An electrochromic film and an electrochromic device

Abstract

The application provides an electrochromic film and an electrochromic device, and relates to the technical field of electrochromic technology. The electrochromic film comprises a first substrate layer, a first conductive layer, an electrochromic layer, a second conductive layer and a second substrate layer which are sequentially stacked; the edge region of the electrochromic film is provided with a first groove, a second groove, a partition region and a division line; the first groove and the second groove are alternately arranged along the outer periphery of the electrochromic film, and the adjacent first groove and second groove form a spacing region; the partition region at least penetrates the first conductive layer and the second conductive layer, the division line at least penetrates the first conductive layer or the second conductive layer, the partition region is communicated with the division line, and the projection of the partition region and the division line in the thickness direction of the electrochromic film is arranged around the spacing region. Even if the first conductive layer and the second conductive layer in the spacing region are in conduction, the inside of the electrochromic film will not be short-circuited, the normal use of the electrochromic film can be ensured, and the electrochromic film is not prone to failure.

Description

Technical Field

[0001] This application relates to the field of electrochromic technology, and more particularly to an electrochromic film and an electrochromic device. Background Technology

[0002] An electrochromic film is a device that can change color under the influence of voltage. It consists of two conductive layers and an electrochromic layer disposed between them. When the two conductive layers are connected to an external power source, an electric field is generated between them. Under the influence of this electric field, the electrochromic layer undergoes a redox reaction, resulting in the entire electrochromic film changing color.

[0003] During the compression molding process of existing electrochromic films, the two conductive layers located at the edge region are subjected to pressure, which can easily cause them to come into contact and conduct, resulting in a local short circuit. This affects the normal use of the electrochromic film and may even cause it to fail. Utility Model Content

[0004] In order to solve the problems existing in the prior art, one of the objectives of this application is to provide an electrochromic film.

[0005] This application provides the following technical solution: An electrochromic film includes a first substrate layer, a first conductive layer, an electrochromic layer, a second conductive layer, and a second substrate layer, which are stacked sequentially. The edge region of the electrochromic film is provided with a first groove, a second groove, a partition area, and a dividing line; The first groove penetrates the first substrate layer, the first conductive layer and the electrochromic layer, and the second groove penetrates the second substrate layer, the second conductive layer and the electrochromic layer. The first groove and the second groove are alternately arranged along the outer periphery of the electrochromic film, and a gap is formed between adjacent first grooves and second grooves. The partition region penetrates at least the first conductive layer and the second conductive layer, the dividing line penetrates at least the first conductive layer or the second conductive layer, the partition region is connected to the dividing line, and the partition region and the dividing line are arranged around the partition region in the thickness direction of the electrochromic film.

[0006] As a further optional embodiment of the electrochromic film, the interval region is located between the partition region and the outer periphery of the electrochromic film; The dividing line includes a first dividing line and a second dividing line, and the first dividing line, the interval area and the second dividing line are arranged sequentially along the outer periphery of the electrochromic film.

[0007] As a further optional embodiment of the electrochromic film, in the projection direction of the thickness direction of the electrochromic film, the first groove has a first inner edge close to the interior of the electrochromic film, the second groove has a second inner edge close to the interior of the electrochromic film, and the partition area has a third inner edge close to the outer periphery of the electrochromic film. Along the outer periphery of the electrochromic film, the first inner edge, the third inner edge, and the second inner edge are connected in sequence, and the third inner edge is convex relative to the first inner edge and the second inner edge toward the outer periphery of the electrochromic film.

[0008] As a further optional embodiment of the electrochromic film, the width of the partition region extending from the inside to the outside along the electrochromic film is W, where W ≥ 0.5 mm.

[0009] As a further optional feature of the electrochromic film, the length of the partition region extending circumferentially along the electrochromic film is greater than the length of the interval region extending circumferentially along the electrochromic film.

[0010] As a further optional embodiment of the electrochromic film, the first dividing line at least divides the first substrate layer, the first conductive layer, and the electrochromic layer, specifically the first substrate layer and the first conductive layer, and / or the second dividing line at least divides the second substrate layer, the second conductive layer, and the electrochromic layer, specifically the second substrate layer and the second conductive layer.

[0011] As a further optional embodiment of the electrochromic film, the electrochromic film further includes a first busbar and a second busbar. A portion of the first busbar is disposed on the side of the first substrate layer away from the first conductive layer, and another portion of the first busbar contacts the second conductive layer corresponding to the plurality of first grooves. A portion of the second busbar is disposed on the side of the second substrate layer away from the second conductive layer, and another portion of the second busbar contacts the first conductive layer corresponding to the plurality of second grooves. The first busbar and the partition area are misaligned in the projection of the electrochromic film in the thickness direction, and the second busbar and the partition area are misaligned in the projection of the electrochromic film in the thickness direction.

