MPCVD chamber yellow skin impurity removal device

Abstract

The utility model relates to a device for manufacturing diamond characterized by a method of introducing gas into a reaction chamber or changing the gas flow in the reaction chamber, and particularly relates to an MPCVD cavity yellow skin impurity removal device. The device comprises a dry ice cleaning machine and a protective tooling. The dry ice cleaning machine includes a dry ice particle nozzle and a dry ice spray gun. The protective tooling includes a protective cover for covering outside the cavity and a dust suction component for connecting a negative pressure device supporting the cavity. An operation port for operating the dry ice spray gun to clean the cavity is arranged on the protective cover. The dust suction component includes a tray, on which a connecting pipe for hermetically connecting with a vacuum extraction port arranged on the cavity bottom plate of the cavity is arranged, and a filter medium is further arranged on the tray to filter the gas entering the connecting pipe. The MPCVD cavity yellow skin impurity removal device of the utility model introduces the dry ice cleaning method into the cleaning of the MPCVD cavity, and solves the problems of damaging the cavity environment and the cavity surface during the cleaning process of the MPCVD cavity.

Description

Technical Field

[0001] This utility model relates to an apparatus for manufacturing diamonds characterized by introducing gas into a reaction chamber or changing the airflow in the reaction chamber, and particularly to an MPCVD chamber yellow skin impurity removal device. Background Technology

[0002] The preparation of high-quality single-crystal diamond using microwave plasma chemical vapor deposition (MPCVD) requires a special growth environment. During the growth of single-crystal diamond wafers, special gases such as hydrogen, methane, oxygen, and nitrogen are introduced. These gases are excited into plasma under the influence of microwave energy and deposited on the single-crystal diamond wafers. The chamber environment (reaction chamber) required for single-crystal diamond growth has a significant impact on the quality and efficiency of the synthesis. For example, the cleanliness, temperature, humidity, and outgassing rate within the chamber are important factors affecting the quality of the synthesized single-crystal diamond.

[0003] During the growth of single-crystal diamond, in addition to the beneficial substances that promote growth deposited on the single-crystal diamond, other non-diamond impurities (yellow skin impurities) are generated on the inner wall of the chamber and the surface of the growth abutment. These impurities adhere to the surface of the chamber and the growth abutment, altering the physicochemical properties of the surface and adversely affecting diamond manufacturing. For example, the presence of impurities affects the cleanliness of the chamber and the surface temperature. The outgassing rate of impurities is higher than that of metals, leading to gas pollution during synthesis. If impurities are not cleaned after multiple growth cycles, there is a risk of them falling and contaminating the single-crystal diamond wafer during the growth process. Furthermore, the thickening of impurities affects the morphology of the plasma spheres, disrupting their rounded shape and consequently affecting the temperature distribution of the growth abutment. Therefore, timely cleaning of the MPCVD equipment chamber and the surface of the growth abutment after each growth cycle is crucial for the quality of single-crystal diamond growth.

[0004] The existing cleaning methods for the cavity and the growth base mainly include the steam method and the manual scraping method. In the steam method, a smoking gun of a steam engine is aimed at the impurities for fumigation, and finally the impurities are removed completely through fumigation and wetting. Although the steam method is time-saving and labor-saving for cleaning the yellow skin, the water vapor brought by steam fumigation pollutes the inner wall of the cavity and the surface of the growth base. After the water vapor combines with the impurities, it not only has corrosiveness, but also the water vapor adhering to the surface of the cavity and the growth base after cleaning increases the humidity inside the cavity. This increases the difficulty of leak detection before starting up and consumes time during the synthesis process of single-crystal diamond. Moreover, when the humidity increases, the latent water vapor released during the synthesis process will further affect the synthesis quality of single-crystal diamond. The manual scraping method uses physical means to remove impurities. Tools such as sandpaper, scouring pads, and small files are used to manually grind off the impurities adhering to the surface of the cavity and the growth base. This method is time-consuming and laborious, and it will also scratch the surface of the cleaned part. The scratched surface may affect microwave transmission and the leakage rate, and the scratched surface is more likely to deposit impurities. For the quartz wafer in the window part of the cavity, after being scratched, it seriously affects the operator's observation of the synthesis situation of single-crystal diamond in the reaction cavity and cannot effectively measure the temperature of the single-crystal diamond wafer. Utility Model Content

[0005] The purpose of the present utility model is to provide a device for removing yellow skin impurities in an MPCVD cavity, so as to solve the problems of damaging the cavity environment and damaging the cavity surface during the cleaning process of the MPCVD cavity.

