Ion energy control device and ion generating apparatus

Abstract

The utility model relates to ion source processing technical field discloses an ion energy control device and ion generating equipment. Ion energy control device is suitable for and ion emission source cooperation connection, and ion emission source is suitable for emitting target ion and impurity ion, and impurity ion and target ion take heterogenic charge, ion energy control device includes: electrode plate, electrode plate has opposite electric field with target ion charge type, is suitable for adsorbing target ion to electrode plate surface, bottom plate, bottom plate is set up with the channel of repelling, along the moving direction of target ion, and the channel of repelling and electrode plate projection do not overlap. Through set up electrode plate with opposite electric field and set up the channel of repelling bottom plate, realized target ion and impurity ion's high -efficient separation. Electrode plate adsorbs target ion, and the channel of repelling is located outside electrode plate projection, ensures that impurity ion is not adsorbed and smoothly discharges, improves the purity and efficiency of ion separation.

Description

Technical Field

[0001] This utility model relates to the field of ion source processing technology, specifically to an ion energy control device and an ion generating equipment. Background Technology

[0002] Ion source processing is a technique that uses ion beams to precisely process or modify the surface of materials. Its core principle is to generate ions (such as plasma) by ionizing gases or solid materials, accelerating them in an electric field to form a high-energy ion beam that bombards the workpiece surface. This process allows for precise control of ion energy, dosage, and incident angle, enabling functions such as nanoscale etching, sputtering coating, ion implantation, and surface cleaning. It is widely used in semiconductor manufacturing, optical component processing, and material modification, and is characterized by high precision, non-contact operation, and broad applicability.

[0003] In existing ion source processing technologies, ions with specific charge states are usually required to ensure processing accuracy. However, the ion source ionization process naturally generates a mixed charge state ion beam. If separation is not timely, non-target ions will cause uneven etching rates, excessive surface damage, or abnormal chemical reactions due to energy differences, reducing processing uniformity and film quality. Utility Model Content

[0004] In view of this, the present invention provides an ion energy control device and an ion generating equipment to solve the problem of poor charge separation effect during ion source processing, which leads to poor processing effect of the processed parts.

[0005] In a first aspect, this utility model provides an ion energy control device suitable for connection with an ion emission source, the ion emission source being suitable for emitting target ions and impurity ions, the impurity ions and target ions carrying opposite charges; the ion energy control device includes:

[0006] The electrode plate has an electric field that is opposite to the charge type of the target ion, which is suitable for adsorbing the target ion onto the surface of the electrode plate;

[0007] The base plate has a rejection channel, and the rejection channel does not overlap with the projection of the electrode plate along the direction of movement of the target ion.

[0008] Beneficial effects: By setting up electrode plates with opposite electric fields and a base plate with rejection channels, highly efficient separation of target ions and impurity ions is achieved. The electrode plates adsorb target ions, while the rejection channels are located outside the projection of the electrode plates, ensuring that impurity ions are not adsorbed and are smoothly discharged. This improves the purity and efficiency of ion separation, making it particularly suitable for applications requiring high-purity ions. Furthermore, the non-overlapping projection arrangement avoids electric field interference, ensuring that impurity ions move along a preset path. The overall structure is simple, requiring no complex control system, thus reducing manufacturing costs and maintenance difficulty.

[0009] In one alternative embodiment, the external suction member is adapted to communicate with the rejection channel to draw impurity ions into the rejection channel.

[0010] Beneficial effects: By introducing an external suction component connected to the rejection channel, the removal efficiency of impurity ions is further improved. The negative pressure generated by the suction component actively draws impurity ions into the rejection channel, preventing them from being retained due to diffusion or residual electric field effects. This active suction method ensures the continuity and stability of the separation process. Furthermore, the suction force is adjustable, adapting to different concentrations of impurity ions, enhancing the applicability and flexibility of the device.

[0011] In one alternative implementation, the rejection channel has a mesh structure.

[0012] Beneficial effects: Designing the rejection channel as a mesh structure increases the dispersion area of ​​impurity ions while maintaining the mechanical strength of the base plate. The mesh structure achieves uniform suction or natural diffusion through multi-pore distribution, avoiding ion backflow caused by local airflow turbulence, and also reduces airflow resistance, thus reducing energy consumption when used in conjunction with external suction components.

