Frame cassette

Abstract

A frame cassette includes a frame carrier, a gas distribution manifold, and a gas exhaust manifold. The frame carrier carries a plurality of substrates in a vertical stack. The gas distribution manifold includes an inlet port and a plurality of rows of distribution ports arranged along a vertical direction. The gas exhaust manifold includes an outlet port and a plurality of rows of exhaust ports arranged along the vertical direction and configured to collect purge gas. A value of pneumatic conductance of each row of distribution ports increases with a length of a gas flow path in the gas distribution manifold from the inlet port to each row of distribution ports. A lateral flow of purge gas is introduced between the inlet port and the outlet port by pressurizing the inlet port relative to the outlet port while applying a flow of purge gas to the inlet port.

Description

Technical Field

[0001] This utility model relates to a frame cartridge. More specifically, this utility model relates to a frame cartridge that can provide uniformly purified gas. Background Technology

[0002] In semiconductor manufacturing, related frame cartridge designs suffer from inefficient gas purge processes due to uneven ventilation. These methods typically involve a single bottom hole, which fails to achieve uniform ventilation within the cartridge. This deficiency causes internal gas stagnation, leading to surface contamination. This contamination is a major cause of unbonded defects, severely impacting manufacturing yield. Inefficient gas purge can also cause surface contamination prior to hybrid and fusion bonding processes, resulting in unbonded defects and lower yields. This problem is particularly significant in advanced packaging technologies. The inability to effectively remove internal gases hinders the overall efficiency and reliability of semiconductor devices manufactured using these methods. Utility Model Content

[0003] The purpose of this invention is to provide a frame cartridge to solve at least one of the above-mentioned problems.

[0004] This utility model provides a frame cartridge, including a frame support, a gas distribution manifold, and a gas exhaust manifold. The frame support is configured to support a plurality of vertically stacked substrates. The gas distribution manifold includes an inlet port and multiple rows of distribution ports arranged along a vertical direction and configured to inject a purge gas between multiple vertically adjacent pairs of substrates. Each row of distribution ports has a pneumatic conduction value, and the pneumatic conduction value of each row of distribution ports increases with the length of the gas flow path from the inlet port to each row of distribution ports within the gas distribution manifold. The gas exhaust manifold includes an outlet port and multiple rows of exhaust outlets arranged along a vertical direction and configured to collect the purge gas.

[0005] According to one embodiment of the present invention, it further includes: a gas inlet seal configured to provide a gas inlet passage to an inlet port when mated with a mated gas supply connector; and a gas outlet seal configured to provide a gas outlet passage from an outlet port when mated with a mated gas discharge connector.

[0006] According to one embodiment of the present invention, each outlet has a pneumatic conduction value, and the pneumatic conduction value of each outlet increases with the length of the gas flow path from each outlet to the outlet port in the gas discharge manifold.

[0007] According to one embodiment of the present invention, the gas distribution manifold includes a portion of a frame support and includes a plurality of perforated distribution manifold branches; each perforated distribution manifold branch includes a sidewall containing a row of distribution ports selected from a plurality of distribution ports; and each perforated distribution manifold branch is an outer peripheral portion configured to support one of a plurality of substrates.

[0008] According to one embodiment of the present invention, the frame support includes a plurality of distribution side spacers configured to support the outer peripheral portion of one of a plurality of substrates respectively; the gas distribution manifold includes a plurality of perforated distribution manifold branches, each distribution manifold branch including a side wall containing a row of distribution ports selected from a plurality of distribution ports; and each distribution side spacer contacts the top surface of one of the plurality of perforated distribution manifold branches.

[0009] According to one embodiment of the present invention, for each pair of a row of distribution ports and a row of outlets between multiple substrates located at vertically adjacent positions, a horizontal plate containing multiple geometric centers of the row of distribution ports is vertically offset relative to a horizontal plate containing multiple geometric centers of the row of outlets.

[0010] According to one embodiment of the present invention, the frame cartridge includes a pair of first sidewalls parallel to a first horizontal direction and a pair of second sidewalls parallel to a second horizontal direction; multiple rows of dispensing ports and multiple rows of dispensing outlets are laterally spaced from each other along the first horizontal direction; and the dispensing ports in each row of dispensing ports are laterally spaced from each other along the second horizontal direction.

[0011] According to one embodiment of the present invention, the frame cartridge includes a pair of first sidewalls parallel to a first horizontal direction and a pair of second sidewalls parallel to a second horizontal direction; a first subset of the dispensing ports in each row of dispensing ports is laterally spaced from each other along the second horizontal direction; and a second subset of the dispensing ports in each row of dispensing ports is laterally spaced from each other along the first horizontal direction.

[0012] According to one embodiment of the present invention, the area of ​​each distribution port in the multi-row distribution port increases with the length of the gas flow path from the inlet port to each distribution port in the gas distribution manifold.

[0013] According to one embodiment of the present invention, the total number of distribution ports in each row of distribution ports increases with the length of the gas flow path from the inlet port to each row of distribution ports in the gas distribution manifold, or the vertical dimension of the distribution port in each row of distribution ports increases with the length of the gas flow path from the inlet port to each row of distribution ports in the gas distribution manifold, or the lateral dimension of the distribution port in each row of distribution ports increases with the length of the gas flow path from the inlet port to each row of distribution ports in the gas distribution manifold. Attached Figure Description

[0014] The embodiments of this utility model can be better understood from the following detailed description and the accompanying drawings. It should be noted that, according to industry standard practice, the various components in the drawings are not necessarily drawn to scale. In fact, the dimensions of various components may be arbitrarily enlarged or reduced for clarity of illustration.

[0015] Figures 1A to 1D This is a vertical cross-sectional view of various configurations of the frame cartridge when positioned on a docking unit according to an embodiment of the present invention.

[0016] Figures 2A to 2S This is a side view of portions of the gas distribution manifold and gas discharge manifold of various configurations of the frame cartridge according to an embodiment of the present invention. Figures 2A to 2S From top to bottom, each of the following side views includes: a portion of the perforated distribution manifold branch at the furthest end of the gas distribution manifold located between multiple pairs of adjacent substrates; a portion of the perforated distribution manifold branch at the nearest end of the gas distribution manifold located between multiple pairs of adjacent substrates; a portion of the furthest branch of the gas exhaust manifold located between multiple pairs of adjacent substrates; and a portion of the nearest branch of the gas exhaust manifold located between multiple pairs of adjacent substrates.

[0017] Figures 3A to 3E This is a top view of various configurations of a frame cartridge according to an embodiment of the present invention.

[0018] Figure 4 The first flowchart illustrates the steps of purifying gas flowing in a frame cartridge according to an embodiment of the present invention.

[0019] Figure 5 This is a second flowchart illustrating the steps of storing a substrate in a frame cartridge according to an embodiment of the present invention.

[0020] The attached figures are labeled as follows:

[0021] 10:Substrate

[0022] 20: Outer shell wall

[0023] 30: Gas distribution manifold / frame support

[0024] 32: Gas inlet seal

[0025] 34: Entry Port

[0026] 35: Distribution manifold mainline

[0027] 36: Perforated distribution manifold branch

[0028] 36_1: First perforated distribution manifold branch line

[0029] 36_2: Second perforated distribution manifold branch line

[0030] 36_i: The i-th perforated manifold branch

[0031] 36_(N-1): The (N-1)th perforated manifold branch

[0032] 36_N: Nth perforated manifold branch

[0033] 37: Distribution port

[0034] 38: Distributed side spacers / frame load-bearing components

[0035] 40: Gas exhaust manifold / frame support

[0036] 42: Gas outlet seal

[0037] 44: Export Port

[0038] 45: Drainage manifold main line

[0039] 46: Perforated drain manifold branch

[0040] 46_1: First perforated discharge manifold branch line

[0041] 46_2: Second perforated discharge manifold branch line

[0042] 46_i: The i-th perforated manifold branch

[0043] 46_(N-1): N-1th perforated manifold branch

[0044] 46_N: Nth perforation discharge manifold branch

[0045] 47: Discharge outlet

[0046] 48: Discharge side spacer / frame load-bearing component

[0047] 50: Docking Unit

[0048] 52: Gas supply connector

[0049] 58: Gas Exhaust Connector

[0050] 100: Frame cartridge

[0051] 410: Steps

[0052] 420: Steps

[0053] 510: Steps

[0054] 520: Steps

[0055] 530: Steps

[0056] hd1: First horizontal direction

[0057] hd2: Second horizontal direction Detailed Implementation

[0058] The following disclosure provides many different embodiments or examples to implement different features of this invention. The following disclosure describes specific examples of the various components and their arrangements for simplification. Of course, these specific examples are not intended to be limiting. For example, if an embodiment of this utility model describes a first feature formed on or above a second feature, it indicates that it may include embodiments where the first and second features are in direct contact, or embodiments where an additional feature is formed between the first and second features, so that the first and second features may not be in direct contact. Furthermore, the same reference numerals and / or designations may be repeated in different examples of the following disclosure. These repetitions are for simplification and clarity and are not intended to limit the specific relationship between the different embodiments and / or structures described.

[0059] Furthermore, to facilitate the description of the relationship between one element or feature and another (plural) element or feature in the accompanying drawings, spatially related terms such as "below," "below," "under," "above," "above," and similar terms may be used. In addition to the orientations shown in the drawings, spatially related terms cover different orientations of the device during use or operation. The device may also be positioned otherwise (rotated 90 degrees or in other orientations), and the spatially related descriptions used herein may be interpreted accordingly. Unless otherwise expressly stated, each element with the same reference numerals is assumed to have the same material composition and thickness within the same thickness range.

[0060] The embodiments disclosed herein represent novel and efficient internal air purification designs for frame cartridges used in semiconductor manufacturing. In a related frame cartridge with a single bottom hole, the purification gas flow provides a non-uniform purification gas flow pattern. This non-uniform purification gas flow pattern can cause purification gas to stagnate in localized volumes. Prolonged stagnation of purification gas in localized volumes can lead to contamination on the substrate surface, potentially resulting in non-bonding defects and reduced manufacturing yield.

