A photoresist nozzle moisturizing and cleaning device and a coating and developing machine

Abstract

The utility model relates to a kind of photoresist nozzle moisturizing and keeping clean device and gumming developing machine, photoresist nozzle moisturizing and keeping clean device is applied to gumming developing machine, and photoresist nozzle moisturizing and keeping clean device includes the box for filling photoresist, the upper end plate of box has through-hole, the diameter of this through-hole is at least not less than the outer diameter of nozzle, the bottom of box is fixedly installed with photoresist replenishing pipe, photoresist replenishing pipe is connected control valve, control valve is connected photoresist source.In use, mechanical hand drives nozzle to rise and separate from box, horizontally moves to the center of one of wafer just above, nozzle drops to specified height, starts to spray glue, wafer rotation evenly coats photoresist on the surface of wafer, nozzle rises again-translation-lowering inserts into through-hole and completes reset, so that nozzle is inserted into photoresist in box, so that nozzle keeps wet, avoid photoresist to form particle on nozzle due to volatilization and pollution, play the role of moisturizing and keeping clean.

Description

Technical Field

[0001] This utility model relates to the nozzle moisturizing and cleaning treatment technology of a photoresist nozzle and a photoresist coating and developing machine. Background Technology

[0002] In semiconductor photolithography, the photoresist coating process is as follows: 1. The photoresist nozzle rises from the initial position and moves to the center of the wafer; 2. It then descends to a certain height and sprays a set amount of photoresist; 3. The wafer rotates to evenly coat the photoresist on the surface of the wafer; 4. The photoresist nozzle moves up from the center of the wafer and then moves above the initial position before descending back to the initial position.

[0003] For detailed reference Figure 1 The coating and developing machine specifically includes a machine base 1 with two coating stations 2 (for placing wafers) on the machine base. A gap 3 separates the two coating stations. A robotic arm 4 holds a nozzle 5 at the gap, which is the initial position of the nozzle. During operation, the robotic arm moves the nozzle upwards from its initial position to directly above one of the coating stations, then descends to a designated height to begin operation. After completion, it resets.

[0004] In the actual production process, due to the different types of photoresist used in different processes, the photoresist nozzle is mostly suspended in the initial position, which will lead to the following problems: 1. The nozzle surface is contaminated by impurities (microparticles); 2. The photoresist crystallizes due to the volatilization of organic matter after being exposed to the air for a long time.

[0005] The current solution involves setting a periodic spraying program for the photoresist nozzles: spraying the nozzles at fixed intervals, such as 2ml of photoresist every 2 hours, to keep the nozzles moist and prevent the photoresist from evaporating and contaminating the nozzles, thus forming particles. However, this solution consumes a lot of photoresist, resulting in significant non-production-related losses. Summary of the Invention

[0006] This invention provides a photoresist nozzle moisturizing and cleaning device and a photoresist coating and developing machine. The photoresist nozzle moisturizing and cleaning device is applied to the photoresist coating and developing machine. In use, a robotic arm drives the nozzle to rise and detach from the housing, and moves horizontally to directly above the center of one of the wafers. The nozzle descends to a designated height and begins to spray photoresist. The wafer rotates, evenly coating the surface of the wafer with photoresist. The nozzle then rises, moves horizontally, and descends again to insert into the through hole to complete the reset, so that the nozzle is inserted into the photoresist inside the housing. This keeps the nozzle moist and prevents the photoresist from evaporating and contaminating the nozzle, thus achieving the function of moisturizing and cleaning.

[0007] The technical solution adopted by this utility model is: a photoresist nozzle moisturizing and cleaning device, including a box for filling with photoresist, a through hole on the upper plate of the box, the diameter of the through hole being at least not less than the outer diameter of the nozzle, a photoresist replenishment tube fixedly installed at the bottom of the box, the photoresist replenishment tube being connected to a control valve, the control valve being connected to a photoresist source, and a detection device for detecting the amount of photoresist in the box, the detection device being electrically connected to the control valve.

