Dynamic and static decoupled lithography machine

Abstract

This application discloses a dynamic-static decoupled lithography machine, including a base plate that can be placed on the ground; a base beam located on the side of the base plate away from the ground; multiple vibration dampers located on the side of the base beam away from the base plate; a main substrate located on the side of the vibration dampers away from the base plate; a workpiece stage located on the same side of the main substrate as the vibration dampers; and a mask stage and a projection lens located on the side of the main substrate away from the vibration dampers. The main substrate, workpiece stage, mask stage, and projection lens constitute an internal frame, while the base beam, base, and lighting device constitute an external frame. This application uses vibration dampers to support the main substrate and positions the workpiece stage and vibration dampers on the same side of the main substrate, thereby suspending the workpiece stage, lowering the overall center of gravity of the lithography machine, and improving the overall stability of the lithography machine. Simultaneously, the internal and external frames are isolated and decoupled, thereby reducing the impact of vibration on the internal frame and improving its stability.

Description

Technical Field

[0001] This application relates to the field of lithography machine technology, and in particular to a lithography machine with dynamic and static decoupling. Background Technology

[0002] Photolithography equipment is an important piece of equipment in semiconductor processing. It is mainly used to transfer the pattern of integrated circuits from a mask to a silicon wafer through exposure. Specifically, photolithography equipment generally uses a workpiece stage to support the silicon wafer to be processed and fix the silicon wafer to prevent it from shifting during processing.

[0003] However, in typical lithography equipment, the workpiece stage is usually placed on the main substrate. During the exposure process of the lithography machine, the movement of some mechanical parts will generate vibration, which will affect the stability of the workpiece stage. Utility Model Content

[0004] Embodiments of this application provide a dynamic-static decoupled lithography machine that can reduce the impact of vibration on the workpiece stage by setting up a vibration damper and suspending the workpiece stage below the main substrate.

[0005] In a first aspect, embodiments of this application provide a dynamic-static decoupled lithography machine, the lithography machine comprising:

[0006] A base plate, which can be placed on the ground;

[0007] A base beam is provided on the side of the base plate away from the ground.

[0008] Multiple vibration dampers are provided on the side of the base beam away from the base plate;

[0009] The main base plate is disposed on the side of the vibration damper away from the base plate;

[0010] The workpiece stage and the vibration damper are located on the same side of the main base plate;

[0011] The main base plate forms an accommodating space with the base plate through the vibration damper and the base beam, and the workpiece table is suspended in the accommodating space.

[0012] In some embodiments, the lithography machine further includes:

[0013] A suspension member is provided for suspending the workpiece stage within the accommodating space; one end of the suspension member is located on the side of the main base plate near the bottom plate, and the other end of the suspension member is detachably connected to the workpiece stage.

[0014] In some embodiments, the base beam includes:

[0015] A crossbeam, which is provided on the side of the bottom plate away from the ground;

[0016] A plurality of bases, which are provided on the side of the crossbeam away from the bottom plate, and the shock absorbers are provided on the side of the bases away from the crossbeam; the plurality of bases are arranged in one-to-one correspondence with the plurality of shock absorbers;

[0017] Wherein, the crossbeam is detachably connected to the base, or the crossbeam and the base are integrally formed.

[0018] In some embodiments, the crossbeam includes:

[0019] Two first crossbeams, on which the base is provided;

[0020] A second crossbeam, one end of the second crossbeam is connected to one of the first crossbeams, and the other end of the second crossbeam is connected to the other first crossbeam.

[0021] In some embodiments, the crossbeam includes at least two second crossbeams, and / or one end of the second crossbeam is connected to the first crossbeam at a position close to the base.

[0022] [[ID=ZI]]In some embodiments, the second crossbeam is detachably connected to both of the first crossbeams;

[0023] Or, the second crossbeam and the two first crossbeams are integrally formed;

[0024] Or, the second crossbeam is integrally formed with one of the first crossbeams, and one end of the second crossbeam is detachably connected to the other first crossbeam.

