Apparatus for purifying acetylene gas

Abstract

The application provides an acetylene gas purification device, impurities in crude acetylene gas are preliminarily washed through the first water washing tower, acetylene gas after preliminary water washing is input into the acid washing tower, phosphine and hydrogen sulfide in the acetylene gas are removed through oxidation of concentrated sulfuric acid, then the acetylene after acid washing is water washed, the acetylene gas after water washing is input into the alkali washing device for alkali washing, residual acidic substances are removed, finally the acetylene gas after alkali washing is water washed and purified, pure acetylene gas is obtained, and the pure acetylene gas is compressed by a compressor and stored in a gas tank. The device of the application removes impurities in crude acetylene through cooperation of the above-mentioned equipment to realize purification of acetylene gas, and sodium hypochlorite is not used in the above-mentioned equipment, so that the defects that a large amount of sodium hypochlorite wastewater is generated and is difficult to treat can be effectively overcome.

Description

Technical Field

[0001] This application relates to the field of acetylene gas purification technology, and more particularly to an acetylene gas purification device. Background Technology

[0002] Acetylene, as a fundamental chemical raw material, occupies a crucial position in the chemical industry, widely used in the synthesis of rubber, resins, fuels, chemicals, and many other fields, making it an indispensable part of modern industrial production. The primary industrial method for obtaining acetylene is the calcium carbide process. This process first uses quicklime and carbonaceous raw materials, primarily coke, to produce calcium carbide. Then, calcium carbide reacts with water to generate acetylene gas. However, because the coke used in calcium carbide production inevitably contains sulfur and phosphorus, these elements are introduced into the calcium carbide. This results in the acetylene gas produced from the reaction of calcium carbide and water containing impurities such as phosphine and hydrogen sulfide. Since hydrogen sulfide is more soluble in water than phosphine, the crude acetylene gas contains a higher concentration of phosphine and a lower concentration of hydrogen sulfide. Furthermore, due to variations in the impurity content of the calcium carbide, the concentrations of hydrogen sulfide and phosphine in the crude acetylene gas can vary considerably, typically ranging from 40 ppm to 190 ppm for hydrogen sulfide and from 290 ppm to 720 ppm for phosphine.

[0003] Crude acetylene gas contains a significant amount of phosphine (e.g., several hundred ppm) and a smaller amount of hydrogen sulfide (tens to hundreds of ppm). These impurity gases pose a threat to production operations and personal safety. Therefore, these impurity gases in acetylene gas must be removed to reduce production costs and waste. This method is carried out at room temperature and under alkaline conditions, utilizing the oxidizing properties of sodium hypochlorite to oxidize phosphine and hydrogen sulfide to phosphoric acid and sulfuric acid, respectively. The corresponding acids are then neutralized and removed by sodium hydroxide solution. However, since the oxidizing power of sodium hypochlorite is controlled by the effective chlorine concentration and pH value of the solution, a large amount of wastewater containing sodium hypochlorite is generated during the reaction process. This wastewater is difficult to treat and has high treatment costs. Utility Model Content

[0004] This application provides an acetylene gas purification device to solve the problem that the existing method of purifying crude acetylene gas with sodium hypochlorite generates a large amount of sodium hypochlorite wastewater that is difficult to treat.

[0005] This application provides an acetylene gas purification device, comprising an acetylene generator, a first water scrubbing tower, an acid scrubbing tower, a second water scrubbing tower, an alkaline scrubbing device, a third water scrubbing tower, a compressor, and a gas holder connected in series. The pickling tower is also connected to a waste acid treatment unit, which in turn is connected to an acetylene generator.

[0006] Optionally, a demisting device is installed between the third water washing tower and the compressor.

[0007] Optionally, the first water washing tower, the second water washing tower, the alkaline washing device, and the third water washing tower are all connected to the wastewater pool.

[0008] Optionally, the waste acid treatment device includes a waste acid collection tank, a first filter, a heating kettle, a second filter, a neutralization tank, a filter press, and a filtrate tank connected in series. The filtrate tank is also connected to the wastewater tank; The filter press is also connected to a calcium sulfate storage tank.