[0012] As a further optional embodiment of the electrochromic film, the electrochromic film further includes a first insulating barrier layer and a second insulating barrier layer, wherein the first insulating barrier layer is disposed on the first busbar and the second insulating barrier layer is disposed on the second busbar. The projection of the partition region in the thickness direction of the electrochromic film is located within the projection of the first insulating barrier layer in the thickness direction of the electrochromic film; and / or, the projection of the partition region in the thickness direction of the electrochromic film is located within the projection of the second insulating barrier layer in the thickness direction of the electrochromic film.

[0013] As a further alternative to the electrochromic film, the partition region extends through the electrochromic film along its thickness direction.

[0014] Another objective of this application is to provide an electrochromic device.

[0015] This application provides the following technical solution: An electrochromic device includes a substrate layer, an adhesive layer, and the aforementioned electrochromic film, wherein the substrate layer is bonded to the surface of the electrochromic film at least along its thickness direction via the adhesive layer.

[0016] The embodiments of this application have the following beneficial effects: During the compression molding of the aforementioned electrochromic film, the gap between the first and second grooves is subjected to pressure. The first and second conductive layers within this gap are prone to structural deformation, leading to contact and conductivity between them. Since the projections of the partition region and dividing line along the thickness direction of the electrochromic film surround the gap, and the partition region penetrates at least both the first and second conductive layers, and the dividing line penetrates at least one or both, the first and second conductive layers are completely isolated around the gap. Therefore, even if the first and second conductive layers within the gap become conductive, the electrochromic film will not short-circuit internally, ensuring its normal operation and preventing failure.

[0017] To make the above-mentioned objectives, features and advantages of this application more apparent and understandable, preferred embodiments are described below in detail with reference to the accompanying drawings. Attached Figure Description

[0018] To more clearly illustrate the technical solutions of the embodiments of this application, the accompanying drawings used in the embodiments will be briefly introduced below. It should be understood that the following drawings only show some embodiments of this application and should not be regarded as a limitation of the scope. For those skilled in the art, other related drawings can be obtained based on these drawings without creative effort.

[0019] Figure 1 A cross-sectional schematic diagram of an electrochromic film provided in an embodiment of this application is shown; Figure 2A top view of an electrochromic film provided in an embodiment of this application is shown; Figure 3 It shows Figure 2 Enlarged view of point A in the middle; Figure 4 A partial structural schematic diagram of an electrochromic film provided in another embodiment of this application is shown; Figure 5 A cross-sectional schematic diagram of an electrochromic device provided in an embodiment of this application is shown.

[0020] Explanation of key component symbols: 10-Electrochromic film; 101-First groove; 101a-First side edge; 101b-First inner edge; 102-Second groove; 102a-Second side edge; 102b-Second inner edge; 103-Separation area; 103a-Third inner edge; 104-Dividing line; 104a-First dividing line; 104b-Second dividing line; 105-Interval area; 106-Color-changing area; 100-First substrate layer; 200-First conductive layer; 300-Electrochromic layer; 400-Second conductive layer; 500-Second substrate layer; 600-First busbar; 700-Second busbar; 800-First insulating barrier layer; 900-Second insulating barrier layer; 20-Substrate layer; 30-Adhesive layer; 40-Sealant layer. Detailed Implementation

[0021] The embodiments of this application are described in detail below. Examples of these embodiments are shown in the accompanying drawings, wherein the same or similar reference numerals denote the same or similar elements or elements having the same or similar functions throughout. The embodiments described below with reference to the accompanying drawings are exemplary and are only used to explain this application, and should not be construed as limiting this application.

[0022] It should be noted that when an element is said to be "fixed" to another element, it can be directly on the other element or there may be an intervening element. When an element is said to be "connected" to another element, it can be directly connected to the other element or there may be an intervening element. Conversely, when an element is said to be "directly" on another element, there is no intervening element. The terms "vertical," "horizontal," "left," "right," and similar expressions used in this document are for illustrative purposes only.

[0023] In this application, unless otherwise expressly specified and limited, the terms "installation," "connection," "linking," and "fixing," etc., should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral part; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; they can refer to the internal communication of two components or the interaction between two components. Those skilled in the art can understand the specific meaning of the above terms in this application according to the specific circumstances.

[0024] Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of that feature. In the description of this application, "multiple" means two or more, unless otherwise explicitly specified.

[0025] Unless otherwise defined, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this application belongs. The terminology used herein in the template description is for the purpose of describing particular embodiments only and is not intended to be limiting of this application. The term "and / or" as used herein includes any and all combinations of one or more of the associated listed items.

[0026] To accelerate the conductivity of electrochromic films, multiple electrodes are typically placed at the edge of the electrochromic film.

[0027] The inventors of this application discovered that during the compression molding of an electrochromic film, when the upper and lower conductive layers located at the edge region are subjected to pressure, the thickness of the electrochromic layer sandwiched between them decreases, and the structure of the upper and lower conductive layers themselves is also prone to deformation. During subsequent charging and discharging processes, due to the reduced thickness in the edge region, the distance between the upper and lower conductive layers further shortens, making them prone to contact and short circuits, thus affecting the normal use of the electrochromic film.

