An electrode cleaning device

Abstract

This utility model discloses an electrode cleaning device, including a cleaning tank and a support ring disposed within the cleaning tank. The support ring divides the cleaning tank into a main storage chamber and an auxiliary storage chamber. An electrode is placed on the support ring in the main storage chamber, and the electrode has multiple air holes. A negative pressure device is provided in the auxiliary storage chamber to generate negative pressure, attracting the cleaning fluid from the main storage chamber to flow into the auxiliary storage chamber through the air holes on the electrode, forming a water curtain. This utility model has a simple structure. By setting a negative pressure device in the auxiliary storage chamber to generate negative pressure, an auxiliary suction force is formed at the cleaning fluid outlet side of the air holes, accelerating the flow of cleaning fluid from the air holes and effectively compensating for the friction loss experienced by the cleaning fluid in the air hole section at the outlet side. This structure can shorten the cleaning time while reducing the initial water pressure or maintaining the original water pressure, while ensuring good cleaning results.

Description

Technical Field

[0001] This utility model relates to the field of cleaning equipment technology, specifically an electrode cleaning device. Background Technology

[0002] In semiconductor manufacturing, dry etching is a critical process step widely used to form the microstructure of wafer surfaces. During this process, electrodes, as essential components for generating and maintaining plasma, are typically directly exposed to the plasma chamber and gradually wear down due to prolonged plasma bombardment, making them common consumables. When the electrode surface etches to a certain extent, the entire wafer must be replaced with a new etched electrode to ensure process stability and product yield.

[0003] Typically, the etching electrodes are circular to create a uniform external electric field within the vacuum etching chamber, thereby guiding the plasma to bombard the wafer surface evenly. To achieve uniform plasma distribution within the chamber, process gases are injected through multiple tiny pores distributed on the electrodes. These pores are typically 0.35-0.5 mm in diameter, and for electrodes used on 12-inch wafers, their thickness is usually between 10-20 mm.

[0004] Cleaning is a crucial step in the manufacturing and maintenance of electrodes. The main purpose of cleaning is to remove impurities remaining from the machining process and to polish the inner walls of the pores, thereby improving the uniformity and stability of gas distribution in subsequent processes. In existing technologies, a common cleaning method involves placing the electrode at the outlet of a liquid storage chamber, allowing the cleaning fluid to flow through the electrode pores under gravity or external pressure, thus achieving the cleaning purpose.

[0005] However, due to the small diameter of the pores, the flow resistance along the pores is significant, resulting in noticeable head loss as the cleaning fluid flows through pores approximately 20 mm in length. In practical applications, variations in initial head can lead to head losses as high as 50%-80%. This large variation in friction resistance causes uneven velocity and pressure distribution of the cleaning fluid at different depths within the pores, thus affecting the consistency of the cleaning effect.

[0006] To compensate for the insufficient cleaning effect at the outlet, existing technologies often improve the cleaning effect by increasing the cleaning pressure or extending the cleaning time. However, this approach yields limited improvement in cleaning effect and increases energy consumption and process costs, resulting in poor economic efficiency. Therefore, an electrode cleaning device is proposed. Utility Model Content

[0007] The purpose of this invention is to provide an electrode cleaning device to solve the problems mentioned in the background art.

[0008] To achieve the above objectives, the present invention provides the following technical solution: an electrode cleaning device, comprising a cleaning tank and a support ring disposed within the cleaning tank, the support ring dividing the cleaning tank into a main storage chamber and an auxiliary storage chamber, an electrode located in the main storage chamber being placed on the support ring, the electrode being provided with multiple air holes, and a negative pressure device being provided in the auxiliary storage chamber for generating negative pressure in the auxiliary storage chamber to attract the cleaning liquid in the main storage chamber to flow into the auxiliary storage chamber through the air holes on the electrode to form a water curtain.

[0009] As a further embodiment of this utility model: the negative pressure device includes a negative pressure pipeline, one end of which is connected to the interior of the auxiliary storage chamber, and the other end of which is connected to a vacuum generator.

