Panel Evaporation Equipment

Abstract

This utility model discloses a panel vapor deposition apparatus, including a vapor deposition chamber, a cleaning mechanism, and a driving mechanism. The vapor deposition chamber contains a vapor deposition crucible and a panel conveyor line positioned above the crucible for transporting panels. The top of the crucible has multiple vapor deposition nozzles facing the panel conveyor line. The cleaning mechanism includes a support frame and a cleaning component movably mounted on the support frame. The length of the support frame extends along the length of the vapor deposition crucible. The driving mechanism includes a first driving component and a second driving component. The first driving component is mounted on the support frame and is driven by the cleaning component to drive the cleaning component to reciprocate along the length of the support frame. The second driving component is driven by the support frame to drive the support frame to move closer to or away from the top surface of the vapor deposition crucible and to rotate around a first axis perpendicular to the top surface of the crucible. This apparatus has a simple structure, high cleaning efficiency, and helps reduce the labor intensity of operators and improve production efficiency.

Description

Technical Field

[0001] This utility model relates to the field of panel manufacturing technology, and in particular to a panel vapor deposition apparatus. Background Technology

[0002] Reference Figure 1 As shown, during the vapor deposition process, the liquefied organic material 3' inside the vapor deposition crucible 2' is ejected without vaporization. The heater is located near the bottom of the vapor deposition crucible 2', which makes the temperature at the top of the vapor deposition crucible 2' lower than that at the bottom. Therefore, when the unvaporized organic material 3' is ejected from the top of the vapor deposition crucible 2', it solidifies on the top surface of the vapor deposition crucible 2' and accumulates at and near the vapor deposition nozzle 21'.

[0003] The existing technology has the following shortcomings: The solidification of organic material 3′ at the vapor deposition nozzle 21′ may cause blockage, affecting the vapor deposition quality and efficiency. Furthermore, the heater still maintains heat on the top surface of the vapor deposition crucible 2′, and will heat the organic material 3′ solidified near the vapor deposition nozzle 21′, causing the solidified organic material 3′ to vaporize and vaporize onto the panel 1′. This simultaneous vaporization of the organic material 3′ at the vapor deposition nozzle 21′ onto the panel 1′ results in increased vapor deposition thickness in some areas of the panel 1′, leading to poor quality of the vapor deposition layer on the surface of the panel 1′. To solve these problems, it is necessary to clean the solidified organic material 1′ on the top of the vapor deposition crucible 2′ regularly. The traditional method is to stop the vapor deposition equipment and wait for the temperature of the vapor deposition crucible 2′ to cool to a safe temperature before manually cleaning the top of the crucible 2′. This cleaning method is inefficient, has unsatisfactory cleaning results, is time-consuming and labor-intensive, and frequent shutdowns for cleaning also affect production efficiency. Utility Model Content

[0004] The purpose of this utility model is to provide a panel vapor deposition device with a simple structure that can realize mechanized and automated cleaning of the top of the vapor deposition crucible. It has high cleaning efficiency, reduces the labor intensity of operators, and the downtime of the vapor deposition device during the cleaning process is short, which is conducive to improving production efficiency.

[0005] To achieve this objective, the present invention adopts the following technical solution:

[0006] A panel vapor deposition apparatus is provided, including a vapor deposition chamber, a cleaning mechanism and a driving mechanism. The vapor deposition chamber is provided with a vapor deposition crucible and a panel conveying line disposed above the vapor deposition crucible for conveying the panel. The top of the vapor deposition crucible is provided with a plurality of vapor deposition nozzles facing the panel conveying line.

[0007] The cleaning mechanism includes a support frame and a cleaning component movably mounted on the support frame, wherein the length of the support frame extends along the length of the vapor deposition crucible.

[0008] The driving mechanism includes a first driving component and a second driving component. The first driving component is disposed on the support frame and is driven to the cleaning component to drive the cleaning component to reciprocate along the length direction of the support frame. The second driving component is driven to the support frame to drive the support frame to move closer to or away from the top surface of the vapor deposition crucible and to rotate around a first axis, the first axis being perpendicular to the top surface of the vapor deposition crucible.

[0009] In one embodiment of the panel vapor deposition apparatus, the first drive assembly includes a first drive member, a rotating shaft, and a plurality of chain plates surrounding the outside of the rotating shaft. Two adjacent chain plates are hinged to each other. The first drive member is driven to the rotating shaft. The first drive member drives the rotating shaft to rotate along its axis to wind up or unwind the chain plates.

