Electrode self-cleaning device and residual chlorine monitoring device for water quality monitoring sensors
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2025-09-10
- Publication Date
- 2026-08-14
AI Technical Summary
[0010]本实用新型的目的在于克服现有技术存在的上述不足,提供一种用于水质监测传感器的电极自清洁装置及余氯监测装置,采用本实用新型的技术方案,利用采样水流可驱动螺旋叶轮旋转和轴向移动,结构更加简单,易于实施,并且在采样水流速度降低时清洁件能够远离电极表面,对检测过程无干扰;清洁时仅需增大采样水流动能,利用清洁件接触电极表面并旋转刮除表面污染物,从根本上解决了因电极污染导致的测量不准问题,显著延长了有效维护周期
[0026]采用本实用新型提供的技术方案,与已有的公知技术相比,具有如下有益效果:
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Figure CN224636460U_ABST
Abstract
Description
Technical Field
[0001] This utility model relates to the field of water quality analysis instrument technology, and more specifically, to an electrode self-cleaning device and a residual chlorine monitoring device for water quality monitoring sensors, particularly a device that can automatically clean the measuring electrode using the sampling water flow. Background Technology
[0002] In secondary water supply pump stations and water plant process control, online residual chlorine monitors are crucial equipment for ensuring the safety of water supply quality. Currently, the mainstream sensors use the electrode method (constant voltage method), whose core consists of one or more pairs of precious metal (such as gold or platinum) measuring electrodes. In actual long-term operation, the electrode surface undergoes polarization and is inevitably contaminated and deposited by impurities, biofilms, and metal oxides (such as ferric hydroxide) in the water. This leads to reduced electrode surface activity and attenuation of the response signal (such as decreased sensitivity and reading drift), resulting in severely distorted measurement results.
[0003] To address this issue, existing technologies mainly employ the following processing methods and have the following obvious shortcomings:
[0004] 1. Manual on-site calibration and cleaning: This method requires technicians to visit the site periodically (e.g., every 1-2 weeks) to perform calibration using a special calibration solution and manually clean the electrodes with a chemical agent or a soft cloth. This method is labor-intensive, has a slow response time, and frequent manual operations may damage the precision electrodes.
[0005] 2. External Cleaning Device: This method uses an additional motor-driven brush or ultrasonic generator for cleaning. This solution is complex, costly, and energy-intensive. Furthermore, introducing an external power unit increases the failure rate and safety hazards in the humid pump room environment.
[0006] 3. Chemical cleaning: This system integrates a small pump and reagent tank to periodically inject chemical cleaning agents (such as dilute acid). This system is complex, has high operating costs, and poses a risk of secondary contamination during chemical storage and disposal.
[0007] Therefore, there is an urgent need for a low-cost automated cleaning solution that is simple in structure, requires no external power, has a long maintenance cycle, and is safe and reliable, in order to ensure the measurement accuracy and stability of online residual chlorine sensors.
[0008] A search revealed existing technologies that also employ hydrodynamic methods for electrode cleaning, such as the "Hydrodynamic Water Quality Monitoring Electrode Cleaning Device" (published on August 30, 2019) in Chinese Patent Publication No. CN110186978A and the "Residual Chlorine Sensor Accessory and Residual Chlorine Sensor Assembly" (published on July 7, 2023) in Chinese Patent Publication No. CN116399931A. The former utilizes two sets of water flow channels to control the turbine rotation and electrode brush head lifting, requiring adjustment of the water flow through corresponding regulating columns, resulting in a relatively complex structure and manufacturing difficulty. The latter places the cleaning impeller on the outer periphery of the residual chlorine sensor, using water flow to drive the cleaning impeller to rotate, thereby continuously scraping the measuring electrode through the arc structure within the vertical hole of the cleaning impeller. This method can only clean the outer periphery of the electrode and is not suitable for situations where the detection position is the electrode end face. Furthermore, the cleaning impeller surrounding the electrode can easily affect the water flow, interfering with the detection process. Summary of the Invention
[0009] 1. Technical problem to be solved by the utility model
[0010] The purpose of this invention is to overcome the above-mentioned shortcomings of the existing technology and provide an electrode self-cleaning device and a residual chlorine monitoring device for water quality monitoring sensors. The technical solution of this invention utilizes the sampling water flow to drive the spiral impeller to rotate and move axially, resulting in a simpler structure and easier implementation. Furthermore, when the sampling water flow velocity decreases, the cleaning component can move away from the electrode surface without interfering with the detection process. During cleaning, only the kinetic energy of the sampling water flow needs to be increased, and the cleaning component contacts the electrode surface and rotates to scrape off surface contaminants, fundamentally solving the problem of inaccurate measurement caused by electrode contamination and significantly extending the effective maintenance cycle.