[0006] To solve the above problems, the device for removing yellow skin impurities in the MPCVD cavity of the present utility model adopts the following technical solutions:

[0007] The device for removing yellow skin impurities in the MPCVD cavity includes a dry ice cleaning machine and a protective tooling. The dry ice cleaning machine includes a dry ice particle spray pipe and a dry ice spray gun connected to the dry ice particle spray pipe. The protective tooling includes a protective cover for covering outside the cavity and a dust suction component for connecting to the negative pressure device supporting the cavity. An operation port for operating the dry ice spray gun to clean the cavity is provided on the protective cover; the dust suction component includes a tray, a connecting pipe for hermetically connecting to the vacuum extraction port provided on the cavity bottom plate of the cavity is provided on the tray, and a filter material is further provided on the tray to filter the gas entering the connecting pipe.

[0008] Furthermore, an installation groove is provided on the tray, the filter material is arranged in the installation groove, and a pressure equalizing cavity is provided between the upper end of the filter material and the connecting pipe, and each connecting pipe communicates with the pressure equalizing cavity. [[ID=!15]]

[0009] Furthermore, a perforated plate is provided in the installation groove, and the filter material is supported on the perforated plate.

[0010] Furthermore, the periphery of the orifice plate is sealed to the tray by a sealing ring, which surrounds the pressure equalization chamber.

[0011] Furthermore, the connecting pipe is a rigid pipe and forms the support leg of the tray.

[0012] Furthermore, the lower end of the connecting pipe is provided with a plug section for connecting to the vacuum port.

[0013] Furthermore, the diameter of the insertion section is smaller than the diameter of other parts of the connecting pipe, and a stepped surface is formed at the upper end of the insertion section. A sealing ring is provided on the stepped surface for sealing and engaging with the edge of the vacuum port.

[0014] Furthermore, the operating port of the protective cover is located on its side, and a dust suction hole is provided on the top surface of the protective cover.

[0015] Furthermore, the protective cover is provided with a dustproof curtain connection structure above the operating port for installing a dustproof curtain.

[0016] Furthermore, the top wall and / or the inner side of the side wall of the protective cover are provided with a pull-out groove, through which a sound insulation plate is installed on the side wall of the protective cover.

[0017] Beneficial Effects: This invention, a pioneering device for removing yellow residue from MPCVD chambers, is groundbreaking. The device uses a dry ice cleaner to remove deposited impurities from MPCVD chambers. Dry ice is sprayed onto the deposited impurities, causing them to break and detach under the impact and the effects of thermal expansion and contraction. Dry ice cleaning is simple to operate, quick, and avoids the physical damage to the surface caused by manual scraping, as well as the corrosion and humidity effects of steam cleaning. Furthermore, the protective cover of the protective fixture can contain dust generated during the cleaning process. Connecting the connecting pipe to the vacuum port allows the use of the MPCVD chamber's vacuum system to create negative pressure inside the protective cover, collecting dust and preventing it from affecting the cleanliness of the production environment (typically a cleanroom) where the MPCVD chamber is located. In summary, this invention introduces dry ice cleaning into MPCVD chamber cleaning, solving the problems of disrupting the chamber environment and damaging the chamber surface during cleaning. Attached Figure Description

[0018] Figure 1 This is a schematic diagram of the protective tooling in use in one embodiment of the MPCVD cavity yellow skin impurity removal device of this utility model;

[0019] Figure 2 yes Figure 1 A schematic diagram of the tray and filter media in the diagram;

[0020] Figure 3 yes Figure 1 Exploded view of the tray and filter media in the image;

[0021] Figure 4 yes Figure 1 Exploded view of the protective shield in the image;

[0022] Figure 5 This is a cross-sectional view of a gun head of the dry ice spray gun of the dry ice cleaning machine in one embodiment of the MPCVD cavity yellow skin impurity removal device of this utility model.

[0023] Figure 6 yes Figure 5 A 3D view of the gun head in the image;

[0024] Figure 7 This is a cross-sectional view of another nozzle of the dry ice spray gun of the dry ice cleaning machine in one embodiment of the MPCVD cavity yellow skin impurity removal device of this utility model.

[0025] Figure 8 yes Figure 7 A 3D view of the gun head in the image;

[0026] Figure 9 This is a cross-sectional view of the third nozzle of the dry ice spray gun of the dry ice cleaning machine in one embodiment of the MPCVD cavity yellow skin impurity removal device of this utility model.

[0027] Figure 10 yes Figure 9 A 3D diagram of the gun head.

