A gas recovery filter device
Patent Information
- Application Number
- CN202522079117.X
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2025-09-26
- Publication Date
- 2026-09-15
- Estimated Expiration
- 2035-09-26
AI Technical Summary
目前通常采用多级过滤装置进行采出天然气的过滤处理,过滤效果一直是技术人员不断改进的目标,同时,过滤出的颗粒杂质和水汽随着时间的积累,需要定期进行排出清理,但是,现有的水汽和杂质的排出清理容易对天然气的正常输送造成影响,甚至需要关断天然气的正常输送才能完成过滤装置内的杂质清除,实现过滤装置的维护,如此不利于天然气采气流程的正常进行
1、本实用新型提供一种采气过滤装置,通过分级过滤机构将罐体内部空间分隔为多个腔室,使从入口至出口的气流依次经过各腔室的过滤分离,其中的水汽和杂质被逐步去除,能够实现较好的滤除效果;
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Figure CN224754385U_ABST
Abstract
Description
Technical Field
[0001] This utility model relates to the field of gas filtration technology, specifically to a gas sampling and filtration device. Background Technology
[0002] During natural gas extraction, the extracted natural gas generally contains some water vapor and particulate impurities. Certain measures are needed to remove the water vapor and larger particles before it can be transported for use. Currently, multi-stage filtration devices are commonly used to filter the extracted natural gas. Filtration efficiency is a continuous goal for technicians. However, the filtered particulate impurities and water vapor accumulate over time and require periodic removal and cleaning. But the current method of removing water vapor and impurities can easily affect the normal transportation of natural gas, sometimes even necessitating the shutdown of normal gas supply to remove impurities from the filtration device and maintain it. This is detrimental to the normal operation of the natural gas extraction process. Utility Model Content
[0003] The purpose of this invention is to overcome the shortcomings of existing technologies, such as the need to further improve the filtration effect of natural gas and the impact of maintenance of the filtration device on the normal operation of the natural gas extraction process, and to provide a gas extraction filtration device.
[0004] This utility model provides a gas sampling and filtration device, comprising: The tank body is equipped with an inlet and an outlet; A graded filtration mechanism includes a primary filter, a secondary filter, a tertiary filter, and a quaternary filter arranged sequentially. The graded filtration mechanism divides the internal space of the tank into a primary chamber, a secondary chamber, a tertiary chamber, and a quaternary chamber that are connected horizontally in sequence. The space behind the quaternary filter is the post-filtration space. The inlet is connected to the top of the primary chamber, and the outlet is connected to the post-filtration space. A partition plate connects the bottom edge of the primary filter, the bottom edge of the secondary filter, and the middle sidewall of the tertiary filter, forming a bottom chamber inside the tank. The bottom chamber is vertically connected to the primary chamber, the secondary chamber, and the tertiary chamber, respectively, and horizontally connected to the tertiary chamber via the tertiary filter. The storage mechanism is connected to the bottom chamber, the fourth-stage chamber and the filtered space via pipes. The pipes are equipped with switch valves, and the storage mechanism is equipped with a discharge pipe with a discharge valve.
[0005] This utility model discloses a gas sampling and filtration device that divides the internal space of the tank into multiple chambers through a graded filtration mechanism. The airflow from the inlet to the outlet passes through each chamber sequentially for filtration and separation, gradually removing water vapor and impurities, resulting in a good filtration effect. Connecting the inlet to the top of the first-stage chamber prevents backflow of water vapor and impurities, allowing the airflow to smoothly enter the first chamber. Simultaneously, a bottom partition plate further divides the airflow into a bottom chamber, where the filtered water vapor and impurities are collected and discharged for temporary storage in a storage mechanism. This gradual removal of filtered water vapor and impurities further improves the filtration effect. Furthermore, during use, the opening and closing states of the on / off valve and the discharge valve can be controlled according to actual conditions, ensuring that the discharge of water vapor and impurities does not affect the normal airflow.
