An EUV lithography reticle

Abstract

The utility model discloses a kind of EUV photoetching mask, specifically related to mask technology field, including photoetching mask, the photoetching mask one end is provided with mask fixed base, the mask fixed base surface is fixedly connected with first mounting rod, the first installation groove is opened in the photoetching mask, the photoetching mask is fixedly connected in mask fixed base side by first mounting rod to first installation groove insertion, the EUV photoetching mask is inserted by the interference fit and the guiding chamfer of first mounting rod and first installation groove, make insertion process smooth no jam, cooperate the close adhesion of second mounting rod and second installation groove, form double fixed, replace traditional screw connection, substantially shorten installation time, realize quick installation. The interference fit of first mounting rod and first installation groove ensures that initial connection is firm, after second mounting rod is inserted into second installation groove, the elastic recovery force of spring continues to exert pressure, further enhance connection tightness.

Description

Technical Field

[0001] This utility model relates to the field of photomask technology, and more specifically, to an EUV lithography photomask. Background Technology

[0002] In EUV lithography technology, the lithography mask is a core component, and its installation accuracy and efficiency directly affect the stability and production efficiency of the lithography process. In existing technologies, the connection between the EUV lithography mask and the mounting base mostly relies on threaded rods, which require repeated tightening to ensure a tight fit. This is not only time-consuming, but the threaded fit is also prone to uneven stress on the mask due to uneven tightening force, leading to warping or deformation and affecting the flatness accuracy. At the same time, traditional installation structures lack guiding design, which can easily cause jamming during insertion, potentially damaging the edges or surface of the mask. If the gap at the connection point is too large, it can also loosen due to vibration during use, further affecting the lithography accuracy. In addition, some installation tools are inconvenient to hold and are prone to slipping during operation, increasing the difficulty of installation and the risk of error. This makes it difficult to meet the requirements of EUV lithography for efficient and high-precision installation. Therefore, a new EUV lithography mask is proposed. Utility Model Content

[0003] To overcome the aforementioned deficiencies of the prior art, embodiments of this utility model provide an EUV lithography mask. This EUV lithography mask, through the interference fit between the first mounting rod and the first mounting groove, and the guide chamfer, ensures a smooth and seamless insertion process. Combined with the tight fit between the second mounting rod and the second mounting groove, a double fixation is formed, replacing the traditional threaded connection, significantly shortening installation time and achieving rapid installation. The interference fit between the first mounting rod and the first mounting groove ensures a firm initial connection. After the second mounting rod is inserted into the second mounting groove, the elastic restoring force of the spring continuously applies pressure, further enhancing the connection tightness and effectively preventing loosening due to vibration during use, thus improving connection stability. The elliptical design and anti-slip texture of the fixing rod increase grip comfort and friction, making operation more convenient and reducing the risk of slippage.

[0004] To achieve the above objectives, the present invention provides the following technical solution: an EUV lithography mask, comprising a lithography mask, a mask fixing seat at one end of the lithography mask, a first mounting rod fixedly connected to the surface of the mask fixing seat, a first mounting groove formed on the lithography mask, and the lithography mask being inserted into and fixedly connected to one side of the mask fixing seat through the first mounting rod into the first mounting groove.

[0005] In a preferred embodiment, the first mounting rod has a second mounting groove, and a second mounting rod is inserted and fixed inside the second mounting groove. One end of the second mounting rod is fixedly connected to a fixing rod, and the other end of the fixing rod is rotatably connected to a rotating column. A fixing column is slidably connected to the inner wall of the rotating column, and one end of the fixing column is fixedly connected to the side of the mask plate fixing seat.

[0006] In a preferred embodiment, the fixing rod is elliptical in shape, and the outer surface of the fixing rod is provided with anti-slip texture.

[0007] In a preferred embodiment, two sets of second mounting grooves are symmetrically arranged on the first mounting rod, and the inner wall of the second mounting groove is in contact with the outer wall of the second mounting rod.

