A microwave plasma deposition device

Abstract

This invention provides a microwave plasma deposition apparatus, relating to the field of diamond growth technology. The apparatus includes a base plate and a housing. The top surface of the base plate has a boss, and the housing is fitted over the boss and extends to its top surface. A first sealing element and a first shielding element are provided between the top surface of the boss and the housing. The housing has a first observation component and a second observation component. The height of the first observation component is lower than that of the second observation component. The first observation component has a first observation channel extending horizontally, and the second observation component has a second observation channel extending at an angle relative to the horizontal plane. The orientations of the first and second observation channels converge above the middle of the base plate. This microwave plasma deposition apparatus enables vacuum sealing and microwave sealing of the cavity between the base plate and the housing, and ensures that the entire plasma sphere state is more comprehensively observed during operation.

Description

Technical Field

[0001] This utility model relates to the field of diamond growth technology, and in particular to a microwave plasma deposition device. Background Technology

[0002] Microwave Plasma Chemical Vapor Deposition (MPCVD) is a process in which microwaves generated by a microwave generator are introduced into a reaction chamber via a waveguide after mode conversion. Under the excitation of the microwaves, the gas molecules in the reaction chamber are ionized to generate plasma, which is then deposited on a substrate to obtain a diamond film.

[0003] In existing microwave plasma deposition equipment, four observation components symmetrically distributed at 90 degrees are typically mounted on top of the reaction chamber for infrared thermography observation and plasma status monitoring. However, due to the limited internal space of the chamber and the fixed angle of the observation components, some areas at the edge of the substrate stage cannot be directly observed in the existing design, which poses difficulties for adjusting process parameters and monitoring the deposition process. Utility Model Content

[0004] The purpose of this invention is to provide a microwave plasma deposition device that can achieve vacuum sealing and microwave sealing of the cavity between the base plate and the outer shell, and can ensure that the entire plasma sphere state can be observed more comprehensively during operation.

[0005] To achieve the above objectives, this utility model provides the following technical solution: In a first aspect, this utility model provides a microwave plasma deposition device, including a base plate and a housing; The top surface of the base plate has a boss, the outer shell is fitted over the outside of the boss and extends to the top surface of the boss, and a first sealing element and a first shielding element are provided between the top surface of the boss and the outer shell; The housing is provided with a first observation component and a second observation component. The height of the first observation component is lower than that of the second observation component. The first observation component has a first observation channel extending in a horizontal direction. The second observation component has a second observation channel extending at an angle relative to the horizontal plane. The orientation of the first observation channel and the second observation channel intersects above the middle of the base plate.

[0006] In an optional embodiment, the first observation component includes a first light-transmitting sheet, a mounting base, and a honeycomb plate. The mounting base is connected to the housing and has the first observation channel. One end of the mounting base extends into the housing and is connected to the honeycomb plate, while the other end of the mounting base extends out of the housing and is connected to the first light-transmitting sheet.

[0007] In an optional implementation, the inner diameter of the first observation channel is larger than the inner diameter of the second observation channel.

[0008] In an optional embodiment, the boss includes an inclined outer side that extends gradually toward the center of the base plate in a direction that gradually moves away from the bottom surface of the base plate, and the outer shell has an inner side that mates with the outer side.

[0009] In an optional embodiment, the outer casing includes an inner casing and an outer casing body that is sealed to the inner casing. A cooling cavity is formed between the outer casing body and the inner casing. The outer casing body is provided with an inlet and an outlet that communicate with the cooling cavity.

[0010] In an optional embodiment, a plurality of partitions are provided between the inner housing and the outer housing along the circumferential direction of the inner housing. Among at least two adjacent partitions, one partition is connected to the top surface of the cooling cavity and has a gap with the bottom surface of the cooling cavity, and the other partition is connected to the bottom surface of the cooling cavity and has a gap with the top surface of the cooling cavity.

[0011] In an optional embodiment, the top of the inner housing is provided with an air intake channel, the air intake channel having an air outlet communicating with the internal space of the inner housing, the air outlet being arranged radially along the inner housing.