[0006] Preferably, the partition plate includes a first base plate, the height of which gradually decreases along the direction from the inlet to the outlet, and the first base plate connects the bottom edge of the tank body and the secondary filter screen; the first base plate has a first connecting port that penetrates the primary chamber and the bottom chamber, and the first connecting port is vertically connected to the inlet; the first base plate has a second connecting port that penetrates the secondary chamber and the bottom chamber, and the second connecting port is located on the side of the first base plate near the secondary filter screen.
[0007] Preferably, the partition plate further includes a second plate, which connects the first plate and the third-stage filter. The height of the second plate gradually increases along the direction from the inlet to the outlet. The second plate is provided with a third connecting port that passes through the third-stage chamber and the bottom chamber. The third connecting port is located on the side of the second plate near the second-stage filter.
[0008] Preferably, the primary filter screen has a fourth connecting port on the side near the top surface of the tank.
[0009] Preferably, the secondary filter screen has a fifth communication port on the side near the partition base plate.
[0010] Preferably, both the first base plate and the second base plate are mesh structures.
[0011] Preferably, the bottom wall of the bottom chamber corresponding to the first bottom plate is inclined, the height of the bottom wall gradually decreases along the direction from the inlet to the outlet, and the inclination angle of the bottom wall is smaller than the inclination angle of the first bottom plate.
[0012] Preferably, the bottom chamber is provided with a blocking member, the blocking member comprising: The first baffle plate is located below the third-stage chamber, connecting the bottom edge of the tank and the third-stage filter, and its height gradually increases along the direction from the inlet to the outlet; The second barrier plate is coplanar with the third-stage filter screen and connects the bottom edge of the third-stage filter screen to the tank body; The third barrier plate is coplanar with the fourth-stage filter screen and connects the bottom edge of the fourth-stage filter screen to the tank body; The height of the third barrier plate is greater than that of the second barrier plate.
[0013] Preferably, the fourth-stage chamber is provided with a flow guide plate, and the fourth-stage chamber is connected to the storage mechanism through the pipe at the lowest point of the flow guide plate.
[0014] Preferably, the discharge pipe is connected to the bottom of the storage mechanism, and the inner bottom surface of the storage mechanism gradually decreases from the perimeter to the discharge pipe.
[0015] Compared with the prior art, the beneficial effects of this utility model are as follows: 1. This utility model provides a gas sampling and filtration device, which divides the internal space of the tank into multiple chambers through a graded filtration mechanism, so that the airflow from the inlet to the outlet passes through each chamber for filtration and separation in sequence, and the water vapor and impurities are gradually removed, which can achieve a better filtration effect. 2. This utility model provides a gas sampling and filtration device, which, by connecting the inlet to the top of the first-stage chamber, can prevent water vapor and impurities in the airflow from flowing back, allowing the airflow to smoothly enter the first-stage chamber; 3. This utility model provides a gas sampling and filtration device, which further divides the bottom chamber by a partition plate, so that the water vapor and impurities separated by filtration are collected and output in the bottom chamber and temporarily stored in the storage mechanism. This can realize the gradual export of the water vapor and impurities separated by filtration, and further improve the filtration effect. 4. This utility model provides a gas sampling and filtration device, which, through the setting of a switching valve and a discharge valve, can smoothly discharge water vapor and impurities without affecting the normal transport of airflow. Attached Figure Description
[0016] Figure 1 This is a cross-sectional structural diagram of a gas sampling and filtration device according to Example 1.
[0017] Figure 2 This is a schematic diagram of the usage state of a gas sampling and filtration device according to Example 1.
[0018] Figure 3 This is a schematic diagram of the structure of the primary filter screen described in Example 1.
[0019] Figure 4 This is a schematic diagram of the structure of the secondary filter screen described in Example 1.
[0020] Figure 5This is a schematic diagram of the three-stage filter screen described in Example 1.
[0021] Figure 6 This is a schematic diagram of the four-stage filter screen described in Example 1.
