A vacuum pipeline gas distribution assembly for a silicon carbide deposition furnace

CN224633551UActive Publication Date: 2026-08-14SHANXI ZHONGDIAN NEW ENERGY TECH CO LTD
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
Filing Date
2025-09-11
Publication Date
2026-08-14

AI Technical Summary

Technical Problem

[0004]本实用新型克服了现有技术的不足,提出一种碳化硅沉积炉用真空管路分气组件,以保障碳化硅沉积炉沉积过程中炉体内气体可以被均匀的从各管路中顺利抽出;解决碳化硅沉积炉在抽真空过程中气体流量不一致,以及管路过热导致的真空泵工作效率降低的问题

Benefits of technology

1、本实用新型采用分段式冷却水套,分别对进气管及五通管道进行冷却,管拼接的焊缝暴露至外部,便于及时发现漏点、漏气等问题,维修难度降低。

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Abstract

This utility model discloses a vacuum pipeline gas distribution assembly for a silicon carbide deposition furnace, relating to the field of high-temperature industrial electric furnace technology. It includes a pipe and a perforated plate. Multiple inlet pipes are uniformly connected to one side of the pipe along its axial direction, and an extraction pipe is connected to the other side of the pipe. A perforated plate is installed inside the pipe, with small holes uniformly distributed on its surface. The perforated plate is positioned along the axial direction of the pipe, between the inlet pipes and the extraction pipes. The inlet pipes are connected to and communicate with the furnace wall of the silicon carbide deposition furnace. The extraction pipe is connected to a vacuum pipeline, the other end of which is connected to a vacuum pump assembly. This utility model ensures that the gas inside the furnace can be uniformly and smoothly extracted from each pipeline during the silicon carbide deposition process. It solves the problems of inconsistent gas flow during vacuuming of the silicon carbide deposition furnace and reduced vacuum pump efficiency due to pipeline overheating.
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Description

Technical Field

[0001] This utility model relates to the field of high-temperature industrial electric furnace technology, specifically a vacuum pipeline gas distribution component for a silicon carbide deposition furnace. Background Technology

[0002] During the processing of materials in a silicon carbide deposition furnace, vacuum pumps are required for evacuation. Process gases need to be extracted and introduced during deposition. Therefore, the efficiency and safety of the vacuum process significantly impacts the equipment and the overall process outcome. The uniform extraction of gas from the furnace cavity is a key factor in determining the vacuum efficiency of the deposition furnace.

[0003] However, current silicon carbide deposition furnaces all operate by directly connecting to vacuum pumps. This leads to uneven gas flow during the vacuuming process, making it impossible to guarantee the consistency of gas flow at various locations in a large silicon carbide deposition furnace. Furthermore, since conventional silicon carbide deposition furnaces are very large and the vacuuming process is lengthy, it can cause overheating of pipelines and other components. During the deposition process, highly corrosive gases in the overheated environment can corrode the vacuum pump, further reducing its efficiency. Utility Model Content

[0004] This invention overcomes the shortcomings of the prior art by proposing a vacuum pipeline gas distribution component for a silicon carbide deposition furnace, which ensures that the gas inside the furnace can be uniformly and smoothly extracted from each pipeline during the deposition process of the silicon carbide deposition furnace; and solves the problems of inconsistent gas flow during the vacuuming process of the silicon carbide deposition furnace and the reduced working efficiency of the vacuum pump caused by pipeline overheating.

[0005] To achieve the above objectives, this utility model is implemented through the following technical solution: A vacuum pipeline gas distribution assembly for a silicon carbide deposition furnace includes a pipe and a perforated plate. Multiple inlet pipes are uniformly connected to one side of the pipe along its axial direction, and an extraction pipe is connected to the other side of the pipe. The perforated plate is disposed inside the pipe, with small holes uniformly distributed on its surface. The perforated plate is positioned along the axial direction of the pipe, between the inlet pipes and the extraction pipes. The inlet pipes are connected to and communicate with the furnace wall of the silicon carbide deposition furnace. The extraction pipe is connected to a vacuum pipeline, and the other end of the vacuum pipeline is connected to a vacuum pump unit.

[0006] Furthermore, the axis of the perforated plate coincides with the axis of the pipe.

