A double-sided coated anti-reflective glass

Abstract

This utility model relates to a double-sided coated anti-reflective glass, belonging to the technical field of coated glass. It includes a glass substrate and coatings on both sides of the glass substrate; the coating on the first side, from the inside out, consists of a TiO2 layer, a SiO2 layer, and a Nb2O layer. x Layer, SiO2 layer, Nb2O x The first layer is a TiO2 layer, followed by a SiO2 layer; the second layer, from the inside out, consists of a TiO2 layer, a SiO2 layer, and a Nb2O layer. x Layer, SiO2 layer, Nb2O x The first coating consists of a SiO2 layer and an organic polymer layer on its outer surface. This invention relates to a double-sided coated anti-reflective glass. By rationally designing the thickness of each layer, especially the geometric and optical thicknesses of the media layers with different refractive indices, it achieves anti-reflection and anti-reflection functions. Simultaneously, an organic polymer layer is added as a protective layer to the first coating surface, ensuring the safety of the coated surface. Ultimately, the double-sided coating achieves the anti-reflection and anti-reflection function of the glass.

Description

Technical Field

[0001] This utility model relates to a double-sided coated anti-reflective glass, belonging to the field of coated glass technology. Background Technology

[0002] In the construction industry, with the growing global awareness of energy conservation and environmental protection, building energy efficiency standards are becoming increasingly stringent. Anti-reflective glass can significantly improve lighting efficiency and reduce indoor artificial lighting energy consumption. Ordinary glass has a high reflectivity, reflecting a large amount of light away, while anti-reflective glass can significantly reduce reflectivity, allowing more natural light to penetrate the interior, effectively improving the indoor lighting environment and creating a bright and comfortable space. Statistics show that buildings using anti-reflective glass can increase indoor lighting by approximately 20%-30% and reduce energy consumption by 15%-20%. Furthermore, in some high-end commercial buildings, office buildings, and residential projects, anti-reflective glass is increasingly widely used because it enhances the overall aesthetics of the building, meeting the dual demands of modern architecture for both appearance and function. With the acceleration of urbanization and the continuous growth in the number of new buildings, a vast development space has been created for anti-reflective glass in the construction market.

[0003] Anti-reflective glass has a wide and urgent market demand in many fields, including architecture, electronic displays, automobiles, optical instruments, and cultural exhibitions. With continuous technological advancements and the ongoing improvement in people's quality of life, the market size of anti-reflective glass is expected to further expand, and its application areas will continue to broaden.

[0004] Most existing anti-reflective glass only has a coating on one side, which cannot fully meet the market demand for good light transmission and low reflection. Furthermore, the durability and oxidation resistance of the glass surface cannot guarantee against the effects of complex environments over a long period of time.

[0005] Existing methods for manufacturing double-sided anti-reflective glass are difficult and have extremely low yield rates. Therefore, there is an urgent need for a method for manufacturing double-sided coated anti-reflective glass to solve the above problems. Utility Model Content

[0006] The purpose of this invention is to provide a double-sided coated anti-reflective glass to solve the above-mentioned technical problems.

[0007] To achieve the above objectives, the technical solution adopted by this utility model is as follows:

[0008] A double-sided coated antireflective glass includes a glass substrate and coatings on both sides of the glass substrate; the coating on the first side, from the inside out, consists of a TiO2 layer, a SiO2 layer, and a Nb2O layer. x Layer, SiO2 layer, Nb2O x The first layer is a TiO2 layer, followed by a SiO2 layer; the second layer, from the inside out, consists of a TiO2 layer, a SiO2 layer, and a Nb2O layer. xLayer, SiO2 layer, Nb2O x The first coating consists of a SiO2 layer and an organic polymer layer.

[0009] A further improvement to the present invention is that the organic polymer is composed of acrylate monomers, including one or more of methyl methacrylate, butyl methacrylate, isooctyl methacrylate, methacrylic acid, and glycidyl methacrylate.

