A photovoltaic silicon wafer cleaning system
Patent Information
- Application Number
- CN202522152293.1
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2025-10-11
- Publication Date
- 2026-09-15
- Estimated Expiration
- 2035-10-11
AI Technical Summary
[0005]为了有助于解决相关技术中清洗系统在使用过程中，药液在清洗箱平面顶部边缘处，由于表面张力以及药液与固体壁面的接触角作用，使得药液在达到理论溢流高度时不会立即溢出，导致药液内的脏污延迟溢出至副槽内，随着反应时间的推移，清洗箱内硅酸盐浓度将逐渐增加，药液粘稠度也将同步升高，降低光伏硅片在药液中的反应速率的问题，本申请提供的一种光伏硅片清洗系统，采用如下的技术方案：包括箱体，所述箱体内设有清洗箱，装载光伏硅片的花篮架设在所述清洗箱内，所述清洗箱与箱体内壁之间设有副槽，所述清洗箱的顶端面设有开口，所述开口处设有若干供药液通过的导流板导流板，所述箱体上设有用于使药液在副槽和清洗箱内循环的循环装置
[0015] In summary, this application has the following beneficial technical effects: A quantitative amount of chemical solution is injected into the cleaning tank, the circulation device is started, the chemical solution is extracted from the auxiliary tank and re-injected into the cleaning tank, so as to achieve uniform mixing of the chemical solution. Then, a basket containing photovoltaic silicon wafers is placed in the tank, and the photovoltaic silicon wafers react with the chemical solution. The dirt generated after the reaction overflows quickly into the auxiliary tank through the guide plate, making it easier for the chemical solution to overcome the limitation of surface tension and achieve a fast and stable overflow effect. The chemical solution and dirt can be discharged in time, reducing the possibility of long-term retention in the cleaning tank and improving the reaction rate of photovoltaic silicon wafers in the chemical solution.
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Figure CN224749642U_ABST
Abstract
Description
Technical Field
[0001] This application relates to the field of photovoltaic cleaning technology, and in particular to a photovoltaic silicon wafer cleaning system. Background Technology
[0002] Photovoltaic silicon wafers are thin-film semiconductor materials formed by a series of processes, such as ingot casting, crystal pulling, and cutting, from high-purity polycrystalline silicon. They occupy a key position in the photovoltaic industry.
[0003] In the fabrication process of photovoltaic silicon wafers, the wafers mounted on baskets need to be wet-cleaned. Related technologies utilize a cleaning system comprising a housing containing a cleaning tank. A cleaning solution is injected into the cleaning tank, and the basket containing the photovoltaic silicon wafers is immersed in the solution. The top of the cleaning tank is flat, and one side of the tank is connected to a secondary tank. The cleaning solution overflows from the top of the cleaning tank into the secondary tank, and then a circulation pump continuously re-injects the solution from the secondary tank into the cleaning tank, thus achieving continuous cleaning of the photovoltaic silicon wafers.
[0004] During the operation of the above-mentioned cleaning system, due to surface tension and the contact angle between the liquid and the solid wall, the liquid does not overflow immediately when it reaches the theoretical overflow height at the top edge of the cleaning tank. This causes the dirt in the liquid to overflow into the secondary tank with a delay. As the reaction time progresses, the silicate concentration in the cleaning tank will gradually increase, and the viscosity of the liquid will also increase accordingly, reducing the reaction rate of the photovoltaic silicon wafer in the liquid. Summary of the Invention
[0005] To address the problem in related technologies where, during the use of cleaning systems, the cleaning solution at the top edge of the cleaning tank does not immediately overflow upon reaching the theoretical overflow height due to surface tension and the contact angle between the solution and the solid wall, resulting in delayed overflow of contaminants into the secondary tank, and with the passage of reaction time, the silicate concentration and viscosity of the solution gradually increase, reducing the reaction rate of photovoltaic silicon wafers in the solution, this application provides a photovoltaic silicon wafer cleaning system with the following technical solution: It includes a housing, within which a cleaning tank is located, a basket for loading photovoltaic silicon wafers is mounted inside the cleaning tank, a secondary tank is provided between the cleaning tank and the inner wall of the housing, an opening is provided on the top surface of the cleaning tank, and several guide plates are provided at the opening to allow the solution to pass through, and a circulation device is provided on the housing to circulate the solution within the secondary tank and the cleaning tank.
