Semiconductor silicon electrode pickling tank

Abstract

This utility model relates to an acid pickling tank for semiconductor silicon electrodes, belonging to the field of silicon electrode cleaning technology. It mainly includes a chemical treatment tank, a partition, a lower tube, an acid pump, a polytetrafluoroethylene (PTFE) filter bag, an upper pump, and an acid pickling frame. The chemical treatment tank is divided into a cleaning tank, a storage chamber, a filtration chamber, and a clearing chamber. During operation, the acid pump delivers the acid from the storage chamber to the filtration chamber for filtration. The PTFE filter bag filters impurities from the acid. The upper pump pump pumps the filtered clearing into the cleaning tank. The workpiece is placed into the cleaning tank using the acid pickling frame. After soaking and pickling, the acid is slowly discharged into the storage chamber. During the discharge process, the liquid level in the cleaning tank slowly decreases, and the silicon electrode surface becomes hydrophobic, effectively reducing liquid residue on the silicon electrode surface and ensuring no watermark residue after drying; thus guaranteeing product quality. The acid is filtered through the PTFE filter bag, ensuring the cleaning effect and effectively improving product quality.

Description

Technical Field

[0001] This utility model belongs to the field of silicon electrode cleaning technology, specifically relating to a pickling tank for semiconductor silicon electrodes. Background Technology

[0002] After etching, the surface of silicon electrodes is hydrophilic, and watermarks are easily left on the surface during drying. Therefore, HF (hydrofluoric acid) cleaning is necessary to make the surface hydrophobic. HF cleaning of silicon wafers is a key process in semiconductor manufacturing and the photovoltaic industry. Its core function is to remove the oxide layer on the silicon wafer surface while selectively etching the silicon substrate. Traditional acid baths are single-tank structures, resulting in significant liquid residue on the silicon electrodes upon removal from the bath. After the solution dries, residual watermarks form, affecting product quality. Summary of the Invention

[0003] In order to overcome the problems in the background technology where the traditional acid tank is a single tank structure, the silicon electrode is seriously covered with liquid when it leaves the tank, and residual watermarks are formed after the solution dries, which affects the product quality, this utility model provides a semiconductor silicon electrode acid washing tank.

[0004] To achieve the above objectives, this utility model is implemented through the following technical solution: The pickling tank for semiconductor silicon electrodes mainly includes a chemical treatment tank 1, a partition 2, a lower liquid pipe 3, an acid pump 4, a polytetrafluoroethylene filter bag 5, an upper liquid pump 6, and a pickling frame 7. The chemical treatment tank 1 is divided by the partition 2 to form a cleaning tank 11, a storage chamber 12, a filtration chamber 13, and a clearing chamber 14. The storage chamber 12 and the filtration chamber 13 are located at the bottom of the chemical treatment tank 1, the clearing chamber 14 is located above the filtration chamber 13, and the cleaning tank 11 is located at the top of the chemical treatment tank 1. The bottom of the cleaning tank 11 is connected to the storage chamber 12 via the lower pipe 3, which is equipped with a valve. The storage chamber 12 is connected to the filter chamber 13 via the acid pump 4 and the liquid transfer pipe. The filter chamber 13 is connected to the clear liquid chamber 14 via the connecting hole 15. The polytetrafluoroethylene filter bag 5 is installed on the connecting hole 15 and is located inside the filter chamber 13. The clear liquid chamber 14 is connected to the cleaning tank 11 via the upper pump 6 and the upper pipe 16, which is equipped with a valve. The pickling frame 7 is detachably installed inside the cleaning tank 11. The pickling frame 7 is evenly provided with water inlets.

[0005] Furthermore, the cleaning tank 11 is provided with an annular liquid distribution pipe 17, which is connected to the upper liquid pipe 16, and the bottom of the annular liquid distribution pipe 17 is provided with liquid outlet holes evenly distributed.

[0006] Furthermore, a control box 8 is installed on the side wall of the drug treatment tank 1, a controller 81 is installed inside the control box 8, and a control panel 82 is installed on the control box 8; the control panel 82 is connected to the controller 81, and the controller 81 is connected to the acid pump 4, the liquid pump 6 and various valves.

[0007] Furthermore, the polytetrafluoroethylene filter bag 5 is installed in 2 to 5 units.

[0008] Furthermore, the cleaning tank 11 is provided with a cover plate 18, and a lifting ring 19 for easy operation is installed on the cover plate 18. The pickling frame 7 is provided with a lifting lug 20 for easy operation.

[0009] Furthermore, the bottom of the cleaning tank 11 has a conical structure to facilitate liquid discharge.

[0010] Furthermore, the clear liquid chamber 14 is provided with a backwash pipe 21, and the backwash pipe 21 is provided with a valve.

[0011] Furthermore, both the liquid storage chamber 12 and the filter chamber 13 are provided with a drain pipe 22 at the bottom, and a valve is provided on the drain pipe 22.