[0010] A further improvement to the technical solution of this utility model is as follows: the thickness of each layer of the first coating is 30nm for the TiO2 layer, 45nm for the SiO2 layer, and 45nm for the Nb2O layer. x Layer 35nm, SiO2 layer 55nm, Nb2O x The first layer is 42 nm thick, and the second layer is 48 nm thick; the second layer, from the inside out, consists of a 30 nm thick TiO2 layer, a 45 nm thick SiO2 layer, and a 48 nm thick Nb2O layer. x Layer 35nm, SiO2 layer 55nm, Nb2O x The first layer is 42 nm thick, and the second layer is 48 nm thick.

[0011] A further improvement to the technical solution of this utility model is that the thickness of the organic polymer is 15μm.

[0012] A method for manufacturing double-sided coated anti-reflective glass involves using a large-area glass coating production line and a vacuum magnetron sputtering coating process to coat a glass substrate using 26 cathode targets under negative pressure.

[0013] The thickness of the high-refractive-index layer and the low-refractive-index layer can be accurately controlled by controlling the power supply.

[0014] After the first coating is completed, a protective coating is applied to the glass surface using chemical roller coating technology. The coating is composed of acrylic monomers to protect the bottom surface of the glass from mechanical damage caused by transmission during the second coating.

[0015] Then, the above coating process is repeated on the back of the completed single-sided anti-reflective glass, using the same coating process as the first side.

[0016] A further improvement to the above technical solution is as follows: the first dielectric layer is a TiO2 layer, and the TiO2 target is sputtered in an argon-oxygen atmosphere by AC rotating cathode sputtering. The purity of the TiO2 target should be ≥99.99%.

[0017] The second dielectric layer is a SiO2 layer, which is sputtered in an argon-oxygen atmosphere by AC rotating cathode sputtering. The purity of the Si target should be ≥99%.

[0018] The third dielectric layer is Nb2O. xLayer, Nb2O is sputtered by alternating current rotating cathode. x The target was sputtered in a nitrogen-oxygen atmosphere, Nb2O x The purity of the target should be ≥99.9%;

[0019] The fourth dielectric layer is a SiO2 layer, which is sputtered by AC rotating cathode sputtering in an argon-oxygen atmosphere. The purity of the Si target should be ≥99%.

[0020] The fifth dielectric layer is Nb2O x Layer, Nb2O is sputtered by alternating current rotating cathode. x The target was sputtered in a nitrogen-oxygen atmosphere, Nb2O x The purity of the target should be ≥99.9%;

[0021] The sixth dielectric layer is a SiO2 layer, which is sputtered in an argon-oxygen atmosphere by AC rotating cathode sputtering. The purity of the Si target should be ≥99%.

[0022] A further improvement to the above technical solution is that the first dielectric layer is sputtered in an argon-oxygen atmosphere with an argon-oxygen ratio of 1000:50.

[0023] A further improvement to the above technical solution is: in the sputtering process of the third and fifth dielectric layers, Nb2O x Deoxidation treatment using Nb2O5 is required. x The value of X in the figure is 4.45 ± 0.1. This is used to improve the Nb2O content. x The refractive index of the film. The process gas should be mainly argon, supplemented with a small amount of oxygen, with an argon-oxygen ratio of 1000:30.

[0024] A further improvement to the above technical solution is as follows: In the sputtering process of the second dielectric layer, the fourth dielectric layer, and the sixth electrolyte layer, magnetron sputtering is used to deposit a SiO2 thin film on the glass substrate. When the oxygen-argon ratio (O2 / Ar) increases from 30% to 60%, the oxygen-silicon ratio (O / Si) of the film continuously increases from a severely oxygen-deficient 1.68:1 to 1.93:1; the average particle size decreases and becomes more uniform, the surface roughness decreases with the increase of the oxygen-argon ratio, and the refractive index and absorptivity of the film decrease; when the oxygen content is 40%, the refractive index of the film is close to the refractive index of silicon dioxide, which is 1.46.

