A top pressure adjusting mechanism and a double polishing machine
Patent Information
- Application Number
- CN202522107938.X
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2025-09-30
- Publication Date
- 2026-09-11
- Estimated Expiration
- 2035-09-30
AI Technical Summary
[0004]针对现有技术的不足,本实用新型提供了一种顶压力调节机构及双抛机,解决了现有的双抛机顶压力调节机构,在使用过程中,仅仅采用单个压力传感器位于竖直中心位置进行监测调节,对顶部抛光盘压力监测并不准确的问题
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Figure CN224738058U_ABST
Abstract
Description
Technical Field
[0001] This utility model relates to the field of pressure regulation technology for double-shot blasting machines, specifically to a top pressure regulation mechanism and a double-shot blasting machine. Background Technology
[0002] A glass double-sided polishing machine, also known as a glass double-sided polishing machine, is a device that can polish both the upper and lower surfaces of a glass material simultaneously. It is widely used for high-precision double-sided polishing of hard and brittle materials such as optical glass, semiconductor silicon wafers, sapphire, and ceramic sheets. It can handle workpieces with thicknesses ranging from tens of micrometers to hundreds of millimeters, with processing accuracy reaching the micrometer to sub-micrometer level.
[0003] In the prior art, in order to avoid damage to the glass during the polishing process, a pressure regulating mechanism is required to adjust the pressure applied by the top polishing disc. However, the existing double polishing machine top pressure regulating mechanism only uses a single pressure sensor located at the vertical center position for monitoring and adjustment during use. During long-term use, the pressure distribution of the top polishing disc will be uneven due to angular deviation. The pressure monitoring of the top polishing disc by a single pressure sensor is not accurate, which can easily damage the surface of the glass. Utility Model Content
[0004] To address the shortcomings of existing technologies, this utility model provides a top pressure adjustment mechanism and a double polishing machine, which solves the problem that the existing double polishing machine top pressure adjustment mechanism, which only uses a single pressure sensor located at the vertical center position for monitoring and adjustment, does not accurately monitor the pressure of the top polishing disc during use.
[0005] To achieve the above objectives, this utility model is implemented through the following technical solution: a top pressure adjustment mechanism, including a mounting plate, an electric telescopic rod vertically fixedly connected to the upper surface of the mounting plate, the bottom end of the electric telescopic rod extending movably to the bottom of the mounting plate and fixedly connected to a protective shell, and a receiving seat rotatably provided inside the protective shell; The bottom of the receiving seat is movably provided with a lifting seat, and the bottom of the lifting seat is provided with a top polishing mechanism. The interior of the receiving seat has several monitoring chambers, which are arranged in a circular array along the interior of the receiving seat. Several vertical rods are fixedly connected to the upper surface of the lifting seat. The top of the vertical rods is pulled out and extended into the interior of the corresponding monitoring chamber, and a lifting block is fixedly connected thereto. A pressure sensor is fixedly connected to the top of the inner wall of the monitoring chamber, and a spring is vertically arranged between the pressure sensor and the lifting block.
[0006] Furthermore, a support frame is fixedly connected inside the protective shell, and a support plate is fixedly connected to the bottom of the support frame. The receiving seat is rotatably disposed inside the support plate.
[0007] Furthermore, a shielding shell is fixedly connected to the side wall of the protective shell, and a motor is detachably installed inside the shielding shell via a connecting seat. A rotating rod is fixedly connected to the top of the receiving seat, and a second pulley is fixedly connected to the surface of the rotating rod. A first pulley is fixedly connected to the output shaft of the motor, and the first pulley and the second pulley are connected by a transmission belt.
[0008] Furthermore, the top polishing mechanism includes a connecting shaft, a flow divider, and a polishing disc. The connecting shaft is vertically fixed to the bottom of the lifting seat, the flow divider is fixedly connected to the bottom of the connecting shaft, and the polishing disc is fixedly connected to the bottom of the flow divider.