[0011] 2. Technical Solution
[0012] To achieve the above objectives, the technical solution provided by this utility model is as follows:
[0013] This utility model discloses an electrode self-cleaning device for a water quality monitoring sensor, comprising:
[0014] A spiral impeller is installed inside the water inlet pipe of the measuring cup of the water quality monitoring sensor, and the spiral impeller is driven to rotate by the sampling water flow;
[0015] A cleaning component, which is fixed on a spiral impeller and is used to form a rotational scraping motion with the electrode surface of the water quality monitoring sensor as the spiral impeller rotates;
[0016] A rotating shaft defines the axis of rotation of a helical impeller, which is movable along the axis of rotation under the action of the sampling water flow to bring the cleaning element into contact with or away from the electrode surface of the water quality monitoring sensor.
[0017] Furthermore, it also includes a rotating shaft bracket, which is fixed to the bottom of the water inlet pipe of the measuring cup. The lower end of the rotating shaft is fixed on the rotating shaft bracket. The center of the spiral impeller is provided with a shaft hole, and the upper end of the rotating shaft is inserted into the shaft hole, so that the spiral impeller can rotate relative to the rotating shaft and move axially.
[0018] Furthermore, it also includes a rotating shaft bracket, which is fixed to the bottom of the water inlet pipe of the measuring cup. The upper end of the rotating shaft is coaxially and fixedly connected to the spiral impeller, and the lower end of the rotating shaft passes through the shaft hole of the rotating shaft bracket, so that the spiral impeller and the rotating shaft can rotate relative to the rotating shaft bracket and move axially.
[0019] Furthermore, the cleaning component is a wiping plate made of a soft, wear-resistant material.
[0020] Furthermore, the cleaning component is made of silicone rubber, polyurethane, or microfiber felt.
[0021] The present invention discloses a residual chlorine monitoring device, comprising a flow channel and a water quality monitoring sensor, wherein the water quality monitoring sensor is a constant voltage residual chlorine electrode sensor, the water quality monitoring sensor is installed in the measuring cup of the flow channel, and the device further comprises the aforementioned electrode self-cleaning device for the water quality monitoring sensor, which is located directly below the electrode of the water quality monitoring sensor.
[0022] Furthermore, the flow channel has a water inlet connected to the water inlet pipe of the measuring cup. The water inlet is connected to the water inlet pipe, and the water inlet pipe is equipped with a flow regulating valve to control the sampling water flow rate in order to control the rotation frequency and cleaning force of the spiral impeller.
[0023] Furthermore, the flow channel has a water outlet, and the water outlet is equipped with a drain solenoid valve, which is used to periodically open the drain solenoid valve to perform periodic electrode cleaning.
[0024] Furthermore, the flow channel has an inlet connected to the water inlet pipe of the measuring cup, and the inlet is connected to the sampling pump. The sampling water flow rate is adjusted by adjusting the output power of the sampling pump.
[0025] 3. Beneficial effects
[0026] Compared with existing known technologies, the technical solution provided by this utility model has the following beneficial effects:
[0027] (1) The electrode self-cleaning device for water quality monitoring sensors of this utility model includes a spiral impeller, a cleaning component and a rotating shaft. The rotating shaft defines the rotation axis of the spiral impeller. The spiral impeller can move and rotate along the rotation axis under the action of the sampling water flow. The sampling water flow can drive the spiral impeller to rotate and move axially. The structure is simpler and easier to implement. When the sampling water flow speed decreases, the cleaning component can move away from the electrode surface and has no interference with the detection process. When cleaning, it is only necessary to increase the kinetic energy of the sampling water flow. The cleaning component contacts the electrode surface and rotates to scrape off the surface contaminants, which fundamentally solves the problem of measurement inaccuracy caused by electrode contamination and significantly extends the effective maintenance cycle.
