A photoresist showerhead cleaning apparatus

Abstract

The utility model discloses a photoresist spray head cleaning device, including cleaning bucket, cleaning bucket is used to accommodate cleaning liquid, and the inner chamber of cleaning bucket is provided with the bearing, and the bearing is used for bearing the photoresist spray head needed to be cleaned, base, base fixed connection is in the bottom of cleaning bucket, and the base is used for supporting cleaning bucket, and the inner chamber of base is provided with the drive element for rotating the bearing, and the drive element drives the photoresist spray head to rotate around the own axis in cleaning liquid, and let its surface each part can contact cleaning liquid, the utility model discloses through the cooperation of cleaning bucket, base, gas conveying part and circulating pump part, and the drive element drives the spray head rotation to ensure that surface each part evenly contacts cleaning liquid, can remove the crystalline particle everywhere comprehensively, simultaneously, the bubble of gas conveying part can effectively strip the crystalline particle of adhering, and circulating pump part makes cleaning liquid circulation flow, and promptly takes away the particle of falling, avoids its residual or reattachment.

Description

Technical Field

[0001] This utility model relates to the technical field of photoresist nozzle cleaning devices, specifically a photoresist nozzle cleaning device. Background Technology

[0002] In integrated circuit manufacturing, various physical components such as transistors, diodes, capacitors, resistors, and metal layers are formed on or within the surface of a wafer. These components are then processed through a photolithography process, ultimately leaving a feature pattern on the wafer. The goal of photolithography is to generate precisely sized feature patterns according to the circuit design requirements, ensuring they are correctly positioned on the wafer surface and correctly associated with other components.

[0003] For example, Chinese patent CN216965605U discloses a photoresist nozzle cleaning device, which describes the following technical problem: During the photoresist spraying process, the photoresist nozzle is in the spray environment formed by the photoresist for a long time, and a large number of crystal particles will form around it. If these crystal particles are not removed in time, they may fall onto the wafers to be sprayed with photoresist, which may cause photoresist deformation or even wafer scratches.

[0004] As evidenced by the technical problems described in the aforementioned utility model patent, during the photoresist spraying process, the existing photoresist nozzle is in the photoresist spray environment for a long time, and a large number of crystalline particles will form around it. If these crystalline particles are not removed in time, they may fall onto the wafers to be sprayed with photoresist, causing photoresist deformation at best and wafer scratches at worst. Utility Model Content

[0005] The purpose of this invention is to provide a photoresist nozzle cleaning device to solve the problems mentioned in the background art.

[0006] To achieve the above objectives, this utility model provides the following technical solution: A photoresist nozzle cleaning device includes a cleaning tank for containing cleaning fluid, an inner cavity of which is provided with a support member for supporting the photoresist nozzle to be cleaned; a base fixedly connected to the bottom of the cleaning tank for supporting the cleaning tank, the inner cavity of which is provided with a drive member for rotating the support member, the drive member driving the photoresist nozzle to rotate around its own axis in the cleaning fluid, so that all parts of its surface can contact the cleaning fluid; a gas supply member disposed in the inner cavity of the cleaning tank for supplying gas into the cleaning fluid in the cleaning tank to generate bubbles to peel off impurities on the surface of the photoresist nozzle; and a circulation pumping member disposed on one side of the cleaning tank for pumping the cleaning fluid from the lower part of the cleaning tank to the upper part of the cleaning tank.

[0007] As a preferred technical solution, the carrier includes a positioning rod rotatably connected inside the cleaning tank and fitted onto the photoresist nozzle. A support ring is fixedly fitted onto the lower surface of the positioning rod, and a threaded groove is provided on the top of the positioning rod. A hand-tightening bolt is threadedly connected to the inner cavity of the threaded groove, and a buffer is fitted onto the neck of the hand-tightening bolt.

[0008] As a preferred technical solution, the buffer includes a pressure pad that is rotatably sleeved on the neck of the hand-tightening bolt, and the bottom of the pressure pad is pressed against the top of the photoresist nozzle.

