Wafer edge overplating protection device for electroless nickel palladium gold plating

CN224692220UActive Publication Date: 2026-08-28JIANGSU SIZHI SEMICON TECH CO LTD
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Patent Information

Application Number
CN202521965405.9
Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
Filing Date
2025-09-12
Publication Date
2026-08-28
Estimated Expiration
2035-09-12

AI Technical Summary

Technical Problem

[0003]然而,在化学镀过程中,由于电镀液流动特性、电场分布不均及基体几何形状等因素的影响,晶圆边缘区域往往出现镀层过度沉积的现象,即边缘过镀,边缘过镀现象不仅导致镀层厚度超出工艺规范,造成金属材料浪费,更会引发后续光刻、蚀刻或键合工艺中的对齐偏差、短路风险或机械应力集中,严重影响器件可靠性和成品率

Benefits of technology

该化学镀镍钯金的晶圆边缘抗过镀保护装置,通过伺服电机、带轮组件和联动轴构成的精密传动系统,驱动表面具有花纹的聚氨酯摩擦条平稳、同步地带动晶圆旋转,结合定位槽对晶圆的精确固定以及进液口和出液口实现的镀液循环,共同确保了晶圆在化学镀过程中表面扩散层的均匀扰动,有效抑制了边缘电场和液流集中现象,从而减少了金属材料的浪费,避免了后续工艺中的对齐偏差与短路风险,最终大幅提升了镀层厚度均匀性、器件可靠性和生产成品率。

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Abstract

The utility model discloses a kind of chemical nickel palladium gold's wafer edge anti overplating protection devices, it is related to semiconductor manufacturing technical field, it includes wafer basket, and wafer basket is provided with wafer box by hanging bracket, the inside of wafer box is provided with control mechanism, and control mechanism is used to drive wafer body rotation, control mechanism includes servo motor, and the output of servo motor is provided with rotating shaft, rotating shaft is provided with pulley assembly, and pulley assembly is provided with linkage shaft, linkage shaft and the rotating shaft are all provided with friction strip, and friction strip is used to drive wafer body rotation in wafer box inside.This chemical nickel palladium gold's wafer edge anti overplating protection device is driven by servo motor synchronous rotation mechanism and friction strip, so that wafer rotates at uniform speed in plating solution, effectively eliminates edge electric field and liquid flow concentration phenomenon, to inhibit plating layer edge overplating, improve plating layer uniformity and product yield.
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