[0010] The support frame has a drive cavity for mounting the first drive assembly and a cleaning cavity for the cleaning assembly to move within it. The drive cavity is connected to the cleaning cavity. The bottom of the cleaning cavity has a cleaning port. The cleaning end of the cleaning assembly cleans the top surface of the vapor deposition crucible through the cleaning port. The cleaning assembly is mounted on the outermost chain plate. The side wall of the cleaning cavity has a sliding groove for the chain plate to slide.

[0011] In one embodiment of the panel vapor deposition apparatus, the chute extends into the drive cavity, and a guide ramp is provided on the chute wall near one end of the first drive assembly.

[0012] In one embodiment of the panel vapor deposition apparatus, the cleaning component includes a suction host, a connecting pipe, and a suction nozzle. The suction host is mounted on the chain plate, and the suction nozzle is connected to the suction host through the connecting pipe, with the suction nozzle facing the cleaning port.

[0013] In one embodiment of the panel vapor deposition apparatus, the first drive assembly includes a first drive member, a rotating shaft and a plurality of chain plates. There are two rotating shafts, which are respectively located at both ends of the support frame along its length direction. The plurality of chain plates are connected end to end and surround the outside of the two rotating shafts. Adjacent chain plates are hinged to each other.

[0014] The support frame has a cleaning chamber, the first drive assembly is installed in the cleaning chamber, the bottom of the cleaning chamber has a cleaning port, the cleaning assembly is installed on the chain plate facing the cleaning port, and the cleaning end of the cleaning assembly cleans the top surface of the vapor deposition crucible through the cleaning port.

[0015] In one embodiment of the panel vapor deposition apparatus, the second drive assembly includes a telescopic cylinder and a rotary motor. The telescopic cylinder is driven by the support frame to drive the support frame to move closer to or away from the top surface of the vapor deposition crucible. The rotary motor is driven by the telescopic cylinder to drive the telescopic cylinder to rotate around the first axis.

[0016] In one embodiment of the panel vapor deposition apparatus, multiple vapor deposition crucibles are provided, arranged in a rectangular pattern. The cleaning mechanism and the driving mechanism are connected to form a cleaning drive group. Two cleaning drive groups are provided, with the two groups respectively located on both sides of the vapor deposition crucible along its width direction, and two second driving components respectively located diagonally along the vapor deposition crucible.

[0017] In one embodiment of the panel vapor deposition apparatus, the top of the vapor deposition chamber is provided with a cover plate for sealing the vapor deposition chamber, and the cover plate is openable and closable to allow the cleaning mechanism to extend into the vapor deposition chamber.

[0018] In one embodiment of the panel vapor deposition apparatus, the cover plate includes a fixed plate, a movable plate, and a second driving member. The fixed plate is provided with a telescopic groove, the movable plate is movably disposed in the telescopic groove, and the second driving member is disposed in the telescopic groove and is connected to the movable plate in a transmission manner to drive the movable plate to move within the telescopic groove.

[0019] In one embodiment of the panel vapor deposition apparatus, an industrial camera is also included, with the top surface of the vapor deposition crucible located within the field of view of the industrial camera, which is connected to both the cleaning mechanism and the drive mechanism.

[0020] The beneficial effects of this invention are as follows: By employing a drive mechanism to drive the cleaning mechanism, the cleaning component can clean the organic materials accumulated on the top surface of the vapor deposition crucible, achieving mechanization and automation of the cleaning operation. Compared with traditional manual cleaning, the cleaning efficiency is higher. Furthermore, during the cleaning operation, there is no need to lower the temperature of the vapor deposition chamber excessively, and the heating time for subsequent vapor deposition operations is shorter, thus reducing downtime of the vapor deposition equipment during the cleaning process and improving operational efficiency. Specifically, the second drive component drives the cleaning mechanism to approach and clean the vapor deposition crucible. The support frame extends along the length of the vapor deposition crucible, allowing the cleaning component to clean various positions along the length of the vapor deposition crucible when moved along the length of the support frame under the drive of the first drive component. Further, the second drive component drives the support frame to rotate around a first axis perpendicular to the top surface of the vapor deposition crucible, allowing the cleaning component located on the support frame to move to any position on the top surface of the vapor deposition crucible, thereby achieving cleaning of the entire top surface of the vapor deposition crucible and ensuring thorough cleaning. Attached Figure Description

[0021] The present invention will now be described in further detail with reference to the accompanying drawings and embodiments.