[0028] In the diagram: 1. Dry ice spray gun; 2. Protective cover; 201. Operating port; 202. Vacuum suction connector; 203. Hanging hole; 204. Pull-out slot; 205. Sound insulation board; 3. Vacuum suction assembly; 301. Tray; 302. Connecting pipe; 303. Filter media; 304. Pressure equalization chamber; 305. Support surface; 306. Perforated plate; 307. Insertion section; 4. Cavity bottom plate; 401. Vacuum port; 5. Main cover; 6. Growth base. Detailed Implementation

[0029] The features and performance of this utility model will be further described in detail below with reference to specific embodiments.

[0030] Dry ice cleaning utilizes dry ice particles propelled by compressed air to impact the surface of an object at supersonic speeds, generating an impact force similar to a "micro-explosion" that directly peels away dirt. Furthermore, the extremely low temperature of dry ice (-78.5℃) causes a sudden temperature change between the dirt layer and the substrate when it comes into contact with relatively hot workpieces, leading to cracking and detachment of the dirt due to the cold brittle effect. On the other hand, upon impact, dry ice instantly sublimates into gaseous carbon dioxide, expanding up to 800 times in volume, creating micro-explosions within the dirt crevices, thoroughly removing residues. Besides its excellent cleaning effect, dry ice cleaning is also non-abrasive. The vaporization of dry ice particles avoids scratches on metals and precision parts caused by sandblasting or steel wire. Moreover, no solvents are used during the cleaning process, resulting in no chemical corrosion. Only the removed dirt remains after cleaning, with no wastewater or chemical residues, protecting the integrity of the equipment materials. Therefore, introducing dry ice cleaning into MPCVD chamber cleaning could solve a series of problems associated with current methods for removing yellow skin impurities from MPCVD chambers, such as damaging the chamber surface and disrupting the internal environment.

[0031] However, MPCVD chambers are typically located in cleanrooms. Dry ice cleaning generates a large amount of dust particles and other impurities. Directly cleaning the MPCVD chamber with a dry ice cleaner would disrupt the cleanroom environment, which is unacceptable. Therefore, this invention's MPCVD chamber yellowing impurity removal device includes a protective fixture in addition to the dry ice cleaner. This protective fixture prevents the spillage of dust and other impurities during the dry ice cleaning process, thus allowing the dry ice cleaning method to be applied to the removal of yellowing impurities from MPCVD chambers.

[0032] As a typical embodiment, the MPCVD cavity yellow skin impurity removal device of this utility model includes a dry ice cleaning machine (not shown in the figure) and protective fixtures.

[0033] The dry ice cleaning machine is an existing device. In this embodiment, the dry ice cleaning machine includes a scraping blade to scrape off blocky dry ice, achieving the effects of saving ice and maintaining the consistency of dry ice particles. For example, the dry ice cleaning machine can specifically be the one disclosed in the patent specification CN208407925U. Of course, the type of dry ice cleaning machine should not be limited. In other embodiments, the dry ice cleaning machine can also be a dry ice snow cleaning machine or a dry ice particle spraying cleaning machine, etc. As a pathway for the transfer of dry ice particles to the cleaning point, the dry ice cleaning machine also includes a dry ice particle spray pipe and a dry ice spray gun 1 connected to the dry ice particle spray pipe. To meet the cleaning needs of different locations, the dry ice spray gun 1 has a linear nozzle (e.g., Figure 5 , Figure 6 ), dotted gun tip (such as Figure 7 , Figure 8 ) and curved spearheads (such as Figure 9 , Figure 10The dry ice nozzles are designed with various shapes and sizes. Linear nozzles spray dry ice particles in a straight line, primarily for cleaning flat surfaces; dotted nozzles spray dry ice particles in a dotted pattern, used for cleaning corners; and curved nozzles clean cylindrical surfaces at deep holes in the neck of cavities. The nozzles are made of plastic to reduce ice ejection resistance and minimize the risk of freezing, thus protecting the user's hands. The nozzles are manufactured using 3D printing, allowing for highly flexible designs to meet different scenario requirements.

[0034] The protective fixture includes a protective cover 2 and a dust collection component 3. The main function of the protective cover 2 is to cover the MPCVD cavity to be cleaned, trapping dust and other impurities generated during the cleaning process and preventing them from spreading into the surrounding environment. The function of the dust collection component 3 is to absorb dust and other impurities from the protective cover 2, reducing the settling of airborne impurities on the cavity surface and preventing dust from overflowing from the protective cover 2.

