Ceramic substrate exposure machine

Abstract

The utility model relates to ceramic substrate processing technical field, and disclose a kind of ceramic substrate exposure machine, including conveying pedestal, exposure conveying movement part, ceramic plate flexible centering clamping positioning part, the bottom outer wall of conveying pedestal is fixedly installed with support plate symmetrically, the bottom outer wall of support plate is fixedly installed with support pad block symmetrically, the top of conveying pedestal is provided with exposure machine;The exposure conveying movement part is arranged inside conveying pedestal.The utility model is through the cooperation of spring and slide bar, clamping pad plate, and the combination of buffer spring and small damping rod, buffer pad plate, forms double flexible protection structure, when clamping ceramic substrate, spring can be automatically adjusted clamping intensity by elastic deformation, avoid the scratch of substrate, fragmentation caused by rigid clamping, while damping rod can absorb the impact force in clamping process, further reduce the damage risk of fragile ceramic material when positioning, especially adapt the processing scene of thin or high-precision ceramic substrate.

Description

Technical Field

[0001] This utility model relates to the field of ceramic substrate processing technology, specifically a ceramic substrate exposure machine. Background Technology

[0002] In the production and processing of ceramic substrates, the exposure process is a crucial step in ensuring the accuracy of the circuit patterns, requiring precise exposure of the photosensitive material on the substrate surface using an exposure machine. However, existing ceramic substrate exposure machines suffer from the following technical challenges in practical applications:

[0003] Clamping and positioning can easily damage the substrate: Ceramic substrates are brittle and hard with poor impact resistance. Traditional exposure machines mostly use rigid clamping structures, and the clamping force is difficult to control precisely, which can easily lead to scratches, chipping, or even cracks on the substrate surface. The risk of damage is even higher for thin or high-precision ceramic substrates, which seriously affects the product yield.

[0004] Insufficient conveying and positioning accuracy: If there is transmission gap or unstable guidance in the conveying mechanism during the process of conveying the substrate to the exposure area, it is easy to cause the substrate to shift or shake, resulting in the exposure pattern being misaligned with the preset position and reducing the processing accuracy; at the same time, the vibration of the equipment during operation will further aggravate the positioning deviation and affect the quality of the final product.

[0005] Limited adaptability and versatility: Ceramic substrates of different specifications (size, thickness) require corresponding adjustments to the clamping components, making the changeover process cumbersome and time-consuming, which makes it difficult to meet the production needs of multiple varieties and small batches, thus limiting the flexibility of equipment use and production efficiency.

[0006] Therefore, in view of the shortcomings of the traditional exposure machine in terms of ceramic substrate clamping and protection, positioning accuracy and adaptability, there is an urgent need to design a ceramic substrate exposure machine that can achieve flexible clamping, precise delivery and strong adaptability, so as to solve the problems existing in the current technology. Utility Model Content

[0007] The purpose of this invention is to provide a ceramic substrate exposure machine that solves the technical problems of traditional exposure machines, such as damage to the ceramic substrate due to rigid contact during clamping and positioning, insufficient positioning accuracy during transportation, and poor flexibility in adapting to different specifications of substrates. The invention achieves the goals of flexible centering and clamping of ceramic substrates to protect brittle materials, improved transportation to ensure exposure quality, and enhanced equipment adaptability to different specifications of substrates to improve production efficiency.

[0008] To achieve the above objectives, this utility model provides the following technical solution: a ceramic substrate exposure machine, comprising a conveying base, an exposure conveying moving part, and a ceramic plate flexible centering clamping and positioning part. Support plates are symmetrically fixedly installed on the bottom outer wall of the conveying base, and support pads are symmetrically fixedly installed on the bottom outer wall of the support plates. The exposure machine is disposed on the top of the conveying base. The exposure conveying moving part is disposed inside the conveying base. The ceramic plate flexible centering clamping and positioning part is disposed inside the conveying base and on the top of the exposure conveying moving part, respectively. Specifically, the ceramic plate flexible centering clamping and positioning part includes: a ceramic plate positioning platform disposed inside the conveying base; a built-in dual-head motor disposed inside the ceramic plate positioning platform; a stationary clamping and positioning plate symmetrically fixedly installed on the top of the conveying base; and buffer springs equidistantly disposed on one side outer wall of the stationary clamping and positioning plate.

