Resistance loading mechanism
Patent Information
- Application Number
- CN202521851850.2
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2025-08-29
- Publication Date
- 2026-09-04
- Estimated Expiration
- 2035-08-29
AI Technical Summary
这不仅导致设备通用性差,而且在实际测试生产中切换操作繁琐、效率低下,难以同时满足不同尺寸贴片电阻的上料需求
[0013] 1) By setting a bending section on the limiting plate and utilizing different cooperation methods between the bending section and the protruding part of the feeding chamber, the same station can be compatible with feeding chambers of different fixed sizes, thus completing the feeding operation of large and small surface mount resistors in one feeding mechanism. This design avoids the cumbersome process of replacing the entire feeding device or frequently adjusting the structure in the prior art, and significantly improves the versatility and adaptability of the feeding mechanism.
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Figure CN224715861U_ABST
Abstract
Description
Technical Field
[0001] This application relates to the field of resistance testing technology, and in particular to a resistor feeding mechanism. Background Technology
[0002] With the widespread use of smartphones, tablets, and other electronic products, the integration level of electronic components is constantly increasing. Among them, surface mount resistors, as one of the most commonly used basic components, are widely used in various circuit modules. Surface mount resistors typically require testing during the production process to ensure that their electrical performance meets design requirements. Before resistance testing, mass-produced surface mount resistors are often loaded into a loading chamber and supplied to the testing device one by one through a loading mechanism to achieve efficient and continuous testing operations.
[0003] Existing resistor loading mechanisms typically use a substrate and limiting components to fix the loading chamber, and a lifting device at the bottom of the loading chamber to push the resistors one by one into the testing station. This type of solution can achieve a relatively stable feeding effect in the loading of single-specification surface mount resistors and has been widely used in electronic component testing equipment.
[0004] However, with the increasing variety of electronic products on the market, different circuit boards often require surface mount resistors of different sizes. Existing feeding mechanisms typically only accommodate one type of resistor loading bay. When changing to a different size resistor, the entire feeding device often needs to be replaced or the feeding structure adjusted. This not only results in poor equipment versatility but also makes switching operations cumbersome and inefficient in actual testing and production, making it difficult to simultaneously meet the feeding needs of surface mount resistors of different sizes. Utility Model Content
[0005] To simultaneously meet the feeding requirements of surface mount resistors of different sizes during actual resistor testing, this application provides a resistor feeding mechanism. This application provides the following technical solution:
[0006] A resistor feeding mechanism includes a substrate, a first feeding chamber, and a second feeding chamber. The size of the resistor corresponding to the first feeding chamber is larger than the size of the resistor corresponding to the second feeding chamber. The substrate is provided with a first limiting plate and a second limiting plate, both vertically arranged. The two sides of the second limiting plate are bent towards the first limiting plate to form bending portions. The distance between the two bending portions is equal to the length of the second feeding chamber. The second feeding chamber is inserted between the first limiting plate and the second limiting plate and is locked between the bending portions. The two sides of the first feeding chamber protrude outward to form a first protrusion and a second protrusion, respectively. The distance between the first protrusion and the second protrusion is equal to the length of the second limiting plate. The first feeding chamber is inserted between the first limiting plate and the second limiting plate and is locked outside the bending portions.
[0007] In one specific implementation, the substrate is hollowly disposed between the first limiting plate and the second limiting plate, and the bottom surface of the substrate is connected to a first fixing frame. The bottom surface of the first fixing frame is provided with a first electric cylinder, and the piston rod of the first electric cylinder passes through the first fixing frame and is located in the hollow part of the substrate.
[0008] In one specific implementation scheme, the first limiting plate and the second limiting plate are at the same height, the top of the second limiting plate is provided with a first photoelectric sensor, and the top of the first limiting plate is provided with a second photoelectric sensor.
[0009] In one specific implementation scheme, the substrate is further provided with a third limiting plate and a fourth limiting plate, both of which are vertically arranged. The third limiting plate has the same structure as the first limiting plate, and the fourth limiting plate has the same structure as the second limiting plate. The third limiting plate and the fourth limiting plate constitute a preparatory station.
[0010] In one specific implementation, the substrate is hollowed out between the third limiting plate and the fourth limiting plate, and the bottom surface of the substrate is provided with a second fixing frame. The bottom surface of the second fixing frame is provided with a second electric cylinder, and the piston rod of the second electric cylinder passes through the second fixing frame and is located in the hollow part of the substrate.