[0022] Marked in the image: 1-Tank body, 11-Inlet, 12-Outlet, 13-Primary chamber, 14-Secondary chamber, 15-Tertiary chamber, 16-Fourth chamber, 17-Bottom chamber, 18-Filtered space, 19-Bottom wall plate 2- Primary filter, 21- Fourth connecting port, 3-Secondary filter screen, 31-Fifth connecting port, 4-Three-stage filter, 5-Four-stage filter, 6-Divider base plate, 61-First base plate, 611-First connecting port, 612-Second connecting port, 62-Second base plate, 621-Third connecting port. 7-Storage mechanism, 71-Pipeline, 72-Switch valve, 73-Discharge pipe, 74-Discharge valve 8-Barrier component, 81-First barrier plate, 82-Second barrier plate, 83-Third barrier plate 9-Guide base plate. Detailed Implementation
[0023] The present invention will be further described in detail below with reference to specific embodiments. However, it should not be construed as limiting the scope of the present invention to the following embodiments; all technologies implemented based on the content of the present invention fall within the scope of the present invention.
[0024] Unless otherwise specified, the use of terms such as "upper," "lower," "left," "right," "center," "inner," and "outer" to indicate orientation or positional relationships in the description of specific embodiments of this utility model is based on the orientation or positional relationships shown in the accompanying drawings, or the orientation or positional relationship in which the utility model product / equipment / device is typically placed during use. These terms are merely for the purpose of facilitating the description of the utility model solution or simplifying the description in specific embodiments, enabling those skilled in the art to quickly understand the solution, and do not indicate or imply that a specific device / component / element must have a specific orientation, or be constructed and operated in a specific positional relationship. Therefore, they should not be construed as limitations on this utility model.
[0025] Furthermore, the use of terms such as "horizontal," "vertical," "suspended," and "parallel" does not imply that the corresponding device / component / element must be absolutely horizontal, vertical, suspended, or parallel, but rather that it can be slightly tilted or have a deviation. For example, "horizontal" merely means that its direction is more horizontal relative to "vertical," not that the structure must be completely horizontal, but can be slightly tilted. Alternatively, it can be simplified to mean that the corresponding device / component / element, when set in a "horizontal," "vertical," "suspended," or "parallel" direction, can have an error / deviation of ±10% relative to the corresponding direction, more preferably within ±8%, more preferably within ±6%, more preferably within ±5%, and more preferably within ±4%. As long as the corresponding device / component / element is within the error / deviation range, it can still achieve its function in the present invention.
[0026] Furthermore, the use of terms such as "first," "second," and "third" in terminology is merely for distinguishing descriptions of identical or similar components and should not be interpreted as emphasizing or implying the relative importance of a particular component.
[0027] Furthermore, in the description of the embodiments of this utility model, "several", "multiple", and "several" represent at least two. The number can be any number, such as two, three, four, five, six, seven, eight, or nine, and can even exceed nine.
[0028] Furthermore, in the description of the technical solution of this utility model, unless otherwise explicitly specified / limited / restricted, the terms "set up," "install," "connect," "link," "equipped with," "laid out," and "arranged" should be interpreted broadly. For example, they can refer to fixed connections, detachable connections, or integral connections; they can refer to common connection methods in the art, such as welding, riveting, bolting, and threaded connections. Such connections can be mechanical, electrical, or communication connections; they can be direct connections or indirect connections through an intermediate medium; and they can refer to the internal communication between two components.
[0029] Example 1 like Figures 1-2As shown, a gas sampling and filtration device includes a tank 1, a staged filtration mechanism, a partition plate 6, and a storage mechanism 7. The tank 1 has an inlet 11 and an outlet 12. The staged filtration mechanism includes a primary filter 2, a secondary filter 3, a tertiary filter 4, and a quaternary filter 5 arranged sequentially, dividing the internal space of the tank 1 into a horizontally connected primary chamber 13, a secondary chamber 14, a tertiary chamber 15, and a quaternary chamber 16. The filtration space 18 is located behind the quaternary filter 5. The inlet 11 is connected to the top of the primary chamber 13, and the outlet 12 is connected to the filtration space 18. The bottom plate 6 connects the bottom edge of the primary filter 2, the bottom edge of the secondary filter 3, and the middle side wall of the tertiary filter 4, forming a bottom chamber 17 inside the tank 1. The bottom chamber 17 is vertically connected to the primary chamber 13, the secondary chamber 14, and the tertiary chamber 15, respectively. The bottom chamber 17 is horizontally connected to the tertiary chamber 16 via the tertiary filter 4. The storage mechanism 7 is connected to the bottom chamber 17, the tertiary chamber 16, and the filtered space 18 via a pipe 71. A switch valve 72 is provided on the pipe 71. The storage mechanism 7 is provided with a discharge pipe 73, and a discharge valve 74 is provided on the discharge pipe 73.