[0006] In one specific implementation scheme, a liquid extraction pipe is connected to the wall of the auxiliary tank, a circulation pipe is connected to the cleaning tank, and a liquid extraction pump is provided on the tank body. The inlet end of the liquid extraction pump is connected to the liquid extraction pipe, and the outlet end of the liquid extraction pump is connected to the circulation pipe.
[0007] In one specific implementation scheme, the cleaning tank is connected to a bubbling tube, and the end of the bubbling tube facing away from the cleaning tank is connected to a nitrogen tank. The bubbling tube has several bubbling holes.
[0008] In one specific implementation, the housing and cleaning tank are arranged at an angle toward the circulation device.
[0009] In one specific implementation scheme, the bottom of the cleaning tank is connected to a fixed drain pipe, and the connection port between the fixed drain pipe and the cleaning tank is located at one end near the circulation device. The fixed drain pipe is equipped with a control valve to control the opening and closing of the fixed drain pipe.
[0010] In one specific implementation, the circulation tube is provided with a heater for heating the liquid medicine inside the circulation tube.
[0011] In one specific implementation scheme, the tank is equipped with a level gauge for detecting the liquid level in the secondary tank.
[0012] In one specific implementation scheme, a liquid outlet pipe is connected to the end face of the box near the circulation device, and a liquid pumping device is connected to the end of the liquid outlet pipe away from the box.
[0013] In one specific implementation, the outlet pipe includes a first pipe connected to the housing and a second pipe connected to the liquid extraction end of the extraction device. A concave pipe connects the first pipe and the second pipe, and both the first pipe and the second pipe are higher than the concave pipe.
[0014] In one specific implementation scheme, a cover plate is hinged to the opening of the box, and the end face of the cover plate facing away from the cleaning box is provided with several reinforcing ribs.
[0015] In summary, this application has the following beneficial technical effects: A quantitative amount of chemical solution is injected into the cleaning tank, the circulation device is started, the chemical solution is extracted from the auxiliary tank and re-injected into the cleaning tank, so as to achieve uniform mixing of the chemical solution. Then, a basket containing photovoltaic silicon wafers is placed in the tank, and the photovoltaic silicon wafers react with the chemical solution. The dirt generated after the reaction overflows quickly into the auxiliary tank through the guide plate, making it easier for the chemical solution to overcome the limitation of surface tension and achieve a fast and stable overflow effect. The chemical solution and dirt can be discharged in time, reducing the possibility of long-term retention in the cleaning tank and improving the reaction rate of photovoltaic silicon wafers in the chemical solution. Attached Figure Description
[0016] Figure 1 This is a schematic diagram of the overall structure of an embodiment of this application.
[0017] Figure 2 This is a schematic diagram illustrating the structure of the bubbling tube in the embodiments of this application.
[0018] Figure 3This is a structural schematic diagram used in the embodiments of this application to illustrate the degree of inclination of the bottom surface of the box.
[0019] Reference numerals: 1. Box body; 2. Cleaning box; 3. Flower basket; 4. Secondary tank; 5. Guide plate; 6. Liquid extraction pipe; 7. Circulation pipe; 8. Bubble tube; 9. Fixed discharge pipe; 10. Heater; 11. Liquid level gauge; 12. Liquid outlet pipe; 13. First pipe; 14. Second pipe; 15. Concave pipe; 16. Cover plate; 17. Reinforcing rib; 18. Circulation device. Detailed Implementation
[0020] The following is in conjunction with the appendix Figure 1-3 This application will be described in further detail.
[0021] This application discloses a photovoltaic silicon wafer cleaning system.
