Exhaust pipe and chemical vapor deposition device

CN224633550UActive Publication Date: 2026-08-14LG DISPLAY HIGH-TECH (CHINA) CO LTD
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
Filing Date
2025-08-26
Publication Date
2026-08-14

AI Technical Summary

Technical Problem

[0003]但是,反应材料在排出的过程中,也会部分附着于排气管100'的内管壁,形成膜层,随着化学气相沉积装置的长时间的使用,排气管100'的内管壁上形成的膜层也会越来越厚,直至影响排气的顺畅性

Benefits of technology

[0026]本实用新型的排气管,通过在主管体的外周设置沿螺旋方向盘绕的多个导电线圈,且使多个导电线圈沿主管体的轴向方向间隔排列,从而在导电线圈通入电流时,能够使导电线圈的附近形成磁场,以使得导电线圈沿主管体的轴向方向的两端附近的极性相反,并且,还能够通过调整导电线圈内的电流的流向,来调整导电线圈沿主管体的轴向方向的两端附近的极性,因此,在导电线圈内的电流流向不同时,能够使得导电线圈对沿主管体的轴向方向间隔的第一清洁组件的磁性件施加吸引力或排斥力,以能够带动第一清洁组件整体沿主管体的轴向方向移动,以使得清洁头对主管体的内壁进行自动清洁。在该过程中操作人员只需要将第一清洁组件放置于主管体的远离于化学气相沉积箱的一端处,并使多个导电线圈分别接通于供电电路即可,操作人员无需直接对主管体的内壁进行清洁操作,从而能够避免排气管的清洁过程对操作人员造成伤害。

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Abstract

This utility model discloses an exhaust pipe and a chemical vapor deposition apparatus. The exhaust pipe includes a main pipe body, two conductive coils, and a first cleaning component. The internal space of the main pipe body is used for exhaust. The two conductive coils are wound around the outer periphery of the main pipe body in the same helical direction and are symmetrically arranged with respect to the axis of the main pipe body. The first cleaning component includes a magnetic element and a cleaning head. The magnetic element has opposite polarities at both ends along its length. The cleaning head includes two cleaning heads, which are respectively located at both ends of the magnetic element. The cleaning ends of the cleaning heads can abut against the inner wall of the main pipe body. The first cleaning component can realize the function of automatically cleaning the inner wall of the main pipe body, thereby avoiding injury to the operator during the cleaning process of the exhaust pipe.
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Description

Technical Field

[0001] This utility model relates to the field of display panel manufacturing equipment technology, and in particular to an exhaust pipe and a chemical vapor deposition apparatus. Background Technology

[0002] In the manufacturing process of display panels, chemical vapor deposition equipment is required to perform chemical vapor deposition on the substrate, such as... Figure 1 As shown, specifically, a chemical vapor deposition apparatus typically includes an exhaust pipe 100' and a chemical vapor deposition chamber 200' that are internally connected. After chemical vapor deposition is completed in the reaction chamber 200a' of the chemical vapor deposition chamber 200', the remaining reaction material in the reaction chamber 200a' can be discharged with the air through the exhaust pipe 100'.

[0003] However, during the discharge process, some of the reactant material will also adhere to the inner wall of the exhaust pipe 100', forming a film. With the long-term use of the chemical vapor deposition device, the film formed on the inner wall of the exhaust pipe 100' will become thicker and thicker, until it affects the smoothness of the exhaust.

[0004] In the existing technology, the inner wall of the exhaust pipe 100' is usually cleaned periodically by hand using a cleaning brush. However, during this cleaning process, the film debris particles brushed off are small, which can easily lead to a lot of dust in the environment and cause great harm to the health of the operators. Utility Model Content

[0005] The first objective of this invention is to provide an exhaust pipe that can achieve an automatic cleaning function, thereby avoiding injury to operators during the cleaning process.

[0006] The second objective of this invention is to provide a chemical vapor deposition apparatus that, by using the aforementioned exhaust pipe, enables automatic cleaning of the exhaust pipe.

[0007] To achieve this objective, the present invention adopts the following technical solution:

[0008] In a first aspect, an exhaust pipe is provided, comprising:

[0009] A main tube is used to connect to a chemical vapor deposition chamber, and the internal space of the main tube is used to exhaust air from the reaction chamber of the chemical vapor deposition chamber.

[0010] A plurality of conductive coils are wound helically around the outer periphery of the main body, and the plurality of conductive coils are spaced apart along the axial direction of the main body; and,

[0011] A first cleaning assembly includes a magnetic element and a plurality of cleaning heads. The magnetic element has opposite polarities at both ends along the axial direction of the main tube. The plurality of cleaning heads are disposed on the magnetic element and arranged at intervals along the circumferential direction of the main tube. The cleaning ends of the cleaning heads are located on the outer periphery of the magnetic element and can abut against the inner wall of the main tube.