[0010] As a further embodiment of this utility model: a gas-liquid separator is installed on the negative pressure pipeline, and the gas-liquid separator is located between the vacuum generator and the auxiliary storage chamber.

[0011] As a further embodiment of this utility model: a cover plate is installed on the top of the cleaning tank, and an exhaust hole is provided on the cover plate. The exhaust hole can be selectively opened and closed to remove gas from the main storage chamber.

[0012] As a further embodiment of this utility model, it further includes a return pipeline, which is connected to the main storage chamber and the auxiliary storage chamber respectively. A liquid supply pump is installed on the return pipeline to pump the cleaning liquid in the auxiliary storage chamber back to the main storage chamber through the return pipeline.

[0013] As a further embodiment of this utility model: a filter is installed on the return pipeline, and the filter is located between the supply pump and the auxiliary storage chamber.

[0014] As a further embodiment of this utility model: the return pipeline is connected to a replenishment pipeline for replenishing cleaning fluid, and the replenishment pipeline is connected to an external source of cleaning fluid.

[0015] As a further embodiment of this utility model: an overflow valve is installed on the return pipeline, and the overflow valve is located between the liquid supply pump and the main storage chamber.

[0016] As a further embodiment of this utility model, it further includes an overflow pipeline, which is connected to the main storage chamber and the auxiliary storage chamber respectively.

[0017] As a further embodiment of this utility model: a limiting member for a limiting ring is installed inside the cleaning tank, and the limiting ring is in sliding fit with the inside of the cleaning tank.

[0018] Compared with the prior art, the beneficial effects of this utility model are: This application introduces a negative pressure device in the auxiliary storage chamber to generate negative pressure, thereby creating an auxiliary suction force on the cleaning fluid outlet side of the vent, accelerating the flow of cleaning fluid from the vent, and effectively compensating for the friction loss of the cleaning fluid in the vent section on the outlet side; this structure can shorten the cleaning time while reducing the initial water pressure or maintaining the original water pressure, and at the same time ensure good cleaning effect. Attached Figure Description

[0019] Figure 1 This is a schematic diagram of the cleaning equipment of this utility model; Figure 2 This is a schematic diagram of another embodiment of the cleaning equipment of this utility model; Figure 3 This is a schematic diagram of the cleaning box of this utility model; Figure 4 This is a schematic diagram of the bottom of the cleaning tank of this utility model; Figure 5 This is a schematic diagram of the support ring and electrode assembly of this utility model; Figure 6 This is a schematic diagram of the support ring of this utility model; Figure 7 This is a schematic diagram of the limiting component of this utility model; In the diagram: 1. Cleaning tank; 1-1. Main storage chamber; 1-2. Auxiliary storage chamber; 1-3. Negative pressure hole; 1-4. First connecting hole; 1-5. Second connecting hole; 2. Support ring; 3. Through hole; 4. Electrode; 41. Air hole; 5. Negative pressure device; 51. Negative pressure pipeline; 52. Vacuum generator; 53. Gas-liquid separator; 6. Cover plate; 7. Return pipeline; 8. Liquid supply pump; 9. Filter; 10. Replenishment pipeline; 11. Overflow valve; 12. Overflow pipeline; 13. Limiting component. Detailed Implementation

[0020] The technical solutions of the present utility model will be clearly and completely described below with reference to the accompanying drawings of the embodiments. Obviously, the described embodiments are only some embodiments of the present utility model, and not all embodiments. Based on the embodiments of the present utility model, all other embodiments obtained by those of ordinary skill in the art without creative effort are within the protection scope of the present utility model.

