A four-axis equalization table

Abstract

The utility model relates to wafer technical field, concretely relates to a four -axis equal platform, include: horizontal adjustment mechanism, horizontal adjustment mechanism includes at least one guide mechanism and at least one support part, and guide mechanism and support part are at least partially superposed in thickness direction, so that the overall thickness of horizontal adjustment mechanism is less than the sum of the thickness of support part and the height of guide mechanism, longitudinal adjustment mechanism is established in horizontal adjustment mechanism, is used for realizing lifting motion, angle adjustment mechanism is established in longitudinal adjustment mechanism inside, is used to carry the equipment above and carries out angle adjustment to it, in the utility model, through the alternate lamination of support part and guide mechanism, and utilize support part recessed space to contain guide mechanism completely, realize thickness direction completely overlap, far less than the accumulation of traditional support part thickness and guide mechanism thickness, save vertical space significantly.

Description

Technical Field

[0001] This utility model relates to the field of wafer technology, and in particular to a four-axis peering stage. Background Technology

[0002] In many high-precision industrial production processes such as semiconductor manufacturing and precision optical processing, the wafer, as a core component, plays a decisive role in product quality due to the accuracy of its position.

[0003] As semiconductor manufacturing technology advances towards higher integration and smaller dimensions, the requirements for miniaturization and integration of production equipment are becoming increasingly stringent. In many advanced semiconductor processing equipment and precision optical instruments, the space available for wafer positioning is extremely limited. This necessitates that wafer positioning platforms not only possess multi-directional, high-precision adjustment capabilities but also achieve a compact and rational layout within a limited space, ensuring no interference between components while guaranteeing the stability and reliability of the platform during operation.

[0004] DD motors, with their advantages of high precision, high torque, and high response speed, are widely used in wafer positioning. Some existing wafer positioning platforms place the XY-axis drive units above the DD motor (typically used for the θ-axis rotation), forming a stacked structure. While this structure achieves multi-axis positioning to some extent, during actual operation, the movement of the XY-axis drive units generates vibrations and inertial forces, which are transmitted to the DD motor below. The DD motor itself also vibrates during high-speed rotation. When the vibration frequencies of the XY-axis movement and the DD motor rotation are close to or multiples of each other, resonance occurs. Resonance exacerbates the vibration of the wafer positioning platform, severely affecting the wafer's positioning accuracy and stability.

[0005] Therefore, this application develops a four-axis equalization stage to solve the problems existing in the prior art. Utility Model Content

[0006] The purpose of this invention is to provide a four-axis equalization platform to solve the problem of insufficient stability of existing four-axis platforms.

[0007] The technical solution of this utility model is: a four-axis paralleling stage, comprising: A horizontal adjustment mechanism, comprising at least one guide mechanism and at least one support portion, wherein the guide mechanism and the support portion are at least partially overlapped in the thickness direction, such that the overall thickness of the horizontal adjustment mechanism is less than the sum of the thickness of the support portion and the height of the guide mechanism; A longitudinal adjustment mechanism, located above the horizontal adjustment mechanism, is used to realize lifting and lowering movements; An angle adjustment mechanism is located inside the longitudinal adjustment mechanism to support the upper equipment and adjust its angle.

[0008] Preferably, a recessed space is formed on the support portion, and the guide mechanism is configured to be completely accommodated within the recessed space, that is, the guide mechanism and the support portion are overlapped in the thickness direction to reduce the overall thickness of the horizontal adjustment mechanism.

[0009] Preferably, there are two guide mechanisms and two support parts. The two support parts and the two guide mechanisms are arranged alternately in the thickness direction, and the extension directions of the two guide mechanisms are perpendicular to each other. The upper support part is slidably disposed on the lower guide mechanism, and a sliding gap is defined between the upper support part and the lower support part.

[0010] Preferably, the longitudinal adjustment mechanism has two symmetrical installation areas along the first direction, and each installation area is provided with a drive mechanism. The drive mechanism is arranged adjacent to the angle adjustment mechanism and is used to drive the longitudinal adjustment mechanism and the angle adjustment mechanism to perform lifting and lowering movements together.

[0011] Preferably, cylinders are provided on both sides of the longitudinal adjustment mechanism in the second direction. The cylinders are used to balance gravity and are equipped with clamps. When the air supply is interrupted, the clamps lock in position to prevent the longitudinal adjustment mechanism from falling.

[0012] Preferably, a pair of support seats are symmetrically arranged along the second direction, and guide rails are provided on the sides of the two support seats adjacent to the longitudinal adjustment mechanism, and the longitudinal adjustment mechanism slides in cooperation with the guide rails.