[0012] As a preferred embodiment of the exhaust pipe, the cleaning head is slidably connected to the magnetic element along the radial direction of the main pipe body. All the cleaning heads are connected to elastic elements. When the elastic elements are not subjected to external forces, the distance between the cleaning end of the cleaning head and the center of the magnetic element is greater than the inner radius of the main pipe body.

[0013] As a preferred embodiment of the exhaust pipe, the ends of all the elastic elements furthest from the cleaning end are directly connected; or...

[0014] The first cleaning component also includes an intermediate fixing structure located at the center of the magnetic element, and the ends of all the elastic elements away from the cleaning end are connected to the intermediate fixing structure.

[0015] As a preferred embodiment of the exhaust pipe, the cleaning head includes a bristle structure, and / or the cleaning head includes a scraper structure.

[0016] As a preferred embodiment of the exhaust pipe, the cleaning head includes a bristle structure and a scraper structure. The scraper structure is provided on at least two opposite sides of the bristle structure along the axial direction of the main body, and the tip of the scraper structure extends outward. Along the length direction of the cleaning head, the end of the bristle structure protrudes beyond the tip.

[0017] As a preferred embodiment of the exhaust pipe, the protrusion height of the end of the brush filament structure protruding from the tip of the blade is h, where 2cm≤h≤4cm.

[0018] As a preferred embodiment of the exhaust pipe, it includes multiple cleaning components, which are arranged at intervals and connected sequentially along the axial direction of the main pipe body;

[0019] All of the cleaning components are the first cleaning component, or at least one of the cleaning components is the second cleaning component. The second cleaning component includes a base and a plurality of cleaning heads. The plurality of cleaning heads are disposed on the base and arranged at intervals along the circumferential direction of the main body. The cleaning ends of the cleaning heads are located on the outer periphery of the base and can abut against the inner wall of the main body.

[0020] As a preferred embodiment of the exhaust pipe, two adjacent cleaning components are connected by a rotation drive that can drive the two cleaning components to rotate relative to each other about the central axis of the main pipe, and / or, in the two adjacent cleaning components, the cleaning head of one is positioned directly opposite the gap between the two adjacent cleaning heads of the other.

[0021] As a preferred embodiment of the exhaust pipe, the outer periphery of the conductive coil is covered with a first insulating layer; and / or,

[0022] The outer periphery of the main body is covered with a second insulating layer, and the conductive coil is disposed outside the second insulating layer; and / or,

[0023] The main body, which is connected to one end of the chemical vapor deposition chamber, may be equipped with a sensor that can detect the relative position of one end of the main body to the first cleaning component.

[0024] In a second aspect, a chemical vapor deposition apparatus is provided, comprising: a chemical vapor deposition chamber and an exhaust pipe as described in the first aspect above, wherein the internal space of the main body of the exhaust pipe is connected to the reaction chamber of the chemical vapor deposition chamber.

[0025] The advantages of this utility model compared to the prior art are:

[0026] This invention relates to an exhaust pipe that utilizes multiple conductive coils spirally wound around the outer circumference of the main pipe body. These coils are spaced apart along the axial direction of the main pipe body. When current flows through the coils, a magnetic field is created near them, causing the polarities of the coils to be opposite at their two ends along the axial direction. Furthermore, the polarity can be adjusted by changing the direction of the current flow within the coils. Therefore, when the current flows in different directions, the coils exert attractive or repulsive forces on the magnetic components of a first cleaning assembly spaced apart along the axial direction of the main pipe body. This causes the first cleaning assembly to move along the axial direction of the main pipe body, allowing the cleaning head to automatically clean the inner wall of the main pipe body. During this process, the operator only needs to place the first cleaning assembly at the end of the main pipe body furthest from the chemical vapor deposition chamber and connect the multiple conductive coils to the power supply circuit. The operator does not need to directly clean the inner wall of the main pipe body, thus avoiding any injury during the exhaust pipe cleaning process.

[0027] Furthermore, by adjusting the direction of the current flow in the conductive coil, the polarity near both ends of the conductive coil along the axial direction of the main body can be adjusted, thereby adjusting the direction of the driving force generated by the magnetic field of the conductive coil on the magnetic component. In this way, not only can the conductive coil drive the first cleaning component to move radially from the end of the main body away from the chemical vapor deposition chamber to the end of the main body connected to the chemical vapor deposition chamber by adjusting the current in the conductive coil, but it can also drive the first cleaning component to move axially from the end of the main body connected to the chemical vapor deposition chamber to the end of the main body away from the chemical vapor deposition chamber, so that the operator can remove the first cleaning component that has completed the cleaning work from the main body.