[0022] Figure 1 This is a schematic diagram of an existing vapor deposition apparatus;

[0023] Figure 2 This is a schematic diagram of the panel vapor deposition apparatus in an embodiment of this utility model;

[0024] Figure 3 This is a schematic diagram of the cleaning mechanism and the driving mechanism in an embodiment of this utility model;

[0025] Figure 4 This is a schematic diagram of the internal structure of the cleaning mechanism in an embodiment of this utility model;

[0026] Figure 5 yes Figure 4 Enlarged structural diagram of section A in the middle;

[0027] Figure 6 This is a schematic diagram of the support frame in an embodiment of this utility model;

[0028] Figure 7 This is a schematic diagram of the structure of the first driving component in another embodiment of the present invention;

[0029] Figure 8 This is a schematic diagram of the motion trajectory of the two sets of cleaning drive groups in an embodiment of this utility model;

[0030] Figure 9 This is a top view of the vapor deposition chamber in an embodiment of this utility model;

[0031] Figure 10 This is a schematic diagram of the cover plate in an embodiment of this utility model;

[0032] Figure 11 This is a schematic diagram of the panel vapor deposition device (cover plate closed state) in an embodiment of this utility model;

[0033] Figure 12 This is a schematic diagram of the panel vapor deposition device (cover plate open state) in an embodiment of this utility model.

[0034] Figure 1 middle:

[0035] 1′ Panel; 2′ Evaporation crucible; 21′ Evaporation nozzle; 3′ Organic material;

[0036] Figures 2 to 12 middle:

[0037] 1. Evaporation chamber; 2. Cleaning mechanism; 21. Support frame; 211. Drive chamber; 212. Cleaning chamber; 213. Cleaning port; 214. Slide groove; 2141. Guide slope; 22. Cleaning component; 221. Suction unit; 222. Connecting pipe; 223. Suction nozzle; 31. First drive component; 311. Rotating shaft; 312. Chain plate; 32. Second drive component; 321. Telescopic cylinder; 322. Rotary motor; 323. Reversing connector; 33. First axis; 4. Evaporation crucible; 41. Evaporation nozzle; 5. Panel; 6. Panel conveyor line; 7. Cover plate; 71. Fixed plate; 711. Telescopic groove; 72. Movable plate; 73. Second drive component; 8. Industrial camera; 9. Organic material. Detailed Implementation

[0038] The advantages and features of this invention, as well as methods of implementing them, will become apparent from the following detailed description of the embodiments in conjunction with the accompanying drawings. However, this invention is not limited to the embodiments disclosed below, but can be implemented in various different forms. These embodiments are provided merely to complete the disclosure of this invention and to enable those skilled in the art to fully understand its scope, which is defined only by the scope of the claims. The same reference numerals denote the same constituent elements throughout the specification.

[0039] The present invention will now be described in detail with reference to the accompanying drawings.

[0040] like Figures 2 to 12As shown, the panel vapor deposition apparatus of this utility model embodiment includes a vapor deposition chamber 1, a cleaning mechanism 2, and a driving mechanism. The vapor deposition chamber 1 is provided with a vapor deposition crucible 4 and a panel conveying line 6 located above the vapor deposition crucible 4 for conveying the panel 5. The top of the vapor deposition crucible 4 is provided with a plurality of vapor deposition nozzles 41 facing the panel conveying line 6. The cleaning mechanism 2 includes a support frame 21 and a cleaning component 22 movably mounted on the support frame 21. The length direction of the support frame 21 extends along the length direction of the vapor deposition crucible 4. The driving mechanism includes a first driving component 31 and a second driving component 32. The first driving component 31 is mounted on the support frame 21 and is drivenly connected to the cleaning component 22 to drive the cleaning component 22 to move along the length direction of the support frame 21. The second driving component 32 is drivenly connected to the support frame 21 to drive the support frame 21 to move closer to or away from the top surface of the vapor deposition crucible 4 and to rotate around a first axis 33. The first axis 33 is perpendicular to the top surface of the vapor deposition crucible 4.