[0009] As a preferred technical solution, the driving component includes a cavity disposed inside the base, a servo motor is installed inside the cavity, the output shaft of the servo motor is keyed to a transmission rod, a waterproof bearing is sleeved on the surface of the transmission rod, the waterproof bearing is embedded in the bottom of the cleaning tub, and the top of the transmission rod extends upward through the cleaning tub and is fixedly connected to the bottom of the positioning rod.

[0010] As a preferred technical solution, the air supply component includes a hollow ring disposed in the lower inner cavity of the cleaning tank, and the inner wall of the hollow ring is uniformly connected with a number of sets of air jet pipes, the ends of the sets of air jet pipes being inclined downwards.

[0011] As a preferred technical solution, one side of the hollow ring is connected to an air inlet pipe, one end of the air inlet pipe extends to the outside of the cleaning tank, the middle of the air inlet pipe has a solenoid valve, and a flow sensor is provided on the surface of the air inlet pipe at the input end of the solenoid valve.

[0012] As a preferred technical solution, the circulating pump component includes a housing embedded in the upper part of one side of the cleaning tub, a circulating pump is provided inside the housing, the input end of the circulating pump is connected to a suction pipe, the suction end of the suction pipe is bent downward and connected to the lower inner cavity of the cleaning tub, the output end of the circulating pump is connected to a connecting pipe, and the output end of the connecting pipe extends into the cleaning tub.

[0013] As a preferred technical solution, an arc-shaped guide pipe is fixedly connected to the inner wall of one side of the cleaning tank, and the output end of the connecting pipe is connected to the inner cavity of the arc-shaped guide pipe.

[0014] As a preferred technical solution, the bottom of the cleaning tub is connected to a drain pipe, one end of which is bent to one side and extends to the outside of the base, and the end of the drain pipe located on the outside of the base is connected to a valve.

[0015] As a preferred technical solution, an operation screen is installed on the front side of the base. The servo motor, the circulating pump, and the solenoid valve are all controlled by the operation screen. The output end of the flow sensor is electrically connected to the signal input end of the operation screen through a wire.

[0016] Compared with the prior art, the beneficial effects of this utility model are: 1. This utility model uses the cooperation of a cleaning tank, base, air supply component and circulation pump component. The drive component drives the nozzle to rotate to ensure that all parts of the surface are evenly contacted with the cleaning liquid, which can thoroughly remove crystal particles from all places. At the same time, the air bubbles generated by the air supply component can effectively peel off the attached crystal particles, and the circulation pump component makes the cleaning liquid circulate and carry away the detached particles in time to avoid their residue or re-attachment.

[0017] 2. This utility model can achieve stable support and fixation of the photoresist nozzle by setting up a bearing component. The positioning rod is used for the nozzle to be sleeved, the support ring provides bottom support, and the hand-tightened bolt with threaded groove can press the top of the nozzle through the buffer component to ensure that the nozzle does not shake during the cleaning process. At the same time, the structure is simple and facilitates the quick loading and unloading of the nozzle.

[0018] 3. This utility model incorporates a solenoid valve and a flow sensor on the air inlet pipe. The solenoid valve controls the gas flow, while the flow sensor monitors the gas flow in real time and feeds the signal back to the control panel. This allows operators to monitor the gas supply and make adjustments in real time, ensuring the stability of bubble generation and improving the controllability and stability of the cleaning process. Attached Figure Description

[0019] Figure 1 This is a three-dimensional structural schematic diagram of the photoresist nozzle cleaning device of this utility model; Figure 2 This is a two-dimensional structural schematic diagram of the present invention; Figure 3 This is a cross-sectional structural diagram of the base of this utility model; Figure 4 This is a cross-sectional view of the cleaning bucket of this utility model; Figure 5 This is a schematic diagram of the hollow ring structure of this utility model.