[0030] In an optional embodiment, the tank body 1 can be modified from a horizontally placed storage tank structure with a square or circular cross-section. The inlet 11 can be set at the top of one horizontal end of the tank body 1, and the outlet 12 can be set at the end of one horizontal end of the tank body 1, so that the airflow enters the tank body 1 from top to bottom from the inlet 11, and then flows in the horizontal direction from the inlet 11 to the outlet 12 through multiple chambers for filtration and separation.
[0031] In an optional embodiment, the size of the outlet 12 can be set to be consistent with the cross-sectional size of the tank 1 in the post-filtration space 18, so that the outlet 12 is larger and can ensure that the airflow can smoothly enter the subsequent process and be smoothly transported in the subsequent process.
[0032] In an optional embodiment, the primary filter 2, the secondary filter 3, the tertiary filter 4, and the quaternary filter 5 can be welded or detachably connected to the inner wall of the tank 1 to achieve stable division of the internal space of the tank 1.
[0033] In an optional implementation, the filtration precision of the primary filter 2, secondary filter 3, tertiary filter 4, and quaternary filter 5 can be set to increase sequentially according to actual conditions, so that water vapor and impurities in the airflow are gradually removed, improving the filtration effect, reducing the filtration pressure of each filter, and extending its service life.
[0034] In an optional embodiment, the storage mechanism 7 can be located below the tank 1. Taking advantage of the fact that natural gas is lighter than water vapor and impurity particles, water vapor and impurities can smoothly enter the storage mechanism 7 for collection. During use, even if some gas enters the storage mechanism 7, since the storage mechanism 7 is connected to different chambers in the tank 1, the gas in the storage mechanism 7 will not accumulate pressure during the gas flow and can be discharged with the flow of air.
[0035] In one or more embodiments, the partition plate 6 may include a first plate 61, the height of which gradually decreases along the direction from the inlet 11 to the outlet 12, and the bottom edge of the first plate 61 connects the tank 1 and the secondary filter 3; the first plate 61 is provided with a first connecting port 611 that passes through the primary chamber 13 and the bottom chamber 17, and the first connecting port 611 is vertically connected to the inlet 11; the first plate 61 is provided with a second connecting port 612 that passes through the secondary chamber 14 and the bottom chamber 17, and the second connecting port 612 is located on the side of the first plate 61 near the secondary filter 3.
[0036] The first base plate 61 is inclined. The airflow entering from the inlet 11 from top to bottom passes through the primary filter 2 into the secondary chamber 14, and passes through the first connecting port 611 into the bottom chamber 17. As the airflow continues to flow, since the first base plate 61 is connected to the bottom edge of the secondary filter 3, some of the airflow in the bottom chamber 17 will inevitably collide with the first base plate 61 and enter the secondary chamber 14, thus further filtering out water vapor and impurities. At the same time, the water vapor and impurities filtered out in the secondary chamber 14 will also enter the bottom chamber 17 through the second connecting port 612 under the action of gravity, and be collected in the bottom chamber 17. In this way, multiple diversions and convergences of the airflow are achieved, changing the overall flow direction and velocity of the airflow, improving the separation of the gas portion in the airflow, and allowing the water vapor and impurities in it to enter the bottom chamber 17 for better collection and then enter the storage mechanism 7.
[0037] In one or more embodiments, the partition plate 6 may further include a second plate 62, which connects the first plate 61 and the middle sidewall of the third-stage filter 4. The height of the second plate 62 gradually increases along the direction from the inlet 11 to the outlet 12. The second plate 62 is provided with a third connecting port 621 that passes through the third-stage chamber 15 and the bottom chamber 17. The third connecting port 621 is located on the side of the second plate 62 near the second-stage filter 3.