[0008] In a preferred embodiment, a spring is wound around the fixed column, with one end of the spring fixedly connected to the rotating column and the other end of the spring fixedly connected to the fixed column.

[0009] In a preferred embodiment, the first mounting groove, the first mounting rod, the fixing rod, and the fixing post are arranged symmetrically on the photomask fixing seat, and the photolithography photomask and the photomask fixing seat are fitted together.

[0010] The technical effects and advantages of this utility model are as follows: The EUV lithography mask, through the interference fit between the first mounting rod and the first mounting groove, and the guide chamfer, ensures a smooth and seamless insertion process. Combined with the tight fit between the second mounting rod and the second mounting groove, a double fixation is formed, replacing the traditional threaded connection, significantly shortening installation time and achieving rapid installation. The interference fit between the first mounting rod and the first mounting groove ensures a firm initial connection. After the second mounting rod is inserted into the second mounting groove, the elastic restoring force of the spring continuously applies pressure, further enhancing the connection tightness and effectively preventing loosening due to vibration during use, thus improving connection stability. The elliptical design and anti-slip texture of the fixing rod increase grip comfort and friction, making operation more convenient and reducing the risk of slippage. Attached Figure Description

[0011] Figure 1 This is a schematic diagram of the three-dimensional structure of the wall quality testing instrument body of this utility model.

[0012] Figure 2 This is a schematic diagram of a partial cross-sectional view of the three-dimensional structure of the sensing probe body of this utility model, showing its disassembled and movable state.

[0013] Figure 3 This utility model Figure 2 Enlarged view of the structure at point A.

[0014] The components are: 1. Photolithography mask; 2. Mask holder; 3. First mounting slot; 4. First mounting rod; 5. Fixing post; 6. Rotating post; 7. Fixing rod; 8. Second mounting slot; 9. Second mounting rod; 10. Spring. Detailed Implementation

[0015] The technical solutions of the present utility model will be clearly and completely described below with reference to the accompanying drawings of the embodiments. Obviously, the described embodiments are only some embodiments of the present utility model, and not all embodiments. Based on the embodiments of the present utility model, all other embodiments obtained by those of ordinary skill in the art without creative effort are within the protection scope of the present utility model.

[0016] Refer to the instruction manual appendix Figure 1-3 An EUV lithography mask includes a lithography mask 1, a mask holder 2 at one end of the lithography mask 1, a first mounting rod 4 fixedly connected to the surface of the mask holder 2, a first mounting groove 3 formed on the lithography mask 1, and the lithography mask 1 being inserted into and fixedly connected to one side of the mask holder 2 via the first mounting rod 4 into the first mounting groove 3; a second mounting groove 8 formed on the first mounting rod 4, a second mounting rod 9 inserted and fixedly fixed inside the second mounting groove 8, and a fixing rod 7 fixedly connected to one end of the second mounting rod 9. The other end is rotatably connected to a rotating post 6, and a fixed post 5 is slidably connected to the inner wall of the rotating post 6. One end of the fixed post 5 is fixedly connected to the side of the mask plate fixing seat 2. The photolithography mask 1 is inserted into and fixedly connected to the side of the mask plate fixing seat 2 via the first mounting rod 4 and the first mounting groove 3. When inserted, the outer wall of the first mounting rod 4 and the inner wall of the first mounting groove 3 form a tight interference fit to ensure that the two are firmly connected without loosening. The end of the first mounting rod 4 is provided with a guide chamfer to guide it to be smoothly inserted into the first mounting groove 3 and avoid jamming during the installation process.

[0017] The first mounting rod 4 has a second mounting groove 8, which is a through rectangular groove. It is located at the end of the first mounting rod 4 away from the mask plate fixing seat 2. Its size is adapted to the second mounting rod 9. The inner wall of the second mounting groove 8 is ground to ensure that it fits tightly with the outer wall of the second mounting rod 9, preventing unstable connection due to excessive gap.