[0028] Furthermore, since the first cleaning component obtains its driving force from the conductive coil in a non-contact manner, in other words, the first cleaning component does not need to be connected to an external circuit during the entire process of cleaning the inner wall of the main body using the first cleaning component. Therefore, there is no need to connect the first cleaning component with wires, and the problem of wire tangling during the automatic cleaning process can be avoided. Attached Figure Description

[0029] Figure 1 A schematic diagram of a chemical vapor deposition apparatus provided for the prior art.

[0030] Figure 2 This is a schematic diagram of the exhaust pipe structure according to an embodiment of the present utility model.

[0031] Figure 3 for Figure 2 The diagram shows the magnetic field situation of the exhaust pipe.

[0032] Figure 4 This is a three-dimensional structural diagram of the main body and conductive coil of this utility model embodiment.

[0033] Figure 5 This is a cross-sectional view of the exhaust pipe according to an embodiment of the present invention.

[0034] Figure 6 This is a cross-sectional view of the exhaust pipe according to another embodiment of the present invention.

[0035] Figure 7 This is a cross-sectional view of the cleaning head (which includes both a brush bristle structure and a scraper structure) according to an embodiment of the present invention.

[0036] Figure 8 This is a schematic diagram of the main body and multiple cleaning components of an embodiment of the present invention.

[0037] Figure 9 This is a schematic diagram of the chemical vapor deposition apparatus according to an embodiment of the present invention.

[0038] Figure 1 middle:

[0039] 100', Exhaust pipe;

[0040] 200', Chemical Vapor Deposition Chamber; 200a', Reaction Chamber.

[0041] Figures 2 to 8 middle:

[0042] 100. Exhaust pipe;

[0043] 1. Main body; 11. Second insulating layer;

[0044] 2. Conductive coil; 21. First insulating layer;

[0045] 3a. First cleaning component; 3b. Second cleaning component; 31. Magnetic component; 32. Cleaning head; 320. Cleaning end; 323. Brush bristle structure; 324. Scraper structure; 3240. Blade tip; 33. Elastic component; 34. Intermediate fixing structure; 35. Base component;

[0046] 4. Rotation drive component;

[0047] 5. Sensors;

[0048] 200, Chemical Vapor Deposition Chamber; 200a, Reaction Chamber. Detailed Implementation

[0049] The advantages and features of this invention, as well as methods of implementing them, will become apparent from the following detailed description of the embodiments in conjunction with the accompanying drawings. However, this invention is not limited to the embodiments disclosed below, but can be implemented in various different forms. These embodiments are provided merely to complete the disclosure of this invention and to enable those skilled in the art to fully understand its scope, which is defined only by the scope of the claims. The same reference numerals denote the same constituent elements throughout the specification.

[0050] The present invention will now be described in detail with reference to the accompanying drawings.

[0051] like Figures 2 to 4As shown, an exhaust pipe 100 is provided, including a main pipe body 1, a plurality of conductive coils 2, and a first cleaning component 3a. The main pipe body 1 is used to connect to a chemical vapor deposition chamber. The internal space of the main pipe body 1 is used to exhaust the reaction chamber of the chemical vapor deposition chamber. The conductive coils 2 are spirally wound around the outer periphery of the main pipe body 1, and the plurality of conductive coils 2 are spaced apart along the axial direction of the main pipe body 1. The first cleaning component 3a includes a magnetic element 31 and a plurality of cleaning heads 32. The two ends of the magnetic element 31 along the axial direction of the main pipe body 1 have opposite polarities. The plurality of cleaning heads 32 are disposed on the magnetic element 31 and spaced apart along the circumferential direction of the main pipe body 1. The cleaning end 320 of the cleaning head 32 is located on the outer periphery of the magnetic element 31 and can abut against the inner wall of the main pipe body 1.

[0052] By arranging multiple conductive coils 2 spirally around the outer periphery of the main body 1 and spacing them at intervals along the axial direction of the main body 1, a magnetic field can be formed near the conductive coils 2 when current is passed through them. This results in opposite polarities near the two ends of the conductive coils 2 along the axial direction of the main body 1. Furthermore, the polarity near the two ends of the conductive coils 2 along the axial direction of the main body 1 can be adjusted by changing the direction of the current flow within the conductive coils 2. Therefore, when the current flow directions within the conductive coils 2 are different, the conductive coils 2 can apply attractive or repulsive forces to the magnetic components 31 of the first cleaning components 3a spaced at intervals along the axial direction of the main body 1. This allows the first cleaning components 3a to move as a whole along the axial direction of the main body 1, enabling the cleaning head 32 to automatically clean the inner wall of the main body 1.