[0009] Furthermore, the lower surface of the polishing disc is provided with a plurality of liquid spraying nozzles, the surface of the distribution disc is connected to a plurality of distribution pipes, the plurality of distribution pipes correspond one-to-one with the plurality of liquid spraying nozzles, and the other end is connected to the interior of the corresponding liquid spraying nozzle. The surface of the protective shell is provided with a liquid injection component connected to the distribution disc.
[0010] A double polishing machine includes a double polishing machine frame, the aforementioned top pressure adjustment mechanism, and a lower polishing disc assembly. The top pressure adjustment mechanism is disposed at the top of the inner cavity of the double polishing machine frame, and the lower polishing disc assembly is disposed inside the double polishing machine frame and located below the top pressure adjustment mechanism.
[0011] Compared with the prior art, the beneficial effects of this utility model are as follows: multiple pressure sensors are evenly distributed in a ring along the inside of the receiving seat. When the electric telescopic rod extends, it can drive the top polishing mechanism to descend to contact the glass surface through the connection between the receiving seat and the lifting seat. After the top polishing mechanism is subjected to force, it can drive the lifting seat, vertical rod and lifting block to move. The compression spring contracts and deforms to generate elastic force. After the elastic force acts on the pressure sensors, the pressure can be monitored. By monitoring whether the pressure values of multiple pressure sensors are consistent, it can be determined whether the top polishing mechanism is perpendicular to the surface of the glass workpiece. This avoids uneven pressure distribution caused by angular deviation, which can damage the glass during the polishing process. This improves the stability of the glass polishing process and thus improves the quality of the finished glass product. Attached Figure Description
[0012] Figure 1 This is a three-dimensional structural diagram of the top pressure adjustment mechanism of this utility model; Figure 2 This is a schematic diagram of the structure of the diversion pipe and diversion plate of this utility model; Figure 3 This is a schematic diagram of the structure of the motor and transmission belt of this utility model; Figure 4This is a schematic diagram of the structure of the second pulley and support frame of this utility model; Figure 5 This is a schematic diagram of the structure of the housing and pressure sensor of this utility model; Figure 6 This utility model Figure 5 Enlarged view of a portion of point A in the middle; Figure 7 This is a three-dimensional structural diagram of the double-throw machine of this utility model.
[0013] In the diagram: 1. Mounting plate; 2. Electric telescopic rod; 3. Protective shell; 4. Shielding shell; 5. Motor; 6. Support frame; 7. Rotating rod; 8. Connecting seat; 9. Vertical rod; 10. First pulley; 11. Transmission belt; 12. Second pulley; 13. Support plate; 14. Receiving seat; 15. Lifting seat; 16. Monitoring chamber; 17. Lifting block; 18. Pressure sensor; 19. Spring; 20. Connecting shaft; 21. Diverter plate; 22. Polishing disc; 23. Diverter pipe; 24. Liquid injection assembly; 25. Liquid spray nozzle; 26. Double polishing machine frame; 27. Lower polishing disc assembly. Detailed Implementation
[0014] The technical solutions of the present utility model will be clearly and completely described below with reference to the accompanying drawings of the embodiments. Obviously, the described embodiments are only some embodiments of the present utility model, and not all embodiments. Based on the embodiments of the present utility model, all other embodiments obtained by those of ordinary skill in the art without creative effort are within the protection scope of the present utility model.
[0015] Please see Figure 1-6 This utility model provides a technical solution: a top pressure adjustment mechanism, including a mounting plate 1, an electric telescopic rod 2 vertically fixedly connected to the upper surface of the mounting plate 1, the bottom end of the electric telescopic rod 2 extending movably to the bottom of the mounting plate 1 and fixedly connected to a protective shell 3, and a receiving seat 14 rotatably arranged inside the protective shell 3.
