A vacuuming device

CN224664798UActive Publication Date: 2026-08-21GUANGDONG SUNION ADVANCED NOVEL TECHNOLOGIES CO LTD
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Patent Information

Application Number
CN202521827058.3
Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
Filing Date
2025-08-26
Publication Date
2026-08-21
Estimated Expiration
2035-08-26

AI Technical Summary

Technical Problem

[0004]本实用新型的目的是提供一种抽真空装置,以解决液环真空泵排出至大气的气体不仅会危害工作人员的身体,还会恶化车间的工作环境,对其他设备产生负面影响的技术问题

Benefits of technology

本实用新型抽真空装置中,液环真空泵、第一缓冲罐、第二缓冲罐和压缩机依次连接,其中,液环真空泵的第一泵入口对被处理设备抽真空,液环真空泵在气相出口处排出气液混合物,压缩机通过降低其入口的压力,将气相出口处的气体朝压缩机的方向引流,使该气体能够依次流经第一缓冲罐和第二缓冲罐,压缩机将该气体朝密闭排放系统排放,密闭排放系统对该气体进行处理,以对该部分气体无害化处理,进一步的,为了确保流通至压缩机的物质为气体(液体会使该压缩机损坏),第一缓冲罐能够对液环真空泵在气相出口处排出气液混合物进行气液分离,具体的,当气液混合物被排放至第一缓冲罐时,该气液混合物中的液体(密封液)留在第二缓冲罐内,而气体部分继续流通,以实现气液分离的效果;第二缓冲罐能够对凝结气体中的低沸点成分,具体的,当气体流通至第二缓冲罐,第一换热器降低第二缓冲罐内的温度,使气体中的低沸点成分凝结成液体,并留在第二缓冲罐内,气体中没有被凝结的部分继续流通,以防止气体在压缩机处冷凝形成液体;另外,第一缓冲罐和第二缓冲罐还具有平稳气流的作用;综上,本实用新型抽真空装置能够将液环真空泵的气相出口所排出物质依次进行气液分离、凝结,并在最后排放至密闭排放系统,以防止液体损坏压缩机,并对排放的气体进行无害化处理,大大降低了对工作人员的危害以及对工作环境的负面影响。

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Abstract

The utility model relates to the technical field of vacuumizing, especially a kind of vacuumizing device, including liquid ring vacuum pump, first buffer tank, second buffer tank and compressor, liquid ring vacuum pump is equipped with first pump inlet and gas phase outlet, first pump inlet is used to connect in the equipment being handled, gas phase outlet is connected to first buffer tank, first buffer tank is connected to second buffer tank, first heat exchanger is equipped in second buffer tank, first heat exchanger is used to reduce the temperature in second buffer tank, second buffer tank is connected to the inlet of compressor, the outlet of compressor is used to connect in closed discharge system;Above all, the vacuumizing device of the utility model can discharge material of gas phase outlet of liquid ring vacuum pump in turn carry out gas-liquid separation, condense, and discharge to closed discharge system in last, to prevent liquid damage compressor, and carry out innocuous treatment to the gas of discharge, greatly reduce the harm to staff and the negative influence to working environment.
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Description

Technical Field

[0001] This utility model relates to the field of vacuum technology, and in particular to a vacuum device. Background Technology

[0002] A liquid ring vacuum pump is a rotary positive displacement vacuum pump that uses liquid as the working medium and achieves gas suction and discharge through volume changes. It is widely used in industrial vacuum systems.

[0003] In practical applications of liquid ring vacuum pumps, because the outlet of the pump can only maintain a slight positive pressure, it will trip when the outlet pressure becomes too high. This prevents the outlet from being directly connected to a pressurized, closed system for processing. Instead, the outlet must be connected to a buffer tank, which is open to the atmosphere, so the discharged gas is first released into the buffer tank and then into the atmosphere. However, this results in untreated gas being discharged directly from the buffer tank, which not only harms the health of workers but also deteriorates the workshop environment and negatively impacts other equipment. Utility Model Content

[0004] The purpose of this invention is to provide a vacuum pumping device to solve the technical problem that the gas discharged from the liquid ring vacuum pump into the atmosphere not only harms the health of workers, but also deteriorates the working environment of the workshop and has a negative impact on other equipment.