[0021] Please see Figure 1-7In this embodiment of the present invention, an electrode cleaning device includes a cleaning tank 1 and a support ring 2 disposed within the cleaning tank 1. The shape of the cleaning tank 1 is not limited; it can be cylindrical or square. In this embodiment, preferably, the cleaning tank 1 is square. The support ring 2 is fixedly connected to the inner wall of the cleaning tank. The support ring 2 divides the cleaning tank 1 into a main storage chamber 1-1 and an auxiliary storage chamber 1-2, wherein the main storage chamber 1-1 is located above the support ring 2, and the auxiliary storage chamber 1-2 is located below the support ring 2. The support ring 2 has a through hole 3 in the middle connecting the main storage chamber 1-1 and the auxiliary storage chamber 1-2. An electrode 4 located in the main storage chamber 1-1 is placed on the support ring 2. The inner diameter of the through hole 3 is matched with the inner diameter of the electrode 4 to better hold the electrode 4 in place, ensuring that the position of the electrode 4 will not move when the liquid passes through it. The electrode 4 is provided with multiple air holes 41, the inner diameter of which is 0.2mm-0.5mm. The auxiliary storage chamber 1-2 is provided with a negative pressure device 5 to generate negative pressure in the auxiliary storage chamber 1-2, so as to attract the cleaning liquid in the main storage chamber 1-1 to flow into the auxiliary storage chamber 1-2 through the air holes 41 on the electrode 4 to form a water curtain. At this time, a pressure difference is formed between the main storage chamber 1-1 and the auxiliary storage chamber 1-2, which accelerates the passage of the cleaning liquid through the air holes 41 on the electrode 4 and effectively compensates for the friction loss of the cleaning liquid in the air hole section on the outlet side.

[0022] Please see Figure 1 and Figure 3 In one embodiment, preferably, the negative pressure device 5 includes a negative pressure pipeline 51, one end of which is connected to the interior of the auxiliary storage chamber 1-2, and the other end of which is connected to the vacuum generator 52.

[0023] Specifically, the cleaning tank 1 is provided with a negative pressure hole 1-3. One end of the negative pressure pipe 51 passes through the negative pressure hole 1-3 and enters the interior of the auxiliary storage chamber 1-2. The inner diameter of the negative pressure hole 1-3 is matched with the outer diameter of the negative pressure pipe 51 to ensure the airtightness of the connection. Then, the vacuum generator 52 at the other end of the negative pressure pipe 51 generates suction and acts on the negative pressure pipe 51 and the auxiliary storage chamber 1-2 in sequence, thereby forming a pressure difference between the auxiliary storage chamber 1-2 and the main storage chamber 1-1, thereby accelerating the liquid to pass through the air hole 41 on the electrode 4.

[0024] Please see Figure 1 In one embodiment, preferably, a gas-liquid separator 53 is installed on the negative pressure pipeline 51, and the gas-liquid separator 53 is located between the vacuum generator 52 and the auxiliary storage chamber 1-2. Furthermore, the gas-liquid separator 53 can prevent the gas containing cleaning fluid from entering the vacuum generator 52, thus affecting the working effect and expected life of the vacuum generator 52.

[0025] Please see Figure 1 , Figure 3 and Figure 4In one embodiment, preferably, a cover plate 6 is installed on the top of the cleaning tank 1. One side of the cover plate 6 is connected to the cleaning tank 1 by a rotating shaft, so that the cover plate 6 can be opened to expose the opening at the top of the cleaning tank 1, making it convenient for the operator to place the electrode 4 onto the support ring 2. An exhaust hole is provided on the cover plate 6. The exhaust hole is selectively opened and closed to remove gas from the main storage chamber 1-1. The exhaust hole is usually equipped with a valve, which is opened and closed as needed. During the start-up process, the exhaust hole is usually opened to ensure that the gas in the main storage chamber 1-1 is discharged as the cleaning fluid continuously enters. After the cleaning fluid fills the main storage chamber 1-1, the exhaust hole is closed to prevent the cleaning fluid in the main storage chamber 1-1 from overflowing and to maintain the water pressure of the cleaning fluid in the main storage chamber 1-1.