[0028] By using laser cutting or etching, a dividing line is processed around the spacer area, allowing the dividing line to penetrate the conductive layer. Theoretically, this can achieve electrical isolation between the edge area and other areas, so that even if a short circuit occurs in the edge area, it will not be conducted to other areas, thus not affecting the overall discoloration of the film.

[0029] However, in actual use, because the width of the dividing line is relatively narrow, as the diaphragm is squeezed, the originally disconnected conductive layers may move closer to each other and become conductive again, resulting in the risk of short circuits in areas other than the edge area of ​​the diaphragm.

[0030] To address the aforementioned technical problems, this embodiment provides an electrochromic film 10. Please refer to... Figure 1 , Figure 2 and Figure 3 The electrochromic film 10 includes a first base layer 100, a first conductive layer 200, an electrochromic layer 300, a second conductive layer 400, and a second base layer 500, which are stacked sequentially.

[0031] In addition, the edge region of the electrochromic film 10 is provided with a first groove 101, a second groove 102, a partition area 103 and a dividing line 104.

[0032] The first groove 101 penetrates the first substrate layer 100, the first conductive layer 200, and the electrochromic layer 300, while the second groove 102 penetrates the second substrate layer 500, the second conductive layer 400, and the electrochromic layer 300. The first groove 101 and the second groove 102 are alternately arranged along the outer periphery of the electrochromic film 10, and a gap region 105 is formed between adjacent first grooves 101 and second grooves 102.

[0033] The partition region 103 penetrates at least the first conductive layer 200 and the second conductive layer 400, and the dividing line 104 penetrates at least the first conductive layer 200 or the second conductive layer 400. The partition region 103 and the dividing line 104 are connected, and the projections of the partition region 103 and the dividing line 104 in the thickness direction of the electrochromic film 10 surround the partition region 105.

[0034] During the compression molding of the electrochromic film 10, the gap region 105 located between the first groove 101 and the second groove 102 is subjected to pressure. The first conductive layer 200 and the second conductive layer 400 within the gap region 105 are prone to structural deformation, thereby causing the first conductive layer 200 and the second conductive layer 400 to come into contact with each other and conduct electricity. Since the projection of the partition region 103 and the dividing line 104 in the thickness direction of the electrochromic film 10 surrounds the gap region 105, and the partition region 103 penetrates at least the first conductive layer 200 and the second conductive layer 400, and the dividing line 104 penetrates at least the first conductive layer 200 or the second conductive layer 400, the first conductive layer 200 and the second conductive layer 400 are completely isolated around the gap region 105. At this time, even if the first conductive layer 200 and the second conductive layer 400 within the interval 105 become conductive, the electrochromic film 10 will not be short-circuited inside, which can ensure the normal use of the electrochromic film 10 and make the electrochromic film 10 less prone to failure.

[0035] Understandably, the partition region 103 is wider than the dividing line 104. When the diaphragm is compressed, the inner edges of the partition region 103 are less likely to come into contact with each other, and the first conductive layer 200 and the second conductive layer 400 penetrated by the partition region 103 are less likely to make contact and conduct electricity. In the event that a short circuit may occur in the partition region 105, this can further reduce the risk of short circuits occurring in other areas of the diaphragm besides the partition region 105.

[0036] In addition, by using the partition area 103 and the dividing line 104 together to separate the conductive layer of the interval area 105 from the conductive layer of other areas, instead of just separating the conductive layer of the interval area 105 by the partition area 103, it is possible to prevent the interval area 105 from being completely separated from other areas, thereby preserving the interval area 105 and separating the first groove 101 and the second groove 102.

[0037] For example, both the first substrate layer 100 and the second substrate layer 500 are transparent substrates. The transparent substrate is an optically grade transparent material, specifically a flexible substrate material, such as polyethylene terephthalate (PET), polycarbonate (PC), polyimide (PI), cyclic olefin copolymers, or cellulose triacetate. Alternatively, the first substrate layer 100 and the second substrate layer 500 may also be glass substrates.

[0038] Both the first conductive layer 200 and the second conductive layer 400 are transparent conductive layers. The material of the transparent conductive layer can be any transparent conductive material well known to those skilled in the art, such as indium-tin oxide (ITO), aluminum zinc oxide (AZO), fluorine-doped tin oxide (FTO), silver nanowires, graphene, carbon nanotubes, metal meshes, or silver nanoparticles.

[0039] In the embodiments of this application, the electrochromic layer 300 is a sheet composed of one or more layers of gel-state or solid materials, such as polymer-dispersed liquid crystal (PDLC), suspended particle device (SPD), and electrochromic (EC) layers. The electrochromic layer 300 may include a color-changing material layer, an electrolyte layer, and an ion storage layer stacked sequentially. The materials of the color-changing material layer, electrolyte layer, and ion storage layer can be those found in the prior art, and this embodiment does not impose any special limitations on them.