[0013] In one alternative implementation, the base plate and the electrode plate are detachably connected.

[0014] Beneficial effects: The detachable connection between the base plate and the electrode plate simplifies the maintenance and cleaning process. The electrode plates may experience performance degradation due to ion adsorption after prolonged use; they can be quickly disassembled and replaced or cleaned, reducing downtime.

[0015] In one alternative implementation, the base plate and the electrode plate are electrically connected.

[0016] Beneficial effects: By electrically connecting the base plate and the electrode plate, and then transmitting the electric field from the electrode plate to the electrode plate, the stability of the electric field distribution is ensured, further improving the safety and reliability of the device.

[0017] In one alternative embodiment, the baffle is fixedly connected to the base plate, and the baffle surrounds the rejection channel and the outer periphery of the electrode plate.

[0018] Beneficial effects: The baffle, surrounding the rejection channel and the electrode plate, forms a working chamber, reducing external airflow interference and ion escape. The baffle guides impurity ions to the rejection channel, improving separation efficiency while preventing environmental pollutants from entering the device. The fixed connection between the baffle and the base plate enhances the overall structural rigidity. Furthermore, the baffle can integrate an observation window or sensor interface for real-time monitoring of the separation process.

[0019] In one alternative embodiment, both the base plate and the electrode plate are arranged vertically, and the rejection channel is located at least below the electrode plate along the direction of gravity.

[0020] Beneficial effects: By vertically arranging the base plate and electrode plate, and placing the impurity removal channel below the direction of gravity of the electrode plate, gravity assists in the sedimentation and removal of impurity ions. With the ion source horizontally aligned with the electrode plate, the impurity removal channel, located below, can naturally collect impurity ions, preventing their deposition on the electrode plate surface. If the impurity removal channel surrounds the bottom of the electrode plate, multi-directional impurity removal can be achieved, adapting to ion beams with different incident angles and improving fault tolerance.

[0021] In one alternative embodiment, at least one support column is provided on the outer peripheral surface formed by the baffle, and the two ends of the support column are respectively connected to the base plate and the ion source emission device.

[0022] Beneficial effects: By connecting the base plate and the ion source emission device with support columns, the overall structure achieves rigid fixation and precise alignment. The support columns can resist the mechanical vibration of the ion source, ensuring the relative position stability of the electrode plate and the ion emission end, and maintaining consistent separation performance. Their length is adjustable, facilitating the calibration of the ion beam incident angle. The distributed arrangement of multiple support columns also distributes stress, extending the equipment's lifespan.

[0023] Secondly, this utility model also provides an ion generating device, including the ion energy control device mentioned above, and further including: an ion emission source, wherein the emitting end of the ion emission source is detachably connected to the ion energy control device.

[0024] Beneficial effects: The ion generator integrates the aforementioned separation device and ion emission source, forming a complete functional unit. The detachable connection facilitates quick replacement of the ion source type, reduces the risk of interface leakage, and improves ion transmission efficiency. Attached Figure Description

[0025] To more clearly illustrate the specific embodiments of this utility model or the technical solutions in the prior art, the drawings used in the description of the specific embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are some embodiments of this utility model. For those skilled in the art, other drawings can be obtained from these drawings without creative effort.

[0026] Figure 1 This is a schematic diagram of the ion energy control device of this utility model;

[0027] Figure 2 This is a top view of the ion energy control device of this utility model.

[0028] Explanation of reference numerals in the attached figures:

[0029] 1. Electrode plate; 2. Baffle; 3. Exclusion channel; 4. Support column; 5. Base plate; 6. Ion emission source. Detailed Implementation

[0030] To make the objectives, technical solutions, and advantages of the embodiments of this utility model clearer, the technical solutions of the embodiments of this utility model will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this utility model, not all embodiments. Based on the embodiments of this utility model, all other embodiments obtained by those skilled in the art without creative effort are within the protection scope of this utility model.

