or fully automatic film washing equipment has emerged on the market, such as tank-type immersion transfer film washers and drum-type spray film washers. However, these devices still fail to fundamentally solve the problem of contact between the chemical solution and air. Their chemical tanks are usually open or semi-open designs, allowing oxidation and evaporation of the chemical solution to continue. Users need to frequently replace or add new solution to maintain the concentration, resulting in high operating costs and fluctuating treatment effectiveness depending on the lifespan of the chemical solution.

[0004] Therefore, it is necessary to invent a fully automatic industrial film washing machine to solve the above problems. Utility Model Content

[0005] The purpose of this invention is to provide a fully automatic industrial film processor that improves efficiency through the cooperation of the developing table and the sealing and liquid retention mechanism. This solves the problem that in the prior art, the liquid tank is usually designed to be open or semi-open, and the oxidation and evaporation of the liquid continues. Users need to frequently replace or add new liquid to maintain the concentration, which not only results in high operating costs, but also causes the processing effect to fluctuate with the life of the liquid.

[0006] To achieve the above objectives, this utility model provides the following technical solution: an industrial fully automatic film processor, including a developing table, a sealing and liquid-retaining mechanism above the developing table, the sealing and liquid-retaining mechanism including an inert gas chamber fixedly connected to the bottom of the developing table, and a filter device inside the inert gas chamber, the filter device including a three-stage filtration mechanism of activated carbon, molecular sieve and alkaline substance, two sets of pump-equipped suction pipes fixedly connected to the rear side of the inert gas chamber, and an inverted L-shaped sliding seat fixedly connected to the rear side of the inert gas chamber. A sealing platform is provided below the L-shaped sliding seat, and the end of the pump-equipped air extraction pipe away from the inert gas chamber is fixedly connected to the sealing platform. A gas distribution box is fixedly connected to the top of the sealing platform and is connected to the pump-equipped air extraction pipe. A first sealing groove is opened on the surface of the developing table. The first sealing groove is the same size as the sealing platform. A sealing door is provided on the left side of the sealing platform. Two sets of pump-equipped air extraction pipes are used to draw the chemical gas inside the sealing platform into the inert gas chamber for filtration and inject clean inert gas into the sealing platform, thus achieving sealing through the sealing platform.

[0007] Preferably, a lifting cylinder is fixedly connected to the top of the inverted L-shaped sliding seat, the output end of the lifting cylinder is fixedly connected to the top of the sealing platform, and the sealing platform is slidably connected to the front side of the inverted L-shaped sliding seat. The lifting cylinder is activated to drive the sealing platform to rise and fall.

[0008] Preferably, a second sealing groove is provided at the bottom of the sealing platform, and a sealing strip is fixedly connected to the bottom wall of the first sealing groove. The second sealing groove is the same size as the sealing strip, and the sealing effect is enhanced by the second sealing groove and the sealing strip.

[0009] Preferably, the surface of the developing table is provided with a developing tank and the surface of the developing table is provided with a fixing tank, and the film washing work is completed through the developing tank and the fixing tank.

[0010] Preferably, the surface of the developing table is provided with a cleaning tank, and the developing tank, fixing tank and cleaning tank are arranged in order from left to right, and the cleaning tank is used to clean off excess film solution.

[0011] Preferably, the top of the developing table is fixedly connected to three sets of upper electric rollers, and the interior of the developing tank, fixing tank and cleaning tank are all equipped with lower electric rollers. The upper electric rollers and lower electric rollers are arranged alternately, and automatic film processing is achieved by the cooperation of the upper electric rollers and lower electric rollers.

[0012] Preferably, the top of the developing table is provided with a drain plate and the drain plate is located on the right side of the cleaning tank. A collection tank is provided below the drain plate and the collection tank is located on the surface of the developing table. A drying pipe is provided above the drain plate and the drying pipe is installed on the top of the sealing table. Drying is achieved through the cooperation of the drain plate and the cleaning tank.