[0053] It is understood that the description of the relative posture of the first cleaning component 3a and the main body 1 in this utility model, such as "the polarities of the two ends of the magnetic component 31 are opposite along the axial direction of the main body 1", is valid when the first cleaning component 3a is fitted inside the main body 1. After the first cleaning component 3a is removed from the main body 1, the relative posture of the first cleaning component 3a and the main body 1 is not limited by the description in this utility model. In other words, after the first cleaning component 3a is removed from the main body 1, the description of the relative posture of the first cleaning component 3a and the main body 1 in this utility model may or may not be valid.

[0054] Combination Figure 9 As shown, during the cleaning process, the operator only needs to place the first cleaning component 3a at the end of the main body 1 away from the chemical vapor deposition chamber 200 and connect the two conductive coils 2 to the power supply circuit. The operator does not need to directly clean the inner wall of the main body 1, thereby avoiding injury to the operator during the cleaning process of the exhaust pipe 100.

[0055] Furthermore, by adjusting the direction of the current flow in the conductive coil 2, the polarity near both ends of the conductive coil 2 along the axial direction of the main body 1 can be adjusted, thereby adjusting the direction of the driving force generated by the magnetic field generated by the conductive coil 2 on the magnetic component 31. Thus, not only can the conductive coil 2 drive the first cleaning component 3a to move radially from the end of the main body 1 away from the chemical vapor deposition chamber 200 to the end of the main body 1 connected to the chemical vapor deposition chamber 200 by adjusting the current in the conductive coil 2, but it can also drive the first cleaning component 3a to move axially from the end of the main body 1 connected to the chemical vapor deposition chamber 200 to the end of the main body 1 away from the chemical vapor deposition chamber 200, so that the operator can remove the first cleaning component 3a, which has completed the cleaning work, from the main body 1.

[0056] Furthermore, since the first cleaning component 3a obtains its driving force from the conductive coil 2 in a non-contact manner, in other words, during the entire process of cleaning the inner wall of the main tube 1 using the first cleaning component 3a, the first cleaning component 3a does not need to be connected to an external circuit, thus eliminating the need to connect wires to the first cleaning component 3a and avoiding the problem of wire tangling during the automatic cleaning process.

[0057] Among them, the cleaning end 320 of the cleaning head 32 is the end of the cleaning head 32 that extends out of the outer periphery of the magnetic component 31 and is away from the magnetic component 31.

[0058] For example, when using the conductive coil 2 to drive the first cleaning component 3a to move, the conductive coil 2 located downstream of the first cleaning component 3a in the target moving direction can apply an attractive force to the first cleaning component 3a, and / or the conductive coil 2 located upstream of the first cleaning component 3a in the target moving direction can apply a repulsive force to the first cleaning component 3a, and the conductive coil 2 located at least partially on the outer periphery of the first cleaning component 3a can be de-energized, so as to avoid the conductive coil 2 located at least partially on the outer periphery of the first cleaning component 3a generating a magnetic field that hinders the first cleaning component 3a from leaving the conductive coil 2, thereby driving the first cleaning component 3a to move along the target moving direction.

[0059] Combination Figure 2 and Figure 3 The above, Figure 3The magnetic field formed by the conductive coil 2 is illustrated using dashed lines and arrows. It can be seen that the upper half of the magnetic component 31 of the first cleaning assembly 3a is the N pole, and the lower half is the S pole. The magnetic field formed by the conductive coil 2 located on the upper side of the first cleaning assembly 3a causes the area near the lower end of the conductive coil 2 to be an S pole and the area near the upper end to be an N pole, thus exerting an attractive force on the magnetic component 31 of the first cleaning assembly 3a. The magnetic field formed by the conductive coil 2 located on the lower side of the first cleaning assembly 3a causes the area near the upper end of the conductive coil 2 to be an S pole and the area near the lower end to be an N pole, thus exerting a repulsive force on the magnetic component 31 of the first cleaning assembly 3a. This de-energizes at least a portion of the conductive coil 2 located on the outer periphery of the first cleaning assembly 3a, preventing it from generating a magnetic field, thereby enabling the first cleaning assembly 3a to move upwards. Figure 3 The arrows in the diagram indicate the up and down directions. It is understood that these directions only represent the up and down directions in the case shown in the diagram and are not equivalent to the up and down positions of the exhaust pipe 100 in actual use.