[0012] In an optional embodiment, the system further includes a worktable located within the housing. The worktable includes a download platform and an loading platform connected to the download platform. A second sealing element is provided between the loading platform and the download platform. The hardness of the download platform is greater than that of the loading platform, and the thermal conductivity of the loading platform is greater than that of the download platform.

[0013] In an optional embodiment, the loading stage includes a substrate stage bearing surface and a cooling and heat dissipation surface arranged opposite each other in the vertical direction. The substrate stage bearing surface is provided with a substrate stage positioning area, and the cooling and heat dissipation surface is provided with a sealing protrusion.

[0014] In an optional embodiment, a quartz ring is further provided between the base plate and the download platform. The boss has a recessed mounting groove, the quartz ring is installed in the mounting groove, and a third sealing element is provided between the quartz ring and the mounting groove.

[0015] The microwave plasma deposition equipment provided by this utility model can produce the following beneficial effects: In the microwave plasma deposition equipment provided by this utility model, the first sealing element can seal the gap between the base plate and the outer shell, and the first shielding element can prevent microwave leakage, thus achieving vacuum sealing and microwave sealing of the cavity between the base plate and the outer shell. During use, the state of the plasma sphere can be observed from an oblique upward direction through the second observation channel in the second observation assembly, and the state of the plasma sphere can be observed from a horizontal side direction through the first observation channel in the first observation assembly. The cooperation of the second and first observation channels ensures that the entire state of the plasma sphere is observed more comprehensively during operation. Attached Figure Description

[0016] To more clearly illustrate the specific embodiments of this utility model or the technical solutions in the prior art, the drawings used in the description of the specific embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are some embodiments of this utility model. For those skilled in the art, other drawings can be obtained from these drawings without creative effort.

[0017] Figure 1 A top view of a portion of the structure of the microwave plasma deposition apparatus provided in an embodiment of this utility model; Figure 2 for Figure 1 AA section diagram; Figure 3 for Figure 2 A magnified view of part B; Figure 4 A three-dimensional structural diagram of a portion of the microwave plasma deposition equipment provided in an embodiment of this utility model; Figure 5 for Figure 2 A magnified view of a portion at point C; Figure 6 for Figure 2 A magnified view of a portion at point D; Figure 7 A three-dimensional structural diagram of the loading platform provided in an embodiment of this utility model from a first-view perspective; Figure 8 A three-dimensional structural diagram of the loading platform provided in an embodiment of this utility model from a second perspective; Figure 9 A partial cross-sectional view of the microwave plasma deposition apparatus provided in an embodiment of this utility model.

[0018] Icons: 1-Base plate; 11-Boss; 111-Outer side; 112-Mounting slot; 2-Outer shell; 21-Inner shell; 211-Air inlet channel; 2111-Air outlet; 22-Outer shell; 221-Liquid inlet; 222-Liquid outlet; 23-Cooling chamber; 24-Baffle; 3-First seal; 4-First shield; 5-First observation assembly; 51-First observation channel; 52-First light-transmitting sheet; 53-Security... Mounting device; 54-Honeycomb panel; 6-Second observation assembly; 61-Second observation channel; 7-Worktable; 71-Downloading stage; 72-Loading stage; 721-Substrate stage bearing surface; 7211-Substrate stage positioning area; 722-Cooling and heat dissipation surface; 7221-Sealing protrusion; 73-Second seal; 8-Quartz ring; 9-Third seal; 10-Microwave generator; 011-Waveguide converter; 012-Cooling exhaust pipe assembly. Detailed Implementation

[0019] The technical solution of this utility model will now be clearly and completely described with reference to the accompanying drawings. Obviously, the described embodiments are only some, not all, of the embodiments of this utility model. Based on the embodiments of this utility model, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of this utility model.

[0020] In the description of this utility model, it should be noted that the terms "center," "upper," "lower," "left," "right," "vertical," "horizontal," "inner," and "outer," etc., indicating the orientation or positional relationship, are based on the orientation or positional relationship shown in the accompanying drawings and are only for the convenience of describing this utility model and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of this utility model. Furthermore, the terms "first," "second," and "third" are used for descriptive purposes only and should not be construed as indicating or implying relative importance.