[0016] A lifting seat 15 is movably provided at the bottom of the receiving seat 14. A top polishing mechanism is provided at the bottom of the lifting seat 15. Several monitoring chambers 16 are opened inside the receiving seat 14. The multiple monitoring chambers 16 are arranged in a circular array along the inside of the receiving seat 14. Several vertical rods 9 are fixedly connected to the upper surface of the lifting seat 15. The top of the vertical rods 9 is pulled out and extended into the corresponding monitoring chamber 16, and a lifting block 17 is fixedly connected thereto. A pressure sensor 18 is fixedly connected to the top of the inner wall of the monitoring chamber 16. A spring 19 is vertically arranged between the pressure sensor 18 and the lifting block 17.
[0017] Multiple pressure sensors 18 are evenly spaced and arranged in a ring inside the housing 14. When the electric telescopic rod 2 is extended, it can drive the top polishing mechanism to descend to contact the surface of the glass through the connection between the housing 14 and the lifting seat 15. After the top polishing mechanism is subjected to force, it can drive the lifting seat 15, the vertical rod 9 and the lifting block 17 to move, and compress the spring 19 to contract and deform to generate elastic force.
[0018] After the elastic force is applied to the pressure sensor 18, the pressure can be monitored. By monitoring whether the pressure values of multiple pressure sensors 18 are consistent, it can be determined whether the top polishing mechanism is perpendicular to the surface of the glass workpiece. This avoids uneven pressure distribution caused by angular deviation, which could damage the glass during the polishing process. This improves the stability of the glass polishing process and thus improves the quality of the finished glass product.
[0019] The protective shell 3 is fixedly connected to the inside of a support frame 6, and the bottom of the support frame 6 is fixedly connected to a support plate 13. The receiving seat 14 is rotatably disposed inside the support plate 13.
[0020] A shielding shell 4 is fixedly connected to the side wall of the protective shell 3. A motor 5 is installed inside the shielding shell 4 through a connecting seat 8. A rotating rod 7 is fixedly connected to the top of the receiving seat 14. A second pulley 12 is fixedly connected to the surface of the rotating rod 7. A first pulley 10 is fixedly connected to the output shaft of the motor 5. The first pulley 10 and the second pulley 12 are connected by a transmission belt 11.
[0021] After the motor 5 starts working, it can drive the support frame 6 to rotate through the transmission connection of the first pulley 10, the transmission belt 11 and the second pulley 12, and then drive the top polishing mechanism to rotate to perform polishing work.
[0022] The top polishing mechanism includes a connecting shaft 20, a flow divider 21, and a polishing disc 22. The connecting shaft 20 is vertically fixed to the bottom of the lifting seat 15, the flow divider 21 is fixedly connected to the bottom of the connecting shaft 20, and the polishing disc 22 is fixedly connected to the bottom of the flow divider 21.
[0023] The lower surface of the polishing disc 22 is provided with several spray nozzles 25, and the surface of the distribution disc 21 is connected to several distribution pipes 23. Each of the multiple distribution pipes 23 corresponds to one of the multiple spray nozzles 25, and the other end is connected to the interior of the corresponding spray nozzle 25. The surface of the protective shell 3 is provided with a liquid injection component 24 that is connected to the distribution disc 21.
[0024] Please see Figure 7 A double polishing machine includes a double polishing machine frame 26, the aforementioned top pressure adjustment mechanism, and a lower polishing disc assembly 27. The top pressure adjustment mechanism is located at the top of the inner cavity of the double polishing machine frame 26, and the lower polishing disc assembly 27 is located inside the double polishing machine frame 26 and below the top pressure adjustment mechanism.
[0025] During operation, multiple pressure sensors 18 are evenly spaced and arranged in a ring inside the housing 14. When the electric telescopic rod 2 extends, it can drive the top polishing mechanism to descend to contact the glass surface through the connection between the housing 14 and the lifting seat 15. After the top polishing mechanism is subjected to force, it can drive the lifting seat 15, the vertical rod 9 and the lifting block 17 to move. The compression spring 19 contracts and deforms to generate elastic force. After the elastic force acts on the pressure sensor 18, the pressure can be monitored. By monitoring whether the pressure values of multiple pressure sensors 18 are consistent, it can be determined whether the top polishing mechanism is perpendicular to the surface of the glass workpiece, so as to avoid uneven pressure distribution due to angular deviation and damage to the glass during the polishing process.
