Microchannel arsenic removal reactor dedicated to hydrofluoric acid

Abstract

The utility model belongs to the field of chemical technology, especially relate to a micro -channel arsenic removal reactor special use of hydrofluoric acid. Including primary reactor, the lower part of primary reactor is equipped with fluorine nitrogen gas import, the upper part of primary reactor is equipped with finished product acid import, be equipped with gas -liquid mixer in primary reactor, the lower part of primary reactor and with fluorine nitrogen gas import opposite side still connect the lower part of secondary reactor, the upper part of secondary reactor connects finished product acid export, be equipped with micro -channel reactor in secondary reactor. The utility model can realize mixing fully, reaction efficiency is high, and the arsenic ion content of the hydrofluoric acid product of disposal is reduced obviously.

Description

Technical Field

[0001] This utility model belongs to the field of chemical technology, and in particular relates to a microchannel arsenic removal reactor specifically for hydrofluoric acid. Background Technology

[0002] Currently, the arsenic content of fluorite powder used in hydrofluoric acid production is ≤100ppm. Hydrofluoric acid produced from this fluorite powder has an arsenic content of ≤100ppm, and arsenic is a heavy metal subject to strict control. Existing technology uses an oxidant oxidation method. The crude arsenic-containing hydrofluoric acid tank is connected to a mixing reactor and an oxidant tank via pipelines. The mixing reactor is also connected to a packed tower, which is further connected to a condenser and a finished hydrofluoric acid tank. After treatment, the finished hydrofluoric acid contains 10–80ppm of arsenic and 0–5ppm of oxidant. However, in the arsenic removal process of anhydrous hydrofluoric acid, excess oxidants, such as potassium permanganate or hydrogen peroxide, are usually added. These oxidants typically require a very complex distillation process for removal, and the residual amount of oxidant directly affects the quality of the hydrofluoric acid. Utility Model Content

[0003] The purpose of this invention is to address the above-mentioned problems by providing a microchannel arsenic removal reactor specifically for hydrofluoric acid.

[0004] To achieve the above objectives, the present invention adopts the following technical solution:

[0005] A microchannel arsenic removal reactor for hydrofluoric acid includes a primary reactor with a fluorine and nitrogen gas inlet at the bottom and a finished acid inlet at the top. A gas-liquid mixer is installed inside the primary reactor. The lower part of the primary reactor, opposite to the fluorine and nitrogen gas inlet, is connected to the lower part of a secondary reactor. The upper part of the secondary reactor is connected to the finished acid outlet. A microchannel reactor is installed inside the secondary reactor.

[0006] In the aforementioned microchannel arsenic removal reactor specifically designed for hydrofluoric acid, a premixer is also provided between the primary reactor and the secondary reactor.

[0007] In the aforementioned microchannel arsenic removal reactor specifically designed for hydrofluoric acid, a first waste gas outlet is provided at the top of the primary reactor, and a second waste gas outlet is provided at the top of the secondary reactor.

[0008] In the aforementioned microchannel arsenic removal reactor specifically for hydrofluoric acid, a pressure reducing valve is installed at the fluorine and nitrogen gas inlet, a control valve is installed at the finished acid inlet, and a premixing valve is installed between the primary reactor and the premixer.

[0009] In the aforementioned microchannel arsenic removal reactor specifically designed for hydrofluoric acid, the primary reactor and the secondary reactor are detachably fixed to the frame.

[0010] In the aforementioned microchannel arsenic removal reactor specifically for hydrofluoric acid, the finished acid outlet is located above the microchannel reactor, and the connection between the premixer and the secondary reactor is located below the microchannel reactor.

[0011] In the aforementioned microchannel arsenic removal reactor specifically designed for hydrofluoric acid, the gas-liquid mixer is located between the fluorine and nitrogen gas inlet and the finished acid inlet.

[0012] In the aforementioned microchannel arsenic removal reactor specifically for hydrofluoric acid, the microchannel reactor includes a partition fixed inside a secondary reactor, and the partition is densely covered with several parallel microchannel tubes.

[0013] In the aforementioned microchannel arsenic removal reactor specifically for hydrofluoric acid, the microchannel tubes are densely packed with spiral blades.

[0014] In the aforementioned microchannel arsenic removal reactor specifically for hydrofluoric acid, the spiral blades are arranged at equal intervals along the axial direction of the microchannel tube.

