A sputtering film deposition apparatus

Abstract

The utility model discloses a sputter coating device, including sample cavity, the inner top surface of sample cavity is equipped with target material, and the inner bottom of sample cavity is fixed with sample stage through rotating part, the upper surface of sample stage is equipped with the track of circular, at least one track swing point is equipped on the track, the fixed part with the jack is installed to the opposite two side walls in sample cavity, and the swing rod is movably inserted between two jacks, the center of swing rod is fixed with swing ware, and one transmission block that cooperates with track swing point is equipped with on both sides of swing ware respectively. The utility model discloses through swing impact force cooperation sample stage's rotation, can effectively change the relative position of powder's coating area and powder, thereby in improving the uniformity of coating film, reduces the mutual adhesion of powder in the coating process.

Description

Technical Field

[0001] This utility model relates to the field of vacuum coating, and in particular to a sputtering coating apparatus. Background Technology

[0002] Magnetron sputtering, a physical vapor deposition technique, enhances sputtering efficiency by confining plasma with a magnetic field, enabling the efficient deposition of various thin films on target substrates. It has wide applications in scientific research and industrial production.

[0003] Surface coating of powder materials is a common surface modification method. Depending on the coating requirements, various coating techniques can be selected, such as physical vapor deposition, chemical vapor deposition, electroplating, and electroless plating. Among these, magnetron sputtering, due to its inherent principle, has no special restrictions on the substrate material, produces high-purity coatings, and is simple to process, making it suitable for coating various powder surfaces. However, due to the large specific surface area and the adhesion between powder particles, conventional magnetron sputtering devices can only coat exposed surfaces, resulting in suboptimal coating quality. Therefore, it is essential to improve magnetron sputtering devices to enable effective coating of powder substrates, in addition to coating bulk, sheet, and thin film substrates.

[0004] Chinese patent document CN108060400A discloses a powder dispersion device for magnetron sputtering coating, comprising a sidewall, a tray, a ball bearing interlayer, a vibration system, a spring, and a base. The upper surface of the tray is micro-serrated, and the ball bearing interlayer is installed between the tray and the vibration system. During magnetron sputtering coating, the tray vibrates due to a vibration motor, while the balls in the ball bearing interlayer bounce and continuously tap the tray, thus dispersing the powder within the tray.

[0005] However, this device directly applies the vibration of the vibrating motor and the impact of the marbles to the tray, which affects the stability of the tray. Furthermore, the device lacks horizontal vibration. Utility Model Content

[0006] This invention provides a sputtering coating device that effectively changes the coating area of ​​the powder and the relative position between the powders by swinging impact in conjunction with the rotation of the sample stage, thereby improving the uniformity of the coating film and reducing the mutual adhesion between powders during the coating process.

[0007] A sputtering coating apparatus includes a sample chamber and a magnetron sputtering system. The inner top surface of the sample chamber is provided with a target material for the magnetron sputtering system, and the inner bottom of the sample chamber is fixed to the sample stage by a rotating component. The sample stage is detachably provided with a circular track on its upper surface, and the track has at least one track swing point; a fixing member with a socket is detachably installed on each of the two opposite side walls inside the sample cavity, and a swing rod is movably inserted between the two sockets. The swing rod has a swinging device fixed at its center; the swing rod has a transmission block on each side of the swinging device that cooperates with the swing point of the track.

[0008] The working principle of this utility model is as follows: During the rotation of the circular track driven by the sample stage, the track swing point pushes the two transmission blocks back and forth, thereby driving the swing rod to swing along its own axis under the restriction of the two insertion holes. During the swing, the swing device swings back and forth to hit the powder sample, changing the coating area of ​​the powder and the relative position between the powders. The radial thickness of the track swing point is the swing amplitude of the swing device.

[0009] Preferably, the track has at least two track swing points, which are arranged non-centrally symmetrically. Alternatively, the track swing points are convex structures, and their shapes are selected from hemispherical, semi-cylindrical, spherical, cylindrical, quasi-spherical, quasi-cylindrical, pyramidal, or prismatic.