[0020] In the picture: 100. Base; 101. Cleaning tub; 102. Tub lid; 103. Housing; 104. Cavity; 105. Servo motor; 106. Waterproof bearing; 107. Transmission rod; 108. Support ring; 109. Positioning rod; 110. Hand-tightening bolt; 111. Pressure pad; 112. Threaded groove; 200. Valve; 201. Drain pipe; 300. Intake pipe; 301. Hollow ring; 302. Jet pipe; 303. Flow sensor; 304. Solenoid valve; 400. Operation screen; 500, Circulating pump; 501, Connecting pipe; 502, Arc-shaped guide pipe; 503, Suction pipe. Detailed Implementation

[0021] The technical solutions of the present utility model will be clearly and completely described below with reference to the accompanying drawings of the embodiments. Obviously, the described embodiments are only some embodiments of the present utility model, and not all embodiments. Based on the embodiments of the present utility model, all other embodiments obtained by those of ordinary skill in the art without creative effort are within the protection scope of the present utility model.

[0022] Please see Figure 1-5 This embodiment provides a photoresist nozzle cleaning device, including a cleaning tank 101 for containing cleaning fluid, a support member for supporting the photoresist nozzle to be cleaned, a base 100 fixedly connected to the bottom of the cleaning tank 101 for supporting the cleaning tank 101, and a drive member for rotating the support member within the base 100. The drive member drives the photoresist nozzle to rotate around its own axis in the cleaning fluid, ensuring that all parts of its surface can contact the cleaning fluid. An air supply member is disposed within the cleaning tank 101 for supplying air to the cleaning tank 101. The cleaning fluid in tank 101 generates air bubbles to peel off impurities from the surface of the photoresist nozzle. A circulating conveyor is located on one side of the cleaning tank 101. The circulating conveyor pumps the cleaning fluid from the bottom of the cleaning tank 101 to the top of the cleaning tank 101. Through the cooperation of the cleaning tank 101, the base 100, the air conveyor, and the circulating conveyor, the drive unit drives the nozzle to rotate, ensuring that all parts of the surface are evenly contacted with the cleaning fluid, which can thoroughly remove crystal particles from all places. At the same time, the air bubbles generated by the air conveyor can effectively peel off the attached crystal particles. The circulating conveyor makes the cleaning fluid circulate, promptly carrying away the detached particles and preventing them from remaining or re-attaching.

[0023] The opening of the cleaning tank 101 is provided with a lid 102, which is used to prevent the cleaning liquid from overflowing from the cleaning tank 101.

[0024] The support component includes a positioning rod 109 rotatably connected inside the cleaning tank 101 and used to mount the photoresist nozzle. A support ring 108 is fixedly mounted on the lower surface of the positioning rod 109, and a threaded groove 112 is provided on the top of the positioning rod 109. A hand-tightening bolt 110 is threadedly connected to the inner cavity of the threaded groove 112. A buffer is mounted on the neck of the hand-tightening bolt 110. Through the setting of the support component, the photoresist nozzle can be stably supported and fixed. The positioning rod 109 is used to mount the nozzle, the support ring 108 provides bottom support, and the hand-tightening bolt 110, together with the threaded groove 112, can press the top of the nozzle through the buffer to ensure that the nozzle does not shake during the cleaning process. At the same time, the structure is simple and facilitates the quick loading and unloading of the nozzle.

[0025] The buffer includes a pressure pad 111 that is rotatably sleeved on the neck of the hand-tightening bolt 110. The bottom of the pressure pad 111 is pressed against the top of the photoresist nozzle. By setting up the buffer, the pressure pad 111, which is rotatably sleeved on the neck of the hand-tightening bolt 110 and pressed against the top of the nozzle, can not only prevent the hand-tightening bolt 110 from directly tightening and causing damage to the nozzle through the buffering effect of the pressure pad 111, but also ensure the clamping effect on the nozzle, thereby improving the reliability of the nozzle fixation and the protection of the nozzle.

[0026] The driving component includes a cavity 104 located inside the base 100. A servo motor 105 is installed inside the cavity 104. The output shaft of the servo motor 105 is keyed to a transmission rod 107. A waterproof bearing 106 is fitted onto the surface of the transmission rod 107 and is embedded in the bottom of the cleaning tank 101. The top of the transmission rod 107 extends upward through the cleaning tank 101 and is fixedly connected to the bottom of the positioning rod 109. Through the servo motor 105, stable power is provided, and the transmission rod 107 transmits power. The waterproof bearing 106 effectively prevents cleaning fluid from leaking from the bottom of the cleaning tank 101 into the cavity 104 of the base 100, ensuring the sealing and service life of the equipment. At the same time, it ensures that the nozzle can rotate stably around its own axis, improving the uniformity of cleaning.

