Special anti-slip multi-station soaking jig for semiconductor quartz ring

Abstract

The utility model relates to semiconductor technology. A kind of special anti-slip multi-station soaking fixture for semiconductor quartz ring, including base, the outer edge of base is equipped with two mirror image relative settings first support plate;The outer edge of base is also equipped with relative settings flow guide slope block and limit plate;At least two longitudinal arrangement limit clamping groove are all set up on first support plate and limit plate;Still include at least two longitudinal arrangement and for loading quartz ring through-flow disc, the through-flow disc in the lowermost part is with the upper surface of flow guide slope block and reaches, the edge of through-flow disc and the limit clamping groove of first support plate and limit plate are clamped, and welding is connected;First through slot is set up on through-flow disc and is penetrated from top to bottom;Second through slot is set up on base and is penetrated from top to bottom;The top of first support plate and limit plate is equipped with gripping hole for gripping. The utility model is favorable to the flow of liquid medicine in the process of loading and unloading fixture, reduces the probability of occurrence of sputtering and other accidents.

Description

Technical Field

[0001] This utility model relates to the field of semiconductor technology, specifically to an immersion fixture. Background Technology

[0002] In the cleaning and regeneration of semiconductor components, the regeneration and cleaning of quartz rings requires frequent acid washing, pure water ultrasonic cleaning, and other processes. To improve cleaning efficiency, multiple quartz rings are usually immersed and cleaned simultaneously.

[0003] Currently, two common fixing methods are used in the industry:

[0004] (1) Stacked immersion method: Quartz rings are stacked in the immersion tank, which causes the contact surface between the rings to form a cleaning dead corner, which easily leads to the problem of pollutant residue. In addition, the edges are easily chipped due to collision during operation.

[0005] (2) Simple support method: The open support is used to fix the quartz ring. Although the stacking problem is alleviated, the friction coefficient drops sharply in the strong acid environment, and the quartz ring is prone to slipping and colliding on the fixture. In addition, due to the lack of fluid path, the loading and unloading process is prone to splashing of liquid, which endangers the life safety of the operators. Utility Model Content

[0006] This utility model provides a special anti-slip multi-station immersion fixture for semiconductor quartz rings to solve at least one of the above-mentioned technical problems.

[0007] A special anti-slip multi-station immersion fixture for semiconductor quartz rings includes a base, characterized in that two mirror-opposite first support plates are installed on the outer edge of the base;

[0008] The outer edge of the base is also equipped with a flow guide ramp block and a limiting plate arranged opposite to each other. The upper surface of the flow guide ramp block is inclined downward from the side away from the limiting plate to the side adjacent to the limiting plate.

[0009] Both the first support plate and the limiting plate are provided with at least two longitudinally arranged limiting slots;

[0010] It also includes at least two longitudinally arranged flow plates for loading quartz rings. The lowermost flow plate abuts against the upper surface of the flow guide ramp block. The edge of the flow plate engages with the limiting slots on the first support plate and the limiting plate, and is welded together.

[0011] The flow plate has a first through groove running vertically through it.

[0012] The base has a second through groove that extends vertically.

[0013] The top of the first support plate and the limiting plate are provided with gripping holes for gripping.

[0014] This invention facilitates the tilted placement of multiple quartz rings, and the through groove facilitates the flow of the liquid during the loading and unloading of the fixture, reducing the probability of accidents such as splashing.

[0015] More preferably, the upper surface of the flow plate is provided with corrugated protrusions.

[0016] More preferably, the limiting slot on the first support plate is inclined downward from the vicinity of the guide ramp block to the distance from the guide ramp block.

[0017] More preferably, the connection point between the flow plate and the first support plate is higher than the connection point between the flow plate and the limiting plate.

[0018] More preferably, the angle between the upper surface of the guide ramp block and the horizontal plane is 15° ± 1°.

[0019] More preferably, the base is made of PTFE resin;

[0020] The flow plate is made of PTFE resin;

[0021] The first support plate is made of PTFE resin;

[0022] The flow guide ramp block is made of PTFE resin;

[0023] The limiting plate is made of PTFE resin.

