Heating type vacuum chuck

Abstract

The utility model discloses a kind of heating type vacuum adsorption jigs, including jig body, vacuum passage in the jig body, pipe joint and burying in the heating unit of jig body in the jig body on assembly with the vacuum passage communication. The jig body is equipped with the placement structure for the placement of the substrate, a plurality of adsorption holes are opened on the placement structure, and the adsorption holes are spaced apart from each other and communicated with the vacuum passage. The heating unit includes first heating unit and second heating unit, which are spaced apart and can work independently. The first heating unit is arranged opposite to the central region of the placement structure, and the second heating unit is arranged opposite to the edge region of the placement structure. The heating type vacuum adsorption jig of the utility model improves flatness by heating temperature balance.

Description

Technical Field

[0001] This utility model relates to a fixture used in thin film forming experiments of materials such as perovskite, organic semiconductors, and functional polymers, and particularly to a heated vacuum adsorption fixture. Background Technology

[0002] In laboratory research in materials science, optoelectronic thin films, and other fields, small-scale experimental flatbed coating machines are key equipment for preparing high-precision thin film samples. They are widely used in thin film forming experiments of materials such as perovskites, organic semiconductors, and functional polymers. These experiments have extremely high requirements for the uniformity and flatness of the thin films. The microstructure and surface state of the thin film directly affect the accuracy of subsequent performance tests (such as photoelectric conversion efficiency, mechanical strength, and weather resistance). Therefore, process control at every step of the thin film preparation process is crucial.

[0003] Currently, after a small-scale experimental plate coating machine completes the coating process, the film is still in a undried state. The film material has low viscosity due to incomplete solvent evaporation and retains a certain degree of fluidity. At this stage, researchers must manually remove the substrate carrying the wet film from the coating machine platform and transport it to drying equipment (such as an oven or hot plate) for further processing. However, slight shaking, tilting, or contact disturbances are unavoidable during manual handling. On the one hand, minute displacements of the substrate can cause localized flow of the uncured film under gravity and inertia. On the other hand, finger contact with the substrate edge or airflow disturbances can also cause uneven stress on the film surface, ultimately leading to defects such as agglomeration, wrinkles, or thickness deviations. These defects have a particularly significant impact on high-precision experimental samples. At best, they can cause localized performance failures; at worst, they can distort the data for the entire batch of experiments, requiring repeated experiments, which not only increases material consumption and time costs but may also delay research progress.

[0004] To avoid the above problems, Chinese patent application No. 202023255210.5 discloses a thin film vacuum adsorption bonding heating device, which can realize the vacuum adsorption and heating functions of proton exchange membrane; however, since the heating does not have a zone function, it cannot ensure the thermal balance of the proton exchange membrane, thus affecting the flatness of the proton exchange membrane.

[0005] Therefore, there is an urgent need for a heated vacuum adsorption fixture to overcome one or more of the above-mentioned defects. Utility Model Content

[0006] The purpose of this invention is to provide a heated vacuum adsorption fixture that improves flatness through heating and balancing.

[0007] To achieve the above objectives, the present invention provides a heated vacuum adsorption fixture suitable for vacuum adsorption and fixation of a substrate and for heating and curing of a coating applied to the substrate. The fixture includes a fixture body, a vacuum channel located within the fixture body, a pipe connector mounted on the fixture body and communicating with the vacuum channel, and a heating unit embedded in the fixture body. The fixture body has a placement structure for placing the substrate, and the placement structure has multiple spaced-apart adsorption holes communicating with the vacuum channel. The heating unit includes a first heating unit and a second heating unit that are spaced apart and can operate independently. The first heating unit is arranged opposite to the central region of the placement structure, and the second heating unit is arranged opposite to the edge region of the placement structure.

[0008] Compared with existing technologies, by using "the heating unit includes a first heating unit and a second heating unit that are separated from each other and can work independently, the first heating unit is arranged opposite to the central area of ​​the placement structure, and the second heating unit is arranged opposite to the edge area of ​​the placement structure", the first heating unit and the second heating unit can achieve global temperature balance through differentiated power adjustment. This avoids the central area of ​​the substrate corresponding to the central area of ​​the placement structure from being prone to excessive temperature due to slow heat dissipation, and the edge area of ​​the substrate corresponding to the edge area of ​​the placement structure from being prone to low temperature due to fast heat dissipation, thereby improving the flatness of the substrate coating.