[0025] In some embodiments, one side of the first crossbeam close to the second crossbeam has a first installation groove, and one end of the second crossbeam extends into the first installation groove so that the first crossbeam and the second crossbeam are detachably connected.

[0026] In some embodiments, the base crossbeam further includes:

[0027] A reinforcing member, one end of the reinforcing member is provided on the outside of the first crossbeam close to the first installation groove, and the other end of the reinforcing member passes through the first crossbeam and enters the first installation groove, and extends into the second crossbeam for setting.

[0028] In some embodiments, in the direction perpendicular to the ground, the cross-section of the base is in the shape of "I" or "king".

[0029] In some embodiments, the lithography machine further includes:

[0030] A lighting device is mounted on the base plate and is located on one side of the base beam;

[0031] A mask stage is located on the side of the main substrate away from the base plate;

[0032] A projection lens is disposed on the main substrate and is located on one side of the lighting device;

[0033] The projection lens is disposed between the mask stage and the main substrate, and the mask stage is located above the projection lens.

[0034] The beneficial effects of this application are as follows: This application supports the main substrate with a vibration damper and places the workpiece stage and the vibration damper on the same side of the main substrate, thereby suspending the workpiece stage, lowering the overall center of gravity of the lithography machine, and improving the overall stability of the lithography machine. At the same time, this structure can decouple the overall frame of the lithography machine, thereby reducing the impact of vibration on the structural frame mounted on the vibration damper and improving the stability of the structural frame mounted on the vibration damper. Attached Figure Description

[0035] To more clearly illustrate the technical solutions in the embodiments of this application, the accompanying drawings used in the description of the embodiments will be briefly introduced below. Obviously, the accompanying drawings described below are only some embodiments of this application. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0036] Figure 1 This is a schematic diagram of the structure of a lithography machine according to one embodiment of this application;

[0037] Figure 2 This is a side view of the structure of a lithography machine according to one embodiment of this application;

[0038] Figure 3 This is a schematic diagram of the base beam structure of one embodiment of this application;

[0039] Figure 4 This is a schematic diagram of the base beam structure of another embodiment of this application;

[0040] Figure 5 This is a schematic diagram of the base beam structure of another embodiment of this application.

[0041] Explanation of reference numerals in the attached figures:

[0042] 10-Base plate; 20-Base beam; 30-Vibration damper; 40-Main base plate; 50-Workpiece stage; 60-Accommodation space; 70-Suspension component; 21-Beam; 22-Base; 211-First beam; 212-Second beam; 2111-First mounting slot; 23-Reinforcing component; 80-Lighting device; 91-Mask stage; 92-Projection lens; 100-Ground; 11-Supporting foot. Detailed Implementation

[0043] The technical solutions of the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only a part of the embodiments of this application, and not all of the embodiments. Based on the embodiments of this application, all other embodiments obtained by those of ordinary skill in the art without creative effort are within the scope of protection of this application.

[0044] Please refer to Figure 1 and Figure 2 In one embodiment, this application provides a dynamic-static decoupled lithography machine, the lithography machine comprising:

[0045] Base plate 10, which can be placed on the ground 100.

[0046] The base beam 20 is located on the side of the base plate 10 away from the ground 100.

[0047] Multiple vibration dampers 30 are provided on the side of the base beam 20 away from the base plate 10.

[0048] The main base plate 40 is located on the side of the vibration damper 30 away from the base plate 10.

[0049] The workpiece stage 50 and the vibration damper 30 are located on the same side of the main base plate 40.

[0050] The main base plate 40 forms an accommodating space 60 between the damper 30 and the base beam 20 and the base plate 10, and the workpiece table 50 is suspended in the accommodating space 60.

[0051] In this embodiment, the base plate 10 serves as the bottom structure of the entire lithography machine, used to mount other devices of the lithography machine. Furthermore, the base plate 10 may also be provided with support feet 11, which support the entire base plate 10 through contact with the ground.