[0013] Compared with the prior art, the advantages of this utility model are: (1) By alternating the stacking of the support part and the guide mechanism, and by utilizing the recessed space of the support part to fully accommodate the guide mechanism, the thickness direction is completely overlapped, which is much smaller than the sum of the thickness of the traditional support part and the thickness of the guide mechanism, thus significantly saving vertical space. (2) Two voice coil motor drive mechanisms are symmetrically arranged in the first direction, and the adjacent angle adjustment mechanism is arranged to reduce the overall space occupation; (3) The cylinder supports the longitudinal adjustment mechanism through telescopic movement to balance gravity. When the air supply is interrupted, the clamp automatically locks to prevent the equipment from falling and ensure safety. Attached Figure Description

[0014] The present invention will be further described below with reference to the accompanying drawings and embodiments: Figure 1 This is an exploded view of a four-axis equalization table according to the present invention; Figure 2 This is an exploded view of the horizontal adjustment mechanism described in this utility model; Figure 3 This is a side sectional view of a four-axis equivalence platform according to the present invention; Figure 4 This is a perspective view of a four-axis equivalence platform according to the present invention.

[0015] The components include: 1. Horizontal adjustment mechanism; 11. Guide mechanism; 12. Support part; 121. Recessed space; 2. Longitudinal adjustment mechanism; 21. Installation area; 3. Angle adjustment mechanism; 4. Drive mechanism; 5. Cylinder; 6. Support base; 7. Guide rail. Detailed Implementation

[0016] The present invention will be further described in detail below with reference to specific embodiments: like Figures 1-4 As shown, a four-axis alignment stage includes a horizontal adjustment mechanism 1, a longitudinal adjustment mechanism 2, and an angle adjustment mechanism 3. The horizontal adjustment mechanism 1 comprises two guide mechanisms 11 and two support parts 12. The two support parts 12 and the two guide mechanisms 11 are arranged in an alternating, stacked manner along the thickness direction; that is, one support part 12 is placed at the bottom, one guide mechanism 11 is placed on top of it, then another support part 12 is placed, and finally another guide mechanism 11 is placed on top. The extension directions of the two guide mechanisms 11 are perpendicular to each other, enabling the horizontal adjustment mechanism 1 to achieve independent adjustment in two mutually perpendicular horizontal directions. In this embodiment, the guide mechanism 11 and the support part 12 are arranged in a stacked manner in the thickness direction, which significantly reduces the overall thickness of the horizontal adjustment mechanism 1, which is less than the sum of the thickness of the support part 12 and the height of the guide mechanism 11. This effectively saves space occupied by the equipment in the vertical direction and adapts to movement in a limited space. The longitudinal adjustment mechanism 2 is set on the horizontal adjustment mechanism 1 to realize the lifting and lowering movement of the equipment. The angle adjustment mechanism 3 is built into the longitudinal adjustment mechanism 2, which supports the equipment above and adjusts its angle, thereby realizing four-axis adjustment in two horizontal directions, longitudinal direction and angle.

[0017] Specifically, such as Figure 1As shown, a recessed space 121 is formed on the support portion 12, and the guide mechanism 11 is configured to be completely accommodated within the recessed space 121 of the support portion 12, achieving complete overlap between the guide mechanism 11 and the support portion 12 in the thickness direction. In conventional structures, the guide mechanism 11 and the support portion 12 are sequentially added together in the thickness direction, resulting in the overall thickness of the horizontal adjustment mechanism 1 being the sum of the thickness of the support portion 12 and the height of the guide mechanism 11. However, the design in this application significantly reduces the overall thickness of the horizontal adjustment mechanism 1, depending only on the maximum thickness of the support portion 12, providing a basis for the installation of wafer processing equipment in a limited space.

[0018] In this embodiment, as Figures 2-3 As shown, the upper support part 12 is slidably disposed on the lower guide mechanism 11, and a sliding gap is defined between the upper support part 12 and the lower support part 12. This sliding gap avoids interference between the two support parts 12 during the sliding process, and does not excessively increase the overall thickness of the horizontal adjustment mechanism 1. In addition, the cooperation between the two guide mechanisms 11 with mutually perpendicular extension directions and the support part 12 in the horizontal adjustment mechanism 1 realizes the independent and precise adjustment of the equipment in two mutually perpendicular horizontal directions. Combined with the lifting movement of the vertical adjustment mechanism 2 and the multi-degree-of-freedom rotation of the angle adjustment mechanism 3, the motion requirements in the wafer processing process are met.

