Feed and monitoring device for an RPD apparatus, RPD apparatus
Patent Information
- Application Number
- CN202522184959.1
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2025-10-15
- Publication Date
- 2026-09-11
- Estimated Expiration
- 2035-10-15
AI Technical Summary
1)随着工艺调试或离子源使用时间长导致的老化,靶材消耗速度与马达推动速度不匹配,导致靶材的高度变化,影响镀膜衍射角,镀膜速率受到影响;2)更换离子源或其使用寿命后期不稳定,导致离子源位置偏移,靶材消耗不在中心点,衍射角变化,镀膜区域左右不均匀;3)靶材推速与靶材消耗长期不匹配,若靶材过度消耗,可能到时炉膛烧坏及影响膜质
[0015]本申请实施例提供一种用于RPD设备的供料及监控装置、RPD设备,可通过热电偶实时监控炉膛温度,评估靶材消耗情况并及时调整靶材的推动距离或推动速度,可以在RPD正常工作期间,不用破真空开腔就可以监控镀膜均一性及靶材消耗情况,大大提高了产品良率及设备UpTime(设备正常运行时间)。
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Figure CN224741128U_ABST
Abstract
Description
Technical Field
[0001] This utility model relates to the field of solar cell technology, and in particular to a feeding and monitoring device for RPD equipment and RPD equipment. Background Technology
[0002] Reactive plasma deposition (RPD) is a variant of plasma deposition technology that uses reactive gases to initiate chemical reactions to generate the desired compound or alloy thin film. RPD deposition offers the advantages of low temperature and low damage. Since perovskite layers are not heat-resistant, RPD deposition is particularly advantageous for the top transparent conductive oxide (TCO) layer in perovskite solar cells.
[0003] The current working principle of RPD coating is as follows: Plasma bombardment of the TCO target causes it to heat up and volatilize, and the volatilized TCO material forms a film on the substrate. RPD coating is a thermal evaporation process. As the target material is consumed, its height decreases. Generally, a motor screw pusher below the target is needed to move the target upwards to ensure that the target height remains relatively constant, thereby ensuring the stability of the coating. However, in practical applications, the following problems exist: 1) Due to process debugging or aging caused by prolonged use of the ion source, the target consumption rate becomes mismatched with the motor drive speed, leading to changes in target height, affecting the diffraction angle and coating rate. 2) Replacement of the ion source or its instability in the later stages of its lifespan causes the ion source position to shift, resulting in off-center target consumption, changes in the diffraction angle, and uneven coating area. 3) Long-term mismatch between target push speed and target consumption can lead to excessive target consumption, potentially burning out the furnace and affecting film quality. Real-time monitoring of RPD film thickness uniformity without opening the coating chamber during normal equipment operation can significantly improve product yield and equipment uptime. Utility Model Content
[0004] The purpose of this invention is to provide a feeding and monitoring device for RPD equipment, which can monitor the uniformity of RPD film thickness and the consumption of target material in real time without opening the coating chamber during normal operation of the equipment, thus greatly improving product yield and equipment uptime.
[0005] The purpose of this utility model is to provide a feeding and monitoring device for RPD equipment, comprising: A thermocouple is used to monitor the furnace temperature in real time. The furnace is used to house the target material. The thermocouple is connected to the controller via a signal connection. A rangefinder is used to measure the distance from the rangefinder to the target material, and the rangefinder is signal-connected to the controller. The controller is used to determine the pushing distance and / or pushing speed of the target material based on the target material distance measured by the rangefinder and the furnace temperature measured by the thermocouple. A motor is used to push the target material under the control of the controller.
[0006] In one embodiment of this utility model, the thermocouple is further used to obtain the furnace temperature as a reference operating temperature T0 when the target material is at a reference target depth. The controller is further used to: when the thermocouple detects that the furnace temperature has dropped from the reference operating temperature T0 to the lower threshold value T1 of the operating temperature, manually or automatically drive the motor to compensate, so that the target material drops to the reference target depth, or slow down the motor speed or reduce the process power until the furnace temperature recovers to the reference operating temperature T0; when the thermocouple detects that the furnace temperature has risen from the reference operating temperature T0 to the upper threshold value T2 of the operating temperature, manually or automatically drive the motor to compensate, so that the target material rises to the reference target depth, or speed up the motor speed or increase the process power until the furnace temperature recovers to the reference operating temperature T0.