[0052] In this embodiment, the base beam 20 serves as a support structure for the vibration damper 30 and the main base plate 40, maintaining the stability of the overall structure. Simultaneously, the base beam 20 and the vibration damper 30 together raise the height of the main base plate 40, ensuring that the formed accommodating space 60 provides sufficient height for suspending the workpiece stage 50.

[0053] In this embodiment, the vibration damper 30 can reduce the impact of vibrations generated by the lithography machine during exposure on the main substrate 40.

[0054] In this embodiment, the main substrate 40 is the main support structure for setting up the workpiece stage 50, used to suspend the workpiece stage 50, as well as support components such as the projection lens 92 and the mask stage 91 of the lithography machine.

[0055] In this embodiment, the workpiece stage 50 is used to carry and position the workpiece to be processed by the lithography machine, such as carrying silicon wafers. In some embodiments, the workpiece stage 50 is also referred to as a wafer stage.

[0056] In this embodiment, the main substrate 40 forms an accommodating space 60 between the vibration damper 30 and the base beam 20 and the base plate 10. The workpiece stage 50 is suspended within the accommodating space 60, allowing it to be suspended on the side of the main substrate 40 closest to the ground, i.e., below the main substrate 40. The vibration damper 30 blocks the transmission path of vibration, reducing its impact on the workpiece stage 50. Furthermore, instead of directly placing the workpiece stage 50 above the main substrate 40 in existing designs, the workpiece stage 50 is suspended, lowering the overall center of gravity of the lithography machine and improving its overall stability. Simultaneously, this structure decouples the overall frame of the lithography machine, reducing the impact of vibration on the structural frame mounted on the vibration damper 30, and improving the stability of the structural frame mounted on the vibration damper 30. This provides a dynamic-static decoupling method for the lithography machine structure, separating dynamic responses such as vibration from the static loads of structures like the workpiece stage 50, thereby improving the stability of the workpiece stage 50 itself.

[0057] In this embodiment, by suspending the workpiece stage 50, the workpiece stage 50 and the main substrate 40 can be detachably connected to facilitate the inspection and maintenance of the workpiece stage 50.

[0058] Please refer to Figure 1 and Figure 2 In one embodiment, the lithography machine further includes:

[0059] The suspension member 70 has one end located on the side of the main base plate 40 near the bottom plate 10, and the other end is detachably connected to the workpiece stage 50.

[0060] In this embodiment, a suspension member 70 is provided to suspend the workpiece stage 50 below the main substrate 40.

[0061] In one embodiment, the suspension element 70 is a hanging ring.

[0062] In this embodiment, the workpiece stage 50 is suspended below the main base plate 40, and the vibration damper 30 is installed below the main base plate 40, which can lower the overall center of gravity and reduce the vibration of the whole machine.

[0063] Please refer to Figure 3 The specific structure of the base beam 20 is further optimized, and the base beam 20 includes:

[0064] A crossbeam 21 is located on the side of the base plate 10 away from the ground 100.

[0065] Multiple bases 22 are provided on the side of the crossbeam 21 away from the base plate 10, and vibration dampers 30 are provided on the side of the base 22 away from the crossbeam 21. The multiple bases 22 and multiple vibration dampers 30 are provided in a one-to-one correspondence. The crossbeam 21 and the base 22 are detachably connected, or the crossbeam 21 and the base 22 are integrally formed.

[0066] In this embodiment, the crossbeam 21 is used to install the vibration damper 30, and the crossbeam 21 also serves as a support structure for the base 22, providing it with stability and ensuring that the vibration damper 30 on the base 22 does not shift during the operation of the lithography machine.

[0067] In this embodiment, the crossbeam 21 and the base 22 can be detachably connected, for example, by screws or other threaded connections, or by snap-fit ​​connections. Alternatively, the crossbeam 21 and the base 22 can be integrally formed during production, or they can be fixedly connected by welding.