[0028] (2) The electrode self-cleaning device for water quality monitoring sensors of this utility model has a lower end of the rotating shaft fixed on a rotating shaft support, a shaft hole in the center of the spiral impeller, and the upper end of the rotating shaft inserted into the shaft hole, so that the spiral impeller can rotate relative to the rotating shaft and move axially; or, the lower end of the rotating shaft is fixed on a rotating shaft support, the shaft hole in the center of the spiral impeller, and the upper end of the rotating shaft inserted into the shaft hole, so that the spiral impeller can rotate relative to the rotating shaft and move axially; with the above structural design, the structure is simple, easy to manufacture, and the rotation and axial movement of the spiral impeller are flexible and stable.
[0029] (3) The self-cleaning device for electrodes of the water quality monitoring sensor of this utility model has a cleaning component made of a soft and wear-resistant material, such as silicone rubber, polyurethane or microfiber felt, which is soft, wear-resistant and does not damage the electrodes.
[0030] (4) The residual chlorine monitoring device of this utility model includes a flow channel, a water quality monitoring sensor and the above-mentioned electrode self-cleaning device for the water quality monitoring sensor. The water quality monitoring sensor is installed in the measuring cup of the flow channel, and the electrode self-cleaning device is located directly below the electrode of the water quality monitoring sensor, which ensures the measurement accuracy and stability of the online residual chlorine sensor. It has the advantages of simple structure, no need for external cleaning power, long maintenance cycle, safety and reliability, and low cost.
[0031] (5) The residual chlorine monitoring device of this utility model can control the sampling water flow rate through the flow regulating valve at the inlet and the drain solenoid valve at the outlet. It can adjust the rotation frequency, cleaning force and cleaning cycle of the spiral impeller, effectively keep the electrode surface clean, greatly extend the calibration cycle, and ensure the accuracy and stability of the measurement data; or, the sampling water flow rate can be adjusted by adjusting the output power of the sampling pump. The cleaning control is convenient, no additional control valve is required, and the structure is simpler. Attached Figure Description
[0032] Figure 1 This is a schematic diagram of the installation structure of the electrode self-cleaning device of this utility model (rotational contact state);
[0033] Figure 2 for Figure 1 A magnified schematic diagram of the local structure at point A;
[0034] Figure 3 This is a schematic diagram of the installation structure of the electrode self-cleaning device of this utility model (in a non-cleaning state);
[0035] Figure 4 for Figure 3 A magnified schematic diagram of the local structure at point B;
[0036] Figure 5 This is a three-dimensional structural diagram of the electrode self-cleaning device of this utility model;
[0037] Figure 6 This is a cross-sectional view of the electrode self-cleaning device of this utility model.
[0038] Figure 7 This is a schematic diagram of the residual chlorine monitoring device of this utility model.
[0039] Explanation of the labels in the diagram:
[0040] 1. Spiral impeller; 1a. Shaft hole; 2. Cleaning component; 3. Rotating shaft; 4. Water quality monitoring sensor; 5. Flow channel; 5a. Measuring cup inlet pipe; 6. Rotating shaft bracket; 7. Inlet; 8. Outlet; 9. Air vent valve; 10. Cleaning port; Z. Rotation axis. Detailed Implementation
[0041] To further understand the content of this utility model, a detailed description of this utility model will be provided in conjunction with the accompanying drawings and embodiments.