[0061] Embodiments of this invention utilize a gas distribution manifold and a gas exhaust manifold to ensure effective and uniform distribution of purified gas within the frame cartridge. The combination of the gas distribution manifold and the gas exhaust manifold provides a highly efficient internal air purification design for the frame cartridge. The gas distribution manifold may include multiple perforated distribution manifold branches. Each of the multiple perforated distribution manifold branches may include a row of distribution ports, and each of the multiple perforated exhaust manifold branches may include a row of exhaust ports. The pneumatic conduction of this row of distribution ports and this row of exhaust ports may vary along the vertical direction, such that an increase in gas travel distance is compensated by the larger pneumatic conduction of each row of distribution ports and each row of exhaust ports. Relatively uniform purified gas flow is provided throughout the entire volume of the frame cartridge in various disclosed embodiments. Therefore, the density and / or size of the distribution ports in the gas distribution manifold may increase as a function of the distance from the inlet port to the distribution port, and the density and / or size of the exhaust ports in the gas exhaust manifold may increase as a function of the distance from the exhaust port to the outlet port. The design of the dispensing and venting ports ensures that the purified gas is effectively kept away from the released material in the volume of the frame cartridge, thus avoiding substrate contamination and improving process yield in subsequent process steps, such as the bonding step.

[0062] Figures 1A to 1D A vertical cross-sectional view of various embodiments of a frame cassette 100 with a mounting substrate 10 positioned above a docking unit 50 according to an embodiment of the present invention. As used herein, “frame cassette” refers to any instrument designed to carry and support vertically stacked substrates 10 (e.g., semiconductor wafers) during manufacturing processes.

[0063] Please see Figure 1A The first configuration of the frame cartridge 100 is shown, with the frame cartridge 100 loaded with the substrate 10 and positioned on the docking unit 50. According to one aspect of the present invention, the frame cartridge 100 of the disclosed embodiment may include a housing wall 20 (which may be a transparent container with an opening to allow the substrate 10 to pass through), a frame support including mechanical elements for physically supporting the substrate 10 once it is supported, a gas distribution manifold 30 for distributing purified gas from a distribution side, and a gas exhaust manifold 40 for collecting purified gas from an exhaust side. The components of the frame cartridge 100 are configured to manage the flow of purified gas, ensuring uniform gas distribution and effective removal of contaminants from the substrate 10 when it is stored within the housing wall 20.

[0064] The gas distribution manifold 30 includes a main distribution manifold 35 extending in a vertical direction and having a pair of inner and outer walls parallel to the proximal sidewall of the housing wall 20; a plurality of perforated distribution manifold branches 36 arranged in a vertical direction, spaced perpendicularly from each other, adjacent to the main distribution manifold 35, and including rows of distribution ports 37 facing the central region of the inner housing volume of the housing wall 20; and an inlet port 34 located near the path of the purified gas entering the housing and into the inner housing wall 20.

[0065] The gas exhaust manifold 40 includes an exhaust manifold main line 45 extending in a vertical direction and having a pair of inner and outer walls parallel to the proximal sidewall of the housing wall 20; a plurality of perforated exhaust manifold branches 46 arranged in a vertical direction, perpendicularly spaced from each other, adjacent to the exhaust manifold main line 45, and including exhaust outlets 47 facing the central region of the inner housing volume of the housing wall 20; and an outlet port 44 located near the path of the purified gas leaving the housing and going outside the housing wall 20.

[0066] The frame cartridge 100 may include a gas inlet seal 32 configured to provide a gas inlet passage to an inlet port 34 when mated with a gas supply connector 52 in the docking unit 50; and a gas outlet seal 42 configured to provide a gas outlet passage from an outlet port 44 when mated with a gas exhaust connector 58 in the docking unit 50. The dashed arrows indicate the direction of flow of the purified gas, which may include and / or be substantially composed of nitrogen or clean dry air (CDA). The gas supply connector 52 and the gas exhaust connector 58 may be provided with various sealing mechanisms, automatic valves, filters, and / or mechanical components known in the art that provide a tight and leak-tight connection when the frame cartridge 100 is mated with the docking unit 50.

[0067] Substrate 10 can be any type of substrate used in semiconductor manufacturing. Non-limiting examples of substrate 10 include silicon wafers having various semiconductor devices and / or interconnect-level dielectric material layers, organic interposer substrates having two-dimensional organic interposers before dicing, reconstituted wafers having semiconductor grains arranged in a two-dimensional configuration in a molding compound matrix, etc. In a top view, substrate 10 can be circular, rectangular, rounded rectangular, or any other shape having a suitable outer periphery that provides stable physical support when mounted on the surface of the frame support (30, 40).

[0068] The frame support members (30, 40) are collectively referred to as the assembly of all mechanical components, which are used to hold the substrate 10 in place when it is stored within the housing wall 20. Therefore, the frame support members (30, 40) are functional components that provide support for the substrate 10. In this way, the frame support members (30, 40) can use dedicated mechanical components that do not utilize the gas distribution manifold 30 and / or gas exhaust manifold 40, or physical structures that can utilize the gas distribution manifold 30 and / or gas exhaust manifold 40. Figure 1A In the illustrated example, the frame support members (30, 40) include a combination of a gas distribution manifold 30 and a gas exhaust manifold 40, and utilize the geometric features of the gas distribution manifold 30 and the gas exhaust manifold 40 to provide stable mechanical support to the substrate 10.

[0069] In one embodiment, the perforated distribution manifold branch 36 may have a ledge shape attached to the inner sidewall of the housing wall 20. The lateral protrusion width of the ledge (including the physical surface of the perforated distribution manifold branch 36) may optionally provide an area that overlaps with the outer peripheral region of the overlying substrate 10 to provide stable mechanical support to the overlying substrate 10. For example, the maximum width of the contact area between the perforated distribution manifold branch 36 and the overlying substrate 10 may be between 1 mm and 10 mm, although less or more widths may also be used. Similarly, the perforated drain manifold branch 46 may have a ledge shape attached to another inner sidewall of the housing wall 20. The lateral protrusion width of the ledge (including the physical surface of the perforated drain manifold branch 46) may optionally provide a sufficient area that overlaps with the outer peripheral region of the overlying substrate 10 to provide stable mechanical support to the overlying substrate 10. For example, the maximum width of the contact area between the perforated discharge manifold branch 46 and the overlying substrate 10 can be between 1 mm and 10 mm, although less or more widths may also be used.

[0070] Each perforated distribution manifold branch 36 includes a row of distribution ports 37 configured to inject purge gas between a pair of vertically adjacent substrates 10, above the highest point of substrate 10, or below the lowest point of substrate 10. The rows of distribution ports 37 may be arranged in a horizontal direction, which may be a horizontal direction extending laterally along the main distribution manifold line 35. Each row of distribution ports 37 may have a corresponding value for pneumatic conductance.

[0071] As used in this article, "aerodynamic conduction" refers to the ease with which gas flows through a perforated surface or pore. Generally, the rate of gas flow through pores or porous media is determined by factors such as size, shape, number of pores, and the pressure difference across them. Therefore, larger sizes and more pores result in higher aerodynamic conduction, allowing for more efficient gas flow. Aerodynamic conduction is a measure of this velocity and is typically quantified as volumetric flow per unit pressure difference. Aerodynamic conduction for any perforated surface can be determined by the formula C = Q / ΔP, where C represents aerodynamic conduction, Q represents the volumetric velocity of the gas, and ΔP represents the pressure difference across the surface. Aerodynamic conduction for any perforated surface can be calculated by considering the combined effect of all individual pores, their individual sizes, shapes, and distributions.

[0072] According to one aspect of this utility model embodiment, the aerodynamic conduction value of each row of distribution ports 37 increases with the length of the gas flow path within the gas distribution manifold 30 from the inlet port 34 to each row of distribution ports 37 (i.e., to each perforated distribution manifold branch 36). For example, the perforated distribution manifold branches 36 can be numbered sequentially with positive integers starting from 1 according to the length of the gas flow path within the gas distribution manifold 30 from the inlet port 34 to each perforated distribution manifold branch 36. When the total number of perforated distribution manifold branches 36 is N, the perforated distribution manifold branches 36 may include a first perforated distribution manifold branch 36_1 with the shortest gas flow path starting from the inlet port 34, a second perforated distribution manifold branch 36_2 with the second shortest gas flow path starting from the inlet port 34, and so on up to the Nth perforated distribution manifold branch 36_N with the longest gas flow path starting from the inlet port 34. For any positive integer i less than (N+1), the i-th perforation allocation manifold branch 36_i is provided. The value of the integer N can be between 2 and 51, for example, between 3 and 26.

[0073] According to an embodiment of the present invention, the aerodynamic conduction value of each outlet 47 increases with the length of the gas flow path within the gas discharge manifold 40 from each outlet 47 (i.e., from each perforated outlet manifold branch 46) to the outlet port 44. For example, the perforated outlet manifold branches 46 can be numbered sequentially with positive integers starting from 1 according to the length of the gas flow path within the gas discharge manifold 40 from each perforated outlet manifold branch 46 to the outlet port 44. When the total number of perforated outlet manifold branches 46 is N, the perforated outlet manifold branches 46 may include a first perforated outlet manifold branch 46_1, having the shortest gas flow path to the outlet port 44, a second perforated outlet manifold branch 46_2, having the second shortest gas flow path to the outlet port 44, and so on up to the Nth perforated outlet manifold branch 46_N, having the longest gas flow path to the outlet port 44. For any positive integer i less than (N+1), the i-th perforation discharge manifold branch 46_i is provided.

[0074] By pressurizing the inlet port 34 relative to the outlet port 44 and simultaneously applying an airflow of purified gas to the inlet port 34, a lateral flow of purified gas can be introduced between the inlet port 34 and the outlet port 44. The purified gas carries away outgassed molecules from the various materials of the substrate, thereby preventing the outgassed molecules from reacting with other materials on the substrate. Therefore, the formation of reaction byproducts on the surface of the substrate 10 can be mitigated or even avoided.

[0075] The pneumatic conduction of the main distribution manifold 35 is limited, and the pneumatic conduction of the main discharge manifold 45 is also limited. Therefore, if the pneumatic conduction of each perforated distribution manifold branch 36 is the same, the velocity of the purified gas from the inlet port 34 to the perforated distribution manifold branch 36 will decrease as a function of the length of the gas flow path through the main distribution manifold 35. According to one aspect of the present invention, the pneumatic conduction value of each row of distribution ports 37 increases by a certain amount with the length of the gas flow path within the gas distribution manifold 30 from the inlet port 34 to each perforated distribution manifold branch 36, which compensates for the reduction in purified gas flow due to the difference in gas flow distance through the main distribution manifold 35. Therefore, the velocity of purified gas through each row of distribution ports 37 (i.e., through each perforated distribution manifold branch 36) can be the same or approximately the same (e.g., within + / -20%, and more preferably within + / -10% of the target value). In some embodiments, the flow rate of the purified gas through the highest perforated distribution manifold branch 36 (i.e., the Nth perforated distribution manifold branch 36_N) and / or through the lowest perforated distribution manifold branch 36 (i.e., the first perforated distribution manifold branch 36_1) can be adjusted as needed to account for differences in the volume of purified gas injected.