[0027] The air supply component includes a hollow ring 301 disposed in the lower inner cavity of the cleaning tank 101. Several sets of jet pipes 302 are evenly connected to the inner wall of the hollow ring 301. The ends of the jet pipes 302 are inclined downwards. By setting the air supply component, the hollow ring 301 disposed in the lower inner cavity of the cleaning tank 101 and the evenly connected jet pipes 302, with the ends of the jet pipes 302 inclined downwards, can allow gas to be evenly distributed to each jet pipe 302 through the hollow ring 301. Then, the jet pipes 302 evenly supply gas to the cleaning liquid to generate bubbles. The bubbles can more fully contact the nozzle surface, enhancing the removal effect of impurities on the nozzle surface.

[0028] One side of the hollow ring 301 is connected to an air inlet pipe 300, one end of which extends to the outside of the cleaning tank 101. The middle of the air inlet pipe 300 has a solenoid valve 304. A flow sensor 303 is installed on the surface of the air inlet pipe 300 and at the input end of the solenoid valve 304. With the solenoid valve 304 installed on the air inlet pipe 300, the solenoid valve 304 can control the gas flow, and the flow sensor 303 can monitor the gas flow in real time and feed the signal back to the operation panel 400. This allows the operator to monitor the gas supply in real time and make adjustments, ensuring the stability of bubble generation and improving the controllability and stability of the cleaning process.

[0029] The circulating conveying component includes a housing 103 embedded in the upper part of one side of the cleaning tank 101. A circulating pump 500 is installed inside the housing 103. The input end of the circulating pump 500 is connected to a suction pipe 503. The suction end of the suction pipe 503 is bent downward and connected to the lower inner cavity of the cleaning tank 101. The output end of the circulating pump 500 is connected to a connecting pipe 501. The output end of the connecting pipe 501 extends into the cleaning tank 101. Through the arrangement of the circulating pump 500, the cooperation of the circulating pump 500, the suction pipe 503, and the connecting pipe 501, the cleaning liquid in the lower part of the cleaning tank 101 can be pumped to the upper part, forming a circulating flow of the cleaning liquid. This can transport the cleaning liquid that may contain impurities in the lower part to the upper part, further rinsing the surface of the nozzle through the flow, while maintaining a uniform concentration of the cleaning liquid and improving the overall cleaning effect.

[0030] Among them, an arc-shaped guide pipe 502 is fixedly connected to the inner wall of the middle part of one side of the cleaning tank 101. The output end of the connecting pipe 501 is connected to the inner cavity of the arc-shaped guide pipe 502. Through the setting of the arc-shaped guide pipe 502, the inner wall of the cleaning tank 101 is provided with an arc-shaped guide pipe 502, and the connecting pipe 501 is connected to the arc-shaped guide pipe 502. This allows the cleaning fluid conveyed by the circulating conveyor to flow back evenly along the inner wall of the cleaning tank 101 through the arc-shaped guide pipe 502, forming a vortex in the tank. This enhances the scouring force of the cleaning fluid on the nozzle surface and improves the cleaning efficiency.

[0031] The bottom of the cleaning tank 101 is connected to a drain pipe 201. One end of the drain pipe 201 is bent to one side and extends to the outside of the base 100. The end of the drain pipe 201 located on the outside of the base 100 is connected to a valve 200. With the drain pipe 201 and valve 200 set at the bottom of the cleaning tank 101, it is convenient to quickly discharge the cleaning liquid after cleaning. The operation is simple and convenient, and the cleaning convenience after the equipment is used is improved.