[0008] Based on the above scheme, a pressure sensor installed on the photoresist replenishment tube is preferred as the detection device.

[0009] Based on the above scheme, the preferred detection device includes a fixed tube that is fixedly installed at the center of the bottom of the box and closed at the bottom. The fixed tube is connected to the inside of the box and a pressure sensor is installed on the fixed tube.

[0010] Based on the above scheme, the preferred photoresist source includes a photoresist storage tank and a pump connected to the photoresist storage tank via a pipeline, with the pump connected to a valve via a pipeline.

[0011] Based on the above solution, a protective device for covering the through hole is also preferredly included when the adhesive is sprayed from the nozzle.

[0012] Based on the above scheme, the preferred protective device includes a protective cover, two guide rails fixed on the upper end plate and located on both sides of the through hole, and a drive cylinder. The cylinder body of the drive cylinder is fixed on the upper end plate, a proximity switch is fixedly installed on the cylinder body, and the piston rod of the drive cylinder is fixedly connected to the protective cover.

[0013] A photoresist coating and developing machine includes a machine base with two coating stations and a gap between them. A robotic arm holds a nozzle and positions it at the gap, which is the initial position of the nozzle. A photoresist nozzle moisturizing and cleaning device is fixedly installed at the initial position. When the nozzle is in the initial position, the nozzle is inserted into the through hole of the photoresist nozzle moisturizing and cleaning device and extends into the housing.

[0014] The present invention has the following technical advantages: During use, the robotic arm lifts the nozzle upwards, detaches it from the housing, and moves it horizontally to directly above the center of one of the wafers. The nozzle then descends to the designated height and begins spraying the photoresist. The wafer rotates, evenly coating the surface of the wafer with photoresist. The nozzle then rises, moves horizontally, and descends again to insert into the through-hole and completes its reset, allowing the nozzle to be inserted into the photoresist inside the housing. This keeps the nozzle moist and prevents the photoresist from evaporating and contaminating the nozzle, thus preventing the formation of particles on the nozzle and maintaining its moisture and cleanliness.

[0015] A fixed tube is located at the center of the bottom of the chamber and is closed at the bottom. The fixed tube is connected to the inside of the chamber. A pressure sensor is installed on the fixed tube to avoid interference from the flow of liquid during the photoresist injection process.

[0016] By designing a protective cover, the through holes on the upper plate of the enclosure can be covered during adhesive spraying, thereby preventing the photoresist inside the enclosure from being contaminated and ensuring quality. Attached Figure Description

[0017] Figure 1 This is a schematic diagram of an existing coating and developing machine; Figure 2 This is a structural schematic diagram of Example 1; Figure 3 This is a schematic diagram of the photoresist nozzle moisturizing and cleaning device in Example 1; Figure 4 This is a schematic diagram of the interaction between a photoresist nozzle moisturizing and cleaning device and a machine in Example 2; Figure 5 This is a schematic diagram of the structure of a photoresist nozzle moisturizing and cleaning device in Example 2; Figure 6 This is a schematic diagram of the interaction between another photoresist nozzle moisturizing and cleaning device and the machine in Example 2; Figure 7 This is a schematic diagram of another photoresist nozzle moisturizing and cleaning device in Example 2. Figure 8 This is a structural schematic diagram of Example 4. Detailed Implementation

[0018] To further understand this utility model, the following detailed description is provided in conjunction with embodiments. However, this is not intended to limit the scope of the utility model. It should be understood that these descriptions are only for further illustrating the features and advantages of the utility model, and not for limiting the scope of the claims. Any equivalent substitutions made in the art based on the disclosure of this utility model are within the protection scope of this utility model.

[0019] like Figure 1 As shown, a coating and developing machine specifically includes a machine base 1, which has two coating stations 2 and a gap 3 between the two coating stations. A robotic arm 4 holds a nozzle 5 so that the nozzle is located at the gap, which is the initial position of the nozzle.

