A rotation angle detection device

Abstract

This application provides a rotation angle detection device for detecting the rotational accuracy of a rotating component. The rotating component is connected to a driving component, which drives the rotating component to rotate at a set angle. In this embodiment, the detection device includes a support component, a reference component, and a detection component. The support component is fixedly connected to the side of the rotating component away from the driving component, and the reference component is fixedly connected to the side of the support component away from the rotating component. The detection component and the reference component are spaced apart. When the driving component drives the rotating component to rotate at a set angle, the detection component acquires the angle data of the reference component rotating with the rotating component to determine the rotation angle error of the rotating component. This rotation angle detection device can detect the rotation angle of a rotating component under normal pressure conditions. The detection process is simpler, more efficient, and more direct, reducing production costs and improving detection accuracy. This allows for more accurate control of the ion beam injection angle distribution and effectively suppresses the influence of the channeling effect.

Description

Technical Field

[0001] This application belongs to the field of semiconductor testing technology, and in particular relates to a rotation angle detection device. Background Technology

[0002] In semiconductor chip manufacturing, ion implanters are used to implant ions into wafers to alter the conductivity of the wafer or specific areas within it. Electrostatic chucks, a key component of ion implanters, utilize electrostatic adsorption to hold the wafer to be processed on their surface, preventing movement or misalignment during production. During ion implantation, the electrostatic chuck rotates according to process requirements, effectively controlling the ion implantation depth and concentration distribution, and suppressing channeling effects.

[0003] With the rapid development of semiconductor technology and the iterative updates in process technology, the requirements for the detection accuracy of electrostatic chuck rotation are becoming increasingly stringent. In related technologies, detecting the rotational accuracy of electrostatic chucks requires establishing a high vacuum and then injecting an ion beam into a control wafer. The accuracy of the injection angle is then reflected in the test results of the control wafer. However, this method relies on the negative pressure environment of the ion implanter's working chamber, which is quite demanding (generally requiring a pressure of 10...). -6 torr~10 -7 Furthermore, the measurement results are affected by the working chamber environment, especially by particulate contamination, which makes it impossible to accurately evaluate the injection angle distribution of charged particles. The accuracy of the measurement results is low, making it difficult to effectively suppress the influence of the channeling effect. Utility Model Content

[0004] This application aims to address, at least to some extent, the technical problems in related technologies where the rotation detection environment of electrostatic chucks is subject to harsh conditions and the accuracy of measurement results is low, making it difficult to effectively suppress the influence of channeling effects. Therefore, this application provides a rotation angle detection device.

[0005] To achieve the above objectives, embodiments of this application provide a rotation angle detection device for detecting the rotational accuracy of a rotating component, the rotating component being capable of rotating at a set angle under the drive of a driving component. The rotation angle detection device includes:

[0006] The load-bearing component is fixedly connected to the side of the rotating component away from the driving component;

[0007] The reference component is fixedly connected to the side of the load-bearing assembly away from the rotating component;

[0008] The test piece is spaced apart from the reference piece.

[0009] In this process, when the driving component drives the rotating component to rotate by a set angle, the detection component is used to obtain the angle data of the reference component as the rotating component rotates, so as to determine the rotation angle error of the rotating component.

[0010] The rotation angle detection device proposed in this application, when the driving component drives the rotating component to rotate by a set angle, also causes the reference component to rotate with the rotating component. The detection component can determine the error of the rotation angle of the rotating component relative to the set angle by acquiring the rotation angle data of the reference component. This rotation angle detection device has low environmental requirements and is basically unaffected by the working chamber environment and particulate contamination. Therefore, it can more accurately detect the rotation angle of the electrostatic chuck, which is beneficial for more precise control of the injection angle distribution of charged particles, thereby effectively suppressing the adverse effects of the channel effect on semiconductor products.

[0011] In some embodiments, the support assembly includes a support platform and an indexing plate. The support platform is fixedly connected to a rotating member. The indexing plate includes a fixed part and a rotating part. The fixed part is fixedly connected to the support platform, and the rotating part is rotatable relative to the fixed part. The reference member is fixedly connected to the rotating part.