[0009] Optionally, the alkaline washing unit includes an alkaline washing tower and an alkaline solution tank; The alkaline washing tower is divided into an upper concentrated alkali washing zone, a middle medium alkali washing zone, and a lower weak alkali washing zone from top to bottom by a first partition and a second partition. A first connecting pipe is provided on the first partition. The first connecting pipe passes through the first partition to connect the concentrated alkali washing area and the medium alkali washing area. The portion of the first connecting pipe located in the concentrated alkali washing area extends upward and is provided with a first rainproof cap at the top. A second connecting pipe is provided on the second partition. The second connecting pipe passes through the alkaline washing zone and the weak alkaline washing zone of the second partition and connects them. The part of the second connecting pipe located in the alkaline washing zone extends upward and is provided with a second rainproof cap at the top.

[0010] Optionally, a first spray layer is provided above the concentrated alkali washing zone, and a first circulation port is provided at the lower part of the concentrated alkali washing zone near the first partition. The first circulation port is connected to the first circulation pump and the first spray layer in sequence through a first three-way valve. The first circulation pump is also connected to the alkali tank through the first three-way valve. A second spray layer is provided in the upper part of the medium-alkali washing zone, and a second circulation port is provided in the lower part of the medium-alkali washing zone near the second partition. The second circulation port is connected to the second circulation pump and the second spray layer in sequence through a second three-way valve. The second circulation pump is also connected to the first circulation port through a second three-way valve. A third spray layer is provided at the upper part of the weak alkaline washing zone, and a third circulation port and a drain port are provided at the bottom of the weak alkaline washing zone. The third circulation port is connected to the third circulation pump and the third spray layer in sequence through a third three-way valve. The third circulation pump is also connected to the second circulation port through a third three-way valve. An air inlet is provided on one side of the weak alkaline washing zone, and an exhaust outlet is provided on the top of the concentrated alkaline washing zone.

[0011] Optionally, the alkali tank is also connected to a nitrogen bladder via a float valve.

[0012] This application provides an acetylene gas purification device. A first water washing tower is used to preliminarily wash impurities from crude acetylene gas. The preliminarily washed acetylene gas is then fed into an acid washing tower where concentrated sulfuric acid is used to remove phosphine and hydroxide sulfides. The acid-washed acetylene is then washed with water, followed by an alkaline washing unit to remove residual acidic substances. Finally, the alkaline-washed acetylene gas is washed with water again to obtain pure acetylene gas. This pure acetylene gas is then compressed using a compressor and stored in a gas holder. This device, through the combined use of the above equipment, removes impurities from crude acetylene to purify the gas. Since this device does not use sodium hypochlorite oxidation, it effectively overcomes the drawbacks of sodium hypochlorite oxidation, which generates large amounts of difficult-to-treat sodium hypochlorite wastewater. Attached Figure Description

[0013] To more clearly illustrate the technical solutions in the embodiments of this application or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are some embodiments of this application. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0014] Figure 1 This is a schematic diagram of an acetylene gas purification device provided in an embodiment of this application; Figure 2 A schematic diagram of an acetylene gas purification device provided in another embodiment of this application; Figure 3 A schematic diagram of an acetylene gas purification device provided in yet another embodiment of this application; Figure 4 This is a schematic diagram of the structure of an alkaline washing tower provided in one embodiment of this application.

[0015] Explanation of reference numerals in the attached figures: 1. Acetylene generator; 2. First water washing tower; 3. Acid washing tower; 4. Second water washing tower; 5. Alkali washing device; 6. Third water washing tower; 7. Gas holder; 8. Acid treatment device; 9. Demisting device; 10. Compressor; 20. Wastewater tank; 50. Nitrogen gas bag; 51. Alkali washing tower; 52. Alkali tank; 53. First spray layer; 54. Second spray layer; 55. Third spray layer; 81. Waste acid collection tank; 82. First filter; 83. Heating kettle; 84. Second filter; 85. Neutralization tank; 86. Filter press; 87. Filtrate tank; 88. Calcium sulfate storage tank; 500, Float valve; 510, First circulation pump; 511, First baffle; 512, Second baffle; 520, Second circulation pump; 530, Third circulation pump; 5100, First three-way valve; 5101, First circulation port; 5102, Second circulation port; 5103, Third circulation port; 5104, Drain port; 5105, Air inlet; 5106, Exhaust port; 5111, First connecting pipe; 5112, First rainproof cap; 5121, Second connecting pipe; 5122, Second rainproof cap; 5200, Second three-way valve; 5300, Third three-way valve. Detailed Implementation

[0016] To make the objectives, technical solutions, and advantages of the embodiments of this application clearer, the technical solutions in the embodiments of this application are described clearly and completely below. Obviously, the described embodiments are only some embodiments of this application, not all embodiments. Based on the embodiments in this application, all other embodiments obtained by those skilled in the art without creative effort are also within the scope of protection of this application.