[0035] To provide the necessary operating path for cleaning the chamber, an operating port 201 is provided on the protective cover 2 for operating the dry ice spray gun to clean the chamber. The operating port 201 allows the dry ice spray gun to enter. The dust collection assembly 3 includes a tray 301, which essentially constitutes a suction head for absorbing dust from the protective cover 2. A connecting pipe 302 is provided on the tray 301 for sealing connection with the vacuum port 401 (a structure built into the chamber) on the chamber bottom plate 4. A filter material 303 is also provided on the tray 301 to filter the gas entering the connecting pipe 302. In use, the connecting pipe 302 can be connected to the vacuum port 401 on the chamber bottom plate 4, and the vacuum system of the chamber can be used to perform dust collection inside the protective cover 2. At the same time, residues and other impurities that fall off during the cleaning process can also be collected through the tray 301.

[0036] The filter media 303 filters dust and other impurities generated during the cavity cleaning process. Therefore, any filter media suitable for filtering dust is applicable to this invention, and it can be installed on the tray 301 using any existing mounting structure. In a preferred embodiment, the filter media 303 is made of filter cotton. To facilitate the positioning and installation of the filter media 303, an installation groove is provided on the tray 301, and the filter media 303 is placed in the installation groove. To ensure that all parts of the filter media can perform a uniform filtration function, a pressure equalization chamber 304 is provided between the filter media 303 and the upper end of the connecting pipe 302, and each connecting pipe 302 communicates with the pressure equalization chamber 304. Figure 1-3As shown, a stepped groove is provided on the upper surface of the tray 301. The stepped groove is divided into an upper, larger diameter section and a lower, smaller diameter section. Therefore, an upward-facing support surface 305 is formed at the adjacent location of the larger and smaller diameter sections. The filter media 303 is supported on the support surface 305. The mounting groove is formed by the larger diameter section, and the pressure equalization chamber 304 is formed by the smaller diameter section. After a period of use, the filter media 303 can be replaced according to the usage conditions to maintain a good filtration effect.

[0037] Although the above embodiments include an installation groove and a pressure equalization chamber 304, those skilled in the art should understand that the installation groove and pressure equalization chamber 304 are not the only structures for installing the filter material 303. For example, in some embodiments, the installation groove can be omitted, and the filter material 303 can be set as a "sandwich" structure with mesh plates on both sides and filter cotton in the middle. In this case, it can be directly installed on the top surface of the tray 301; or the filter material 303 can be set in each connecting pipe 302 to achieve the effect of filtering gas.

[0038] Based on the aforementioned mounting groove and pressure equalization chamber 304, in a more preferred embodiment, an orifice plate 306 is provided in the mounting groove, and the filter media 303 is supported on the orifice plate 306. The periphery of the orifice plate 306 is sealed to the tray 301 by a sealing ring, which encloses the pressure equalization chamber 304 within it. It should be noted that since the gas reaching the orifice plate 306 has already been filtered by the filter media 303, the sealing fit between the orifice plate 306 and the tray 301 is not necessary.

[0039] To facilitate the installation of the tray 301, independent support legs can be provided at the bottom of the tray 301 to free up space for the connecting pipe 302. However, in a preferred embodiment, to simplify the structure of the tray 301, the connecting pipe 302 is made into a rigid pipe, directly forming the support legs of the tray 301. Furthermore, to facilitate a sealed connection with the vacuum port, a plug-in section 307 for insertion into the vacuum port is provided at the lower end of the connecting pipe 302. Further, to achieve stable support for the tray 301, the diameter of the plug-in section 307 is smaller than the diameter of other parts of the connecting pipe, forming a stepped surface at the upper end of the plug-in section. A sealing ring for sealingly engaging with the edge of the vacuum port 401 is provided on the stepped surface.

[0040] The function of the operating port 201 of the protective cover 2 is to provide the path required for the cleaning operation, and therefore it can be opened on the top or side of the protective cover 2 as needed. In a preferred embodiment, the operating port of the protective cover 2 is opened on its side, and a dust suction hole is provided on the top surface of the protective cover 2. A dust suction connector 202 is connected through the dust suction hole. The dust suction connector 202 can be used to connect to a corresponding dust collection device to handle the dust generated during the cleaning process from another angle.