[0007] Furthermore, a blind plate is connected to each end of the perforated plate, and the perforated plate is fixed to the clamps extending inward from the blind plates at both ends; a second stainless steel fixing flange with a groove is connected to each end of the pipe, and the blind plate is connected and fixed to the second stainless steel fixing flange on the same side.

[0008] Furthermore, an O-ring rubber sealing strip is provided between the blind flange and the second stainless steel fixed flange.

[0009] Furthermore, an exhaust flange with a groove is connected to the inlet of the air inlet, and a first stainless steel fixed flange is connected to the outlet of the exhaust pipe. The air inlet is connected to the silicon carbide deposition furnace through the exhaust flange; the exhaust pipe is connected to the vacuum pipeline through the first stainless steel fixed flange.

[0010] Furthermore, a vacuum valve is connected to the vacuum line.

[0011] Furthermore, a first water-cooling component is installed on the outer wall of the pipe, and a second water-cooling component is installed on the outer wall of the air intake pipe.

[0012] Furthermore, the first water-cooling component includes a water-cooling baffle, a water-cooling sleeve, and a water-cooling ring; the water-cooling baffle is disposed on the pipe; a water-cooling ring is uniformly welded on the water-cooling baffle, and the water-cooling ring is welded together with the water-cooling sleeve, and the water-cooling baffle, water-cooling sleeve, and water-cooling ring are connected.

[0013] Furthermore, the second water-cooling assembly includes an intake water-cooling sleeve and an intake water-cooling ring that are connected to each other; the intake water-cooling sleeve and the intake water-cooling ring are welded together and welded to the outside of the intake pipe.

[0014] The beneficial effects of this utility model compared to the prior art are as follows: 1. This utility model adopts a segmented cooling water jacket to cool the air intake pipe and the five-way pipe separately. The weld seam of the pipe splicing is exposed to the outside, which makes it easy to detect leaks and other problems in time, and reduces the difficulty of maintenance.

[0015] 2. This utility model uses a stainless steel perforated plate. During the vacuum pump operation, the dense and evenly distributed small holes allow the airflow to pass through evenly, keeping the airflow in the five air inlet pipes consistent, thereby reducing the vacuum level in the furnace more efficiently and safely.

[0016] 3. This utility model uses a two-end clamping method to fix the stainless steel perforated plate. The stainless steel perforated plate is fixed on the clamps extending from the blind plates at both ends, which facilitates disassembly, cleaning, maintenance and replacement.

[0017] 4. This utility model can significantly reduce the temperature of the hot gas flow, reduce the corrosive effect of highly corrosive gas components on the vacuum pump during the deposition process, and better protect the vacuum valve and vacuum pump.

[0018] 5. This utility model has a reasonable structure, is simple and reliable, and can meet the requirements of vacuum treatment during the deposition process of silicon carbide deposition furnace. It has high reliability and good working stability. Attached Figure Description

[0019] Figure 1A schematic diagram of a gas filter assembly for a silicon carbide deposition furnace; Figure 2 A schematic cross-sectional view of a gas filter assembly for a silicon carbide deposition furnace; Figure 3 This is a schematic diagram of a stainless steel perforated plate. Figure 4 This is a schematic diagram of the components of a silicon carbide deposition furnace.

[0020] In the picture: 1 is a five-way pipe, 2 is a stainless steel perforated plate, 3 is an air inlet pipe, 4 is an exhaust flange, 5 is an air inlet water-cooled sleeve, 6 is an air inlet water-cooled collar, 7 is a water-cooled baffle, 8 is a water-cooled sleeve, 9 is a water-cooled collar, 10 is a blind flange, 11 is a first stainless steel fixed flange, 12 is an exhaust pipe, 13 is a second stainless steel fixed flange, 14 is a silicon carbide deposition furnace, 15 is a vacuum pipeline, 16 is a vacuum valve, and 17 is a vacuum pump set. Detailed Implementation

[0021] To make the technical problem to be solved, the technical solution, and the beneficial effects of this utility model clearer, this utility model will be further described in detail with reference to the embodiments and accompanying drawings. It should be understood that the specific embodiments described herein are merely illustrative of this utility model and are not intended to limit it. The technical solution of this utility model will be described in detail below with reference to the embodiments and accompanying drawings, but the scope of protection is not limited thereto.