[0031] In the description of this utility model, it should be noted that the terms "center," "upper," "lower," "left," "right," "vertical," "horizontal," "inner," and "outer," etc., indicating the orientation or positional relationship, are based on the orientation or positional relationship shown in the accompanying drawings and are only for the convenience of describing this utility model and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of this utility model. Furthermore, the terms "first," "second," and "third" are used for descriptive purposes only and should not be construed as indicating or implying relative importance.

[0032] In the description of this utility model, it should be noted that, unless otherwise explicitly specified and limited, the terms "installation," "connection," and "joining" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral connection; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; and they can refer to the internal connection of two components. Those skilled in the art can understand the specific meaning of the above terms in this utility model according to the specific circumstances.

[0033] Furthermore, the technical features involved in the different embodiments of this utility model described below can be combined with each other as long as they do not conflict with each other.

[0034] Ion source processing technology is a precision machining method based on high-energy ion beams. Its core lies in generating ions (such as plasma) by ionizing gases or solid materials, and then accelerating them into a directional ion beam under the influence of a strong electric (or magnetic) field. This technology can achieve various processing functions by precisely controlling the ion energy, beam density, and incident angle. This non-contact processing method avoids mechanical stress and is applicable to a variety of materials, including metals, semiconductors, and ceramics.

[0035] However, the ion source ionization process naturally generates the problem of mixing of ions with multiple charge states. Ions with different charge states obtain significantly different kinetic energies under the same accelerating voltage. High-energy ions may penetrate too deeply and damage the substrate lattice structure, while low-energy ions may cause etching stagnation due to insufficient energy, resulting in erosion of the surface morphology and seriously affecting the processing accuracy of the device.

[0036] The following is combined with Figures 1 to 2 The following describes embodiments of the present invention.

[0037] According to an embodiment of the present invention, an ion energy control device is provided, which is suitable for connection with an ion emission source 6. The ion emission source 6 is suitable for emitting target ions and impurity ions, wherein the impurity ions and the target ions carry opposite charges. The ion energy control device includes: an electrode plate 1, which has an electric field with the opposite charge type to that of the target ions, and is suitable for adsorbing target ions onto the surface of the electrode plate 1; and a base plate 5, which has an rejection channel 3, wherein the rejection channel 3 does not overlap with the projection of the electrode plate 1 along the direction of movement of the target ions.

[0038] Electrode plate 1 is made of conductive material, and a constant voltage opposite to the polarity of the target ion charge is applied to its surface. When the ion beam enters the separation region, the ions carrying the target charge are strongly attracted by the electrostatic field generated by electrode plate 1 and eventually deposited on the working surface of electrode plate 1. The electrode plate 1 can be made of conductive materials such as stainless steel, titanium alloy, or gold-plated copper plate, and its surface can be polished to enhance the ion adsorption effect.

[0039] A base plate 5 is disposed parallel to one side of the electrode plate 1, and rejection channels 3 are precisely machined on it. The spatial arrangement of these rejection channels 3 is specially designed so that their projection in the direction of target ion movement completely does not overlap with the projection area of ​​the electrode plate 1. This non-overlapping layout ensures that only impurity ions can reach the rejection channel 3 area, while the target ions are effectively intercepted on the surface of the electrode plate 1. The base plate 5 can be made of materials such as aluminum alloy, and its thickness is preferably 3-10 mm to ensure structural strength.

[0040] By setting up an electrode plate 1 with opposite electric fields and a base plate 5 with an rejection channel 3, efficient separation of target ions and impurity ions is achieved. The electrode plate 1 adsorbs the target ions, while the rejection channel 3 is located outside the projection of the electrode plate 1, ensuring that impurity ions are not adsorbed and are smoothly discharged. This improves the purity and efficiency of ion separation, making it particularly suitable for applications requiring high-purity ions. In addition, the non-overlapping projection arrangement avoids electric field interference, ensuring that impurity ions move along a preset path. The overall structure is simple, requiring no complex control system, thus reducing manufacturing costs and maintenance difficulty.