[0011] In one specific implementation, the third limiting plate and the fourth limiting plate are at the same height, and the top of the fourth limiting plate is provided with a third photoelectric sensor and the top of the third limiting plate is provided with a fourth photoelectric sensor.
[0012] In summary, the beneficial effects of this application include at least the following:
[0013] 1) By setting a bending section on the limiting plate and utilizing different cooperation methods between the bending section and the protruding part of the feeding chamber, the same station can be compatible with feeding chambers of different fixed sizes, thus completing the feeding operation of large and small surface mount resistors in one feeding mechanism. This design avoids the cumbersome process of replacing the entire feeding device or frequently adjusting the structure in the prior art, and significantly improves the versatility and adaptability of the feeding mechanism.
[0014] 2) An electric cylinder is installed in the hollow part of the substrate, and a through-beam photoelectric sensor is used for detection and motion control, realizing automated feeding of resistors one by one. This structure not only ensures the stability and accuracy of the resistor feeding process, but also reduces the occurrence of abnormalities such as jamming and leakage during testing, thereby improving the overall testing efficiency and production reliability.
[0015] By setting opposing first and second limiting plates on the substrate, and forming bent portions on both sides of the second limiting plate, the second feeding chamber can be stably fixed by inserting into the bent portions. Simultaneously, protrusions are provided on both sides of the first feeding chamber. The length of the protrusions matches the length of the second limiting plate, allowing the first feeding chamber to be secured by locking onto the outside of the bent portions. This structure, through the differentiated cooperation between the bent portions of the limiting plates and the protrusions of the feeding chambers, allows the same station on the substrate to accommodate both smaller second feeding chambers and larger first feeding chambers. Therefore, during actual resistor testing, the feeding mechanism can select the corresponding feeding chamber for fixing and feeding according to the different sizes of surface mount resistors, thus simultaneously meeting the feeding requirements of surface mount resistors of different sizes and improving the compatibility and continuity of the testing process.
[0016] The above description is only an overview of the technical solution of this application. In order to better understand the technical means of this application and to implement it in accordance with the contents of the specification, the preferred embodiments of this application are described in detail below with reference to the accompanying drawings. Attached Figure Description
[0017] Figure 1 This is a schematic diagram of the resistor feeding mechanism in this embodiment.
[0018] Figure 2 This is a schematic diagram of the structure of the first and second feeding chambers in this embodiment.
[0019] Figure 3 This is a schematic diagram of the actual loading structure of the first loading compartment in this embodiment.
[0020] Figure 4 This is a schematic diagram of the actual loading structure of the second loading compartment in this embodiment.
[0021] Reference numerals: 1. Substrate; 11. First loading station; 111. First limiting plate; 112. Second limiting plate; 1121. Bending section; 12. Second loading station; 13. Preparatory station; 131. Third limiting plate; 132. Fourth limiting plate; 14. First fixing frame; 15. Second fixing frame; 16. First electric cylinder; 17. Second electric cylinder; 2. First loading chamber; 21. First protrusion; 22. Second protrusion; 3. Second loading chamber; 4. First photoelectric sensor; 5. Second photoelectric sensor; 6. Third photoelectric sensor; 7. Fourth photoelectric sensor. Detailed Implementation
[0022] The specific embodiments of this utility model will be described in further detail below with reference to the accompanying drawings and examples. The following examples are used to illustrate this utility model, but are not intended to limit its scope.
[0023] To make the above-mentioned objectives, features, and advantages of this application more apparent and understandable, the specific embodiments of this application will be described in detail below with reference to the accompanying drawings. It should be understood that the specific embodiments described herein are for illustrative purposes only and are not intended to limit the scope of this application. Furthermore, it should be noted that, for ease of description, only the parts relevant to this application are shown in the accompanying drawings, not the entire structure. Based on the embodiments in this application, all other embodiments obtained by those skilled in the art without inventive effort are within the scope of protection of this application.
[0024] The terms “comprising” and “having”, and any variations thereof, used in this application are intended to cover non-exclusive inclusion. For example, a process, method, system, product, or apparatus that includes a series of steps or units is not limited to the steps or units listed, but may optionally include steps or units not listed, or may optionally include other steps or units inherent to such process, method, product, or apparatus.