[0009] Preferably, the exposure conveying moving part specifically includes: a mounting groove formed on the top outer wall of the conveying base; a drive motor fixedly installed on one side outer wall of the conveying base; a guide slide rail symmetrically fixedly installed on the inner wall of the mounting groove; and a moving slide rail fixedly installed on the inner wall of the mounting groove.

[0010] Preferably, the output end of the drive motor is fixedly connected to a threaded screw, the other end of which movably passes through the outer wall of the conveying base and extends into the interior of the movable slide rail, and the other end of the threaded screw is rotatably connected to the inner wall of the mounting groove.

[0011] Preferably, a movable slider is slidably installed inside the movable slide rail, and a hexagonal groove is provided on one side of the movable slider. A hexagonal nut is fixedly installed inside the hexagonal groove. The movable slider is threadedly connected to the threaded screw through the hexagonal nut. Guide sliders are slidably installed on the outer wall of the guide slide rail.

[0012] A guide rail is provided, which, when used in conjunction with the guide slider and ceramic plate positioning platform, provides a lateral guide for the platform, limiting vertical or horizontal deviation during movement. Even if the exposure transport moving part drives the platform to move frequently, it can prevent the ceramic substrate from shifting due to shaking, ensuring that the substrate remains on the preset path during exposure operations.

[0013] Preferably, the ceramic plate positioning platform is fixedly installed on the top outer wall of the movable slider and the guide slider. The top outer wall of the ceramic plate positioning platform is symmetrically provided with clamping guide grooves and movable slide grooves. The inner wall of the movable slide groove is provided with an installation circular groove. The movable slide grooves are connected through the installation circular grooves. The built-in double-head motor is fixedly installed inside the installation circular groove. Both ends of the built-in double-head motor are fixedly connected with lead screws. The other end of each lead screw is rotatably connected to the inner wall of the movable slide groove.

[0014] Equipped with a built-in dual-head motor, the output shafts at both ends rotate synchronously, driving the corresponding lead screw and clamping slider to move synchronously. This ensures that the moving clamping plates on both sides maintain symmetrical movement when clamping the ceramic substrate, avoiding substrate offset caused by unilateral drive and improving the accuracy of centering and positioning.

[0015] Preferably, guide slide rods are fixedly connected between the inner walls of the clamping guide grooves, a rectangular slider is slidably installed inside the clamping guide groove, the rectangular slider is sleeved on the outer wall of the guide slide rod, a clamping slider is slidably installed inside the movable slide groove, the clamping slider is threaded to the lead screw, and a movable clamping plate is fixedly installed on the top outer wall of both the clamping slider and the rectangular slider. The movable clamping plate has symmetrical openings, and a slide rod is slidably installed inside the opening.

[0016] Preferably, one end of the slide rod extends to one side of the outer wall of the movable clamping plate, one end of the slide rod is fixedly connected to a limiting plate, the other end of the slide rod extends to the other side of the outer wall of the movable clamping plate, a clamping pad is fixedly installed on the other end of the slide rod, a spring is sleeved on the outer wall of the slide rod, one end of the spring is fixedly connected to the outer wall of the limiting plate, and the other end of the spring is fixedly connected to one side of the outer wall of the movable clamping plate.

[0017] A spring is incorporated, which, when working with the slide bar and clamping pad, can buffer the clamping force through its own elastic deformation. When the moving clamping plate causes the clamping pad to contact the ceramic substrate, the spring can automatically adjust the clamping force according to the substrate thickness and hardness, avoiding damage such as scratches and cracks to the substrate caused by rigid clamping. This is especially suitable for the processing needs of brittle materials such as ceramics.

[0018] Preferably, small damping rods are fixedly installed at equal intervals on the outer wall of the stationary clamping positioning plate, and buffer pads are fixedly installed on the telescopic ends of the small damping rods. The buffer springs are sleeved on the outer wall of the small damping rods, and the two ends of the buffer springs are fixedly connected to the buffer pads and the outer walls of the stationary clamping positioning plate, respectively.

[0019] This invention provides a ceramic substrate exposure machine. It has the following advantages:

[0020] (1) This utility model drives the screw to rotate by a drive motor. With the screw connection between the moving slider and the screw, the rotational motion of the motor can be converted into the linear motion of the moving slider, thereby driving the ceramic plate positioning platform to move smoothly. This transmission method can accurately control the moving distance and speed of the platform, ensuring that the ceramic substrate can be accurately transported to the processing area of ​​the exposure machine, avoiding exposure position deviation due to transport offset, and improving the processing accuracy of the final product.