[0015] Compared with existing technologies, the advantages of this utility model are:

[0016] 1. It can achieve thorough mixing, high reaction efficiency, and significantly reduce the arsenic ion content in the treated hydrofluoric acid product.

[0017] 2. The system has low resistance and does not require additional power. It can complete the process by relying on the liquid level difference, thus saving energy.

[0018] 3. Simple installation, easy to connect to the original production system, gas-liquid mixer and microchannel reactor are detachable and replaceable, easy to maintain and replace. Attached Figure Description

[0019] Figure 1 This is a schematic diagram of the structure of this utility model;

[0020] Figure 2 yes Figure 1 A diagram from another direction;

[0021] Figure 3 This is a top view of a microchannel reactor.

[0022] In the diagram: 1. Primary reactor; 2. Fluorine and nitrogen inlet; 3. Finished acid inlet; 4. Gas-liquid mixer; 5. Secondary reactor; 6. Finished acid outlet; 7. Microchannel reactor; 8. Premixer; 9. First waste gas outlet; 10. Second waste gas outlet; 11. Pressure reducing valve; 12. Control valve; 13. Premixing valve; 14. Frame; 15. Baffle; 16. Microchannel tube; 17. Spiral vane. Detailed Implementation

[0023] The present invention will now be described in further detail with reference to the accompanying drawings and specific embodiments.

[0024] like Figure 1 and Figure 2 As shown, a microchannel arsenic removal reactor for hydrofluoric acid includes a primary reactor 1, a fluorine-nitrogen gas inlet 2 at the bottom of the primary reactor 1, a finished acid inlet 3 at the top of the primary reactor 1, a gas-liquid mixer 4 inside the primary reactor 1, and the lower part of a secondary reactor 5 connected to the lower part of the primary reactor 1 on the side opposite to the fluorine-nitrogen gas inlet 2. The finished acid outlet 6 is connected to the top of the secondary reactor 5, and a microchannel reactor 7 is inside the secondary reactor 5.

[0025] The primary and secondary reactors are typically small in size, about 1 meter in diameter and 1.5 meters in height. The primary reactor uses a counter-current gas-liquid mixing structure, while the secondary reactor uses a co-current gas-liquid mixing structure, ensuring complete reaction. Primary reactor 1 and secondary reactor 5 are detachably fixed to the frame 14. The gas-liquid mixer 4 and microchannel reactor 7 can be commercially available products, directly and detachably installed within primary reactor 1 and secondary reactor 5, facilitating disassembly and replacement. This results in skid-mounted manufacturing, simplifying installation and allowing for easy integration into existing production systems.

[0026] A premixer 8 is also provided between the primary reactor 1 and the secondary reactor 5. The premixer 8 is a liquid-liquid mixer or a gas-liquid mixer, and commercially available products are directly used.

[0027] The primary reactor 1 is equipped with a first waste gas outlet 9 at the top, and the secondary reactor 5 is equipped with a second waste gas outlet 10 at the top. Unreacted gases from the first waste gas outlet 9 and the second waste gas outlet 10 enter the tail gas absorption tower for treatment.

[0028] The fluorine-nitrogen inlet 2 is equipped with a pressure reducing valve 11 to control the amount of fluorine-nitrogen entering the gas, so as to achieve precise control. The finished acid inlet 3 is equipped with a regulating valve 12 to control the amount of finished acid fed. A premixing valve 13 is provided between the primary reactor 1 and the premixer 8 for preliminary mixing.

[0029] The finished acid outlet 6 is located above the microchannel reactor 7, and the connection between the premixer 8 and the secondary reactor 5 is located below the microchannel reactor 7. The secondary reactor 5 has a gas-liquid co-current mixing structure. The gas-liquid mixer 4 is located between the fluorine-nitrogen inlet 2 and the finished acid inlet 3. The primary reactor 1 has a gas-liquid counter-current mixing structure.

[0030] As mentioned above, the microchannel reactor 7 can be a commercially available product. In this embodiment, a specific structure of the microchannel reactor 7 is provided, such as... Figure 2 and Figure 3 As shown, the microchannel reactor 7 includes a partition 15 fixed inside the secondary reactor 5, and the partition 15 is densely covered with several parallel microchannel tubes 16.

[0031] The microchannel tube 16 is densely packed with spiral blades 17, which are arranged at equal intervals along the axial direction of the microchannel tube 16.