[0010] Alternatively, the at least two track swing points may have one or at least two radial thicknesses to achieve different swing amplitudes.

[0011] Alternatively, at least one track swing point is located on the inner surface of the track; Two transmission blocks are arranged inside the track, and the distance between the back sides of the two transmission blocks is the difference between the inner diameter of the track and the radial thickness of the track swing point with the largest radial thickness.

[0012] Optionally, at least one of the track swing points is located on the outer surface of the track; Two transmission blocks are arranged on the outside of the track, and the distance between the front of the two transmission blocks is the sum of the outer diameter of the track and the radial thickness of the track swing point with the largest radial thickness.

[0013] Based on a similar principle, this utility model also provides another sputtering coating device, including a sample chamber and a magnetron sputtering system. The inner top surface of the sample chamber is provided with the target material of the magnetron sputtering system, and the inner bottom of the sample chamber is fixed to the sample stage by a rotating component. The sample stage has an elliptical track detachably mounted on its upper surface, and the track has a groove. A fixing piece with a socket is detachably installed on each of the two opposite side walls inside the sample chamber, and a swing rod is movably inserted between the two sockets. The swing rod has a swinging device fixed at its center; the swing rod has a transmission block that cooperates with the slide groove on one side of the swinging device.

[0014] The working principle of the device is as follows: as the sample stage drives the elliptical track to rotate, the slide on the track pushes the transmission block back and forth, thereby driving the swing rod to swing along its own axis under the restriction of the two insertion holes. During the swing, the swinger swings back and forth to hit the powder sample, changing the coating area of ​​the powder and the relative position between the powders.

[0015] Alternatively, the groove may be disposed on the upper surface, inner surface, or outer surface of the track.

[0016] Preferably, the cross-section of the groove is U-shaped.

[0017] Preferably, the surfaces of the swing point and the transmission block of the present invention are smooth surfaces, the smoothness of the smooth surface is better than 0.5 μm, and / or the smooth surface is coated with a vacuum lubricating material.

[0018] Preferably, the track of this invention is detachably arranged on the sample stage, the oscillator and oscillating rod are detachably arranged on the fixing member, and the fixing member is detachably arranged on the side wall of the sample chamber. By assembling and disassembling the track, oscillating rod and oscillator, the sputtering coating device can perform coating functions for samples of various shapes, including powder, flakes and blocks.

[0019] Compared with the prior art, the present invention has the following beneficial effects: 1. In this utility model, the axial swing of the swing rod is driven by the rotation of the track. When coating the powder sample surface, the sample stage rotates in coordination, pushing the powder sample to swing back and forth, continuously changing the coating surface of the powder, and avoiding adhesion during the coating process.

[0020] 2. By setting up a track and a swing rod, the swing is ultimately completed by the swing rod. The sample stage does not overlap during rotation, which can effectively improve the rotational stability of the sample stage and avoid the impact of sample stage swing on sputtering quality. Attached Figure Description

[0021] Figure 1 This is a schematic diagram of a sputtering coating apparatus in Example 1.

[0022] Figure 2 This is a top view of the track swing point and the transmission block in Example 1.

[0023] Figure 3 This is a schematic diagram of the elliptical track in Example 2.

[0024] Figure 4 This is a schematic diagram of the swing distance generated by the elliptical track pushing the transmission block to slide in Example 2.

[0025] Figure 5 This is a schematic diagram of the slide and transmission block in Example 2.

[0026] In the figure: 1-track; 2-transmission block; 3-oscillator; 4-oscillating rod; 5-fixed part; 6-sample stage; 7-target material; 8-track oscillation point; 9-slide groove. Detailed Implementation

[0027] The present invention will be further described in detail below with reference to the accompanying drawings and embodiments. It should be noted that the embodiments described below are intended to facilitate the understanding of the present invention and do not limit it in any way.