[0022] See Figures 1 to 4 This embodiment proposes a vacuum pipeline gas distribution assembly for a silicon carbide deposition furnace, including a five-way pipe 1, a stainless steel perforated plate 2, an inlet pipe 3, an exhaust flange 4, an inlet water-cooled sleeve 5, an inlet water-cooled collar 6, a water-cooled baffle 7, a water-cooled sleeve 8, a water-cooled collar 9, a blind flange 10, a first stainless steel fixed flange 11, an extraction pipe 12, and a second stainless steel fixed flange 13.

[0023] Five air inlet pipes 3 are evenly connected to one side of the five-way pipe 1 along its axial direction, and two air extraction pipes 12 are connected to the other side of the five-way pipe 1. A stainless steel perforated plate 2 is installed inside the five-way pipe 1, arranged along its axial direction. A blind flange 10 is connected to each end of the stainless steel perforated plate 2, and the stainless steel perforated plate 2 is fixed to the clamps extending inward from the blind flanges 10 at both ends. A second stainless steel fixing flange 13 with a groove is connected to each end of the five-way pipe 1, and the blind flange 10 is connected and fixed to the second stainless steel fixing flange 13 on the same side. Furthermore, an O-ring rubber sealing strip is provided between the blind flange 10 and the second stainless steel fixing flange 13 for sealing between the blind flange 10 and the five-way pipe 1.

[0024] The stainless steel perforated plate 2 is located between the air inlet pipe 3 and the air extraction pipe 12, and is installed at the center of the five-way pipe 1. The axis of the stainless steel perforated plate 2 coincides with the axis of the five-way pipe 1. Small holes are evenly distributed on the surface of the stainless steel perforated plate 2 to disperse the airflow.

[0025] The inlet pipe 3 is connected to the exhaust flange 4 with a groove, and the outlet of the extraction pipe 12 is connected to the first stainless steel fixed flange 11. The five inlet pipes 3 are connected to the furnace wall of the silicon carbide deposition furnace 14 through the exhaust flange 4 and are connected to the silicon carbide deposition furnace 14. The two extraction pipes 12 are connected to the vacuum pipeline 15 through the first stainless steel fixed flange 11. The other end of the vacuum pipeline 15 is connected to the vacuum pump group 17. A vacuum valve 16 is connected to the vacuum pipeline 15. During the vacuuming stage of the silicon carbide deposition furnace 14, the vacuum valve 16 is opened and the vacuum pump group 17 is started. The airflow enters the five-way pipe 1 from the silicon carbide deposition furnace 14 through the five air inlet pipes 3, passes through the stainless steel perforated plate 2 and enters the exhaust pipe 12, and is evenly extracted from the exhaust pipe 12; and then converges into the vacuum pipeline 15 and is discharged.

[0026] The vacuum pipeline gas distribution assembly has a simple and reliable structure and reasonable installation and debugging. It disperses the unstable airflow during the vacuuming process of the silicon carbide deposition furnace, ensuring uniform airflow and improving the vacuuming efficiency of the equipment.

[0027] During the vacuuming process, the temperature of the five-way pipe 1 and the air inlet pipe 3 will rise. Therefore, a first water-cooling component is installed on the outer wall of the five-way pipe 1, and a second water-cooling component is installed on the outer wall of the five air inlet pipes 3.

[0028] Specifically, the first water-cooling component includes a water-cooling baffle 7, a water-cooling sleeve 8, and a water-cooling ring 9; the water-cooling baffle 7 is disposed on the five-way pipe 1; the water-cooling ring 9 is uniformly welded on the water-cooling baffle 7, and the water-cooling ring 9 is welded together with the water-cooling sleeve 8. The water-cooling baffle 7, the water-cooling sleeve 8, and the water-cooling ring 9 are connected. During operation, water flows through the water-cooling baffle 7, the water-cooling sleeve 8, and the water-cooling ring 9 for cooling during air extraction.

[0029] Specifically, the second water-cooling assembly includes an intake water-cooling sleeve 5 and an intake water-cooling ring 6; the intake water-cooling sleeve 5 and the intake water-cooling ring 6 are welded together and welded to the outside of the five-way pipe-intake pipe 3. During operation, water flows through the intake water-cooling sleeve 5 and the intake water-cooling ring 6 for cooling during air intake.