[0060] Understandably, when it is necessary to drive the first cleaning component 3a towards... Figure 3 When the lower side moves as shown, the direction of the current in the conductive coil 2 can be changed so that the magnetic field formed by the conductive coil 2 located on the upper side of the first cleaning component 3a makes the area near the lower end of the conductive coil 2 the N pole and the area near the upper end the S pole, so as to apply a repulsive force to the magnetic component 31 of the first cleaning component 3a. The magnetic field formed by the conductive coil 2 located on the lower side of the first cleaning component 3a makes the area near the upper end of the conductive coil 2 the N pole and the area near the lower end the S pole, so as to apply an attractive force to the magnetic component 31 of the first cleaning component 3a. This de-energizes at least part of the conductive coil 2 located on the outer periphery of the first cleaning component 3a and prevents it from generating a magnetic field, thereby enabling the first cleaning component 3a to move downward.

[0061] The outer periphery of the main body 1 may be provided with more conductive coils 2. When the conductive coils 2 are used to drive the first cleaning component 3a to move, multiple conductive coils 2 along the target moving direction of the first cleaning component 3a can be energized sequentially, thereby causing multiple conductive coils 2 located downstream of the first cleaning component 3a along the target moving direction to sequentially apply attractive forces to the first cleaning component 3a, attracting the first cleaning component 3a to move along the target moving direction. Alternatively, multiple conductive coils 2 located upstream of the first cleaning component 3a along the target moving direction can sequentially apply repulsive forces to the first cleaning component 3a, pushing the first cleaning component 3a to move along the target moving direction. By sequentially energizing a plurality of conductive coils 2 along the target moving direction of the first cleaning component 3a, the plurality of conductive coils 2 located downstream of the first cleaning component 3a along the target moving direction sequentially apply attractive forces to the first cleaning component 3a, thereby attracting the first cleaning component 3a to move along the target moving direction. Meanwhile, the plurality of conductive coils 2 located upstream of the first cleaning component 3a along the target moving direction sequentially apply repulsive forces to the first cleaning component 3a. At this time, a de-energized conductive coil 2 is spaced between the conductive coil 2 used to apply repulsive forces to the first cleaning component 3a and the conductive coil 2 used to apply attractive forces to the first cleaning component 3a.

[0062] Optionally, the cleaning head 32 is slidably connected to the magnetic component 31 along the radial direction of the main body 1. All cleaning heads 32 are connected to elastic components 33. When the elastic component 33 is not subjected to external force, the distance between the cleaning end 320 of the cleaning head 32 and the center of the magnetic component 31 is greater than the inner radius of the main body 1. Thus, when the first cleaning component 3a is placed inside the main body 1, the elastic component 33 will be compressed. Under the action of the elastic restoring force of the elastic component 33, the cleaning end 320 of each cleaning head 32 can be more easily and stably kept in a state of pressing against the inner wall of the main body 1, so that the cleaning end 320 of each cleaning head 32 can perform more stable cleaning on the inner wall of the main body 1.

[0063] like Figure 5 As shown, in an optional embodiment, the ends of all elastic elements 33 that are away from the cleaning end 320 are directly connected to each other, that is, the ends of all elastic elements 33 that are away from the connected cleaning head 32 are directly connected, thus making the structure of the first cleaning component 3a simpler.

[0064] like Figure 6As shown, in another optional embodiment, the first cleaning component 3a further includes an intermediate fixing structure 34 located at the center of the magnetic component 31. The ends of all elastic components 33 away from the cleaning end 320 are connected to the intermediate fixing structure 34. That is, the ends of all elastic components 33 away from the connected cleaning head 32 are connected to the intermediate fixing structure 34, so that the position of one end of the elastic component 33 can be fixed by the intermediate fixing structure 34, avoiding the situation where different cleaning heads 32 pull on each other through the elastic components 33.

[0065] Next, with reference to the accompanying drawings, we will introduce the structures of several different cleaning heads 32.

[0066] Please continue reading Figure 5 and Figure 6 In one alternative example, the cleaning head 32 may include a bristle structure 323, thereby adapting the cleaning head 32 to break up and remove loosely structured membrane layers.

[0067] Furthermore, since the bristle structure 323 has a certain degree of elasticity, preferably, the cleaning end of the bristle structure 323 can be interference-fitted to the main body 1, so that the bristle structure 323 can undergo a certain degree of elastic deformation when inside the main body 1, so that the cleaning end of the bristle structure 323 can be kept more stably pressed against the inner wall of the main body 1, thereby enabling the cleaning end of the bristle structure 323 to perform more stable cleaning on the inner wall of the main body 1.