[0041] In this embodiment, a driving mechanism is used to drive the cleaning mechanism 2, enabling the cleaning component 22 to clean the organic material 9 accumulated on the top surface of the vapor deposition crucible 4. This achieves mechanization and automation of the cleaning operation, resulting in higher cleaning efficiency compared to traditional manual cleaning. Furthermore, during the cleaning operation, the temperature of the vapor deposition chamber 1 does not need to drop excessively, and the heating time for subsequent vapor deposition operations is shorter. This reduces downtime of the panel vapor deposition device during the cleaning process, further improving operational efficiency.

[0042] Specifically, the cleaning mechanism 2 is driven by the second drive assembly 32 to approach and clean the vapor deposition crucible 4. The support frame 21 extends along the length of the vapor deposition crucible 4, allowing the cleaning assembly 22 to clean various positions along the length of the crucible 4 when it moves along the length of the support frame 21 under the drive of the first drive assembly 31. Furthermore, the second drive assembly 32 drives the support frame 21 to rotate around a first axis 33 perpendicular to the top surface of the vapor deposition crucible 4, enabling the cleaning assembly 22 located on the support frame 21 to move to any position on the top surface of the vapor deposition crucible 4, thereby achieving cleaning of the entire top surface of the crucible 4 and ensuring thorough cleaning.

[0043] In one embodiment, such as Figure 4As shown, the first drive assembly 31 includes a first drive member (not shown), a rotating shaft 311, and multiple chain plates 312 surrounding the outside of the rotating shaft 311. The first drive member is connected to the rotating shaft 311 in a transmission manner, and drives the rotating shaft 311 to rotate along its axis to wind up or unwind the chain plates 312. The support frame 21 is provided with a drive cavity 211 for mounting the first drive assembly 31 and a cleaning cavity 212 for the cleaning assembly 22 to move in. The drive cavity 211 is connected to the cleaning cavity 212. The bottom of the cleaning cavity 212 is provided with a cleaning port 213. The cleaning end of the cleaning assembly 22 cleans the top surface of the vapor deposition crucible 4 through the cleaning port 213. The cleaning assembly 22 is mounted on the outermost chain plate 312. The two opposite side walls of the cleaning cavity 212 are provided with sliding grooves 214 for the chain plate 312 to slide. Specifically, the first driving component drives the rotating shaft 311 to rotate to wind up or unwind the chain plate 312, thereby driving the cleaning component 22 installed on the chain plate 312 to move within the cleaning chamber 212 to the position of the vapor deposition crucible 4 that needs to be cleaned. The cleaning end of the cleaning component 22 performs cleaning operations on the vapor deposition crucible 4 through the cleaning port 213.

[0044] Of course, in other embodiments, other structures of the first driving component 31 can also be adopted, such as a cylinder, a hydraulic cylinder, a scissor telescopic structure, etc., to drive the cleaning component 22 to move in the cleaning chamber 212, so that the cleaning component 22 can move to the corresponding position above the vapor deposition crucible 4 and clean the organic material 9 accumulated on the top surface of the vapor deposition crucible 4.

[0045] In one embodiment, the slide groove 214 extends into the drive cavity 211. A guide slope 2141 is provided on the groove wall of the slide groove 214 near the first drive assembly 31, which can guide the chain plate 312, so that the chain plate 312 can enter the slide groove 214 more smoothly, and avoid the chain plate 312 from getting stuck at the end of the slide groove 214 when it enters the slide groove 214 from one end.

[0046] In one embodiment, the cleaning component 22 includes a suction unit 221, a connecting pipe 222, and a suction nozzle 223. The suction unit 221 is mounted on the chain plate 312. The suction nozzle 223 is connected to the suction unit 221 via the connecting pipe 222 and is positioned towards the cleaning port 213. Negative pressure is provided by the suction unit 221 and transmitted to the suction nozzle 223 via the connecting pipe 222, allowing the suction nozzle 223 to remove the organic material 9 accumulated on the top surface of the vapor deposition crucible 4, thus completing the cleaning process. Specifically, in this embodiment, the suction nozzle 223 extends slightly beyond the cleaning port 213, bringing it closer to the top surface of the vapor deposition crucible 4, thereby increasing the suction force of the suction nozzle 223 on the organic material 9 on the top surface of the vapor deposition crucible 4 and improving the cleanliness. Of course, in other embodiments, other cleaning components 22 can also be used, such as cleaning cloths and brushes. The cleaning cloths and brushes are driven by a driving mechanism to move to the top of the vapor deposition crucible 4 and wipe the organic material 9 accumulated on the top surface of the vapor deposition crucible 4. Such a design is also within the protection scope of this utility model.