[0026] Please see Figure 1 In one embodiment, preferably, a return pipe 7 is further included. The cleaning tank 1 is provided with a first connecting hole 1-4 and a second connecting hole 1-5. The first connecting hole 1-4 is connected to the main storage chamber 1-1, and the second connecting hole 1-5 is connected to the auxiliary storage chamber 1-2 and is located at the bottom of the cleaning tank 1. The outer diameters of both ends of the return pipe 7 are adapted to the inner diameters of the first connecting hole 1-4 and the second connecting hole 1-5, respectively, so as to ensure the sealing of the connection between the return pipe 7 and the cleaning tank 1. The return pipe 7 is connected to the main storage chamber 1-1 and the auxiliary storage chamber 1-2, respectively. A liquid supply pump 8 is installed on the return pipe 7 for pumping the cleaning liquid in the auxiliary storage chamber 1-2 back to the main storage chamber 1-1 through the return pipe 7. A filter 9 is installed on the return pipe 7, and the filter 9 is located between the liquid supply pump 8 and the auxiliary storage chamber 1-2. The return pipe 7 is connected to a replenishment pipe 10 for replenishing cleaning liquid, and the replenishment pipe 10 is connected to an external cleaning liquid source.

[0027] Specifically, since the auxiliary storage chamber 1-2 is located below the main storage chamber 1-1, a liquid supply pump 8 is installed on the return pipeline 7 connecting the two to pump the cleaning fluid that flows into the auxiliary storage chamber 1-2 through the vent 41 back into the main storage chamber 1-1. As the cleaning fluid can carry out burrs and debris from the vent 41 during its passage through the vent 41, and a powder layer is also removed from the wall during the polishing process, the filter 9 can intercept and filter out the aforementioned solid particles in the cleaning fluid to prevent these solid particles from affecting the cleaning and polishing effect after reuse. In addition, when the cleaning fluid in the main storage chamber 1-1 or the auxiliary storage chamber 1-2 is significantly reduced, cleaning fluid is injected into it through the replenishment pipeline 10.

[0028] Please see Figure 1In one embodiment, preferably, an overflow valve 11 is installed on the return pipeline 7. The overflow valve 11 is located between the liquid supply pump 8 and the main storage chamber 1-1. Furthermore, the overflow valve 11 is used to regulate the water pressure of the cleaning fluid input to the main storage chamber 1-1 so that it is maintained within a preset standard range.

[0029] Please see Figure 2 In another embodiment, preferably, it further includes an overflow pipe 12, which is connected to the main storage chamber 1-1 and the auxiliary storage chamber 1-2 respectively. When the cleaning fluid level in the main storage chamber 1-1 is higher than the set height of the overflow pipe 12 in the main storage chamber 1-1, the excess cleaning fluid will flow into the auxiliary storage chamber 1-2 through the overflow pipe 12, thereby maintaining the stability of the cleaning fluid level in the main storage chamber 1-1.

[0030] Please see Figure 7 In one embodiment, preferably, a limiting member 13 for limiting the support ring 2 is installed inside the cleaning tank 1. The support ring 2 is in sliding fit with the inside of the cleaning tank 1. Since there are many sizes and models of electrodes 4, in order to make the cleaning tank 1 adaptable to different models of electrodes 4, a limiting member 13 is fixedly connected to the inner wall of the cleaning tank 1. The limiting member 13 can be a locking block or a locking ring. Its purpose is to support the bottom of the support ring 2 from the top. Since the support ring 2 is in sliding fit with the cleaning tank 1, the support ring 2 that matches the outer diameter of the electrode 4 can be selected. Different models of electrodes 4 can be cleaned without replacing other parts, which improves the practicality of the cleaning equipment.