[0005] To achieve the above objectives, this utility model provides a vacuum pumping device, including a liquid ring vacuum pump, a first buffer tank, a second buffer tank, and a compressor. The liquid ring vacuum pump has a first pump inlet and a gas phase outlet. The first pump inlet is connected to the equipment being processed, and the gas phase outlet is connected to the first buffer tank. The first buffer tank is connected to the second buffer tank, and the second buffer tank has a first heat exchanger inside. The first heat exchanger is used to reduce the temperature inside the second buffer tank. The second buffer tank is connected to the inlet of the compressor, and the outlet of the compressor is connected to a closed discharge system.

[0006] Optionally, the first buffer tank has a first tank inlet on its side, the gas phase outlet is connected to the first tank inlet, the top surface of the first buffer tank has a first tank outlet, and the first tank outlet is connected to the second buffer tank.

[0007] Optionally, the second buffer tank has a second tank inlet on its side, which is connected to the first buffer tank, and a second tank outlet on its top surface, which is connected to the inlet of the compressor.

[0008] Optionally, the first buffer tank is provided with a first tank inlet, the gas phase outlet is connected to the first tank inlet, the first buffer tank is provided with a first tank outlet, the first tank outlet is connected to the second buffer tank, and the diameter of the first tank inlet is larger than the diameter of the first tank outlet; The second buffer tank has a second tank inlet connected to the first buffer tank, and the second buffer tank has a second tank outlet connected to the inlet of the compressor. The diameter of the second tank inlet is larger than the diameter of the second tank outlet.

[0009] Optionally, a circulating pump is also included. The liquid ring vacuum pump is provided with a second pump inlet, and the bottom surface of the first buffer tank is provided with a third tank outlet. The inlet of the circulating pump is connected to the third tank outlet, and the outlet of the circulating pump is connected to the second pump inlet.

[0010] Optionally, a second heat exchanger may also be included, which is disposed between the outlet of the circulating pump and the inlet of the second pump.

[0011] Optionally, the first heat exchanger includes a heat exchange tube that passes through the second buffer tank. The heat exchange tube includes an input section, a heat exchange section, and an output section connected in sequence. The heat exchange section is coiled inside the second buffer tank, while the input section and the output section are located outside the second buffer tank.

[0012] Optionally, it also includes a condensate recovery pipe, wherein the bottom surface of the second buffer tank is provided with a fourth tank outlet, and one end of the condensate recovery pipe is connected to the fourth tank outlet.

[0013] Optionally, it also includes a discharge pipe, a first regulating valve, a second regulating valve, and a check valve. The first regulating valve is located between the second buffer tank and the compressor. The outlet of the compressor is connected to one end of the discharge pipe, and the other end of the discharge pipe is used to connect to a closed discharge system. The second regulating valve and the check valve are located on the discharge pipe, and the check valve is positioned towards the end of the discharge pipe used to connect to the closed discharge system.

[0014] Optionally, the compressor is a diaphragm compressor.

[0015] Compared with the prior art, the vacuum pumping device implemented in this utility model has the following advantages: In this vacuuming device, a liquid ring vacuum pump, a first buffer tank, a second buffer tank, and a compressor are connected in sequence. The first pump inlet of the liquid ring vacuum pump evacuates the equipment being processed. The liquid ring vacuum pump discharges a gas-liquid mixture at its gas phase outlet. The compressor reduces the pressure at its inlet, directing the gas from the gas phase outlet towards the compressor, allowing the gas to flow sequentially through the first and second buffer tanks. The compressor then discharges the gas into a closed-loop discharge system, which treats the gas to render it harmless. Furthermore, to ensure that the substance flowing to the compressor is gas (liquid would damage the compressor), the first buffer tank performs gas-liquid separation on the gas-liquid mixture discharged from the liquid ring vacuum pump at its gas phase outlet. Specifically, when the gas-liquid mixture is discharged into the first buffer tank, the liquid in the gas-liquid mixture (… The sealing liquid remains in the second buffer tank, while the gas portion continues to flow, achieving gas-liquid separation. Specifically, when gas flows into the second buffer tank, the first heat exchanger lowers the temperature inside, causing the low-boiling-point components to condense into liquid and remain in the second buffer tank. The uncondensed portion of the gas continues to flow, preventing condensation at the compressor. Additionally, the first and second buffer tanks stabilize the airflow. In summary, this vacuum device sequentially separates and condenses the substances discharged from the gas phase outlet of the liquid ring vacuum pump, finally discharging them into a closed discharge system to prevent liquid damage to the compressor and to render the discharged gas harmless, significantly reducing harm to workers and negative impacts on the working environment. Attached Figure Description

[0016] Figure 1 This is a schematic diagram of the vacuum pumping device of this utility model.