[0047] In another embodiment, such as Figure 7 As shown, the first drive assembly 31 includes a first drive component, a rotating shaft 311, and multiple chain plates 312. Two rotating shafts 311 are provided, each located at one end of the support frame 21 along its length. The multiple chain plates 312 are connected end-to-end and surround the outer sides of the two rotating shafts 311 to form a track-like structure. Adjacent chain plates 312 are hinged to each other. A cleaning chamber 212 is provided inside the support frame 21. The first drive assembly 31 is installed inside the cleaning chamber 212. A cleaning port 213 is provided at the bottom of the cleaning chamber 212. The cleaning assembly 22 is installed on the chain plate 312 facing the cleaning port 213. The cleaning end of the cleaning assembly 22 cleans the top surface of the vapor deposition crucible 4 through the cleaning port 213. Specifically, the track-like transmission structure of the first drive assembly 31 drives the cleaning assembly 22 to reciprocate within the cleaning chamber 212, thereby achieving targeted cleaning of the organic material 9 accumulated on the top surface of the vapor deposition crucible 4. Furthermore, the tracked structure allows for the control of the angle at which the first drive component drives the rotating shaft 311 to rotate, thereby determining the distance the cleaning component 22 can move, making operation simple and convenient.

[0048] In actual operation, in order to prevent slippage between the chain plate 312 and the shaft 311, an anti-slip protrusion (not shown) can be provided on the shaft 311, and an anti-slip groove (not shown) can be provided on the chain plate 312 corresponding to the anti-slip protrusion. The anti-slip protrusion and the anti-slip groove are inserted and matched to achieve anti-slip, ensuring the driving stability and accuracy of the shaft 311 on the chain plate 312.

[0049] In one embodiment, the second driving assembly 32 includes a telescopic cylinder 321 and a rotary motor 322. The telescopic cylinder 321 is driven by the support frame 21 to move the support frame 21 closer to or further away from the top surface of the vapor deposition crucible 4. The rotary motor 322 is driven by the telescopic cylinder 321 to drive the telescopic cylinder 321 to rotate around the first axis 33. Specifically, the support frame 21 is positioned above the vapor deposition crucible 4. During cleaning, the telescopic cylinder 321 drives the support frame 21 to descend closer to the top surface of the vapor deposition crucible 4, so that the top surface of the vapor deposition crucible 4 is within the cleaning range of the cleaning assembly 22, allowing the cleaning assembly 22 to clean the vapor deposition crucible 4. Furthermore, the rotary motor 322 drives the telescopic cylinder 321 to rotate, thereby causing the support frame 21 connected to the telescopic cylinder 321 to rotate. This allows the cleaning assembly 22, located on the support frame 21, to move relative to any position on the top surface of the vapor deposition crucible 4, thereby achieving cleaning of the entire top surface of the vapor deposition crucible 4 and ensuring thorough cleaning.

[0050] In one embodiment, the rotary motor 322 is connected to the telescopic cylinder 321 via a reversing connector 323, such that the axis of rotation of the rotary motor 322 is angled to the axis of transmission of the telescopic cylinder 321, thereby reducing the overall height of the equipment. Specifically, the reversing connector 323 is a vertical reversing device, and the rotary motor 322 is placed horizontally with its rotation axis parallel to the horizontal direction, which improves the stability of the rotary motor 322 during installation and operation. In this embodiment, by using the reversing connector 323, the transmission design becomes more flexible, saving overall space and reducing the overall size of the equipment.

[0051] In one embodiment, multiple vapor deposition crucibles 4 are arranged in a rectangular pattern. A cleaning mechanism 2 and a driving mechanism are connected to form a cleaning drive group. Two cleaning drive groups are provided, each positioned on one side of the vapor deposition crucible 4 along its width. Two second driving components 32 are positioned diagonally opposite each other along the vapor deposition crucible 4. In actual operation, the vapor deposition chamber 1 typically adopts a narrow and long design, thus limiting the range of rotation of the support frame 21 within the vapor deposition chamber 1 and preventing complete coverage of the top surface of all the vapor deposition crucibles 4. Therefore, as... Figure 8 As shown, by setting two sets of cleaning drive groups and driving them in a cross manner, the top surface of all vapor deposition crucibles 4 can be completely covered, ensuring effective cleaning of all vapor deposition crucibles 4.

