A magnetron sputtering coating device

Abstract

A kind of magnetron sputtering coating device, including shell, target material, target seat, positioning seat, controller, cooling device, gas inlet and exhaust are provided on shell, target seat and positioning seat are connected on shell, target seat is connected with power supply, target seat is connected with controller by line, target seat is connected with cooling device by cooling water pipe, controller and cooling device are set outside shell, target material is connected on target seat, target seat is located at the bottom of shell, target material is located at the top of target seat, positioning seat is located above target material, the top surface of positioning seat is the positioning surface that can fix workpiece, positioning seat through-hole is distributed on positioning surface.The utility model has the advantages of reducing the influence of pollution source on workpiece film layer, effectively keeping coating clean, and good coating effect;At the same time, since workpiece is located above target material, target material particles can better be shot to each position on the surface of workpiece, and more uniform film layer covering effect is obtained.

Description

Technical Field

[0001] This utility model relates to the field of vacuum magnetron sputtering technology, and more particularly to a magnetron sputtering coating device. Background Technology

[0002] Vacuum magnetron sputtering involves introducing an inert gas, such as argon, into a vacuum chamber and applying an electric field to ionize the gas, generating plasma. Argon ions bombard the target material above under the influence of the electric field, sputtering target atoms downwards at a specific angle, ultimately depositing onto the surface of the workpiece below to form a thin film. However, this coating method introduces several contaminants during the coating process. Besides target atoms, tiny particles, impurities, or unionized target particles are present. These contaminants, influenced by gravity, naturally fall and land directly on the workpiece surface, causing defects in the film layer, such as pinholes and pitting, thus reducing product yield. Furthermore, during equipment maintenance, dust or component debris from the top of the chamber may also fall onto the workpiece below. Therefore, this processing method and its corresponding equipment require further improvement. Summary of the Invention

[0003] The technical problem to be solved by this utility model is to provide a magnetron sputtering coating device that provides a clean surface and good coating effect for coated parts, in light of the above-mentioned existing technology.

[0004] The technical solution adopted by this utility model to solve the above-mentioned technical problems is as follows: This magnetron sputtering coating device includes a housing capable of vacuuming, a target material connected inside the housing, a target holder capable of cooling the target material, energizing it, and providing a magnetic field, a positioning seat capable of connecting the workpiece, a controller, and a cooling device. The housing is provided with an air inlet for introducing argon gas and an air outlet for extracting air. The target holder and the positioning seat are connected to the housing. The target holder is connected to a power source. The target holder is connected to the controller via a circuit. The target holder is connected to the cooling device via a cooling water pipe. The controller and the cooling device are located outside the housing. The target material is connected to the target holder. The device is characterized in that: the target holder is located at the bottom of the housing, the target material is located at the top of the target holder, the positioning seat is located above the target material, the top surface of the positioning seat is a positioning surface capable of fixing the workpiece, and through holes for positioning seat are distributed on the positioning surface to allow target material particles to pass through and achieve coating on the workpiece surface.

[0005] As an improvement, the target base can preferably be connected to a drive platform that can raise and lower the corresponding target base. The top of the target base is provided with a detachable interface, and the target material is detachably connected to the target base conductive plate inside the detachable interface. The bottom of the housing corresponding to the detachable interface is provided with a connection opening, and the detachable interface can be sealed together with the connection opening.

[0006] In a further improvement, the drive platform can preferably be connected to the drive base, the drive base is movably connected to the slide rail, and the drive base is connected to a base driver that can drive the drive base to move relative to the slide rail.

[0007] As an improvement, the target holder can preferably have three, namely a first target holder capable of depositing an ITO film, a second target holder capable of depositing a silver film, and a third target holder capable of depositing an ITO film.

[0008] In a further improvement, the inner cavity of the housing may preferably include a locking cavity, a front buffer cavity, a front entry cavity, a first coating cavity, a second coating cavity, a third coating cavity, a rear discharge cavity, a rear buffer cavity, and an unlocking cavity. The first target seat corresponds to the first coating cavity, the second target seat corresponds to the second coating cavity, and the third target seat corresponds to the third coating cavity. Each target seat has a maintenance opening on its top. Each maintenance opening is equipped with a gate that can open and seal the corresponding maintenance opening.

[0009] As a further improvement, observation windows may preferably be spaced out on the side wall of the housing.

[0010] In a further improvement, electromagnetic coils that can improve the magnetic field of the target holder and reduce the upward drift of argon ions can preferably be provided between the front inlet chamber and the first coating chamber, between the first coating chamber and the second coating chamber, between the second coating chamber and the third coating chamber, and between the third coating chamber and the rear outlet chamber. The electromagnetic coils are connected to the controller through wires.