[0021] In the description of this utility model, it should be noted that, unless otherwise explicitly specified and limited, the terms "installation," "connection," and "joining" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral connection; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; and they can refer to the internal connection of two components. Those skilled in the art can understand the specific meaning of the above terms in this utility model according to the specific circumstances.

[0022] The specific embodiments of this utility model will be described in detail below with reference to the accompanying drawings. It should be understood that the specific embodiments described herein are for illustration and explanation only and are not intended to limit the scope of this utility model.

[0023] The first aspect of this utility model provides a microwave plasma deposition apparatus, such as... Figures 1 to 3 As shown, it includes a base plate 1 and an outer shell 2; The top surface of the base plate 1 has a boss 11, and the outer shell 2 is fitted outside the boss 11 and extends to the top surface of the boss 11. A first sealing element 3 and a first shielding element 4 are provided between the top surface of the boss 11 and the outer shell 2. The outer casing 2 is provided with a first observation component 5 and a second observation component 6. The height of the first observation component 5 is lower than that of the second observation component 6. The first observation component 5 has a first observation channel 51 extending in the horizontal direction. The second observation component 6 has a second observation channel 61 extending at an angle relative to the horizontal plane. The orientation of the first observation channel 51 and the second observation channel 61 converges above the middle of the bottom plate 1.

[0024] In the microwave plasma deposition equipment provided in the above embodiments, the first sealing member 3 can seal the gap between the base plate 1 and the outer shell 2, and the first shielding member 4 can prevent microwave leakage, thus achieving vacuum sealing and microwave sealing of the cavity between the base plate 1 and the outer shell 2. During use, the state of the plasma sphere can be observed from an oblique upward direction through the second observation channel 61 in the second observation assembly 6, and the state of the plasma sphere can be observed from a horizontal side direction through the first observation channel 51 in the first observation assembly 5. The cooperation of the second observation channel 61 and the first observation channel 51 ensures that the entire state of the plasma sphere is observed more comprehensively during operation.

[0025] The material of the first shielding component 4 needs to have good conductivity and electromagnetic shielding performance. Specifically, conductive rubber, metal mesh, or silver-plated metal gaskets can be selected. The first sealing component 3 needs to ensure a good vacuum seal between the base plate and the outer shell to prevent gas leakage. Its material can be silicone rubber or fluororubber, with fluororubber being preferred due to its high temperature resistance and good sealing performance.

[0026] The second observation component 6 can be configured as one or multiple, such as Figure 1 As shown, there are four first observation components 5, which are evenly distributed around the axis of the outer shell 2.

[0027] The first observation component 5 can be configured as one or multiple, such as Figure 2 As shown, there are two first observation components 5, which are arranged opposite each other along the radial direction of the housing 2, thereby ensuring that the side of the housing 2 has a more comprehensive field of view for observing the plasma sphere.

[0028] In alternative implementations, such as Figure 2 As shown, the first observation component 5 includes a first light-transmitting sheet 52, a mounting base 53, and a honeycomb panel 54.

[0029] Mounting base 53 is fixedly connected to housing 2 and forms a first observation channel 51 therein. One end of mounting base 53 extends into the interior of housing 2 and is fixedly connected to honeycomb panel 54 at that end.

[0030] The aforementioned honeycomb panel 54 can effectively prevent microwave leakage from the first observation channel 51. The principle is that the wavelength of microwaves is usually much larger than the size of the through holes on the honeycomb panel 54. Therefore, when microwaves propagate to the honeycomb panel 54, due to the electromagnetic wave cutoff effect, the microwaves cannot pass through the honeycomb structure and are reflected back into the device, thereby achieving good microwave shielding performance.

[0031] The other end of the mounting base 53 extends outside the housing 2, and a first light-transmitting sheet 52 is mounted on this end. The light-transmitting sheet is made of a high-temperature resistant and high-transmittance material, such as quartz glass, which can withstand the high-temperature environment generated during the deposition process and ensure good optical performance.