[0021] (2) This utility model forms a double flexible protection structure by combining the spring with the slide bar and the clamping pad, and the buffer spring with the small damping rod and the buffer pad. When clamping the ceramic substrate, the spring can automatically adjust the clamping force through elastic deformation to avoid scratches and cracks on the substrate caused by rigid clamping. At the same time, the damping rod can absorb the impact force during the clamping process, further reducing the risk of damage to brittle ceramic materials during positioning, and is especially suitable for processing scenarios of thin or high-precision ceramic substrates. Attached Figure Description

[0022] Figure 1 This is a three-dimensional schematic diagram of the overall structure of this utility model;

[0023] Figure 2 This is a partial view of the exposure conveying moving part of this utility model;

[0024] Figure 3 This is a partial view of the flexible centering and clamping positioning part of the ceramic plate of this utility model;

[0025] Figure 4 This is a partial view of the buffer spring of this utility model.

[0026] In the diagram: 1. Conveying base; 2. Support plate; 3. Exposure conveying moving part; 311. Mounting groove; 312. Drive motor; 313. Moving slide rail; 314. Guide slide rail; 315. Threaded screw; 316. Guide slider; 317. Moving slider; 318. Hexagonal nut; 4. Flexible centering and clamping positioning part for ceramic plate; 411. Ceramic plate positioning platform; 412. Clamping guide groove; 413. Moving slide groove; 414. Guide slide rod; 415. Built-in double-head motor; 416. Screw; 417. Clamping slider; 418. Rectangular slider; 419. Static clamping positioning plate; 4111. Small damping rod; 4112. Buffer spring; 4113. Buffer pad; 4114. Moving clamping plate; 4115. Slide rod; 4116. Clamping pad; 5. Exposure machine. Detailed Implementation

[0027] The technical solutions of the present utility model will be clearly and completely described below with reference to the accompanying drawings of the embodiments. Obviously, the described embodiments are only some embodiments of the present utility model, and not all embodiments. Based on the embodiments of the present utility model, all other embodiments obtained by those of ordinary skill in the art without creative effort are within the protection scope of the present utility model.

[0028] Examples of the embodiments are shown in the accompanying drawings, wherein the same or similar reference numerals denote the same or similar elements or elements having the same or similar functions throughout. The embodiments described below with reference to the accompanying drawings are exemplary and intended to explain the present invention, and should not be construed as limiting the present invention.

[0029] Example 1:

[0030] Based on the existing problems of traditional exposure machines, such as easy damage to ceramic substrates due to rigid contact during clamping and positioning, insufficient positioning accuracy during transportation, and poor flexibility in adapting to different substrate specifications, the present invention provides a preferred embodiment of a ceramic substrate exposure machine, for example... Figure 1-4 As shown: A ceramic substrate exposure machine includes a conveying base 1, an exposure conveying moving part 3, and a ceramic plate flexible centering clamping and positioning part 4. Support plates 2 are symmetrically fixedly installed on the bottom outer wall of the conveying base 1, and support pads are symmetrically fixedly installed on the bottom outer wall of the support plates 2. An exposure machine 5 is provided on the top of the conveying base 1. The exposure conveying moving part 3 is disposed inside the conveying base 1. The ceramic plate flexible centering clamping and positioning part 4 is disposed inside the conveying base 1 and on the top of the exposure conveying moving part 3, respectively.

[0031] The flexible centering and clamping positioning part 4 of the ceramic plate specifically includes: a ceramic plate positioning platform 411, which is set inside the conveying base 1; a built-in double-head motor 415, which is set inside the ceramic plate positioning platform 411; a stationary clamping positioning plate 419, which is symmetrically fixedly installed on the top of the conveying base 1; and buffer springs 4112, which are equidistantly arranged on one side of the outer wall of the stationary clamping positioning plate 419.

[0032] The exposure conveying moving part 3 specifically includes: a mounting groove 311, which is formed on the top outer wall of the conveying base 1; a drive motor 312, which is fixedly installed on one side outer wall of the conveying base 1; a guide slide rail 314, which is symmetrically fixedly installed on the inner wall of the mounting groove 311; and a moving slide rail 313, which is fixedly installed on the inner wall of the mounting groove 311.