[0076] Similarly, with the same aerodynamic conduction in each perforated exhaust manifold branch 46, the velocity of the purified gas from the perforated exhaust manifold branch 46 to the outlet port 44 will decrease as a function of the length of the gas flow path through the main exhaust manifold 45. According to one aspect of this embodiment, the aerodynamic conduction value of each row's outlet 47 increases by a certain amount with the length of the gas flow path within the gas exhaust manifold 40 from each perforated exhaust manifold branch 46 to the outlet port 44, compensating for the reduction in purified gas flow due to differences in the gas flow distance through the main exhaust manifold 45. Therefore, the velocity of the purified gas through each row's outlet 47 (i.e., through each perforated exhaust manifold branch 46) can be the same or approximately the same (e.g., within + / -20%, and more preferably within + / -10% of the target value). In some embodiments, the flow rate of the purified gas through the highest perforated discharge manifold branch 46 (i.e., the Nth perforated discharge manifold branch 46_N) and / or through the lowest perforated discharge manifold branch 46 (i.e., the first perforated discharge manifold branch 46_1) can be adjusted as needed to account for differences in the volume of purified gas injected.

[0077] Generally speaking, for at least one set of perforated distribution manifold branches 36, the aerodynamic conduction value of each row of distribution ports 37 increases with the length of the gas flow path within the gas distribution manifold 30 from the inlet port 34 to each row of distribution ports 37, except for the lowest perforated distribution manifold branch 36 (i.e., the first perforated distribution manifold branch 36_1) and the highest perforated distribution manifold branch 36 (i.e., the Nth perforated distribution manifold branch 36_N). Furthermore, for at least one set of perforated discharge manifold branches 46, the aerodynamic conduction value of each row of discharge outlets 47 increases with the length of the gas flow path within the gas discharge manifold 40 from each row of discharge outlets 47, except for the lowest perforated discharge manifold branch 46 (i.e., the first perforated discharge manifold branch 46_1) and the highest perforated discharge manifold branch 46 (i.e., the Nth perforated discharge manifold branch 46_N).

[0078] It should be noted that when a gas distribution manifold “includes” each row of distribution ports 37 or perforated distribution manifold branches, these rows or these manifold branches may or may not include each and all rows, or each and all manifold branches. Similarly, when a gas discharge manifold “includes” each row of discharge outlets 47 or perforated discharge manifold branches, these rows or these manifold branches may or may not include each and all rows, or each and all manifold branches. For any group of at least two rows of distribution ports 37 in any set of perforated distribution manifold branches 36 other than the lowest perforated distribution manifold branch 36 (i.e., the first perforated distribution manifold branch 36_1) and the highest perforated distribution manifold branch 36 (i.e., the Nth perforated distribution manifold branch 36_N), the aerodynamic conduction value of each row of distribution ports 37 increases with the length of the gas flow path within the gas distribution manifold 30 from the inlet port 34 to each row of distribution ports 37. Similarly, for any group of at least two rows of outlets 47 in any set of perforated outlet manifold branches 46 other than the lowest perforated outlet manifold branch 46 (i.e., the first perforated outlet manifold branch 46_1) and the highest perforated outlet manifold branch 46 (i.e., the Nth perforated outlet manifold branch 46_N), the aerodynamic conduction value of each outlet 47 increases with the length of the gas flow path within the gas outlet manifold 40 from each outlet 47 to the outlet port 44.

[0079] By adjusting the pneumatic conduction of the perforated distribution manifold branch 36 and / or the pneumatic conduction of the perforated discharge manifold branch 46, purified gas at the same or near-the same flow rate can be provided on the entire physically exposed surface of the substrate 10, and the gas release problem caused by the material composition of the substrate 10 can be effectively solved.

[0080] Generally speaking, the frame load-bearing components (30, 40) can be provided in various configurations according to different embodiments. Figure 1A In the first embodiment configuration of the frame cartridge 100 shown in the drawing, the gas distribution manifold 30 includes a portion of the frame support members (30, 40) and includes a plurality of perforated distribution manifold branches 36. Each perforated distribution manifold branch 36 includes a respective sidewall containing a row of distribution ports 37 selected from multiple rows of distribution ports 37. Each perforated distribution manifold branch 36 is configured to support an outer peripheral portion of one of the substrates 10. Furthermore, the gas exhaust manifold 40 includes a portion of the frame support members (30, 40) and includes a plurality of perforated exhaust manifold branches 46. Each perforated exhaust manifold branch 46 includes a respective sidewall containing a row of exhaust ports 47 selected from multiple rows of exhaust outlets 47. Each perforated exhaust manifold branch 46 is configured to support an outer peripheral portion of one of the substrates 10.

[0081] Please see Figure 1BThe second embodiment configuration of the frame card holder 100 according to this utility model is illustrated. The second embodiment configuration of the frame card holder 100 can be derived from... Figure 1A The first configuration of the frame cartridge 100 drawn in the figure is derived by using a set of additional mechanical structures using elements such as frame support members (30, 40, 38). Specifically, in Figure 1B In the second embodiment configuration of the frame cartridge 100 shown in the drawing, the gas distribution manifold 30 can be moved downward by a vertical offset distance relative to the first embodiment configuration of the frame cartridge 100, but is not moved. Figure 1A The gas exhaust manifold 40 in the first configuration of the frame cartridge 100 is drawn in the image. Generally, the vertical offset distance is less than... Figure 1A The first embodiment of the frame cartridge 100 depicted in the drawing shows a vertical spacing between adjacent pairs of substrates 10. In a second embodiment of the frame cartridge 100, a dispensing side spacer 38 may be mounted on the top surface of the perforated dispensing manifold branch 36, except for the top surface of the highest perforated dispensing manifold branch 36. The dispensing side spacer 38 may comprise any structurally robust material, such as glass, plastic, etc., and may have a vertical thickness equal to the vertical offset distance. Therefore, the substrate 10 may be located on the top surface of the dispensing side spacer 38 and on the top surface of the lugs including the perforated discharge manifold branch 46.

[0082] In the second embodiment configuration, the frame support members (30, 40, 38) include a plurality of distribution-side spacers 38 configured to support the outer peripheral portion of one of the substrates 10. The gas distribution manifold 30 includes a plurality of perforated distribution manifold branches 36, each distribution manifold branch 36 including a respective sidewall containing a row of distribution ports 37 selected from multiple rows of distribution ports 37. Each distribution-side spacer 38 contacts the top surface of one of the perforated distribution manifold branches 36.

[0083] In the second embodiment configuration, for each pair of perforated distribution manifold branches 36 and perforated discharge manifold branches 46 facing each other between adjacent pairs of substrates 10, the perforated distribution manifold branches 36 are moved downward relative to the perforated discharge manifold branches 46. Once the purge gas flows into the housing wall 20, the gas velocity vector field can be calculated over the entire volume within the housing wall 20 that is not filled with any solid phase material. Because of the vertical offset between each pair of perforated distribution manifold branches 36 and perforated discharge manifold branches 46 facing each other between adjacent pairs of substrates 10, the average value of the gas velocity vector between each pair of vertically adjacent substrates 10 (as seen in a plan view (e.g., viewed from a top view), calculated over the corresponding volume defined by the pair of vertically adjacent substrates 10 and the periphery of substrates 10) includes a horizontal component from the perforated distribution manifold branches 36 and perforated discharge manifold branches 46, and also includes an upward vertical component. Therefore, for each pair of rows of distribution ports 37 and rows of outlets 47 located between vertically adjacent pairs of substrates 10 selected from the vertically stacked substrates 10, the average value of the gas velocity vector represents that the gas flow velocity of the purified gas has a non-zero vertical component.

[0084] Please see Figure 1C The diagram illustrates a third embodiment configuration of the frame cartridge 100 according to an embodiment of the present invention. The third embodiment configuration of the frame cartridge 100 can be derived from... Figure 1A The first embodiment of the frame cartridge 100 drawn in the figure is derived from the configuration by using a set of additional mechanical structures using elements such as frame carriers (30, 40, 48). Specifically, in Figure 1C In the third embodiment configuration of the frame cartridge 100 shown in the drawing, the gas exhaust manifold 40 can be moved downward by a vertical offset distance relative to the first embodiment configuration of the frame cartridge 100, but is not moved. Figure 1A The first embodiment of the frame cartridge 100 shown in the drawing includes a gas distribution manifold 30. Generally, the vertical offset distance is less than... Figure 1A The first configuration of the frame cartridge 100, as shown in the drawing, depicts the vertical spacing between adjacent pairs of substrates 10. In a third embodiment of the frame cartridge 100, a discharge-side spacer 48 may be mounted on the top surface of the perforated discharge manifold branch 46, except for the top surface of the highest perforated discharge manifold branch 46. The discharge-side spacer 48 may comprise any structurally robust material, such as glass, plastic, etc., and may have a vertical thickness equal to the vertical offset distance. Therefore, the substrate 10 may be located on the top surface of the discharge-side spacer 48 and on the top surface of the lugs including the perforated distribution manifold branch 36.

[0085] In the third embodiment configuration, the frame support members (30, 40, 48) include a plurality of discharge-side spacers 48 configured to support the outer peripheral portion of one of the substrates 10. The gas exhaust manifold 40 includes a plurality of perforated exhaust manifold branches 46, each exhaust manifold branch 46 including a respective sidewall containing a row of exhaust outlets 47 selected from a plurality of exhaust outlets 47. Each discharge-side spacer 48 contacts the top surface of one of the perforated exhaust manifold branches 46.

[0086] In the third embodiment configuration, for each pair of perforated distribution manifold branches 36 and perforated discharge manifold branches 46 facing each other between adjacent pairs of substrates 10, the perforated distribution manifold branches 36 are moved upward relative to the perforated discharge manifold branches 46. Once the purge gas flows into the housing wall 20, the gas velocity vector field can be calculated over the entire volume within the housing wall 20, which is not filled with any solid phase material. Because of the vertical offset between each pair of perforated distribution manifold branches 36 and perforated discharge manifold branches 46 facing each other between vertically adjacent pairs of substrates 10, the average value of the gas velocity vector between each pair of vertically adjacent substrates 10 (as seen in a plan view (e.g., viewed from a top view), calculated over the corresponding volume defined by the pair of vertically adjacent substrates 10 and the outer periphery of substrates 10) includes a horizontal component from the perforated distribution manifold branches 36 and perforated discharge manifold branches 46, and also includes a downward vertical component. Therefore, for each pair of rows of distribution ports 37 and rows of outlets 47 located between vertically adjacent pairs of substrates 10 selected from the vertically stacked substrates 10, the average value of the gas velocity vector represents that the gas flow velocity of the purified gas has a non-zero vertical component.

