White carbon black preparation reaction kettle
Patent Information
- Application Number
- CN202521235408.7
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2025-06-17
- Publication Date
- 2026-09-08
- Estimated Expiration
- 2035-06-17
AI Technical Summary
[0003]现有技术中，普通白炭黑制备用反应釜的反应成本较高与激光反应功能不佳的问题
该一种白炭黑制备用反应釜，通过设置反应釜、多波长激光同轴照射装置与激光发射器，在多波长激光同轴照射装置的激光发射器为三轴调节式，集成266nm紫外激光与1064nm红外激光，通过振镜系统实现溶胶三维扫描，精准调控白炭黑孔结构，多波长激光同轴照射装置的266nm紫外激光激发溶胶中硅羟基自由基，促进初级粒子表面羟基化，抑制硬团聚，提升白炭黑分散性，团聚粒径≤50nm，多波长激光同轴照射装置的1064nm红外激光通过光热效应，在溶胶局部微区产生100-150℃瞬时高温，诱导无定形二氧化硅向介孔结构转变，孔径可控在5-10nm，替代传统模板法，多波长激光同轴照射装置的多波长激光协同调控技术，相比传统模板法制备白炭黑，生产成本降低的条件下，使得多波长激光同轴照射装置集成了紫外激光与红外激光，通过振镜系统实现溶胶的三维扫描，精准调控白炭黑的孔结构，紫外激光激发溶胶中的硅羟基自由基，促进初级粒子表面羟基化，有效抑制硬团聚，提升白炭黑的分散性；红外激光则通过光热效应在溶胶局部微区产生高温，诱导无定形二氧化硅向介孔结构转变，实现对孔径的精确控制，且多波长激光协同调控技术替代了传统的模板法，不仅简化了生产工艺，还显著降低了生产成本，同时，激光照射的精准性和高效性也减少了能源的浪费，提高了整体的生产效率，有效的解决了普通白炭黑制备用反应釜的反应成本较高与激光反应功能不佳的问题。
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Abstract
Description
Technical Field
[0001] This utility model relates to the field of silica technology, specifically to a reaction vessel for preparing silica. Background Technology
[0002] Silica is a general term for white powdery amorphous silica and silicate products, with silicon dioxide (SiO2) as its main component. It is named for its white appearance and similar uses to carbon black. It possesses a porous structure, high specific surface area, and high surface activity, and is widely used in rubber, plastics, coatings, and pharmaceuticals.
[0003] In the existing technology, the reaction cost of the reactor used for the preparation of ordinary precipitated silica is high and the laser reaction function is not good. Utility Model Content
[0004] This invention provides a reaction vessel for preparing silica to solve the problems in the background art.
[0005] To achieve the above objectives, this utility model provides the following technical solution: a reaction vessel for preparing silica, comprising an integral device body, wherein the integral device body includes a support member located at the bottom of the integral device body, a reaction vessel is arranged on the top periphery of the support member, an electrically controlled valve is arranged on the bottom periphery of the reaction vessel, a discharge pipe is arranged on the bottom periphery of the electrically controlled valve, an observation window is arranged on one side of the outer ring surface of the reaction vessel, a control mechanism is arranged on one side of the outer ring surface of the reaction vessel, a multi-wavelength laser coaxial irradiation device is arranged on the top periphery of the reaction vessel, three sets of laser emitters are arranged on the bottom periphery of the multi-wavelength laser coaxial irradiation device, an inlet is arranged on the top periphery of the reaction vessel, a stirring motor is arranged at the center of the top periphery of the reaction vessel, and a stirring rod is movably connected to the drive shaft on the bottom periphery of the stirring motor.
[0006] Furthermore, the laser emitter of the multi-wavelength laser coaxial irradiation device is a three-axis adjustable type, integrating a 266nm ultraviolet laser and a 1064nm infrared laser. It achieves three-dimensional scanning of the sol through a galvanometer system, and precisely controls the pore structure of the silica.