[0038] The second base plate 62 is inclined in the opposite direction to the first base plate 61, which further changes the flow direction of the airflow, promotes the separation of water vapor and impurities from the gas, and achieves the obstruction and separation of the airflow in the third-stage chamber 15 through the second base plate 62, so that the airflow in the third-stage chamber 15 can enter the bottom chamber 17 through the second base plate 62, and then continue to enter the fourth-stage chamber 16 only through the lower half of the third-stage filter screen 4, further improving the filtration effect.
[0039] In one or more embodiments, the primary filter 2 may have a fourth connecting port 21 on one side near the inner top surface of the tank 1. For example... Figure 3 As shown, taking the tank 1 with a circular cross-section as an example, the fourth connecting port 21 is a partial gap set at the top of the primary filter 2, so that part of the airflow can directly enter the secondary chamber 14 from the primary chamber 13, and the airflow is mixed and filtered in multiple directions in the secondary chamber 14 to increase the airflow flow.
[0040] In one or more embodiments, the secondary filter 3 may have a fifth communication port 31 on the side near the partition base plate 6. For example... Figure 4 As shown, taking a circular cross-section tank 1 as an example, the fifth connecting port 31 is formed by removing part of the structure of the secondary filter 3, so that part of the airflow in the secondary chamber 14 enters the tertiary chamber 15 through the fifth connecting port 31. At the same time, since the fifth connecting port 31, the first connecting port 611 and the third connecting port 621 are close to each other, they can provide a more convenient passage for the airflow in the bottom chamber 17 to enter the secondary chamber 14 and the tertiary chamber 15, realize the mixing of airflow in multiple chambers, and change the overall speed of airflow to the greatest extent to improve the filtration effect.
[0041] In an optional embodiment, both the first base plate 61 and the second base plate 62 are mesh structures.
[0042] In one or more embodiments, the bottom wall plate 19 of the bottom chamber 17 corresponding to the first bottom plate 61 can be configured to be inclined. The height of the bottom wall plate 19 gradually decreases along the direction from the inlet 11 to the outlet 12, and the inclination angle of the bottom wall plate 19 is smaller than that of the first bottom plate 61. The airflow entering the bottom chamber 17 impacts the bottom wall plate 19, and the water vapor and impurities therein are collected and output along the inclined bottom wall plate 19. Part of the airflow continues to flow and impacts the first bottom plate 61, which has a larger inclination angle, while part of the airflow continues to flow along the bottom chamber 17 to below the third-stage chamber 15 for further diversion and convergence.
[0043] In one or more embodiments, the bottom chamber 17 may be provided with a blocking member 8, the blocking member 8 comprising: The first baffle plate 81 is located below the third-stage chamber 15, connecting the bottom edge of the tank body 1 and the third-stage filter screen 4, and its height gradually increases along the direction from the inlet 11 to the outlet 12; The second barrier plate 82 is coplanar with the third-stage filter 4 and connects the bottom edge of the third-stage filter 4 to the tank body 1; The third barrier plate 83 is coplanar with the fourth-stage filter 5 and connects the bottom edge of the fourth-stage filter 5 to the tank 1. The height of the third barrier plate 83 is greater than the height of the second barrier plate 82.
[0044] The blocking component 8 can further change the flow direction of the airflow and promote the filtration of water vapor and impurities in the airflow.
[0045] In an optional embodiment, the second barrier plate 82 and the third-stage filter 4 can be integrally manufactured structural components, with the second barrier plate 82 being a solid plate and the third-stage filter 4 being a mesh structure; the third barrier plate 83 and the fourth-stage filter 5 can also be integrally manufactured structural components, with the third barrier plate 83 being a solid plate and the fourth-stage filter 5 being a mesh structure, which facilitates the fabrication of the structure and reduces the fabrication cost.
[0046] like Figures 5-6 As shown, taking the tank 1 with a circular cross-section as an example, the second barrier plate 82 and the third-stage filter 4 are integrally manufactured structural components, and the third barrier plate 83 and the fourth-stage filter 5 are integrally manufactured structural components.