[0017] Reference numerals: 1. Liquid ring vacuum pump; 11. First pump inlet; 12. Second pump inlet; 13. Gas phase outlet; 2. First buffer tank; 21. First tank inlet; 22. First tank outlet; 23. Third tank outlet; 3. Second buffer tank; 31. Second tank inlet; 32. Second tank outlet; 33. Fourth tank outlet; 4. Compressor; 5. First heat exchanger; 51. Heat exchange tube; 511. Input section; 512. Heat exchange section; 513. Output section; 6. Second heat exchanger; 7. Circulation pump; 8. First regulating valve; 9. Second regulating valve; 10. Check valve; 20. Condensate recovery pipe; 30. Discharge pipe; 40. Equipment being treated; 50. Closed discharge system. Detailed Implementation

[0018] The specific embodiments of this utility model will be further described in detail below with reference to the accompanying drawings and examples. The following examples are used to illustrate this utility model, but are not intended to limit the scope of this utility model.

[0019] In the description of this utility model, it should be understood that the terms "top", "bottom", "inner", "outer", "circumferential", etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the drawings. They are only for the convenience of describing this utility model and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on this utility model.

[0020] Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of indicated technical features. Thus, a feature defined as "first" or "second" may explicitly or implicitly include at least one of that feature. In the description of this utility model, "a plurality of" means at least two, such as two, three, etc., unless otherwise explicitly specified.

[0021] like Figure 1 As shown, a vacuum pumping device of this utility model includes a liquid ring vacuum pump 1, a first buffer tank 2, a second buffer tank 3, and a compressor 4. The liquid ring vacuum pump 1 is provided with a first pump inlet 11 and a gas phase outlet 13. The first pump inlet 11 is used to connect to the equipment 40 to be processed. The gas phase outlet 13 is connected to the first buffer tank 2. The first buffer tank 2 is connected to the second buffer tank 3. The second buffer tank 3 is provided with a first heat exchanger 5, which is used to reduce the temperature inside the second buffer tank 3. The second buffer tank 3 is connected to the inlet of the compressor 4. The outlet of the compressor 4 is used to connect to a closed discharge system 50.

[0022] In the above technical solution, the vacuum pumping device of this utility model consists of a liquid ring vacuum pump 1, a first buffer tank 2, a second buffer tank 3, and a compressor 4 connected in sequence. The first pump inlet 11 of the liquid ring vacuum pump 1 evacuates the equipment 40 being processed. The liquid ring vacuum pump 1 discharges a gas-liquid mixture at the gas phase outlet 13. The compressor 4 reduces the pressure at its inlet, directing the gas from the gas phase outlet 13 towards the compressor 4, allowing the gas to flow sequentially through the first buffer tank 2 and the second buffer tank 3. The compressor 4 then discharges the gas into a closed-loop discharge system 50, which treats the gas to render it harmless. Furthermore, to ensure that the substance flowing to the compressor 4 is gas (liquid would damage the compressor 4), the first buffer tank 2 performs gas-liquid separation on the gas-liquid mixture discharged from the liquid ring vacuum pump 1 at the gas phase outlet 13. Specifically, when the gas-liquid mixture is discharged into the first buffer tank 2... The liquid (sealing liquid) in the gas-liquid mixture remains in the second buffer tank 3, while the gas continues to flow, achieving gas-liquid separation. The second buffer tank 3 can condense the low-boiling-point components in the gas. Specifically, when the gas flows to the second buffer tank 3, the first heat exchanger 5 lowers the temperature inside the second buffer tank 3, causing the low-boiling-point components in the gas to condense into liquid and remain in the second buffer tank 3. The uncondensed portion of the gas continues to flow, preventing the gas from condensing into liquid at the compressor 4. In addition, the first buffer tank 2 and the second buffer tank 3 also have the function of stabilizing the airflow. In summary, the vacuum pumping device of this utility model can sequentially separate and condense the substances discharged from the gas phase outlet 13 of the liquid ring vacuum pump 1, and finally discharge them to the closed discharge system 50 to prevent the liquid from damaging the compressor 4 and to treat the discharged gas in a harmless manner, greatly reducing the harm to workers and the negative impact on the working environment.