[0013] The technical effects and advantages provided by this utility model in the above technical solution are as follows: Through the coordination of the developing stage and the sealing and liquid retention mechanism, the lifting cylinder is activated to drive the sealing stage to descend, so that the second sealing groove of the sealing stage and the sealing strip in the first sealing groove of the developing stage form a mechanical seal, thus constructing a basic sealed space. On this basis, the inert gas chamber and its internally integrated three-stage filtration mechanism, which includes activated carbon adsorption of volatile organic compounds, molecular sieve deep dehumidification, and alkaline substances neutralizing acidic gases, together with two sets of pump-equipped air extraction pipes, constitute a recyclable inert gas purification and supply system. This system can not only actively expel polluted air from the chamber, but also continuously provide a dry and pure inert gas protective atmosphere, so that the chemicals in the developing tank and fixing tank are completely isolated from oxygen and moisture, greatly extending their effective service life, ensuring the ultimate stability and repeatability of imaging quality, saving energy and avoiding secondary pollution. Attached Figure Description

[0014] To more clearly illustrate the technical solutions in the embodiments of this application or the prior art, the drawings used in the embodiments will be briefly introduced below. Obviously, the drawings described below are only some embodiments recorded in this invention. For those skilled in the art, other drawings can be obtained based on these drawings.

[0015] Figure 1 This is a schematic diagram of the overall structure of this utility model; Figure 2 This is a schematic diagram of the sealing platform structure of this utility model; Figure 3 This is a schematic diagram of the developing table structure of this utility model; Figure 4 For the present utility model Figure 3 Enlarged structural diagram at point A in the middle; Figure 5 For the present utility model Figure 4 Enlarged structural diagram at point B.

[0016] Explanation of reference numerals in the attached figures: 1. Developing table; 2. Sealing and liquid retention mechanism; 201. Inert gas chamber; 202. Pump-equipped air extraction pipe; 203. Inverted L-shaped sliding seat; 204. Sealing table; 205. First sealing groove; 206. Gas distribution box; 207. Lifting cylinder; 3. Sealing door; 4. Sealing strip; 5. Developing tank; 6. Fixing tank; 7. Washing tank; 8. Draining plate; 9. Drying tube; 10. Upper electric roller assembly; 11. Lower electric roller assembly; 12. Second sealing groove. Detailed Implementation

[0017] To enable those skilled in the art to better understand the technical solution of this utility model, the present utility model will be further described in detail below with reference to the accompanying drawings.

[0018] This utility model provides, for example Figure 1-5 The industrial fully automatic film processor shown includes a developing table 1. A sealing and liquid retention mechanism 2 is provided above the developing table 1. The sealing and liquid retention mechanism 2 includes an inert gas chamber 201 fixedly connected to the bottom of the developing table 1, and a filter device is provided inside the inert gas chamber 201. The filter device includes a three-stage filtration mechanism consisting of activated carbon, molecular sieve, and alkaline substance. Two sets of pump-equipped exhaust pipes 202 are fixedly connected to the rear side of the inert gas chamber 201. An inverted L-shaped sliding seat 203 is fixedly connected to the rear side of the inert gas chamber 201. A sealing platform 204 is provided below the inverted L-shaped sliding seat 203, and the end of the pump-equipped exhaust pipe 202 away from the inert gas chamber 201 is fixedly connected to the sealing platform 204. A gas distribution box 206 is fixedly connected to the top of the sealing platform 204, and the gas distribution box 206 communicates with the pump-equipped exhaust pipe 202. A first sealing groove 205 is formed on the surface of the developing table 1. The groove 205 is the same size as the sealing platform 204. A sealing door 3 is provided on the left side of the sealing platform 204. Two sets of pump-equipped air extraction pipes 202 are used to draw the chemical gas inside the sealing platform 204 into the inert gas chamber 201 for filtration and inject the clean inert gas into the sealing platform 204. The sealing is achieved through the sealing platform 204. A lifting cylinder 207 is fixedly connected to the top of the inverted L-shaped sliding seat 203. The output end of the lifting cylinder 207 is fixedly connected to the top of the sealing platform 204. The sealing platform 204 is slidably connected to the front side of the inverted L-shaped sliding seat 203. The lifting cylinder 207 is activated to drive the sealing platform 204 to rise and fall. A second sealing groove 12 is opened at the bottom of the sealing platform 204. A sealing strip 4 is fixedly connected to the bottom wall of the first sealing groove 205. The second sealing groove 12 is the same size as the sealing strip 4. The second sealing groove 12 and the sealing strip 4 are used to enhance the sealing effect.