[0012] The beneficial effects of this utility model are: This invention features a chemical treatment tank divided into a cleaning tank, a storage chamber, a filtration chamber, and a clearing chamber. During operation, impurities in the acid solution are filtered through a polytetrafluoroethylene (PTFE) filter bag. The filtered clearing liquid is pumped into the cleaning tank via an upper pump. After the workpiece is immersed and pickled, the acid solution is slowly discharged into the storage chamber. During the discharge process, the liquid level in the cleaning tank gradually decreases, resulting in a hydrophobic state on the silicon electrode surface. This effectively reduces liquid residue on the silicon electrode surface, ensuring no watermarks remain after drying and guaranteeing product quality. The PTFE filter bag ensures effective cleaning and improves product quality. Attached Figure Description

[0013] Figure 1 This is a cross-sectional structural diagram of the present invention.

[0014] Figure 2 This is a three-dimensional schematic diagram of the present invention.

[0015] Figure 3 This is a three-dimensional schematic diagram of the acid-free washing frame of this utility model.

[0016] Figure 4 This is a three-dimensional schematic diagram of the pickling frame of this utility model. Detailed Implementation

[0017] To make the objectives, technical solutions, and beneficial effects of this utility model clearer, the preferred embodiments of this utility model will be described in detail below with reference to the accompanying drawings, so as to facilitate the understanding of those skilled in the art.

[0018] This utility model discloses a pickling tank for semiconductor silicon electrodes. The pickling tank mainly includes a chemical treatment tank 1, a partition 2, a lower tube 3, an acid pump 4, a polytetrafluoroethylene (PTFE) filter bag 5, an upper pump 6, and a pickling frame 7. The chemical treatment tank 1 is divided by the partition 2 to form a cleaning tank 11, a storage chamber 12, a filtration chamber 13, and a clearing chamber 14. The storage chamber 12 and the filtration chamber 13 are located at the bottom of the chemical treatment tank 1, and the clearing chamber 14 is located above the filtration chamber 13. The cleaning tank 11 is located at the top of the chemical treatment tank 1. The bottom of the cleaning tank 11 is connected to the storage chamber 12 via the lower tube 3, which is equipped with a valve. The storage chamber 12 and the filtration chamber 13 are connected via the acid pump 4 and a through-pipe. The filtration chamber 13 and the clearing chamber 14 are connected via a connecting hole 15. The PTFE filter bag 5 is installed in the connecting hole 15 and is located inside the filtration chamber 13. The clear liquid chamber 14 is connected to the cleaning tank 11 via the liquid pump 6 and the liquid pipe 16, and the liquid pipe 16 is equipped with a valve. The pickling frame 7 is detachably installed in the cleaning tank 11. The pickling frame 7 is evenly provided with water outlets. The chemical treatment tank 1 is divided into the cleaning tank 11, the storage chamber 12, the filtration chamber 13, and the clear liquid chamber 14. During operation, the acid in the storage chamber 12 is transported to the filtration chamber 13 for filtration by the acid pump 4. Impurities in the acid are filtered by the polytetrafluoroethylene filter bag 5. The filtered clear liquid is pumped to the cleaning tank 11 by the liquid pump 6. The workpiece is placed into the cleaning tank 11 using the pickling frame 7. After the soaking and pickling process is completed, the acid is slowly discharged into the storage chamber 12. During the discharge process, the liquid level in the cleaning tank 11 drops slowly, and the silicon electrode surface becomes hydrophobic, effectively reducing the liquid carrying phenomenon on the silicon electrode surface and ensuring that there is no watermark residue after drying; thus ensuring product quality. The acid solution is filtered through a polytetrafluoroethylene filter bag 5 to ensure cleaning effectiveness and improve product quality.

[0019] The cleaning tank 11 is equipped with an annular liquid distribution pipe 17, which is connected to the upper liquid pipe 16. The bottom of the annular liquid distribution pipe 17 is evenly provided with liquid outlet holes, which disperse the liquid through the annular liquid distribution pipe 17. At the same time, the liquid outlet holes are designed to face downwards, which effectively avoids the problem of acid splashing.

[0020] A control box 8 is installed on the side wall of the drug treatment tank 1. A controller 81 is installed inside the control box 8, and a control panel 82 is installed on the control box 8. The control panel 82 is connected to the controller 81, and the controller 81 is connected to the acid pump 4, the liquid supply pump 6, and various valves. By operating the control panel 82, the acid pump 4, the liquid supply pump 6, and various valves can be controlled through the controller 81. The operation is simple and convenient, and the safety is high.

[0021] Two to five polytetrafluoroethylene filter bags 5 are installed to improve the filtration speed and filtration effect of acid solution.

[0022] The cleaning tank 11 is equipped with a cover plate 18, and a lifting ring 19 for easy operation is installed on the cover plate 18. The pickling frame 7 is equipped with a lifting lug 20 for easy operation, ensuring safety during the working process.

[0023] The bottom of the cleaning tank 11 has a conical structure to facilitate the discharge of liquid, which makes it easy to drain the acid liquid in the cleaning tank 11.