[0087] Please see Figure 1D The fourth embodiment configuration of the frame cartridge 100 according to this utility model is illustrated. The fourth embodiment configuration of the frame cartridge 100 can be derived from... Figure 1B The second embodiment of the frame cartridge 100 shown in the drawing is derived by using an additional set of mechanical structures, such as frame support members (30, 40, 38, 48). Specifically, in Figure 1D In the fourth embodiment configuration of the frame cartridge 100 drawn in the figure, the gas exhaust manifold 40 can be relative to... Figure 1B The second embodiment of the frame cartridge 100 drawn in the image is configured to be moved downward by a vertical offset distance. The vertical offset distance of the gas exhaust manifold 40 can be the same as that in... Figure 1B The vertical offset distance of the gas distribution manifold 30 used in the second embodiment configuration of the frame cartridge 100 is shown in the drawing. In the fourth embodiment configuration of the frame cartridge 100, the discharge side spacer 48 can be as follows: Figure 1CThe frame cartridge 100, as shown in the third embodiment configuration, is mounted on the top surface of the perforated drain manifold branch 46 in the same manner, except for the top surface of the highest perforated drain manifold branch 46. Therefore, the substrate 10 can be located on the top surface of both the dispensing side spacer 38 and the drain side spacer 48.

[0088] In the fourth embodiment configuration, the frame support members (30, 40, 38, 48) include a plurality of distribution-side spacers 38 configured to support the outer peripheral portion of one of the substrates 10. The gas distribution manifold 30 includes a plurality of perforated distribution manifold branches 36, each distribution manifold branch 36 including a respective sidewall containing a row of distribution ports 37 selected from multiple rows of distribution ports 37. Each distribution-side spacer 38 contacts the top surface of one of the perforated distribution manifold branches 36. Additionally, the frame support members (30, 40, 38, 48) also include a plurality of discharge-side spacers 48 configured to support the outer peripheral portion of one of the substrates 10. The gas discharge manifold 40 includes a plurality of perforated discharge manifold branches 46, each discharge manifold branch 46 including a respective sidewall containing a row of discharge ports 47 selected from multiple rows of discharge outlets 47. Each discharge-side spacer 48 contacts the top surface of one of the perforated discharge manifold branches 46.

[0089] In the fourth embodiment configuration, for each pair of perforated distribution manifold branches 36 and perforated discharge manifold branches 46 facing each other between adjacent pairs of substrates 10, the perforated distribution manifold branches 36 are horizontal relative to the perforated discharge manifold branches 46. Once the purge gas flows into the housing wall 20, the gas velocity vector field can be calculated over the entire volume within the housing wall 20, which is not filled with any solid phase material. The average value of the gas velocity vector between each pair of vertically adjacent substrates 10 (as seen in a plan view (e.g., from a top view), calculated over the corresponding volume defined by the vertically adjacent pair of substrates 10 and the outer periphery of the substrates 10) includes a horizontal component from the perforated distribution manifold branches 36 and the perforated discharge manifold branches 46, and does not include any vertical component.

[0090] Please refer to the following: Figures 1A to 1DA method for storing a substrate 10 in a frame cartridge 100 is provided. First, a frame cartridge 100 is provided, comprising a frame support (30, 40, (38 / 48)), a gas distribution manifold 30 including an inlet port 34 and multiple rows of distribution ports 37 arranged vertically and configured to inject a purified gas, and a gas exhaust manifold 40 including an outlet port 44 and multiple rows of exhaust ports 47 arranged vertically and configured to collect the purified gas. According to one aspect of the present invention, each row of distribution ports 37 includes a respective pneumatic conduction value, and the pneumatic conduction value increases with the length of the gas flow path within the gas distribution manifold 30 from the inlet port 34 to each row of distribution ports 37. The aforementioned method further includes supporting the substrate 10 on the frame support members (30, 40, (38 / 48)) such that for each vertically adjacent pair of substrates 10 selected from the substrate 10, each row distribution port 37 and each row outlet port 47 face each other between the vertically adjacent pairs of substrates 10. Lateral flow of purified gas can be introduced between the inlet port 34 and the outlet port 44 by simultaneously pressurizing the inlet port 34 relative to the outlet port 44 and applying an airflow of purified gas to the inlet port 34.

[0091] Figures 2A to 2S This is a side view of portions of the gas distribution manifold 30 and gas discharge manifold 40 of the frame cartridge 100 according to various configurations of this utility model embodiment. Figures 2A to 2S From top to bottom, each of the following is a side view of the portion of the perforated distribution manifold branch 36 at the farthest end of the gas distribution manifold 30 located between multiple pairs of adjacent substrates 10 (i.e., the (N-1)th perforated distribution manifold branch 36_(N-1)), the portion of the perforated distribution manifold branch 36 at the nearest end of the gas distribution manifold 30 located between multiple pairs of adjacent substrates 10 (i.e., the second perforated distribution manifold branch 36_2), the portion of the farthest branch of the gas exhaust manifold 40 located between multiple pairs of adjacent substrates 10 (i.e., the (N-1)th perforated exhaust manifold branch 46_(N-1)), and the portion of the nearest branch of the gas exhaust manifold 40 located between multiple pairs of adjacent substrates 10 (i.e., the second perforated exhaust manifold branch 46_2).

[0092] As previously explained, except for the lowest perforated distribution manifold branch 36 (i.e., the first perforated distribution manifold branch 36_1) and the highest perforated distribution manifold branch 36 (i.e., the Nth perforated distribution manifold branch 36_N), for any group of at least two rows of distribution ports 37 within a set of perforated distribution manifold branches 36, the aerodynamic conduction value of each row of distribution ports 37 increases with the length of the gas flow path within the gas distribution manifold 30 from the inlet port 34 to each row of distribution ports 37. Adjustments to the aerodynamic conduction of each row of distribution ports 37 can be made by changing the shape and / or size of the distribution ports 37, changing the total number of distribution ports 37 in each row of distribution ports 37, changing the vertical dimension of the distribution ports 37 within the corresponding row of distribution ports 37, changing the lateral dimension of each distribution port 37 within the corresponding row of distribution ports 37, or combinations thereof.

[0093] Similarly, except for the lowest perforated discharge manifold branch 46 (i.e., the first perforated discharge manifold branch 46_1) and the highest perforated discharge manifold branch 46 (i.e., the Nth perforated discharge manifold branch 46_N), for any group of at least two rows of outlets 47 within a set of perforated discharge manifold branches 46, the aerodynamic conduction value of each row of outlets 47 increases with the length of the gas flow path within the gas discharge manifold 40 from each row of outlets 47 to the outlet port 44. Adjustments to the aerodynamic conduction of each row of outlets 47 can be made by changing the shape and / or size of the outlets 47, changing the total number of outlets 47 in each row of outlets 47, changing the vertical dimension of the outlets 47 within the corresponding row of outlets 47, changing the lateral dimension of each outlet 47 within the corresponding row of outlets 47, or combinations thereof.

[0094] Figures 2A to 2S The various embodiments of the perforated distribution manifold branch 36 and the perforated discharge manifold branch 46 shown in the illustration are non-limiting examples, depicting how the pneumatic conduction values ​​are adjusted through each row distribution port 37 and each row discharge port 47. The height of each distribution port 37 is typically between 50 micrometers and 3 millimeters, although smaller or larger heights are also possible. The height of each discharge port 47 is typically between 50 micrometers and 3 millimeters, although smaller or larger heights are also possible. The width of each distribution port 37 is typically between 50 micrometers and 50 millimeters, although smaller or larger widths are also possible. The width of each discharge port 47 is typically between 50 micrometers and 50 millimeters, although smaller or larger widths are also possible. Alternative configurations of the distribution ports 37 and / or discharge ports 47 that provide adjustment of the pneumatic conduction values ​​through each row distribution port 37 and / or through each row discharge port 47 may also be used.

[0095] Please see Figure 2AThe diagram illustrates a first embodiment configuration of the distribution ports 37 and outlet ports 47. The area of ​​each distribution port 37 within each row of distribution ports 37 can increase with the length of the gas flow path within the gas distribution manifold 30 from the inlet port 34 to each row of distribution ports 37. Therefore, among all the rows of distribution pipes 37 located between the highest and lowest substrates 10, the area of ​​each distribution port 37 in the upper row can be larger than the area of ​​each distribution port 37 in the lower row. The area of ​​each outlet port 47 within each row of outlet ports 47 can increase with the length of the gas flow path within the gas discharge manifold 40 from each row of outlet ports 47 to the outlet port 44. Therefore, among all the rows of discharge pipes 47 located between the highest and lowest substrates 10, the area of ​​each outlet port 47 in the upper row can be larger than the area of ​​each outlet port 47 in the lower row. In one embodiment, the distribution ports 37 and outlet ports 47 can be circular or elliptical in shape. The total number of distribution ports 37 in each row can be the same or different. The total number of discharge outlets 47 in each row can be the same or different.

[0096] Please see Figure 2B A second embodiment configuration of the distribution port 37 and the discharge port 47 is shown. This second embodiment configuration of the distribution port 37 and the discharge port 47 can be derived from a first embodiment configuration of the distribution port 37 and the discharge port 47 by using rounded rectangular shapes for the distribution ports 37 and the discharge ports 47. The total number of distribution ports 37 in each row can be the same or different. The total number of discharge ports 47 in each row can be the same or different.

[0097] Please see Figure 2C A third embodiment configuration of the distribution port 37 and the discharge port 47 is shown. This third embodiment configuration of the distribution port 37 and the discharge port 47 can be derived from a second embodiment configuration of the distribution port 37 and the discharge port 47 by laterally elongating the distribution port 37 and the discharge port 47. The total number of distribution ports 37 in each row of distribution ports 37 may be the same or different. The total number of discharge ports 47 in each row of discharge ports 47 may be the same or different.

[0098] Please see Figure 2D A fourth embodiment configuration of the distribution ports 37 and discharge ports 47 is shown. This fourth embodiment configuration of the distribution ports 37 and discharge ports 47 can be derived from a second embodiment configuration of the distribution ports 37 and discharge ports 47, by using the same first vertical dimension for each distribution port 37 and adjusting the lateral dimensions of the distribution ports 37 row by row, and by using the same second vertical dimension for each discharge port 47 and adjusting the lateral dimensions of the discharge ports 47 row by row. The total number of distribution ports 37 in each row can be the same or different. The total number of discharge ports 47 in each row can be the same or different.