[0068] Please see Figure 7 and Figure 8 In another alternative example, the cleaning head 32 may include a scraper structure 324, thereby adapting the cleaning head 32 to remove denser, more robust, and thicker membrane structures.

[0069] Understandably, when the cleaning head 32 only includes the scraper structure 324, the cleaning head 32 can be connected to the elastic member 33 so that the cleaning head 32 can move relative to the magnetic member 31, thereby allowing the cleaning end of the cleaning head 32 to elastically abut against the inner wall of the main body 1, thereby reducing the possibility that the scraper structure 324 will get stuck in the main body 1.

[0070] Please continue reading Figure 7 and Figure 8 In another optional example, the cleaning head 32 includes a bristle structure 323 and a scraper structure 324, so that the cleaning head 32 can both break up and remove loosely structured membrane layers, and remove denser, more stable, and thicker membrane layers. Figure 7 and Figure 8 The cleaning head 32 shown includes both a bristle structure 323 and a scraper structure 324.

[0071] It is understandable that membrane structures with thinner local thicknesses are generally more loosely structured, while membrane structures with thicker local thicknesses are generally more dense and stable. Therefore, when the cleaning head 32 includes both a bristle structure 323 and a scraper structure 324, optionally, the scraper structure 324 is provided on at least two opposite sides of the bristle structure 323 along the axial direction of the main body 1, and the blade tip 3240 of the scraper structure 324 extends outwards. Along the length of the cleaning head 32, the end of the bristle structure 323 protrudes beyond the blade tip 3240. 240, thus when cleaning a thinner local membrane layer, the brush structure 323 can be used directly to break and remove the membrane layer. When cleaning a thicker local membrane layer, the scraper structure 324 located around the brush structure 323 can be used first to scrape off the thicker part of the membrane layer, leaving the thinner part of the membrane layer. Then, the brush structure 323 can be used to break and remove the remaining thinner part of the membrane layer, so that the cleaning head 32 can effectively remove various membrane layers of different thicknesses.

[0072] In addition, this arrangement can reduce the possibility that the blade structure 324 will collide with the inner wall of the main tube 1 during the movement of the magnetic component 31, which would cause the blade structure 324 to undergo large deformation or damage.

[0073] In other embodiments, at least one side of the bristle structure 323 along the circumferential direction of the main body 1 may also be provided with a scraper structure 324, and the blade tip 3240 of the scraper structure 324 located on at least one side of the bristle structure 323 along the circumferential direction of the main body 1 also extends outward. So when the cleaning head 32 rotates to a certain extent relative to the main body 1 along the circumferential direction of the main body 1, the scraper structure 324 located on the periphery of the bristle structure 323 can first be used to scrape off the thicker part of the film layer, leaving the thinner part of the film layer. Then the bristle structure 323 is used to break and sweep away the remaining thinner film layer, so that the cleaning head 32 can have a better cleaning effect on various film layers of different thicknesses.

[0074] The protrusion height of the end of the brush bristle structure 323 protruding from the tip of the blade 3240 is h. Since the brush bristle structure 323 has a good cleaning effect on film layers with a thickness of 4 cm or less, the larger the height h, the less likely the scraper structure 324 will collide with the inner wall of the main tube 1 during the movement with the magnetic component 31. Based on this, the height h can optionally satisfy: 2 cm ≤ h ≤ 4 cm. For example, the height h can be 2 cm, 2.2 cm, 2.4 cm, 2.5 cm, 2.6 cm, 2.8 cm, 3 cm, 3.2 cm, 3.4 cm, 3.5 cm, 3.6 cm, 3.8 cm or 4 cm, etc.

[0075] like Figure 8As shown, optionally, the exhaust pipe 100 includes multiple cleaning components, which are arranged sequentially and connected sequentially along the axial direction of the main pipe 1. This increases the number of cleaning components, thereby improving the cleaning effect of the cleaning components on the main pipe 1. Furthermore, by having multiple cleaning components restrain each other, it prevents a single cleaning component from flipping over relative to the main pipe 1 to the point where the two ends of the magnetic component 31 are parallel to the radial direction of the main pipe 1, which would cause the driving effect of the conductive coil 2 on the magnetic component 31 to fail. In other words, this arrangement allows all cleaning components to be stably positioned so that all cleaning ends 320 are approximately pointing to the radial sides of the main pipe 1, thus improving the cleaning effect of the cleaning components on the inner wall of the main pipe 1 and the driving effect of the magnetic field generated by the conductive coil 2 on the cleaning components.