[0018] The second mounting rod 9 is inserted and fixed inside the second mounting slot 8. The second mounting rod 9 is made of high-strength alloy steel, which has high hardness and wear resistance and can withstand the impact force during the insertion process. One end of it is fixedly connected to the fixing rod 7, and the other end is inserted into the second mounting slot 8. The insertion depth is sufficient to ensure the stability of the connection. The surface of the second mounting rod 9 is chrome-plated, which not only enhances the surface hardness but also improves the corrosion resistance.

[0019] The second mounting rod 9 is fixedly connected to a fixing rod 7 at one end. The fixing rod 7 and the second mounting rod 9 are integrally formed and made of the same alloy steel material to ensure the strength of the connection. The length of the fixing rod 7 is designed for easy gripping by the operator. It is elliptical in shape, which conforms to the ergonomic principle and provides a comfortable grip for the operator, reducing operator fatigue. The outer surface of the fixing rod 7 is provided with anti-slip texture. The texture is a continuous diamond-shaped protrusion, which can effectively increase the friction between the hand and the fixing rod 7 and prevent slippage during operation.

[0020] The other end of the fixed rod 7 is rotatably connected to a rotating column 6. The rotating column 6 is made of bearing steel and has a through hole inside. A rolling bearing is installed in the through hole. The inner ring of the bearing is slidably connected to the fixed column 5, and the outer ring is fixedly connected to the rotating column 6, so that the rotating column 6 can both rotate around the fixed column 5 and slide along the axis of the fixed column 5, ensuring the flexibility of movement.

[0021] The inner wall of the rotating column 6 is slidably connected to a fixed column 5. The fixed column 5 is made of stainless steel and its surface is precision ground and polished to reduce the sliding friction resistance between it and the rotating column 6, so that the sliding action of the rotating column 6 is smooth and stable. One end of the fixed column 5 is fixedly connected to the side of the mask plate fixing seat 2, and the other end extends into the interior of the rotating column 6 to provide sufficient sliding stroke for the rotating column 6.

[0022] One end of the fixing post 5 is fixedly connected to the side of the photomask fixing seat 2 by welding. The area around the welding point is polished to ensure a smooth surface and avoid obstructing the sliding of the rotating post 6. With the above structure, the photomask fixing seat 2 and the photolithography photomask 1 can be quickly installed. During installation, the operator aligns the first mounting groove 3 of the photolithography photomask 1 with the first mounting rod 4 of the photomask fixing seat 2 and inserts it. Then, the fixing rod 7 is pushed to insert the second mounting rod 9 into the second mounting groove 8, which completes the fixing without the need for time-consuming installation operations using threaded rods.

[0023] The fixing rod 7 is oval-shaped, which increases the contact area between the operator's fingers and the fixing rod 7, dispersing grip pressure and improving operating comfort. The anti-slip texture on its outer wall maintains good friction even when hands are sweaty or oily, ensuring stable operation and preventing improper installation due to slippage.

[0024] Two sets of second mounting grooves 8 are symmetrically arranged on the first mounting rod 4, and the two sets of second mounting grooves 8 are located on both sides of the first mounting rod 4 in a mirror distribution. This symmetrical structure ensures that the fixing force of the second mounting rod 9 on the first mounting rod 4 is evenly distributed, preventing the first mounting rod 4 from bending and deforming due to unilateral force. The inner wall of the second mounting groove 8 fits snugly against the outer wall of the second mounting rod 9, ensuring that the second mounting rod 9 can be smoothly inserted, and preventing loosening through the friction generated by the interference fit, thus ensuring the reliability of the connection.