[0007] Optionally, the device further includes: a rangefinder shield, which is automatically closed during the PRD equipment coating process and opened upon receiving a measurement command.
[0008] Optionally, the rangefinder is a high-temperature resistant rangefinder, whose upper limit of operating temperature is greater than the temperature inside the PRD cavity. Optionally, the rangefinder is, for example, a laser rangefinder.
[0009] Optionally, the thermocouple is a multi-point thermocouple, with multiple sensing points distributed at intervals along the length of the furnace.
[0010] Optionally, it also includes: at least two sets of film thickness testers for monitoring the coating rate on at least two sides of the sample; the controller is also used to determine whether the target consumption has shifted based on the coating rate on at least two sides of the sample.
[0011] Optionally, the controller is also configured to shut down the plasma power supply of the RPD device when the furnace temperature is detected to have reached an abnormal threshold.
[0012] Optionally, the rangefinder is also used to measure the initial distance to the target before heating the target; the controller is also used to adjust the target to a reference target depth before heating the target and to set the basic drive rate of the motor according to the target heating power and the target material.
[0013] Optionally, it also includes: a ceramic insulating protective cover surrounding the thermocouple to prevent plasma bombardment damage to the thermocouple and signal interference.
[0014] On the other hand, this application also provides an RPD device, including the feeding and monitoring device described in any of the above claims.
[0015] This application provides a feeding and monitoring device for RPD equipment and an RPD equipment. The device can monitor the furnace temperature in real time through thermocouples, assess the consumption of the target material, and adjust the pushing distance or speed of the target material in a timely manner. During normal operation of RPD, the uniformity of coating and the consumption of the target material can be monitored without breaking the vacuum chamber, which greatly improves the product yield and equipment uptime. Attached Figure Description
[0016] Figure 1 This is a schematic diagram of the feeding and monitoring device for RPD equipment provided in an embodiment of this application; Figure 2 This is a schematic diagram of the feeding and monitoring device control for an RPD equipment provided in an embodiment of this application; Figure 3 for Figure 1 A partially enlarged schematic diagram of the furnace chamber; Figure 4 This is a schematic diagram illustrating the mismatch between target consumption and target pushing speed in RPD equipment. Figure 5 This is a schematic diagram illustrating how the target material consumption is not centered due to the offset of the ion source position in the RPD device.
[0017] Figure Labels 1-Room wall of RPD equipment, 2-Tray, 3-Plasma, 4-Furnace chamber, 5-Target material 6-Motor, 7-Thermocouple, 8-Ceramic insulating protective cover, 9-Range meter 10-Film thickness tester, 11-Controller. Detailed Implementation
[0018] To make the objectives, technical solutions, and advantages of the embodiments of this application clearer, the technical solutions of the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this utility model, and not all embodiments. Based on the embodiments of this utility model, all other embodiments obtained by those skilled in the art without creative effort are within the protection scope of this utility model.
[0019] This embodiment provides a feeding and monitoring device for RPD equipment, such as... Figure 1 and Figure 2As shown, the device includes a thermocouple 7, a rangefinder 9, a controller 11, and a motor 6. Thermocouple 7 is used to monitor the temperature of the furnace 4 in real time. The furnace 4 houses the target material 5. Thermocouple 7 is connected to the controller 11. The rangefinder 9 is also connected to the controller 11. The rangefinder 9 measures the distance from the rangefinder 9 to the target material 5 to obtain the wear depth of the target material 5. The wear depth d of the target material 5 (referred to as target depth) refers to the distance from the top of the furnace 4 to the lowest point of the target material 5. Figure 3 As shown. The controller 11 is used to determine the pushing distance and / or pushing speed of the target 5 based on the distance to the target 5 measured by the rangefinder 9 and the furnace temperature measured by the thermocouple 7.
[0020] The feeding and monitoring device of this application can be applied to coating equipment, such as PRD coating equipment. Figure 1 As shown, 1 is the wall of the PRD chamber coating equipment, 2 is the tray for fixing the substrate (such as solar cell), 4 is the furnace chamber, and the furnace chamber 4 is equipped with a target material 5. The plasma 3 bombards the target material 5 to make it heat up and volatilize. The volatilized target material (such as TCO material) forms a film on the substrate.
[0021] The feeding and monitoring device of this application includes a thermocouple 7, a rangefinder 9, a controller 11, and a motor 6. This application uses a rangefinder 9, which can be used to measure the depth of target consumption, ensuring that the target consumption matches the pushing speed, and ensuring the coating diffraction angle and coating rate. However, due to the presence of plasma in the chamber, the rangefinder 9 cannot achieve real-time monitoring.