[0042] [Example 1]
[0043] Combination Figures 1 to 6As shown, the electrode self-cleaning device for a water quality monitoring sensor in this embodiment includes a spiral impeller 1, a cleaning component 2, and a rotating shaft 3. The spiral impeller 1 is disposed inside the water inlet pipe 5a of the measuring cup of the water quality monitoring sensor 4, and is driven to rotate by the sampling water flow. The cleaning component 2 is fixed on the spiral impeller 1 and is used to form a rotational scraping motion with the electrode surface of the water quality monitoring sensor 4 as the spiral impeller 1 rotates. The rotating shaft 3 defines the rotation axis Z of the spiral impeller 1, and the spiral impeller 1 can move along the rotation axis Z under the action of the sampling water flow so that the cleaning component 2 contacts or moves away from the electrode surface of the water quality monitoring sensor 4. When the sampling water flows through the inlet pipe 5a of the measuring cup, it drives the spiral impeller 1 to rotate and move axially, causing the cleaning component 2 to contact the electrode surface of the water quality monitoring sensor 4. The cleaning component 2 then performs a rotating scraping motion on the measuring electrode surface, achieving automatic cleaning. When the sampling water flow returns to its original flow rate (e.g., 20 L / h), the spiral impeller 1 slowly stops rotating and falls to the bottom, settling at the bottom of the inlet pipe 5a of the measuring cup. At this point, the cleaning component 2 leaves the electrode surface of the water quality monitoring sensor 4. The electrode self-cleaning device of this embodiment utilizes the sampling water flow to drive the spiral impeller 1 to rotate and move axially. Its structure is simpler and easier to implement. Furthermore, when the sampling water flow speed decreases, the cleaning component 2 can move away from the electrode surface without interfering with the detection process. Cleaning only requires increasing the kinetic energy of the sampling water flow, allowing the cleaning component 2 to contact the electrode surface and rotate to scrape away surface contaminants. This fundamentally solves the problem of measurement inaccuracies caused by electrode contamination and significantly extends the effective maintenance cycle.
[0044] like Figures 1 to 6 As shown, the electrode self-cleaning device for a water quality monitoring sensor in this embodiment further includes a rotating shaft support 6. The rotating shaft support 6 is fixed to the bottom of the water inlet pipe 5a of the measuring cup. The lower end of the rotating shaft 3 is fixed on the rotating shaft support 6. The center of the spiral impeller 1 is provided with a shaft hole 1a, and the upper end of the rotating shaft 3 is inserted into the shaft hole 1a, so that the spiral impeller 1 can rotate and move axially relative to the rotating shaft 3. Specifically, the diameter of the shaft hole 1a is slightly larger than the diameter of the rotating shaft 3, so that the spiral impeller 1 can flexibly rotate and move axially on the rotating shaft 3. The axial movement stroke of the spiral impeller 1 relative to the rotating shaft 3 is greater than the maximum distance between the cleaning component 2 and the electrode surface of the water quality monitoring sensor 4, so that the spiral impeller 1 remains on the rotating shaft 3 when it is raised to the highest position. The structure is simple, easy to manufacture, and the rotation and axial movement of the spiral impeller 1 are flexible and stable. In this embodiment, the cleaning component 2 is a wiping plate made of soft and wear-resistant material. Specifically, the cleaning component 2 is made of silicone rubber, polyurethane, or microfiber felt, which has the advantages of being soft, wear-resistant, and not damaging the electrode. The aforementioned rotating shaft bracket 6 can be adopted as follows: Figure 5The spoke structure shown is embedded and fixed to the bottom of the measuring cup inlet pipe 5a on its outer periphery, and its center is used to connect to the rotating shaft 3. The center and the outer periphery are connected by several radial connecting plates. The spiral impeller 1 has a central column, and several inclined blades are evenly distributed around the column. It can rotate freely under the drive of water flow. The top of the spiral impeller 1 has a mounting part, and the cleaning component 2 is fixed to the mounting part. The cleaning component 2 can be glued to the top of the spiral impeller 1, or it can be installed on the top of the spiral impeller 1 using a replaceable structure such as Velcro.
[0045] [Example 2]
[0046] The electrode self-cleaning device for water quality monitoring sensors in this embodiment has the same basic structure and working principle as in Embodiment 1, except that:
[0047] In this embodiment, the upper end of the rotating shaft 3 is coaxially and fixedly connected to the helical impeller 1, and the lower end of the rotating shaft 3 passes through the shaft hole of the rotating shaft bracket 6, so that the helical impeller 1 and the rotating shaft 3 can rotate relative to the rotating shaft bracket 6 and move axially. That is, the helical impeller 1 and the rotating shaft 3 are fixed as one unit. When the sampling water flow passes through, the helical impeller 1 and the rotating shaft 3 rotate and move axially together. At this time, the rotating shaft bracket 6 plays a guiding role in the rotation and movement of the rotating shaft 3. With the above structural design, the structure is simple, easy to manufacture, and the rotation and axial movement of the helical impeller 1 are flexible and stable.