[0009] Preferably, the first heating unit is two symmetrical and spaced apart, and the second heating unit is two symmetrical and spaced apart, with the center of symmetry between the two first heating units coinciding with the center of symmetry between the two second heating units.

[0010] Preferably, the adsorption pores are micropores that enable the placement structure to form a microporous structure.

[0011] Preferably, the placement structure is a flat microporous ceramic plate.

[0012] Preferably, the pore size of the micropore is 4 micrometers to 12 micrometers.

[0013] Preferably, the fixture body includes a base and a platform fixedly mounted on the base. At least one of the platform and the base has a first mounting cavity for mounting the first heating unit and a second mounting cavity for mounting the second heating unit. The second mounting cavity is spaced apart from the first mounting cavity. The placement structure is located on the end face of the platform opposite to the base. The vacuum channel is located on the platform. The pipe joint is located on the side of the platform.

[0014] Preferably, the vacuum channel includes a first straight channel, a second straight channel, and a reciprocating curved groove. The first straight channel extends from two opposite sides of the platform. The curved groove passes through the end face of the platform opposite to the base. The placement structure covers the curved groove and seals with the end face. The second straight channel connects the first straight channel and the curved groove. The pipe joint is connected to the first straight channel.

[0015] Preferably, the bending grooves are arranged in an "S"-shaped reciprocating bending pattern.

[0016] Preferably, the width of the bending groove is 10 mm to 20 mm, the depth of the bending groove is 5 mm to 10 mm, and the spacing between the bending grooves is 10 mm to 15 mm.

[0017] Preferably, the fixture body further includes a temperature sensor and a mounting through hole for assembling the temperature sensor. The mounting through hole penetrates the platform and the base in the direction in which the platform is stacked on the base, and the placement structure covers the mounting through hole.

[0018] Preferably, the mounting through holes are a plurality of spaced-apart holes, and the temperature sensor is mounted in each of the mounting through holes.

[0019] Preferably, the temperature sensor is a platinum resistance temperature sensor.

[0020] Preferably, both the platform and the base are made of marble.

[0021] Preferably, the first mounting cavity is a square cavity, and the second mounting cavity is U-shaped.

[0022] Preferably, the first mounting cavity is filled with a first thermally conductive insulating medium to separate the first heating unit, the platform, and the base; the second mounting cavity is filled with a second thermally conductive insulating medium to separate the second heating unit, the platform, and the base; an insulating gasket is fixed on the side of the base, and the wiring pins of both the first heating unit and the second heating unit pass through the insulating gasket. Attached Figure Description

[0023] Figure 1 This is a perspective view of the heated vacuum adsorption fixture of this utility model.

[0024] Figure 2 yes Figure 1 The diagram shown is an exploded three-dimensional view of the heated vacuum adsorption fixture after concealing the first thermally conductive insulating medium, the second thermally conductive insulating medium, and the temperature sensor.

[0025] Figure 3 yes Figure 2A further exploded 3D diagram, which also uses dashed lines to indicate the central area where the structure is placed.

[0026] Figure 4 yes Figure 1 The heated vacuum adsorption fixture shown is a plan view viewed in the direction indicated by arrow A.

[0027] Figure 5 It is along Figure 4 Internal view of the section cut along the BB line.

[0028] Figure 6 It is along Figure 4 Internal view of the section cut along the CC line.

[0029] Figure 7 yes Figure 6 Enlarged view of section D.

[0030] Figure 8 yes Figure 1 The diagram shows a plan view of the heated vacuum adsorption fixture after concealing the fixture body, vacuum channel, pipe joint, first thermally conductive insulating medium, second thermally conductive insulating medium, and insulating gasket, and viewed in the opposite direction of arrow A. The central area of ​​the placement structure is also indicated by dashed lines.

[0031] Figure 9 Is Figure 5 Based on this, a status diagram is displayed showing the substrate, the wet film on the substrate, and the worktable of the coating machine. Detailed Implementation

[0032] To explain the technical content and structural features of this utility model in detail, the following description is provided in conjunction with the embodiments and accompanying drawings.