[0076] Optionally, all cleaning components may be first cleaning components 3a, or the multiple cleaning components may include at least one first cleaning component 3a and at least one second cleaning component 3b. The second cleaning component 3b includes a base member 35 and multiple cleaning heads 32. The multiple cleaning heads 32 are disposed on the base member 35 and arranged at intervals along the circumferential direction of the main pipe 1. The cleaning ends 320 of the cleaning heads 32 are located on the outer periphery of the base member 35 and can abut against the inner wall of the main pipe 1. Figure 8 The diagram shows that the exhaust pipe 100 includes two cleaning components, one of which is a first cleaning component 3a and the other is a second cleaning component 3b.

[0077] Optionally, two adjacent cleaning components are connected by a rotation drive 4. The rotation drive 4 can drive the two cleaning components to rotate relative to each other around the central axis of the main tube 1. The rotation drive 4 may be, but is not limited to, a rotation motor or a swing motor, so that the cleaning head 32 can clean a larger circumferential range of the inner wall of the main tube 1, thereby improving the cleaning effect of the cleaning components on the inner wall of the main tube 1.

[0078] Preferably, the rotation drive 4 can be a drive with its own power supply, thereby avoiding the problem of wire tangling during the use of the cleaning component.

[0079] In other embodiments, the rotation drive 4 may also be a drive connected with wires.

[0080] Optionally, in two adjacent cleaning components, the cleaning head 32 of one component is positioned directly opposite the gap between two adjacent cleaning heads 32 of the other component. In other words, the cleaning head 32 of one cleaning component can be used to clean areas that cannot be covered by the cleaning range of the cleaning head 32 of the other cleaning component. This allows for a more thorough cleaning effect on various positions along the circumferential direction of the inner wall of the main pipe 1 through the cleaning heads 32 of multiple cleaning components.

[0081] Preferably, two adjacent cleaning components can be connected by a rotating drive 4, and the cleaning head 32 of one of the two adjacent cleaning components can be positioned directly opposite the gap between the two adjacent cleaning heads 32 of the other, so that the cleaning components can better clean various positions of the inner wall of the main tube 1.

[0082] Optionally, two adjacent cleaning components can be hinged together, or connected by an elastic rod (not shown in the figure), so that the two adjacent cleaning components can be flipped relative to each other to a certain extent, so as to avoid multiple cleaning components getting stuck in the main body 1 when there is a certain bending of the inner wall of the main body 1.

[0083] Please see again Figure 6 Optionally, the outer periphery of the conductive coil 2 is covered with a first insulating layer 21, or the outer periphery of the main body 1 is covered with a second insulating layer 11, with the conductive coil 2 located outside the second insulating layer 11. Alternatively, the outer periphery of the conductive coil 2 is covered with the first insulating layer 21 and the outer periphery of the main body 1 is covered with the second insulating layer 11, with the conductive coil 2 located outside the second insulating layer 11. This allows the conductive coil 2 to be insulated from the main body 1, so that when the current flowing through the conductive coil 2 is a high-voltage current, the high-voltage current in the conductive coil 2 can be prevented from affecting the main body 1 and the chemical vapor deposition chamber 200 connected to the main body 1.

[0084] Please see again Figure 8 Optionally, a sensor 5 may be provided at one end of the main body 1. The sensor 5 can detect the relative position between one end of the main body 1 and the first cleaning component 3a. The sensor 5 may be located at the end of the main body 1 that is connected to the chemical vapor deposition chamber 200. Thus, the sensor 5 can detect whether the first cleaning component 3a has moved along the axial direction of the main body 1 to the vicinity of the end of the main body 1 that is connected to the chemical vapor deposition chamber 200. This can trigger a switch that automatically adjusts the current direction in the conductive coil 2, or issue a signal prompting that the switch that needs to be manually operated to adjust the current direction in the conductive coil 2 is required. This allows the magnetic field generated by the conductive coil 2 to be adjusted in a timely manner to control the direction of the first cleaning component 3a, preventing the first cleaning component 3a from moving along the main body 1 into the chemical vapor deposition chamber 200.

[0085] Furthermore, when the first cleaning component 3a moves along the axial direction of the main body 1 to the vicinity of one end of the main body 1 that is connected to the chemical vapor deposition chamber 200, the sensor 5 can also abut against the first cleaning component 3a to prevent the first cleaning component 3a from entering the interior of the chemical vapor deposition chamber 200.

[0086] For example, sensor 5 can be a pressure sensor, so that when the first cleaning component 3a moves to abut against sensor 5, sensor 5 can detect that the first cleaning component 3a is near one end of chemical vapor deposition chamber 200, and can also prevent the first cleaning component 3a from entering the interior of chemical vapor deposition chamber 200 by abutting against sensor 5. Alternatively, sensor 5 can be a distance sensor, so that when the first cleaning component 3a moves to the vicinity of sensor 5, sensor 5 can detect that the first cleaning component 3a is near one end of chemical vapor deposition chamber 200.