[0052] In one embodiment, the top of the vapor deposition chamber 1 is provided with a cover plate 7 for sealing the vapor deposition chamber 1. The cover plate 7 is closable to allow the cleaning mechanism 2 to extend into the vapor deposition chamber 1. Thus, during the vapor deposition operation, the cleaning mechanism 2 can be moved outside the vapor deposition chamber 1. After the vapor deposition is stopped, the cover plate 7 can be opened to allow the cleaning mechanism 2 to extend into the vapor deposition chamber 1 for cleaning operations. This reduces the damage caused to the cleaning mechanism 2 by the vapor deposition operation and helps to improve the service life of the cleaning mechanism 2.

[0053] In one embodiment, the cover plate 7 includes a fixed plate 71, a movable plate 72, and a second driving member 73. The fixed plate 71 has a telescopic groove 711, and the movable plate 72 is movably disposed within the telescopic groove 711. The second driving member 73 is disposed within the telescopic groove 711 and is connected to the movable plate 72 for transmission, thereby driving the movable plate 72 to move within the telescopic groove 711. Specifically, during cleaning operations, the second driving member 73 drives the movable plate 72 to retract towards the inside of the telescopic groove 711 to open the vapor deposition chamber 1, allowing the support frame 21 to enter the vapor deposition chamber 1 from the retracted and opened position of the movable plate 72 to perform cleaning operations on the vapor deposition crucible 4 located within the vapor deposition chamber 1. Further, two sets of movable plates 72 and second driving members 73 are correspondingly provided and respectively disposed on both sides of the fixed plate 71, so that the cover plate 7 can be opened and closed from both sides, allowing two sets of cleaning driving groups to enter the vapor deposition chamber 1 from both sides to perform cleaning operations.

[0054] In actual operation, the cover plate 7 is a transparent cover plate 7, which makes it convenient for operators to observe the accumulation of organic material 9 on the top surface of the vapor deposition crucible 4 in the vapor deposition chamber 1 through the cover plate 7, so as to determine whether cleaning is required.

[0055] In one embodiment, the panel vapor deposition apparatus further includes an industrial camera 8, which is positioned above the vapor deposition chamber 1. The top surface of the vapor deposition crucible 4 is within the shooting range of the industrial camera 8. The industrial camera 8 is connected to the cleaning mechanism 2 and the drive mechanism via an external controller (not shown), and can be connected electrically or by signal depending on the actual operation. Specifically, the industrial camera 8 captures and analyzes images of the top surface of the vapor deposition crucible 4. When the image shows that the organic material 9 accumulated on the top surface of the vapor deposition crucible 4 has reached a certain level, the information is fed back to the external controller. The external controller stops the vapor deposition operation and waits for a certain safe time (the operator can set a fixed time according to the actual situation). Then, it controls the cleaning mechanism 2 and the drive mechanism to start and clean the vapor deposition crucible 4, thus automating the entire cleaning operation. This eliminates the need for manual monitoring and judgment of the cleaning timing, making cleaning more timely and helping to ensure the quality of vapor deposition.

[0056] Furthermore, the second drive unit 73 can also be connected to an external controller. When the industrial camera 8 detects that a cleaning operation is required, the external controller controls the second drive unit 73 to start, driving the movable plate 72 to retract toward the telescopic groove 711 to open the vapor deposition chamber 1, thereby allowing the cleaning mechanism to extend into the vapor deposition chamber 1 and perform cleaning operations on the vapor deposition crucible 4 located in the vapor deposition chamber.

[0057] Although embodiments of the present invention have been described above with reference to the accompanying drawings, the present invention is not limited to the above embodiments, but can be made in various forms, and those skilled in the art will understand that the present invention can be implemented in other specific forms without changing the technical spirit or essential characteristics of the present invention. Therefore, it should be understood that the above embodiments are exemplary in all respects and not restrictive.