[0025] In this document, the term "embodiment" means that a particular feature, structure, or characteristic described in connection with an embodiment may be included in at least one embodiment of this application. The appearance of this phrase in various places throughout the specification does not necessarily refer to the same embodiment, nor is it a separate or alternative embodiment mutually exclusive with other embodiments. It will be explicitly and implicitly understood by those skilled in the art that the embodiments described herein can be combined with other embodiments.
[0026] This application discloses a resistor feeding mechanism.
[0027] Reference Figure 1 and Figure 2 The resistor feeding mechanism includes a substrate 1, a first feeding chamber 2, and a second feeding chamber 3. The size of the resistor corresponding to the first feeding chamber 2 is larger than the size of the resistor corresponding to the second feeding chamber 3. The substrate 1 is provided with a first feeding station 11 and a second feeding station 12. The first feeding station 11 and the second feeding station 12 are identical, so only the structure of the first feeding station 11 will be described in detail below. The substrate 1 is provided with a first limiting plate 111 and a second limiting plate 112, both of which are vertically arranged. The first limiting plate 111 and the second limiting plate 112 together constitute the first feeding station 11. The two sides of the second limiting plate 112 are bent towards the first limiting plate 111 to form bent portions 1121. The distance between the bent portions 1121 on both sides of the second limiting plate 112 is equal to the length of the second feeding chamber 3. Figure 4As shown, during loading, the second loading chamber 3 is inserted between the first limiting plate 111 and the second limiting plate 112 and locked between the bending portions 1121, thereby completing the fixation of the second loading chamber 3 on the substrate 1. The first loading chamber 2 has outwardly protruding sides forming a first protrusion 21 and a second protrusion 22, respectively. The distance between the first protrusion 21 and the second protrusion 22 is equal to the length of the second limiting plate 112. Figure 3 As shown, when the first feeding chamber 2 is feeding, it is inserted between the first limiting plate 111 and the second limiting plate 112 and is locked on the outside of the bending part 1121, thereby completing the fixation of the first feeding chamber 2 on the substrate 1.
[0028] Reference Figure 1 and Figure 2 A hollow space is provided on the substrate 1 between the first limiting plate 111 and the second limiting plate 112. A first fixing frame 14 is connected to the bottom surface of the substrate 1, and a first electric cylinder 16 is fixedly installed on the bottom surface of the first fixing frame 14. The piston rod of the first electric cylinder 16 passes through the first fixing frame 14 and is located in the hollow space of the substrate 1. At this time, the piston rod of the first electric cylinder 16 abuts against the bottom surface of the first loading chamber 2 or the second loading chamber 3. The first limiting plate 111 and the second limiting plate 112 are at the same height. A first photoelectric sensor 4 is provided at the top of the second limiting plate 112, and a second photoelectric sensor 5 is provided at the top of the first limiting plate 111. The first photoelectric sensor 4 and the second photoelectric sensor 5 together form a through-beam photoelectric sensor. The above structure facilitates real-time detection when resistors enter the loading station one by one. When the photoelectric sensor senses the position of the resistor, it can send a signal to the control system in a timely manner to drive the piston rod of the first electric cylinder 16 to perform a lifting action, thereby ensuring that the resistor can be smoothly pushed to the loading position.
[0029] Furthermore, by using photoelectric sensors to accurately sense the position of the resistors being fed, test anomalies caused by resistors not being pushed in time or their position being offset can be effectively avoided, ensuring the stability and reliability of the feeding process.
[0030] Reference Figure 1 and Figure 2The substrate 1 is also provided with a preparation station 13. Specifically, the substrate 1 is also provided with a third limiting plate 131 and a fourth limiting plate 132, both of which are vertically arranged. The third limiting plate 131 has the same structure as the first limiting plate 111, and the fourth limiting plate 132 has the same structure as the second limiting plate 112. The third limiting plate 131 and the fourth limiting plate 132 together constitute the preparation station 13. The substrate 1 is hollow between the third limiting plate 131 and the fourth limiting plate 132. The bottom surface of the substrate 1 is provided with a second fixing frame 15. A second electric cylinder 17 is fixedly installed on the bottom surface of the second fixing frame 15. The piston rod of the second electric cylinder 17 passes through the second fixing frame 15 and is located in the hollow part of the substrate 1. At this time, the piston rod of the second electric cylinder 17 abuts against the bottom surface of the first loading chamber 2 or the second loading chamber 3. The third limiting plate 131 and the fourth limiting plate 132 are at the same height. A third photoelectric sensor 6 is mounted on the top of the fourth limiting plate 132, and a fourth photoelectric sensor 7 is mounted on the top of the third limiting plate 131. The third photoelectric sensor 6 and the fourth photoelectric sensor 7 together form a through-beam photoelectric sensor. The aforementioned backup station 13 allows the equipment to continue feeding resistors even if the main station experiences jamming, malfunction, or requires a change of the feeding chamber, thus ensuring uninterrupted testing. This not only improves the continuity and stability of the feeding mechanism but also provides backup protection in case of emergencies, preventing downtime caused by the failure of a single station and improving overall production efficiency and reliability.