[0099] Please see Figure 2E A fifth embodiment configuration of the distribution port 37 and the discharge port 47 is shown. This fifth embodiment configuration of the distribution port 37 and the discharge port 47 can be derived from the fourth embodiment configuration of the distribution port 37 and the discharge port 47 by laterally elongating the distribution port 37 and the discharge port 47. The total number of distribution ports 37 in each row of distribution ports 37 may be the same or different. The total number of discharge ports 47 in each row of discharge ports 47 may be the same or different.

[0100] Please see Figure 2F A sixth embodiment configuration of the distribution port 37 and the discharge port 47 is illustrated. This sixth embodiment configuration of the distribution port 37 and the discharge port 47 can be derived from a second embodiment configuration of the distribution port 37 and the discharge port 47 by providing an overall dimensional offset between the average size of the distribution port 37 and the average size of the discharge port 47. In the illustrated example, the average size of the distribution port 37 can be 1.1 times to 10 times larger than the average size of the discharge port 47. The total number of distribution ports 37 in each row of distribution ports 37 can be the same or different. The total number of discharge ports 47 in each row of discharge ports 47 can be the same or different.

[0101] Please see Figure 2G A seventh embodiment configuration of the distribution port 37 and the discharge port 47 is illustrated. This seventh embodiment configuration of the distribution port 37 and the discharge port 47 can be derived from a second embodiment configuration of the distribution port 37 and the discharge port 47 by providing an overall dimensional offset between the average size of the distribution port 37 and the average size of the discharge port 47. In the illustrated example, the average size of the discharge port 47 can be 1.1 times to 10 times larger than the average size of the distribution port 37. The total number of distribution ports 37 in each row of distribution ports 37 can be the same or different. The total number of discharge ports 47 in each row of discharge ports 47 can be the same or different.

[0102] Please see Figure 2HThe eighth embodiment configuration of the distribution ports 37 and discharge ports 47 is illustrated. The total number of distribution ports 37 in each row of distribution ports 37 can increase with the length of the gas flow path from the inlet port 34 to each row of distribution ports 37 within the gas distribution manifold 30. Therefore, in a group of all rows of distribution ports 37 located between the highest and lowest substrates 10, the total number of distribution ports 37 in the upper row of distribution ports 37 can be greater than the total number of distribution holes 37 in the lower row of distribution ports 37. The total number of discharge ports 47 in each row of discharge ports 47 can increase with the length of the gas flow path from each row of discharge ports 47 to the outlet port 44 within the gas discharge manifold 40. Therefore, in a group of all rows of discharge ports 47 located between the highest and lowest substrates 10, the total number of discharge ports 47 in the upper row of discharge ports 47 can be greater than the total number of discharge holes 47 in the lower row of discharge ports 47. The area of ​​each distribution port 37 may increase with or without increasing the length of the gas flow path within the gas distribution manifold 30 from the inlet port 34 to each distribution port 37. The area of ​​each outlet port 47 may increase with or without increasing the length of the gas flow path within the gas discharge manifold 40 from each outlet port 47 to the outlet port 44. In one embodiment, the distribution ports 37 and outlet ports 47 may have circular or elliptical shapes.

[0103] Please see Figure 2I A ninth embodiment configuration of the distribution port 37 and the outlet port 47 is shown. This ninth embodiment configuration of the distribution port 37 and the outlet port 47 can be derived from an eighth embodiment configuration of the distribution port 37 and the outlet port 47 by using rounded rectangular shapes for the distribution port 37 and the outlet port 47. The area of ​​each distribution port 37 may increase with or without increasing the length of the gas flow path within the gas distribution manifold 30 from the inlet port 34 to each distribution port 37. The area of ​​each outlet port 47 may increase with or without increasing the length of the gas flow path within the gas discharge manifold 40 from each outlet port 47 to the outlet port 44.

[0104] Please see Figure 2JA tenth embodiment configuration of the distribution port 37 and the outlet port 47 is illustrated. This tenth embodiment configuration of the distribution port 37 and the outlet port 47 can be derived from a ninth embodiment configuration of the distribution port 37 and the outlet port 47 by laterally elongating the distribution port 37 and the outlet port 47. The area of ​​each distribution port 37 may increase with or without increasing with the length of the gas flow path within the gas distribution manifold 30 from the inlet port 34 to each distribution port 37. The area of ​​each outlet port 47 may increase with or without increasing with the length of the gas flow path within the gas discharge manifold 40 from each outlet port 47 to the outlet port 44. In the illustrated example, the vertical dimension of the distribution port 37 increases with the length of the gas flow path within the gas distribution manifold 30 from the inlet port 34 to each distribution port 37, and the vertical dimension of the outlet port 47 increases with the length of the gas flow path within the gas discharge manifold 40 from each outlet port 47 to the outlet port 44.

[0105] Please see Figure 2K The eleventh embodiment configuration of the distribution port 37 and the discharge port 47 is shown. The eleventh embodiment configuration of the distribution port 37 and the discharge port 47 can be derived from the ninth embodiment configuration of the distribution port 37 and the discharge port 47, by using the same first vertical dimension for each distribution port 37 and adjusting the lateral dimension of the distribution port 37 row by row, and by using the same second vertical dimension for each discharge port 47 and adjusting the lateral dimension of the discharge port 47 row by row.

[0106] Please see Figure 2L A twelfth embodiment configuration of the distribution port 37 and the outlet 47 is illustrated. This twelfth embodiment configuration of the distribution port 37 and the outlet 47 can be derived from an eleventh embodiment configuration of the distribution port 37 and the outlet 47 by laterally elongating the distribution port 37 and the outlet 47. The area of ​​each distribution port 37 increases with the length of the gas flow path within the gas distribution manifold 30 from the inlet port 34 to each distribution port 37. The area of ​​each outlet 47 increases with the length of the gas flow path within the gas discharge manifold 40 from each outlet 47 to the outlet port 44. In the illustrated example, the lateral dimension of the distribution port 37 increases with the length of the gas flow path within the gas distribution manifold 30 from the inlet port 34 to each distribution port 37, and the lateral dimension of the outlet 47 increases with the length of the gas flow path within the gas discharge manifold 40 from each outlet 47 to the outlet port 44.

[0107] Please see Figure 2MA thirteenth embodiment configuration of the distribution port 37 and the discharge port 47 is illustrated. This thirteenth embodiment configuration of the distribution port 37 and the discharge port 47 can be derived from the ninth embodiment configuration of the distribution port 37 and the discharge port 47 by providing an overall dimensional offset between the average size of the distribution port 37 and the average size of the discharge port 47. In the illustrated example, the average size of the distribution port 37 can be 1.1 times to 10 times larger than the average size of the discharge port 47. The total number of distribution ports 37 in each row of distribution ports 37 can be the same or different. The total number of discharge ports 47 in each row of discharge ports 47 can be the same or different.

[0108] Please see Figure 2N A fourteenth embodiment configuration of the distribution port 37 and the discharge port 47 is illustrated. This fourteenth embodiment configuration of the distribution port 37 and the discharge port 47 can be derived from a ninth embodiment configuration of the distribution port 37 and the discharge port 47 by providing an overall dimensional offset between the average size of the distribution port 37 and the average size of the discharge port 47. In the illustrated example, the average size of the discharge port 47 can be 1.1 times to 10 times larger than the average size of the distribution port 37. The total number of distribution ports 37 in each row of distribution ports 37 can be the same or different. The total number of discharge ports 47 in each row of discharge ports 47 can be the same or different.

[0109] Please see Figure 2O A fifteenth embodiment configuration of the distribution ports 37 and discharge ports 47 is shown. The total number of distribution ports 37 in each row of distribution ports 37 can increase with the length of the gas flow path from the inlet port 34 to each row of distribution ports 37 within the gas distribution manifold 30. Therefore, in a group of all rows of distribution ports 37 located between the highest and lowest substrates 10, the total number of distribution ports 37 in the upper row of distribution ports 37 can be greater than the total number of distribution holes 37 in the lower row of distribution ports 37. The total number of discharge ports 47 in each row of discharge ports 47 can increase with the length of the gas flow path from each row of discharge ports 47 to the outlet port 44 within the gas discharge manifold 40. Therefore, in a group of all rows of discharge ports 47 located between the highest and lowest substrates 10, the total number of discharge ports 47 in the upper row of discharge ports 47 can be greater than the total number of discharge holes 47 in the lower row of discharge ports 47. The area of ​​each distribution port 37 can be the same in each row of distribution ports 37. The area of ​​each discharge port 47 can be the same in each row of discharge ports 47. In one embodiment, the dispensing port 37 and the discharge port 47 may have a circular or elliptical shape.

[0110] Please see Figure 2PA sixteenth embodiment configuration of the dispensing port 37 and the drain port 47 is illustrated. This sixteenth embodiment configuration of the dispensing port 37 and the drain port 47 can be derived from a fifteenth embodiment configuration of the dispensing port 37 and the drain port 47 by using rounded rectangular shapes. The area of ​​each drain port 47 may be the same across all drain ports 47. In one embodiment, the dispensing port 37 and the drain port 47 may have circular or elliptical shapes.

[0111] Please see Figure 2Q A seventeenth embodiment configuration of the dispensing port 37 and the drain port 47 is illustrated. This seventeenth embodiment configuration of the dispensing port 37 and the drain port 47 can be derived from a sixteenth embodiment configuration of the dispensing port 37 and the drain port 47 by laterally elongating them. The area of ​​each drain port 47 may be the same across all drain ports 47. In one embodiment, the dispensing port 37 and the drain port 47 may have a circular or elliptical shape.

[0112] Please see Figure 2R An eighteenth embodiment configuration of the distribution port 37 and the discharge port 47 is illustrated. The eighteenth embodiment configuration of the distribution port 37 and the discharge port 47 can be found from... Figure 2I The sixteenth embodiment configuration of the distribution port 37 and discharge port 47 shown in the drawing is derived by providing an overall dimensional offset between the average size of the distribution port 37 and the average size of the discharge port 47. In the drawn example, the average size of the distribution port 37 may be 1.1 times to 10 times larger than the average size of the discharge port 47. The total number of distribution ports 37 in each row of distribution ports 37 may be the same or different. The total number of discharge ports 47 in each row of discharge ports 47 may be the same or different.

[0113] Please see Figure 2S The nineteenth embodiment configuration of the distribution port 37 and the discharge port 47 is illustrated. The nineteenth embodiment configuration of the distribution port 37 and the discharge port 47 can be found from... Figure 2I The sixteenth embodiment configuration of the distribution port 37 and discharge port 47 shown in the drawing is derived by providing an overall dimensional offset between the average size of the distribution port 37 and the average size of the discharge port 47. In the drawn example, the average size of the discharge port 47 may be 1.1 times to 10 times larger than the average size of the distribution port 37. The total number of distribution ports 37 in each row of distribution ports 37 may be the same or different. The total number of discharge ports 47 in each row of discharge ports 47 may be the same or different.