[0033] Please see Figure 9 The heated vacuum adsorption fixture 100 of this invention is installed on the worktable 300 of the coating machine during use, with the worktable 300 providing stable support. Therefore, during the coating process, the heated vacuum adsorption fixture 100 first vacuum-adsorbs and fixes the substrate 210; then, the coating machine applies a wet film 220 (hereinafter referred to as the coating film) onto the substrate 210; subsequently, the heated vacuum adsorption fixture 100 heats the substrate 210, causing the wet film 220 on the substrate 210 to solidify, thereby obtaining the experimental sample. Since the wet film 220 on the substrate 210 does not need to be removed from the worktable 300 of the coating machine and transferred to the drying equipment during the solidification process, the flatness of the experimental sample is improved.

[0034] Combined Figures 1 to 3The present invention relates to a heatable vacuum adsorption fixture 100, comprising a fixture body 10, a vacuum channel 20 located within the fixture body 10, a pipe connector 30 mounted on the fixture body 10 and communicating with the vacuum channel 20, and a heating unit 40 embedded in the fixture body 10. The fixture body 10 is provided with a placement structure 50 for placing a substrate 210, and the placement structure 50 has multiple spaced-apart adsorption holes 51 communicating with the vacuum channel 20 (see...). Figure 7 ); Alternatively, at Figure 7 In this example, the adsorption pore 51 is a micropore that forms a microporous structure in the placement structure 50. The pore size of the micropore is 4 micrometers to 12 micrometers, for example, the pore size is 4 micrometers, 5 micrometers, 6 micrometers, 7 micrometers, 8 micrometers, 9 micrometers, 10 micrometers, 11 micrometers or 12 micrometers. In addition, the placement structure 50 is a flat microporous ceramic plate. Obviously, depending on the actual needs, the placement structure 50 can also be made of other suitable materials, but this is well known in the art, so it will not be described in detail here.

[0035] Combined Figure 8 The heating unit 40 includes a first heating unit 41 and a second heating unit 42 that are spaced apart from each other and can operate independently. The first heating unit 41 is located in the central region of the placement structure 50 (see...). Figure 3 and Figure 8 The second heating unit 42 is arranged opposite to the edge region 53 of the placement structure 50 (i.e., the area enclosed by the dashed box indicated by the reference numeral 52). Figure 3 and Figure 8 The area enclosed by the outer contour of the placement structure 50 and the dashed frame is arranged opposite to each other. Specifically, in Figure 8 In the example, the first heating unit 41 consists of two symmetrically spaced units, and the second heating unit 42 consists of two symmetrically spaced units. The center of symmetry between the two first heating units 41 coincides with the center of symmetry between the two second heating units 42. The line of symmetry after the coincidence is shown in the figure. Figure 8 As shown by the center line in the diagram; this better ensures the heat balance of the substrate 210 and more effectively improves the flatness of the experimental sample formed after the wet film 220 on the substrate 210 has cured. More specifically, see the description below.

[0036] like Figure 2 , Figure 3 , Figure 5 and Figure 6As shown, as an example, the fixture body 10 includes a base 10a and a platform 10b stacked and fixed on the base 10a, such that the platform 10b and the base 10a can be manufactured separately and then fixed together by assembly. Alternatively, as an example, the base 10a has a first mounting cavity 11 for mounting the first heating unit 41 and a second mounting cavity 12 for mounting the second heating unit 42, the second mounting cavity 12 being spaced apart from the first mounting cavity 11. Preferably, in Figure 3 In this example, the first mounting cavity 11 is a square cavity, and the second mounting cavity 12 is U-shaped, so that the arrangement between the first heating unit 41 and the second heating unit 42 is more reasonable and compact; furthermore, Figure 5 and Figure 9 In this example, the first mounting cavity 11 is filled with a first thermally conductive insulating medium 60 to separate the first heating unit 41, the platform 10b, and the base 10a. The second mounting cavity 12 is filled with a second thermally conductive insulating medium 60' to separate the second heating unit 42, the platform 10b, and the base 10a. This is to prevent the first heating unit 41 from directly contacting the base 10a and the platform 10b, thus avoiding localized overheating damage to the base 10a and platform 10b, and to reduce heat loss. Furthermore, an insulating gasket 70 is fixed to the side 15 of the base 10a. The wiring pins 411 (421) of both the first heating unit 41 and the second heating unit 42 protrude from the insulating gasket 70. The insulating gasket 70 serves to support and fix the first heating unit 41 and the second heating unit 42, and also provides insulation. Specifically, in conjunction with... Figure 2 , Figure 3 and Figure 5 As an example, the fixture body 10 also includes a temperature sensor 10c and a mounting through hole 10d for assembling the temperature sensor 10c; the mounting through hole 10d penetrates the platform 10b and the base 10a in the direction in which the platform 10b is stacked on the base 10a (see arrow A), at which time the placement structure 50 covers the mounting through hole 10d (see state). Figure 5 (As shown); optionally, combining Figure 2 , Figure 3 and Figure 6 As an example, there are four assembly through holes 10d spaced apart from each other. Obviously, depending on actual needs, the number of assembly through holes 10d can also be one, two, three or more, so it is not considered as... Figure 6As shown, the temperature sensor 10c is installed in each mounting through hole 10d. This design allows for real-time detection of the temperature at various locations of the placement structure 50, providing precise conditions for the heating temperature control of the central region 51 of the placement structure 50 by the first heating unit 41 and the heating temperature control of the edge region 52 of the placement structure 50 by the second heating unit 42. In addition, the temperature sensor 10c is a platinum resistance temperature sensor to improve the accuracy of temperature detection.