[0022] This application innovatively employs thermocouples to monitor furnace temperature in real time, assessing target material consumption and preventing furnace damage. If excessive target material is consumed, the plasma will bombard the furnace extensively, causing the temperature to rise. By monitoring the temperature rise with thermocouples, it is possible to assess whether the target material is being consumed too quickly, allowing for real-time adjustments to ensure film thickness uniformity and prevent furnace burnout. Conversely, if the temperature decreases, target material consumption may be too slow, also requiring real-time adjustments.
[0023] Based on this, if a continuous rise in furnace temperature is detected, it indicates that the target 5 is being pushed too slowly, causing the target 5 to descend in depth. This results in some plasma bombarding the furnace 4, leading to a temperature increase. In this case, the target 5's pushing speed can be adjusted appropriately. Conversely, if the furnace temperature is decreasing, the motor pushing speed needs to be increased. In other words, this application primarily uses thermocouple 7 to monitor the furnace temperature in real time to indirectly obtain the matching status between target 5 consumption and motor pushing speed. For example, taking an RPD device as an example, when the device is working normally, if the thermocouple 7 temperature is generally 550℃, subsequent monitoring reveals that the temperature continues to rise to 555℃ / 560℃ or even higher, and the target 5 diffraction angle is as follows: Figure 4 If the target has narrowed and the film uniformity has deteriorated, it means that the consumption rate of the target 5 is greater than the pushing speed. At this time, the pushing speed of the target 5 can be appropriately increased.
[0024] In one specific embodiment of this utility model, the thermocouple 7 can obtain the furnace temperature as the reference working temperature T0 when the target material 5 is at the reference target depth. The controller 11 is also used to: when the thermocouple 7 detects that the furnace temperature has dropped from the reference working temperature T0 to the lower threshold T1 of the working temperature, manually or automatically drive the motor 6 to compensate, so that the target material 5 drops to the reference target depth, or slow down the motor 6 or reduce the process power until the furnace temperature 4 recovers to the reference working temperature T0; when the thermocouple 7 detects that the furnace temperature has risen from the reference working temperature T0 to the upper threshold T2 of the working temperature, manually or automatically drive the motor 6 to compensate, so that the target material 5 rises to the reference target depth, or speed up the motor 6 or increase the process power until the furnace temperature 4 recovers to the reference working temperature T0.
[0025] The aforementioned reference target depth refers to the optimal position of target 5 when other conditions are not considered, resulting in the best film quality. This depth can generally be obtained through multiple experiments or experience, or by referring to the equipment manual. The aforementioned reference operating temperature T0 refers to the furnace temperature measured by thermocouple 7 when target 5 is at the reference target depth and the coating process is stable. Generally, target 5 can be adjusted to the reference target depth, and various coating parameters of the coating equipment can be adjusted. After stabilization, the furnace temperature at this point can be obtained through thermocouple 7 as the reference operating temperature T0.
[0026] Optionally, the controller 11 is also used to shut down the plasma power supply of the RPD equipment when the furnace temperature is detected to reach an abnormal threshold. Plasma bombardment of the target material raises its temperature for vapor deposition, and the local plasma temperature can reach over 1500°C. However, the furnace material is generally copper (copper's melting point is 1083.4°C). If the target material pushing speed is lower than the target material consumption rate, the target material height decreases, and a large amount of plasma bombards the furnace, causing an increase in heat that cannot be conducted away in time, leading to the furnace reaching its melting point and burning out. The solution in this application avoids the above problems through thermocouples and a controller. When the thermocouple detects that the furnace temperature has reached an abnormal threshold, the controller outputs a command signal to the plasma power supply to shut down the RPD equipment or reduce the target material heating power.
[0027] The following explanation uses RPD equipment as an example to illustrate the above-mentioned feeding and monitoring devices.
[0028] The PRD equipment of this application can be used to deposit TCO films on solar cells. Assuming that the TCO consumption depression depth d~10mm is optimal, that is, the reference target depth is 10mm, and based on experience, the tolerance of the target depth during film deposition is better when it is controlled between 7-13mm. The target pushing speed can be controlled in the following way: Experimental data collection: such as Figure 3As shown, if the target depth d=10mm, the corresponding temperature is T0 (assuming 550℃, but the actual temperature may differ); if d=7mm, the corresponding temperature is T1 (assuming 520℃); and if d=13mm, the corresponding temperature is T2 (assuming 580℃). The trigger temperature for the equipment to protect and shut down is T4. The furnace material is generally copper, and copper's melting point is 1083.4℃. T4 can be set to <900℃, such as 700℃. T1 < T0 < T2 < T4.