[0028] Example 1 like Figure 1 and Figure 2 As shown, a sputtering coating apparatus includes a sample chamber and a magnetron sputtering system. The inner top surface of the sample chamber is provided with a target material 7 of the magnetron sputtering system, and the inner bottom of the sample chamber is fixed to the sample stage 6 by a rotating component.

[0029] The upper surface of the sample stage 6 is provided with a circular track 1, and the circular track 1 has several track swing points 8. A fixing piece 5 with a socket is installed on each of the two opposite side walls inside the sample chamber, and a swing rod 4 is movably inserted between the two sockets.

[0030] The center of the swing rod 4 is fixed with a swing device 3; on both sides of the swing rod 4, there is a transmission block 2 that cooperates with the swing point 8 of the track.

[0031] In this embodiment, the different track swing points 8 are arranged non-centrally symmetrically. The track swing points 8 on track 1 can be arranged at equal or unequal intervals.

[0032] Alternatively, the structure of the track swing point 8 can be hemispherical, semi-cylindrical, spherical, cylindrical, quasi-spherical, quasi-cylindrical, pyramidal, and prismatic.

[0033] In practical applications, sputtering coating equipment also includes an atmosphere management module and a water cooling module. The atmosphere management module is connected to the sample chamber, evacuating and filling the sample chamber with air before and after coating, and controlling the atmosphere during the coating process. The atmosphere management module includes a pump set, a gas source, a flow controller, and supporting pipelines and valves. The pump set is used to remove gas from the sample chamber to a high vacuum state, and together with the gas source, flow controller, and valves, it enables the arrangement of specific gas sources and pressures within the sample chamber. The water cooling module is connected to the magnetron sputtering system and includes a circulating water pump, a flow controller, a thermometer, and supporting pipelines and valves, used for heat dissipation of the magnetron sputtering system during operation.

[0034] The sample stage 6 is a horizontally arranged planar sample stage. A rotating component is also arranged inside the sample cavity and connected to the sample stage 6 to support the rotation of the sample stage 6. The rotational angular velocity is between 1-60° / s.

[0035] like Figure 2 As shown, the working principle of this embodiment is as follows: During the rotation of the circular track 1 driven by the sample stage 6, the track swing point 8 pushes the two transmission blocks 2 back and forth, thereby driving the swing rod 4 to swing along its own axis under the restriction of the two insertion holes. During the swing, the swing device 3 swings back and forth to hit the powder sample, changing the coating area of ​​the powder and the relative position between the powders.

[0036] In this embodiment, the swing rod 4 is positioned close to and above the track 1, without contacting the track 1. Several track swing points 8 can be all located on the inner surface of the track 1, or all located on the outer surface of the track 1.

[0037] When all the track swing points 8 are located on the inner surface of track 1, the two transmission blocks 2 need to be arranged on the inner side of track 1, and the distance between the back sides of the two transmission blocks 2 is the difference between the inner diameter of track 1 and the radial thickness h of the track swing point 8. At this time, the inner side of track 1 also serves to limit the transmission blocks 2.

[0038] When all the track swing points 8 are located on the outer surface of the track 1, the two transmission blocks 2 are arranged on the outside of the track 1, and the front-to-front distance between the two transmission blocks 2 is the sum of the outer diameter of the track 1 and the radial thickness h of the track swing point 8. At this time, the outer surface of the track 1 also serves to limit the transmission blocks 2.

[0039] Example 2 Unlike embodiment 1, in this embodiment, an elliptical track 1 is used. In this case, the track swing point 8 can be omitted, and a groove 9 is set on the track. At the same time, the swing rod 4 is provided with a transmission block 2 that cooperates with the groove 9 on one side of the swinger 3.

[0040] The working principle of this embodiment is as follows: During the rotation of the elliptical track 1 driven by the sample stage 6, the slide groove 9 on the track 1 pushes the transmission block 2 back and forth, thereby driving the swing rod 4 to swing along its own axis under the restriction of the two insertion holes. During the swing, the swing device 3 swings back and forth to hit the powder sample, changing the coating area of ​​the powder and the relative position between the powders.