[0012] In some embodiments, the rotating member has a first connecting surface, the support platform has a second connecting surface, and the first connecting surface is attached to the second connecting surface.

[0013] In some embodiments, the support platform includes a support body and a claw disposed on the support body, a second connecting surface is disposed on the support body, and the claw is locked to the rotating member.

[0014] In some embodiments, the support platform, indexing plate, and reference member are arranged along the axial direction of the rotating member.

[0015] In some embodiments, the reference member has a reflective surface; the emitted light emitted by the detection member can illuminate the reflective surface and receive the reflected light reflected by the aforementioned emitting surface, so as to obtain the angle data of the reference member rotating with the rotating member based on the emitted light and the reflected light.

[0016] In some embodiments, the reference element has multiple reflective surfaces connected end to end in sequence, and the angle between each pair of adjacent reflective surfaces is the same; the detection element is an optical autocollimator.

[0017] In some implementations, the reference element is a polyhedron.

[0018] In some embodiments, the rotation angle detection device further includes a support frame for supporting the detection element.

[0019] In some embodiments, the rotating component is an electrostatic chuck of an ion implanter, which is located inside the working chamber of the ion implanter; the carrier component and the reference component are installed in the working chamber, and the detection component is installed outside the working chamber. Attached Figure Description

[0020] To more clearly illustrate the technical solutions in the embodiments of this application, the accompanying drawings used in the description of the embodiments will be briefly introduced below. The accompanying drawings described below are drawings in some embodiments of this application. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0021] Figure 1 A schematic diagram of the rotation angle detection device provided in the embodiments of this application is shown.

[0022] Figure 2 A schematic diagram illustrating the detection principle of the detection element in the rotation angle detection device provided in the embodiments of this application is shown.

[0023] Figure label:

[0024] 10-Detection device, 20-Base, 30-Rotating component, 100-Bearing assembly, 110-Bearing platform, 120-Index plate, 121-Fixing part, 122-Rotating part, 200-Reference component, 300-Detection component, 310-Reticle, 320-Objective lens. Detailed Implementation

[0025] The technical solutions in the embodiments of the application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only a part of the embodiments of this application, and not all of the embodiments. Based on the embodiments of this application, all other embodiments obtained by those of ordinary skill in the art without creative effort are within the scope of protection of this application.

[0026] It should be noted that all directional indications in the embodiments of this application are only used to explain the relative positional relationships and movement of the components in a specific posture. If the specific posture changes, the directional indications will also change accordingly. In the description of this application, unless otherwise explicitly specified and limited, the terms "connection" and "fixed" should be interpreted broadly. For example, "fixed" can mean a fixed connection, a detachable connection, or an integral part; it can mean a direct connection or an indirect connection through an intermediate medium, unless otherwise explicitly limited. For those skilled in the art, the specific meaning of the above terms in this utility model can be understood according to the specific circumstances.

[0027] Furthermore, in this utility model, descriptions involving "first," "second," etc., are for descriptive purposes only and should not be construed as indicating or implying their relative importance or implicitly specifying the number of technical features indicated. Therefore, features defined with "first" or "second" may explicitly or implicitly include at least one of those features. Additionally, where there is no conflict, the technical solutions of various embodiments can be combined with each other, and such combined technical solutions are also within the scope of protection claimed in this application.

[0028] During ion implantation, when charged particles are incident along a specific crystal orientation, the interaction between the charged particles and crystal atoms constrains their trajectory, resulting in a unique channel-like motion—a phenomenon known as the channel effect. Under the channel effect, the probability of collisions with crystal atoms decreases as charged particles move along the crystal channel, slowing energy loss. This allows the particles to penetrate deeper than in amorphous materials or random implantation, leading to an increase in the average ion implantation depth. Simultaneously, charged particles implanted along the channel direction can create a higher doping concentration in specific regions and a lower concentration in other regions, resulting in lateral doping inhomogeneity. This affects the performance consistency of the semiconductor structure and, in severe cases, can even impact the performance of semiconductor products or cause product failure.