[0037] Specifically, four platinum resistance temperature sensors (accuracy ±0.1℃) are used to detect the real-time temperature of the four heating zones of the placement structure 50, and the temperature of the platinum resistance temperature sensor in the through hole 10d covered by the placement structure 50 is also monitored (see status). Figure 5 As shown in the diagram, this ensures that the detected value is close to the actual film surface temperature. Specifically, during operation, the platinum resistance temperature sensor transmits the temperature signal to an external microcontroller control system (such as an STM32 series). The microcontroller control system adjusts the power output of the first heating unit 41 and the second heating unit 42 independently via solid-state relays (SSRs) based on the deviation between the preset temperature (e.g., but not limited to, room temperature to 200°C adjustable, with an accuracy of ±1°C) and the real-time detected value. When the temperature in a certain area is lower than the set value, the power of the first heating unit 41 or the second heating unit 42 is increased accordingly. When the temperature is higher than the set value, the power of the first heating unit 41 or the second heating unit 42 is reduced or suspended, ultimately achieving a temperature fluctuation range of ≤±3°C across the entire placement structure 50, meeting the stringent requirements for drying temperature uniformity of materials such as perovskite and organic semiconductors.

[0038] Understandably, when the fixture body 10 includes a base 10a and a platform 10b stacked and fixed on the base 10a, the placement structure 50 is located on the end face 13 of the platform 10b facing away from the base 10a, the vacuum channel 20 is located on the platform 10b, and the pipe connector 30 is located on the side 14 of the platform 10b; this design facilitates assembly and disassembly operations between the external environment and the pipe connector 30. Furthermore, although... Figure 2 , Figure 3 , Figure 5 and Figure 6 The diagram shows that the first mounting cavity 11 and the second mounting cavity 12 are formed by the base 10a. Obviously, depending on actual needs, the first mounting cavity 11 and the second mounting cavity 12 can also be formed by the platform 10b; or, the base 10a and the platform 10b can each have a first mounting cavity 11 and a second mounting cavity 12. Therefore, it is not considered that... Figure 2 , Figure 3 , Figure 5 and Figure 6 As shown. Furthermore, in Figures 1 to 4In this example, four insulating pads 70 are provided to meet the requirement that two first heating units 41 correspond to two insulating pads 70 and two second heating units 42 correspond to two insulating pads 70. This ensures that each first heating unit 41 is supported and fixed by its corresponding insulating pad 70, and each second heating unit 42 is supported and fixed by its corresponding insulating pad 70. For example, in... Figure 2 , Figure 3 and Figure 8 In this example, the first heating unit 41 and the second heating unit 42 are each electric heating tubes. Obviously, depending on actual needs, the first heating unit 41 and the second heating unit 42 can also be other types of heating structures known in the art.

[0039] like Figures 1 to 3 and Figures 5 to 6 As shown, as an example, both the platform 10b and the base 10a are marble structures; furthermore, the base 10a is preferably made of high-density natural marble, such as, but not limited to, blue marble, to ensure that the thermal conductivity of the base 10a is stable, approximately 2.5-3.0 W / (m•K), and its coefficient of thermal expansion is low (less than or equal to 6×10⁻⁶). -6 The base 10a and the platform 10b are precision ground to ensure that the flatness error of the base 10a and the platform 10b is less than or equal to 0.02 mm / m. This ensures a tight fit between the base 10a and the platform 10b and prevents uneven stress on the wet film 220 on the substrate 210 due to unevenness of the support surface of the base 10a supporting the platform 10b. In addition, the base 10a has a rectangular structure with rounded edges to prevent scratches to the hands or the substrate 210 during experimental operations.