[0023] Among them, the closed emission system 50 can be a flare closed emission system 50. The flare closed emission system 50 is a closed emission treatment system used in the industrial field for the safe and environmentally friendly treatment of combustible, toxic and harmful gases (especially gases that are excess, urgently discharged or leaked during the process). Specifically, it treats the gas to be harmless by flare combustion, avoiding direct discharge into the atmosphere and causing safety risks or environmental pollution.

[0024] Furthermore, the first buffer tank 2 has a first tank inlet 21 on its side, the gas phase outlet 13 is connected to the first tank inlet 21, the top surface of the first buffer tank 2 has a first tank outlet 22, and the first tank outlet 22 is connected to the second buffer tank 3.

[0025] The first inlet 21 of the first buffer tank 2 is located on its side, so that when the gas-liquid mixture enters the first buffer tank 2, it moves towards the inner wall of the first buffer tank 2. The liquid in it impacts the inner wall of the first buffer tank 2 or flows directly downward to the bottom of the first buffer tank 2. The liquid eventually settles at the bottom of the first buffer tank 2. The gas in it impacts the inner wall of the first buffer tank 2 or flows directly upward. The gas eventually exits from the first outlet 22 located on the top surface of the first buffer tank 2, so as to ensure the gas-liquid separation effect.

[0026] Furthermore, the second buffer tank 3 has a second tank inlet 31 on its side, which is connected to the first buffer tank 2, and the second buffer tank 3 has a second tank outlet 32 ​​on its top surface, which is connected to the inlet of the compressor 4.

[0027] The second inlet 31 of the second buffer tank 3 is located on its side, so that when the gas enters the second buffer tank 3, it moves towards the inner wall of the second buffer tank 3. After moving a certain distance inside the second buffer tank 3, the gas will be cooled by the cooling chamber, causing the components with lower boiling points in the gas to condense into liquid. The liquid settles at the bottom of the second buffer tank 3, and the remaining gas flows upward and is discharged from the second outlet 32 ​​located on the top surface of the second buffer tank 3.

[0028] Furthermore, the diameter of the first tank inlet 21 is larger than the diameter of the first tank outlet 22; the diameter of the second tank inlet 31 is larger than the diameter of the second tank outlet 32.

[0029] During operation, the inlet pressure of the buffer tank is low and the outlet pressure is high. By increasing the inlet of the buffer tank, the flow rate at the inlet can be increased, thereby increasing the gas discharge volume and ensuring that the gas can be discharged normally.

[0030] Furthermore, it also includes a circulation pump 7. The liquid ring vacuum pump 1 is provided with a second pump inlet 12, and the bottom surface of the first buffer tank 2 is provided with a third tank outlet 23. The inlet of the circulation pump 7 is connected to the third tank outlet 23, and the outlet of the circulation pump 7 is connected to the second pump inlet 12.

[0031] The liquid ring pump discharges the gas-liquid mixture at the gas phase outlet 13. The liquid obtained after gas-liquid separation is the sealing liquid. The circulating pump 7 draws the sealing liquid from the third tank outlet 23 of the first buffer tank 2 to the second pump inlet 12 of the circulating vacuum pump, forming a closed loop, reducing the consumption of sealing liquid and lowering operating costs.

[0032] Furthermore, it also includes a second heat exchanger 6, which is located between the outlet of the circulating pump 7 and the inlet of the second pump 12.

[0033] The second heat exchanger 6 is used to reduce the temperature of the sealing fluid so that the sealing fluid can maintain a low temperature when flowing through the liquid ring vacuum pump 1 and the circulating pump 7, thereby ensuring the stability of pump operation.

[0034] Furthermore, the first heat exchanger 5 includes a heat exchange tube 51, which passes through the second buffer tank 3. The heat exchange tube 51 includes an input section 511, a heat exchange section 512, and an output section 513 connected in sequence. The heat exchange section 512 is coiled inside the second buffer tank 3, while the input section 511 and the output section are located outside the second buffer tank 3.