[0114] According to one aspect of the present invention, various horizontal flow directions of the purified gas can be provided by using various configurations of the gas distribution manifold 30 and the gas discharge manifold 40. Figures 3A to 3E A top view of various configurations of a frame cartridge 100 according to an embodiment of the present invention.

[0115] Please see Figure 3A A first embodiment configuration of a gas distribution manifold 30 and a gas discharge manifold 40 is illustrated. In this configuration, the frame cartridge 100 includes a pair of first sidewalls parallel to a first horizontal direction hd1 and a pair of second sidewalls parallel to a second horizontal direction hd2. The distribution manifold main line 35 may be located on one sidewall of the frame cartridge 100 (e.g., a sidewall of the housing wall 20 parallel to the second horizontal direction hd2), and the discharge manifold main line 45 may be located on the other sidewall of the frame cartridge 100 (e.g., another sidewall of the housing wall 20 parallel to the second horizontal direction hd2). Multiple rows of distribution ports 37 and multiple rows of discharge ports 47 are laterally spaced from each other along the first horizontal direction hd1. Distribution ports 37 within each row of distribution ports 37 are laterally spaced from each other along the second horizontal direction hd2. Discharge ports 47 within each row of discharge ports 47 are laterally spaced from each other along the second horizontal direction hd2. Within the volume of the main portion of the outer shell 20 not occupied by the solid material portion, the flow direction of the purified gas may be parallel to the first horizontal direction hd1. As used herein, the main portion refers to the portion that occupies at least 50% of the total volume.

[0116] Please see Figure 3A A second embodiment configuration of the combination of gas distribution manifold 30 and gas exhaust manifold 40 is illustrated. This second embodiment configuration of the combination of gas distribution manifold 30 and gas exhaust manifold 40 can be derived from a first configuration of gas distribution manifold 30 and gas exhaust manifold 40 by changing the patterns of the distribution ports 37 and / or the exhaust ports 47, such that the total number of distribution ports 37 between at least one pair of vertically adjacent substrates 10 and / or between each pair of vertically adjacent substrates 10 does not match the total number of exhaust ports 47. Figure 3B In the example shown, the total number of distribution ports 37 between a pair of vertically adjacent substrates 10 is half the total number of discharge ports. The flow direction of the purified gas is mainly along the first horizontal direction hd1, but has a horizontal divergence component along the second horizontal direction hd2.

[0117] Please see Figure 3C A third embodiment configuration of the combination of gas distribution manifold 30 and gas exhaust manifold 40 is illustrated. This third embodiment configuration of the combination of gas distribution manifold 30 and gas exhaust manifold 40 can be derived from a first configuration of gas distribution manifold 30 and gas exhaust manifold 40 by changing the patterns of the distribution ports 37 and / or the exhaust ports 47, such that the total number of distribution ports 37 between at least one pair of vertically adjacent substrates 10 and / or between each pair of vertically adjacent substrates 10 does not match the total number of exhaust ports 47. Figure 3CIn the example shown, the total number of distribution ports 37 between a pair of vertically adjacent substrates 10 is twice the total number of discharge ports. The flow direction of the purified gas is mainly along the first horizontal direction hd1, but has a horizontal convergent component along the second horizontal direction hd2.

[0118] Please see Figure 3D A fourth embodiment configuration of the combination of gas distribution manifold 30 and gas discharge manifold 40 is shown. In this configuration, the frame cartridge 100 includes a pair of first sidewalls parallel to a first horizontal direction hd1 and a pair of second sidewalls parallel to a second horizontal direction hd2. The gas manifold main line 35 may be located on a first plurality of sidewalls of the frame cartridge 100 (e.g., about half of the sidewall of the outer casing wall 20 parallel to the second horizontal direction hd2 and the two sidewalls of the outer casing wall 20 parallel to the first horizontal direction hd1), and the discharge manifold main line 45 may be located on a second plurality of sidewalls of the frame cartridge 100 (e.g., about half of the other sidewall of the outer casing wall 20 parallel to the second horizontal direction hd2 and the two sidewalls of the outer casing wall 20 parallel to the first horizontal direction hd1). In this embodiment, in a top view, the perforated distribution manifold branch 36 and the perforated discharge manifold branch 46 may each have a U-shaped profile.

[0119] In one embodiment, a first subset of the distribution ports 37 in each row of distribution ports 37 are laterally spaced from each other along a second horizontal direction hd2, and a second subset of the distribution ports 37 in each row of distribution ports 37 are laterally spaced from each other along a first horizontal direction hd1. In one embodiment, a first subset of the discharge outlets 47 in each row of discharge outlets 47 are laterally spaced from each other along a second horizontal direction hd2, and a second subset of the discharge outlets 47 in each row of discharge outlets 47 are laterally spaced from each other along a first horizontal direction hd1. In a plan view, along a strip-shaped region surrounding the geometric center of the frame cartridge 100, the flow direction of the purified gas is parallel to the first horizontal direction hd1. The flow direction of the purified gas can be flexible in the volume of the lateral gap between the gas distribution manifold 30 and the gas discharge manifold 40.

[0120] Please see Figure 3EA fifth embodiment configuration of the combination of gas distribution manifold 30 and gas discharge manifold 40 is shown. In this configuration, the frame cartridge 100 includes a pair of first sidewalls parallel to a first horizontal direction hd1 and a pair of second sidewalls parallel to a second horizontal direction hd2. The gas manifold main line 35 may be located on a first plurality of sidewalls of the frame cartridge 100 (e.g., the sidewall of the outer casing wall 20 parallel to the second horizontal direction hd2 and the sidewall of the outer casing wall 20 parallel to the first horizontal direction hd1), and the discharge manifold main line 45 may be located on a second plurality of sidewalls of the frame cartridge 100 (e.g., another sidewall of the outer casing wall 20 parallel to the second horizontal direction hd2 and the other sidewall of the outer casing wall 20 parallel to the first horizontal direction hd1). In this embodiment, in a top view, the perforated distribution manifold branch line 36 and the perforated discharge manifold branch line 46 may each have an L-shaped profile.

[0121] In one embodiment, a first subset of the distribution ports 37 in each row of distribution ports 37 are laterally spaced from each other along a second horizontal direction hd2, and a second subset of the distribution ports 37 in each row of distribution ports 37 are laterally spaced from each other along a first horizontal direction hd1. In one embodiment, a first subset of the discharge ports 47 in each row of discharge outlets 47 are laterally spaced from each other along a second horizontal direction hd2, and a second subset of the discharge ports 47 in each row of discharge outlets 47 are laterally spaced from each other along a first horizontal direction hd1. In a plan view, the flow direction of the purified gas may be inclined relative to the first horizontal direction hd1 and the second horizontal direction hd2. The flow direction of the purified gas may be curved in the volume of the lateral gap between the gas distribution manifold 30 and the gas discharge manifold 40.

[0122] Please refer to the following: Figures 1A to 1D , Figure 2A Up to Figure 2S and Figures 3A to 3E According to various embodiments of the present invention, a frame cartridge 100 is provided, comprising: a frame support member (30, 40, (38 / 48)) configured to support a plurality of vertically stacked substrates; a gas distribution manifold 30 including an inlet port 34 and multiple rows of distribution ports 37 arranged along a vertical direction and configured to inject a purification gas between a plurality of vertically adjacent pairs of substrates, wherein each row of distribution ports 37 has a pneumatic conduction value, and the pneumatic conduction value of each row of distribution ports 37 increases with the length of the gas flow path from the inlet port 34 to each row of distribution ports 37 within the gas distribution manifold 30; and a gas discharge manifold 40 including an outlet port 44 and multiple rows of outlets 47 arranged along a vertical direction and configured to collect the purification gas.

[0123] In one embodiment, each outlet 47 has a pneumatic conduction value, and the pneumatic conduction value of each outlet increases with the length of the gas flow path from each outlet 47 to the outlet port 44 within the gas discharge manifold 40.

[0124] In one embodiment, the gas distribution manifold 30 includes a portion of a frame support (30, 40, (38 / 48)) and includes a plurality of perforated distribution manifold branches 36; each perforated distribution manifold branch 36 includes a sidewall containing a row of distribution ports 37 selected from a plurality of distribution ports 37; and each perforated distribution manifold branch 36 is configured to support an outer peripheral portion of one of a plurality of substrates 10.

[0125] In one embodiment, the frame support (30, 40, (38 / 48)) includes a plurality of distribution side spacers 38 configured to support the outer peripheral portion of one of the plurality of substrates 10 respectively; the gas distribution manifold 30 includes a plurality of perforated distribution manifold branches 36, each perforated distribution manifold branch 36 including a sidewall containing a row of distribution ports 37 selected from the plurality of distribution ports 37; and each distribution side spacer 38 contacts the top surface of one of the plurality of perforated distribution manifold branches 36 respectively.

[0126] In one embodiment, for each pair of a row of distribution ports 37 and a row of outlet ports 47 located between vertically adjacent substrates 10, a horizontal plate containing a plurality of geometric centers of the row of distribution ports 37 is vertically offset relative to a horizontal plate containing a plurality of geometric centers of the row of outlet ports 47.

[0127] Figure 4 The first flowchart illustrates the steps of purifying gas flowing in the frame cartridge 100 according to an embodiment of the present invention.

[0128] Please refer to step 410 and Figures 1A to 1D , Figures 2A to 2S as well as Figures 3A to 3E A frame cartridge 100 includes a frame support (30, 40, (38 / 48)) supporting vertically stacked substrates 10, a gas distribution manifold 30 including an inlet port 34 and multiple rows of distribution ports 37 arranged vertically to inject purified gas between vertically adjacent pairs of substrates 10, and a gas exhaust manifold 40 including an outlet port 44 and multiple rows of exhaust ports 47 arranged vertically to collect purified gas. Each row of distribution ports 37 has a pneumatic conduction value, and the pneumatic conduction value of each row of distribution ports 37 increases with the length of the gas flow path within the gas distribution manifold 30 from the inlet port 34 to each row of distribution ports 37.

[0129] Please refer to step 420 and Figures 1A to 1D , Figures 2A to 2S as well as Figures 3A to 3E Lateral flow of purified gas can be introduced between inlet port 34 and outlet port 44 by pressurizing inlet port 34 relative to outlet port 44 and simultaneously applying gas flow of purified gas to inlet port 34.