[0022] Reference Figure 1 and Figure 2 The photovoltaic silicon wafer cleaning system includes a housing 1. A cover plate 16 is hinged to the opening of the housing 1. Several reinforcing ribs 17 are fixedly connected to the end face of the cover plate 16 away from the cleaning tank 2. In this embodiment, there are two cover plates 16. The two cover plates 16 close to cover the opening of the housing 1. The reinforcing ribs 17 enhance the structural rigidity of the cover plate 16 and facilitate the operator to grasp the reinforcing ribs 17 to open the cover plate 16. A cleaning tank 2 is provided inside the housing 1. In this embodiment, the cleaning tank 2 and the bottom of the housing 1 share a base plate. A basket 3 for loading photovoltaic silicon wafers is mounted on the support frame of the cleaning tank 2. A secondary trough 4 is provided between the cleaning tank 2 and the inner wall of the housing 1. The secondary trough 4 surrounds the cleaning tank 2. A guide plate 5 is fixedly connected to the top surface of the cleaning tank 2. In this embodiment, the guide plate 5 is wavy. A circulation device 18 is provided on the housing 1 to circulate the cleaning solution in the secondary trough 4 and the cleaning tank 2.
[0023] Therefore, a measured amount of chemical solution is injected into the cleaning tank 2, and the circulation device 18 is started to extract the chemical solution from the auxiliary tank 4 and re-inject it into the cleaning tank 2 to achieve uniform mixing of the chemical solution. Then, the basket 3 containing photovoltaic silicon wafers is placed in, and the photovoltaic silicon wafers and the chemical solution begin to react. The dirt generated after the reaction is quickly overflowed into the auxiliary tank 4 through the guide plate 5, making it easier for the chemical solution to overcome the limitation of surface tension and achieve a fast and stable overflow effect. The chemical solution and dirt can be discharged in time, reducing the possibility of long-term retention in the cleaning tank 2 and improving the reaction rate of the photovoltaic silicon wafers in the chemical solution.
[0024] Reference Figure 1 and Figure 2The auxiliary tank 4 has a suction pipe 6 connected to its wall, and the cleaning tank 2 has a circulation pipe 7 connected to it. A suction pump is installed on the tank body 1. Several through holes connected to the auxiliary tank 4 are opened on the side wall of the cleaning tank 2. The inlet end of the suction pump is connected to the suction pipe 6, and the outlet end of the suction pump is connected to the circulation pipe 7. Therefore, when the suction pump is started, the medicine is drawn from the auxiliary tank 4 through the suction pipe 6 and reinjected into the cleaning tank 2 through the circulation pipe 7. In this embodiment, three flower baskets 3 are placed in the cleaning tank 2 as an example, so the number of circulation pipes 7 is set to three, and the number of suction pipes 6 is set to two at the bottom of the tank body 1. The number and position of the circulation pipes 7 and the suction pipes 6 can be set according to the actual situation on site, and are not limited here.
[0025] Reference Figure 1 and Figure 2 The cleaning tank 2 is connected to a bubbling tube 8, with a nitrogen tank connected to the end of the bubbling tube 8 away from the cleaning tank 2. The bubbling tube 8 has several bubbling holes. Before the flower basket 3 is placed into the cleaning tank 2, nitrogen is injected into the cleaning tank 2 through the bubbling tube 8, ensuring thorough mixing of the chemical solution and achieving rapid mixing. After the flower basket 3 is placed in the chemical solution for reaction, nitrogen is injected into the cleaning tank 2 through the bubbling tube 8 according to the reaction situation, causing the chemical solution in the cleaning tank 2 to flow and carrying away the precipitate produced by the reaction between the chemical solution and the photovoltaic silicon wafer, improving the reaction effect of the photovoltaic silicon wafer. A heater 10 is installed on the circulation pipe 7 for heating the chemical solution within the circulation pipe 7. When heating of the chemical solution is required, the heater 10 is activated to heat the chemical solution in the circulation pipe 7, allowing the heated chemical solution to be injected into the cleaning tank 2. A flow sensor can also be installed on the circulation pipe 7 according to the actual site conditions, with the flow sensor installed between the heater 10 and the tank 1. The tank 1 is equipped with a level gauge 11 for detecting the liquid level in the auxiliary tank 4. The external level gauge 11 allows the operator to visually observe the liquid level in the auxiliary tank 4.