[0025] A further improvement to the above technical solution is that the negative pressure environment should be lower than 5×10. -6E mbar.

[0026] Due to the adoption of the above technical solution, the technical effects achieved by this utility model are as follows:

[0027] This invention relates to a double-sided coated antireflective glass. By rationally designing the thickness of each coating layer, especially the geometric and optical thicknesses of the media layers with different refractive indices, it achieves the glass's antireflective and antireflective functions. Simultaneously, an organic polymer is rolled onto the surface of the first coating as a protective layer, ensuring the safety of the coated surface. Ultimately, the double-sided coating achieves the glass's antireflective and antireflective functions.

[0028] In this technical solution, the thickness of the high-refractive-index layer and the low-refractive-index layer is accurately controlled by controlling the power supply to achieve the designed thickness of the film. By continuously changing the refractive index, destructive interference occurs between reflected light under a specific wavelength, thereby reducing reflection.

[0029] In this technical solution, two layers of single-sided anti-reflective coating are repeatedly applied to both sides of the transparent folded glass. During the first coating, a protective coating is rolled on to protect the bottom surface of the glass from mechanical damage caused by the transmission during the second coating. Attached Figure Description

[0030] Figure 1 This is a schematic diagram of the film structure of the coated glass of this utility model. Detailed Implementation

[0031] To make the technical means, creative features, objectives and effects of this utility model easier to understand, the present utility model will be further described below in conjunction with specific embodiments.

[0032] This utility model is a double-sided coated anti-reflective glass, which is made by coating a functional film on a glass substrate, specifically on both sides, the front and the back.

[0033] The glass mainly consists of a glass substrate and coatings on both sides of the glass substrate. The coating is applied to one side of the glass substrate, with the first coating consisting of a TiO2 layer, a SiO2 layer, and a Nb2O layer from the inside out. x Layer, SiO2 layer, Nb2O x The first layer is a SiO2 layer; the second layer, from the inside out, consists of a TiO2 layer, a SiO2 layer, and a Nb2O layer. x Layer, SiO2 layer, Nb2O x The two films have the same structure: a SiO2 layer and a SiO2 layer. Specifically, as shown... Figure 1 As shown.

[0034] Furthermore, in the specific implementation, the thickness of each layer of the first coating is as follows: TiO2 layer 30nm, SiO2 layer 45nm, Nb2O... x 35nm layer, SiO2 layer 55nm, Nb2O x The first layer is 42nm, the second layer is 48nm; the second layer, from the inside out, consists of a 30nm TiO2 layer, a 45nm SiO2 layer, and an Nb2O layer.x 35nm layer, SiO2 layer 55nm, Nb2O x The first layer is 42nm, and the second layer is 48nm.

[0035] An organic polymer layer is deposited on the outer surface of the first coating on the glass substrate to protect the coating. The organic polymer is composed of acrylate monomers, including one or more mixtures of methyl methacrylate, butyl methacrylate, isooctyl methacrylate, methacrylic acid, and glycidyl methacrylate. The thickness of the organic polymer is 15 μm.

[0036] Two layers of single-sided anti-reflective coating are repeatedly applied to both sides of the transparent glass. After the first coating is completed, a protective coating is rolled onto the surface of the coating to protect against mechanical damage to the bottom surface of the glass caused by the transmission during the second coating.

[0037] The glass is produced using a large-area glass coating production line with vacuum magnetron sputtering coating technology, which uses 26 cathode targets to coat a functional film on the glass substrate under negative pressure.

[0038] The negative pressure environment during coating should be below 5 × 10⁻⁶. -6E mbar.

[0039] By accurately controlling the thickness of the high-refractive-index layer and the low-refractive-index layer through power control, the constantly changing refractive index causes destructive interference between reflected light at a specific wavelength, thereby reducing reflection.