[0017] like Figure 1 As shown, this application provides an acetylene gas purification device, including an acetylene generator 1, a first water washing tower 2, an acid washing tower 3, a second water washing tower 4, an alkaline washing device 5, a third water washing tower 6, a compressor 10, and a gas holder 7 connected in series. The pickling tower 3 is also connected to the waste acid treatment device 8, which is also connected to the acetylene generator 1.

[0018] In operation, the crude acetylene (containing impurities such as hydrogen sulfide and phosphine) generated in the acetylene generator 1 is sent to the first water washing tower 2 for initial water washing to remove water-soluble impurities. The crude acetylene gas after the initial water washing is then sent to the acid washing tower 3, where concentrated sulfuric acid is used as the washing agent. The oxidizing properties of concentrated sulfuric acid are used to oxidize the acetylene gas to sulfurous acid and the phosphine to phosphoric acid for removal. The waste acid after washing is discharged into the acid treatment device 8 for further treatment.

[0019] After being washed with concentrated sulfuric acid in acid washing tower 3, the acetylene gas enters the second water washing tower 4. After water washing, sulfuric acid, phosphoric acid, sulfurous acid and other substances in the acetylene gas are removed. After the second water washing, the acetylene gas enters the alkaline washing device 5 for further washing.

[0020] After being washed with alkaline solution, the acetylene gas enters the third water washing tower 6 for a second water washing. The washed acetylene gas is then compressed by compressor 10 and sent to gas holder 7 for storage.

[0021] This application provides an acetylene gas purification device. A first water washing tower 2 is used to preliminarily wash impurities from crude acetylene gas. The preliminarily washed acetylene gas is then fed into an acid washing tower 3, where concentrated sulfuric acid is used to remove phosphine and hydroxide sulfides. The acid-washed acetylene is then washed with water, followed by an alkaline washing device 5 to remove residual acidic substances. Finally, the alkaline-washed acetylene gas is washed with water again to obtain pure acetylene gas. This pure acetylene gas is then compressed using a compressor 10 and stored in a gas holder. This device, through the combined use of the above equipment, removes impurities from crude acetylene to purify the gas. Since sodium hypochlorite oxidation is not used, it effectively overcomes the drawbacks of sodium hypochlorite oxidation, which generates large amounts of difficult-to-treat sodium hypochlorite wastewater.

[0022] like Figure 2 As shown, optionally, a demisting device 9 is provided between the third water washing tower 6 and the compressor 10.

[0023] In this application, since the acetylene gas after washing still contains a small amount of water mist, a demisting device 9 is provided to remove this water mist. For example, the demisting device 9 is filled with corrugated plate demisting packing or wire mesh demisting packing.

[0024] like Figure 2 As shown, optionally, the first water washing tower 2, the second water washing tower 4, the alkaline washing device 5 and the third water washing tower 6 are all connected to the wastewater pool 20.

[0025] In this application, since these wastewaters contain acidic wastewater, such as wastewater from the first water washing tower 2 and the second water washing tower 4, and alkaline wastewater, such as wastewater from the alkaline washing device 5 and the third water washing tower 6, combining the wastewater from the above devices into the wastewater pool 20 can neutralize these wastewaters and facilitate centralized treatment.

[0026] like Figure 3 As shown, optionally, the waste acid treatment device 8 includes a waste acid collection tank 81, a first filter 82, a heating kettle 83, a second filter 84, a neutralization tank 85, a filter press 86, and a filtrate tank 87 connected in series. The filtrate tank 87 is also connected to the wastewater tank 20; The filter press 86 is also connected to the calcium sulfate storage tank 88.