[0035] The refrigerant enters the heat exchange tube 51 from the input section 511, flows through the heat exchange section 512, and leaves the heat exchange tube 51 from the output section 513. Furthermore, the coil-type heat exchange section 512 can significantly increase the heat exchange area, and the gas flows around the low-temperature tube wall in the second buffer tank 3, which can quickly reduce the temperature of the gas.

[0036] Furthermore, it also includes a condensate recovery pipe 20, and the bottom surface of the second buffer tank 3 is provided with a fourth tank outlet 33, one end of the condensate recovery pipe 20 is connected to the fourth tank outlet 33.

[0037] The condensate recovery pipe enables the recovery of condensate, achieving resource recycling and reducing waste.

[0038] Furthermore, it also includes a discharge pipe 30, a first regulating valve 8, a second regulating valve 9, and a one-way valve 10. The first regulating valve 8 is located between the second buffer tank 3 and the compressor 4. The outlet of the compressor 4 is connected to one end of the discharge pipe 30, and the other end of the discharge pipe 30 is used to connect to the closed discharge system 50. The second regulating valve 9 and the one-way valve 10 are located on the discharge pipe 30, and the one-way valve 10 is oriented toward the end of the discharge pipe 30 used to connect to the closed discharge system 50.

[0039] The first regulating valve 8 controls the gas flow and pressure entering the compressor 4, matching the compressor 4's operating range to prevent overload or surge. The second regulating valve 9 adjusts the discharge pressure to meet the needs of the closed system. In addition, both regulating valves can cut off or close the pipeline when necessary for maintenance. Furthermore, the one-way valve 10 ensures that the gas flows only in one direction into the closed system, preventing treated waste gas, liquid, or pressure fluctuations from flowing back into the compressor 4 or buffer tank, protecting equipment safety, and maintaining process reliability.

[0040] Furthermore, the compressor 4 is a diaphragm compressor 4.

[0041] The diaphragm compressor 4's drive mechanism does not come into direct contact with the compressed gas, and it can compress special gases that are difficult for conventional compressors 4 to handle, such as corrosive, flammable, explosive, and toxic gases.

[0042] Furthermore, fixed setting and fixed connection refer to the fixed relative positional relationship of two components, including but not limited to fixing by connectors, fixing by welding, fixing by adhesive, fixing by integral molding, and fixing by snap-fit ​​connection.

[0043] Furthermore, the connectors include, but are not limited to, fasteners, straps, ropes, pneumatic connectors, hydraulic connectors, flanges, Velcro, and buttons.

[0044] In summary, this utility model embodiment provides a vacuum pumping device, the technical effects of which are as follows: In this vacuum device, a liquid ring vacuum pump 1, a first buffer tank 2, a second buffer tank 3, and a compressor 4 are connected in sequence. The first pump inlet 11 of the liquid ring vacuum pump 1 evacuates the equipment 40 being processed. The liquid ring vacuum pump 1 discharges a gas-liquid mixture at its gas phase outlet 13. The compressor 4 reduces the pressure at its inlet, directing the gas from the gas phase outlet 13 towards the compressor 4, allowing the gas to flow sequentially through the first buffer tank 2 and the second buffer tank 3. The compressor 4 then discharges the gas into a closed-loop discharge system 50, which treats the gas to render it harmless. Furthermore, to ensure that the substance flowing to the compressor 4 is gas (liquid would damage the compressor 4), the first buffer tank 2 performs gas-liquid separation on the gas-liquid mixture discharged from the liquid ring vacuum pump 1 at its gas phase outlet 13. Specifically, when the gas-liquid mixture is discharged into the first buffer tank 2, the gas-liquid mixture... The liquid (sealing fluid) in the mixture remains in the second buffer tank 3, while the gas portion continues to flow, achieving gas-liquid separation. The second buffer tank 3 can condense the low-boiling-point components in the gas. Specifically, when the gas flows to the second buffer tank 3, the first heat exchanger 5 lowers the temperature inside the second buffer tank 3, causing the low-boiling-point components in the gas to condense into liquid and remain in the second buffer tank 3. The uncondensed portion of the gas continues to flow, preventing the gas from condensing into liquid at the compressor 4. In addition, the first buffer tank 2 and the second buffer tank 3 also have the function of stabilizing the airflow. In summary, the vacuum pumping device of this utility model can sequentially separate and condense the substances discharged from the gas phase outlet 13 of the liquid ring vacuum pump 1, and finally discharge them to the closed discharge system 50 to prevent the liquid from damaging the compressor 4 and to treat the discharged gas in a harmless manner, greatly reducing the harm to workers and the negative impact on the working environment.