[0032] With the above structure, the first observation component 5 allows the operator to observe the operation status of the plasma ball from a horizontal direction without affecting the microwave sealing and vacuum sealing, which facilitates real-time monitoring of the deposition process and improves the safety and ease of operation of the equipment.

[0033] The structure of the second observation component 6 is similar to that of the first observation component 5, except that the end of the second observation component 6 that extends into the outer casing 2 does not have a honeycomb plate 54. This is because the aperture of the second observation channel 61 is smaller, less than 1 / 4 wavelength, and microwaves will not leak from the second observation channel 61. The second observation component 6 can observe the state of the plasma sphere from an obliquely upward position, and together with the first observation component 5, it can observe the plasma sphere from different angles.

[0034] In an optional implementation, the inner diameter of the first observation channel 51 is larger than the inner diameter of the second observation channel 61.

[0035] The first observation channel 51 and the second observation channel 61 are oriented at the upper part of the center of the base plate 1, that is, the central area of ​​the plasma sphere, ensuring that the field of view of the two observation channels can cover the entire effective area of ​​the plasma sphere. Since the inner diameter of the first observation channel 51 is larger, its field of view in the horizontal direction is wider, which can effectively capture the changes in the lateral expansion of the plasma sphere; while the second observation channel 61 has a smaller inner diameter, its tilted position helps to observe the three-dimensional structure and height changes of the plasma sphere.

[0036] Specifically, since the plasma sphere is usually approximately spherical during the deposition process and is located above the center of the base plate 1, the horizontally set first observation channel 51 has a large inner diameter to ensure that the field of view can cover the main volume range of the plasma sphere, thereby facilitating the observation of the overall shape, brightness distribution and possible displacement of the plasma sphere.

[0037] Since the observation angle of the second observation channel 61 mainly focuses on the top region of the plasma sphere and its relative relationship with the gas injection port and microwave feed position, the required field of view is relatively small. Therefore, the inner diameter of the second observation channel 61 can be designed to be relatively small. This smaller inner diameter can not only meet the accuracy requirements of oblique observation, but also save space in the structure, while reducing the possibility of microwave leakage and improving the overall electromagnetic shielding performance of the equipment.

[0038] In alternative implementations, such as Figure 3 As shown, in order to improve the fitting accuracy and sealing performance between the housing 2 and the boss 11, the boss 11 includes an inclined outer surface 111.

[0039] Specifically, the outer side 111 of the boss 11 is inclined relative to the bottom surface of the base plate 1, and as the outer side 111 extends from the bottom surface of the base plate 1 toward the top surface, it gradually moves toward the center of the base plate 1. That is to say, the diameter of the outer side 111 decreases as the height increases, thus forming a trapezoidal structure that is narrower at the top and wider at the bottom.

[0040] In conjunction with this, the inner side of the outer shell 2 is also designed with an inclined structure that matches the outer side 111 of the boss 11. This inner side can fit tightly against the outer side 111 of the boss 11, thereby achieving a more uniform and stable contact fit when the outer shell 2 is fitted onto the outside of the boss 11. This facilitates the smooth fitting of the outer shell 2 onto the boss 11 during installation, reducing assembly errors and stress concentration.

[0041] In alternative implementations, such as Figure 1 and Figure 2 As shown, the outer shell 2 includes an inner shell 21 and an outer shell body 22 that is sealed to the inner shell 21. A cooling cavity 23 is formed between the outer shell body 22 and the inner shell 21. The outer shell body 22 is provided with an inlet 221 and an outlet 222 that communicate with the cooling cavity 23. The inlet 221 is used to introduce cooling medium into the cooling cavity 23, and the outlet 222 is used to discharge the cooling medium that has absorbed heat, forming a circulating cooling system.

[0042] The aforementioned cooling chamber 23 is used to contain a cooling medium, such as cooling water or other media suitable for heat dissipation of industrial equipment, in order to achieve temperature control of the internal cavity of the outer casing 2, thereby maintaining the thermal stability of the equipment during long-term operation.