[0033] The output end of the drive motor 312 is fixedly connected to a threaded screw 315. The other end of the threaded screw 315 moves through the outer wall of the conveying base 1 and extends into the interior of the movable slide rail 313. The other end of the threaded screw 315 is rotatably connected to the inner wall of the mounting groove 311.

[0034] The movable slide rail 313 has a movable slider 317 slidably installed inside. A hexagonal groove is provided on one side of the movable slider 317. A hexagonal nut 318 is fixedly installed inside the hexagonal groove. The movable slider 317 is threadedly connected to the threaded screw 315 through the hexagonal nut 318. Guide sliders 316 are slidably installed on the outer wall of the guide slide rail 314.

[0035] Furthermore, in this embodiment, the drive motor 312 of the exposure conveying moving part 3 is started, and the output end drives the threaded screw 315 to rotate within the moving slide rail 313; the moving slider 317 converts the rotational motion into linear motion through the threaded engagement of the hexagonal nut 318 and the threaded screw 315, and slides along the moving slide rail 313; the guide slider 316 slides synchronously along the guide slide rail 314, limiting the lateral offset of the ceramic plate positioning platform 411, ensuring that it drives the positioned ceramic substrate to move smoothly and convey it to the exposure area directly below the exposure machine 5. This transmission method can precisely control the moving distance and speed of the platform, ensuring that the ceramic substrate can be accurately conveyed to the processing area of ​​the exposure machine, avoiding exposure position deviation due to conveying offset, and improving the processing accuracy of the final product.

[0036] Example 2:

[0037] Based on Embodiment 1, a preferred embodiment of the ceramic substrate exposure machine provided by this utility model is as follows: Figure 1-4 As shown: The ceramic plate positioning platform 411 is fixedly installed on the top outer wall of the movable slider 317 and the guide slider 316. The top outer wall of the ceramic plate positioning platform 411 is symmetrically provided with clamping guide groove 412 and movable slide groove 413. The inner wall of the movable slide groove 413 is provided with a mounting circular groove. The movable slide groove 413 is connected through the mounting circular groove. The built-in double-head motor 415 is fixedly installed inside the mounting circular groove. Both ends of the built-in double-head motor 415 are fixedly connected with lead screws 416. The other end of the lead screws 416 is rotatably connected to the inner wall of the movable slide groove 413.

[0038] Guide slide rods 414 are fixedly connected to the inner walls of the clamping guide groove 412. A rectangular slider 418 is slidably installed inside the clamping guide groove 412. The rectangular slider 418 is sleeved on the outer wall of the guide slide rod 414. A clamping slider 417 is slidably installed inside the movable slide groove 413. The clamping slider 417 is threadedly connected to the lead screw 416. A movable clamping plate 4114 is fixedly installed on the top outer wall of both the clamping slider 417 and the rectangular slider 418. A through opening is symmetrically opened on the movable clamping plate 4114. A slide rod 4115 is slidably installed inside the through opening.

[0039] One end of the slide rod 4115 extends to one side of the outer wall of the movable clamping plate 4114. One end of the slide rod 4115 is fixedly connected to a limit plate. The other end of the slide rod 4115 extends to the other side of the outer wall of the movable clamping plate 4114. A clamping pad 4116 is fixedly installed on the other end of the slide rod 4115. A spring is sleeved on the outer wall of the slide rod 4115. One end of the spring is fixedly connected to the outer wall of the limit plate, and the other end of the spring is fixedly connected to one side of the outer wall of the movable clamping plate 4114.

[0040] Small damping rods 4111 are fixedly installed at equal intervals on the outer wall of the stationary clamping positioning plate 419. A buffer pad 4113 is fixedly installed on the telescopic end of the small damping rod 4111. A buffer spring 4112 is sleeved on the outer wall of the small damping rod 4111. The two ends of the buffer spring 4112 are fixedly connected to the buffer pad 4113 and the outer wall of the stationary clamping positioning plate 419, respectively.