[0040] In this embodiment, the first groove 101 and the second groove 102 are alternately distributed on the edge region of the entire perimeter of the electrochromic film 10. Furthermore, the number of first grooves 101 and the number of second grooves 102 can be any number of two or more values, which can be specifically set according to actual conditions. It is understood that there is a gap between adjacent first grooves 101 and second grooves 102, thereby forming a gap region 105 between adjacent first grooves 101 and second grooves 102.

[0041] Please see Figure 3 It should be noted that the interval region 105 refers to the area on the edge region of the electrochromic device, located between adjacent first grooves 101 and second grooves 102, and the first groove 101 and second groove 102 are separated by this interval region 105. Specifically, the first groove 101 includes a first side 101a near the second groove 102, and the second groove 102 includes a second side 102a near the first groove 101. The area between the first side 101a and the second side 102a is the interval region 105. Furthermore, this embodiment illustrates that both the first groove 101 and the second groove 102 are rectangular. In other embodiments, the shapes of the first groove 101 and the second groove 102 are not limited and can be any of the following: circular, polygonal, etc.

[0042] It should be noted that the spacer region 105 is part of the electrochromic film 10, and the spacer region 105 is located at the edge of the electrochromic film 10 where the electrodes are arranged. Specifically, the spacer region 105 includes a portion of the first substrate layer 100, a portion of the first conductive layer 200, a portion of the electrochromic layer 300, a portion of the second conductive layer 400, and a portion of the second substrate layer 500, that is, the thickness of the spacer region 105 is substantially equal to the thickness of the electrochromic film 10.

[0043] In this embodiment, a portion of the second conductive layer 400 exposed from the first groove 101 is defined as the first electrode, and a portion of the first conductive layer 200 exposed from the second groove 102 is defined as the second electrode.

[0044] By providing a partition region 103 and a dividing line 104 at the edge of the electrochromic film 10, the spacer region 105 is defined as an insulating island, so that during compression molding, regardless of the pressure applied, current will not be transmitted to the spacer region 105 when it is being transmitted in the non-spacer region. Therefore, there is no current between the first conductive layer 200 and the second conductive layer 400 corresponding to the spacer region 105, and even if the two conductive layers come into contact, they will not conduct and a short circuit will not occur.

[0045] In this embodiment, the area of ​​the electrochromic film 10 other than the spacer region 105 can be defined as the non-spacer region. This non-spacer region includes the electrode regions exposing the first groove 101 and the second groove 102, and the color-changing regions 106 located inside each inner edge. It should be noted that the color-changing region 106 refers to the area in the electrochromic film 10 other than the spacer region 105, where the first substrate layer 100, the first conductive layer 200, the electrochromic layer 300, the second conductive layer 400, and the second substrate layer 500 completely overlap in the thickness direction of the electrochromic film 10. The electrode region refers to the area formed by the first and second electrodes at the edge of the electrochromic film 10.

[0046] By using the partition region 103 and the dividing line 104, at least the first conductive layer 200 in the partition region 105 is isolated from the first conductive layer 200 in the color-changing region 106 of the electrochromic film 10, or the second conductive layer 400 in the partition region 105 is isolated from the second conductive layer 400 in the color-changing region 106 of the electrochromic film 10, thereby forming a barrier between the partition region 105 and the non-partitioned region of the electrochromic film 10. Here, the isolation refers to the current interruption between the partition region 105 and the non-partitioned region of the electrochromic film 10. That is, current cannot be conducted between the conductive layers of the partition region 105 and the non-partitioned region of the electrochromic film 10, thus blocking the current transmission in the non-partitioned region through the partition region 103 and the dividing line 104, effectively improving the safety and stability of the electrochromic film 10 during use.

[0047] For example, the partition area 103 and the dividing line 104 are processed by laser cutting or etching.

[0048] In some embodiments, the spacer region 105 is located between the partition region 103 and the outer periphery of the electrochromic film 10.

[0049] Furthermore, the dividing line 104 includes a first dividing line 104a and a second dividing line 104b. The first dividing line 104a, the interval region 105, and the second dividing line 104b are arranged sequentially along the outer periphery of the electrochromic film 10.

[0050] That is to say, the projections of the first dividing line 104a, the partition region 103, and the second dividing line 104b in the thickness direction of the electrochromic film 10 surround the partition region 105 in sequence. When the partition region 103 penetrates the first conductive layer 200 and the second conductive layer 400, the first dividing line 104a penetrates the first substrate layer 100 and the first conductive layer 200, and the second dividing line 104b penetrates the second substrate layer 500 and the second conductive layer 400, the first conductive layer 200 and the second conductive layer 400 are completely isolated around the partition region 105.