[0027] In this application, during treatment in the acid treatment device 8, the waste acid is temporarily collected in the waste acid collection tank 81. Since impurities in the crude acetylene gas will produce polymers or solids during the oxidation of concentrated sulfuric acid, the waste acid needs to be pre-filtered through the first filter 82 to remove solid particles. The filtered waste acid is then added to the heating kettle 83 for heating and concentration. During concentration, some substances mixed in with the waste acid will react and polymerize to form solid particles. The concentrated waste acid is then filtered a second time using the second filter 84. The filtered waste acid is transferred to the neutralization tank 85 to neutralize with the calcium hydroxide obtained from acetylene production in the acetylene generator 1 to produce calcium sulfate. The neutralized slurry is then filtered through the filter press 86 to obtain crude calcium sulfate, which is stored in the calcium sulfate storage tank 88. The filtrate is combined with the wastewater in the wastewater tank 20 and treated together with wastewater from other devices. Due to the high corrosiveness of the waste acid, the aforementioned equipment in contact with the waste acid should be made of corrosion-resistant materials or lined with polytetrafluoroethylene (PTFE).

[0028] like Figure 4 As shown, optionally, the alkaline washing device 5 includes an alkaline washing tower 51 and an alkaline solution tank 52; The alkaline washing tower 51 is divided into an upper concentrated alkali washing zone, a middle medium alkali washing zone, and a lower weak alkali washing zone from top to bottom by a first partition 511 and a second partition 512. A first connecting pipe 5111 is provided on the first partition 511. The first connecting pipe 5111 passes through the first partition 511 to connect the concentrated alkali washing area and the medium alkali washing area. The portion of the first connecting pipe 5111 located in the concentrated alkali washing area extends upward and is provided with a first rainproof cap 5112 at the top. A second connecting pipe 5121 is provided on the second partition 512. The second connecting pipe 5121 passes through the medium alkaline washing zone and the weak alkaline washing zone of the second partition 512 and connects them. The part of the second connecting pipe 5121 located in the medium alkaline washing zone extends upward and is provided with a second rainproof cap 5122 at the top.

[0029] In this application, dividing the alkaline scrubbing tower 51 into multiple scrubbing sections allows for multi-stage scrubbing of acetylene gas, thereby improving the scrubbing effect.

[0030] like Figure 4 As shown, optionally, a first spray layer 53 is provided at the upper part of the concentrated alkali washing zone, and a first circulation port 5101 is provided at the lower part of the concentrated alkali washing zone near the first partition 511. The first circulation port 5101 is connected to the first circulation pump 510 and the first spray layer 53 in sequence through the first three-way valve 5100. The first circulation pump 510 is also connected to the alkali tank 52 through the first three-way valve 5100. A second spray layer 54 is provided in the upper part of the medium-alkali washing zone, and a second circulation port 5102 is provided in the lower part of the medium-alkali washing zone near the second partition 512. The second circulation port 5102 is connected to the second circulation pump 520 and the second spray layer 54 in sequence through the second three-way valve 5200. The second circulation pump 520 is also connected to the first circulation port 5101 through the second three-way valve 5200. A third spray layer 55 is provided at the upper part of the weak alkaline washing zone. A third circulation port 5103 and a drain port 5104 are provided at the bottom of the weak alkaline washing zone. The third circulation port 5103 is connected to the third circulation pump 530 and the third spray layer 55 in sequence through the third three-way valve 5300. The third circulation pump 530 is also connected to the second circulation port 5102 through the third three-way valve 5300. An air inlet 5105 is provided on one side of the weak alkaline washing area, and an exhaust outlet 5106 is provided on the top of the concentrated alkaline washing area.

[0031] In this application, during washing in the alkaline washing device 5, acetylene gas enters the weakly alkaline washing zone of the alkaline washing tower 51 from the inlet 5105. Simultaneously, the third circulation pump 530 draws alkaline washing liquid from the tower into the third spray layer 55 (at this time, the third three-way valve 5300 is in a state where it connects the third circulation port 5103 and the third circulation pump 530 while blocking the second circulation port 5102), spraying and washing the upward-moving acetylene gas. The washed acetylene gas then rises through the second connecting... Pipe 5121 enters the medium-alkali washing zone. The second circulation pump 520 pumps the alkaline washing liquid into the second spray layer 54 to perform countercurrent washing on the upward acetylene gas (at this time, the second three-way valve 5200 is in the state of connecting the second circulation port 5102 and the second circulation pump 520 while blocking the first circulation port 5101). Due to the presence of the second anti-spray cap 5122, the alkaline liquid sprayed by the second spray layer 54 will not directly enter the lower weak-alkali washing zone through the first connecting pipe 5121.