Claims

1. A panel evaporation apparatus characterized by comprising: include: A vapor deposition chamber is provided with a vapor deposition crucible and a panel conveyor line located above the vapor deposition crucible for conveying the panel. The top of the vapor deposition crucible is provided with multiple vapor deposition nozzles facing the panel conveyor line. A cleaning mechanism, comprising a support frame and a cleaning component movably mounted on the support frame, wherein the length of the support frame extends along the length of the vapor deposition crucible; The driving mechanism includes a first driving component and a second driving component. The first driving component is disposed on the support frame and is drivenly connected to the cleaning component to drive the cleaning component to reciprocate along the length direction of the support frame. The second driving component is drivenly connected to the support frame to drive the support frame to move closer to or away from the top surface of the vapor deposition crucible and to rotate about a first axis, the first axis being perpendicular to the top surface of the vapor deposition crucible.

2. The panel evaporation apparatus according to claim 1, characterized by, The first drive assembly includes a first drive member, a rotating shaft, and a plurality of chain plates surrounding the outside of the rotating shaft. Two adjacent chain plates are hinged to each other. The first drive member is driven to the rotating shaft. The first drive member drives the rotating shaft to rotate along its axis to wind up or unwind the chain plates. The support frame has a drive cavity for mounting the first drive assembly and a cleaning cavity for the cleaning assembly to move within it. The drive cavity is connected to the cleaning cavity. The bottom of the cleaning cavity has a cleaning port. The cleaning end of the cleaning assembly cleans the top surface of the vapor deposition crucible through the cleaning port. The cleaning assembly is mounted on the last chain plate. The inner sidewall of the cleaning cavity has a sliding groove for the chain plate to slide.

3. The panel evaporation apparatus according to claim 2, characterized by, The chute extends into the drive cavity, and a guide slope is provided on the chute wall near the end of the first drive assembly.

4. The panel evaporation apparatus according to claim 2, characterized by, The cleaning assembly includes a suction unit, a connecting tube, and a suction nozzle. The suction unit is mounted on the chain plate, and the suction nozzle is connected to the suction unit through the connecting tube, with the suction nozzle facing the cleaning port.

5. The panel evaporation apparatus according to claim 1, characterized by, The first drive assembly includes a first drive member, a rotating shaft, and multiple chain plates. There are two rotating shafts, which are respectively located at both ends of the support frame along its length. The multiple chain plates are connected end to end and surround the outside of the two rotating shafts. Adjacent chain plates are hinged to each other. The support frame has a cleaning chamber, the first drive assembly is installed in the cleaning chamber, the bottom of the cleaning chamber has a cleaning port, the cleaning assembly is installed on the chain plate facing the cleaning port, and the cleaning end of the cleaning assembly cleans the top surface of the vapor deposition crucible through the cleaning port.

6. The panel evaporation apparatus according to any one of claims 1 to 5, characterized by, The second drive assembly includes a telescopic cylinder and a rotary motor. The telescopic cylinder is driven by the support frame to drive the support frame to move closer to or away from the top surface of the vapor deposition crucible. The rotary motor is driven by the telescopic cylinder to drive the telescopic cylinder to rotate around the first axis.

7. The panel evaporation apparatus according to any one of claims 1 to 5, characterized by, Multiple vapor deposition crucibles are provided, and the multiple vapor deposition crucibles are arranged in a rectangular pattern. The cleaning mechanism and the driving mechanism are connected to form a cleaning driving group. There are two cleaning driving groups, which are respectively located on both sides of the vapor deposition crucible along its width direction, and the two second driving components are respectively located along the diagonal of the vapor deposition crucible.

8. The panel vapor deposition apparatus according to any one of claims 1 to 5, characterized in that, The top of the vapor deposition chamber is provided with a cover plate for sealing the vapor deposition chamber, and the cover plate is openable and closable to allow the cleaning mechanism to extend into the vapor deposition chamber.

9. The panel evaporation apparatus according to claim 8, characterized by, The cover plate includes a fixed plate, a movable plate, and a second driving member. The fixed plate has a telescopic groove, and the movable plate is movably disposed in the telescopic groove. The second driving member is disposed in the telescopic groove and is connected to the movable plate in a transmission manner to drive the movable plate to move within the telescopic groove.

10. The panel evaporation apparatus according to any one of claims 1 to 5, characterized by, It also includes an industrial camera, with the top surface of the vapor deposition crucible located within the camera's field of view.

Images