[0026] It should be noted that, in this document, relational terms such as "first" and "second" are used only to distinguish one entity or operation from another, and do not necessarily require or imply any such actual relationship or order between these entities or operations. Furthermore, the terms "comprising," "including," or any other variations thereof are intended to cover non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements includes not only those elements but also other elements not expressly listed, or elements inherent to such process, method, article, or apparatus.
[0027] The above description is only a preferred embodiment of the present utility model and is not intended to limit the present utility model. Any modifications, equivalent substitutions, improvements, etc., made within the spirit and principles of the present utility model should be included within the protection scope of the present utility model.
Claims
1. A top pressure regulating mechanism comprising a mounting plate (1), characterized in that: An electric telescopic rod (2) is vertically fixedly connected to the upper surface of the mounting plate (1). The bottom end of the electric telescopic rod (2) extends movably to the bottom of the mounting plate (1) and is fixedly connected to a protective shell (3). A receiving seat (14) is rotatably provided inside the protective shell (3). The bottom of the receiving seat (14) is movably provided with a lifting seat (15), and the bottom of the lifting seat (15) is provided with a top polishing mechanism. The interior of the receiving seat (14) is provided with a plurality of monitoring chambers (16), and the plurality of monitoring chambers (16) are arranged in a ring array along the interior of the receiving seat (14). The upper surface of the lifting seat (15) is fixedly connected with a plurality of vertical rods (9), the top of the vertical rods (9) is pulled out and extended to the interior of the corresponding monitoring chamber (16), and is fixedly connected with a lifting block (17). The top of the inner wall of the monitoring chamber (16) is fixedly connected with a pressure sensor (18), and a spring (19) is vertically provided between the pressure sensor (18) and the lifting block (17).
2. A top pressure adjustment mechanism according to claim 1, wherein: The protective shell (3) is fixedly connected to a support frame (6), and the bottom of the support frame (6) is fixedly connected to a support plate (13). The receiving seat (14) is rotatably disposed inside the support plate (13).
3. A top pressure adjustment mechanism according to claim 1, wherein: The protective shell (3) is fixedly connected to a shield shell (4) on its side wall. A motor (5) is installed inside the shield shell (4) via a connecting seat (8). A rotating rod (7) is fixedly connected to the top of the receiving seat (14). A second pulley (12) is fixedly connected to the surface of the rotating rod (7). A first pulley (10) is fixedly connected to the output shaft of the motor (5). The first pulley (10) and the second pulley (12) are connected by a transmission belt (11).
4. A top pressure adjustment mechanism according to claim 1, wherein: The top polishing mechanism includes a connecting shaft (20), a flow divider (21), and a polishing disc (22). The connecting shaft (20) is vertically fixed to the bottom of the lifting seat (15), the flow divider (21) is fixedly connected to the bottom of the connecting shaft (20), and the polishing disc (22) is fixedly connected to the bottom of the flow divider (21).
5. The top pressure adjustment mechanism according to claim 4, characterized in that: The lower surface of the polishing disc (22) is provided with a plurality of spray nozzles (25), and the surface of the diversion disc (21) is connected to a plurality of diversion pipes (23). The plurality of diversion pipes (23) correspond one-to-one with the plurality of spray nozzles (25), and the other end is connected to the interior of the corresponding spray nozzle (25). The surface of the protective shell (3) is provided with a liquid injection assembly (24) connected to the diversion disc (21).
6. A double-thrower, characterized in that: The device includes a double-shot machine frame (26), a top pressure adjustment mechanism as described in any one of claims 1-5, and a lower polishing disc assembly (27). The top pressure adjustment mechanism is located at the top of the inner cavity of the double-shot machine frame (26), and the lower polishing disc assembly (27) is located inside the double-shot machine frame (26) and below the top pressure adjustment mechanism.