[0025] A spring 10, made of stainless steel wire, is wound around the fixed post 5, providing excellent elasticity and corrosion resistance. One end of the spring 10 is fixedly connected to the rotating post 6, and the other end is fixedly connected to the fixed post 5, both connections being welded. When the spring 10 is in its natural state, the rotating post 6 is located at the end of the fixed post 5 furthest from the mask plate fixing seat 2. When the fixing rod 7 is pushed to insert the second mounting rod 9 into the second mounting groove 8, the spring 10 is compressed and generates an elastic restoring force. This force acts on the rotating post 6, ensuring that the second mounting rod 9 is always subjected to pressure into the second mounting groove 8, further enhancing the tightness of the connection and preventing the second mounting rod 9 from falling off due to vibration during use.

[0026] It should be noted that the first mounting groove 3, the first mounting rod 4, the fixing rod 7, and the fixing post 5 are arranged symmetrically on the photomask fixing seat 2. The overall symmetrical structure ensures that the fixing force on the photomask 1 after installation is evenly distributed in various parts, avoiding warping or deformation of the photomask 1 due to uneven force, and ensuring that its flatness meets the usage requirements. The photomask 1 and the photomask fixing seat 2 are fitted together with each other, and the gap between the mating surfaces is extremely small, reducing the impact of air gaps on heat conduction. This allows the heat generated by the photomask 1 during operation to be quickly transferred to the photomask fixing seat 2 and dissipated, avoiding local overheating that could damage the pattern.

[0027] Finally, the following points should be noted: First, in the description of this application, it should be noted that, unless otherwise specified and limited, the terms "installation", "connection", and "linkage" should be interpreted broadly, and can be mechanical or electrical connections, or internal connections between two components, or direct connections. "Up", "down", "left", "right", etc. are only used to indicate relative positional relationships. When the absolute position of the described object changes, the relative positional relationship may change.

[0028] Secondly: The accompanying drawings of the embodiments disclosed in this utility model only involve the structures involved in the embodiments disclosed in this utility model. Other structures can refer to the general design. In the absence of conflict, the same embodiment and different embodiments of this utility model can be combined with each other.

[0029] Finally: The above description is only a preferred embodiment of the present utility model and is not intended to limit the present utility model. Any modifications, equivalent substitutions, improvements, etc., made within the spirit and principles of the present utility model should be included within the protection scope of the present utility model.

Claims

1. An EUV lithography mask, comprising a lithography mask (1), characterized in that: The photolithography mask (1) is provided with a mask fixing seat (2) at one end. A first mounting rod (4) is fixedly connected to the surface of the mask fixing seat (2). A first mounting groove (3) is opened on the photolithography mask (1). The photolithography mask (1) is inserted into the first mounting groove (3) and fixedly connected to one side of the mask fixing seat (2) through the first mounting rod (4).

2. The EUV lithography mask according to claim 1, characterized in that: The first mounting rod (4) has a second mounting groove (8), and a second mounting rod (9) is inserted and fixed inside the second mounting groove (8). One end of the second mounting rod (9) is fixedly connected to a fixing rod (7), and the other end of the fixing rod (7) is rotatably connected to a rotating column (6). The inner wall of the rotating column (6) is slidably connected to a fixing column (5), and one end of the fixing column (5) is fixedly connected to the side of the mask plate fixing seat (2).

3. The EUV lithography mask according to claim 2, characterized in that: The fixing rod (7) is elliptical in shape, and the outer surface of the fixing rod (7) is provided with anti-slip texture.

4. An EUV lithography mask according to claim 2, characterized in that: Two sets of second mounting grooves (8) are symmetrically arranged on the first mounting rod (4), and the inner wall of the second mounting groove (8) is in contact with the outer wall of the second mounting rod (9).

5. An EUV lithography mask according to claim 2, characterized in that: A spring (10) is wound around the fixed column (5). One end of the spring (10) is fixedly connected to the rotating column (6), and the other end of the spring (10) is fixedly connected to the fixed column (5).

6. An EUV lithography mask according to claim 1, characterized in that: The first mounting groove (3), the first mounting rod (4), the fixing rod (7) and the fixing post (5) are arranged symmetrically on the mask plate fixing seat (2), and the photolithography mask (1) and the mask plate fixing seat (2) are fitted together.

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