[0020] Example 1, as Figure 1-3 As shown, a photoresist nozzle moisturizing and cleaning device is fixedly installed in the initial position. The photoresist nozzle moisturizing and cleaning device includes a housing 6 for filling with photoresist. The upper plate of the housing has a through hole 7. The diameter of the through hole is at least not less than the outer diameter of the nozzle. A photoresist replenishment tube 8 is fixedly installed at the bottom of the housing. The photoresist replenishment tube is connected to a control valve 9. The control valve is connected to a photoresist source. When the nozzle is in the initial position, the nozzle is inserted into the through hole of the photoresist nozzle moisturizing and cleaning device and extends into the housing.

[0021] The photoresist source includes a photoresist storage tank and a pump connected to the photoresist storage tank via a pipeline. The pump is connected to a valve via a pipeline. The photoresist storage tank can be placed at any position on the machine. The photoresist storage tank, pump, and valve are not shown in the figure.

[0022] During use, the robotic arm 4 drives the nozzle to rise and detach from the housing, and moves horizontally to directly above the center of one of the wafers 10. The nozzle 5 descends to the designated height and begins to spray photoresist. The wafer 10 rotates to evenly coat the photoresist on the surface of the wafer. The nozzle then rises, moves horizontally, and descends to insert into the through hole to complete the reset, so that the nozzle is inserted into the photoresist in the housing. This keeps the nozzle moist and prevents the photoresist from evaporating and contaminating the nozzle, thus forming particles on the nozzle and playing a role in moisturizing and keeping it clean.

[0023] The amount of photoresist inside the housing 6 is relatively small, and the size and depth of the housing are relatively small. However, the nozzle is relatively high from the table surface of the machine. Therefore, the bracket 11 is fixedly installed on the machine, and the housing 6 is fixedly installed on the bracket 11.

[0024] Example 2: Due to wear and tear on the photolithography machines stored in the box in the workshop, to prevent the internal liquid level from becoming too low and thus failing to keep the nozzles moist, the following design is made based on Example 1: Figure 4-5 As shown, the moisturizing and cleaning device is also used as a detection device to detect the amount of photoresist inside the chamber. The detection device is electrically connected to the control valve 9.

[0025] The detection device is a pressure sensor 12 installed on the photoresist replenishment tube. When the pressure sensor detects a value lower than the threshold, the control valve 9 opens to inject photoresist into the chamber.

[0026] Since the photoresist is injected from the photoresist supply tube, the flow of liquid during the injection process can interfere with the pressure sensor. To avoid this interference, the pressure sensor can be kept off during photoresist injection, or the pressure sensor can be installed elsewhere, such as... Figure 6-7 As shown, the detection device includes a fixed tube 13 with its upper end fixedly installed at the center of the bottom of the box and its lower end closed. The fixed tube is connected to the inside of the box, and a pressure sensor 12 is installed on the fixed tube.

[0027] In Example 3, during nozzle operation, the through-hole is exposed. Although this time is short, a protective device is designed as an optimization to ensure quality. This optimization is not essential. The specific details of the optimization are: designing a protective device to cover the through-hole when the nozzle is spraying adhesive. The protective device includes a protective cover, two guide rails fixed to the upper end plate and located on both sides of the through-hole, and a drive cylinder. The cylinder body of the drive cylinder is fixed to the upper end plate, a proximity switch is fixedly installed on the cylinder body, and the piston rod of the drive cylinder is fixedly connected to the protective cover.

[0028] The protective cover is preferably hemispherical, and can be either solid or hollow (bowl-shaped). Its sides slide with the guide rail through connectors, and its bottom contacts the upper surface of the upper plate.

[0029] When the nozzle sprays adhesive, the drive cylinder drives the protective cover to move directly above the through hole, covering the through hole and preventing impurities from entering it.