[0041] like Figure 3 As shown, the left and right sides respectively demonstrate the positions of the transmission block 2 on the secondary axis and the main axis of the elliptical track.

[0042] like Figure 4 As shown, the swing distance of the swing rod 4 is based on the difference x between the primary and secondary diameters of the ellipse of the track.

[0043] Alternatively, the chute can be provided on the upper surface, inner surface or outer surface of the track 1.

[0044] like Figure 5 As shown, in this embodiment, the cross-section of the slide groove 9 on the left is U-shaped, and the structure of the transmission block 2 on the right matches the U-shaped slide groove.

[0045] The embodiments described above provide a detailed explanation of the technical solution and beneficial effects of this utility model. It should be understood that the above descriptions are only specific embodiments of this utility model and are not intended to limit this utility model. Any modifications, additions, and equivalent substitutions made within the scope of the principles of this utility model should be included within the protection scope of this utility model.

Claims

1. A sputtering coating apparatus, characterized in that, It includes a sample chamber and a magnetron sputtering system. The inner top surface of the sample chamber is provided with a target material (7) for the magnetron sputtering system, and the inner bottom of the sample chamber is fixed to the sample stage (6) by a rotating component. The upper surface of the sample stage (6) is detachably provided with a circular track (1), and the track (1) is provided with at least one track swing point (8). A fixing piece (5) with a socket is installed on each of the two opposite side walls inside the sample chamber, and a swing rod (4) is movably inserted between the two sockets. The swing rod (4) has a swing device (3) fixed at its center; the swing rod (4) has a transmission block (2) on each side of the swing device (3) that cooperates with the swing point (8) of the track.

2. The sputtering coating apparatus according to claim 1, characterized in that, The track (1) is provided with at least two track swing points (8), and the different track swing points (8) are arranged non-centrally symmetrically.

3. The sputtering coating apparatus according to claim 1, characterized in that, The track swing point (8) is a convex structure, and its shape is selected from hemispherical, semi-cylindrical, spherical, cylindrical, quasi-spherical, quasi-cylindrical, pyramidal or prismatic.

4. The sputtering coating apparatus according to claim 1, characterized in that, At least one track swing point (8) is located on the inner surface of the track (1); Two transmission blocks (2) are arranged inside the track (1), and the distance between the back sides of the two transmission blocks (2) is the difference between the inner diameter of the track (1) and the radial thickness of the track swing point (8) with the largest radial thickness.

5. The sputtering coating apparatus according to claim 1, characterized in that, At least one track swing point (8) is located on the outer surface of the track (1); Two transmission blocks (2) are arranged outside the track (1), and the frontal distance between the two transmission blocks (2) is the sum of the outer diameter of the track (1) and the radial thickness of the track swing point (8) with the largest radial thickness.

6. A sputtering coating apparatus, characterized in that, It includes a sample chamber and a magnetron sputtering system. The inner top surface of the sample chamber is provided with a target material (7) for the magnetron sputtering system, and the inner bottom of the sample chamber is fixed to the sample stage (6) by a rotating component. The upper surface of the sample stage (6) is detachably provided with an elliptical track (1), and the track (1) is provided with a groove (9). A fixing piece (5) with a socket is installed on each of the two opposite side walls inside the sample chamber, and a swing rod (4) is movably inserted between the two sockets. The swing rod (4) has a swing device (3) fixed at its center; the swing rod (4) has a transmission block (2) that cooperates with the slide groove (9) on one side of the swing device (3).

7. The sputtering coating apparatus according to claim 6, characterized in that, The groove (9) is provided on the upper surface, inner surface or outer surface of the track (1).

8. The sputtering coating apparatus according to claim 6, characterized in that, The cross-section of the groove (9) is concave.

Images