[0029] If the monitored temperature drops from T0 to T1 during the process, it indicates that the target material is consumed too slowly. Correspondingly, the target material depth changes from 10mm to 7mm. At this time, manually or automatically adjust the motor downward by 3mm to 10mm; or according to experimental data, slow down the motor speed or reduce the process power until the reference target material depth of 10mm is restored.
[0030] During the process, if the monitored temperature rises from T0 to T2, it indicates that the target material is consumed too quickly and the depth changes from 10mm to 13mm. At this time, manually or automatically adjust the motor upward to compensate 3mm to 13mm; or adjust the motor speed or increase the process power according to the experimental data until the reference target material depth of 10mm is restored.
[0031] When the process monitoring temperature reaches the T4 warning temperature, the program activates the protection mechanism and automatically shuts off the power to prevent the high temperature from burning out furnace chamber 4.
[0032] The above-mentioned speed adjustments for the motor are based on the preset speed by the experimenter or the default speed of the equipment. That is, the motor runs at the base speed when the coating begins, and the speed is adjusted by monitoring the furnace temperature through thermocouples according to the above scheme.
[0033] In other embodiments, the rangefinder 9 is also used to measure the initial distance to the target 5 before heating the target 5; the controller 11 is also used to adjust the target 5 to a reference target depth before heating the target 5, and to set the basic drive rate of the motor 6 according to the target material and the target heating power.
[0034] Based on feedback from the rangefinder 9, the controller 11 controls the motor to adjust the target 5 to the reference target depth. Pre-set information regarding the target material, target heating power, and target consumption rate (or motor base driving rate) is stored in the memory. The controller 11 can also match the corresponding motor base driving rate in the memory based on the input target material and target heating power, and execute the operation.
[0035] Furthermore, the rangefinder 9 of this application can acquire the distance to the target 5, but due to the influence of the chamber environment such as plasma, it generally cannot be monitored in real time. The distance to the target 5 can be measured in an idle state (IDLE state) when no coating operation is being performed, thus correcting the target wear depth. Alternatively, when a professional determines that the target wear depth needs correction, the coating process can be paused, and the target wear depth can be quickly acquired using the rangefinder 9. Based on this, the above device may also include: a rangefinder shield or baffle (not shown), used to automatically close during PRD equipment coating and open upon receiving a measurement command. The rangefinder shield can prevent plasma bombardment damage to the rangefinder and signal interference.
[0036] Optionally, the rangefinder 9 is a high-temperature resistant rangefinder, with an upper limit of operating temperature greater than the temperature inside the PRD cavity. The rangefinder 9 may be, for example, a laser rangefinder.
[0037] Optionally, the thermocouple is a multi-point thermocouple, with multiple sensing points distributed at intervals along the length of the furnace. The highest value among multiple temperature data corresponding to multiple sensing points can be selected as the furnace temperature, thus avoiding errors caused by differences in heat conduction distance.
[0038] Optionally, it also includes: a ceramic insulating protective cover 8, which surrounds the thermocouple 7 to prevent plasma from bombarding and damaging the thermocouple 7 and from signal interference, and to prevent the thermocouple from malfunctioning.
[0039] Optionally, it also includes: at least two sets of film thickness gauges 10 for monitoring the coating rate on at least two sides of the sample, such as crystal oscillator film thickness gauges 10. The controller 11 is also used to determine whether the target material 5 has shifted based on the coating rate on at least two sides of the sample. Replacement of the ion source or instability in the later stages of the ion source's lifespan can cause the plasma to shift in position on the target, resulting in the target material not being consumed at the center point, a change in the diffraction angle of the coating, and unevenness in the coating area, such as... Figure 5 As shown. If the film thickness is found to be inconsistent on both sides of the sample by two sets of film thickness testers 10 (exceeding the allowable error range), it indicates that the target material consumption depression position has shifted, the diffraction angle has changed, and the coating area is uneven from left to right, requiring the machine to be stopped for inspection.