[0041] Since the operating port 201 may become a leakage point for dust, in order to achieve a better dust prevention effect, such as Figure 4 As shown, a dustproof curtain connecting structure for installing a dustproof curtain is provided on the protective cover 2 above the operating port 201. In use, the dustproof curtain can be connected through the dustproof curtain connecting structure, thereby suppressing the diffusion of dust from the operating port. Figure 4 In the embodiment shown, the dust curtain connection structure uses hanging holes 203. In other embodiments, the dust curtain connection structure can also use structures such as Roman rods or tracks commonly used when hanging curtains, which will not be elaborated here.

[0042] To suppress noise generated during the cleaning process, in a preferred embodiment, the inner sides of the side and top walls of the protective cover 2 are provided with pull-out grooves 204, through which sound-insulating panels 205 are installed on the side walls of the protective cover. In other embodiments, pull-out grooves may be provided only on the inner sides of the top or side walls of the protective cover 2 for installing sound-insulating panels 205, as needed. The side and top walls, as the main body of the protective cover, can be made of materials such as acrylic to ensure lightweight construction, or they can be made of metal.

[0043] When cleaning the MPCVD chamber using the MPCVD chamber yellow skin impurity removal device of this invention, the main cover 5 of the chamber (the main cover 5 is a flip-top structure relative to the bottom plate 4 of the chamber) can be opened through the chamber opening and closing mechanism. The opened chamber is then covered by the protective cover 2. The dust collection assembly 3 is arranged on the bottom plate 4 of the chamber, and the connecting pipe 302 is connected to the vacuum port 401 provided on the bottom plate 4 of the chamber. The dust collection connector 202 is connected to the corresponding dust collection equipment, and the chamber is cleaned using the dry ice spray gun 1. Regarding the growth platform 6 in the chamber, since it is a detachable structure, it can be disassembled and transferred outside the workshop for cleaning.

[0044] The above description is only a preferred embodiment of the present utility model and is not intended to limit the present utility model. The patent protection scope of the present utility model shall be determined by the claims. Similarly, any equivalent structural changes made based on the description and drawings of the present utility model shall also be included within the protection scope of the present utility model.

Claims

1. An MPCVD chamber yellow skin impurity removal device, characterized in that, It includes a dry ice cleaning machine and a protective tooling. The dry ice cleaning machine includes a dry ice particle nozzle and a dry ice spray gun connected to the dry ice particle nozzle. The protective tooling includes a protective cover for covering outside the cavity and a dust suction component for connecting a negative pressure device supporting the cavity. An operation port for operating the dry ice spray gun to clean the cavity is provided on the protective cover. The dust suction component includes a tray. A connecting pipe for sealing connection with a vacuum extraction port provided on the bottom plate of the cavity is provided on the tray. A filter material is further provided on the tray to filter the gas entering the connecting pipe.

2. The MPCVD cavity yellow skin impurity removal device according to claim 1, characterized in that, An installation groove is provided on the tray. The filter material is arranged in the installation groove. A pressure equalizing chamber is provided between the filter material and the upper end of the connecting pipe. Each connecting pipe communicates with the pressure equalizing chamber.

3. The MPCVD cavity yellow skin impurity removal device according to claim 2, characterized in that, A perforated plate is provided in the installation groove. The filter material is supported on the perforated plate.

4. The MPCVD cavity yellow skin impurity removal device according to claim 3, characterized in that, The periphery of the perforated plate and the tray are in sealing fit through a sealing ring. The sealing ring encloses the pressure equalizing chamber therein.

5. The MPCVD cavity yellow skin impurity removal device according to any one of claims 1-4, characterized in that, The connecting pipe is a rigid pipe and forms the leg of the tray.

6. The MPCVD cavity yellow skin impurity removal device according to claim 5, characterized in that, A plug-in section for plugging into the vacuum extraction port is provided at the lower end of the connecting pipe.

7. The MPCVD cavity yellow skin impurity removal device according to claim 6, characterized in that, The diameter of the plug-in section is smaller than that of other parts of the connecting pipe, and a step surface is formed at the upper end of the plug-in section. A sealing ring for sealing fit with the edge of the vacuum extraction port is provided on the step surface.

8. The MPCVD cavity yellow skin impurity removal device according to any one of claims 1-4, characterized in that, The operation port of the protective cover is opened on its side surface, and a dust suction hole is provided on the top surface of the protective cover.

9. The MPCVD cavity yellow skin impurity removal device according to claim 8, characterized in that, A dust curtain connection structure for installing a dust curtain is provided above the operation port on the protective cover.

10. The MPCVD chamber yellow skin impurity removal device according to any one of claims 1-4, characterized in that, A pull-out groove is provided on the inner side of the top wall and / or side wall of the protective cover. A sound insulation board is installed on the side wall of the protective cover through the pull-out groove.

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