[0026] Reference Figure 1 and Figure 3The tank 1 and the cleaning tank 2 are inclined toward the circulation device 18. In this embodiment, the inclination angle α is 0.5-5°, preferably 1.5°. Due to the inclined structure of the bottom of the tank 1 and the cleaning tank 2, the liquid solution generates a relatively stable liquid flow direction, reducing the generation of local eddies. Regional eddies easily deposit silicates. The bottom of the cleaning tank 2 is connected to a fixed drain pipe 9, and the connection port between the fixed drain pipe 9 and the cleaning tank 2 is located at one end near the circulation device 18. A control valve is installed on the fixed drain pipe 9 to control the opening and closing of the fixed drain pipe 9. When the silicates in the cleaning tank 2 accumulate to a certain extent as the reaction time progresses, due to the inclined structure of the bottom of the tank 1 and the cleaning tank 2, the deposited silicates will accumulate at the lower part of the cleaning tank 2. The control valve is activated to keep the fixed drain pipe 9 unobstructed, and the silicates deposited in the cleaning tank 2 are discharged from the tank 1. Some of the silicates flowing into the auxiliary tank 4 are sucked out by a pump in the prior art and discharged from the cleaning system through the pump outlet. These two discharge methods can be freely combined according to the concentration of the chemical solution as the number of flower baskets being cleaned increases to achieve the purpose of step-by-step discharge, maximizing the discharge of silicates from the tank and improving the utilization efficiency of the chemical solution.
[0027] Reference Figure 1 and Figure 2 A liquid outlet pipe 12 is connected to the end face of the tank 1 near the circulation device 18. The end of the liquid outlet pipe 12 away from the tank 1 is connected to a liquid extraction device, which can be a liquid extraction pump in the prior art. The liquid outlet pipe 12 includes a first pipe 13 connected to the tank 1 and a second pipe 14 connected to the liquid extraction end of the liquid extraction device. A concave pipe 15 is connected between the first pipe 13 and the second pipe 14. Both the first pipe 13 and the second pipe 14 are higher than the concave pipe 15. In this embodiment, the first pipe 13, the second pipe 14 and the concave pipe 15 form a U-shaped pipe. When it is necessary to extract the waste liquid from the tank 1 after the reaction, the liquid extraction device is started. The waste liquid is discharged from the outlet of the liquid extraction device after passing through the first pipe 13, the concave pipe 15 and the second pipe 14. Since both the first pipe 13 and the second pipe 14 are higher than the concave pipe 15, a small amount of waste liquid will remain in the concave pipe 15, reducing the possibility of waste liquid flowing back into the tank 1 from the first pipe 13.
[0028] The implementation principle of this application embodiment is as follows: A quantitative chemical solution is injected into the cleaning tank 2, the liquid pump is started, the chemical solution is drawn from the auxiliary tank 4 through the liquid extraction pipe 6 and reinjected into the cleaning tank 2 through the circulation pipe 7, the nitrogen tank is turned on and nitrogen is injected into the cleaning tank 2 through the bubble pipe 8, so that the chemical solution in the cleaning tank 2 is fully stirred and the chemical solution is quickly mixed; then the basket 3 containing photovoltaic silicon wafers is placed in, and the photovoltaic silicon wafers and the chemical solution begin to react. During this process, due to the inclined structure of the bottom of the tank 1 and the cleaning tank 2, the chemical solution generates a relatively stable liquid flow direction, reducing the generation of local eddies and reducing the deposition of silicates. The dirt generated after the reaction is quickly overflowed into the auxiliary tank 4 through the guide plate 5, which improves the uniformity of wet etching of photovoltaic silicon wafers. When the silicate in the cleaning tank 2 accumulates to a certain level over time, due to the inclined structure of the tank body 1 and the bottom of the cleaning tank 2, the deposited silicate will accumulate at the lower part of the cleaning tank 2. The control valve is activated to keep the drain pipe 9 unobstructed, allowing the deposited silicate in the cleaning tank 2 to be discharged from the tank body 1. Some of the silicate flowing into the auxiliary tank 4 is drawn out by a pump using existing technology and discharged from the cleaning system through the pump outlet, maximizing the discharge of silicate from the tank and improving the utilization efficiency of the cleaning solution. The corrugated guide plate 5 makes it easier for the cleaning solution to overcome the surface tension limitation, achieving a rapid and stable overflow effect. The cleaning solution and dirt can be discharged in a timely manner, reducing the possibility of prolonged retention in the cleaning tank 2, inhibiting the increase of silicate concentration in the cleaning tank 2, and increasing the reaction rate of the photovoltaic silicon wafer in the cleaning solution.