[0029] To suppress the effects of channeling, the industry typically employs a process that combines adjusting the ion implantation angle with electrostatic chuck (ESC) rotational implantation. This disrupts the ion entry paths into the crystal lattice from different angles, further reducing the probability of ions penetrating along the channel and better controlling the ion implantation depth and concentration distribution. The electrostatic chuck, a key component of the ion implanter, uses electrostatic adsorption to hold the wafer to be processed on its surface, preventing wafer movement or misalignment during production. During ion implantation, the electrostatic chuck rotates according to process requirements, effectively controlling the ion implantation depth and concentration distribution and suppressing channeling.

[0030] With the rapid development of semiconductor technology and the continuous upgrading of process technology, the requirements for the detection accuracy of electrostatic chuck rotation are becoming increasingly stringent. Related technologies have relatively harsh detection conditions for electrostatic chuck rotation accuracy, and the accuracy of the measurement results is low, ultimately making it difficult to effectively suppress the effects of channeling.

[0031] To improve the above-mentioned defects to a certain extent, this application provides a rotation angle detection device. When using this rotation angle detection device to measure the rotation angle of an electrostatic chuck, the requirements for the detection environment are low, and the rotation angle of the electrostatic chuck can be detected more accurately, which is beneficial to suppressing the influence of the channeling effect.

[0032] The specific technical solutions of the embodiments of this application are described below with reference to the accompanying drawings and specific examples.

[0033] Please see Figure 1 This application provides a rotation angle detection device 10 for detecting the rotation accuracy of a rotating component 30. The rotating component 30 is connected to a driving component, which can drive the rotating component 30 to rotate at a set angle.

[0034] The detection device 10 can be used to detect the rotational accuracy of the electrostatic chuck, meeting the requirements of the ion implantation process for the rotational accuracy of the electrostatic chuck, thereby improving the performance consistency of the semiconductor structure. Specifically, the rotating component 30 can be an electrostatic chuck. The electrostatic chuck is mounted on the base 20 of the working chamber of the ion implanter; the driving component can be a motor, located within the base 20. The ion implanter has a control interface; by inputting a set angle into the control interface, the driving component can drive the electrostatic chuck to rotate according to the set angle. This embodiment uses the detection of the rotational angle of the electrostatic chuck as an example for explanation. Of course, this detection device 10 can also be used to detect the rotational angle of any other rotating component, such as a robotic arm or a wafer positioner, without limitation.

[0035] In this embodiment, the detection device 10 specifically includes a support assembly 100, a reference member 200, and a detection member 300. The support assembly 100 is fixedly connected to the side of the rotating member 30 away from the driving member, the reference member 200 is fixedly connected to the side of the support assembly 100 away from the rotating member 30, and the detection member 300 is spaced apart from the reference member 200. When the driving member drives the rotating member 30 to rotate by a set angle, the support assembly 100 and the reference member 200 also rotate accordingly. The detection member 300 is used to acquire the angle data of the reference member 200 rotating with the rotating member 30 to determine the rotation angle error of the rotating member 30.

[0036] The rotating component 30, the bearing assembly 100, and the reference component 200 are arranged sequentially in the direction away from the driving component. Since the rotating component 30 is located at the top of the base 20, that is, the rotating component 30, the bearing assembly 100, and the reference component 200 are arranged sequentially from bottom to top, and the rotating component 30 is fixedly connected to the bearing assembly 100, and the bearing assembly 100 and the reference component 200 are fixedly connected. In this way, when the driving component drives the rotating component 30 to rotate by a set angle, the bearing assembly 100 and the reference component 200 will also rotate with the rotating component 30, and the rotation angle of the reference component 200 is the same as that of the rotating component 30.