[0031] The working principle and usage process of this utility model are as follows: First, open the cover plate 6 and place the electrode 4 on the through hole 3 of the support ring 2 to fix the position of the electrode 4. Then, close the cover plate 6 and inject cleaning fluid into the main storage chamber 1-1 through the return pipe 7. As the cleaning fluid is continuously injected, it will flow into the auxiliary storage chamber 1-2 through the pores 41 on the electrode 4 under the action of gravity, and clean the pores 41 during the flow. At the same time, the vacuum generator 52 is turned on to generate negative pressure, which is applied to the auxiliary storage chamber 1-2 through the negative pressure pipe 51, thereby forming the main... The pressure difference between the main storage chamber 1-1 and the auxiliary storage chamber 1-2 accelerates the flow of the cleaning fluid in the main storage chamber 1-1 into the auxiliary storage chamber 1-2 through the vent 41. The cleaning fluid entering the auxiliary storage chamber 1-2 is then re-entered into the main storage chamber 1-1 through the return pipe 7 under the action of the supply pump 8. During this process, impurities in the cleaning fluid are filtered by the filter 9 to ensure the recyclability of the cleaning fluid. At the same time, the overflow valve 11 or the overflow pipe 12 ensures that the cleaning fluid level in the main storage chamber 1-1 does not become too high. In addition, the vent on the cover plate 6 also helps to expel the gas in the main storage chamber 1-1.

[0032] Although this specification describes embodiments, not every embodiment contains only one independent technical solution. This narrative style is merely for clarity. Those skilled in the art should consider the specification as a whole. The technical solutions in each embodiment can also be appropriately combined to form other embodiments that can be understood by those skilled in the art.

[0033] Therefore, the above description is only a preferred embodiment of this application and is not intended to limit the scope of this application; that is, all equivalent modifications made in accordance with the scope of the claims of this application shall be within the protection scope of the claims of this application.

Claims

1. An electrode cleaning apparatus, characterized by, The device includes a cleaning tank and a support ring disposed within the cleaning tank. The support ring divides the cleaning tank into a main storage chamber and an auxiliary storage chamber. An electrode located in the main storage chamber is placed on the support ring. The electrode has multiple air holes. A negative pressure device is provided in the auxiliary storage chamber to generate negative pressure in the auxiliary storage chamber, so as to attract the cleaning liquid in the main storage chamber to flow into the auxiliary storage chamber through the air holes on the electrode to form a water curtain.

2. The electrode cleaning apparatus according to claim 1, characterized by The negative pressure device includes a negative pressure pipeline, one end of which is connected to the interior of the auxiliary storage chamber, and the other end of which is connected to a vacuum generator.

3. The electrode cleaning apparatus according to claim 2, characterized by A gas-liquid separator is installed on the negative pressure pipeline, and the gas-liquid separator is located between the vacuum generator and the auxiliary storage chamber.

4. The electrode cleaning apparatus according to claim 1, characterized by The top of the cleaning tank is equipped with a cover plate, and an exhaust hole is provided on the cover plate. The exhaust hole can be selectively opened and closed to remove gas from the main storage chamber.

5. The electrode cleaning apparatus according to claim 1, wherein Further, a return pipeline is included, which is connected to the main storage chamber and the auxiliary storage chamber respectively. A liquid supply pump is installed on the return pipeline to pump the cleaning liquid in the auxiliary storage chamber back to the main storage chamber through the return pipeline.

6. The electrode cleaning apparatus according to claim 5, characterized by A filter is installed on the return line, and the filter is located between the supply pump and the auxiliary storage chamber.

7. The electrode cleaning apparatus according to claim 5, wherein The return pipeline is connected to a replenishment pipeline for the cleaning fluid, and the replenishment pipeline is connected to an external source of cleaning fluid.

8. The electrode cleaning apparatus according to claim 5, wherein An overflow valve is installed on the return pipeline, which is located between the supply pump and the main storage chamber.

9. The electrode cleaning apparatus according to claim 1, wherein It further includes an overflow pipeline, which is connected to the main storage chamber and the auxiliary storage chamber respectively.

10. The electrode cleaning apparatus according to claim 1, characterized by The cleaning tank is equipped with a limiting member that restricts the support ring, and the support ring is in sliding fit with the inside of the cleaning tank.

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