[0068] Please refer to Figure 3 and Figure 4 The specific structure of the crossbeam 21 is further optimized, and the crossbeam 21 includes:

[0069] Two first crossbeams 211, and a base 22 is mounted on the first crossbeams 211.

[0070] The second crossbeam 212 has one end connected to one of the first crossbeams 211, and the other end connected to the other first crossbeam 211.

[0071] In this embodiment, the crossbeam 21 is split into a first crossbeam 211 and a second crossbeam 212 to facilitate disassembly and quick maintenance.

[0072] In this embodiment, multiple bases 22 on the first crossbeam 211 can be provided according to the number of vibration dampers 30.

[0073] In this embodiment, the number of second crossbeams 212 is not limited. Even with only one second crossbeam 212, the connection between the two first crossbeams 211 can be achieved so that all the dampers 30 provided on the first crossbeams 211 can work together to reduce vibration.

[0074] Please refer to Figure 1 In one embodiment, the structure of the crossbeam 21 is further optimized by setting the crossbeam 21 to include at least two second crossbeams 212, and / or, one end of the second crossbeam 212 is connected to the first crossbeam 211 at a position near the base 22.

[0075] In this embodiment, at least two second crossbeams 212 are provided. By adding the second crossbeams 212, the stability of the connection between the two first crossbeams 211 is further improved. Simultaneously, one end of the second crossbeam 212 is connected to the first crossbeam 211 near the base 22, making the structure at the vibration point more stable. In one embodiment, the two first crossbeams 211 and the two second crossbeams 212 are connected end-to-end at intervals to form a U-shaped structure, while the base 22 is located at the four corners of the U-shaped structure, corresponding to the vibration dampers 30, thus achieving a better vibration reduction effect.

[0076] Please continue to refer to this. Figure 1 The connection method of the first crossbeam 211 and the second crossbeam 212 is further optimized. The first crossbeam 211 and the second crossbeam 212 can be any of the following connection methods:

[0077] The second crossbeam 212 is detachably connected to both first crossbeams 211.

[0078] The second crossbeam 212 is integrally formed with the two first crossbeams 211.

[0079] The second crossbeam 212 is integrally formed with one of the first crossbeams 211, and one end of the second crossbeam 212 is detachably connected to the other first crossbeam 211.

[0080] In this embodiment, through the above-described method, when the crossbeam 21 is integrally molded, the overall structure of the crossbeam 21 is more stable; when it is detachably connected, the crossbeam 21 can be disassembled to separate the second crossbeam 212 from the first crossbeam 211 during maintenance, thus simplifying the disassembly process. Under normal conditions, installing the crossbeam 21 helps reduce the deformation of the main substrate 40; when maintaining the workpiece table 50, it can be removed, facilitating the transport of the workpiece table 50 from the bottom via an air cushion.

[0081] In one embodiment, the first crossbeam 211 and the second crossbeam 212 can also be connected by screws or other means, or fixedly connected by welding or other means.

[0082] Please refer to Figure 3 and Figure 4, further optimize the specific connection structure of the first cross beam 211 and the second cross beam 212. Set that one side of the first cross beam 211 close to the second cross beam 212 has a first installation groove 2111, and one end of the second cross beam 212 extends into the first installation groove 2111, so that the first cross beam 211 and the second cross beam 212 are detachably connected.

[0083] In this embodiment, the first cross beam 211 is provided with a first installation groove 2111. At this time, by extending the second cross beam into the first installation groove 2111, the detachable connection between the two can be realized. When disassembly is required, only need to pull out the second cross beam 212.

[0084] [[ID=I6]]Please refer to Figure 4 , in order to further improve the connection stability between the first cross beam 211 and the second cross beam 212 in the base cross beam 31, set that the base cross beam 31 further includes:

[0085] A reinforcing member 317, one end of the reinforcing member 317 is arranged on the outside of the first cross beam 211 close to one side of the first installation groove 2111, the other end of the reinforcing member 317 passes through the first cross beam 211 and enters the first installation groove 2111, and extends into the second cross beam 212 for setting.