[0037] As mentioned above, the ion implanter has a working chamber, and the base 20 is located inside the working chamber. Therefore, the rotating component 30, the supporting assembly 100, and the reference component 200 are also located inside the working chamber. Due to the limited space in the working chamber, the detection component 300 can be located outside the working chamber, as long as it can ensure that the detection component 300 can detect the rotation angle of the reference component 200. Specifically, the detection component 300 can be supported by a tripod or other support frame.

[0038] The detection device 300 can acquire the rotation angle data of the reference device 200. By comparing this angle data with the set angle input in the ion implanter control interface, the rotation angle error of the rotating device 30 can be determined. The detection device 300 can detect the rotation angle data of the reference device 200 under normal pressure, without the need to establish a high vacuum environment. It has lower requirements for the working chamber environment, making the detection process simpler and more efficient. Moreover, the detection results are basically unaffected by the working chamber environment and particulate contamination. Therefore, the rotation angle detection device 10 can detect the rotation angle of the electrostatic chuck more accurately. Subsequently, the rotation accuracy of the electrostatic chuck can be calibrated based on the detection data to achieve precise control of ion implantation, thereby effectively suppressing the influence of the channeling effect.

[0039] In one implementation, the detection element 300 can obtain the rotation angle data of the reference element 200 by receiving light emitted or reflected by the reference element 200. For example, the detection element 300 can determine the rotation angle data of the reference element 200 by receiving light emitted or reflected before and after the reference element 200 rotates. Alternatively, the reference element 200 is used to emit light. When the reference element 200 rotates with the rotating element 30, the detection element 300 calculates the rotation angle data of the reference element 200 by capturing the movement trajectory of the reference element 200.

[0040] In another implementation, the detection element 300 emits light (denoted as emitted light), and the reference element 200 has a reflective surface. The emitted light from the detection element 300 shines onto the reflective surface of the reference element 200, and the emitted light is reflected by the reflective surface to form reflected light. The detection element 300 can receive the reflected light and obtain the angle data of the rotation of the reference element 200 based on the deviation between the emitted light and the reflected light on the detection element 300. For this implementation, please refer to [link to relevant documentation]. Figure 2The detection element 300 can specifically be an optical autocollimator. The optical path of the autocollimator is light emitted from a light source, passing through a reticle 310 and an objective lens 320 before reaching the reference element 200. After passing through the reticle 310 located at the focal plane of the objective lens 320, the light becomes parallel. This parallel light is reflected back by the reference element 200, which is perpendicular to the optical axis, and then passes through the objective lens 320 again, forming an image of the reticle 310 on the focal plane that coincides with the reticle line. When the reference element 200 tilts (rotates) by a small angle α, the reflected light beam tilts by an angle 2α. After passing through the objective lens 320, the light beam forms an image of the reticle 310 on the focal plane at a distance d from the reticle line. The magnitude of the rotation angle α can be calculated from this offset distance. The accuracy of an optical autocollimator is usually measured in angular units (such as arcseconds). Common optical autocollimators have an angular measurement accuracy of up to 1 arcsecond. This accuracy makes optical autocollimators perform exceptionally well when measuring minute angular changes. The specific structure and working principle of the optical autocollimator are existing technologies and will not be described in detail here.

[0041] In some implementations, when the set angle is less than or equal to the reference angle, the rotation angle error of the rotating member 30 is the difference between the angle data and the set angle.

[0042] The specific reference angle mentioned above can be determined based on the measurement range of the optical autocollimator. The measurement range of the optical autocollimator is ±100″ to ±1000″, meaning it can directly measure the error within a rotation angle of ±100″ to ±1000″. Therefore, the reference angle is ±100″ to ±1000″. Specifically, the reference angle can be ±100″, ±300″, ±500″, ±800″, or ±1000″.

[0043] When the set angle is less than or equal to the reference angle, the detection element 300 can directly measure the true rotation angle of the reference element 200. In other words, the angle data obtained by the detection element 300 is the true rotation angle of the reference element 200. Since the rotation angles of the reference element 200 and the rotating element 30 are the same, the angle data obtained by the detection element 300 is also the true rotation angle of the rotating element 30. Therefore, the difference between the angle data and the set angle is the rotation angle error of the rotating element 30. When the difference is positive, it indicates that the rotating element 30 is under-rotated. Similarly, when the difference is negative, it indicates that the rotating element 30 is over-rotated.