[0007] Furthermore, the 266nm ultraviolet laser of the multi-wavelength laser coaxial irradiation device excites silanol radicals in the sol, promotes hydroxylation of primary particles, inhibits hard agglomeration, improves the dispersibility of silica, and reduces agglomerate particle size to ≤50nm.
[0008] Furthermore, the 1064nm infrared laser of the multi-wavelength laser coaxial irradiation device generates instantaneous high temperatures of 100-150℃ in the local micro-region of the sol through photothermal effect, inducing amorphous silica to transform into a mesoporous structure with a pore size controllable at 5-10nm, thus replacing the traditional template method.
[0009] Furthermore, the multi-wavelength laser coordinated control technology of the multi-wavelength laser coaxial irradiation device reduces production costs compared to the traditional template method for preparing silica.
[0010] Furthermore, the observation window is made of high-temperature resistant quartz glass with a light transmittance of ≥90%, and is used in conjunction with a laser three-dimensional scanning system to monitor the changes in the sol structure and the formation process of silica in real time.
[0011] Compared with the prior art, this utility model provides a reaction vessel for preparing silica, which has the following beneficial effects: This invention relates to a reaction vessel for preparing silica, comprising a reaction vessel, a multi-wavelength laser coaxial irradiation device, and a laser emitter. The laser emitter of the multi-wavelength laser coaxial irradiation device is triaxially adjustable, integrating a 266nm ultraviolet laser and a 1064nm infrared laser. A galvanometer system enables three-dimensional scanning of the sol, precisely controlling the pore structure of the silica. The 266nm ultraviolet laser of the multi-wavelength laser coaxial irradiation device excites silanol radicals in the sol, promoting hydroxylation of primary particles, inhibiting hard agglomeration, and improving the dispersibility of silica, with agglomerated particle size ≤50nm. The 1064nm infrared laser of the multi-wavelength laser coaxial irradiation device generates instantaneous high temperatures of 100-150℃ in local micro-regions of the sol through photothermal effects, inducing the transformation of amorphous silica into a mesoporous structure with a controllable pore size of 5-10nm. This method replaces the traditional template method, utilizing the multi-wavelength laser synergistic control technology of the multi-wavelength laser coaxial irradiation device. Compared to the traditional template method for preparing silica, this new technology, with its reduced production costs, integrates ultraviolet and infrared lasers into a multi-wavelength laser coaxial irradiation device. A galvanometer system enables three-dimensional scanning of the sol, precisely controlling the pore structure of the silica. The ultraviolet laser excites silanol radicals in the sol, promoting hydroxylation of primary particles, effectively inhibiting hard agglomeration and improving the dispersibility of the silica. The infrared laser generates high temperatures in localized micro-regions of the sol through photothermal effects, inducing the transformation of amorphous silica into a mesoporous structure, achieving precise control of pore size. Furthermore, the multi-wavelength laser synergistic control technology replaces the traditional template method, simplifying the production process and significantly reducing production costs. Simultaneously, the precision and efficiency of laser irradiation reduce energy waste and improve overall production efficiency, effectively solving the problems of high reaction costs and poor laser reaction function in ordinary silica preparation reactors. Attached Figure Description
[0012] Figure 1 This is a schematic diagram of the overall structure of this utility model; Figure 2 This is an enlarged structural schematic diagram of the stirring rod of this utility model; Figure 3 This is an enlarged schematic diagram of the bottom structure of the multi-wavelength laser coaxial irradiation device of this utility model.
[0013] In the diagram: 1. Main body of the overall device; 2. Support component; 3. Electrically controlled valve; 4. Discharge pipe; 5. Reactor; 6. Observation window; 7. Control mechanism; 8. Multi-wavelength laser coaxial irradiation device; 801. Laser emitter; 9. Inlet; 10. Stirring motor; 11. Stirring rod. Detailed Implementation
[0014] The technical solutions of the present utility model will be clearly and completely described below with reference to the accompanying drawings of the embodiments. Obviously, the described embodiments are only some embodiments of the present utility model, and not all embodiments. Based on the embodiments of the present utility model, all other embodiments obtained by those of ordinary skill in the art without creative effort are within the protection scope of the present utility model.