[0040] This application provides a novel method and apparatus for monitoring RPD feeding and film thickness, as well as protecting the furnace. A rangefinder and thermocouple can measure the target consumption depth, ensuring that target consumption matches the feeding rate, thereby guaranteeing the coating diffraction angle and coating rate temperature. A film thickness meter can monitor the coating rates on both sides to ensure that target consumption does not deviate, guaranteeing uniformity in the coating area on both sides.
[0041] On the other hand, this application also provides an RPD device, including the feeding and monitoring device described in any of the above claims. Specific implementation details of this solution are as follows. Figure 1-3 In existing RPD coating systems: A rangefinder 9 was added, positioned directly above the target 5 and on the tray 2. The rangefinder has a baffle to prevent interference with the coating. The baffle can be opened during use. Two sets of crystal oscillator film thickness gauges 10 were added: the crystal oscillator film thickness gauge 10 has a baffle that can be opened intermittently at regular intervals to extend the service life of the crystal oscillator; A high-temperature thermocouple 7 was added to monitor the temperature of the furnace 4, assess the consumption of the target material 5, and prevent damage to the furnace 4. A ceramic insulating protective cover 8 was added to: 1) prevent the plasma 3 from interfering with the thermocouple signal; 2) prevent the plasma 3 from bombarding and damaging the thermocouple 9; and 3) prevent the thermocouple 9 from distorting its operation during coating.
[0042] The above monitoring system can monitor coating uniformity and target consumption without breaking the vacuum chamber during normal RPD operation, greatly improving product yield and equipment uptime. The above description is merely a specific embodiment of this utility model, but the protection scope of this utility model is not limited thereto. Any variations or substitutions that can be easily conceived by those skilled in the art within the technical scope disclosed in this utility model should be included within the protection scope of this utility model. Therefore, the protection scope of this utility model should be determined by the scope of the claims.
Claims
1. A feed and monitoring device for an RPD apparatus, characterized in that, include: Thermocouples are used to monitor the furnace temperature in real time. The furnace is used to house the target material. The thermocouples are connected to the controller signal. A rangefinder is used to measure the distance from the rangefinder to the target material, and the rangefinder is signal-connected to the controller. The controller is used to determine the pushing distance and / or pushing speed of the target material based on the distance to the target material measured by the rangefinder and the furnace temperature measured by the thermocouple. A motor is used to push the target material under the control of the controller.
2. The apparatus of claim 1, wherein, The thermocouple is also used to obtain the furnace temperature as a reference operating temperature when the target material is at the reference target material depth; the controller is also used to: When the thermocouple detects that the furnace temperature has dropped from the reference operating temperature to the lower threshold of the operating temperature, the motor is manually or automatically driven to compensate, causing the target to descend to the reference target depth, or the motor speed is slowed down or the process power is reduced until the furnace temperature returns to the reference operating temperature; when the thermocouple detects that the furnace temperature has risen from the reference operating temperature to the upper threshold of the operating temperature, the motor is manually or automatically driven to compensate, causing the target to rise to the reference target depth, or the motor speed is increased or the process power is increased until the furnace temperature returns to the reference operating temperature.
3. The apparatus of claim 1 or 2, wherein, Also includes: The rangefinder shield is designed to automatically close during the PRD equipment coating process and open upon receiving a measurement command.
4. The apparatus according to claim 1 or 2, characterized in that, The rangefinder is a high-temperature resistant rangefinder, and its upper limit of operating temperature is greater than the temperature inside the PRD cavity.
5. The apparatus of claim 1 or 2, wherein, The thermocouple is a multi-point thermocouple, with multiple sensing points distributed at intervals along the length of the furnace.
6. The apparatus according to claim 1 or 2, characterized in that, Also includes: At least two sets of film thickness testers are used to monitor the coating rate on at least two sides of the sample; The controller is also used to determine whether the target consumption has shifted based on the coating rates of at least two sides of the sample.
7. The apparatus according to claim 1 or 2, characterized in that, The controller is also used to shut down the plasma power supply of the RPD device when the furnace temperature is detected to have reached an abnormal threshold.
8. The apparatus of claim 1 or 2, wherein, The rangefinder is also used to measure the initial distance to the target before heating the target; the controller is also used to adjust the target to a reference target depth before heating the target and to set the basic drive rate of the motor according to the target heating power and the target material.
9. The apparatus according to claim 1 or 2, characterized in that, Also includes: A ceramic insulating protective cover surrounds the thermocouple to prevent damage from plasma bombardment and signal interference.
10. An RPD device, characterized in that, Includes the feeding and monitoring device as described in any one of claims 1-9.