[0011] In a further improvement, the housing can preferably be connected to a spiral guide rail frame, on which a conveyor belt is provided that can drive the positioning seat to move along the spiral guide rail frame, and the positioning seat is a positioning frame that can be connected to the conveyor belt.

[0012] As a further improvement, a maintenance frame can preferably be provided on the spiral guide rail frame to facilitate the entry of maintenance personnel into the inner circle enclosed by the spiral guide rail frame.

[0013] In a further improvement, a wire fixing bracket can preferably be provided in the inner ring, the wires extending from the controller are connected to the wire fixing bracket, a horizontal support is provided on the wire fixing bracket, the main valve of the cooling device is connected to the horizontal support, and the cooling water pipe of the cooling device is connected to the horizontal support.

[0014] Compared with the prior art, the advantages of this utility model are as follows: the target material is located below the workpiece to be coated, so that during the magnetron sputtering coating process, pollutants, particles and impurities will not adhere to the workpiece film layer due to gravity, reducing the impact of the above-mentioned pollution sources on the workpiece film layer, effectively maintaining the cleanliness of the coating and achieving a good coating effect; at the same time, since the workpiece is located above the target material, the target particles can be better sprayed to various positions on the workpiece surface, obtaining a more uniform film layer coverage effect. Attached Figure Description

[0015] Figure 1 This is a perspective view of an embodiment of the present utility model;

[0016] Figure 2 for Figure 1 Exploded structural diagram;

[0017] Figure 3 yes Figure 1 A three-dimensional image from another angle;

[0018] Figure 4 yes Figure 1 A three-dimensional view showing the process after the gate is opened, the target is moved, and the controller and part of the wire fixing bracket are removed.

[0019] Figure 5 yes Figure 4 A three-dimensional view from another angle;

[0020] Figure 6 yes Figure 5 Exploded structural diagram;

[0021] Figure 7 This is a schematic diagram illustrating the working principle of an embodiment of this utility model;

[0022] Figure 8 yes Figure 7 Schematic diagram of the cooling water circulation system;

[0023] Figure 9 yes Figure 2 Enlarged view of section I. Detailed Implementation

[0024] The present invention will be further described in detail below with reference to the accompanying drawings and embodiments.

[0025] like Figures 1 to 6 , Figure 9As shown, the magnetron sputtering coating apparatus of this embodiment includes a housing 1 capable of vacuuming, a target 2 connected to the housing 1, a target holder 3 capable of cooling and energizing the target 2 and providing a magnetic field, a positioning seat 4 capable of connecting the workpiece, a controller 5, and a cooling device 6. The housing 1 is provided with an inlet 11 for introducing argon gas and an outlet 12 for extracting air. The target holder 3 and the positioning seat 4 are connected to the housing 1. The target holder 3 is connected to a power source and is connected to the controller 5 via wiring. The target holder 3 is connected to the cooling device 6 via a cooling water pipe. The controller 5 and the cooling device 6 are located outside the housing 1. The target 2 is connected to the target holder 3. The inlet 11 is connected to an argon gas source, allowing argon gas to enter. The outlet 12 is connected to a vacuum pump. Vacuum pumps 10 are provided at both ends of the housing 1. The connection method between the vacuum pumps 10 and the inner cavity of the housing is the same as in the prior art, and therefore will not be described in detail. The specific structures of the target holder 3, the target material 2, and the cooling device 6 are existing technologies, and the circuit structure used in the controller 5 is also existing technology, so they will not be described in detail.

[0026] The difference between this invention and the prior art lies in that the target holder 3 is located at the bottom of the housing 1, the target material 2 is located at the top of the target holder 3, and the positioning seat 4 is located above the target material 2. The top surface of the positioning seat 4 is a positioning surface that can fix the workpiece, and positioning seat through holes 41 are distributed on the positioning surface to achieve coating on the workpiece surface through the target material particles. This structure places the target material below the workpiece to be coated, so that during the magnetron sputtering coating process, contaminants, particles, and impurities will not adhere to the workpiece film layer due to gravity, reducing the impact of the aforementioned contaminants on the workpiece film layer.

[0027] The target holder 3 is connected to a drive platform 71 that can raise and lower the target holder 3. The top of the target holder 3 has a detachable interface, and the target material 2 is detachably connected to the conductive plate of the target holder within the detachable interface. A connection opening 13 is provided at the bottom of the housing corresponding to the detachable interface, and the detachable interface can be sealed together with the connection opening 13. The drive platform 71 is connected to a drive base 72, which is movably connected to a slide rail 7. The drive base 72 is connected to a base driver that can drive the drive base 72 to move relative to the slide rail 7. The specific structures of the drive platform 71 connecting to the target holder 3, the target holder 3 connecting to the target material 2, the drive platform 71 connecting to the drive base 72, and the drive base 72 connecting to the slide rail are all prior art and will not be described in detail.