[0051] For example, along the circumferential extension direction of the electrochromic film, the spacer region 105, on the projection of the plane where the first conductive layer 200 is located, has a first groove 101 on one side and a first dividing line 104a on the other side; along the extension direction of the electrochromic film from the inside to the outside, one side of the spacer region 105 is a partition region 103. It can be understood that since one side of the spacer region 105 already has a first groove 101, it is only necessary to set the first dividing line 104a on the side of the spacer region 105 away from the first groove 101, and the first conductive layer 200 can achieve partitioning through the semi-circular encirclement of the first dividing line 104a and the partition region 103. Similarly, along the circumferential extension direction of the electrochromic film, the spacer region 105, on the projection of the plane where the second conductive layer 400 is located, has a second groove 102 on one side and a second dividing line 104b on the other side, also forming a semi-circular partition. Thus, both conductive layers achieve mutual partitioning, making the spacer region 105 itself a partition.

[0052] Optionally, two first dividing lines 104a and two second dividing lines 104b are provided respectively. The two first dividing lines 104a, the interval region 105 and the two second dividing lines 104b are arranged sequentially along the outer periphery of the electrochromic film 10 to further improve the blocking effect of the dividing lines on the interval region 105.

[0053] In some embodiments, the partition region 103 extends through the electrochromic film 10 along the thickness direction of the electrochromic film 10. This ensures that the partition region 103 extends through the first conductive layer 200 and the second conductive layer 400, and also facilitates the removal of the material originally present in the partition region 103 during the process of forming the partition region 103, thereby promoting the formation of the partition region 103.

[0054] In contrast, if the cutting depth of the partition region 103 only penetrates the first conductive layer 200, the electrochromic layer 300, and the second conductive layer 400, or only penetrates the first base layer 100, the first conductive layer 200, the electrochromic layer 300, the second conductive layer 400, and part of the second base layer 500, or only penetrates the first conductive layer 200, the electrochromic layer 300, the second conductive layer 400, the second base layer 500, and part of the first base layer 100, although it can also ensure that the partition region 103 penetrates the first conductive layer 200 and the second conductive layer 400, since at least one layer in the multilayer structure is still not cut, at least one layer of material is adhered to the membrane, making it difficult to remove the material in the partition region 103, which is not conducive to the formation of the partition region 103.

[0055] In some embodiments, the first dividing line 104a divides at least the first substrate layer 100 and the first conductive layer 200 in the first substrate layer 100, the first conductive layer 200 and the electrochromic layer 300, and / or, the second dividing line 104b divides at least the second substrate layer 500 and the second conductive layer 400 in the second substrate layer 500, the second conductive layer 400 and the electrochromic layer 300.

[0056] Taking the first dividing line 104a as an example, the first dividing line 104a does not divide the second conductive layer 400 and the second base layer 500, and serves to cut off the conduction path of the first conductive layer 200, but does not cut off the connection between the spacer region 105 and other areas of the membrane. The retention of the second conductive layer 400 and the second base layer 500 makes it difficult for the spacer region 105 to separate from other areas of the membrane.

[0057] Similarly, the second dividing line 104b does not divide the first conductive layer 200 and the first base layer 100. The retention of the first conductive layer 200 and the first base layer 100 also makes it difficult for the spacer region 105 to separate from other areas of the film.

[0058] As mentioned above, the reserved gap 105 can serve to separate the first groove 101 and the second groove 102, making it difficult for the electrodes between the two grooves to come into contact, thus ensuring the conductivity of the diaphragm.

[0059] For example, the first dividing line 104a divides the first substrate layer 100 and the first conductive layer 200, and the second dividing line 104b divides the second substrate layer 500 and the second conductive layer 400.

[0060] Alternatively, the first dividing line 104a divides the first substrate layer 100, the first conductive layer 200, and the electrochromic layer 300, and the second dividing line 104b divides the second substrate layer 500 and the second conductive layer 400.

[0061] Alternatively, the first dividing line 104a divides the first substrate layer 100 and the first conductive layer 200, and the second dividing line 104b divides the second substrate layer 500, the second conductive layer 400 and the electrochromic layer 300.

[0062] Alternatively, the first dividing line 104a divides the first substrate layer 100, the first conductive layer 200, and the electrochromic layer 300, and the second dividing line 104b divides the second substrate layer 500, the second conductive layer 400, and the electrochromic layer 300.

[0063] In some embodiments, in the projection direction of the electrochromic film 10 in the thickness direction, the first groove 101 has a first inner edge 101b near the interior of the electrochromic film 10, the second groove 102 has a second inner edge 102b near the interior of the electrochromic film 10, and the partition region 103 has a third inner edge 103a near the outer periphery of the electrochromic film 10.

[0064] Along the outer periphery of the electrochromic film 10, the first inner edge 101b, the third inner edge 103a, and the second inner edge 102b are connected in sequence, and the third inner edge 103a is convex relative to the first inner edge 101b and the second inner edge 102b toward the outer periphery of the electrochromic film 10.