[0032] After being washed in the medium-alkali washing zone, the acetylene gas rises and enters the concentrated alkali washing zone through the first connecting pipe 5111. At this time, the first circulation pump 510 draws the alkaline washing liquid in the zone into the first spray layer 53 to perform countercurrent spray washing on the rising acetylene gas (at this time, the first three-way valve 5100 is in the state of connecting the first circulation port 5101 and the first circulation pump 510 while blocking the alkali tank 52).

[0033] When the alkalinity of the repeatedly circulated alkali solution decreases (meaning it falls below the alkalinity requirement for that section, for example, the alkali concentration in the concentrated alkali washing zone is 15%±2%, in the medium alkali washing zone it is 10%±2%, and in the weak alkali washing zone it is 2%±1%, the above concentrations are mass concentrations), the first three-way valve 5100 switches to a state that connects the first circulation pump 510 and the alkali tank 52 while blocking the first circulation port 5101, transferring the fresh alkali solution in the alkali tank 52 into the first spray layer 53 for spraying; similarly, the second three-way valve 520... Switching to the state where the second circulation pump 520 is connected to the first circulation port 5101 while the second circulation port 5102 is blocked, the alkaline solution in the concentrated alkaline washing zone is drawn and circulated to the second spray layer 54 for spraying; while in the weak alkaline washing zone, the alkaline solution is first discharged into the wastewater tank 20 through the drain port 5104, and then the third three-way valve 5300 is switched to the state where the third circulation pump 530 is connected to the second circulation port 5102 while the first circulation port 5101 is blocked, the alkaline solution in the medium alkaline washing zone is drawn to the third spray layer 55 for spray washing.

[0034] After being washed with alkaline solution, the acetylene gas is discharged from the exhaust port 5106 at the top of the tower and enters the third water washing tower 6 for further water washing.

[0035] like Figure 4 As shown, optionally, the alkali tank 52 is also connected to the nitrogen gas bladder 50 via a float valve 500.

[0036] In this application, in order to prevent air from entering the alkali tank 52 and causing the alkali solution to deteriorate (the alkali solution is an aqueous solution of sodium hydroxide or potassium hydroxide, which reacts with carbon dioxide in the air to produce corresponding carbonates or bicarbonates, resulting in a decrease in alkalinity and deterioration), the alkali tank 52 is connected to the nitrogen gas bladder 50 through a float valve 500. When the alkali tank 52 is discharging alkali solution, the float valve 500 opens, and nitrogen enters the alkali tank 52 to form a nitrogen seal above the liquid surface. When alkali solution is added to the alkali tank 52, the nitrogen above the liquid surface of the alkali tank 52 enters the nitrogen gas bladder 50 through the float valve 500. When the alkali solution level reaches a certain height, the float valve 500 closes to prevent the alkali solution from entering the nitrogen gas bladder 50.

[0037] An acetylene gas purification device, the working process of which is as follows: During use, the crude acetylene (containing impurities such as hydrogen sulfide and phosphine) generated in the acetylene generator 1 is output to the first water washing tower 2 for initial water washing to remove water-soluble impurities from the crude acetylene gas. The wastewater after water washing is discharged into the wastewater pool 20, and then the crude acetylene gas after the first water washing is sent to the acid washing tower 3, using concentrated sulfuric acid as the washing agent. The oxidizing properties of concentrated sulfuric acid are used to oxidize the sulfide in acetylene gas into sulfurous acid and phosphine into phosphoric acid for removal. The washed waste acid is discharged into acid treatment device 8 for treatment. During treatment in acid treatment device 8, the waste acid is collected and temporarily stored in waste acid collection tank 81. Since impurities in crude acetylene gas will produce some polymers or solids during the oxidation process of concentrated sulfuric acid, the waste acid needs to be pre-filtered through the first filter 82 to remove solid particles. The filtered waste acid is then added to the heating kettle 83 for heating and concentration. During the concentration process, some substances mixed in with the waste acid will react and polymerize to form solid particles. The concentrated waste acid is then filtered a second time through the second filter 84. The filtered waste acid is transferred to the neutralization tank 85 to neutralize the calcium hydroxide obtained from the acetylene generator 1 to produce calcium sulfate. The neutralized slurry is then filtered through the filter press 86 to obtain crude calcium sulfate, which is stored in the calcium sulfate storage tank 88. The filtrate is combined with the wastewater in the wastewater tank 20 and treated together with the wastewater generated by other devices.