[0086] In this embodiment, by adding the reinforcing member 317, further reinforce the connection between the first cross beam 211 and the second cross beam 212 that extends into, making the overall structure more stable. At the same time, the reinforcing member 317 is also convenient for disassembly.

[0087] In one embodiment, the reinforcing member 317 is a screw or a bolt. Further, the surface of the first cross beam 211 corresponding to the first installation groove 2111 is provided with an installation hole communicating with the first installation groove 2111. <00S0196>

[0088] Please refer to Figure 5 , further optimize the structure of the base 22. In the direction perpendicular to the ground 100, set that the cross section of the base S2 is in the shape of "I" or "king".

[0089] In this embodiment, through the above setting, to increase the contact area between the shock absorber 30 and the base 22, improve the stability of the shock absorber 30, and further improve the stability of the installation of the main substrate 40.

[0090] In one embodiment, please refer to Figure 1 , the base 22 can also be a cube structure to further improve the stability.

[0091] Please refer to Figure 1 and Figure 2 , the lithography machine further includes:

[0092] A lighting device 80, arranged on the bottom plate 10, and the lighting device 80 is located on one side of the base cross beam 20.

[0093] A mask stage 91 is located on the side of the main substrate 40 away from the base plate;

[0094] A projection lens 92 is disposed on the main substrate 40 and is disposed on one side of the lighting device 80;

[0095] The projection lens 92 is disposed between the mask stage 91 and the main substrate 40, with the mask stage 91 located above the projection lens 92.

[0096] In this embodiment, the lithography machine is an important piece of equipment for processing silicon wafers (or silicon wafers). The base plate 10 provides a mounting surface for each component. The vibration damper 30 is used to dampen the vibration of the workpiece stage 50 that carries the silicon wafers within the equipment.

[0097] In this embodiment, the lighting device 80 is directly mounted on the base plate 10, further lowering the center of gravity of the lighting device 80 and improving the stability of the overall equipment. Simultaneously, the vibration damper 30 also reduces the impact of vibrations generated by the lighting device 80 on other supported structures. In this embodiment, the lighting device 80 provides the light source used for projection, and the light outlet of the lighting device 80 is located above the mask stage 91.

[0098] In this embodiment, the mask stage 91 is used to carry the mask template and ensures precise alignment between the pattern and the wafer through high-speed synchronous movement, and cooperates with exposure scanning. The projection lens 92 is used to scale down the pattern on the mask template with high precision and project it onto the wafer, realizing imaging through an optical system.

[0099] In one embodiment, the lighting device 80 is mounted on the base plate 10 to reduce the impact of vibrations generated during shutter operation on the main substrate 40.

[0100] In one embodiment, the vibration dampers 30 are disposed at the four corners of the base beam 20 to increase the spacing between adjacent vibration dampers 30, so as to give full play to the performance of active vibration isolation.

[0101] In one embodiment, the main substrate 40 is mounted on the vibration damper 30, the workpiece stage 50 is suspended below the main substrate 40 by a lifting ring, the projection lens 92 is mounted on the main substrate 40, and the mask stage 91 is mounted above the main substrate 40 by a base. The main substrate 40, workpiece stage 50, projection lens 92, and mask stage 91 constitute an internal frame; the internal frame is mounted on the base plate 10 by the vibration damper 30. The illumination device 80 of the lithography machine is mounted on the base plate 10, forming an external frame together with the base plate 10.

[0102] In one embodiment, the lithography machine described in the above embodiment uses a vibration damper 30 to support the main substrate 40, and the workpiece stage 50 and the vibration damper 30 are positioned on the same side of the main substrate 40, thereby suspending the workpiece stage 50. This lowers the overall center of gravity of the lithography machine and improves its overall stability. Simultaneously, the projection lens 92 and the mask stage 91 are positioned above the main substrate 40. In this way, the main substrate 40, workpiece stage 50, projection lens 92, and mask stage 91 constitute the internal frame of the lithography machine, while the base beam 20, lighting device 80, and base plate 10 constitute the external frame. The internal frame is isolated from the external frame by the vibration damper 30, decoupling it from other structures of the lithography machine, thereby reducing the impact of vibration on the internal frame and improving the stability of the internal modules. Furthermore, the base beam 20 is a detachable structure. In the working state, the beams 21 (including two first beams 211 and two second beams 212) are connected together, which can reduce the deformation of the main substrate 40. When repairing the workpiece table, the second crossbeam 212 in the base crossbeam 20 is removed, so that the workpiece table 50 can be transported to the outside for inspection via the air float.