[0032] The spiral plate 17 forms a spiral channel between itself and the inner wall of the microchannel tube 16, changing the gas-liquid flow path and making the reaction more complete.

[0033] Anhydrous hydrofluoric acid, the raw material from the finished acid storage tank, is continuously fed into the top of the primary reactor through the finished acid inlet 3. There, it reacts counter-currently with fluorine and nitrogen gas from the fluorine-nitrogen mixing cylinder via the gas-liquid mixer 4. The anhydrous hydrofluoric acid from the primary reactor 1 then continuously enters the secondary reactor 5 from the bottom, where it reacts co-currently with the fluorine and nitrogen gas, and is thoroughly mixed and reacted through the microchannel reactor 7. This process allows the As contained within the hydrofluoric acid to be released. 3+ Oxidation to As 5+ After the reaction, the unreacted gas enters the tail gas absorption tower for treatment. The crude acid liquid phase after the reaction passes through the finished acid outlet 6 and undergoes dehydrogenation and degravimetric treatment in the subsequent distillation to produce qualified finished acid with an arsenic content ≤0.01ppm and an oxidant content of 0.

[0034] This invention's equipment reduces the arsenic content of the product without introducing new oxidants, achieving the electronic-grade hydrofluoric acid standard of ≤0.01ppm. It improves reaction efficiency and quality, which is beneficial for increasing output and reducing costs and energy consumption. The arsenic removal system is easy to install, readily integrates with the existing production system, and is convenient to maintain.

[0035] The specific embodiments described herein are merely illustrative examples illustrating the spirit of this utility model. Those skilled in the art to which this utility model pertains may make various modifications or additions to the described specific embodiments or use similar methods to replace them, without departing from the spirit of this utility model.

Claims

1. A microchannel arsenic removal reactor for hydrofluoric acid, comprising a primary reactor (1), a fluorine-nitrogen gas inlet (2) at the bottom of the primary reactor (1), and a finished acid inlet (3) at the top of the primary reactor (1), characterized in that, The primary reactor (1) is equipped with a gas-liquid mixer (4). The lower part of the primary reactor (1) and the side opposite to the fluorine and nitrogen gas inlet (2) are also connected to the lower part of the secondary reactor (5). The upper part of the secondary reactor (5) is connected to the finished acid outlet (6). The secondary reactor (5) is equipped with a microchannel reactor (7).

2. The microchannel arsenic removal reactor for hydrofluoric acid according to claim 1, characterized in that, A premixer (8) is also provided between the primary reactor (1) and the secondary reactor (5).

3. The microchannel arsenic removal reactor for hydrofluoric acid according to claim 1, characterized in that, The first-stage reactor (1) is provided with a first exhaust gas outlet (9) at the top, and the second-stage reactor (5) is provided with a second exhaust gas outlet (10) at the top.

4. The microchannel arsenic removal reactor for hydrofluoric acid according to claim 2, characterized in that, The fluorine and nitrogen gas inlet (2) is equipped with a pressure reducing valve (11), the finished acid inlet (3) is equipped with a control valve (12), and a premixing valve (13) is provided between the primary reactor (1) and the premixer (8).

5. The microchannel arsenic removal reactor for hydrofluoric acid according to claim 1, characterized in that, The primary reactor (1) and the secondary reactor (5) are detachably fixed on the frame (14).

6. The microchannel arsenic removal reactor for hydrofluoric acid according to claim 2, characterized in that, The finished acid outlet (6) is located above the microchannel reactor (7), and the connection between the premixer (8) and the secondary reactor (5) is located below the microchannel reactor (7).

7. The microchannel arsenic removal reactor for hydrofluoric acid according to claim 1, characterized in that, The gas-liquid mixer (4) is located between the fluorine-nitrogen gas inlet (2) and the finished acid inlet (3).

8. The microchannel arsenic removal reactor for hydrofluoric acid according to claim 1, characterized in that, The microchannel reactor (7) includes a partition (15) fixed inside the secondary reactor (5), and the partition (15) is densely covered with several parallel microchannel tubes (16).

9. The microchannel arsenic removal reactor for hydrofluoric acid according to claim 8, characterized in that, The microchannel tube (16) is densely packed with spiral blades (17).

10. The microchannel arsenic removal reactor for hydrofluoric acid according to claim 9, characterized in that, The spiral blades (17) are arranged at equal intervals along the axial direction of the microchannel tube (16).

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