[0015] Please see Figure 1-3 This utility model discloses a reaction vessel for preparing silica. Specifically, a reaction vessel for preparing silica includes an integral device body 1, which includes a support member 2 located at the bottom of the integral device body 1. A reaction vessel 5 is arranged on the top periphery of the support member 2, and an electrically controlled valve 3 is arranged on the bottom periphery of the reaction vessel 5. A discharge pipe 4 is arranged on the bottom periphery of the electrically controlled valve 3. An observation window 6 is arranged on one side of the outer ring surface of the reaction vessel 5, and a control mechanism 7 is arranged on one side of the outer ring surface of the reaction vessel 5. A multi-wavelength laser coaxial irradiation device 8 is arranged on the top periphery of the reaction vessel 5, and three sets of laser emitters 801 are arranged on the bottom periphery of the multi-wavelength laser coaxial irradiation device 8. An inlet 9 is arranged on the top periphery of the reaction vessel 5, and a stirring motor 10 is arranged at the center of the top periphery of the reaction vessel 5. A stirring rod 11 is movably connected to the drive shaft on the bottom periphery of the stirring motor 10.
[0016] In this embodiment, the laser emitter 801 of the multi-wavelength laser coaxial irradiation device 8 is triaxially adjustable, integrating a 266nm ultraviolet laser and a 1064nm infrared laser. A galvanometer system enables three-dimensional scanning of the sol, precisely controlling the pore structure of the silica. The 266nm ultraviolet laser of the multi-wavelength laser coaxial irradiation device 8 excites silanol radicals in the sol, promoting hydroxylation of primary particles, inhibiting hard agglomeration, and improving the dispersibility of silica, with agglomerated particle size ≤50nm. The 1064nm infrared laser of the multi-wavelength laser coaxial irradiation device 8 generates instantaneous high temperatures of 100-150℃ in local micro-regions of the sol through photothermal effects, inducing amorphous silica to transform into a mesoporous structure with a controllable pore size of 5-10nm. This replaces the traditional template method. Compared with the traditional template method for preparing silica, the multi-wavelength laser coaxial irradiation device 8's multi-wavelength laser synergistic control technology reduces production costs.
[0017] Specifically, the multi-wavelength laser coaxial irradiation device 8 integrates ultraviolet and infrared lasers. Through a galvanometer system, it achieves three-dimensional scanning of the sol, precisely controlling the pore structure of silica. The ultraviolet laser excites silanol radicals in the sol, promoting hydroxylation of primary particles, effectively inhibiting hard agglomeration, and improving the dispersibility of silica. The infrared laser generates high temperatures in local micro-regions of the sol through photothermal effects, inducing amorphous silica to transform into a mesoporous structure, achieving precise control of pore size. Moreover, the multi-wavelength laser synergistic control technology replaces the traditional template method, which not only simplifies the production process but also significantly reduces production costs. At the same time, the precision and efficiency of laser irradiation also reduce energy waste and improve overall production efficiency.
[0018] In this implementation plan, the observation window 6 is made of high-temperature resistant quartz glass with a light transmittance of ≥90%. Combined with a laser three-dimensional scanning system, it can monitor the changes in the sol structure and the formation process of silica in real time.
[0019] Specifically, observation window 6 is made of high-temperature resistant quartz glass with high light transmittance, enabling real-time monitoring of changes in the sol structure and the formation of silica. This design allows operators to promptly identify and resolve problems, ensuring transparency and controllability in the production process.