[0019] Refer to the instruction manual appendix Figure 1-5The developing table 1 has a developing tank 5 and a fixing tank 6 on its surface. Film washing is completed through the developing tank 5 and fixing tank 6. A cleaning tank 7 is also provided on the surface of the developing table 1. The developing tank 5, fixing tank 6, and cleaning tank 7 are arranged sequentially from left to right. Excess film solution is removed using the cleaning tank 7. Three sets of upper electric roller assemblies 10 are fixedly connected to the top of the developing table 1. Lower electric roller assemblies 11 are installed inside the developing tank 5, fixing tank 6, and cleaning tank 7. The upper and lower electric roller assemblies 10 are arranged alternately, and automatic film washing is achieved through the cooperation of the upper and lower electric roller assemblies 10 and 11. A drain plate 8 is located at the top of the developing table 1 and is situated to the right of the cleaning tank 7. A collection tank is located below the drain plate 8 and is situated on the surface of the developing table 1. A drying tube 9 is located above the drain plate 8 and is installed on the top of the sealing table 204. The drying process is achieved through the cooperation of the drain plate 8 and the cleaning tank 7. The lifting cylinder 207 is activated to drive the sealing platform 204 to descend, so that the second sealing groove 12 and the sealing strip 4 in the first sealing groove 205 of the developing platform 1 form a mechanical seal, thus creating a basic sealed space. On this basis, the inert gas chamber 201 and its internal three-stage filtration mechanism, which includes activated carbon adsorption of volatile organic compounds, molecular sieve deep dehumidification, and alkaline substances neutralizing acidic gases, together with two sets of pump-equipped air extraction pipes 202, constitute a recyclable inert gas purification and supply system. This system can not only actively expel polluted air from the chamber, but also continuously provide a dry and pure inert gas protective atmosphere, so that the chemicals in the developing tank 5 and fixing tank 6 are completely isolated from oxygen and moisture, which greatly extends their effective service life, ensures the ultimate stability and repeatability of imaging quality, saves energy, and avoids secondary pollution.

[0020] The working principle of this practical application is as follows: Refer to the instruction manual appendix Figure 1-5The fully automatic film processor begins by placing the film substrate to be processed through the left-side sealing door 3 and closing it. After startup, the lifting cylinder 207 actuates, pushing the sealing platform 204 downward along the inverted L-shaped sliding seat 203 until the second sealing groove 12 at its bottom is completely nested in the first sealing groove 205 on the surface of the developing table 1. Pressure sealing is achieved through the sealing strip 4 firmly installed in the groove, thereby forming a sealed processing chamber above the developing table 1 that is isolated from the outside world. Subsequently, the sealing and liquid retention mechanism 2 starts its working cycle: one set of pump-equipped air extraction pipes 202 is activated as an exhaust unit, drawing out the air in the sealed cavity and the mixture of chemical gases volatilized from the developing tank 5 and fixing tank 6, and transporting them to the inert gas chamber 201; these gases are forced to pass through a three-stage filtration mechanism in the chamber, consisting of activated carbon adsorbing organic solvent vapors and odors, molecular sieves selectively adsorbing water molecules for deep drying, and alkaline substances neutralizing acidic gases such as sulfur dioxide, effectively removing harmful components and water vapor, and obtaining pure regenerated inert gas; then, another set of pump-equipped air extraction pipes 202 is activated as an air intake unit, drawing the purified gas from the inert gas chamber 201 and evenly reinjecting it into the sealed cavity through the gas distribution box 206 on the top of the sealing platform 204, thus repeating the cycle, and finally establishing and maintaining a dry and pure inert gas environment slightly higher than atmospheric pressure in the cavity, providing optimal protection for the liquid. In this stable atmosphere, the automatic film processing begins: Each upper electric roller assembly 10 and its corresponding lower electric roller assembly 11 rotates synchronously under control system commands, precisely clamping and conveying the film substrates, immersing them sequentially in the developing tank 5 for development, into the fixing tank 6 for fixing, and then rinsing them in the cleaning tank 7 to remove residual chemicals. The cleaned film substrates are then transferred to the drain plate 8 on the right side of the cleaning tank 7, where a large number of droplets on their surface are drained by gravity into the collection tank below. Subsequently, the film substrates are sent to the drying station at the end of the drain plate 8. At this time, the drying pipe 9 integrated into the top of the sealing platform 204 is activated, blowing inert gas, which has been dried and possibly heated by the system, directly onto the surface of the film substrate. Utilizing its low humidity and a certain temperature, the gas quickly removes moisture, achieving efficient and pollution-free drying. After the entire process is completed, the sealing platform 204 is raised, and the finished film substrates are removed. When new film needs to be inserted, the sealing door 3 is opened and the air is kept evacuated for operation.

