A photolithography wafer picking device

Abstract

The utility model relates to the field of photoetching machine takes piece, concretely is a kind of photoetching piece device, including base, the upper end fixed mounting of base has linear motor, the moving end of linear motor is fixedly installed with fixed block, the lateral wall fixed mounting of fixed block has third air cylinder, and the output shaft fixed connection of third air cylinder has support plate, the front end both sides of support plate are respectively fixedly installed with first support platform and second support platform, the upper end of first support platform is installed with push material subassembly, the upper end of second support platform is installed with material moving subassembly, the upper end fixed mounting of base has transmission component;The utility model is set up first push plate and second push plate, can conveniently move the photoetching material on the surface of workbench, make it move to second support platform, then push it to guide plate on second push plate, convenient for its discharge, this process, photoetching material is not extruded, can protect it.

Description

Technical Field

[0001] This utility model relates to the field of lithography machine wafer taking, specifically a lithography wafer taking device. Background Technology

[0002] The photolithography wafer removal device is a key component in a photolithography machine used to remove placed silicon wafers or photomasks. It facilitates the removal of silicon wafers or photomasks while protecting them from damage.

[0003] Most existing wafer picking devices use clamping to remove photolithography wafers placed on the worktable. However, due to the thinness of the photolithography wafers, improper clamping force can easily damage them. Insufficient clamping force makes it difficult to hold the wafers. Furthermore, using photolithography wafers of different sizes further reduces clamping efficiency, thus reducing the efficiency of wafer removal. To address this issue, we propose a photolithography wafer picking device. Utility Model Content

[0004] The purpose of this utility model is to provide a photolithography wafer picking device, including a base, a linear motor fixedly installed on the upper end of the base, a fixing block fixedly installed on the moving end of the linear motor, a third cylinder fixedly installed on the side wall of the fixing block, and a support plate fixedly connected to the output shaft of the third cylinder. A first support platform and a second support platform are fixedly installed on the front sides of the support plate, respectively. A pushing component is installed on the upper end of the first support platform, a transferring component is installed on the upper end of the second support platform, and a transmission component is fixedly installed on the upper end of the base. The pushing assembly includes a first pushing plate, a first fixing plate is fixedly installed on the upper end of the first support platform, a first cylinder is fixedly installed on the side wall of the first fixing plate, the first pushing plate is slidably connected to the upper end of the first support platform, and the output shaft of the first cylinder is fixedly connected to the side wall of the first pushing plate through the interior of the first fixing plate.

[0005] Preferably, the material transfer assembly includes a second push plate, a second fixing plate is fixedly installed at the rear end of the second support platform, a second cylinder is fixedly installed on the rear side wall of the second fixing plate, the second push plate is disposed at the upper end of the second support platform, and the output shaft of the second cylinder is fixedly connected to the side wall of the second push plate through the interior of the second fixing plate.

[0006] Preferably, the transmission assembly includes a transmission device, which is fixedly installed on the upper end of the base. A guide plate is fixedly installed on the rear side wall of the second support platform. The guide plate is tilted, and multiple rotating rollers are rotatably connected at equal intervals inside the side wall of the guide plate. The bottom end of the guide plate is located directly above the conveyor belt in the transmission device.

[0007] Preferably, the top surface of the first support platform is higher than the top surface of the second support platform, and the top surface of the second support platform is rotatably connected with multiple balls at equal intervals, the top surface of the balls being horizontal to the top surface of the first support platform.

[0008] Preferably, a first baffle is fixedly installed on both ends of the guide plate, and a second baffle is fixedly installed on the right end of the second support platform.

[0009] Preferably, the lengths of both the first and second support platforms are greater than the width of the worktable.

[0010] Preferably, the width of the guide plate is greater than the width of the second support platform.

[0011] Compared with the prior art, the beneficial effects of this utility model are: 1. This utility model, through the setting of a first pusher plate and a second pusher plate, can conveniently move the photolithography material on the surface of the worktable to the second support platform, and then use the second pusher plate to push it onto the guide plate for easy discharge. This process will not cause compression to the photolithography material and can protect it.

[0012] 2. In use, the first and second support platforms on both sides of the worktable are positioned by a linear motor. Then, the third cylinder is opened to move the first and second support platforms to the position of the worktable. The first cylinder is then opened to push the photolithography material on the worktable onto the second support platform. The second cylinder is then opened to push the photolithography material out using the second push plate, which facilitates the removal of the photolithography material. Attached Figure Description

[0013] Figure 1 This is a schematic diagram of the main structure of the present utility model; Figure 2 This is a side view of the present invention; Figure 3 This utility model Figure 2 Enlarged structural diagram of section A.