[0020] In summary, this reaction vessel for preparing silica allows for the following steps when using the main body 1: Material preparation and addition: First, the materials required for the reaction are added to the reaction vessel 5 through the inlet 9. Reaction start-up and monitoring: The control mechanism 7 is activated to begin the reaction process. Simultaneously, the changes in the sol structure and the formation of silica within the reaction vessel 5 are monitored in real time through the observation window 6. Laser irradiation and control: The multi-wavelength coaxial laser irradiation device 8 begins operation. Ultraviolet and infrared lasers play their respective roles, promoting the generation of silanol radicals and the formation of mesoporous silica structures. The ultraviolet laser excites silanol radicals in the sol, promoting hydroxylation of primary particle surfaces, effectively inhibiting hard agglomeration, and improving the dispersibility of silica. The infrared laser generates high temperatures in local micro-regions of the sol through photothermal effects, inducing the transformation of amorphous silica into mesoporous structures, achieving precise control of pore size. Furthermore, the multi-wavelength laser synergistic control technology replaces the traditional template method, not only simplifying the production process but also significantly reducing production costs. Simultaneously, the precision and efficiency of laser irradiation reduce energy waste and improve overall production efficiency. Precise control of the reaction process is achieved through the precise regulation of the galvanometer system. Stirring and homogenization: The stirring motor 10 drives the stirring rod 11 to rotate, ensuring uniform mixing of materials within the reactor 5, improving reaction efficiency and product quality. Temperature control and regulation: High temperatures are generated in localized micro-regions of the sol through the photothermal effect of infrared laser, precisely controlling the reaction temperature between 100-150℃, achieving precise control of the silica mesoporous structure. Reaction completion and product discharge: When the reaction reaches the predetermined time or conditions, the laser irradiation device is turned off. The reaction product is discharged from the reactor 5 through the electrically controlled valve 3 and the discharge pipe 4. Equipment cleaning and maintenance: After the reaction is completed, the reactor 5 is cleaned and maintained to ensure long-term stable operation and smooth operation for future use. Therefore, this invention is a very practical product worthy of widespread application.
[0021] Although embodiments of the present invention have been shown and described, it will be understood by those skilled in the art that various changes, modifications, substitutions and alterations can be made to these embodiments without departing from the principles and spirit of the present invention, the scope of which is defined by the appended claims and their equivalents.
Claims
1. A reaction vessel for preparing silica, comprising an integral main body, characterized in that: The main body of the overall device includes a support member located at the bottom of the main body. A reaction vessel is arranged on the top periphery of the support member, and an electrically controlled valve is arranged on the bottom periphery of the reaction vessel. A discharge pipe is arranged on the bottom periphery of the electrically controlled valve. An observation window is arranged on one side of the outer circumference of the reaction vessel, and a control mechanism is arranged on one side of the outer circumference of the reaction vessel. A multi-wavelength laser coaxial irradiation device is arranged on the top periphery of the reaction vessel, and three sets of laser emitters are arranged on the bottom periphery of the multi-wavelength laser coaxial irradiation device. An inlet is arranged on the top periphery of the reaction vessel, and a stirring motor is arranged at the center of the top periphery of the reaction vessel. A stirring rod is movably connected to the drive shaft on the bottom periphery of the stirring motor.
2. The reaction vessel for preparing silica according to claim 1, characterized in that: The laser emitter of the multi-wavelength coaxial laser irradiation device is a three-axis adjustable type, integrating 266nm ultraviolet laser and 1064nm infrared laser.
3. The reaction vessel for preparing silica according to claim 1, characterized in that: The 266nm ultraviolet laser of the multi-wavelength laser coaxial irradiation device excites silanol radicals in the sol.
4. The reaction vessel for preparing silica according to claim 1, characterized in that: The 1064nm infrared laser of the multi-wavelength laser coaxial irradiation device generates an instantaneous high temperature of 100-150℃ in the local micro-region of the sol through photothermal effect.
5. The reaction vessel for preparing silica according to claim 1, characterized in that: The observation window is made of high-temperature resistant quartz glass with a light transmittance of ≥90%.