[0045] The above description is only a preferred embodiment of the present utility model. It should be noted that for those skilled in the art, several improvements and substitutions can be made without departing from the technical principles of the present utility model, and these improvements and substitutions should also be considered within the protection scope of the present utility model.

Claims

1. A vacuum pumping device, characterized in that, The system includes a liquid ring vacuum pump (1), a first buffer tank (2), a second buffer tank (3), and a compressor (4). The liquid ring vacuum pump (1) has a first pump inlet (11) and a gas phase outlet (13). The first pump inlet (11) is connected to the device being processed (40). The gas phase outlet (13) is connected to the first buffer tank (2). The first buffer tank (2) is connected to the second buffer tank (3). The second buffer tank (3) is equipped with a first heat exchanger (5) for reducing the temperature inside the second buffer tank (3). The second buffer tank (3) is connected to the inlet of the compressor (4). The outlet of the compressor (4) is connected to a closed discharge system (50).

2. The vacuum pumping device according to claim 1, characterized in that, The first buffer tank (2) has a first tank inlet (21) on its side, and the gas phase outlet (13) is connected to the first tank inlet (21). The first buffer tank (2) has a first tank outlet (22) on its top surface, and the first tank outlet (22) is connected to the second buffer tank (3).

3. The vacuum pumping device according to claim 1, characterized in that, The second buffer tank (3) has a second tank inlet (31) on its side, which is connected to the first buffer tank (2). The second buffer tank (3) has a second tank outlet (32) on its top surface, which is connected to the inlet of the compressor (4).

4. The vacuum pumping device according to claim 1, characterized in that, The first buffer tank (2) is provided with a first tank inlet (21), the gas phase outlet (13) is connected to the first tank inlet (21), the first buffer tank (2) is provided with a first tank outlet (22), the first tank outlet (22) is connected to the second buffer tank (3), and the diameter of the first tank inlet (21) is larger than the diameter of the first tank outlet (22); The second buffer tank (3) is provided with a second tank inlet (31), which is connected to the first buffer tank (2). The second buffer tank (3) is provided with a second tank outlet (32), which is connected to the inlet of the compressor (4). The diameter of the second tank inlet (31) is larger than the diameter of the second tank outlet (32).

5. The vacuum pumping device according to claim 1, characterized in that, It also includes a circulation pump (7), the liquid ring vacuum pump (1) is provided with a second pump inlet (12), the bottom surface of the first buffer tank (2) is provided with a third tank outlet (23), the inlet of the circulation pump (7) is connected to the third tank outlet (23), and the outlet of the circulation pump (7) is connected to the second pump inlet (12).

6. The vacuum pumping device according to claim 5, characterized in that, It also includes a second heat exchanger (6), which is located between the outlet of the circulating pump (7) and the inlet (12) of the second pump.

7. The vacuum pumping device according to claim 1, characterized in that, The first heat exchanger (5) includes a heat exchange tube (51) that passes through the second buffer tank (3). The heat exchange tube (51) includes an input section (511), a heat exchange section (512), and an output section (513) connected in sequence. The heat exchange section (512) is coiled inside the second buffer tank (3), while the input section (511) and the output end are located outside the second buffer tank (3).

8. The vacuum pumping device according to claim 1, characterized in that, It also includes a condensate recovery pipe (20), and the bottom surface of the second buffer tank (3) is provided with a fourth tank outlet (33), one end of the condensate recovery pipe (20) is connected to the fourth tank outlet (33).

9. The vacuum pumping device according to claim 1, characterized in that, It also includes a discharge pipe (30), a first regulating valve (8), a second regulating valve (9), and a one-way valve (10). The first regulating valve (8) is located between the second buffer tank (3) and the compressor (4). The outlet of the compressor (4) is connected to one end of the discharge pipe (30), and the other end of the discharge pipe (30) is used to connect to the closed discharge system (50). The second regulating valve (9) and the one-way valve (10) are located on the discharge pipe (30), and the one-way valve (10) is positioned facing the end of the discharge pipe (30) used to connect to the closed discharge system (50).

10. The vacuum pumping device according to claim 1, characterized in that, The compressor (4) is a diaphragm compressor (4).