[0044] Taking a reference angle of 1000″ and a set angle of 800″ as an example, when the set angle of 800″ is entered into the control interface of the ion implanter, due to rotation error, the rotating component 30 only rotates 750″. At this time, the angle data obtained by the detection component 300 is 750″. The difference between the set angle of 800″ and the angle data of 750″ is 50″. Therefore, the rotation angle error when the rotating component 30 rotates 800″ is 50″.

[0045] In some embodiments, the reference element 200 has multiple reflective surfaces connected end-to-end. In a further embodiment, the angle between any two adjacent reflective surfaces is the same. The reference element 200 can be a polyhedron, and its reflective surfaces are used to cooperate with the light from the detection element 300 to achieve angle measurement. The reference element 200 can have 4, 8, 12, or 24 reflective surfaces; there is no limitation on this.

[0046] In some embodiments, the reference member 200 has x reflective surfaces, and when the set angle is an integer multiple of 360° / x, the rotation angle error of the rotating member 30 is angular data.

[0047] Since the reference component 200 has x reflective surfaces, and the angle between any two adjacent reflective surfaces is the same, when the set angle is n times 360° / x, the reference component 200 will rotate so that the nth reflective surface faces the detection component 300. That is, each time the reference component 200 rotates, the light from the detection component 300 can stay at the position of one of the reflective surfaces of the reference component 200. When the rotation angle error of the rotating component 300 is 0, the light from the detection component 300 is aligned with the current reflective surface, and the angle data obtained by the detection component 300 is 0°. However, if the rotating component 300 has a rotation angle error, the light from the detection component 300 will not be perfectly aligned with the current reflective surface, and there will be a deviation. The angle data obtained by the detection component 300 at this time is the rotation angle error of the rotating component 300.

[0048] Taking a reference element 200 with 12 reflective surfaces and a set angle of 30° as an example, when the set angle of 30° is input into the control interface of the ion implanter, since the included angle between any two adjacent reflective surfaces is 30°, the reference element 200 will rotate until the next reflective surface faces the detection element 300. However, due to rotation error, the rotating element 30 only rotates by 28°59'10", meaning that the light from the detection element 300 is not aligned with the current reflective surface. At this time, the angle data obtained by the detection element 300 is 50″, thus the rotation angle error of the rotating element 30 when it rotates 30° is 50″.

[0049] Further reference Figure 1 In some embodiments, the support assembly 100 includes a support platform 110 and an indexing plate 120. The support platform 110 is fixedly connected to the rotating member 30. The indexing plate 120 includes a fixed part 121 and a rotating part 122. The fixed part 121 is fixedly connected to the support platform 110, and the rotating part 122 is rotatable relative to the fixed part 121. The reference member 200 is fixedly connected to the rotating part 122.

[0050] The support platform 110, the fixed part 121, the rotating part 122 and the reference member 200 are arranged in sequence in the direction away from the rotating member 30. The fixed part 121 is fixedly connected to the support platform 110 to fix the overall position of the indexing plate 120 and ensure stability. The rotating part 122 can rotate relative to the fixed part 121 to realize angle adjustment. The rotating part 122 is provided with angle scale, and the fixed part 121 is provided with a reading device for reading the scale.

[0051] Specifically, the fixed part 121 and the support platform 110 can be connected by fixing screws, and the rotating part 122 and the reference part 200 can be connected by fixing screws. The indexing plate 120 also includes positioning pins. The fixed part 121 is provided with multiple positioning holes, and the rotating part 122 is provided with multiple corresponding pin holes. The positioning pins can pass through the positioning holes and the corresponding pin holes to fix the rotating part 122 and the fixed part 121 relative to each other. When the positioning pins are removed, the rotating part 122 can rotate relative to the fixed part 121. That is, the rotating part 122 and the fixed part 121 have two states: a relative rotating state and a relative stationary state.