[0048] [Example 3]
[0049] This embodiment also discloses a residual chlorine monitoring device. (Refer to...) Figure 1 , Figure 3 and Figure 7 As shown, the residual chlorine monitoring device includes a flow channel 5, a water quality monitoring sensor 4, and an electrode self-cleaning device as described in Embodiment 1 or Embodiment 2. The water quality monitoring sensor 4 is a constant voltage residual chlorine electrode sensor, which is installed inside the measuring cup of the flow channel 5. The electrode self-cleaning device is located directly below the electrode of the water quality monitoring sensor 4, ensuring the measurement accuracy and stability of the online residual chlorine sensor. It has the advantages of simple structure, no need for external cleaning power, long maintenance cycle, safety and reliability, and low cost.
[0050] Furthermore, the flow channel 5 has an inlet 7 connected to the water inlet pipe 5a of the measuring cup. The inlet 7 is connected to the water inlet pipe, which is equipped with a flow regulating valve to control the sampling water flow rate, thereby controlling the rotation frequency and cleaning force of the spiral impeller 1. The flow channel 5 also has an outlet 8, which is equipped with a drain solenoid valve. This drain solenoid valve can be connected to the control unit of the residual chlorine monitoring device to periodically open and perform periodic electrode cleaning. This structure effectively maintains the smoothness of the electrode surface, greatly extends the calibration cycle, and ensures the accuracy and stability of the measurement data.
[0051] In this embodiment, the bottom of the flow channel 5 also has a cleaning port 10, through which the cleaned contaminants can be discharged. The drain valve can be opened periodically for cleaning and sewage discharge. In addition, the top of the flow channel 5 is also provided with an exhaust port, and an exhaust valve 9 is provided on the exhaust port.
[0052] The residual chlorine monitoring device of this embodiment operates as follows:
[0053] When the residual chlorine monitoring device is working normally, sampling water continuously flows into the inlet pipe 5a of the measuring cup. When the water flow reaches a certain velocity, the water flow drives the spiral impeller 1 to rotate slowly. The spiral impeller 1 drives the cleaning component 2 to continuously and slowly scrape the electrode surface, removing newly formed soft dirt. In addition, the control unit of the residual chlorine monitoring device can control the drain solenoid valve to open for one minute every 24 hours. During this period, a large amount of water flows through rapidly, driving the spiral impeller 1 to rotate at high speed, thereby driving the cleaning component 2 to perform a powerful cleaning of the electrode, removing more stubborn deposits.
[0054] [Example 4]
[0055] The residual chlorine monitoring device in this embodiment has the same basic structure and working principle as that in Embodiment 3, except that:
[0056] In this embodiment, the flow channel 5 has an inlet 7 connected to the water inlet pipe 5a of the measuring cup. The inlet 7 is connected to the sampling pump, and the sampling water flow rate is adjusted by regulating the output power of the sampling pump. Unlike embodiment 3, this embodiment directly uses the sampling pump to control the water flow, which is convenient for cleaning and control, eliminates the need for additional control valves, and simplifies the structure.
[0057] The electrode self-cleaning device and residual chlorine monitoring device for water quality monitoring sensors of this utility model have the following beneficial effects:
[0058] 1. Highly efficient self-cleaning and accurate data: Utilizing the power of water flow, it achieves fully automatic and uninterrupted light cleaning and / or periodic powerful cleaning, which can effectively keep the electrode surface clean, greatly extend the calibration cycle, and ensure the accuracy and stability of measurement data.
[0059] 2. Zero additional energy consumption, energy saving and environmental protection: No external motor or power supply is required. It fully utilizes the inherent water flow energy of the system, achieving true "zero energy consumption" cleaning.
[0060] 3. Simple structure and low cost: The entire device consists of only a few mechanical parts, with a very simple structure and extremely low manufacturing cost, making it easy to integrate into new sensors or to modify existing sensors.
[0061] 4. Safe, reliable, and maintenance-free: The purely mechanical structure avoids the risk of electronic component failure in humid environments, ensuring reliable operation and requiring almost no additional maintenance.