[0028] There are three target holders 3: a first target holder 31 for depositing ITO film, a second target holder 32 for depositing silver film, and a third target holder 33 for depositing ITO film. The internal cavity layout of the housing 1 is prior art. The internal cavity of the housing 1 includes a locking cavity 101, a front buffer cavity 102, a front entry cavity 103, a first coating cavity 104, a second coating cavity 105, a third coating cavity 106, a rear discharge cavity 107, a rear buffer cavity 108, and an unlocking cavity 109. The first target holder 31 corresponds to the first coating cavity 104, the second target holder 32 corresponds to the second coating cavity 105, and the third target holder 33 corresponds to the third coating cavity 106. Each target holder 3 has an inspection opening 14 on its top, and each inspection opening 14 has a gate 141 that can open and seal the corresponding inspection opening 14. Observation windows 15 are spaced apart on the side walls of the housing 1.

[0029] The locking cavity 101 is used to separate the spiral guide frame 8 from the housing 1. After the positioning seat 4 enters the locking cavity 101 from the spiral guide frame 8, the locking cavity 101 closes the opening between the locking cavity 101 and the spiral guide frame 8, and the inner cavity of the housing forms a closed structure. The front buffer cavity 102 is connected to the vacuum pump. A vacuum is drawn at the position of the front buffer cavity 102. After the positioning seat 4 enters the front entry cavity 103 from the front buffer cavity 102, the front entry cavity 103 closes the opening between the front entry cavity 103 and the front buffer cavity 102. The front entry cavity 103, the first coating cavity 104, the second coating cavity 105, the third coating cavity 106, and the rear discharge cavity 107 form a cavity with better sealing. After the positioning seat 4 moves to the first coating chamber 104, it begins to coat the first layer of film. It then enters the second coating chamber 105 to coat the second layer, followed by the third coating chamber 106 to coat the third layer. Afterward, it enters the rear discharge chamber 107, and then the rear buffer chamber 108. The rear buffer chamber 108 is gradually pressurized, and the positioning seat 4 then enters the unlocking chamber 109 from the rear buffer chamber 108, finally returning to the loop guide frame 8 from the unlocking chamber 109. The interconnection and disconnection control between the chambers are existing technologies. This invention does not modify the structure of the chambers or the loop guide frame 8, and therefore will not be described in detail.

[0030] Electromagnetic coils 16 are installed between the front inlet cavity 103 and the first coating cavity 104, between the first coating cavity 104 and the second coating cavity 105, between the second coating cavity 105 and the third coating cavity 106, and between the third coating cavity 106 and the rear outlet cavity 107. These coils improve the magnetic field of the target and reduce the upward drift of argon ions. The electromagnetic coils 16 are connected to the controller 5 via wires. The specific structure of the electromagnetic coils 16 and the specific principle by which they change the magnetic field of the target 3 are known technologies and will not be described in detail here. The main function of the electromagnetic coils 16 is to increase the attractive force of the plasma generated by argon ionization, so that the plasma can be more evenly distributed in the cavity, thereby better targeting the target and achieving uniform coating on the workpiece surface.

[0031] The housing 1 is connected to the spiral guide frame 8. The spiral guide frame 8 is equipped with a conveyor belt 81 that can move the positioning seat 4 along the spiral guide frame 8. The positioning seat 4 is a positioning frame that can be connected to the conveyor belt 81. The specific structure and moving principle of the positioning frame on the spiral guide frame 8, and the specific structure of the spiral guide frame 8, are the same as in the prior art, and therefore will not be described in detail. The difference from the prior art is that the workpiece is fixed on the top surface of the positioning frame. If the workpiece is glass 40, it can be clamped between the metal plate 401 and the positioning frame. If the workpiece is metal, it can be directly bonded or connected to the positioning frame by threaded parts.

[0032] A maintenance frame 82 is provided on the spiral guide rail frame 8 to facilitate maintenance personnel to enter the inner circle enclosed by the spiral guide rail frame.

[0033] A wire fixing bracket 9 is provided in the inner ring. The wires extending from the controller 5 are connected to the wire fixing bracket 9. A horizontal support 91 is provided on the wire fixing bracket 9. The main valve of the cooling device 6 is connected to the horizontal support 91. The cooling water pipe of the cooling device 6 is connected to the horizontal support 91.