[0043] The inner shell 21 and the outer shell 22 can be sealed together by welding, flange connection, or sealing structure such as sealing rings to prevent leakage of cooling medium. In addition, the cooling chamber 23 is preferably designed with annular or spiral flow channels to extend the flow path of the cooling medium and enhance the heat exchange effect.

[0044] The above-described embodiment provides a cooling chamber 23 in the outer casing 2 and configures corresponding liquid inlet 221 and liquid outlet 222, enabling the microwave plasma deposition equipment to have good heat dissipation capabilities and maintain stable operation in a high-temperature plasma working environment, thereby improving the reliability and service life of the equipment.

[0045] In alternative implementations, such as Figure 4 As shown, in order to further improve the cooling efficiency of the outer shell 2, a plurality of baffles 24 are provided between the inner shell 21 and the outer shell 22 along the circumference of the inner shell 21. The plurality of baffles 24 divide the cooling cavity 23 into several cooling channels that are connected sequentially along the circumference, thereby guiding the cooling medium to flow along a predetermined path in the cooling cavity 23 and enhancing the cooling effect.

[0046] Specifically, in at least two adjacent partitions 24, one partition 24 is connected to the top surface of the cooling cavity 23 and has a gap with the bottom surface of the cooling cavity 23, and the other partition 24 is connected to the bottom surface of the cooling cavity 23 and has a gap with the top surface of the cooling cavity 23.

[0047] Through the aforementioned staggered arrangement, the cooling medium forms a serpentine flow path within the cooling chamber 23, sequentially passing through multiple cooling channels formed by different baffles 24. This structural design not only extends the flow path of the cooling medium, improves heat exchange efficiency, and ensures that the cooling medium can fully absorb the heat generated by the outer shell 2 during operation, thereby enhancing the stability and safety of equipment operation, but also ensures that the cooling water can flow smoothly and evenly remove heat from the chamber.

[0048] Furthermore, the partition 24 is made of a metal material with good thermal conductivity, such as stainless steel or copper alloy, to enhance the efficiency of heat conduction from the inner shell 21 to the cooling medium, thereby improving the overall cooling effect.

[0049] In alternative implementations, such as Figure 5 As shown, the top of the inner shell 21 is provided with an air intake channel 211, the air intake channel 211 has an air outlet 2111 that communicates with the internal space of the inner shell 21, and the air outlet 2111 is arranged radially along the inner shell 21.

[0050] The above-described embodiment allows the process gas to flow radially into the inner housing 21 from the inlet channel 211 through the outlet 2111, rather than directly impacting the worktable 7 located at the center of the chamber and the substrate it supports. This effectively avoids substrate displacement or shifting caused by airflow impact. Maintaining a stable position on the substrate during deposition facilitates uniform plasma distribution on the substrate surface, ensuring uniform quality and dense structure of the deposited diamond film. This reduces or avoids diamond growth defects caused by substrate displacement or airflow disturbance, such as uneven thickness, lattice distortion, or decreased adhesion.

[0051] Specifically, the air inlet channel 211 has an air inlet located at the top of the dish-shaped cavity. After the gas enters the air inlet channel 211, it is dispersed along multiple radially extending internal channels to various air outlets 2111 on the top side of the cavity. The various air outlets 2111 are evenly distributed in a ring to ensure that the gas flows parallel to the center after entering the cavity, avoiding blowing the substrate on the worktable downwards.

[0052] In alternative implementations, such as Figure 6 As shown, the microwave plasma deposition apparatus also includes a worktable 7 located inside the housing 2. The worktable 7 includes a download stage 71 and an loading stage 72 connected to the download stage 71. A second sealing element 73 is provided between the loading stage 72 and the download stage 71. The hardness of the download stage 71 is greater than that of the loading stage 72, and the thermal conductivity of the loading stage 72 is greater than that of the download stage 71.