[0062] 5. Extend sensor lifespan: Continuous cleaning can prevent contaminants from permanently corroding or adhering to the electrode surface, thereby effectively extending the lifespan of expensive sensor probes.
[0063] The present invention and its embodiments have been described above illustratively. This description is not restrictive, and the figures shown are only one embodiment of the present invention; the actual structure is not limited thereto. Therefore, if those skilled in the art are inspired by this description and design similar structures and embodiments without departing from the spirit of the present invention, such designs should fall within the protection scope of the present invention.
Claims
1. An electrode self-cleaning device for a water quality monitoring sensor, characterized in that: include The spiral impeller (1) is located in the water inlet pipe (5a) of the measuring cup of the water quality monitoring sensor (4) and is driven to rotate by the sampling water flow. Cleaning component (2), which is fixed on the spiral impeller (1) and is used to form a rotating scraping motion with the electrode surface of the water quality monitoring sensor (4) as the spiral impeller (1) rotates; A rotating shaft (3) defines the axis of rotation (Z) of a helical impeller (1), which is capable of moving along the axis of rotation (Z) under the action of the sampling water flow so that the cleaning element (2) contacts or moves away from the electrode surface of the water quality monitoring sensor (4).
2. The electrode self-cleaning device for a water quality monitoring sensor according to claim 1, characterized in that: It also includes a rotating shaft bracket (6), which is fixed to the bottom of the measuring cup water inlet pipe (5a). The lower end of the rotating shaft (3) is fixed on the rotating shaft bracket (6). The center of the spiral impeller (1) is provided with a shaft hole (1a). The upper end of the rotating shaft (3) is inserted into the shaft hole (1a), so that the spiral impeller (1) can rotate relative to the rotating shaft (3) and move axially.
3. The electrode self-cleaning device for a water quality monitoring sensor according to claim 1, characterized in that: It also includes a rotating shaft bracket (6), which is fixed to the bottom of the measuring cup water inlet pipe (5a). The upper end of the rotating shaft (3) is coaxially fixedly connected to the spiral impeller (1), and the lower end of the rotating shaft (3) passes through the shaft hole of the rotating shaft bracket (6), so that the spiral impeller (1) and the rotating shaft (3) can rotate relative to the rotating shaft bracket (6) and move axially.
4. The electrode self-cleaning device for a water quality monitoring sensor according to claim 1, 2, or 3, characterized in that: The cleaning component (2) is a wiping plate made of soft and wear-resistant material.
5. The electrode self-cleaning device for a water quality monitoring sensor according to claim 4, characterized in that: The cleaning component (2) is made of silicone rubber, polyurethane, or microfiber felt.
6. A residual chlorine monitoring device, comprising a flow channel (5) and a water quality monitoring sensor (4), wherein the water quality monitoring sensor (4) is a constant voltage residual chlorine electrode sensor, and the water quality monitoring sensor (4) is installed in a measuring cup of the flow channel (5), characterized in that: It also includes an electrode self-cleaning device for a water quality monitoring sensor as described in any one of claims 1 to 5, the electrode self-cleaning device being located directly below the electrode of the water quality monitoring sensor (4).
7. The residual chlorine monitoring device according to claim 6, characterized in that: The flow channel (5) has an inlet (7) that is connected to the water inlet pipe (5a) of the measuring cup. The inlet (7) is connected to the water inlet pipe, and the water inlet pipe is equipped with a flow regulating valve to control the sampling water flow speed so as to control the rotation frequency and cleaning force of the spiral impeller (1).
8. The residual chlorine monitoring device according to claim 7, characterized in that: The flow channel (5) has an outlet (8), and the outlet (8) is equipped with a drain solenoid valve for periodically opening the drain solenoid valve to perform periodic electrode cleaning.
9. The residual chlorine monitoring device according to claim 6, characterized in that: The flow channel (5) has an inlet (7) that is connected to the water inlet pipe (5a) of the measuring cup. The inlet (7) is connected to the sampling pump, and the sampling water flow rate is adjusted by adjusting the output power of the sampling pump.
Citation Information
Patent Citations
Hydrodynamic water quality monitoring electrode cleaning device
CN110186978A
Residual chlorine sensor accessory and residual chlorine sensor assembly
CN116399931A