[0034] Working principle: such as Figure 7 and Figure 8 As shown, the target material 2 is connected to the target holder conductive plate 30 of the target holder 3. After the target holder 3 is energized, argon gas forms plasma that bombards the target material 2, causing the target particles to sputter onto the workpiece surface to form a coating. The target holder 3 and the electromagnetic coil 16 work together to form a stable magnetic field, which makes the plasma uniformly distributed in the inner cavity of the shell. Cooling water 61 is circulated to the target holder 3 through the cooling device 6 to reduce the temperature of the target material 2.

Claims

1. A magnetron sputtering coating apparatus, comprising a housing (1) capable of vacuuming, a target material (2) connectable within the housing (1), a target holder (3) capable of cooling and energizing the target material (2) and providing a magnetic field, a positioning seat (4) capable of connecting a workpiece, a controller (5), and a cooling device (6), wherein the housing (1) is provided with an inlet (11) for introducing argon gas and an outlet (12) for extracting air, the target holder (3) and the positioning seat (4) are connected to the housing (1), the target holder (3) is connected to a power source, the target holder (3) is connected to the controller (5) via a circuit, the target holder (3) is connected to the cooling device (6) via a cooling water pipe, the controller (5) and the cooling device (6) are disposed outside the housing (1), and the target material (2) is connected to the target holder (3), characterized in that: The target base (3) is located at the bottom of the housing (1), the target material (2) is located at the top of the target base (3), and the positioning seat (4) is located above the target material (2). The top surface of the positioning seat (4) is a positioning surface that can fix the workpiece. Positioning seat through holes (41) that can achieve workpiece surface coating by passing through target material particles are distributed on the positioning surface.

2. The magnetron sputtering coating apparatus according to claim 1, characterized in that: The target base (3) is connected to a drive platform (71) that can raise and lower the target base (3). The top of the target base (3) is provided with a detachable interface. The target material (2) is detachably connected to the target base conductive plate inside the detachable interface. The bottom of the housing corresponding to the detachable interface is provided with a connection opening (13). The detachable interface can be sealed together with the connection opening (13).

3. The magnetron sputtering coating apparatus according to claim 2, characterized in that: The drive platform (71) is connected to the drive base (72), which is movably connected to the slide rail (7). The drive base (72) is connected to a base driver that can drive the drive base (72) to move relative to the slide rail (7).

4. The magnetron sputtering coating apparatus according to any one of claims 1 to 3, characterized in that: There are three target holders (3): a first target holder (31) capable of depositing ITO film, a second target holder (32) capable of depositing silver film, and a third target holder (33) capable of depositing ITO film.

5. The magnetron sputtering coating apparatus according to claim 4, characterized in that: The inner cavity of the housing (1) includes a locking cavity (101), a front buffer cavity (102), a front entry cavity (103), a first coating cavity (104), a second coating cavity (105), a third coating cavity (106), a rear discharge cavity (107), a rear buffer cavity (108), and an unlocking cavity (109). The first target seat (31) corresponds to the first coating cavity (104), the second target seat (32) corresponds to the second coating cavity (105), and the third target seat (33) corresponds to the third coating cavity (106). Each target seat (3) has a maintenance opening (14) on its top. Each maintenance opening (14) has a gate (141) that can open and seal the corresponding maintenance opening (14).

6. The magnetron sputtering coating apparatus according to claim 5, characterized in that: Observation windows (15) are spaced apart on the side wall of the housing (1).

7. The magnetron sputtering coating apparatus according to claim 5, characterized in that: Electromagnetic coils (16) are provided between the front inlet chamber (103) and the first coating chamber (104), between the first coating chamber (104) and the second coating chamber (105), between the second coating chamber (105) and the third coating chamber (106), and between the third coating chamber (106) and the rear outlet chamber (107). These electromagnetic coils (16) are designed to improve the magnetic field of the target and reduce the upward drift of argon ions. The electromagnetic coils (16) are connected to the controller (5) via wires.

8. The magnetron sputtering coating apparatus according to claim 5, characterized in that: The housing (1) is connected to the spiral guide frame (8), and the spiral guide frame (8) is provided with a conveyor belt (81) that can drive the positioning seat (4) to move along the spiral guide frame (8). The positioning seat (4) is a positioning frame that can be connected to the conveyor belt (81).

9. The magnetron sputtering coating apparatus according to claim 8, characterized in that: A maintenance frame (82) is provided on the spiral guide rail frame (8) to facilitate maintenance personnel to enter the inner circle formed by the spiral guide rail frame.

10. The magnetron sputtering coating apparatus according to claim 8, characterized in that: A wire fixing bracket (9) is provided in the inner ring. The wires extending from the controller (5) are connected to the wire fixing bracket (9). A horizontal support (91) is provided on the wire fixing bracket (9). The main valve of the cooling device (6) is connected to the horizontal support (91). The cooling water pipe of the cooling device (6) is connected to the horizontal support (91).

Images