[0024] More preferably, the gripping hole is rectangular.

[0025] More preferably, the first through groove is an elongated slot;

[0026] The second through groove is a long, narrow slot.

[0027] More preferably, the length direction of the first channel is arranged along the arrangement direction of the guide ramp and the limiting plate.

[0028] More preferably, the two first support plates are arranged in a left-right mirror symmetrical configuration;

[0029] The flow guide ramp and the limiting plate are arranged in front and behind;

[0030] The length direction of the first through slot is the front-to-back direction;

[0031] The length direction of the second through groove is the front-to-back direction.

[0032] More preferably, the inner wall of the first support plate is provided with corrugated protrusions.

[0033] Beneficial effects:

[0034] This invention involves placing quartz rings sequentially onto the loading surface of a flow plate, and then the operator can lift the fixture through the rounded rectangular groove and slowly place it into the solution tank.

[0035] Compared with existing methods, this approach avoids the stacking and collision problems when multiple quartz rings are soaked simultaneously, while saving soaking space and improving output per unit time.

[0036] The inclined design of the flow plate, along with the opening of the flow channel, facilitates the flow of the liquid during the loading and unloading of the fixture, reducing the probability of accidents such as splashing. Attached Figure Description

[0037] Figure 1 This is a schematic diagram of one structure of the present utility model.

[0038] In the diagram: 1. Base; 2. Guide ramp block; 3. First support plate; 4. Flow plate; 5. Limiting plate. Detailed Implementation

[0039] The technical solutions of the present utility model will be clearly and completely described below with reference to the accompanying drawings of the embodiments. Obviously, the described embodiments are only some embodiments of the present utility model, and not all embodiments. Based on the embodiments of the present utility model, all other embodiments obtained by those of ordinary skill in the art without creative effort are within the protection scope of the present utility model.

[0040] Please see Figure 1 As shown, a multi-station immersion fixture for semiconductor quartz rings with anti-slip properties includes a base 1. Two mirror-image opposing first support plates 3 are mounted on the outer edge of the base 1. A flow guide ramp 2 and a limiting plate 5 are also mounted on the outer edge of the base, with the upper surface of the flow guide ramp 2 inclined downwards from the side away from the limiting plate 5 to the side adjacent to the limiting plate 5. At least two longitudinally arranged limiting slots are provided on both the first support plate 3 and the limiting plate 5. The fixture also includes at least two longitudinally arranged flow plates 4 for loading the quartz rings. The lowermost flow plate 4 abuts against the upper surface of the flow guide ramp 2, and the edge of the flow plate 4 engages with and is welded to the limiting slots on the first support plate 3 and the limiting plate 5. A first through-slot is provided on the flow plate, and a second through-slot is provided on the base 1. Grip holes for gripping are provided on the top of the first support plate 3 and the limiting plate 5. This invention facilitates the tilted placement of multiple quartz rings, and the through groove facilitates the flow of the liquid during the loading and unloading of the fixture, reducing the probability of accidents such as splashing.

[0041] The base is a circular disk. The flow path is a circular disk.

[0042] The upper surface of the flow plate 4 is provided with corrugated protrusions.

[0043] The limiting groove on the first support plate 3 is inclined downwards from the adjacent guide ramp block 2 to the distance from the guide ramp block 2. The connection point between the same flow plate 4 and the first support plate 3 is higher than the connection point between the flow plate 4 and the limiting plate 5.

[0044] The angle between the upper surface of the guide ramp block 2 and the horizontal plane is 15° ± 1°.

[0045] The base 1 is made of PTFE resin; the flow plate is made of PTFE resin; the first support plate 3 is made of PTFE resin; the guide ramp block 2 is made of PTFE resin; and the limiting plate 5 is made of PTFE resin.

[0046] The gripping hole is rectangular.

[0047] The first through slot is a long, narrow groove; the second through slot is a long, narrow groove.

[0048] The length of the first channel is set along the arrangement direction of the guide ramp 2 and the limiting plate 5.