[0041] Furthermore, in this embodiment, the sliding rod 4115 on the movable clamping plate 4114 drives the clamping pad 4116 to contact one side of the substrate. The spring on the outer wall of the sliding rod 4115 is compressed to generate elastic force, which buffers the clamping force through deformation, avoiding rigid contact damage to the substrate. The limiting plate restricts the excessive sliding of the sliding rod 4115 to ensure that the clamping force is controllable. The buffer pad 4113 on the stationary clamping positioning plate 419, under the action of the buffer spring 4112 and the small damping rod 4111, adheres to the other side of the substrate. The elastic restoring force of the spring assists the substrate to complete the clamping with the movable clamping plate 4114. At the same time, the damping rod absorbs the clamping impact, further stabilizing the positioning and forming a double flexible protection structure. When clamping the ceramic substrate, the spring can automatically adjust the clamping force through elastic deformation to avoid substrate scratches and breakage caused by rigid clamping. At the same time, the damping rod can absorb the impact force during the clamping process, further reducing the risk of damage to brittle ceramic materials during positioning, especially suitable for processing scenarios of thin or high-precision ceramic substrates.

[0042] Working principle:

[0043] Step 1: Equipment Initialization and Substrate Placement

[0044] The conveyor base 1 serves as the overall support structure, and its bottom support plate 2 and support pads ensure stable placement of the equipment; the exposure machine 5 is in a standby state and is located at the preset exposure position on top of the conveyor base 1.

[0045] The operator places the ceramic substrate on the ceramic plate positioning platform 411. At this time, the ceramic plate positioning platform 411 is initially stopped in the loading area of ​​the conveying base 1 by the bottom moving slider 317 and guide slider 316.

[0046] Step 2: Flexible centering and clamping of ceramic substrate

[0047] Lateral centering drive: The built-in dual-head motor 415 starts, and the lead screws 416 at both ends rotate synchronously in opposite directions, driving the clamping sliders 417 in the moving slide groove 413 to move towards each other; at the same time, the rectangular sliders 418 in the clamping guide groove 412 slide synchronously along the guide slide rod 414 to ensure that the moving clamping plate 4114 smoothly approaches the substrate.

[0048] Flexible clamping takes effect: the slide bar 4115 on the movable clamping plate 4114 drives the clamping pad 4116 to contact the substrate side. The spring on the outer wall of the slide bar 4115 is compressed to generate elastic force, which buffers the clamping force through deformation and avoids damage to the substrate by rigid contact; the limiting plate restricts the slide bar 4115 from sliding too much and ensures that the clamping force is controllable.

[0049] Auxiliary positioning: The buffer pad 4113 on the stationary clamping positioning plate 419, under the action of the buffer spring 4112 and the small damping rod 4111, fits against the other side of the substrate. The elastic restoring force of the spring assists the substrate in completing the clamping with the moving clamping plate 4114. At the same time, the damping rod absorbs the clamping impact and further stabilizes the positioning.

[0050] Step 3: Exposure Position Transport

[0051] Motion drive start: The drive motor 312 of the exposure conveying moving part 3 starts, and the output end drives the threaded screw 315 to rotate in the moving slide rail 313; the moving slider 317 converts the rotational motion into linear motion through the threaded engagement of the hexagonal nut 318 and the threaded screw 315, and slides along the moving slide rail 313.

[0052] Stable guiding and conveying: The guide slider 316 slides synchronously along the guide rail 314, limiting the lateral displacement of the ceramic plate positioning platform 411, ensuring that it drives the positioned ceramic substrate to move smoothly and convey it to the exposure area directly below the exposure machine 5.

[0053] Step 4: Exposure Processing and Reset

[0054] Exposure machine 5 exposes the positioned ceramic substrate. After exposure, drive motor 312 rotates in the reverse direction, driving the moving slider 317 and ceramic plate positioning platform 411 to return to the initial position via threaded screw 315. Built-in dual-head motor 415 drives in the reverse direction, moving clamping plate 4114 to release the substrate. The operator removes the processed substrate, completing one processing cycle.

[0055] Finally, it should be noted that the above description is merely a preferred embodiment of this utility model and is not intended to limit the utility model. Although the utility model has been described in detail with reference to the foregoing embodiments, those skilled in the art can still modify the technical solutions described in the foregoing embodiments or make equivalent substitutions for some of the technical features. Any modifications, equivalent substitutions, improvements, etc., made within the spirit and principles of this utility model should be included within the protection scope of this utility model.