[0032] The base 100 has an operation panel 400 mounted on its front side. The servo motor 105, circulation pump 500, and solenoid valve 304 are all controlled by the operation panel 400. The output of the flow sensor 303 is electrically connected to the signal input of the operation panel 400 via a wire. Through the settings of the operation panel 400, the operation panel 400 centrally controls the servo motor 105, circulation pump 500, and solenoid valve 304, and receives feedback signals from the flow sensor 303. This realizes the coordinated work and automated control of various components of the equipment. At the same time, the operator can conveniently control the cleaning process through the operation panel 400 and monitor parameters such as gas flow rate in real time, which improves the convenience of operation and the reliability of the cleaning process.

[0033] The operation panel 400 integrates a microcontroller of model STC89C51. The signal input terminals of the servo motor 105, the circulating pump 500, and the solenoid valve 304 are all electrically connected to the signal output terminal of the microcontroller via wires. The signal output terminal of the flow sensor 303 is electrically connected to the signal input terminal of the microcontroller via wires.

[0034] The flow sensor 303 can be one of the following models: Sensirion SFM3000 series, Festo SFAH series, Honeywell AWM700 series, etc.

[0035] Working principle; First, place the nozzle onto the positioning rod 109 so that its bottom is supported on the support ring 108. Then, rotate the hand-tightening bolt 110 to press and fix the top of the nozzle through the pressure pad 111 at its neck, ensuring that the nozzle is stable and does not shake during the cleaning process. Pour an appropriate amount of cleaning solution into the cleaning tank 101 until the liquid level can completely submerge the photoresist nozzle; Furthermore, the device is started via the operation screen 400 on the front of the base 100; The servo motor 105 inside the cavity 104 of the base 100 drives the positioning rod 109 to rotate through the transmission rod 107, which in turn drives the photoresist nozzle to rotate around its own axis, so that all parts of the nozzle surface can be evenly contacted with the cleaning liquid, avoiding cleaning dead corners. At the same time, the air supply component starts to work. The control panel 400 controls the solenoid valve 304 on the air inlet pipe 300 to open. The external air source supplies air to the hollow ring 301 at the bottom of the cleaning tank 101 through the air inlet pipe 300. The gas is injected into the cleaning liquid through the jet pipe 302 that is evenly distributed on the inner wall of the hollow ring 301, generating a large number of bubbles. During the rising process, the bubbles come into contact with the surface of the rotating nozzle. The impact force and disturbance of the bubble bursting remove the impurities attached to the surface of the nozzle. During this process, the flow sensor 303 on the intake pipe 300 monitors the gas flow in real time and feeds the signal back to the operation panel 400 to ensure stable gas supply; The circulating pump 500 inside the housing 103 draws the cleaning fluid from the lower part of the cleaning tank 101 through the suction pipe 503, and delivers it through the connecting pipe 501 to the arc-shaped guide pipe 502 in the middle of one side of the cleaning tank 101. Then, the fluid flows back evenly into the tank along the inner wall of the cleaning tank 101 through the arc-shaped guide pipe 502, and a swirling flow is generated inside the tank, so that the cleaning fluid forms a continuous flow. On the one hand, the cleaning fluid that may contain impurities in the lower part is delivered to the upper part, and the flow further washes the surface of the nozzle; on the other hand, the concentration of the cleaning fluid is kept uniform, improving the overall cleaning effect. After cleaning is completed, stop the servo motor 105, circulation pump 500 and solenoid valve 304 through the operation panel 400. After the nozzle stops rotating and the bubbles dissipate, open the valve 200 on the drain pipe 201 at the bottom of the cleaning tank 101 to drain the used cleaning solution. Finally, rotate the hand-tightening bolt 110 in the opposite direction to remove the pressure pad 111, and then remove the cleaned photoresist nozzle from the positioning rod 109.

[0036] Although embodiments of the present invention have been shown and described, it will be understood by those skilled in the art that various changes, modifications, substitutions and alterations can be made to these embodiments without departing from the principles and spirit of the present invention, the scope of which is defined by the appended claims and their equivalents.