[0047] In one or more embodiments, a flow guide plate 9 may be provided inside the fourth-stage chamber 16, and the fourth-stage chamber 16 is connected to the storage mechanism 7 via a pipe 71 at the lowest point of the flow guide plate 9. This allows water vapor and impurities in the fourth-stage chamber 16 to be collected and discharged through the flow guide plate 9, preventing water vapor and impurities from continuing to flow with the airflow.
[0048] In an optional embodiment, the flow guide plate 9 may be two oppositely arranged inclined plate-shaped structural members, with the flow output through the pipe 71 at the lowest point of the flow guide plate 9.
[0049] In one or more embodiments, the discharge pipe 73 is connected to the bottom of the storage mechanism 7, and the inner bottom surface of the storage mechanism 7 gradually decreases from the periphery to the discharge pipe 73.
[0050] This utility model discloses a gas sampling and filtration device. A graded filtration mechanism divides the internal space of the tank 1 into multiple chambers, allowing the airflow from inlet 11 to outlet 12 to pass through each chamber sequentially for filtration and separation. Moisture and impurities are gradually removed, resulting in a good filtration effect. Connecting inlet 11 to the top of the first-stage chamber 13 prevents backflow of moisture and impurities, ensuring smooth entry of the airflow into the first chamber. Simultaneously, a bottom partition plate 6 further divides the airflow into a bottom chamber 17, where the filtered moisture and impurities are collected and discharged, then temporarily stored in a storage mechanism 7. This gradual removal of filtered moisture and impurities further improves the filtration effect. Furthermore, during use, the opening and closing states of the switch valve 72 and discharge valve 74 can be controlled according to actual conditions, ensuring that the discharge of moisture and impurities does not affect the normal airflow.
[0051] This utility model discloses a gas sampling and filtration device. In use, an airflow carrying water vapor and impurities enters the primary chamber 13 through the top inlet 11. A portion of the airflow passes through the primary filter 2 and the fourth connecting port 21 into the secondary chamber 14, while another portion passes through the first connecting port 611 into the bottom chamber 17, continuing its flow towards the secondary chamber 14, tertiary chamber 15, and quaternary chamber 16. During this process, the cross-sectional area of the bottom chamber 17 gradually changes, thereby altering the airflow velocity. Some water vapor and impurities are discharged through pipe 71 into the storage mechanism 7 for temporary storage. Simultaneously, a portion of the airflow from the tertiary chamber 15 and the bottom chamber 17 passes through the tertiary filter 4 into the quaternary chamber 16. The airflow within the quaternary chamber 16... After passing through the four-stage filter screen 5, the gas enters the post-filtration space 18 and then exits from the outlet 12. The filtered water vapor and impurities enter the storage mechanism 7 for temporary storage through the pipeline 71. The water vapor and impurities condensed in the post-filtration space 18 settle down and are also discharged into the storage mechanism 7 for temporary storage through the pipeline 71. When the water vapor and impurities in the storage mechanism 7 reach a certain amount, the corresponding switch valve 72 is closed to cut off the connection between the storage mechanism 7 and the tank 1. The discharge valve 74 is opened for rapid discharge, and then the discharge valve 74 is closed again. The corresponding switch valve 72 is opened to continue collecting. The whole process does not require the gas extraction and filtration process to stop and wait. Moreover, the storage mechanism is located below the tank 1. Natural gas is lighter than water vapor and impurities, so gas leakage is less likely to occur.
[0052] The above description is only a preferred embodiment of the present utility model and is not intended to limit the present utility model. Any modifications, equivalent substitutions and improvements made within the spirit and principles of the present utility model should be included within the protection scope of the present utility model.