[0038] Acetylene gas, after being washed with concentrated sulfuric acid in acid washing tower 3, enters the second water washing tower 4. After water washing, sulfuric acid, phosphoric acid, sulfurous acid and other substances in the acetylene gas are removed. The wastewater after water washing is discharged into wastewater pool 20. After the second water washing, the acetylene gas enters the alkaline washing device 5 for washing.

[0039] During washing in the alkaline washing device 5, acetylene gas enters the weak alkaline washing zone of the alkaline washing tower 51 from the inlet 5105. At the same time, the third circulation pump 530 draws the alkaline washing liquid in the tower into the third spray layer 55 (at this time, the third three-way valve 5300 is in the state of connecting the third circulation port 5103 and the third circulation pump 530 while blocking the second circulation port 5102), spraying and washing the upward acetylene gas. The washed acetylene gas rises and enters the medium alkaline washing zone through the second connecting pipe 5121. The second circulation pump 520 pumps the alkaline washing liquid into the second spray layer 54 to perform countercurrent washing of the upward acetylene gas (at this time, the second three-way valve 5200 is in the state of connecting the second circulation port 5102 and the second circulation pump 520 while blocking the first circulation port 5101). Due to the presence of the second anti-spray cap 5122, the alkaline liquid sprayed by the second spray layer 54 will not directly enter the lower weak alkaline washing zone through the first connecting pipe 5121.

[0040] After being washed in the medium-alkali washing zone, the acetylene gas rises and enters the concentrated alkali washing zone through the first connecting pipe 5111. At this time, the first circulation pump 510 draws the alkaline washing liquid in the zone into the first spray layer 53 to perform countercurrent spray washing on the rising acetylene gas (at this time, the first three-way valve 5100 is in the state of connecting the first circulation port 5101 and the first circulation pump 510 while blocking the alkali tank 52).

[0041] When the alkalinity of the repeatedly circulated alkali solution decreases (meaning it falls below the alkalinity requirement for that section, for example, the alkali concentration in the concentrated alkali washing zone is 15%±2%, in the medium alkali washing zone it is 10%±2%, and in the weak alkali washing zone it is 2%±1%, the above concentrations are mass concentrations), the first three-way valve 5100 switches to a state that connects the first circulation pump 510 and the alkali tank 52 while blocking the first circulation port 5101, transferring the fresh alkali solution in the alkali tank 52 into the first spray layer 53 for spraying; similarly, the second three-way valve 520... Switching to the state where the second circulation pump 520 is connected to the first circulation port 5101 while the second circulation port 5102 is blocked, the alkaline solution in the concentrated alkaline washing zone is drawn and circulated to the second spray layer 54 for spraying; while in the weak alkaline washing zone, the alkaline solution is first discharged into the wastewater tank 20 through the drain port 5104, and then the third three-way valve 5300 is switched to the state where the third circulation pump 530 is connected to the second circulation port 5102 while the first circulation port 5101 is blocked, the alkaline solution in the medium alkaline washing zone is drawn to the third spray layer 55 for spray washing.

[0042] After being washed with alkaline solution, the acetylene gas is discharged from the exhaust port 5106 at the top of the tower and enters the third water washing tower 6 for further water washing. The wastewater after water washing is discharged into the wastewater pool 20. After water washing, the acetylene gas passes through the demister 9 to remove the water mist it carries, and then is compressed by the compressor 10 and sent to the gas holder 7 for storage.

[0043] Meanwhile, to prevent air from entering the alkali tank 52 and causing the alkali solution to deteriorate (the alkali solution is an aqueous solution of sodium hydroxide or potassium hydroxide, which reacts with carbon dioxide in the air to produce corresponding carbonates or bicarbonates, leading to a decrease in alkalinity and deterioration), the alkali tank 52 is connected to the nitrogen bladder 50 via a float valve 500. When the alkali tank 52 is discharging alkali solution, the float valve 500 opens, and nitrogen enters the alkali tank 52 to form a nitrogen seal above the liquid surface. When alkali solution is added to the alkali tank 52, the nitrogen above the liquid surface of the alkali tank 52 enters the nitrogen bladder 50 through the float valve 500. When the alkali solution level reaches a certain height, the float valve 500 closes to prevent the alkali solution from entering the nitrogen bladder 50.