[0040] like Figure 5 and Figure 9 As shown, as an example, the vacuum channel 20 includes a first linear channel 21, a second linear channel 22, and a reciprocating curved groove 23. The first linear channel 21 extends from the platform 10b to two opposite sides 14 (e.g., but not limited to...). Figure 5 and Figure 9 The first straight channel 21 extends from two opposite sides 14 in the left-right direction; since the first straight channel 21 is not curved and passes through the platform 10b, the machining and manufacturing of the first straight channel 21 on the platform 10b is very simple. The curved groove 23 passes through the end face 13 of the platform 10b opposite to the base 10a, which facilitates the machining and manufacturing of the curved groove 23 on the platform 10b. The placement structure 50 covers the curved groove 23 and seals with the end face 13 to prevent leakage at the joint between the placement structure 50 and the platform 10b. The second straight channel 22 connects the first straight channel 21 and the curved groove 23 to facilitate the machining and manufacturing of the second straight channel 22 on the platform 10b; alternatively, in Figure 5 and Figure 9 In this example, the second straight channel 22 extends in a straight line along the direction in which the platform 10b is stacked on the base 10a (see arrow A). The second straight channel 22 also extends along the length of the first straight channel 21 (see...). Figure 5 and Figure 9 Multiple channels (arranged alternately in the left-right direction) are designed to increase the connection between the first straight channel 21 and the curved groove 23, thereby ensuring the uniformity of the vacuum adsorption force on the substrate 210 on the placement structure 50. At this time, the pipe connector 30 is connected to the first straight channel 21, allowing the pipe connector 30 to be connected to an external vacuum pump (vacuum degree adjustable from -0.08 to -0.1 MPa) via a vacuum hose, ensuring smooth and unobstructed airflow within the vacuum channel 20. Specifically, in... Figure 2 and Figure 3 In this example, the curved grooves 23 are arranged in an S-shape, with a groove width of 10 mm to 20 mm, for example, 10 mm, 11 mm, 12 mm, 13 mm, 14 mm, 15 mm, 16 mm, 17 mm, 18 mm, 19 mm, or 20 mm; a groove depth of 5 mm to 10 mm, for example, 5 mm, 6 mm, 7 mm, 8 mm, 9 mm, or 10 mm; and a groove spacing of 10 mm to 15 mm, for example, 10 mm, 11 mm, 12 mm, 13 mm, 14 mm, or 15 mm. This design allows the curved grooves 23 to form a uniformly distributed structure, thereby creating a uniform adsorption effect with the adsorption holes 51 on the placement structure 50. Furthermore, in... Figures 1 to 4 In the example, there are three first straight channels 21 spaced apart from each other, and each of the two ends of the first straight channel 21 is equipped with a pipe connector 30; each first straight channel 21 corresponds to a plurality of second straight channels 22 arranged spaced apart from each other along the length of the first straight channel 21; obviously, the number of first straight channels 21 and pipe connectors 30 can be other according to actual needs, so it is not limited to... Figures 1 to 4 The above is the limit.

[0041] like Figures 1 to 7As shown, as an example, the thickness of the platform 10b is 3 mm to 5 mm, for example, the thickness of the platform 10b is 3 mm, 4 mm or 5 mm; in addition, a high-temperature silicone rubber sealant with a temperature resistance range of -50°C to 250°C can be used for edge sealing between the platform 10b and the base 10a; furthermore, the platform 10b can be precision ground so that the surface flatness error of the platform 10b is less than or equal to 0.01 mm / m. Since the platform 10b is a flat microporous ceramic plate, the concentrated negative pressure in the vacuum channel 20 can be converted into a uniform adsorption force (adsorption pressure 0.02-0.05 MPa) over the entire end face 13 of the platform 10b, which avoids deformation of the substrate 210 caused by excessive local negative pressure, and ensures that the substrate 210 and the end face 13 of the platform 10b are tightly attached, eliminating airflow disturbance below the film surface.