Claims

1. A photoresist nozzle cleaning device, characterized in that, include A cleaning tank (101) is used to contain cleaning fluid. The inner cavity of the cleaning tank (101) is provided with a support member, which is used to support the photoresist nozzle to be cleaned. The base (100) is fixedly connected to the bottom of the cleaning tank (101). The base (100) is used to support the cleaning tank (101). The inner cavity of the base (100) is provided with a drive for rotating the bearing component. The drive drives the photoresist nozzle to rotate around its own axis in the cleaning solution, so that all parts of its surface can contact the cleaning solution. An air supply component is disposed in the inner cavity of the cleaning tank (101). The air supply component is used to supply air into the cleaning liquid in the cleaning tank (101) to generate bubbles to peel off impurities on the surface of the photoresist nozzle. A circulating pump (500) is provided on one side of the cleaning tank (101). The circulating pump (500) is used to pump the cleaning liquid from the lower part of the cleaning tank (101) to the upper part of the cleaning tank (101).

2. The photoresist nozzle cleaning device according to claim 1, characterized in that: The support includes a positioning rod (109) rotatably connected inside the cleaning tank (101) and fitted with a photoresist nozzle. A support ring (108) is fixedly fitted on the lower surface of the positioning rod (109). A threaded groove (112) is opened on the top of the positioning rod (109). A hand-tightening bolt (110) is threadedly connected to the inner cavity of the threaded groove (112). A buffer is fitted on the neck of the hand-tightening bolt (110).

3. The photoresist nozzle cleaning device according to claim 2, characterized in that: The buffer includes a pressure pad (111) that is rotatably sleeved on the neck of the hand-tightening bolt (110), the bottom of which is pressed against the top of the photoresist nozzle.

4. The photoresist nozzle cleaning device according to claim 3, characterized in that: The drive unit includes a cavity (104) disposed inside the base (100), a servo motor (105) is installed inside the cavity (104), the output shaft of the servo motor (105) is keyed to a transmission rod (107), a waterproof bearing (106) is sleeved on the surface of the transmission rod (107), the waterproof bearing (106) is embedded in the bottom of the cleaning tub (101), and the top of the transmission rod (107) extends upward through the cleaning tub (101) and is fixedly connected to the bottom of the positioning rod (109).

5. The photoresist nozzle cleaning device according to claim 1, characterized in that: The air supply component includes a hollow ring (301) disposed in the lower inner cavity of the cleaning tank (101). The inner wall of the hollow ring (301) is uniformly connected with a number of sets of air jet pipes (302), and the ends of the sets of air jet pipes (302) are inclined downward.

6. The photoresist nozzle cleaning device according to claim 5, characterized in that: One side of the hollow ring (301) is connected to an air inlet pipe (300), one end of which extends to the outside of the cleaning tub (101). The middle of the air inlet pipe (300) has a solenoid valve (304), and a flow sensor (303) is provided on the surface of the air inlet pipe (300) and at the input end of the solenoid valve (304).

7. The photoresist nozzle cleaning device according to claim 1, characterized in that: The circulating pump (500) includes a housing (103) embedded in the upper part of one side of the cleaning tub (101). The circulating pump (500) is installed inside the housing (103). The input end of the circulating pump (500) is connected to a suction pipe (503). The suction end of the suction pipe (503) is bent downward and connected to the lower inner cavity of the cleaning tub (101). The output end of the circulating pump (500) is connected to a connecting pipe (501). The output end of the connecting pipe (501) extends into the cleaning tub (101).

8. The photoresist nozzle cleaning device according to claim 7, characterized in that: An arc-shaped guide pipe (502) is fixedly connected to the inner wall of the middle part of one side of the cleaning tank (101), and the output end of the connecting pipe (501) is connected to the inner cavity of the arc-shaped guide pipe (502).

9. The photoresist nozzle cleaning device according to claim 1, characterized in that: The bottom of the cleaning tub (101) is connected to a drain pipe (201), one end of which is bent to one side and extends to the outside of the base (100). The end of the drain pipe (201) located outside the base (100) is connected to a valve (200).

10. A photoresist nozzle cleaning apparatus according to any one of claims 1-9, characterized in that: An operation panel (400) is installed on the front side of the base (100). The servo motor (105), the circulating pump (500), and the solenoid valve (304) are all controlled by the operation panel (400). The output end of the flow sensor (303) is electrically connected to the signal input end of the operation panel (400) through a wire.

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