[0049] The two first support plates 3 are arranged symmetrically in a mirror image; the guide ramp block 2 and the limiting plate 5 are arranged in front and behind; the length direction of the first through groove is the front-back direction; the length direction of the second through groove is the front-back direction.

[0050] The inner wall of the first support plate 3 is provided with corrugated protrusions.

[0051] In specific embodiment 2, based on specific embodiment 1, the first support plate and the limiting plate are provided with a connecting limiting slot and a through hole that penetrates radially inward and outward. The first support plate and the limiting plate are welded to the flow channel at the through hole.

[0052] It will be apparent to those skilled in the art that this invention is not limited to the details of the exemplary embodiments described above, and that it can be implemented in other specific forms without departing from the spirit or essential characteristics of this invention. Therefore, the embodiments should be considered illustrative and non-limiting in all respects, and the scope of this invention is defined by the appended claims rather than the foregoing description. Thus, it is intended that all variations falling within the meaning and scope of equivalents of the claims be included within this invention. No reference numerals in the claims should be construed as limiting the scope of the claims.

[0053] Furthermore, it should be understood that although this specification describes embodiments, not every embodiment contains only one independent technical solution. This narrative style is merely for clarity. Those skilled in the art should consider the specification as a whole, and the technical solutions in each embodiment can also be appropriately combined to form other embodiments that can be understood by those skilled in the art.

Claims

1. A multi-station immersion fixture for semiconductor quartz rings, characterized in that, Two mirror-opposite first support plates are installed on the outer edge of the base; The outer edge of the base is also equipped with a flow guide ramp block and a limiting plate arranged opposite to each other. The upper surface of the flow guide ramp block is inclined downward from the side away from the limiting plate to the side adjacent to the limiting plate. Both the first support plate and the limiting plate are provided with at least two longitudinally arranged limiting slots; It also includes at least two longitudinally arranged flow plates for loading quartz rings. The lowermost flow plate abuts against the upper surface of the flow guide ramp block. The edge of the flow plate engages with the limiting slots on the first support plate and the limiting plate, and is welded together. The flow plate has a first through groove running vertically through it. The base has a second through groove that extends vertically. The top of the first support plate and the limiting plate are provided with gripping holes for gripping.

2. The semiconductor quartz ring anti-slip multi-station immersion fixture according to claim 1, characterized in that: The upper surface of the flow plate is provided with corrugated protrusions.

3. The semiconductor quartz ring anti-slip multi-station immersion fixture according to claim 1, characterized in that: The limiting slot on the first support plate is inclined downward from the vicinity of the guide ramp block to the distance from the guide ramp block.

4. The semiconductor quartz ring anti-slip multi-station immersion fixture according to claim 1, characterized in that: The connection point between the flow plate and the first support plate is higher than the connection point between the flow plate and the limiting plate.

5. The semiconductor quartz ring-specific anti-slip multi-station immersion fixture according to claim 1, characterized in that: The angle between the upper surface of the guide ramp block and the horizontal plane is 15° ± 1°.

6. The semiconductor quartz ring-specific anti-slip multi-station immersion fixture according to claim 1, characterized in that: The base is made of PTFE resin; The flow plate is made of PTFE resin; The first support plate is made of PTFE resin; The flow guide ramp block is made of PTFE resin; The limiting plate is made of PTFE resin.

7. The semiconductor quartz ring-specific anti-slip multi-station immersion fixture according to claim 1, characterized in that: The gripping hole is rectangular.

8. The semiconductor quartz ring-specific anti-slip multi-station immersion fixture according to claim 1, characterized in that: The first through slot is a long strip-shaped slot; The second through groove is a long, narrow slot.

9. The semiconductor quartz ring anti-slip multi-station immersion fixture according to claim 1, characterized in that: The two first support plates are arranged symmetrically in a left-right mirror image configuration; The flow guide ramp and the limiting plate are arranged in front and behind; The length direction of the first through slot is the front-to-back direction; The length direction of the second through groove is the front-to-back direction.

10. A special anti-slip multi-station immersion fixture for semiconductor quartz rings according to claim 1, characterized in that: The inner wall of the first support plate is provided with corrugated protrusions.

Images