[0130] In one embodiment, each outlet 47 may include a pneumatically conductive value, and the pneumatically conductive value of each outlet 47 increases with the length of the gas flow path within the gas discharge manifold 40 from each outlet 47 to the outlet port 44. In one embodiment, the gas distribution manifold 30 includes a portion of a frame support and includes a plurality of perforated distribution manifold branches 36; each perforated distribution manifold branch 36 includes a sidewall containing a row of distribution ports selected from the plurality of distribution ports 37; and each perforated distribution manifold branch 36 is configured to support the outer periphery of one of the plurality of substrates 10. In one embodiment, the gas exhaust manifold 40 includes a portion of a frame support (30, 40, (38 / 48)) and includes a plurality of perforated distribution manifold branches 36; each perforated distribution manifold branch 36 includes a sidewall containing a row of distribution ports 37 selected from multiple rows of distribution ports 37; and each perforated distribution manifold branch 36 is configured to support the outer peripheral portion of one of a plurality of substrates 10. In one embodiment, the frame support (30, 40, (38 / 48)) includes a plurality of distribution side spacers 38 configured to support the outer peripheral portion of one of a plurality of substrates 10; the gas distribution manifold 30 includes a plurality of perforated distribution manifold branches 36, each perforated distribution manifold branch 36 including a sidewall containing a row of distribution ports 37 selected from multiple rows of distribution ports 37; and each distribution side spacer 38 contacts the top surface of one of the plurality of perforated distribution manifold branches 36. In one embodiment, the frame support members (30, 40, (38 / 48)) include a plurality of discharge-side spacers 48 configured to support the outer peripheral portion of one of the plurality of substrates 10 respectively; the gas discharge manifold 40 includes a plurality of perforated discharge manifold branches 46, each perforated discharge manifold branch 46 including a sidewall containing a row of discharge outlets 47 selected from the plurality of discharge outlets 47; and each discharge-side spacer 48 contacts the top surface of one of the plurality of perforated discharge manifold branches 46. In one embodiment, for each pair of a row of distribution ports 37 and a row of discharge outlets 47 located between vertically adjacent pairs of substrates 10 selected from the vertically stacked substrates 10, the average value of the gas velocity vector represents a non-zero vertical component of the gas flow velocity of the purified gas.

[0131] Figure 5 This is a second flowchart illustrating the steps of storing a substrate in a frame cartridge according to an embodiment of the present invention.

[0132] Please refer to step 510 and Figures 1A to 1D , Figures 2A to 2S as well as Figures 3A to 3E A frame cartridge 100 is provided, comprising a frame support (30, 40, (38 / 48)), a gas distribution manifold 30 including an inlet port 34 and multiple rows of distribution ports 37 arranged vertically and configured to inject purified gas, and a gas exhaust manifold 40 including an outlet port 44 and multiple rows of exhaust ports 47 arranged vertically and configured to collect purified gas. Each row of distribution ports 37 has a pneumatic conduction value, and the pneumatic conduction value increases with the length of the gas flow path within the gas distribution manifold 30 from the inlet port 34 to each row of distribution ports 37.

[0133] Please refer to step 520 and Figures 1A to 1D , Figures 2A to 2S as well as Figures 3A to 3E The substrate 10 can be carried on the frame support (30, 40, (38 / 48)) such that for each vertically adjacent pair of substrates 10 selected from the plurality of substrates 10, each row distribution port 37 and each row outlet port 47 face each other between the vertically adjacent pairs of substrates 10.

[0134] Please refer to step 530 and Figures 1A to 1D , Figures 2A to 2S as well as Figures 3A to 3E Lateral flow of purified gas can be introduced between inlet port 34 and outlet port 44 by pressurizing inlet port 34 relative to outlet port 44 and simultaneously applying gas flow of purified gas to inlet port 34.

[0135] In one embodiment, the frame cartridge 100 includes a pair of first sidewalls parallel to a first horizontal direction and a pair of second sidewalls parallel to a second horizontal direction; multiple rows of dispensing ports 37 and multiple rows of dispensing outlets 47 are laterally spaced from each other along the first horizontal direction; and the dispensing ports 37 in each row of dispensing ports 37 are laterally spaced from each other along the second horizontal direction. In a lower embodiment, the frame cartridge 100 includes a pair of first sidewalls parallel to a first horizontal direction and a pair of second sidewalls parallel to a second horizontal direction; a first subset of the dispensing ports in each row of dispensing ports 37 are laterally spaced from each other along the second horizontal direction; and a second subset of the dispensing ports 37 in each row of dispensing ports 37 are laterally spaced from each other along the first horizontal direction. In one embodiment, the area of ​​the dispensing ports in the multiple rows of dispensing ports increases with the length of the gas flow path from the inlet port to each row of dispensing ports within the gas distribution manifold. In one embodiment, the total number of dispensing ports 37 in each row of dispensing ports 37 increases with the length of the gas flow path from the inlet port to each row of dispensing ports within the gas distribution manifold. In one embodiment, the vertical dimension of each distribution port 37 increases with the length of the gas flow path within the gas distribution manifold 30 from the inlet port to each distribution port 37. In one embodiment, the lateral dimension of each distribution port 37 increases with the length of the gas flow path within the gas distribution manifold 30 from the inlet port 34 to each distribution port 37.

[0136] The embodiments disclosed herein provide a novel and efficient internal gas purification design for a frame cartridge 100 used in semiconductor manufacturing. Embodiments of this invention utilize a gas distribution manifold 30 and a gas exhaust manifold 40. The gas distribution manifold 30 includes a plurality of perforated distribution manifold branches 36, and the gas exhaust manifold 40 includes a plurality of perforated exhaust manifold branches 46. Multiple rows of distribution ports 37 and multiple rows of exhaust ports 47 are configured to provide uniform distribution of purified gas within the frame cartridge 100, solving the problem of uneven purified gas flow in conventional frame cartridges with a single bottom hole. By using the frame cartridge 100 of this invention, purified gas stagnation in localized volumes can be avoided, and contaminants on the substrate surface that could cause non-bonding defects and reduced manufacturing yield during bonding processes can be prevented.

[0137] The gas distribution manifold 30 includes a plurality of perforated distribution manifold branches 36, each perforated distribution manifold branch 36 including a row of distribution ports 37. The gas exhaust manifold 40 includes a plurality of perforated exhaust manifold branches 46, each perforated exhaust manifold branch 46 including a row of exhaust ports 47. The pneumatic conduction of each row of distribution ports 37 and each row of exhaust ports 47 can vary along the vertical direction, so that an increase in gas travel distance can be compensated by a larger pneumatic conduction for each row. Therefore, larger size or a greater number of ports (37, 47), higher pneumatic conduction, allows for more efficient gas flow. A relatively average purified gas flow is provided throughout the entire volume of the frame cartridge 100.

[0138] Purified gas flows from an external purified gas supply source through gas supply connector 52, inlet port 34 of gas distribution manifold 30, main distribution manifold line 35 of gas distribution manifold 30, perforated distribution manifold branch line 36, above or below the horizontal surface of substrate 10, perforated outlet manifold branch line 46, outlet manifold line 45, outlet port 44 of gas outlet manifold 40, gas outlet connector 58, and arrives at the external purified gas discharge point. If required, a filter (not shown) may be provided at gas supply connector 52 and / or gas outlet connector 58. The difference in the pneumatic conduction value through the perforated distribution manifold 36 as a function of the gas flow distance from inlet port 34, combined with the difference in the pneumatic conduction value through the perforated outlet manifold 46 as a function of the gas flow distance to outlet port 44, provides uniform gas flow throughout the entire volume of the housing wall 20 of frame cartridge 100.

[0139] The frame cartridge 100 of each disclosed embodiment offers several advantages over conventional designs. The gas distribution manifold 30 and gas exhaust manifold 40 of this embodiment provide uniform distribution and effective gas purification from the frame cartridge 100, reducing the likelihood of contaminants and unbonded defects. By avoiding surface contamination and ensuring effective gas removal, the embodiments disclosed herein improve manufacturing yield.

[0140] Embodiments of this invention provide higher manufacturing yields and more reliable semiconductor devices for various types of semiconductor devices. In an illustrative example, within the scope of advanced packaging technologies such as SoIC (system on integrated chips), CoWoS (chip on wafer on substrate), three-dimensional integrated circuit technologies, and InFO (integrated fan-out), this design exhibits high adaptability and efficiency. SoIC, which includes a three-dimensional stack of wafers in a single package, benefits from effective gas removal through this design, thus avoiding defects that could affect wafer integration. In CoWoS technology, which integrates multiple wafers on a wafer mounted on a substrate, uniform gas distribution ensures a clean assembly process, improving the integrity and performance of the assembled wafers. Three-dimensional integrated circuit technologies, encompassing a family of three-dimensional silicon stacking and advanced packaging technologies, require a clean environment for high-density integrated components, which can be maintained through innovative ventilation systems. Furthermore, InFO technology, which includes high-density interconnects in tight packages for communication or high-performance computing applications, benefits from improved air purification systems that eliminate internal gas residues that could degrade electrical performance.

[0141] This utility model embodiment provides a method for flowing a purified gas in a frame cartridge, comprising: providing the frame cartridge, including: a frame support member for supporting a plurality of vertically stacked substrates; a gas distribution manifold including an inlet port and multiple rows of distribution ports arranged along a vertical direction and configured to inject purified gas between a plurality of vertically adjacent pairs of substrates; and a gas exhaust manifold including an outlet port and multiple rows of exhaust outlets arranged along a vertical direction and configured to collect purified gas, wherein each row of distribution ports has a pneumatic conduction value, and the pneumatic conduction value of each row of distribution ports increases with the length of the gas flow path from the inlet port to each row of distribution ports within the gas distribution manifold; and introducing a lateral flow of purified gas between the inlet port and the outlet port by pressurizing the inlet port relative to the outlet port while simultaneously applying an airflow of purified gas to the inlet port.

[0142] In some embodiments, each outlet has a pneumatic conduction value, and the pneumatic conduction value of each outlet increases with the length of the gas flow path from each outlet port to the outlet port within the gas discharge manifold.

[0143] In some embodiments, the gas distribution manifold includes part of a frame support and includes a plurality of perforated distribution manifold branches, each perforated distribution manifold branch including a sidewall containing a row of distribution ports selected from a plurality of distribution ports, and each perforated distribution manifold branch being a peripheral portion configured to support one of a plurality of substrates respectively.

[0144] In some embodiments, the gas exhaust manifold includes part of a frame support and includes a plurality of perforated exhaust manifold branches, each perforated exhaust manifold branch including a sidewall containing a row of exhaust outlets selected from a plurality of exhaust outlets, and each perforated exhaust manifold branch being a peripheral portion configured to support one of a plurality of substrates respectively.