[0041] In some embodiments, an external suction component is adapted to be connected to the rejection channel 3 to draw impurity ions into the rejection channel 3. By introducing an external suction component connected to the rejection channel 3, the removal efficiency of impurity ions is further improved. The rejection channel 3 can also remove byproducts generated by ions and the electrode plate substrate. The negative pressure generated by the suction component actively draws impurity ions into the rejection channel 3, preventing them from being retained due to diffusion or residual electric field effects. This active suction method ensures the continuity and stability of the separation process. Furthermore, the suction force is adjustable to accommodate different concentrations of impurity ions, enhancing the applicability and flexibility of the device.

[0042] Specifically, the rejection channel 3 has a mesh structure. Designing the rejection channel 3 as a mesh structure increases the dispersion area of ​​impurity ions while maintaining the mechanical strength of the base plate 5. The mesh structure achieves uniform suction or natural diffusion through its porous distribution, avoiding ion backflow caused by localized airflow turbulence, and also reduces airflow resistance, thus reducing energy consumption when used in conjunction with external suction components.

[0043] The rejection channel 3 adopts a regular mesh array structure, and the mesh shape can be selected from geometric shapes such as circles, squares, or hexagons. The mesh diameter is preferably 0.1-2mm, and the open area ratio is controlled between 30% and 70%.

[0044] In some embodiments, combined with Figure 2 As shown, the base plate 5 and the electrode plate 1 are detachably connected. This detachable connection simplifies maintenance and cleaning procedures. The electrode plate 1 may experience performance degradation due to ion adsorption after prolonged use; it can be quickly disassembled and replaced or cleaned, reducing downtime.

[0045] The base plate 5 and the electrode plate 1 are connected via a quick-release mechanism, which can be a snap-fit, threaded, or magnetic connection. As a preferred option, a guide rail with locking screws is used, facilitating disassembly while ensuring stability during operation. A dedicated handle or disassembly groove is provided on the edge of the electrode plate 1 for easy maintenance by operators.

[0046] In some embodiments, the base plate 5 is electrically connected to the electrode plate 1. By electrically connecting the base plate and the electrode plate, the electric field is transmitted from the base plate to the electrode plate, ensuring the stability of the electric field distribution and further improving the safety and reliability of the device.

[0047] In some embodiments, combined with Figure 1As shown, baffle 2 is fixedly connected to the base plate 5, and baffle 2 surrounds the outer periphery of the rejection channel 3 and the electrode plate 1. The baffle 2, surrounding the rejection channel 3 and the electrode plate 1, forms a working chamber, reducing external airflow interference and ion escape. Baffle 2 can guide impurity ions to flow directionally towards the rejection channel 3, improving separation efficiency, while preventing environmental pollutants from entering the device. The fixed connection between baffle 2 and the base plate 5 enhances the overall structural rigidity. Furthermore, baffle 2 can integrate an observation window or sensor interface for real-time monitoring of the separation process.

[0048] In some embodiments, combined with Figure 1 As shown, both the base plate 5 and the electrode plate 1 are vertically arranged, and the impurity removal channel 3 is located at least below the electrode plate 1 along the direction of gravity. With the base plate 5 and electrode plate 1 vertically arranged and the impurity removal channel 3 located below the electrode plate 1 in the direction of gravity, gravity assists in the sedimentation and removal of impurity ions. When the ion source is horizontally aligned with the electrode plate 1, the impurity removal channel 3, located below, can naturally collect impurity ions, preventing their deposition on the surface of the electrode plate 1. If the impurity removal channel 3 surrounds the lower part of the electrode plate 1, it can also achieve multi-directional impurity removal, adapting to ion beams with different incident angles and improving the fault tolerance rate.

[0049] In some embodiments, combined with Figure 1 As shown, at least one support column 4 is arranged on the outer circumferential surface formed by the baffle 2. The two ends of the support column 4 are connected to the base plate 5 and the ion source emission device, respectively. The support column 4 connects the base plate 5 and the ion source emission device, achieving rigid fixation and precise alignment of the overall structure. The support column 4 can resist the mechanical vibration of the ion source, ensuring the relative position stability of the electrode plate 1 and the ion emission end, maintaining consistent separation performance. Its length is adjustable, facilitating the calibration of the ion beam incident angle. The distributed arrangement of multiple support columns 4 also distributes stress, extending the equipment's lifespan.