Claims

1. A ceramic substrate exposure machine, comprising a conveying base (1), an exposure conveying moving part (3), and a ceramic plate flexible centering clamping and positioning part (4), characterized in that: The bottom outer wall of the conveying base (1) is symmetrically fixed with a support plate (2), and the bottom outer wall of the support plate (2) is symmetrically fixed with a support pad. The top of the conveying base (1) is provided with an exposure machine (5). The exposure conveying moving part (3) is provided inside the conveying base (1). The ceramic plate flexible centering clamping and positioning part (4) is provided inside the conveying base (1) and on the top of the exposure conveying moving part (3). The flexible centering and clamping positioning part (4) of the ceramic plate specifically includes: A ceramic plate positioning platform (411) is installed inside the conveying base (1); A built-in dual-head motor (415) is installed inside the ceramic plate positioning platform (411); A stationary clamping and positioning plate (419) is symmetrically fixedly installed on the top of the conveying base (1); Buffer springs (4112) are equidistantly arranged on one side of the outer wall of the stationary clamping positioning plate (419).

2. The ceramic substrate exposure machine according to claim 1, characterized in that: The exposure transport moving part (3) specifically includes: The mounting groove (311) is formed on the top outer wall of the conveying base (1); The drive motor (312) is fixedly installed on one side of the outer wall of the conveying base (1); Guide rails (314) are symmetrically fixedly installed on the inner wall of the mounting groove (311); The movable slide rail (313) is fixedly installed on the inner wall of the mounting groove (311).

3. The ceramic substrate exposure machine according to claim 2, characterized in that: The output end of the drive motor (312) is fixedly connected to a threaded screw (315). The other end of the threaded screw (315) movably penetrates the outer wall of the conveying base (1) and extends into the interior of the movable slide rail (313). The other end of the threaded screw (315) is rotatably connected to the inner wall of the mounting groove (311).

4. The ceramic substrate exposure machine according to claim 3, characterized in that: The movable slide rail (313) has a movable slider (317) slidably installed inside. A hexagonal groove is provided on one side of the movable slider (317), and a hexagonal nut (318) is fixedly installed inside the hexagonal groove. The movable slider (317) is threadedly connected to the threaded screw (315) through the hexagonal nut (318). Guide sliders (316) are slidably installed on the outer wall of the guide slide rail (314).

5. The ceramic substrate exposure machine according to claim 1, characterized in that: The ceramic plate positioning platform (411) is fixedly installed on the top outer wall of the movable slider (317) and the guide slider (316). The top outer wall of the ceramic plate positioning platform (411) is symmetrically provided with clamping guide groove (412) and movable slide groove (413). The inner wall of the movable slide groove (413) is provided with a mounting circular groove. The movable slide groove (413) is connected through the mounting circular groove. The built-in double-head motor (415) is fixedly installed inside the mounting circular groove. Both ends of the built-in double-head motor (415) are fixedly connected with lead screws (416). The other end of the lead screws (416) is rotatably connected to the inner wall of the movable slide groove (413).

6. The ceramic substrate exposure machine according to claim 5, characterized in that: Guide slide rods (414) are fixedly connected between the inner walls of the clamping guide groove (412). A rectangular slider (418) is slidably installed inside the clamping guide groove (412). The rectangular slider (418) is sleeved on the outer wall of the guide slide rod (414). A clamping slider (417) is slidably installed inside the movable slide groove (413). The clamping slider (417) is threadedly connected to the lead screw (416). A movable clamping plate (4114) is fixedly installed on the top outer wall of both the clamping slider (417) and the rectangular slider (418). A through-hole is symmetrically opened on the movable clamping plate (4114). A slide rod (4115) is slidably installed inside the through-hole.

7. A ceramic substrate exposure machine according to claim 6, characterized in that: One end of the slide rod (4115) extends to one side of the outer wall of the movable clamping plate (4114). One end of the slide rod (4115) is fixedly connected to a limiting plate. The other end of the slide rod (4115) extends to the other side of the outer wall of the movable clamping plate (4114). A clamping pad (4116) is fixedly installed on the other end of the slide rod (4115). A spring is sleeved on the outer wall of the slide rod (4115). One end of the spring is fixedly connected to the outer wall of the limiting plate, and the other end of the spring is fixedly connected to one side of the outer wall of the movable clamping plate (4114).

8. The ceramic substrate exposure machine according to claim 7, characterized in that: Small damping rods (4111) are fixedly installed at equal intervals on the outer wall of the stationary clamping positioning plate (419). A buffer pad (4113) is fixedly installed on the telescopic end of the small damping rod (4111). A buffer spring (4112) is sleeved on the outer wall of the small damping rod (4111). The two ends of the buffer spring (4112) are fixedly connected to the buffer pad (4113) and the outer wall of the stationary clamping positioning plate (419), respectively.

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