[0014] In the diagram: 1. Base; 2. Linear motor; 3. Pushing assembly; 31. First push plate; 32. First fixing plate; 33. First cylinder; 4. Transfer assembly; 41. Second cylinder; 42. Second fixing plate; 43. Second push plate; 5. Transmission assembly; 51. Transmission device; 52. Guide plate; 53. Rotary roller; 6. Ball bearing; 7. Third cylinder; 8. Support plate; 9. Fixing block; 10. First support platform; 11. Second support platform; 12. First baffle; 13. Second baffle. Detailed Implementation

[0015] The technical solutions of the present utility model will be clearly and completely described below with reference to the accompanying drawings of the embodiments. Obviously, the described embodiments are only some embodiments of the present utility model, and not all embodiments. Based on the embodiments of the present utility model, all other embodiments obtained by those of ordinary skill in the art without creative effort are within the protection scope of the present utility model.

[0016] Reference Figure 1 - Figure 3 This utility model discloses a photolithography wafer picking device, including a base 1, a fixing block 9, a third cylinder 7 fixedly installed on the side wall of the fixing block 9, and a support plate 8 fixedly connected to the output shaft of the third cylinder 7. A first support platform 10 and a second support platform 11 are fixedly installed on the front two sides of the support plate 8, a pushing component 3 is installed on the upper end of the first support platform 10, a transferring component 4 is installed on the upper end of the second support platform 11, and a transmission component 5 is fixedly installed on the upper end of the base 1. The pusher assembly 3 includes a first pusher plate 31, a first fixing plate 32 fixedly installed on the upper end of the first support platform 10, a first cylinder 33 fixedly installed on the side wall of the first fixing plate 32, the first pusher plate 31 slidably connected to the upper end of the first support platform 10, and the output shaft of the first cylinder 33 is fixedly connected to the side wall of the first pusher plate 31 through the interior of the first fixing plate 32. It should be noted that the first pusher plate 31, under the push of the first cylinder 33, can move the placed photolithography material, which is convenient for its removal.

[0017] The material transfer assembly 4 includes a second push plate 43, a second fixing plate 42 fixedly installed at the rear end of the second support platform 11, a second cylinder 41 fixedly installed on the rear side wall of the second fixing plate 42, the second push plate 43 being disposed at the upper end of the second support platform 11, and the output shaft of the second cylinder 41 being fixedly connected to the side wall of the second push plate 43 through the interior of the second fixing plate 42. It should be noted that after the photolithography material is pushed onto the second support platform 11, under the action of the second cylinder 41, the photolithography material can be conveniently pushed out of the second support platform 11, facilitating its collection.

[0018] The transmission assembly 5 includes a transmission device 51, which is fixedly installed on the upper end of the base 1. A guide plate 52 is fixedly installed on the rear side wall of the second support platform 11. The guide plate 52 is tilted, and multiple rotating rollers 53 are rotatably connected at equal intervals inside the side wall of the guide plate 52. The bottom end of the guide plate 52 is located directly above the conveyor belt in the transmission device 51. It should be noted that after the photolithography material is placed on the second support platform 11, the third cylinder 7 needs to drive the support plate 8 to reset before the photolithography material can be pushed out, so that the photolithography material can enter the conveyor belt in the transmission device 51.

[0019] The top surface of the first support platform 10 is higher than the top surface of the second support platform 11, and multiple balls 6 are rotatably connected at equal intervals inside the top surface of the second support platform 11. The top surface of the balls 6 is horizontal with the top surface of the first support platform 10. The balls 6 can effectively reduce the friction generated when the photolithography material moves.

[0020] The guide plate 52 has a first baffle 12 fixedly installed on both sides of its two ends, and the second support platform 11 has a second baffle 13 fixedly installed on the right side of its two ends; this can conveniently limit the movement of the photolithography material.

[0021] The lengths of the first support platform 10 and the second support platform 11 are both greater than the width of the worktable; this prevents the first push plate 31 and the second push plate 43 from obstructing the material during movement.

[0022] The width of the guide plate 52 is greater than the width of the second support stage 11; this prevents the photolithography material from falling outside the guide plate 52 when it is pushed out.