[0103] The above description is merely an embodiment of this application and does not limit the patent scope of this application. Any equivalent structural or procedural transformations made using the content of this application's specification and drawings, or direct or indirect applications in other related technical fields, are similarly included within the patent protection scope of this application.

Claims

1. A photolithography machine with decoupled motion and static components, characterized in that, The lithography machine includes: a bottom plate which can be placed on the ground; a base crossbeam which is arranged on the side of the bottom plate away from the ground; a plurality of shock absorbers which are arranged on the side of the base crossbeam away from the bottom plate; a main substrate which is arranged on the side of the shock absorbers away from the bottom plate; a worktable which is arranged on the same side of the main substrate as the shock absorbers; wherein, a receiving space is formed between the main substrate and the bottom plate through the shock absorbers and the base crossbeam, and the worktable is suspended in the receiving space; the worktable is detachably connected to the main substrate through a suspension member; the base crossbeam includes a crossbeam and a plurality of bases; the crossbeam is arranged on the side of the bottom plate away from the ground; the bases are arranged on the side of the crossbeam away from the bottom plate, and the shock absorbers are arranged on the side of the bases away from the crossbeam; the plurality of bases are arranged corresponding to the plurality of shock absorbers one by one; wherein, the crossbeam is detachably connected to the bases, the base crossbeam is provided with a reinforcing member for reinforcement.

2. The lithography machine according to claim 1, characterized in that, The suspension member is used for suspending the worktable in the receiving space; one end of the suspension member is arranged on the side of the main substrate close to the bottom plate, and the other end of the suspension member is detachably connected to the worktable.

3. The lithography machine according to claim 1, characterized in that, The crossbeam includes: two first crossbeams on which the bases are arranged; a second crossbeam, one end of the second crossbeam is connected to one of the first crossbeams, and the other end of the second crossbeam is connected to the other first crossbeam.

4. The lithography machine according to claim 3, characterized in that, The crossbeam includes at least two second crossbeams, and / or, one end of the second crossbeam is connected to the first crossbeam at a position close to the base.

5. The lithography machine according to claim 4, wherein the second crossbeam is detachably connected to both of the first crossbeams; or, the second crossbeam and the two first crossbeams are integrally formed; or, the second crossbeam and one of the first crossbeams are integrally formed, and one end of the second crossbeam is detachably connected to the other first crossbeam.

6. The lithography machine according to claim 5, characterized in that, One side of the first crossbeam close to the second crossbeam has a first installation groove, and one end of the second crossbeam extends into the first installation groove so that the first crossbeam and the second crossbeam are detachably connected.

7. The lithography machine according to claim 6, characterized in that, One end of the reinforcing member is arranged on the outside of the first crossbeam close to the first installation groove, and the other end of the reinforcing member passes through the first crossbeam and enters the first installation groove, and extends into the second crossbeam for arrangement.

8. The lithography machine according to claim 1, characterized in that, In the direction perpendicular to the ground, the cross-section of the base is in the shape of "I" or "king".

9. The lithography machine according to any one of claims 1-8, characterized in that, The lithography machine further includes: an illumination device which is arranged on the bottom plate and is located on one side of the base crossbeam; a mask table which is arranged on the side of the main substrate away from the bottom plate; a projection objective which is arranged on the main substrate and is located on one side of the illumination device; wherein, the projection objective is arranged between the mask table and the main substrate, and the mask table is located above the projection objective.

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