Claims
1. A gas sampling and filtration device, characterized in that, include: The tank (1) is provided with an inlet (11) and an outlet (12); The graded filtration mechanism includes a first-stage filter (2), a second-stage filter (3), a third-stage filter (4), and a fourth-stage filter (5) arranged in sequence. The graded filtration mechanism divides the internal space of the tank (1) into a first-stage chamber (13), a second-stage chamber (14), a third-stage chamber (15), and a fourth-stage chamber (16) that are connected horizontally in sequence. The fourth-stage filter (5) is located behind a post-filtration space (18). The inlet (11) is connected to the top of the first-stage chamber (13), and the outlet (12) is connected to the post-filtration space (18). A dividing bottom plate (6) connects the bottom edge of the primary filter (2), the bottom edge of the secondary filter (3), and the middle side wall of the tertiary filter (4), forming a bottom chamber (17) inside the tank (1). The bottom chamber (17) is vertically connected to the primary chamber (13), the secondary chamber (14), and the tertiary chamber (15), respectively. The bottom chamber (17) is horizontally connected to the tertiary chamber (16) through the tertiary filter (4). The storage mechanism (7) is connected to the bottom chamber (17), the fourth-stage chamber (16) and the filtered space (18) respectively through the pipe (71). The pipe (71) is equipped with a switch valve (72), the storage mechanism (7) is equipped with a discharge pipe (73), and the discharge pipe (73) is equipped with a discharge valve (74).
2. The gas sampling and filtration device according to claim 1, characterized in that, The partition plate (6) includes a first plate (61), the height of which gradually decreases along the direction from the inlet (11) to the outlet (12), and the first plate (61) connects the bottom edge of the tank (1) and the secondary filter (3); the first plate (61) is provided with a first connecting port (611) that passes through the primary chamber (13) and the bottom chamber (17), and the first connecting port (611) is vertically connected to the inlet (11); the first plate (61) is provided with a second connecting port (612) that passes through the secondary chamber (14) and the bottom chamber (17), and the second connecting port (612) is located on the side of the first plate (61) near the secondary filter (3).
3. The gas sampling and filtration device according to claim 2, characterized in that, The partition base plate (6) further includes a second base plate (62), which connects the first base plate (61) and the third-stage filter (4). The height of the second base plate (62) gradually increases along the direction from the inlet (11) to the outlet (12). The second base plate (62) is provided with a third communication port (621) that passes through the third-stage chamber (15) and the bottom chamber (17). The third communication port (621) is located on the side of the second base plate (62) near the second-stage filter (3).
4. The gas sampling and filtration device according to claim 3, characterized in that, The primary filter (2) has a fourth connecting port (21) on one side near the inner top surface of the tank (1).
5. A gas sampling and filtration device according to claim 4, characterized in that, The secondary filter (3) has a fifth communication port (31) on the side near the partition base plate (6).
6. A gas sampling and filtration device according to claim 3, characterized in that, Both the first base plate (61) and the second base plate (62) are mesh structures.
7. A gas sampling and filtration device according to claim 3, characterized in that, The bottom chamber (17) is inclined to the bottom wall plate (19) of the first bottom plate (61). The height of the bottom wall plate (19) gradually decreases along the direction from the inlet (11) to the outlet (12). The inclination angle of the bottom wall plate (19) is smaller than that of the first bottom plate (61).
8. A gas sampling and filtration device according to any one of claims 1-7, characterized in that, The bottom chamber (17) is provided with a blocking member (8), the blocking member (8) comprising: The first barrier plate (81) is located below the third-stage chamber (15), connecting the bottom edge of the tank (1) and the third-stage filter (4), and its height gradually increases along the direction from the inlet (11) to the outlet (12); The second barrier plate (82) is coplanar with the third-stage filter (4) and connects the bottom edge of the third-stage filter (4) and the tank (1); The third barrier plate (83) is coplanar with the fourth-stage filter (5) and connects the bottom edge of the fourth-stage filter (5) and the tank (1); The height of the third barrier plate (83) is greater than the height of the second barrier plate (82).
9. A gas sampling and filtration device according to claim 8, characterized in that, The fourth-stage chamber (16) is provided with a flow guide plate (9), and the fourth-stage chamber (16) is connected to the storage mechanism (7) through the pipe (71) at the lowest point of the flow guide plate (9).
10. A gas sampling and filtration device according to claim 8, characterized in that, The discharge pipe (73) is connected to the bottom of the storage mechanism (7), and the inner bottom surface of the storage mechanism (7) gradually decreases from the periphery to the discharge pipe (73).