[0052] In some implementations, when the set angle is greater than the reference angle, the rotation angle error of the rotating member 30 is angular data.

[0053] As described above, when the set angle is less than or equal to the reference angle, the detection element 300 can directly measure the actual rotation angle of the rotating element 30, thereby obtaining the rotation angle error. In particular, when the reference element 200 is a polyhedron, and the set angle is an integer multiple of 360° / x, the angle data of the detection element 300 is the rotation angle error of the rotating element 30. When the set angle is not an integer multiple of 360° / x, the error can be detected using the indexing plate 120.

[0054] Taking a set angle of 93° as an example, the rotating part 122 and the fixed part 121 are initially kept relatively fixed. After 93° is input into the control interface of the ion implanter, the reference piece 200 rotates by a certain angle. Since 93° is not an integer multiple of 360° / x, all the reflective surfaces of the reference piece 200 are misaligned at this time. The current reflective surface is unlikely to return the reflected light to the detection piece 300, resulting in the detection piece 300 being unable to obtain the result. At this point, the rotating part 122 and the fixed part 121 can be switched from a relatively static state to a relatively rotating state. The rotating part 122 is rotated 93° in the opposite direction according to the scale, while the fixed part 121 remains stationary. In this way, the reference part 200 also rotates 93° in the opposite direction and returns to the initial reflecting surface. At this time, the initial reflecting surface of the reference part 200 can return the reflected light. If the rotation angle of the rotating part 30 is completely accurate, then 93° forward + 93° backward = net rotation 0°, and the reading of the detection part 300 should be 0°. Conversely, if there is a deviation in the rotation angle of the rotating part 30, for example, if the angle data obtained by the detection part 300 is 10″, it means that the rotating part 30 actually only rotated 92°59′50″, so the rotation angle error when the rotating part 30 rotates 93° is 10″.

[0055] Of course, when the set angle is an integer multiple of 360° / x, the error detection can also be performed using the above method with the help of the scale 120. It should be noted that the reading accuracy of the set angle cannot exceed the nominal accuracy of the scale 120. For example, when the minimum accuracy of the scale 120 is 0.01°, if the set angle is 93.001°, the rotating part 122 cannot be rotated back to 93.001° according to the scale.

[0056] In some embodiments, the rotating member 30 has a first connecting surface, and the support platform 110 has a second connecting surface, with the first connecting surface abutting the second connecting surface. That is, the rotating member 30 and the support platform 110 have a large surface contact area, which improves the connection stability between them, allowing the rotating member 30 to better drive the reference member 200 to rotate via the support platform 110, thereby improving the accuracy and reliability of the angle detection data. Specifically, the top surface of the rotating member 30 is configured as the first connecting surface, and the bottom surface of the support platform 110 is configured as the second connecting surface; the first and second connecting surfaces have the same dimensions and correspond completely.

[0057] In some embodiments, the support platform 110 includes a support body and a claw disposed on the support body, a second connecting surface is disposed on the support body, and the claw is locked to the rotating member 30.

[0058] The locking force of the jaws provides strong anti-torsional torque, ensuring a stable connection between the support platform 110 and the rotating component 30. This minimizes relative slippage between the support assembly 100 and the rotating component 30 during rotation, improving the accuracy and reliability of the angle detection data. Furthermore, since the jaws lock the component to the rotating component 30, there is no need to drill holes in the rotating component 30, ensuring its structural integrity. Specifically, the support platform 110 can be a three-jaw chuck.

[0059] In some embodiments, the diameter of the support platform 110 is larger than the diameter of the indexing plate 120. The horizontal cross-sections of both the support platform 110 and the indexing plate 120 are circular. Since the diameter of the support platform 110 is larger than the diameter of the indexing plate 120, the support platform 110 and the indexing plate 120 form a stable "larger at the bottom and smaller at the top" structure. The larger support platform 110 serves as the base 20, which lowers the center of gravity of the entire detection device 10 and reduces errors that may be caused by shaking during the measurement process.