[0030] Example 4, as Figure 8 As shown, to ensure the temperature of the photoresist inside the chamber, the chamber is designed as follows: A temperature sensor 14 is fixedly installed on the upper plate of the chamber. The probe of the temperature sensor extends into the chamber and contacts the photoresist. A cooling medium pipe 15 and an electric heating element 16 are fixedly installed inside the chamber. The two ends of the cooling medium pipe extend from opposite side walls of the chamber, and the cooling medium pipe is sealed to the side walls of the chamber. One end of the cooling medium pipe is connected to the cooling medium tank through a cooling medium control valve, and the other end is connected to a storage tank. The cooling medium can be cooling water. The temperature of the photoresist needs to be controlled at 23℃, therefore, the temperature of the cooling water needs to be below 20℃, typically 10-15℃ is preferable. One end of the electric heating element extends out of the chamber and is sealed to the side wall of the chamber. The temperature sensor, electric heating element, control valve, and control system are electrically connected. Multiple temperature sensors are evenly distributed around a through-hole.

[0031] During use, the temperature sensor is used to monitor the temperature of the photoresist inside the chamber in real time and transmits the data to the control system. The control system calculates the average value of multiple sensors and compares this average value with the temperature that the photoresist needs to be controlled for. If it is lower than the threshold ±0.5℃, the electric heating tube is activated to heat the photoresist. When the photoresist reaches 23℃, the electric heating tube is turned off. Conversely, if the average value is higher than the threshold ±0.5℃, the control valve is opened to continuously supply cooling water to the cold medium pipeline. When the photoresist reaches 23℃, the control valve is turned off.

[0032] The preferred embodiments of this utility model have been described in detail above. However, it should be understood that the above description is for illustrative purposes only and does not constitute any limitation on the scope of this utility model. Those skilled in the art can make substitutions or changes to certain features of this utility model without departing from the spirit and scope of this utility model, and such substitutions or changes should be considered to fall within the protection scope of the claims of this utility model.

Claims

1. A photoresist nozzle moisturizing and cleaning device, characterized in that, It includes a housing for filling with photoresist, the upper plate of the housing has a through hole with a diameter at least not less than the outer diameter of the nozzle, and a photoresist replenishment tube is fixedly installed at the bottom of the housing. The photoresist replenishment tube is connected to a control valve, and the control valve is connected to a photoresist source.

2. The photoresist nozzle moisturizing and cleaning device as described in claim 1, characterized in that, It also includes a detection device for detecting the amount of photoresist inside the chamber, which is electrically connected to the control valve.

3. The photoresist nozzle moisturizing and cleaning device as described in claim 1, characterized in that, The detection device is a pressure sensor installed on the photoresist replenishment tube.

4. The photoresist nozzle moisturizing and cleaning device as described in claim 1, characterized in that, The detection device includes a fixed tube that is fixedly installed at the center of the bottom of the box and closed at the bottom. The fixed tube is connected to the inside of the box and a pressure sensor is installed on the fixed tube.

5. The photoresist nozzle moisturizing and cleaning device as described in claim 1, characterized in that, The photoresist source includes a photoresist storage tank and a pump connected to the photoresist storage tank via a pipeline, with the pump connected to a valve via a pipeline.

6. The photoresist nozzle moisturizing and cleaning device as described in claim 1, characterized in that, It also includes a protective device for covering the through-hole when the adhesive is sprayed from the nozzle.

7. The photoresist nozzle moisturizing and cleaning device as described in claim 6, characterized in that, The protective device includes a protective cover, two guide rails fixed on the upper end plate and located on both sides of the through hole, and a drive cylinder. The cylinder body of the drive cylinder is fixed on the upper end plate, and a proximity switch is fixedly installed on the cylinder body. The piston rod of the drive cylinder is fixedly connected to the protective cover.

8. A coating and developing machine, comprising a machine base, the machine base having two coating stations with a gap between the two coating stations, a robotic arm gripping a nozzle and positioning the nozzle at the gap, the gap being the initial position of the nozzle, characterized in that, The photoresist nozzle moisturizing and cleaning device as described in any one of claims 1-7 is fixedly installed in the initial position. When the nozzle is in the initial position, the nozzle is inserted into the through hole of the photoresist nozzle moisturizing and cleaning device and extends into the housing.

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