[0053] In the above embodiments, the hardness of the download stage 71 is greater than that of the upper stage 72, which gives the download stage 71 better mechanical strength and effectively reduces the plastic deformation of the worktable 7 under high coolant pressure. In addition, the thermal conductivity of the upper stage 72 is greater than that of the download stage 71. In the microwave plasma deposition process, the sample surface temperature has an important influence on the deposition quality. Therefore, the high thermal conductivity of the upper stage 72 can quickly dissipate the heat of the upper stage 72 during the deposition process and improve the uniformity of temperature control.

[0054] The aforementioned worktable 7 not only ensures good mechanical strength but also improves thermal control performance, thereby effectively enhancing the stability of the deposition process.

[0055] Among them, the download platform 71 can be made of stainless steel with high hardness and rigidity, and the loading platform 72 can be made of oxygen-free copper.

[0056] In addition, the material selection for the second seal 73 can be the same as that for the first seal 3, which will not be explained here to save space.

[0057] In alternative implementations, such as Figure 7 and Figure 8 As shown, the loading stage 72 includes a substrate stage bearing surface 721 and a cooling and heat dissipation surface 722 arranged opposite each other in the vertical direction. The substrate stage bearing surface 721 is provided with a substrate stage positioning area 7211, and the cooling and heat dissipation surface 722 is provided with a sealing protrusion 7221.

[0058] The download table 71 is recessed with a groove for the sealing protrusion 7221 to extend into. The sealing protrusion 7221 can cooperate with the second seal 73 to form a sealing structure to prevent the cooling water in the worktable 7 from leaking.

[0059] like Figure 8As shown, several grooves are provided in the space enclosed by the sealing protrusion 7221 as cooling water channels. The grooves are distributed around the axis of the upper platform 72, and reinforcing ribs are provided between the grooves to enhance the water pressure resistance of the worktable 7.

[0060] In alternative implementations, such as Figure 6 As shown, the microwave plasma deposition equipment also includes a quartz ring 8 disposed between the base plate 1 and the download stage 71. The boss 11 is recessed with a mounting groove 112, the quartz ring 8 is installed in the mounting groove 112, and a third sealing element 9 is provided between the quartz ring 8 and the mounting groove 112.

[0061] In the above embodiments, the design of the mounting groove 112 effectively prevents the quartz ring 8 from shifting or loosening during equipment operation, ensuring its structural stability and sealing reliability during long-term use. The third sealing element 9 enables an airtight connection between the quartz ring 8 and the mounting groove 112.

[0062] The aforementioned third seal 9 is preferably made of a high-temperature and corrosion-resistant elastic sealing material, such as fluororubber or silicone rubber, which can maintain good sealing performance in a high-temperature plasma environment, thereby preventing process gas from leaking from the gap between the base plate 1 and the quartz ring 8, and ensuring that the equipment maintains the required vacuum environment and process stability.

[0063] In alternative implementations, such as Figure 9 As shown, the microwave plasma deposition equipment also includes a microwave generator 10, a waveguide converter 011, and a cooling exhaust pipe assembly 012; the microwave generator 10 is connected to the waveguide converter 011, the waveguide converter 011 is connected to the cavity inside the housing 2, and introduces the microwave energy output by the microwave generator 10 into the interior of the housing 2; the cooling exhaust pipe assembly 012 is connected to the inner cavity of the worktable 7 and forms a cooling circulation channel and an exhaust channel with the worktable 7.

[0064] The microwave generator 10, waveguide converter 011, and cooling exhaust pipe group 012 described above can adopt currently known structures. The improvement of the microwave plasma deposition equipment provided in the above embodiment does not lie in the microwave generator 10, waveguide converter 011, and cooling exhaust pipe group 012, so their specific structures will not be described in detail.

[0065] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of this utility model, and are not intended to limit it. Although the utility model has been described in detail with reference to the foregoing embodiments, those skilled in the art should understand that modifications can still be made to the technical solutions described in the foregoing embodiments, or equivalent substitutions can be made to some or all of the technical features therein. Such modifications or substitutions do not cause the essence of the corresponding technical solutions to deviate from the scope of the technical solutions of the embodiments of this utility model.