[0060] In some embodiments, the support platform 110, the indexing plate 120, and the reference member 200 are arranged overlappingly along the axial direction of the rotating member 30. That is, the support platform 110, the indexing plate 120, the reference member 200, and the rotating member 30 are all coaxially arranged, and the rotation axes of the support platform 110, the indexing plate 120, and the reference member 200 coincide with the rotation axis of the rotating member 30, minimizing radial runout or end face runout that may occur due to eccentric rotation, thereby reducing measurement errors. Furthermore, since the support platform 110, the indexing plate 120, and the reference member 200 are overlapped, the structural compactness is improved, resulting in a smaller overall footprint of the detection device 10, even with the limited space in the working chamber of the ion implanter.

[0061] In summary, the rotation angle detection device 10 provided in this application embodiment can detect the rotation angle of the rotating component 30 under normal pressure conditions without the need to use a control plate to measure the ion implantation dose. The detection process is simpler, more efficient, and more direct, reducing production costs and improving detection accuracy. This allows for more accurate control of the ion beam implantation angle distribution and effectively suppresses the effects of the channeling effect.

[0062] Although embodiments of this application have been shown and described, those skilled in the art will understand that various changes, modifications, substitutions and variations can be made to these embodiments without departing from the principles and spirit of this application, the scope of which is defined by the claims and their equivalents.

Claims

1. A rotation angle detection device for detecting the rotational accuracy of a rotating component, wherein the rotating component is capable of rotating at a set angle under the drive of a driving component, characterized in that, The rotation angle detection device includes: A support component is fixedly connected to the side of the rotating component away from the driving component; A reference component is fixedly connected to the side of the bearing assembly away from the rotating component; The testing component is spaced apart from the reference component; Wherein, when the driving member drives the rotating member to rotate by a set angle, the detection member is used to acquire the angle data of the reference member rotating with the rotating member, so as to determine the rotation angle error of the rotating member.

2. The rotation angle detection device according to claim 1, characterized in that, The bearing assembly includes a bearing platform and an indexing plate. The bearing platform is fixedly connected to the rotating component. The indexing plate includes a fixed part and a rotating part. The fixed part is fixedly connected to the bearing platform, and the rotating part is rotatable relative to the fixed part. The reference component is fixedly connected to the rotating part.

3. The rotation angle detection device according to claim 2, characterized in that, The rotating component has a first connecting surface, and the support platform has a second connecting surface, with the first connecting surface fitting against the second connecting surface.

4. The rotation angle detection device according to claim 3, characterized in that, The support platform includes a support body and a claw disposed on the support body, the second connecting surface is disposed on the support body, and the claw is locked to the rotating member.

5. The rotation angle detection device according to claim 2, characterized in that, The support platform, the indexing plate, and the reference component are arranged along the axial direction of the rotating component.

6. The rotation angle detection device according to any one of claims 1-5, characterized in that, The reference component has a reflective surface; The emitted light from the detection element can illuminate the reflective surface, and the reflected light reflected by the reflective surface can be received to obtain the angle data of the reference element rotating with the rotating element based on the emitted light and the reflected light.

7. The rotation angle detection device according to claim 6, characterized in that, The reference component has multiple reflective surfaces connected end to end in sequence, and the angle between each pair of adjacent reflective surfaces is the same; the detection component is an optical autocollimator.

8. The rotation angle detection device according to claim 7, characterized in that, The reference component is a multifaceted prism.

9. The rotation angle detection device according to any one of claims 1-5, characterized in that, The rotation angle detection device also includes a support frame for supporting the detection element.

10. The rotation angle detection device according to any one of claims 1-5, characterized in that, The rotating component is an electrostatic chuck of an ion implanter, and the electrostatic chuck is located in the working chamber of the ion implanter; The bearing assembly and the reference component are installed in the working chamber, and the detection component is installed outside the working chamber.

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