[0050] The working principle of this ion energy control device is based on the difference in charge characteristics between target ions and impurity ions. By applying an electric field with the opposite polarity to the target ions, the electrode plate 1 selectively adsorbs the target ions. Simultaneously, the spatial arrangement design of the rejection channels 3 allows impurity ions to be directionally discharged under gravity, airflow, or external suction. Employing a dual separation mechanism combining electrostatic adsorption and mechanical impurity removal, it achieves high separation efficiency and low energy consumption. Physical isolation is achieved through the non-overlapping design of the electrode plate projection and rejection channels, avoiding cross-contamination. The modular structure design combines rigid support with convenient maintenance, adaptable to various installation orientations such as vertical or horizontal, and can be equipped with a suction system or a mesh-type impurity removal structure according to actual needs, exhibiting excellent adaptability and expansion flexibility.

[0051] According to an embodiment of this utility model, another aspect provides an ion generating device, including the ion energy control device described above, and further including an ion emission source 6, the emitting end of the ion emission source 6 being detachably connected to the ion energy control device. The ion generating device integrates the aforementioned separation device and the ion emission source 6 to form a complete functional unit. The detachable connection facilitates quick replacement of the ion source type, reduces the risk of interface leakage, and improves ion transmission efficiency.

[0052] The device integrates the aforementioned ion energy control unit with the ion emission source 6. The emitting end of the ion emission source 6 is connected to the ion energy control unit, and the interface is equipped with a sealing ring and a quick-locking mechanism. As an expansion design, the system can integrate a power module, a control unit, and status monitoring sensors to form an intelligent ion generation and separation system.

[0053] Obviously, the above embodiments are merely examples for clear illustration and are not intended to limit the implementation. Although embodiments of the present invention have been described in conjunction with the accompanying drawings, those skilled in the art can make various modifications and variations without departing from the spirit and scope of the present invention, and all such modifications and variations fall within the scope defined by the present invention.

Claims

1. An ion energy control device, suitable for connection with an ion emission source (6), the ion emission source (6) being suitable for emitting target ions and impurity ions, the impurity ions and the target ions carrying opposite charges; characterized in that, The ion energy control device includes: Electrode plate (1), the electrode plate (1) having an electric field opposite to the charge type of the target ion, suitable for adsorbing the target ion to the surface of the electrode plate (1); The base plate (5) has an anti-rejection channel (3) which does not overlap with the projection of the electrode plate (1) along the direction of movement of the target ion.

2. The ion energy control device according to claim 1, characterized in that, Also includes: An external suction component is adapted to be connected to the rejection channel (3) to draw the impurity ions into the rejection channel (3).

3. The ion energy control device according to claim 1, characterized in that, The rejection channel (3) has a mesh structure.

4. The ion energy control device according to claim 1, characterized in that, The base plate (5) is detachably connected to the electrode plate (1).

5. The ion energy control device according to claim 1, characterized in that, The base plate (5) is electrically connected to the electrode plate (1).

6. The ion energy control device according to claim 1, characterized in that, Also includes: Baffle (2) is fixedly connected to the base plate (5) and surrounds the outer periphery of the rejection channel (3) and the electrode plate (1).

7. The ion energy control device according to claim 1, characterized in that, The base plate (5) and the electrode plate (1) are both arranged in a vertical state, and the rejection channel (3) is arranged at least below the electrode plate (1) along the direction of gravity.

8. The ion energy control device according to claim 7, characterized in that, The rejection channel (3) is arranged around the outer periphery of the electrode plate (1).

9. The ion energy control device according to claim 6, characterized in that, At least one support column (4) is provided on the outer periphery formed by the baffle (2), and the two ends of the support column (4) are respectively connected to the bottom plate (5) and the ion source emission device.

10. An ion generating device, characterized in that, The ion energy control device as described in any one of claims 1 to 9 further includes: an ion emission source (6), wherein the emitting end of the ion emission source (6) is detachably connected to the ion energy control device.

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