[0145] In some embodiments, the frame support includes a plurality of distribution side spacers configured to support the outer periphery of one of a plurality of substrates, the gas distribution manifold includes a plurality of perforated distribution manifold branches, each perforated distribution manifold branch includes a sidewall containing a row of distribution ports selected from a plurality of distribution ports, and each distribution side spacer contacts the top surface of one of the plurality of perforated distribution manifold branches.

[0146] In some embodiments, the frame support includes a plurality of discharge-side spacers configured to support the outer peripheral portion of one of a plurality of substrates, the gas discharge manifold includes a plurality of perforated discharge manifold branches, each perforated discharge manifold branch includes a sidewall containing a row of distribution ports selected from a plurality of distribution ports, and each discharge-side spacer contacts the top surface of one of the plurality of perforated discharge manifold branches.

[0147] In some embodiments, for each pair of a row of dispensing ports and a row of outlets located between a pair of vertically adjacent substrates selected from a plurality of vertically stacked substrates, the average value of the gas velocity vector represents a non-zero vertical component of the gas flow velocity of the purified gas.

[0148] This utility model provides a method for storing multiple substrates in a frame cassette, comprising: providing a frame cassette including a frame support, a gas distribution manifold, and a gas discharge manifold; the gas distribution manifold including an inlet port and multiple rows of distribution ports arranged along a vertical direction and configured to inject a purified gas; the gas discharge manifold including an outlet port and multiple rows of outlets arranged along a vertical direction and configured to collect the purified gas; wherein each row of distribution ports has a pneumatic conduction value, and the pneumatic conduction value increases with the length of the gas flow path from the inlet port to each row of distribution ports within the gas distribution manifold; carrying the multiple substrates on the frame support such that, for each vertically adjacent pair of substrates selected from the multiple substrates, each row of distribution ports and each row of outlets faces each other between the aforementioned vertically adjacent pairs of substrates; and introducing a lateral flow of purified gas between the inlet port and the outlet port by pressurizing the inlet port relative to the outlet port while simultaneously applying an airflow of purified gas to the inlet port.

[0149] In some embodiments, the frame cartridge includes a pair of first sidewalls parallel to a first horizontal direction and a pair of second sidewalls parallel to a second horizontal direction, multiple rows of dispensing ports and multiple rows of dispensing outlets being laterally spaced from each other along the first horizontal direction, and the dispensing ports in each row of dispensing ports being laterally spaced from each other along the second horizontal direction.

[0150] In some embodiments, the frame cartridge includes a pair of first sidewalls parallel to a first horizontal direction and a pair of second sidewalls parallel to a second horizontal direction, a first subset of the dispensing ports in each row of dispensing ports being laterally spaced from each other along the second horizontal direction, and a second subset of the dispensing ports in each row of dispensing ports being laterally spaced from each other along the first horizontal direction.

[0151] In some embodiments, the area of ​​each distribution port in the multi-row distribution port increases with the length of the gas flow path from the inlet port to each distribution port within the gas distribution manifold.

[0152] In some embodiments, the total number of distribution ports for each row increases with the length of the gas flow path within the gas distribution manifold from the inlet port to each row distribution port.

[0153] In some embodiments, the vertical dimension of the distribution port in each row of distribution ports increases with the length of the gas flow path within the gas distribution manifold from the inlet port to each row of distribution ports.

[0154] In some embodiments, the lateral dimension of the distribution port in each row of distribution ports increases with the length of the gas flow path within the gas distribution manifold from the inlet port to each row of distribution ports.

[0155] This utility model provides a frame cartridge, including a frame support, a gas distribution manifold, and a gas exhaust manifold. The frame support is configured to support a plurality of vertically stacked substrates. The gas distribution manifold includes an inlet port and multiple rows of distribution ports arranged along a vertical direction and configured to inject a purge gas between multiple vertically adjacent pairs of substrates. Each row of distribution ports has a pneumatic conduction value, and the pneumatic conduction value of each row of distribution ports increases with the length of the gas flow path from the inlet port to each row of distribution ports within the gas distribution manifold. The gas exhaust manifold includes an outlet port and multiple rows of exhaust outlets arranged along a vertical direction and configured to collect the purge gas.

[0156] In some embodiments, the frame cartridge further includes a gas inlet seal and a gas outlet seal. The gas inlet seal is configured to provide a gas inlet passage to an inlet port when mated with a mating gas supply connector. The gas outlet seal is configured to provide a gas outlet passage from an outlet port when mated with a mating gas exhaust connector.

[0157] In some embodiments, each outlet has a pneumatic conduction value, and the pneumatic conduction value of each outlet increases with the length of the gas flow path from each outlet to the outlet port within the gas discharge manifold.

[0158] In some embodiments, the gas distribution manifold includes part of a frame support and includes a plurality of perforated distribution manifold branches, each perforated distribution manifold branch including a sidewall containing a row of distribution ports selected from a plurality of distribution ports, and each perforated distribution manifold branch being a peripheral portion configured to support one of a plurality of substrates respectively.

[0159] In some embodiments, the frame support includes a plurality of distribution side spacers configured to support the outer periphery of one of a plurality of substrates, the gas distribution manifold includes a plurality of perforated distribution manifold branches, each distribution manifold branch includes a sidewall containing a row of distribution ports selected from a plurality of distribution ports, and each distribution side spacer contacts the top surface of one of the plurality of perforated distribution manifold branches.

[0160] In some embodiments, for each pair of a row of distribution ports and a row of outlets between a plurality of substrates located at vertically adjacent positions, a horizontal plate containing a plurality of geometric centers of the row of distribution ports is vertically offset relative to a horizontal plate containing a plurality of geometric centers of the row of outlets.

[0161] The foregoing summary outlines the features of several embodiments of the present invention, enabling those skilled in the art to more clearly understand various aspects of the embodiments of the present invention. The term "comprising" used in the description of the embodiments also implicitly discloses additional embodiments in which the term "comprising" is replaced by the terms "substantially constitutes" or "consisting of," unless otherwise expressly stated herein. Whenever two or more elements are listed as alternatives in the same or different paragraphs, a Markush group comprising the list of two or more elements is also implicitly disclosed. Whenever the auxiliary verb "may" is used in the embodiments of the present invention to describe the formation of an element or the execution of a process step, embodiments in which such a process step or such element is not performed can also be explicitly anticipated, provided that the resulting apparatus or device can provide equivalent results. Therefore, whenever omitting the formation of such an element or such process step can provide the same or equivalent results, the auxiliary verb "may" applied to the formation of an element or the execution of a process step should also be interpreted as "may, or may not," with equivalent results including slightly better results and slightly worse results. Those skilled in the art will understand that the embodiments of this utility model can serve as the basis for the design or modification of other structures or processes to achieve the same purpose and / or obtain the same advantages as the embodiments of this utility model. It will also be understood by those skilled in the art that equivalent structures or processes described above do not depart from the spirit and scope of the embodiments of this utility model, and that modifications, substitutions, and refinements can be made without departing from the spirit and scope of the embodiments of this utility model.

Claims

1. A frame cartridge, characterized in that, include: A frame support is configured to support multiple vertically stacked substrates; A gas distribution manifold includes an inlet port and multiple rows of distribution ports arranged along a vertical direction and configured to inject a purge gas between multiple vertically adjacent pairs of substrates. Each row of distribution ports has a pneumatic conduction value, and the pneumatic conduction value of each row of distribution ports increases with the length of the gas flow path within the gas distribution manifold from the inlet port to each row of distribution ports. A gas exhaust manifold includes an outlet port and multiple rows of outlets arranged vertically and configured to collect purified gas.

2. The frame cartridge as described in claim 1, characterized in that, Also includes: A gas inlet seal configured to provide a gas inlet passage to an inlet port when mated with a mating gas supply connector; as well as A gas outlet seal configured to provide a gas outlet passage from the outlet port when mated with a mating gas exhaust connector.

3. The frame cartridge as described in claim 1, characterized in that, Each outlet has a pneumatic conduction value, and the pneumatic conduction value of each outlet increases with the length of the gas flow path from each outlet to the outlet port in the gas discharge manifold.

4. The frame cartridge as described in claim 1, characterized in that: The gas distribution manifold includes a portion of the frame support and includes multiple perforated distribution manifold branches; Each perforated distribution manifold branch includes a sidewall containing a row of distribution ports selected from multiple rows of distribution ports; as well as Each perforated distribution manifold branch is configured to support the outer periphery of one of multiple substrates.

5. The frame cartridge as described in claim 1, characterized in that: The frame support includes multiple distribution side spacers configured to support the outer periphery of one of multiple substrates respectively; The gas distribution manifold includes multiple perforated distribution manifold branches, each branch including a sidewall containing distribution ports selected from multiple rows of distribution ports; and Each distribution side spacer contacts the top surface of one of the multiple perforated distribution manifold branches.

6. The frame cartridge as described in claim 1, characterized in that, For each pair of a row of distribution ports and a row of outlets between multiple substrates located at vertically adjacent positions, the horizontal plate containing the multiple geometric centers of the row of distribution ports is vertically offset relative to the horizontal plate containing the multiple geometric centers of the row of outlets.

7. The frame cartridge as described in claim 1, characterized in that, The frame cartridge includes a pair of first sidewalls parallel to a first horizontal direction and a pair of second sidewalls parallel to a second horizontal direction; The multiple distribution ports and multiple discharge ports are laterally spaced from each other along the first horizontal direction; as well as The distribution ports in each row are spaced laterally from each other along the second horizontal direction.

8. The frame cartridge as described in claim 1, characterized in that, The frame cartridge includes a pair of first sidewalls parallel to a first horizontal direction and a pair of second sidewalls parallel to a second horizontal direction; A first subset of the distribution ports in each row are laterally spaced from each other along a second horizontal direction; as well as A second subset of the distribution ports in each of the aforementioned rows are laterally spaced from each other along a first horizontal direction.

9. The frame cartridge as described in claim 1, characterized in that, The area of ​​each distribution port in a multi-row distribution port increases with the length of the gas flow path from the inlet port to each distribution port within the gas distribution manifold.

10. The frame cartridge as described in claim 1, characterized in that, The total number of distribution ports in each row increases with the length of the gas flow path from the inlet port to each distribution port within the gas distribution manifold, or The vertical dimension of each distribution port increases with the length of the gas flow path from the inlet port to each distribution port within the gas distribution manifold, or The lateral dimension of each distribution port increases with the length of the gas flow path from the inlet port to each distribution port within the gas distribution manifold.

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