[0030] By incorporating a first water-cooling component and a second water-cooling component, the safety of the vacuum system is improved, and the deposition time can be effectively extended, thereby increasing the coating thickness.

[0031] The present invention uses a vacuum pipeline gas distribution assembly between the silicon carbide deposition furnace 14 and the vacuum pump group 17 to enable the pump to operate healthily and stably for a long time, which is also a necessary guarantee for the efficient deposition of silicon carbide in the deposition furnace.

[0032] The above description is a further detailed explanation of the present invention in conjunction with specific preferred embodiments. It should not be considered that the specific embodiments of the present invention are limited to this. For those skilled in the art, several simple deductions or substitutions can be made without departing from the present invention, and all such deductions or substitutions should be considered to fall within the scope of patent protection determined by the submitted claims.

Claims

1. A vacuum pipeline gas distribution assembly for a silicon carbide deposition furnace, characterized in that, It includes a pipe and a perforated plate. Multiple air inlet pipes (3) are uniformly connected along the axial direction on one side of the pipe, and an air extraction pipe (12) is connected to the other side of the pipe. A perforated plate is installed inside the pipe, and small holes are uniformly opened on the perforated plate. The perforated plate is arranged along the axial direction of the pipe and is located between the air inlet pipe (3) and the air extraction pipe (12). The air inlet pipe (3) is connected to the furnace wall of the silicon carbide deposition furnace (14) and is connected to the silicon carbide deposition furnace (14). The air extraction pipe (12) is connected to the vacuum pipeline (15), and the other end of the vacuum pipeline (15) is connected to the vacuum pump group (17).

2. The vacuum line gas distribution assembly for a silicon carbide deposition reactor of claim 1, wherein, The axis of the perforated plate coincides with the axis of the pipe.

3. The vacuum line gas distribution assembly for a silicon carbide deposition reactor of claim 1, wherein, A blind plate (10) is connected to each end of the perforated plate. The perforated plate is fixed to the clamps extending inward from the blind plates (10) at both ends. A second stainless steel fixing flange (13) with a groove is connected to each end of the pipe. The blind plate (10) is connected and fixed to the second stainless steel fixing flange (13) on the same side.

4. The vacuum line gas distribution assembly for a silicon carbide deposition reactor of claim 3, wherein, An O-ring rubber sealing strip is provided between the blind flange (10) and the second stainless steel fixed flange (13).

5. The vacuum line gas distribution assembly for a silicon carbide deposition reactor of claim 1, wherein, The inlet pipe (3) is connected to an exhaust flange (4) with a groove, and the outlet of the extraction pipe (12) is connected to a first stainless steel fixed flange (11). The inlet pipe (3) is connected to the silicon carbide deposition furnace (14) through the exhaust flange (4); the extraction pipe (12) is connected to the vacuum pipeline (15) through the first stainless steel fixed flange (11).

6. The vacuum line gas distribution assembly for a silicon carbide deposition reactor of claim 1 or 5, wherein, A vacuum valve (16) is connected to the vacuum line (15).

7. The vacuum line gas distribution assembly for a silicon carbide deposition reactor of claim 1, wherein, A first water-cooling component is provided on the outer wall of the pipe, and a second water-cooling component is provided on the outer wall of the air inlet pipe (3).

8. The vacuum line gas distribution assembly for a silicon carbide deposition reactor of claim 7, wherein, The first water-cooling component includes a water-cooling baffle (7), a water-cooling sleeve (8), and a water-cooling ring (9); the water-cooling baffle (7) is disposed on the pipe; a water-cooling ring (9) is uniformly welded on the water-cooling baffle (7), and the water-cooling ring (9) is welded together with the water-cooling sleeve (8), and the water-cooling baffle (7), the water-cooling sleeve (8), and the water-cooling ring (9) are connected.

9. The vacuum line gas distribution assembly for a silicon carbide deposition reactor of claim 7, wherein, The second water-cooling assembly includes an inlet water-cooling sleeve (5) and an inlet water-cooling ring (6) that are connected together; the inlet water-cooling sleeve (5) and the inlet water-cooling ring (6) are welded together and welded to the outside of the inlet pipe (3).