[0040] The first dielectric layer is sputtered using an AC rotating cathode sputtering method in an argon-oxygen atmosphere with a TiO2 target. The purity of the TiO2 target should be ≥99.99%. High-purity TiO2 target material helps to precisely control the optical parameters of the thin film and achieve better anti-reflection and anti-reflection effects. The gas permeability ratio affects the refractive index, hardness, adhesion, and other properties of the thin film; the argon-oxygen ratio is 1000:50.

[0041] The second dielectric layer was deposited by sputtering a Si target in an argon-oxygen atmosphere using an AC rotating cathode sputtering method. The purity of the Si target should be ≥99%. A SiO2 thin film was deposited on a glass substrate using magnetron sputtering. As the oxygen-argon ratio (O2 / Ar) increased from 30% to 60%, the oxygen-silicon ratio (O / Si) of the film continuously increased from a severely oxygen-deficient 1.68:1 to 1.93:1, approaching the stoichiometric ratio of 2:1. Simultaneously, the average particle size decreased and became more uniform, the surface roughness decreased with increasing oxygen-argon ratio, and the refractive index and absorptivity of the film continuously decreased. When the oxygen content was 40%, the refractive index of the film approached the refractive index of silicon dioxide (1.46).

[0042] The third dielectric layer is Nb2O sputtered using an AC rotating cathode sputtering method. x The target was sputtered in a nitrogen-oxygen atmosphere, Nb2O x The purity of the target should be ≥99.9%, Nb2O x Deoxidation treatment with Nb2O5 is required. x The value of X in the figure is 4.45 ± 0.1. This is used to improve the Nb2O content. x The refractive index of the film. The process gas should be mainly argon, supplemented with a small amount of oxygen, with an argon-oxygen ratio of 1000:30.

[0043] The fourth dielectric layer is deposited by sputtering a Si target in an argon-oxygen atmosphere using AC rotating cathode sputtering. The purity of the Si target should be ≥99%. A SiO2 thin film is deposited on a glass substrate using magnetron sputtering. When the oxygen-argon ratio (O2 / Ar) increases from 30% to 60%, the oxygen-silicon ratio (O / Si) of the film continuously increases from a severely oxygen-deficient 1.68:1 to 1.93:1, approaching the stoichiometric ratio of 2:1. Simultaneously, the average particle size decreases and becomes more uniform, the surface roughness decreases with increasing oxygen-argon ratio, and the refractive index and absorptivity of the film continuously decrease. When the oxygen content is 40%, the refractive index of the film is close to the refractive index of silicon dioxide (1.46).

[0044] The fifth dielectric layer is Nb2O sputtered using an AC rotating cathode method. x The target was sputtered in a nitrogen-oxygen atmosphere, Nb2O x The purity of the target should be ≥99.9%, Nb2O x Deoxidation treatment with Nb2O5 is required. x The value of X in the figure is 4.45 ± 0.1. This is used to improve the Nb2O content. x The refractive index of the film. The process gas should be mainly argon, supplemented with a small amount of oxygen, with an argon-oxygen ratio of 1000:30.

[0045] The sixth dielectric layer was deposited by sputtering a Si target in an argon-oxygen atmosphere using an AC rotating cathode sputtering method. The purity of the Si target should be ≥99%. A SiO2 thin film was deposited on a glass substrate using magnetron sputtering. As the oxygen-argon ratio (O2 / Ar) increased from 30% to 60%, the oxygen-silicon ratio (O / Si) of the film continuously increased from a severely oxygen-deficient 1.68:1 to 1.93:1, approaching the stoichiometric ratio of 2:1. Simultaneously, the average particle size decreased and became more uniform, the surface roughness decreased with increasing oxygen-argon ratio, and the refractive index and absorptivity of the film continuously decreased. When the oxygen content was 40%, the refractive index of the film approached the refractive index of silicon dioxide (1.46).