[0042] Compared with the prior art, by using "the heating unit 40 includes a first heating unit 41 and a second heating unit 42 that are spaced apart from each other and can work independently, the first heating unit 41 is arranged opposite to the central region 52 of the placement structure 50, and the second heating unit 42 is arranged opposite to the edge region 53 of the placement structure 50", the first heating unit 41 and the second heating unit 42 can achieve global temperature balance through differentiated power adjustment, avoiding the central region of the substrate 210 corresponding to the central region 52 of the placement structure 50 from being prone to excessive temperature due to slow heat dissipation, and the edge region of the substrate 210 corresponding to the edge region 53 of the placement structure 50 from being prone to low temperature due to fast heat dissipation, thereby improving the flatness of the coating film on the substrate 210.

[0043] The above-disclosed examples are merely preferred embodiments of the present utility model and should not be construed as limiting the scope of the present utility model. Therefore, any equivalent variations made in accordance with the claims of the present utility model shall fall within the scope of the present utility model.

Claims

1. A heated vacuum adsorption fixture, suitable for vacuum adsorption and fixing of a substrate and heating and curing of a coating applied on the substrate, comprising a fixture body, a vacuum channel located within the fixture body, a pipe connector assembled on the fixture body and communicating with the vacuum channel, and a heating unit embedded in the fixture body, wherein the fixture body is provided with a placement structure for placing the substrate, and the placement structure has a plurality of adsorption holes spaced apart from each other and communicating with the vacuum channel, characterized in that, The heating unit includes a first heating unit and a second heating unit that are spaced apart from each other and can operate independently. The first heating unit is arranged opposite to the central region of the placement structure, and the second heating unit is arranged opposite to the edge region of the placement structure.

2. The heated vacuum adsorption fixture according to claim 1, characterized in that, The first heating unit consists of two symmetrically spaced heating units, and the second heating unit consists of two symmetrically spaced heating units. The center of symmetry between the two first heating units coincides with the center of symmetry between the two second heating units.

3. The heated vacuum adsorption fixture according to claim 1, characterized in that, The adsorption pores are micropores that enable the placement structure to form a microporous structure; the placement structure is a flat microporous ceramic plate, and the pore diameter of the micropores is 4 micrometers to 12 micrometers.

4. The heated vacuum adsorption fixture according to claim 1, characterized in that, The fixture body includes a base and a platform fixedly mounted on the base. At least one of the platform and the base has a first mounting cavity for mounting the first heating unit and a second mounting cavity for mounting the second heating unit. The second mounting cavity is spaced apart from the first mounting cavity. The placement structure is located on the end face of the platform opposite to the base. The vacuum channel is located on the platform. The pipe joint is located on the side of the platform.

5. The heated vacuum adsorption fixture according to claim 4, characterized in that, The vacuum channel includes a first straight channel, a second straight channel, and a reciprocating curved groove. The first straight channel extends from two opposite sides of the platform. The curved groove passes through the end face of the platform opposite to the base. The placement structure covers the curved groove and seals with the end face. The second straight channel connects the first straight channel and the curved groove. The pipe joint is connected to the first straight channel.

6. The heated vacuum adsorption fixture according to claim 5, characterized in that, The bending grooves are arranged in an "S" shape with reciprocating bending; the width of the bending grooves is 10 mm to 20 mm, the depth of the bending grooves is 5 mm to 10 mm, and the spacing between the bending grooves is 10 mm to 15 mm.

7. The heated vacuum adsorption fixture according to claim 4, characterized in that, The fixture body also includes a temperature sensor and an assembly through hole for assembling the temperature sensor. The assembly through hole penetrates the platform and the base in the direction in which the platform is stacked on the base, and the placement structure covers the assembly through hole.

8. The heated vacuum adsorption fixture according to claim 7, characterized in that, The mounting through holes are multiple and spaced apart from each other, and each mounting through hole is equipped with the temperature sensor; the temperature sensor is a platinum resistance temperature sensor.

9. The heated vacuum adsorption fixture according to claim 4, characterized in that, Both the platform and the base are made of marble.

10. The heated vacuum adsorption fixture according to claim 4, characterized in that, The first mounting cavity is a square cavity, and the second mounting cavity is U-shaped; the first mounting cavity is filled with a first thermally conductive insulating medium to separate the first heating unit, the platform, and the base, and the second mounting cavity is filled with a second thermally conductive insulating medium to separate the second heating unit, the platform, and the base; an insulating gasket is fixed on the side of the base, and the wiring pins of the first heating unit and the second heating unit each pass through the insulating gasket.

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