[0065] As mentioned earlier, the wider the partition region 103, the less likely the inner edges of the partition region 103 will come into contact with each other when the diaphragm is compressed, thus preventing the first conductive layer 200 and the second conductive layer 400, which are penetrated by the partition region 103, from becoming conductive again. Based on this premise, the material of a portion of the spacer region 105 near the interior of the electrochromic diaphragm 10 is removed, so that the third inner edge 103a protrudes towards the outer periphery of the electrochromic diaphragm 10 relative to the first inner edge 101b and the second inner edge 102b. This widens the partition region 103 while preventing the partition region 103 from occupying the area of ​​the color-changing region 106 inside the electrochromic diaphragm 10, thereby preventing the color-changing area of ​​the color-changing region 106 from being affected.

[0066] In some embodiments, the width of the partition region 103 extending from the inside to the outside along the electrochromic film 10 is W, which satisfies W≥0.5mm.

[0067] Understandably, making the width of the partition area 103 greater than or equal to 0.5 mm can not only prevent the inner edges of the partition area 103 from contacting each other when the diaphragm is squeezed, but also facilitate the removal of the material originally present in the partition area 103 during the process of forming the partition area 103, thereby facilitating the formation of the partition area 103.

[0068] For example, the width of the partition area 103 extending from the inside to the outside along the electrochromic film 10 is no more than 1 mm, and can be any value between 0.5 mm, 0.6 mm, 0.7 mm, 0.8 mm, 0.9 mm, 1 mm and 0.5 mm to 1 mm.

[0069] In some embodiments, the length of the partition region 103 extending circumferentially along the electrochromic film 10 is greater than the length of the spacer region 105 extending circumferentially along the electrochromic film 10.

[0070] As mentioned earlier, the width of the partition region 103 is larger than that of the dividing line 104, so that the inner edges of the partition region 103 are less likely to come into contact with each other when the diaphragm is compressed. Making the length of the partition region 103 greater than the length of the interval region 105 can minimize the risk of short circuits in other areas of the diaphragm besides the interval region 105 while retaining the interval region 105.

[0071] Furthermore, when the partition area 103 is set long enough, the dividing line 104 can be better connected to the partition area 103 to form a barrier band that semi-encircles the interval area 105, further preventing the conductive layer in other areas of the diaphragm from conducting current with the conductive layer in the interval area 105.

[0072] Please refer to the following: Figure 1 and Figure 4 In some embodiments, the electrochromic film 10 further includes a first busbar 600 and a second busbar 700.

[0073] A portion of the first busbar 600 is disposed on the side of the first substrate layer 100 opposite to the first conductive layer 200, and another portion of the first busbar 600 is in contact with the second conductive layer 400 corresponding to the plurality of first grooves 101. That is to say, a portion of the first busbar 600 is located in the first groove 101, and this portion of the first busbar 600 located in the first groove 101 is electrically connected to the first electrode.

[0074] A portion of the second busbar 700 is disposed on the side of the second substrate 500 opposite to the second conductive layer 400, and another portion of the second busbar 700 is in contact with the first conductive layer 200 corresponding to the plurality of second grooves 102. That is to say, a portion of the second busbar 700 is located in the second groove 102, and this portion of the second busbar 700 located in the second groove 102 is electrically connected to the second electrode.

[0075] Understandably, the first busbar 600 is connected to the first electrode in the edge region of the electrochromic film 10, and the second busbar 700 is connected to the second electrode in the edge region of the electrochromic film 10. When the first busbar 600 and the second busbar 700 are electrically connected to the positive and negative terminals of an external power source, respectively, the current from the external power source can be conducted through the first electrode to the second conductive layer 400 of the electrochromic film 10 via the first busbar 600, and simultaneously, the current from the external power source can be conducted through the second electrode to the first conductive layer 200 of the electrochromic film 10 via the second electrode, thereby electrically connecting the electrochromic film 10 to the external power source.

[0076] For example, the first busbar 600 and the second busbar 700 can be made of conductive materials well known to those skilled in the art, such as at least one of copper foil, conductive silver paste, conductive copper paste, conductive carbon paste, nano silver conductive ink, copper wire and conductive film.

[0077] Furthermore, the projections of the first busbar 600 and the partition area 103 in the thickness direction of the electrochromic film 10 are misaligned, and the projections of the second busbar 700 and the partition area 103 in the thickness direction of the electrochromic film 10 are also misaligned.

[0078] By avoiding the overlap between the projection of the isolation zone 103 and the projection of the first busbar 600, and by avoiding the overlap between the projection of the isolation zone 103 and the projection of the second busbar 700, the side of the exposed conductive layer in the isolation zone 103 can be prevented from contacting the busbar, thus ensuring the barrier performance of the isolation zone 103.

[0079] For example, the widths of the first busbar 600 and the second busbar 700 extending from the inside to the outside along the electrochromic film 10 are both smaller than the width of the spacer region 105 extending from the inside to the outside along the electrochromic film 10, and the projections of the first busbar 600 and the second busbar 700 in the thickness direction of the electrochromic film 10 at least partially overlap. For the portion of the first busbar 600 and the portion of the second busbar 700 covering the spacer region 105, their projections in the thickness direction of the electrochromic film 10 are located within the projection range of the spacer region 105.