[0024] The clear liquid chamber 14 is equipped with a backwash pipe 21, which has a valve. The polytetrafluoroethylene filter bag 5 can be cleaned through the backwash pipe 21 to ensure the filtration speed and filtration effect of the acid liquid.

[0025] Both the liquid storage chamber 12 and the filter chamber 13 are equipped with a drain pipe 22 at the bottom, and a valve is provided on the drain pipe 22.

[0026] Work process: Acid in the storage chamber 12 is pumped by acid pump 4 to the filter chamber 13 for filtration. Impurities in the acid are filtered through a polytetrafluoroethylene (PTFE) filter bag 5. The filtered solution is then pumped to the cleaning tank 11 by the top pump 6 and dispersed through the annular distribution pipe 17. The downward-facing outlet design effectively prevents acid splashing. The workpiece is placed in the cleaning tank 11 using the pickling frame 7. After soaking and pickling, the acid is slowly discharged into the storage chamber 12. During the discharge process, the liquid level in the cleaning tank 11 slowly decreases, and the silicon electrode surface becomes hydrophobic, effectively reducing liquid residue on the silicon electrode surface and ensuring no watermarks remain after drying, thus guaranteeing product quality. The acid is filtered through the PTFE filter bag 5 to ensure cleaning effectiveness and improve product quality.

[0027] Finally, it should be noted that the above preferred embodiments are only used to illustrate the technical solution of this utility model and are not intended to limit it. Although the utility model has been described in detail through the above preferred embodiments, those skilled in the art should understand that various changes can be made to it in form and detail without departing from the scope defined by the claims of this utility model.

Claims

1. A pickling tank for semiconductor silicon electrodes, characterized in that: The semiconductor silicon electrode pickling tank includes a chemical treatment tank (1), a partition (2), a lower overnight pipe (3), an acid pump (4), a polytetrafluoroethylene filter bag (5), an upper liquid pump (6), and a pickling frame (7). The chemical treatment tank (1) is divided by the partition (2) to form a cleaning tank (11), a storage chamber (12), a filtration chamber (13), and a clear liquid chamber (14). The storage chamber (12) and the filtration chamber (13) are located at the bottom of the chemical treatment tank (1), the clear liquid chamber (14) is located above the filtration chamber (13), and the cleaning tank (11) is located at the top of the chemical treatment tank (1). The bottom of the cleaning tank (11) is connected by a lower overnight pipe. (3) It is connected to the storage chamber (12). A valve is provided on the lower night pipe (3). The storage chamber (12) and the filter chamber (13) are connected through the acid pump (4) and the liquid pipe. The filter chamber (13) and the clear liquid chamber (14) are connected through the connecting hole (15). The polytetrafluoroethylene filter bag (5) is installed on the connecting hole (15). The polytetrafluoroethylene filter bag (5) is located in the filter chamber (13). The clear liquid chamber (14) is connected to the cleaning tank (11) through the upper liquid pump (6) and the upper liquid pipe (16). A valve is provided on the upper liquid pipe (16). The pickling frame (7) is detachably installed in the cleaning tank (11). Water inlets are evenly provided on the pickling frame (7).

2. The pickling tank for semiconductor silicon electrodes as described in claim 1, characterized in that: The cleaning tank (11) is provided with an annular liquid distribution pipe (17), which is connected to the upper liquid pipe (16). The bottom of the annular liquid distribution pipe (17) is uniformly provided with liquid outlet holes.

3. The pickling tank for semiconductor silicon electrodes as described in claim 1 or 2, characterized in that: A control box (8) is installed on the side wall of the liquid treatment tank (1), a controller (81) is installed inside the control box (8), and a control panel (82) is installed on the control box (8); the control panel (82) is connected to the controller (81), and the controller (81) is connected to the acid pump (4), the liquid pump (6), and each valve.

4. The pickling tank for semiconductor silicon electrodes as described in claim 3, characterized in that: The polytetrafluoroethylene filter bag (5) is installed in 2 to 5 units.

5. The pickling tank for semiconductor silicon electrodes as described in any one of claims 1, 2, and 4, characterized in that: The cleaning tank (11) is provided with a cover plate (18), and a lifting ring (19) for easy operation is installed on the cover plate (18). The pickling frame (7) is provided with a lifting lug (20) for easy operation.

6. The pickling tank for semiconductor silicon electrodes as described in claim 5, characterized in that: The bottom of the cleaning tank (11) is a conical structure to facilitate liquid discharge.

7. The pickling tank for semiconductor silicon electrodes as described in any one of claims 1, 2, 4, and 6, characterized in that: The clear liquid chamber (14) is provided with a backwash pipe (21), and the backwash pipe (21) is provided with a valve.

8. The pickling tank for semiconductor silicon electrodes as described in claim 7, characterized in that: Both the liquid storage chamber (12) and the filter chamber (13) are equipped with drain pipes (22) at the bottom, and valves are provided on the drain pipes (22).

Images