[0031] In summary, by setting opposing first limiting plates 111 and second limiting plates 112 on the substrate 1, and forming bent portions 1121 on both sides of the second limiting plate 112, the second loading chamber 3 can be stably fixed by inserting into the bent portions 1121. Simultaneously, protrusions are provided on both sides of the first loading chamber 2, and the length of the protrusions matches that of the second limiting plate 112, allowing the first loading chamber 2 to be fixed by being engaged with the outside of the bent portions 1121. This structure, through the differentiated cooperation between the bent portions 1121 of the limiting plates and the protrusions of the loading chambers, allows the same workstation on the substrate 1 to accommodate both the smaller second loading chamber 3 and the larger first loading chamber 2. Therefore, during the actual resistance testing process, the loading mechanism can select the corresponding loading chamber for fixing and feeding according to the different sizes of surface mount resistors, thereby simultaneously meeting the loading requirements of surface mount resistors of different sizes and improving the compatibility and continuity of the testing process.
[0032] The above are all preferred embodiments of this application, and are not intended to limit the scope of protection of this application. Therefore, all equivalent changes made in accordance with the structure, shape and principle of this application should be covered within the scope of protection of this application.
Claims
1. A resistor feeding mechanism, characterized in that, The device includes a substrate, a first feeding chamber, and a second feeding chamber. The size of the resistor corresponding to the first feeding chamber is larger than the size of the resistor corresponding to the second feeding chamber. The substrate is provided with a first limiting plate and a second limiting plate, both of which are vertically arranged. The two sides of the second limiting plate are bent towards the first limiting plate to form a bent portion. The distance between the two bent portions is equal to the length of the second feeding chamber. The second feeding chamber is inserted between the first limiting plate and the second limiting plate and is locked between the bent portions. The two sides of the first feeding chamber are protruding outward to form a first protrusion and a second protrusion, respectively. The distance between the first protrusion and the second protrusion is equal to the length of the second limiting plate. The first feeding chamber is inserted between the first limiting plate and the second limiting plate and is locked outside the bent portion.
2. The resistor feeding mechanism according to claim 1, characterized in that, The substrate is hollowly disposed between the first limiting plate and the second limiting plate. The bottom surface of the substrate is connected to a first fixing frame. The bottom surface of the first fixing frame is provided with a first electric cylinder. The piston rod of the first electric cylinder passes through the first fixing frame and is located in the hollow part of the substrate.
3. The resistor feeding mechanism according to claim 1, characterized in that, The first limiting plate and the second limiting plate are at the same height. The top of the second limiting plate is provided with a first photoelectric sensor, and the top of the first limiting plate is provided with a second photoelectric sensor.
4. The resistor feeding mechanism according to claim 1, characterized in that, The substrate is also provided with a third limiting plate and a fourth limiting plate, both of which are vertically arranged. The third limiting plate has the same structure as the first limiting plate, and the fourth limiting plate has the same structure as the second limiting plate. The third limiting plate and the fourth limiting plate constitute a preparatory station.
5. The resistor feeding mechanism according to claim 4, characterized in that, The substrate is hollowly disposed between the third limiting plate and the fourth limiting plate. The bottom surface of the substrate is provided with a second fixing frame, and the bottom surface of the second fixing frame is provided with a second electric cylinder. The piston rod of the second electric cylinder passes through the second fixing frame and is located in the hollow part of the substrate.
6. The resistor feeding mechanism according to claim 4, characterized in that, The third limiting plate and the fourth limiting plate are at the same height. The top of the fourth limiting plate is provided with a third photoelectric sensor, and the top of the third limiting plate is provided with a fourth photoelectric sensor.