[0080] Please see Figure 1 In some embodiments, the electrochromic film 10 further includes a first insulating barrier layer 800 and a second insulating barrier layer 900. The first insulating barrier layer 800 is disposed on the first busbar 600, and the second insulating barrier layer 900 is disposed on the second busbar 700.

[0081] The projection of the partition region 103 in the thickness direction of the electrochromic film 10 is located within the projection of the first insulating barrier layer 800 in the thickness direction of the electrochromic film 10.

[0082] And / or, the projection of the isolation region 103 in the thickness direction of the electrochromic film 10 lies within the projection of the second insulating barrier layer 900 in the thickness direction of the electrochromic film 10.

[0083] Taking the first insulating barrier layer 800 as an example, on the orthographic projection of the plane containing the electrochromic layer 300, the first insulating barrier layer 800 completely covers the isolation area 103. Therefore, the first insulating barrier layer 800 can protect the isolation area 103 and prevent impurities from entering the isolation area 103 during the lamination process and affecting the isolation function of the isolation area 103. The second insulating barrier layer 900 works similarly and will not be described in detail here.

[0084] When both the first insulating barrier layer 800 and the second insulating barrier layer 900 completely cover the partition area 103, they can completely prevent impurities from entering the partition area 103 during the lamination process.

[0085] For example, both the first insulating barrier layer 800 and the second insulating barrier layer 900 are made of high-temperature adhesive or insulating adhesive. Both the first insulating barrier layer 800 and the second insulating barrier layer 900 are attached to the edge region of the electrochromic film 10.

[0086] Optionally, the first insulating barrier layer 800 completely covers the first busbar 600, and a portion of the first insulating barrier layer 800 facing inwards towards the electrochromic film 10 is connected to the first substrate layer 100, thereby providing protection for the first busbar 600 and improving the stability of the connection between the first busbar 600 and the electrochromic film 10. The second insulating barrier layer 900 completely covers the second busbar 700, and a portion of the second insulating barrier layer 900 facing inwards towards the electrochromic film 10 is connected to the second substrate layer 500, thereby providing protection for the second busbar 700 and improving the stability of the connection between the second busbar 700 and the electrochromic film 10.

[0087] In summary, during the compression molding of the electrochromic film 10, the gap 105 located between the first groove 101 and the second groove 102 is subjected to pressure. The first conductive layer 200 and the second conductive layer 400 within the gap 105 are prone to structural deformation, resulting in contact and conductivity between the first conductive layer 200 and the second conductive layer 400. Since the projections of the partition region 103 and the dividing line 104 in the thickness direction of the electrochromic film 10 surround the gap 105, and the partition region 103 penetrates at least the first conductive layer 200 and the second conductive layer 400, and the dividing line 104 penetrates at least either the first conductive layer 200 or the second conductive layer 400, the first conductive layer 200 and the second conductive layer 400 are completely isolated around the gap 105. At this time, even if the first conductive layer 200 and the second conductive layer 400 within the interval 105 become conductive, the electrochromic film 10 will not short-circuit inside, which can ensure the normal use of the electrochromic film 10, make the electrochromic film 10 less prone to failure, thereby improving the service life of the electrochromic film 10, as well as improving the safety and stability of the electrochromic film 10 during use.

[0088] This embodiment also provides an electrochromic device, including but not limited to devices for building curtain walls, automobile windows, and aircraft windows. Please refer to... Figure 5 The electrochromic device includes a substrate layer 20, an adhesive layer 30, and the aforementioned electrochromic film 10. The substrate layer 20 is bonded to the surface of the electrochromic film 10 at least along the thickness direction through the adhesive layer 30.

[0089] For example, the substrate layer 20 is a transparent structure. For instance, the substrate layer 20 can be transparent glass, a transparent acrylic sheet, or a transparent PVC sheet. Preferably, the substrate layer 20 is glass.

[0090] The substrate layer 20 is provided in two layers, which are located on both sides of the electrochromic film 10 along the thickness direction, forming a more comprehensive load-bearing and protective function for the electrochromic film 10.

[0091] An adhesive, such as PVB (Polyvinyl Butyral) or OCA (Optically Clear Adhesive), is provided between the electrochromic film 10 and the substrate layer 20 to form an adhesive layer 30.

[0092] Furthermore, a sealant layer 40 is formed by sealing the outer periphery of the electrochromic film 10 with a sealant. Simultaneously, the two substrate layers 20 are connected by the sealant to form a sealed color-changing device. The sealant is a transparent insulating colloid, such as PVB or OCA.

[0093] Understandably, the sealant layer 40 can not only form an adhesive bond between the two substrate layers 20 and the electrochromic film 10, but also seal the electrochromic film 10 to isolate it from oxygen and air, preventing the electrochromic film 10 from contacting external moisture and oxygen, thereby improving the service life of the electrochromic film 10 and the service life of the electrochromic device.