[0019] Furthermore, the longitudinal adjustment mechanism 2 has two symmetrical mounting areas 21 in the first direction, each equipped with a drive mechanism 4, and both drive mechanisms 4 are arranged adjacent to the angle adjustment mechanism 3. Specifically, the drive mechanisms 4 are voice coil motors, and during operation, the two drive mechanisms 4 operate synchronously, jointly driving the longitudinal adjustment mechanism 2 and the angle adjustment mechanism 3 to perform lifting and lowering movements. In this way, the overall space occupied by the four-axis alignment table can be effectively reduced in the first direction.

[0020] In addition, cylinders 5 are installed on both sides of the longitudinal adjustment mechanism 2 in the second direction to balance gravity during lifting and lowering. The cylinders 5 used are low-friction cylinders. During operation, the cylinders 5 support the longitudinal adjustment mechanism 2 through their extension and retraction, ensuring smooth lifting and lowering. Specifically, when the air supply is interrupted, the clamp will automatically lock in its current position, effectively preventing the longitudinal adjustment mechanism 2 from suddenly falling due to loss of air support, thus avoiding equipment damage and production safety accidents that may be caused by accidental air supply interruption.

[0021] Furthermore, a pair of support seats 6 are symmetrically arranged in the second direction of the longitudinal adjustment mechanism 2, and a guide rail 7 is installed between the support seats 6 and the longitudinal adjustment mechanism 2. In this embodiment, the selected guide rail 7 is a cross roller guide rail 7. During the movement of the longitudinal adjustment mechanism 2, the characteristic that its inner rollers are arranged at a 90° cross angle in the V-shaped raceway is utilized to avoid swaying or vibration caused by unilateral force, effectively reduce the vibration phenomenon caused by mechanical movement, and can significantly reduce the deviation that may occur during the movement.

[0022] The above embodiments are only for illustrating the technical concept and features of this utility model, and are intended to enable those skilled in the art to understand the content of this utility model and implement it accordingly. They should not be construed as limiting the scope of protection of this utility model. It is obvious to those skilled in the art that this utility model is not limited to the details of the above exemplary embodiments, and that it can be implemented in other specific forms without departing from the spirit or basic characteristics of this utility model. Therefore, the embodiments should be considered exemplary and non-limiting in all respects. The scope of this utility model is defined by the appended claims rather than the foregoing description, and therefore, all changes falling within the meaning and scope of the equivalents of the claims are intended to be included within this utility model.

Claims

1. A four-axis peering stage, characterized in that, include: A horizontal adjustment mechanism (1) includes at least one guide mechanism (11) and at least one support part (12), wherein the guide mechanism (11) and the support part (12) are at least partially overlapped in the thickness direction, such that the overall thickness of the horizontal adjustment mechanism (1) is less than the sum of the thickness of the support part (12) and the height of the guide mechanism (11); A longitudinal adjustment mechanism (2) is provided above the horizontal adjustment mechanism (1) and is used to realize lifting and lowering movements; An angle adjustment mechanism (3) is located inside the longitudinal adjustment mechanism (2) to support the upper equipment and adjust its angle.

2. A four-axis peering stage according to claim 1, characterized in that: A recessed space (121) is formed on the support part (12), and the guide mechanism (11) is configured to be completely contained in the recessed space (121), that is, the guide mechanism (11) and the support part (12) are overlapped in the thickness direction to reduce the overall thickness of the horizontal adjustment mechanism (1).

3. A four-axis peering stage according to claim 2, characterized in that: The number of the guide mechanism (11) and the support part (12) are both two. The two support parts (12) and the two guide mechanisms (11) are arranged alternately in the thickness direction, and the extension directions of the two guide mechanisms (11) are perpendicular to each other. The upper support part (12) is slidably disposed on the lower guide mechanism (11), and a sliding gap is defined between the upper support part (12) and the lower support part (12).

4. A four-axis peering stage according to claim 1, characterized in that: The longitudinal adjustment mechanism (2) has two installation areas (21) symmetrically arranged along the first direction. Each installation area (21) is provided with a drive mechanism (4). The drive mechanism (4) is arranged adjacent to the angle adjustment mechanism (3) and is used to drive the longitudinal adjustment mechanism (2) and the angle adjustment mechanism (3) to perform lifting and lowering movements together.

5. A four-axis peering stage according to claim 1, characterized in that: A cylinder (5) is provided on both sides of the longitudinal adjustment mechanism (2) in the second direction. The cylinder (5) is used to balance the gravity and is equipped with a clamp. When the air source is interrupted, the clamp locks in position to prevent the longitudinal adjustment mechanism (2) from falling.

6. A four-axis peering stage according to claim 5, characterized in that: A pair of support seats (6) are symmetrically arranged along the second direction. Guide rails (7) are provided on the side of each support seat (6) adjacent to the longitudinal adjustment mechanism (2). The longitudinal adjustment mechanism (2) and the guide rails (7) are in sliding cooperation.

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