[0044] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of this application, and are not intended to limit them. Although this application has been described in detail with reference to the foregoing embodiments, those skilled in the art should understand that modifications can still be made to the technical solutions described in the foregoing embodiments, or equivalent substitutions can be made to some or all of the technical features therein. Such modifications or substitutions do not cause the essence of the corresponding technical solutions to deviate from the scope of the technical solutions of the embodiments of this application.

Claims

1. An acetylene gas purification device, characterized in that, It includes an acetylene generator (1), a first water washing tower (2), an acid washing tower (3), a second water washing tower (4), an alkaline washing device (5), a third water washing tower (6), a compressor (10), and a gas holder (7) connected in series. The pickling tower (3) is also connected to the waste acid treatment device (8), which is also connected to the acetylene generator (1).

2. The acetylene gas purification device according to claim 1, characterized in that, A demisting device (9) is provided between the third water washing tower (6) and the compressor (10).

3. The acetylene gas purification device according to claim 1, characterized in that, The first water washing tower (2), the second water washing tower (4), the alkaline washing device (5) and the third water washing tower (6) are all connected to the wastewater pool (20).

4. The acetylene gas purification device according to claim 3, characterized in that, The waste acid treatment device (8) includes a waste acid collection tank (81), a first filter (82), a heating kettle (83), a second filter (84), a neutralization tank (85), a filter press (86), and a filtrate tank (87) connected in series. The filtrate tank (87) is also connected to the wastewater tank (20); The filter press (86) is also connected to a calcium sulfate storage tank (88).

5. The acetylene gas purification device according to claim 1, characterized in that, The alkaline washing device (5) includes an alkaline washing tower (51) and an alkaline liquid tank (52). The alkaline washing tower (51) is divided into an upper concentrated alkali washing zone, a middle medium alkali washing zone and a lower weak alkali washing zone from top to bottom by a first partition (511) and a second partition (512). The first partition (511) is provided with a first connecting pipe (5111), which passes through the first partition (511) to connect the concentrated alkali washing area and the medium alkali washing area. The portion of the first connecting pipe (5111) located in the concentrated alkali washing area extends upward and is provided with a first rainproof cap (5112) at the top. The second partition (512) is provided with a second connecting pipe (5121), which passes through the alkaline washing zone and the weak alkaline washing zone of the second partition (512) and connects them. The part of the second connecting pipe (5121) located in the alkaline washing zone extends upward and is provided with a second rainproof cap (5122) at the top.

6. The acetylene gas purification device according to claim 5, characterized in that, The upper part of the concentrated alkali washing zone is provided with a first spray layer (53), and the lower part of the concentrated alkali washing zone is provided with a first circulation port (5101) near the first partition (511). The first circulation port (5101) is connected to the first circulation pump (510) and the first spray layer (53) in sequence through the first three-way valve (5100). The first circulation pump (510) is also connected to the alkali tank (52) through the first three-way valve (5100). The upper part of the medium-alkali washing zone is provided with a second spray layer (54), and the lower part of the medium-alkali washing zone is provided with a second circulation port (5102) near the second partition (512). The second circulation port (5102) is connected to the second circulation pump (520) and the second spray layer (54) in sequence through the second three-way valve (5200). The second circulation pump (520) is also connected to the first circulation port (5101) through the second three-way valve (5200). The upper part of the weak alkaline washing zone is provided with a third spray layer (55), and the bottom of the weak alkaline washing zone is provided with a third circulation port (5103) and a drain port (5104). The third circulation port (5103) is connected to the third circulation pump (530) and the third spray layer (55) in sequence through a third three-way valve (5300). The third circulation pump (530) is also connected to the second circulation port (5102) through the third three-way valve (5300). An air inlet (5105) is provided on one side of the weak alkaline washing zone, and an exhaust outlet (5106) is provided on the top of the concentrated alkaline washing zone.

7. The acetylene gas purification device according to claim 5, characterized in that, The alkali tank (52) is also connected to the nitrogen gas bag (50) via a float valve (500).

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