[0087] like Figure 9 As shown, a chemical vapor deposition apparatus is also provided, including: a chemical vapor deposition chamber 200 and an exhaust pipe 100 as described in the foregoing technical solution. The internal space of the main body 1 of the exhaust pipe 100 is connected to the reaction chamber 200a of the chemical vapor deposition chamber 200. By using the aforementioned exhaust pipe 100, the automatic cleaning function of the exhaust pipe 100 can be realized.

[0088] Although embodiments of the present invention have been described above with reference to the accompanying drawings, the present invention is not limited to the above embodiments, but can be made in various forms, and those skilled in the art will understand that the present invention can be implemented in other specific forms without changing the technical spirit or essential characteristics of the present invention. Therefore, it should be understood that the above embodiments are exemplary in all respects and not restrictive.

Claims

1. An exhaust pipe characterized by, include: A main tube is used to connect to a chemical vapor deposition chamber, and the internal space of the main tube is used to exhaust air from the reaction chamber of the chemical vapor deposition chamber. A plurality of conductive coils are wound helically around the outer periphery of the main body, and the plurality of conductive coils are spaced apart along the axial direction of the main body; and, A first cleaning assembly includes a magnetic element and a plurality of cleaning heads. The magnetic element has opposite polarities at both ends along the axial direction of the main tube. The plurality of cleaning heads are disposed on the magnetic element and arranged at intervals along the circumferential direction of the main tube. The cleaning ends of the cleaning heads are located on the outer periphery of the magnetic element and can abut against the inner wall of the main tube.

2. The exhaust pipe according to claim 1, characterized by The cleaning head is slidably connected to the magnetic component along the radial direction of the main body. All the cleaning heads are connected to elastic components. When the elastic components are not subjected to external force, the distance between the cleaning end of the cleaning head and the center of the magnetic component is greater than the inner radius of the main body.

3. The exhaust pipe according to claim 2, characterized by All the elastic elements are directly connected at the end furthest from the cleaning end; or... The first cleaning component also includes an intermediate fixing structure located at the center of the magnetic element, and the ends of all the elastic elements away from the cleaning end are connected to the intermediate fixing structure.

4. The exhaust pipe according to any one of claims 1 to 3, characterized by The cleaning head includes a bristle structure, and / or the cleaning head includes a scraper structure.

5. The exhaust pipe according to any one of claims 1 to 3, characterized by The cleaning head includes a bristle structure and a scraper structure. The scraper structure is provided on at least two opposite sides of the bristle structure along the axial direction of the main body, and the tip of the scraper structure extends outward. Along the length of the cleaning head, the end of the bristle structure protrudes beyond the tip.

6. The exhaust pipe according to claim 5, characterized by The protrusion height of the end of the bristle structure beyond the blade tip is h, where 2cm ≤ h ≤ 4cm.

7. The exhaust pipe according to any one of claims 1-3, characterized in that, It includes multiple cleaning components, which are arranged at intervals and connected sequentially along the axial direction of the main body; All of the cleaning components are the first cleaning component, or, among the multiple cleaning components, there is at least one first cleaning component and at least one second cleaning component. The second cleaning component includes a base and multiple cleaning heads. The multiple cleaning heads are disposed on the base and are spaced apart along the circumferential direction of the main body. The cleaning ends of the cleaning heads are located on the outer periphery of the base and can abut against the inner wall of the main body.

8. The exhaust pipe according to claim 7, characterized by Two adjacent cleaning components are connected by a rotation drive that can drive the two cleaning components to rotate relative to each other about the central axis of the main body, and / or, in two adjacent cleaning components, the cleaning head of one is positioned directly opposite the gap between two adjacent cleaning heads of the other.

9. The exhaust pipe according to any one of claims 1 to 3, characterized by The outer periphery of the conductive coil is covered with a first insulating layer; and / or, The outer periphery of the main body is covered with a second insulating layer, and the conductive coil is disposed outside the second insulating layer; and / or, The main body, which is connected to one end of the chemical vapor deposition chamber, may be equipped with a sensor that can detect the relative position of one end of the main body and the cleaning component.

10. A chemical vapor deposition apparatus characterized by comprising: include: A chemical vapor deposition chamber and an exhaust pipe as claimed in any one of claims 1 to 9, the pipe inner space of the main pipe body of the exhaust pipe being in communication with a reaction chamber of the chemical vapor deposition chamber.