[0023] The working principle of this utility model is as follows: When in use, firstly, according to the position of the placement platform, the linear motor 2 is started to move the position of the support plate 8 until the worktable is between the first support platform 10 and the second support platform 11, and the top surface of the first support platform 10 is horizontal with the top surface of the worktable. Then, the third cylinder 7 is activated, which moves the first support platform 10 and the second support platform 11 to the position of the worktable. Then, the first cylinder 33 is opened, which pushes the first push plate 31 to move the photolithography material from the worktable to the second support platform 11. During this process, the first fixing plate 32 plays a stabilizing role to ensure the precise operation of the push assembly 3. When the photolithography material reaches the second support stage 11, the second cylinder 41 is activated, driving the second pusher plate 43 to push it onto the guide plate 52. The rotating roller 53 on the guide plate 52 reduces friction, ensuring smooth sliding of the photolithography material and preventing damage caused by external forces. It also moves smoothly onto the conveyor belt in the transfer device 51. The transfer device 51 further assists in the movement of the photolithography material, ensuring that the entire wafer picking process is efficient and safe. In addition, the base 1 and the fixing block 9 provide stable support for the overall structure, while the design of the ball bearing 6 reduces the friction generated during the movement of the photolithography material, improving the smoothness of operation. The first baffle 12 and the second baffle 13 form a protective barrier on both sides to prevent the photolithography material from deviating from the predetermined track. The drive components of this device are all electrically connected to an external control device.

[0024] The above description, in conjunction with specific embodiments, provides a further detailed explanation of the present utility model. It should not be construed that the specific implementation of the present utility model is limited to these descriptions. For those skilled in the art, several simple deductions or substitutions can be made without departing from the concept of the present utility model, and all such deductions or substitutions should be considered to fall within the scope of protection defined by the claims submitted by the present utility model.

Claims

1. A photolithography wafer picking device comprising a base (1), characterized in that: A linear motor (2) is fixedly installed on the upper end of the base (1). A fixing block (9) is fixedly installed on the moving end of the linear motor (2). A third cylinder (7) is fixedly installed on the side wall of the fixing block (9). The output shaft of the third cylinder (7) is fixedly connected to a support plate (8). A first support platform (10) and a second support platform (11) are fixedly installed on both sides of the front end of the support plate (8). A pushing component (3) is installed on the upper end of the first support platform (10). A transferring component (4) is installed on the upper end of the second support platform (11). A transmission component (5) is fixedly installed on the upper end of the base (1). The pushing assembly (3) includes a first pushing plate (31), a first fixing plate (32) is fixedly installed on the upper end of the first support platform (10), a first cylinder (33) is fixedly installed on the side wall of the first fixing plate (32), the first pushing plate (31) is slidably connected to the upper end of the first support platform (10), and the output shaft of the first cylinder (33) is fixedly connected to the side wall of the first pushing plate (31) through the interior of the first fixing plate (32).

2. A photolithography wafer picking apparatus according to claim 1, wherein: The material transfer assembly (4) includes a second push plate (43), a second fixing plate (42) is fixedly installed at the rear end of the second support platform (11), a second cylinder (41) is fixedly installed on the rear side wall of the second fixing plate (42), the second push plate (43) is located at the upper end of the second support platform (11), and the output shaft of the second cylinder (41) is fixedly connected to the side wall of the second push plate (43) through the interior of the second fixing plate (42).

3. A photolithography wafer picking apparatus according to claim 1, wherein: The transmission assembly (5) includes a transmission device (51), which is fixedly installed on the upper end of the base (1). A guide plate (52) is fixedly installed on the rear side wall of the second support platform (11). The guide plate (52) is tilted, and multiple rotating rollers (53) are rotatably connected at equal intervals inside the side wall of the guide plate (52). The bottom end of the guide plate (52) is located directly above the conveyor belt in the transmission device (51).

4. A photolithography wafer picking apparatus according to claim 1, wherein: The top surface of the first support platform (10) is higher than the top surface of the second support platform (11), and multiple balls (6) are rotatably connected at equal intervals inside the top surface of the second support platform (11), and the top surface of the balls (6) is horizontal to the top surface of the first support platform (10).

5. A photolithography wafer picking apparatus according to claim 3, wherein: The guide plate (52) has a first baffle (12) fixedly installed on both sides of its two ends, and the second support platform (11) has a second baffle (13) fixedly installed on its right side wall.

6. A photolithography wafer picking apparatus according to claim 1, wherein: The length of the first support platform (10) and the second support platform (11) are both greater than the width of the worktable.

7. A photolithography wafer picking apparatus according to claim 3, wherein: The width of the guide plate (52) is greater than the width of the second support platform (11).

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