[0029] This specific embodiment is merely an explanation of the present invention and is not intended to limit the invention. After reading this specification, those skilled in the art can make modifications to this embodiment without contributing any inventive step, but such modifications are protected by patent law as long as they are within the scope of the claims of the present invention.
Claims
1. A photovoltaic silicon wafer cleaning system, characterized in that: The device includes a housing (1), a cleaning tank (2) is provided inside the housing (1), a basket (3) for loading photovoltaic silicon wafers is placed inside the cleaning tank (2), a secondary trough (4) is provided between the cleaning tank (2) and the inner wall of the housing (1), the top surface of the cleaning tank (2) is provided with an opening, and a number of guide plates (5) for the liquid to pass through are provided at the opening, and a circulation device (18) is provided on the housing (1) for circulating the liquid in the secondary trough (4) and the cleaning tank (2).
2. The photovoltaic silicon wafer cleaning system according to claim 1, characterized in that: The auxiliary tank (4) is connected to a liquid extraction pipe (6) on its wall, the cleaning tank (2) is connected to a circulation pipe (7), and the tank body (1) is equipped with a liquid extraction pump. The inlet end of the liquid extraction pump is connected to the liquid extraction pipe (6), and the outlet end of the liquid extraction pump is connected to the circulation pipe (7).
3. The photovoltaic silicon wafer cleaning system according to claim 1, characterized in that: The cleaning tank (2) is connected to a bubbling tube (8), and the end of the bubbling tube (8) away from the cleaning tank (2) is connected to a nitrogen tank. The bubbling tube (8) has several bubbling holes.
4. The photovoltaic silicon wafer cleaning system according to claim 1, characterized in that: The box (1) and the cleaning box (2) are inclined toward the circulation device (18).
5. The photovoltaic silicon wafer cleaning system according to claim 4, characterized in that: The bottom of the cleaning tank (2) is connected to a fixed drain pipe (9), and the connection port between the fixed drain pipe (9) and the cleaning tank (2) is located at one end near the circulation device (18). The fixed drain pipe (9) is provided with a control valve to control the opening and closing of the fixed drain pipe (9).
6. The photovoltaic silicon wafer cleaning system according to claim 2, characterized in that: The circulation pipe (7) is equipped with a heater (10) for heating the liquid medicine inside the circulation pipe (7).
7. The photovoltaic silicon wafer cleaning system according to claim 1, characterized in that: The box (1) is equipped with a level gauge (11) for detecting the liquid level in the auxiliary tank (4).
8. The photovoltaic silicon wafer cleaning system according to claim 1, characterized in that: A liquid outlet pipe (12) is connected to the end face of the box (1) near the circulation device (18), and a liquid pumping device is connected to the end of the liquid outlet pipe (12) away from the box (1).
9. The photovoltaic silicon wafer cleaning system according to claim 8, characterized in that: The outlet pipe (12) includes a first pipe (13) connected to the housing (1) and a second pipe (14) connected to the liquid extraction end of the liquid extraction device. A concave pipe (15) connects the first pipe (13) and the second pipe (14), and both the first pipe (13) and the second pipe (14) are higher than the concave pipe (15).
10. The photovoltaic silicon wafer cleaning system according to claim 1, characterized in that: The opening of the box (1) is hinged with a cover plate (16), and the end face of the cover plate (16) facing away from the cleaning box (2) is provided with several reinforcing ribs (17).