[0046] After the first coating is completed, a protective coating is applied to the glass surface using chemical roller coating technology. The coating is composed of acrylate monomers, including one or more of methyl methacrylate, butyl methacrylate, isooctyl methacrylate, methacrylic acid, and glycidyl methacrylate.

[0047] LED UV curing forms a protective film on the surface of the temperable Low-e glass, improving its resistance to machining and isolating it from the atmosphere.

[0048] Then, the above coating process is repeated on the back of the completed single-sided anti-reflective glass, using the same coating process as the first side.

[0049] The following are specific examples:

[0050] In this embodiment, a vacuum magnetron sputtering deposition process is used, and the high refractive index dielectric layer is Nb2O. x， The low-refractive-index dielectric layer uses SiO2, which includes a total of 26 dual-rotating AC cathodes sequentially deposited on a float glass substrate in the form of TiO2 / SiO2 / Nb2O. x / SiO2 / Nb2O x / SiO2.

[0051] The production process parameters are as follows:

[0052] 1# AC dual rotating target <![CDATA[TiO2]]> <![CDATA[3.11*10 -3 ]]> Argon:Oxygen = 600:400 11 2# AC dual rotating target <![CDATA[SiO2]]> <![CDATA[3.11*10 -3 ]]> Argon:Oxygen = 600:400 18 3# AC dual rotating target <![CDATA[Nb2O x ]]> <![CDATA[3.7*10 -3 ]]> Argon:Oxygen = 1000:30 20 4# AC dual rotating target <![CDATA[Nb2O x ]]> <![CDATA[3.7*10 -3 ]]> Argon:Oxygen = 1000:30 20 5# AC dual rotating target <![CDATA[SiO2]]> <![CDATA[3.11*10 -3 ]]> Argon:Oxygen = 600:400 20 6# AC dual rotating target <![CDATA[SiO2]]> <![CDATA[3.11*10 -3 ]]> Argon:Oxygen = 600:400 15 7# AC dual rotating target <![CDATA[Nb2O x ]]> <![CDATA[3.7*10 -3 ]]> Argon:Oxygen = 1000:30 14 8# AC dual rotating target <![CDATA[Nb2O x ]]> <![CDATA[3.7*10 -3 ]]> Argon:Oxygen = 1000:30 14 9# AC dual rotating target <![CDATA[Nb2O x ]]> <![CDATA[3.7*10 -3 ]]> Argon:Oxygen = 1000:30 14 10# AC dual rotating target <![CDATA[Nb2O x ]]> <![CDATA[3.7*10 -3 ]]> Argon:Oxygen = 1000:30 14 11# AC dual rotating target <![CDATA[Nb2O x ]]> <![CDATA[3.7*10 -3 ]]> Argon:Oxygen = 1000:30 14 12# AC dual rotating target <![CDATA[Nb2O x ]]> <![CDATA[3.7*10 -3 ]]> Argon:Oxygen = 1000:30 15 13# AC dual rotating target <![CDATA[Nb2O x ]]> <![CDATA[3.7*10 -3 ]]> Argon:Oxygen = 1000:30 15 14# AC dual rotating target <![CDATA[Nb2O x ]]> <![CDATA[3.7*10 -3 ]]> Argon:Oxygen = 1000:30 15 15# AC dual rotating target <![CDATA[Nb2O x ]]> <![CDATA[3.7*10 -3 ]]> Argon:Oxygen = 1000:30 15 16# AC dual rotating target <![CDATA[Nb2O x ]]> <![CDATA[3.7*10 -3 ]]> Argon:Oxygen = 1000:30 15 17# AC dual rotating target <![CDATA[SiO2]]> <![CDATA[3.11*10 -3 ]]> Argon:Oxygen = 600:400 13 18# AC dual rotating target <![CDATA[SiO2]]> <![CDATA[3.11*10 -3 ]]> Argon:Oxygen = 600:400 14 19# AC dual rotating target <![CDATA[SiO2]]> <![CDATA[3.11*10 -3 ]]> Argon:Oxygen = 600:400 14 20# AC dual rotating target <![CDATA[SiO2]]> <![CDATA[3.11*10 -3 ]]> Argon:Oxygen = 600:400 14 21# AC dual rotating target <![CDATA[SiO2]]> <![CDATA[3.11*10 -3 ]]> Argon:Oxygen = 600:400 14 22# AC dual rotating target <![CDATA[SiO2]]> <![CDATA[3.11*10 -3 ]]> Argon:Oxygen = 600:400 15 23# AC dual rotating target <![CDATA[SiO2]]> <![CDATA[3.11*10 -3 ]]> Argon:Oxygen = 600:400 15 24# AC dual rotating target <![CDATA[SiO2]]> <![CDATA[3.11*10 -3 ]]> Argon:Oxygen = 600:400 15 25# AC dual rotating target <![CDATA[SiO2]]> <![CDATA[3.11*10 -3 ]]> Argon:Oxygen = 600:400 15 26# AC dual rotating target <![CDATA[SiO2]]> <![CDATA[3.11*10 -3 ]]> Argon:Oxygen = 600:400 15