[0094] In some embodiments, a masking layer is provided on the inner or outer surface of the substrate layer 20 corresponding to the edge region of the electrochromic film 10 to prevent the user from directly seeing the edge region of the electrochromic film 10 through the transparent substrate layer 20. The masking layer obscures the busbars and insulating barrier layer at the edge region of the electrochromic film 10, thereby improving the aesthetics of the electrochromic device. Preferably, the masking layer is an ink layer.

[0095] Specifically, in some embodiments of this application, the projection of the insulating barrier layer onto the plane of the shielding layer is located within the shielding layer. That is to say, the shielding layer can completely cover the insulating barrier layer.

[0096] In all examples shown and described herein, any specific values ​​should be interpreted as merely exemplary and not as limitations; therefore, other examples of exemplary embodiments may have different values.

[0097] It should be noted that similar labels and letters in the following figures indicate similar items. Therefore, once an item is defined in one figure, it does not need to be further defined and explained in subsequent figures.

[0098] The embodiments described above are merely illustrative of several implementation methods of this application, and while the descriptions are specific and detailed, they should not be construed as limiting the scope of this application. It should be noted that those skilled in the art can make various modifications and improvements without departing from the concept of this application, and these modifications and improvements all fall within the protection scope of this application.

Claims

1. An electrochromic film, characterized in that, It includes a first substrate layer, a first conductive layer, an electrochromic layer, a second conductive layer, and a second substrate layer that are stacked sequentially. The edge region of the electrochromic film is provided with a first groove, a second groove, a partition area, and a dividing line; The first groove penetrates the first substrate layer, the first conductive layer and the electrochromic layer, and the second groove penetrates the second substrate layer, the second conductive layer and the electrochromic layer. The first groove and the second groove are alternately arranged along the outer periphery of the electrochromic film, and a gap is formed between adjacent first grooves and second grooves. The partition region penetrates at least the first conductive layer and the second conductive layer, the dividing line penetrates at least the first conductive layer or the second conductive layer, the partition region is connected to the dividing line, and the partition region and the dividing line are arranged around the partition region in the thickness direction of the electrochromic film.

2. The electrochromic film according to claim 1, characterized in that, The interval region is located between the partition region and the outer periphery of the electrochromic film; The dividing line includes a first dividing line and a second dividing line, and the first dividing line, the interval area and the second dividing line are arranged sequentially along the outer periphery of the electrochromic film.

3. The electrochromic film according to claim 2, characterized in that, In the projection direction of the electrochromic film thickness direction, the first groove has a first inner edge close to the interior of the electrochromic film, the second groove has a second inner edge close to the interior of the electrochromic film, and the partition area has a third inner edge close to the outer periphery of the electrochromic film. Along the outer periphery of the electrochromic film, the first inner edge, the third inner edge, and the second inner edge are connected in sequence, and the third inner edge is convex relative to the first inner edge and the second inner edge toward the outer periphery of the electrochromic film.

4. The electrochromic film according to claim 2, characterized in that, The width of the partition area extending from the inside to the outside along the electrochromic film is W, where W ≥ 0.5 mm.

5. The electrochromic film according to claim 2, characterized in that, The length of the partition region extending circumferentially along the electrochromic film is greater than the length of the interval region extending circumferentially along the electrochromic film.

6. The electrochromic film according to claim 2, characterized in that, The first dividing line at least divides the first substrate layer, the first conductive layer, and the electrochromic layer, and / or the second dividing line at least divides the second substrate layer, the second conductive layer, and the electrochromic layer, and the second substrate layer and the second conductive layer.

7. The electrochromic film according to any one of claims 1-6, characterized in that, The electrochromic film further includes a first busbar and a second busbar. A portion of the first busbar is disposed on the side of the first substrate layer away from the first conductive layer, and another portion of the first busbar contacts the second conductive layer corresponding to the plurality of first grooves. A portion of the second busbar is disposed on the side of the second substrate layer away from the second conductive layer, and another portion of the second busbar contacts the first conductive layer corresponding to the plurality of second grooves. The first busbar and the partition area are misaligned in the projection of the electrochromic film in the thickness direction, and the second busbar and the partition area are misaligned in the projection of the electrochromic film in the thickness direction.

8. The electrochromic film according to claim 7, characterized in that, The electrochromic film further includes a first insulating barrier layer and a second insulating barrier layer, wherein the first insulating barrier layer is applied to the first busbar and the second insulating barrier layer is applied to the second busbar. The projection of the partition region in the thickness direction of the electrochromic film is located within the projection of the first insulating barrier layer in the thickness direction of the electrochromic film; and / or, the projection of the partition region in the thickness direction of the electrochromic film is located within the projection of the second insulating barrier layer in the thickness direction of the electrochromic film.

9. The electrochromic film according to any one of claims 1-6, characterized in that, The partition region extends through the electrochromic film along its thickness direction.

10. An electrochromic device, characterized in that, It includes a substrate layer, an adhesive layer, and an electrochromic film as described in any one of claims 1-9, wherein the substrate layer is bonded to the surface of the electrochromic film at least along the thickness direction via the adhesive layer.

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