Claims

1. A microwave plasma deposition apparatus, characterized in that, Includes a base plate (1) and an outer shell (2); The top surface of the base plate (1) has a boss (11), the outer shell (2) is fitted outside the boss (11) and extends to the top surface of the boss (11), and a first sealing element (3) and a first shielding element (4) are provided between the top surface of the boss (11) and the outer shell (2). The outer casing (2) is provided with a first observation component (5) and a second observation component (6). The height of the first observation component (5) is lower than that of the second observation component (6). The first observation component (5) has a first observation channel (51) extending in the horizontal direction. The second observation component (6) has a second observation channel (61) extending at an angle relative to the horizontal plane. The orientations of the first observation channel (51) and the second observation channel (61) converge above the middle of the base plate (1).

2. The microwave plasma deposition apparatus according to claim 1, characterized in that, The first observation component (5) includes a first light-transmitting sheet (52), a mounting base (53) and a honeycomb plate (54). The mounting base (53) is connected to the outer shell (2) and has the first observation channel (51). One end of the mounting base (53) extends into the outer shell (2) and is connected to the honeycomb plate (54). The other end of the mounting base (53) extends out of the outer shell (2) and is connected to the first light-transmitting sheet (52).

3. The microwave plasma deposition apparatus according to claim 1, characterized in that, The inner diameter of the first observation channel (51) is larger than the inner diameter of the second observation channel (61).

4. The microwave plasma deposition apparatus according to claim 1, characterized in that, The boss (11) includes an inclined outer side (111) that extends gradually toward the center of the base plate (1) in a direction that gradually moves away from the bottom surface of the base plate (1). The outer shell (2) has an inner side that mates with the outer side (111).

5. The microwave plasma deposition apparatus according to claim 3, characterized in that, The outer shell (2) includes an inner shell (21) and an outer shell body (22) that is sealed to the inner shell (21). A cooling cavity (23) is formed between the outer shell body (22) and the inner shell (21). The outer shell body (22) is provided with an inlet (221) and an outlet (222) that communicate with the cooling cavity (23).

6. The microwave plasma deposition apparatus according to claim 5, characterized in that, Along the circumference of the inner shell (21), a plurality of partitions (24) are provided between the inner shell (21) and the outer shell (22). In at least two adjacent partitions (24), one partition (24) is connected to the top surface of the cooling cavity (23) and has a gap with the bottom surface of the cooling cavity (23), and the other partition (24) is connected to the bottom surface of the cooling cavity (23) and has a gap with the top surface of the cooling cavity (23).

7. The microwave plasma deposition apparatus according to claim 5, characterized in that, The top of the inner shell (21) is provided with an air intake channel (211), the air intake channel (211) has an air outlet (2111) communicating with the internal space of the inner shell (21), and the air outlet (2111) is arranged radially along the inner shell (21).

8. The microwave plasma deposition apparatus according to claim 1, characterized in that, It also includes a worktable (7) located inside the outer casing (2), the worktable (7) including a download platform (71) and an loading platform (72) connected to the download platform (71), a second sealing element (73) is provided between the loading platform (72) and the download platform (71), the hardness of the download platform (71) is greater than the hardness of the loading platform (72), and the thermal conductivity of the loading platform (72) is greater than the thermal conductivity of the download platform (71).

9. The microwave plasma deposition apparatus according to claim 8, characterized in that, The upper stage (72) includes a substrate stage bearing surface (721) and a cooling and heat dissipation surface (722) arranged opposite each other in the vertical direction. The substrate stage bearing surface (721) is provided with a substrate stage positioning area (7211), and the cooling and heat dissipation surface (722) is provided with a sealing protrusion (7221).

10. The microwave plasma deposition apparatus according to claim 9, characterized in that, It also includes a quartz ring (8) disposed between the base plate (1) and the download platform (71), the boss (11) is recessed with a mounting groove (112), the quartz ring (8) is installed in the mounting groove (112), and a third sealing element (9) is provided between the quartz ring (8) and the mounting groove (112).

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