[0053] The above process ensures that each layer of the coating reaches the preset thickness. After coating, a protective coating is applied to the glass coating surface using a roller coater at the coating exit. The coating is composed of acrylate monomers, including one or more of methyl methacrylate, butyl methacrylate, isooctyl methacrylate, methacrylic acid, and glycidyl methacrylate, or a mixture thereof.

[0054] LED UV curing forms a protective film on the surface of temperable Low-e glass, improving its resistance to machining and isolating it from the atmosphere.

[0055] Then, the above coating process is repeated on the back of the completed single-sided anti-reflective glass, using the same coating process as the first side.

[0056] In this technical solution, the thickness of the high-refractive-index layer and the low-refractive-index layer is accurately controlled by controlling the power supply, thereby achieving the designed thickness of the film. By continuously changing the refractive index, destructive interference occurs between reflected light under a specific wavelength, thereby reducing reflection.

[0057] The foregoing has shown and described the basic principles, main features, and advantages of this utility model. Those skilled in the art should understand that this utility model is not limited to the above embodiments. The embodiments and descriptions in the specification are merely illustrative of the principles of this utility model. Various changes and modifications can be made to this utility model without departing from its spirit and scope, and all such changes and modifications fall within the scope of the claims. The scope of protection of this utility model is defined by the appended claims and their equivalents.

Claims

1. A double-sided coated anti-reflective glass, characterized in that: This includes a glass substrate and the coatings on both sides of the glass substrate; the coating on the first side, from the inside out, consists of a TiO2 layer, a SiO2 layer, and a Nb2O layer. x Layer, SiO2 layer, Nb2O x The first layer is a TiO2 layer, followed by a SiO2 layer; the second layer, from the inside out, consists of a TiO2 layer, a SiO2 layer, and a Nb2O layer. x Layer, SiO2 layer, Nb2O x The first coating consists of a SiO2 layer and an organic polymer layer.

2. The double-sided coated antireflective glass according to claim 1, characterized in that: The thicknesses of each layer in the first coating are as follows: TiO2 layer 30nm, SiO2 layer 45nm, Nb2O layer 45nm. x Layer 35nm, SiO2 layer 55nm, Nb2O x The first layer is 42 nm thick, and the second layer is 48 nm thick; the second layer, from the inside out, consists of a 30 nm thick TiO2 layer, a 45 nm thick SiO2 layer, and a 48 nm thick Nb2O layer. x Layer 35nm, SiO2 layer 55nm, Nb2O x The first layer is 42 nm thick, and the second layer is 48 nm thick.

3. The double-sided coated anti-reflective glass according to claim 1, characterized in that: The thickness of the organic polymer is 15 μm.

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