[0021] The foregoing description only illustrates certain exemplary embodiments of the present invention. Undoubtedly, those skilled in the art can modify the described embodiments in various ways without departing from the spirit and scope of the present invention. Therefore, the above drawings and descriptions are illustrative in nature and should not be construed as limiting the scope of protection of the claims of the present invention.

Claims

1. An industrial fully automatic film processor, comprising a developing table (1), characterized in that: A sealing and liquid-retaining mechanism (2) is provided above the developing table (1). The sealing and liquid-retaining mechanism (2) includes an inert gas chamber (201) fixedly connected to the bottom of the developing table (1), and a filter device is provided inside the inert gas chamber (201). The filter device includes a three-stage filter mechanism consisting of activated carbon, molecular sieve, and alkaline substance. Two sets of pump-equipped air extraction pipes (202) are fixedly connected to the rear side of the inert gas chamber (201). An inverted L-shaped sliding seat (203) is fixedly connected to the rear side of the inert gas chamber (201). A sealing platform (204) is provided below the seat (203), and the end of the pump-assisted air extraction pipe (202) away from the inert gas chamber (201) is fixedly connected to the sealing platform (204). A gas distribution box (206) is fixedly connected to the top of the sealing platform (204), and the gas distribution box (206) is connected to the pump-assisted air extraction pipe (202). A first sealing groove (205) is provided on the surface of the developing table (1). The first sealing groove (205) is the same size as the sealing platform (204). A sealing door (3) is provided on the left side of the sealing platform (204).

2. The fully automatic industrial wafer washing machine according to claim 1, characterized in that: The top of the inverted L-shaped sliding seat (203) is fixedly connected to a lifting cylinder (207), the output end of the lifting cylinder (207) is fixedly connected to the top of the sealing platform (204), and the sealing platform (204) is slidably connected to the front side of the inverted L-shaped sliding seat (203).

3. The fully automatic industrial wafer washing machine according to claim 1, characterized in that: The bottom of the sealing platform (204) is provided with a second sealing groove (12), and the bottom wall of the first sealing groove (205) is fixedly connected with a sealing strip (4). The second sealing groove (12) is the same size as the sealing strip (4).

4. The fully automatic industrial wafer washing machine according to claim 1, characterized in that: The surface of the developing stage (1) is provided with a developing tank (5) and a fixing tank (6).

5. The fully automatic industrial wafer washing machine according to claim 4, characterized in that: The surface of the developing table (1) is provided with a cleaning tank (7), and the developing tank (5), fixing tank (6) and cleaning tank (7) are arranged from left to right.

6. The fully automatic industrial wafer washing machine according to claim 4, characterized in that: The top of the developing table (1) is fixedly connected to three sets of upper electric rollers (10), and the developing tank (5), fixing tank (6) and cleaning tank (7) are all equipped with lower electric rollers (11). The upper electric rollers (10) and lower electric rollers (11) are arranged alternately.

7. The fully automatic industrial wafer washing machine according to claim 1, characterized in that: The top of the developing table (1) is provided with a drain plate (8) and the drain plate (8) is located on the right side of the cleaning tank (7). A collection tank is provided below the drain plate (8) and the collection tank is located on the surface of the developing table (1). A drying tube (9) is provided above the drain plate (8) and the drying tube (9) is installed on the top of the sealing table (204).

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